CN102830876A - Capacitive touch screen with flexible transparent conductive film and production method thereof - Google Patents

Capacitive touch screen with flexible transparent conductive film and production method thereof Download PDF

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CN102830876A
CN102830876A CN2012102900848A CN201210290084A CN102830876A CN 102830876 A CN102830876 A CN 102830876A CN 2012102900848 A CN2012102900848 A CN 2012102900848A CN 201210290084 A CN201210290084 A CN 201210290084A CN 102830876 A CN102830876 A CN 102830876A
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thin layer
touch screen
capacitive touch
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CN102830876B (en
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王鲁南
王建华
窦立峰
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Gaoyou Huijin New Material Technology Co.,Ltd.
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NANJING HUIJIN JINYUAN OPTOELECTRONIC MATERIALS CO Ltd
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Abstract

The invention provides a capacitive touch screen and a production method thereof. The capacitive touch screen is flexible, curlable, thin, light, low in surface resistance, highly light-permeable and low in chroma. The capacitive touch screen comprises a flexible transparent film substrate. By reactive magnetron sputtering, a first Nb2O5 film layer, a first Nb2Ox(0<x<5) film layer, a first SiO2 film layer, a first SiOx(0<x<2) film layer and a first ITO (indium tin oxide) layer are sequentially deposited on the upper surface of the flexible transparent film substrate; and a second ITO film layer is arranged on the lower surface of the flexible transparent film substrate.

