CN102719796A - 具有硬质涂层的被覆件及其制备方法 - Google Patents
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Abstract
本发明提供一种具有硬质涂层的被覆件,包括硬质基体,该被覆件还包括形成于该硬质基体上的钛金属层、形成于该钛金属层上的钛铬合金层及形成于该钛铬合金层上TiCrN层。本发明还提供一种上述被覆件的制备方法,该方法主要包括采用离子束辅助溅射方法于该硬质基体上依次沉积所述钛金属层、钛铬合金层及TiCrN层。本发明的被覆件具有较高的硬度及较好的耐磨损性能。
Description
技术领域
本发明涉及一种具有硬质涂层的被覆件及该被覆件的制备方法。
背景技术
现代社会人们对电子产品的质量要求越来越高,不仅要求比较高的外观质量,同时还要经久耐用,这就要求电子产品表面要有比较高的硬度和耐磨性。
真空镀膜(PVD)是一种非常环保的镀膜技术,已被广泛用来进行材料表面改性,提升材料表面性能。溅射沉积是真空镀膜方法的一种,其被广泛用于沉积硬质耐磨涂层。但是溅射沉积获得的涂层的致密度不够高,因此限制了涂层硬度及耐磨性的进一步提高。
发明内容
有鉴于此,有必要提供一种具有硬质涂层的被覆件,该被覆件具有较高硬度及耐磨损性能。
另外,还有必要提供一种上述被覆件的制备方法。
一种具有硬质涂层的被覆件,包括硬质基体,该被覆件还包括形成于该硬质基体上的钛金属层、形成于该钛金属层上的钛铬合金层及形成于该钛铬合金层上TiCrN层。
一种具有硬质涂层的被覆件的制备方法,包括以下步骤:
提供硬质基体;
于该硬质基体上离子束辅助溅射钛金属层;
于该钛金属层上离子束辅助溅射钛铬合金层;
于该钛铬合金层离子束辅助溅射TiCrN层。
本发明的该被覆件通过钛金属层及钛铬合金层将TiCrN层结合于硬质基体上,使膜层具有较好的结合力。该被覆件的钛金属层、钛铬合金层及TiCrN层采用离子束辅助溅射沉积,具有较高的致密度及较佳的耐磨性能。
附图说明
图1为本发明较佳实施例的被覆件的剖视示意图。
图2为本发明较佳实施例的被覆件的制备方法中所用离子束辅助溅射设备的俯视示意图。
主要元件符号说明
被覆件 | 10 |
硬质基体 | 11 |
结合层 | 13 |
过渡层 | 15 |
硬质层 | 17 |
离子束辅助溅射设备 | 30 |
真空室 | 31 |
真空泵 | 32 |
气源通道 | 33 |
离子源室 | 34 |
离子源通道 | 35 |
加热器 | 36 |
转架 | 37 |
钛靶 | 38 |
铬靶 | 39 |
如下具体实施方式将结合上述附图进一步说明本发明。
具体实施方式
请参阅图1,本发明具有硬质涂层的被覆件10包括硬质基体11、形成于该硬质基体11的一结合层13、形成于该结合层13的过渡层15及形成于该过渡层15上的硬质层17。
该硬质基体11的材质可以为金属,比如高速钢、硬质合金、不锈钢、钛合金、镁合金及铝合金等。硬质基体11的材质还可以为陶瓷、玻璃等。
该结合层13为一钛金属层。该结合层13的厚度可为0.1~0.4μm,其用于提高后续涂层与硬质基体11之间的结合力。
所述过渡层15为钛铬合金层。过渡层15中钛的原子百分含量大约为30%~40%,铬的原子百分含量为60%~70%。过渡层15的厚度可为0.1~0.4μm。
所述硬质层17为TiCrN层。硬质层17中钛的原子百分含量为25.6%~37.0%,铬的原子百分含量为51.7%~67.6%,氮的原子百分含量为5.4%~13.8%。硬质层17的厚度可为1.3μm~1.7μm。
该结合层13、过渡层15及硬质层17可通过离子束辅助磁控溅射方法形成。
