CN102906545B - 干涉测量编码器*** - Google Patents
干涉测量编码器*** Download PDFInfo
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- CN102906545B CN102906545B CN201180025887.4A CN201180025887A CN102906545B CN 102906545 B CN102906545 B CN 102906545B CN 201180025887 A CN201180025887 A CN 201180025887A CN 102906545 B CN102906545 B CN 102906545B
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
- G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
- G01D5/266—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light by interferometric means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
- G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
- G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
- G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
- G01D5/36—Forming the light into pulses
- G01D5/38—Forming the light into pulses by diffraction gratings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Optical Transform (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US31925210P | 2010-03-30 | 2010-03-30 | |
US61/319,252 | 2010-03-30 | ||
US32798310P | 2010-04-26 | 2010-04-26 | |
US61/327,983 | 2010-04-26 | ||
US42248210P | 2010-12-13 | 2010-12-13 | |
US61/422,482 | 2010-12-13 | ||
PCT/US2011/025039 WO2011126610A2 (en) | 2010-03-30 | 2011-02-16 | Interferometric encoder systems |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102906545A CN102906545A (zh) | 2013-01-30 |
CN102906545B true CN102906545B (zh) | 2016-01-20 |
Family
ID=44763458
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201180025887.4A Active CN102906545B (zh) | 2010-03-30 | 2011-02-16 | 干涉测量编码器*** |
Country Status (7)
Country | Link |
---|---|
US (3) | US8300233B2 (ko) |
EP (2) | EP2553401B1 (ko) |
JP (1) | JP5814339B2 (ko) |
KR (1) | KR101725529B1 (ko) |
CN (1) | CN102906545B (ko) |
TW (1) | TWI471535B (ko) |
WO (1) | WO2011126610A2 (ko) |
Families Citing this family (44)
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US8885172B2 (en) | 2011-02-01 | 2014-11-11 | Zygo Corporation | Interferometric heterodyne optical encoder system |
US9074911B2 (en) * | 2011-08-26 | 2015-07-07 | Nikon Corporation | Measurement system and method utilizing high contrast encoder head for measuring relative movement between objects |
EP2776790B1 (en) | 2011-11-09 | 2016-09-14 | Zygo Corporation | Compact encoder head for interferometric encoder system |
JP6162137B2 (ja) * | 2011-11-09 | 2017-07-12 | ザイゴ コーポレーションZygo Corporation | エンコーダシステムを使用する低コヒーレンス干渉法 |
EP2776792B1 (en) * | 2011-11-09 | 2016-08-10 | Zygo Corporation | Double pass interferometric encoder system |
WO2013070965A1 (en) * | 2011-11-09 | 2013-05-16 | Zygo Corporation | Thermally stable optical sensor mount |
TWI479125B (zh) * | 2011-11-09 | 2015-04-01 | Zygo Corp | 干涉式編碼器系統的密接式編碼頭 |
WO2013073538A1 (ja) | 2011-11-17 | 2013-05-23 | 株式会社ニコン | エンコーダ装置、移動量計測方法、光学装置、並びに露光方法及び装置 |
DE102012204572A1 (de) * | 2012-03-22 | 2013-09-26 | Dr. Johannes Heidenhain Gmbh | Positionsmesseinrichtung und Anordnung mit einer derartigen Positionsmesseinrichtung |
JPWO2013141112A1 (ja) * | 2012-03-23 | 2015-08-03 | 住友電気工業株式会社 | 干渉測定装置 |
TWI516746B (zh) * | 2012-04-20 | 2016-01-11 | 賽格股份有限公司 | 在干涉編碼系統中執行非諧循環錯誤補償的方法、裝置及計算機程式產品,以及微影系統 |
EP2746731B1 (de) * | 2012-12-20 | 2020-03-25 | Dr. Johannes Heidenhain GmbH | Optische Positionsmesseinrichtung |
US9798130B2 (en) | 2014-01-09 | 2017-10-24 | Zygo Corporation | Measuring topography of aspheric and other non-flat surfaces |
CN103759655B (zh) * | 2014-01-23 | 2016-08-17 | 清华大学 | 基于光学倍程法的二自由度零差光栅干涉仪位移测量*** |
CN103759656B (zh) * | 2014-01-23 | 2017-01-18 | 清华大学 | 一种二自由度外差光栅干涉仪位移测量*** |