Description

A kind of capacitance touch screen and preparation method thereof with flexible transparent conductive film
Technical field
Present technique relates to capacitive touch screen, specifically, is a kind of flexible and transparent capacitive touch screen.
Background technology
Conventional capacitive touch screen is to be coated with ito thin film layer (plated film electro-conductive glass) in the transparent conducting glass both sides, and the ito thin film layer is as workplace, and extraction electrode on four angles, internal layer ITO are that screen layer is to guarantee good working environment.When finger touch was on the touch screen surface, because people's bulk electric field and conductive glass surface ito thin film layer form with a coupling capacitance, for high-frequency current, electric capacity was direct conductor, so finger siphons away a very little electric current from contact point.This electric current flows out the electrode from four jiaos of touch screens respectively, and the electric current of these four electrodes of flowing through is directly proportional with the distance of pointing four jiaos, and controller draws touch point position information through the accurate Calculation to these four current ratios.
Conventional resistor-type touch-screen is relative with the conduction face by transparent conductive film and transparent conducting glass (or transparent conductive film), and middle interval with the garden cylindricality is supported.On transparent conductive film, exert pressure conducting film is contacted with hand or pen etc.On conducting film, apply voltage, judge the position of this contact point through control circuit.
This resistor-type touch-screen is because the simplification of manufacture, the appropriateness of price, and the advantage of the accuracy that contact point is judged etc., compared with optical mode or ultrasonic mode, this touch-screen applications is extensive.Shortcoming is to experience the judgement of many contact points simultaneously, can not experience the finger move mode.
Conventional capacitive touch screen is responsive than resistor-type touch-screen contact, but because making base material is the transparent conducting glass plate, its thickness, weight are limit by glass baseplate all.Glass baseplate is too thin, and intensity is affected, and touch-screen is frangible or damaged when receiving ambient pressure or bending.Because the specific (special) requirements of electrostatic induction requires to increase the transparent ito thin film layer thickness in both sides usually, it is low to reduce resistance value simultaneously.Have influence on its light transmission therefrom, cause colourity b* higher, full light transmittance is on the low side.
As the manufacture of a transparent conductive film, on the clear films base material, use physics mode deposition indium tin oxide target (ITO).But on this transparent conductive film indium tin oxide target film to adhere to permanance very poor, the surface resistance after pyroprocessing has very big variation.
Summary of the invention
The purpose of present technique is being to glass mould capacitance touch screen thicker, preponderance, transmittance, the problem that can not curl, provide that a kind of flexibility can be curled, thin thickness, in light weight, surface resistance is little, the capacitive touch screen of high printing opacity, low colourity.
The capacitive touch screen with compliant conductive film of present technique comprises flexible and transparent film substrate 1; On flexible and transparent film substrate 1 upper surface, stacked gradually a Nb 2O 5 Thin layer 2, a Nb 2Ox (0<x<5) thin layer 3, a SiO 2Thin layer 4, a SiOx (0<x<2) thin layer 5, the first ito thin film layer 6; The second ito thin film layer 7 is arranged on flexible and transparent film substrate 1 lower surface.
Above-mentioned capacitive touch screen, it also comprises and is positioned at flexible and transparent film substrate 1 upper surface and Nb 2O 5First resin thin film layer 8 between the thin layer 2, second resin thin film layer 9 between flexible and transparent film substrate 1 lower surface and the second ito thin film layer 7.First resin thin film layer 8 or second resin thin film layer 9 can make the adhesion property of rete increase.First resin thin film layer 8 or second resin thin film layer 9 can be the acryl resin thin layers.
Above-mentioned capacitive touch screen, it also comprises the 2nd Nb that stacks gradually between flexible and transparent film substrate 1 lower surface and the second ito thin film layer 7 2O 5 Thin layer 12, the 2nd Nb 2Ox (0<x<5) thin layer 13, the 2nd SiO 2 Thin layer 14, the 2nd SiOx (0<x<2) thin layer 15.
Above-mentioned capacitive touch screen, flexible and transparent film substrate 1 is the PET film substrate.
Above-mentioned capacitive touch screen, flexible and transparent film substrate 1 thickness is 5-250.The thickness of flexible and transparent film substrate is less than 5 the time; On the flexible and transparent film substrate, rely in the physical deposition overlay film, basement membrane is equally processed as crimped paper and is difficult to process, when thickness surpasses 250; Basement membrane is stone, is not suitable for the characteristic of touch-screen.
Above-mentioned capacitive touch screen, a SiO 2Thin layer 4 thickness are 0.5nm-150nm.As a SiO 2When film thickness is lower than 5nm, then do not reach the purpose that anti-scratch is wear-resisting, blocks moisture is permeated.Thickness will make when surpassing 200nm that properties of transparency reduces.The one SiO 2Thin layer has increased the adhesion of the first ito thin film layer, has blocked the infiltration of the moisture of flexible and transparent film substrate simultaneously.Even under the environment of pyroprocessing, the surface resistance variation of the ito thin film layer of winning is reduced.
Above-mentioned capacitive touch screen, a SiOx (0 < x < 2) thin layer 5 thickness are 0.5nm-150nm.
Above-mentioned capacitive touch screen, a Nb 2O 5 Thin layer 2 thickness are 0.5nm-150nm.
Above-mentioned capacitive touch screen, a Nb 2Ox (0<x<5) thin layer 3 thickness are 0.5nm-150nm.
The present invention provides a kind of preparation method with capacitive touch screen of compliant conductive film simultaneously, and promptly through the reaction magnetocontrol sputtering method, deposition obtains a Nb on flexible and transparent film substrate 1 2O 5 Thin layer 2, a Nb 2Ox (0<x<5) thin layer 3, a SiO 2Thin layer 4, a SiOx (0<x<2) thin layer 5, the first ito thin film layer 6, the second ito thin film layer 7.
The beneficial effect of present technique:
