CN103094043B - 等离子体处理装置 - Google Patents

等离子体处理装置 Download PDF

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Publication number
CN103094043B
CN103094043B CN201210436576.3A CN201210436576A CN103094043B CN 103094043 B CN103094043 B CN 103094043B CN 201210436576 A CN201210436576 A CN 201210436576A CN 103094043 B CN103094043 B CN 103094043B
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chamber
substrate
object thing
handling object
processing apparatus
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CN103094043A (zh
Inventor
置田尚吾
渡边彰三
岩井哲博
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Panasonic Intellectual Property Management Co Ltd
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Matsushita Electric Industrial Co Ltd
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  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
CN201210436576.3A 2011-11-07 2012-11-05 等离子体处理装置 Active CN103094043B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011243268A JP5821039B2 (ja) 2011-11-07 2011-11-07 プラズマ処理装置
JP2011-243268 2011-11-07

Publications (2)

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CN103094043A CN103094043A (zh) 2013-05-08
CN103094043B true CN103094043B (zh) 2015-09-30

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JP (1) JP5821039B2 (ja)
CN (1) CN103094043B (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102368126B1 (ko) * 2014-04-16 2022-02-25 에이지씨 가부시키가이샤 에칭 장치, 에칭 방법, 기판의 제조 방법, 및 기판
CN105428197B (zh) * 2015-11-17 2017-06-16 武汉华星光电技术有限公司 干蚀刻机及干蚀刻机的下电极

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1509496A (zh) * 2001-03-28 2004-06-30 东京毅力科创株式会社 等离子体处理装置
CN1791972A (zh) * 2003-05-19 2006-06-21 东京毅力科创株式会社 等离子体处理装置
CN101919041A (zh) * 2008-01-16 2010-12-15 索绍股份有限公司 衬底固持器，衬底支撑设备，衬底处理设备以及使用所述衬底处理设备的衬底处理方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2648233B2 (ja) * 1990-11-29 1997-08-27 株式会社日立製作所 マイクロ波プラズマ処理装置
JP2002252207A (ja) * 2001-02-22 2002-09-06 Matsushita Electric Ind Co Ltd 高周波電源、プラズマ処理装置、プラズマ処理装置の検査方法及びプラズマ処理方法
JP4977730B2 (ja) * 2009-03-31 2012-07-18 Ｓｐｐテクノロジーズ株式会社 プラズマエッチング装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1509496A (zh) * 2001-03-28 2004-06-30 东京毅力科创株式会社 等离子体处理装置
CN1791972A (zh) * 2003-05-19 2006-06-21 东京毅力科创株式会社 等离子体处理装置
CN101919041A (zh) * 2008-01-16 2010-12-15 索绍股份有限公司 衬底固持器，衬底支撑设备，衬底处理设备以及使用所述衬底处理设备的衬底处理方法

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CN103094043A (zh) 2013-05-08
JP5821039B2 (ja) 2015-11-24
JP2013098520A (ja) 2013-05-20

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Address before: Osaka Japan

Patentee before: Matsushita Electric Industrial Co.,Ltd.