JP6427399B2 (ja) * | 2014-04-14 | 2018-11-21 | Dmg森精機株式会社 | 変位検出装置 |
US11061338B2 (en) * | 2014-04-17 | 2021-07-13 | Nikon Corporation | High-resolution position encoder with image sensor and encoded target pattern |
US9282304B1 (en) | 2014-06-02 | 2016-03-08 | Bruker Nano Inc. | Full-color images produced by white-light interferometry |
JP6322069B2 (ja) | 2014-07-02 | 2018-05-09 | Dmg森精機株式会社 | 変位検出装置 |
JP6469833B2 (ja) | 2014-07-14 | 2019-02-13 | ザイゴ コーポレーションZygo Corporation | スペクトルを用いた干渉計エンコーダ |
KR102299921B1 (ko) | 2014-10-07 | 2021-09-09 | 삼성전자주식회사 | 광학 장치 |
US10066974B2 (en) | 2014-10-13 | 2018-09-04 | Zygo Corporation | Interferometric encoder systems having at least partially overlapping diffracted beams |
WO2016096322A1 (en) * | 2014-12-19 | 2016-06-23 | Asml Netherlands B.V. | Optical encoder system, encoder head and lithographic apparatus |
WO2016204878A1 (en) | 2015-06-15 | 2016-12-22 | Zygo Corporation | Displacement measurement of deformable bodies |
CN105203031A (zh) * | 2015-09-14 | 2015-12-30 | 中国科学院上海光学精密机械研究所 | 四倍光学细分的两轴外差光栅干涉仪 |
CN105627921B (zh) * | 2015-12-18 | 2018-08-21 | 佛山轻子精密测控技术有限公司 | 一种绝对式编码器的细分采集***及其测量方法 |
CN106931887B (zh) * | 2015-12-30 | 2019-11-26 | 上海微电子装备(集团)股份有限公司 | 双频光栅测量装置 |
CN105758435B (zh) * | 2016-04-14 | 2018-02-09 | 清华大学深圳研究生院 | 一种绝对式光栅尺 |
CN109716270B (zh) * | 2016-05-11 | 2022-06-03 | Otm技术有限公司 | 用于确定相对运动的设备和方法 |
CN107664481B (zh) | 2016-07-29 | 2019-08-23 | 上海微电子装备(集团)股份有限公司 | 光栅测量装置 |
CN107664482B (zh) * | 2016-07-29 | 2019-08-23 | 上海微电子装备(集团)股份有限公司 | 光栅测量装置 |
US10120196B2 (en) * | 2016-09-30 | 2018-11-06 | National Taiwan University Of Science And Technology | Optical device |
KR102520040B1 (ko) * | 2017-10-04 | 2023-04-10 | 에이에스엠엘 네델란즈 비.브이. | 간섭계 스테이지 위치설정 장치 |
DE102018103869B3 (de) * | 2018-02-21 | 2019-05-09 | Physik Instrumente (Pi) Gmbh & Co. Kg | Maßelement für eine optische Messvorrichtung |
WO2020046408A1 (en) * | 2018-08-28 | 2020-03-05 | Kla-Tencor Corporation | Off-axis illumination overlay measurement using two-diffracted orders imaging |
CN109238148B (zh) | 2018-09-13 | 2020-10-27 | 清华大学 | 一种五自由度外差光栅干涉测量*** |
CN109579694B (zh) * | 2018-12-26 | 2021-03-16 | 哈尔滨工业大学 | 一种高容差的二自由度外差光栅干涉测量方法及*** |
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CN109632010B (zh) * | 2019-01-23 | 2020-07-17 | 中国科学院长春光学精密机械与物理研究所 | 一种位移与角度同步测量方法 |
CN112882347B (zh) * | 2019-11-29 | 2022-05-10 | 上海微电子装备(集团)股份有限公司 | 一种光栅可切换位移测量装置、测量方法及光刻*** |
JP2022135679A (ja) | 2021-03-05 | 2022-09-15 | キヤノン株式会社 | ステージ装置、リソグラフィー装置および物品製造方法 |
CN114459516B (zh) * | 2022-02-21 | 2023-07-28 | 清华大学深圳国际研究生院 | 一种绝对式六自由度光栅编码器 |
US20230366670A1 (en) | 2022-05-10 | 2023-11-16 | Zygo Corporation | Data age reduction |
CN114877811B (zh) * | 2022-06-15 | 2023-06-20 | 中国科学院长春光学精密机械与物理研究所 | 一维光栅位移测量装置 |
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EP2553401A4 (en) | 2014-04-02 |
CN102906545A (zh) | 2013-01-30 |
EP3006902B1 (en) | 2018-04-11 |
US8300233B2 (en) | 2012-10-30 |
JP5814339B2 (ja) | 2015-11-17 |
KR101725529B1 (ko) | 2017-04-10 |
US20140049782A1 (en) | 2014-02-20 |
JP2013525750A (ja) | 2013-06-20 |
US8670127B2 (en) | 2014-03-11 |
EP3006902A1 (en) | 2016-04-13 |
TW201140002A (en) | 2011-11-16 |
EP2553401B1 (en) | 2015-09-02 |
TWI471535B (zh) | 2015-02-01 |
EP2553401A2 (en) | 2013-02-06 |
US8988690B2 (en) | 2015-03-24 |
KR20130018284A (ko) | 2013-02-20 |
US20110255096A1 (en) | 2011-10-20 |
WO2011126610A2 (en) | 2011-10-13 |
WO2011126610A3 (en) | 2012-01-05 |
US20120170048A1 (en) | 2012-07-05 |
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