One, frivolous.Because the flexible and transparent film substrate is compared with glass substrate and had that toughness is big, proportion is little, present technique adopts the flexible and transparent film as base material, compares with the glass mould capacitance touch screen, and thickness is thinner, in light weight.
Two, softness.Because base material adopts the flexible and transparent film, softness can be curled, and can be applicable to flexible display device, like Electronic Paper etc.
Three, owing to increased Nb 2O 5, SiO 2And non-full oxide thin layer combination, reduced the reflection of light.The touch-screen that does not have this multi-layer film structure relatively, the touch-screen of present technique has high relatively total light transmittance.
Four, simultaneously because Nb 2O 5, SiO 2And non-full oxide thin layer combination, helping the scope that broadening sees through spectrum more, total light transmittance increases, and helps to reduce chromatic value b*.Present technique does not have Nb relatively 2O 5, SiO 2And the touch-screen of non-full oxide film combinations, under the identical situation of its resistance value, colourity b* is little, and full light transmittance is higher.
Description of drawings
Fig. 1 is the touch-screen synoptic diagram of multi-layer film structure.
Fig. 2 contains hardened surface flexible transparent conductive film capacitive touch screen synoptic diagram.
Fig. 3 is a double-sided coating flexible transparent conductive film capacitive touch screen synoptic diagram.
Embodiment
Embodiment 1:
Referring to shown in Figure 2,
1, is the two sides of 188 PET film substrate 1 at thickness, acryl resin used the method overlay film of wet printing.Adopt heated-air drying behind the overlay film, harden, form first resin thin film layer 8 or second resin thin film layer 9 of thickness about 5 on PET film substrate two sides respectively with ultraviolet mode.
2, on first resin thin film layer, 8 surfaces, the mode of use reaction magnetocontrol sputtering plated film forms the Nb of thickness 5nm 2O 5Thin layer 2.Then, at a Nb 2O 5The method of passing through the reaction magnetocontrol sputtering plated film on the thin layer 2 forms the Nb of 15nm 2Ox (0<x<5) thin layer 3; The same method of using the reaction magnetocontrol sputtering plated film is at a Nb 2Ox (0<x<5) thin layer 3 forms the SiO of thickness 70nm 2Thin layer 4 is at a SiO 2Form the thick SiOx (0 of 20nm on the thin layer 4<x<2) thin layer 5.On a SiOx (0 < x < 2) thin layer 5, use the first ito thin film layer 6 that forms thickness 25nm with quadrat method at last, use the second ito thin film layer 7 that forms with quadrat method at second resin thin film layer 9.
Embodiment 2:
Embodiment 2 is with embodiment 1 difference: a Nb 2O 5 Thin layer 2, a Nb 2Ox (0<x<5) thin layer 3, a SiO 2Thin layer 4, a SiOx (0<x<2) thickness of thin layer 5, the first ito thin film layer 6 is respectively: 10nm, 10nm, 80nm, 30nm, 30nm.
Embodiment 3:
Embodiment 3 is with embodiment 1 difference: a Nb 2O 5 Thin layer 2, a Nb 2Ox (0<x<5) thin layer 3, a SiO 2Thin layer 4, a SiOx (0<x<2) thickness of thin layer 5, the first ito thin film layer 6 is respectively: 15nm, 5nm, 60nm, 20nm, 30nm.
Embodiment 4:
Embodiment 4 is with embodiment 1 difference: a Nb 2O 5 Thin layer 2, a Nb 2Ox (0<x<5) thin layer 3, a SiO 2Thin layer 4, a SiOx (0<x<2) thickness of thin layer 5, the first ito thin film layer 6 is respectively: 10nm, 10nm, 90nm, 30nm, 30nm.
Embodiment 5:
A kind of capacitive touch screen with compliant conductive film referring to shown in Figure 1 has stacked gradually a Nb on flexible and transparent film substrate 1 upper surface 2O 5 Thin layer 2, a Nb 2Ox (0<x<5) thin layer 3, a SiO 2Thin layer 4, a SiOx (0<x<2) thin layer 5, the first ito thin film layer 6; The second ito thin film layer 7 is arranged on flexible and transparent film substrate 1 lower surface.
Embodiment 6:
Referring to shown in Figure 3,
1, is the two sides of 25 PET film substrate 1 at thickness, acryl resin used the method overlay film of wet printing.Adopt heated-air drying behind the overlay film, harden, form first resin thin film layer 8 or second resin thin film layer 9 of thickness about 5 on PET film substrate two sides respectively with ultraviolet mode.
2, on first resin thin film layer, 8 surfaces, the mode of use reaction magnetocontrol sputtering plated film forms the Nb of thickness 5nm 2O 5Thin layer 2.Then, at a Nb 2O 5The method of passing through the reaction magnetocontrol sputtering plated film on the thin layer 2 forms the Nb of 15nm 2Ox (0<x<5) thin layer 3; The same method of using the reaction magnetocontrol sputtering plated film is at a Nb 2Ox (0<x<5) thin layer 3 forms the SiO of thickness 70nm 2Thin layer 4 is at a SiO 2Form the thick SiOx (0 of 20nm on the thin layer 4<x<2) thin layer 5.On a SiOx (0 < x < 2) thin layer 5, use the first ito thin film layer 6 that forms thickness 25nm with quadrat method at last.
3, on second resin thin film layer 9, use the method for reaction magnetocontrol sputtering plated film, form the 2nd thick Nb of 10nm successively 2O 5 Thin layer 12, the 2nd Nb that 10nm is thick 2Ox (0<x<5) thin layer 13, the 2nd SiO that 90nm is thick 2 Thin layer 14, the 2nd SiOx (0 that 30nm is thick<x<2) thin layer 15, the second ito thin film layer 7 that 30nm is thick.
Utilize the reaction magnetocontrol sputtering mode to form Nb 2Ox thin layer, Nb 2O 5Thin layer; Nb wherein 2The X value is between 0-5 among the Ox, and its refractive index is between 2.2 to 2.6.SiO 2Increase the non-full oxide layer of one deck Si between thin layer and the ito thin film layer, promptly SiOx (0<x<2) thin layer.Utilize reaction magnetocontrol sputtering technology, change deposition SiOx thin layer degree of oxidation, (the SiOx graded index films material of λ=1550nm) more helps to improve the light transmission of light from 2.74 tapering to 1.58 to obtain refractive index.To 150nm, its thickness is difficult to form successional film during less than 0.5 nm to the SiOx film thickness, surpasses 150nm, will cause film light light transmission to reduce at 0.5nm.
Embodiment 1-4 is tested:
Through Minolta CM-3600D optical analysis measurement mechanism, measure full light transmittance Tr and colourity b*.Use 4 point probe analytical equipments, measure the sheet resistance value under the normal temperature; Each surface resistance after thermal treatment in 150 ℃, 1 hour.The result sees table 1.
Present technique provides a kind of flexible and transparent capacitive touch screen.This flexible and transparent capacitive touch screen except thin thickness, in light weight, b* value performance is more superior, full light transmittance is higher, removes and is applied to mobile phone, game machine, navigating instrument, palm machine etc., applicable to flexible display, such as Electronic Paper etc.
Table 1
Figure 2012102900848100002DEST_PATH_IMAGE001

Claims (10)

1. the capacitive touch screen with compliant conductive film is characterized in that, comprises flexible and transparent film substrate (1); On flexible and transparent film substrate (1) upper surface, stacked gradually a Nb 2O 5Thin layer (2), a Nb 2Ox (0<x<5) thin layer (3), a SiO 2Thin layer (4), a SiOx (0<x<2) thin layer (5), the first ito thin film layer (6); The second ito thin film layer (7) is arranged on flexible and transparent film substrate (1) lower surface.
2. capacitive touch screen as claimed in claim 1 is characterized in that, it also comprises and is positioned at flexible and transparent film substrate (1) upper surface and Nb 2O 5First resin thin film layer (8) between the thin layer (2) is positioned at second resin thin film layer (9) between flexible and transparent film substrate (1) lower surface and the second ito thin film layer (7).
3. capacitive touch screen as claimed in claim 1 is characterized in that, it also comprises the 2nd Nb that stacks gradually between flexible and transparent film substrate (1) lower surface and the second ito thin film layer (7) 2O 5Thin layer (12), the 2nd Nb 2Ox (0<x<5) thin layer (13), the 2nd SiO 2Thin layer (14), the 2nd SiOx (0<x<2) thin layer (15).
4. like claim 1,2 or 3 described capacitive touch screen, it is characterized in that flexible and transparent film substrate (1) is the PET film substrate.
5. like claim 1,2 or 3 described capacitive touch screen, it is characterized in that flexible and transparent film substrate (1) thickness is 5-250.
6. like claim 1,2 or 3 described capacitive touch screen, it is characterized in that a SiO 2Thin layer (4) thickness is 0.5nm-150nm.
7. like claim 1,2 or 3 described capacitive touch screen, it is characterized in that a SiOx (0 < x < 2) thin layer (5) thickness is 0.5nm-150nm.
8. like claim 1,2 or 3 described capacitive touch screen, it is characterized in that a Nb 2O 5Thin layer (2) thickness is 0.5nm-150nm.
9. like claim 1,2 or 3 described capacitive touch screen, it is characterized in that a Nb 2Ox (0<x<5) thin layer (3) thickness is 0.5nm-150nm.
10. the preparation method of the described capacitive touch screen of claim 1 is characterized in that, through the reaction magnetocontrol sputtering method, goes up deposition at flexible and transparent film substrate (1) and obtains a Nb 2O 5Thin layer (2), a Nb 2Ox (0<x<5) thin layer (3), a SiO 2Thin layer (4), a SiOx (0<x<2) thin layer (5), the first ito thin film layer (6), the second ito thin film layer (7).
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103472964A (en) * 2013-09-07 2013-12-25 向火平 Flexible capacitive screen and production process thereof
CN103500034A (en) * 2013-08-29 2014-01-08 江苏宇天港玻新材料有限公司 Tablet processing technology of touch screen OGS

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1271560A1 (en) * 2001-06-27 2003-01-02 Bridgestone Corporation Transparent electroconductive film and touch panel
CN201266244Y (en) * 2008-10-07 2009-07-01 甘国工 High translucent conductive film series
CN102279660A (en) * 2010-06-12 2011-12-14 陈维钏 Method for manufacturing touch panel
CN202795320U (en) * 2012-08-15 2013-03-13 南京汇金锦元光电材料有限公司 Capacitive touch screen with flexible transparent conducting thin film

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1271560A1 (en) * 2001-06-27 2003-01-02 Bridgestone Corporation Transparent electroconductive film and touch panel
CN201266244Y (en) * 2008-10-07 2009-07-01 甘国工 High translucent conductive film series
CN102279660A (en) * 2010-06-12 2011-12-14 陈维钏 Method for manufacturing touch panel
CN202795320U (en) * 2012-08-15 2013-03-13 南京汇金锦元光电材料有限公司 Capacitive touch screen with flexible transparent conducting thin film

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103500034A (en) * 2013-08-29 2014-01-08 江苏宇天港玻新材料有限公司 Tablet processing technology of touch screen OGS
CN103472964A (en) * 2013-09-07 2013-12-25 向火平 Flexible capacitive screen and production process thereof

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Effective date of registration: 20211122

Address after: No. 20, Weiwu Road, Lingtang Hui Township, Gaoyou City, Yangzhou City, Jiangsu Province 225600

Patentee after: Gaoyou Huijin New Material Technology Co.,Ltd.

Address before: No. 9, Xingxue Road, Qixia District, Nanjing, Jiangsu 210046

Patentee before: NANJING HJ JINYUAN OPTOELECTRONIC MATERIAL CO.,LTD.