该被覆件10可以为各类切削刀具、精密量具、模具、电子产品外壳及各种建筑装饰件等。
该被覆件10通过由钛金属组成的结合层13及由钛铬合金组成的过渡层15将硬质层17结合于硬质基体11上,使硬质层17能较好地结合于硬质基体11上。
具有上述被覆件10的制备方法,主要包括如下步骤:
对硬质基体11进行清洗。该步骤可将硬质基体11放入盛装有乙醇或丙酮溶液的超声波清洗器中进行震动清洗,以除去硬质基体11表面的杂质和油污等,清洗完毕后烘干备用。
请结合参阅图2,提供一离子束辅助溅射设备30,其包括一真空室31,用以对真空室31抽真空的真空泵32,与真空室31相通的气源通道33,离子源室34,与真空室31及离子源室34相通的离子源通道35。该真空室31内设有加热器36、转架37,同时安装有至少一个钛靶38及至少一个铬靶39。转架37带动硬质基体11做圆周运行,硬质基体11在随转架37运行的同时也进行自转。镀膜时,溅射气体与反应气体经由气源通道33进入真空室31,由离子源室34产生的离子束经过离子源通道35进入真空室31内。
在硬质基体11上溅射该结合层13。将经上述清洗的硬质基体11放置于离子束辅助溅射设备30的转架37上,设置转架37的转速为1~5rpm(revolution per minute,转/分钟),对真空室31抽真空以保持其本底真空度为6.0×10-3~9.0×10-3Pa,同时加热器36升温使真空室31温度保持在150~250℃;然后按固定流量通入溅射气体氩气,使真空室31内压力达0.3~0.5Pa;向离子源室34充入离子源气体,开启离子源电源,并调节离子源电源功率为1~1.5kW,以产生高速离子束,对硬质基体11表面进行离子轰击;开启钛靶38的电源,电源功率为3.8~4.2kW,对硬质基体11进行离子束辅助溅射5~10分钟,以于硬质基体11表面形成所述由钛金属形成的结合层13。该步骤所用辅助离子束为氮离子束。本实施例中,转架37转速为3rpm,真空室31本底真空度为8.0×10-3Pa,通入氩气后真空室31内压力为0.4Pa,钛靶38由中频电源驱动,功率为4kW,沉积时间为10分钟。
继续在结合层13上离子束辅助溅射沉积该过渡层15。沉积该过渡层15的步骤中,保持转架转速不变,持续向真空室31通入氩气,氩气流量不变。开启离子源,保持离子源功率不变。同时开启钛靶38和铬靶39的电源,钛靶电源和铬靶电源的功率均为3.8~4.2kW,在结合层13上离子束辅助溅射沉积该过渡层15,沉积时间为5~10分钟。该步骤所用辅助离子束为氮离子束。本实施例中,该步骤的钛靶38由中频电源驱动,功率为4kW;铬靶39由直流电源驱动,功率为4kW;沉积时间为10分钟。
然后,在该过渡层15上离子束辅助溅射沉积该硬质层17。沉积该硬质层17的步骤中,保持转架转速、氩气流量不变,同时通入反应气体氮气,使氩气与氮气的流量之比在1.5~2.0之间,即使氩气与氮气于真空室31产生的分压之比为1.5~2.0。开启离子源,保持离子源功率不变。同时开启钛靶38和铬靶39的电源,钛靶电源和铬靶电源的功率均为3.8~4.2kW,在过渡层15上离子束辅助溅射沉积该硬质层17,沉积时间为30~50分钟,由此获得被覆件10。该步骤所用辅助离子束为氮离子和氩离子的混合离子束。本实施例中,沉积该硬质层17步骤的钛靶38由中频电源驱动,功率为4kW;铬靶39由直流电源驱动,功率为4kW;沉积时间为40分钟。
镀膜结束后,关闭靶材电源、离子源、气流等,待真空室31温度降至接近室温时取出被覆件10。
由上述方法制备的被覆件10的表面显微维氏硬度为600HV0.025~700HV0.025,膜层结合力为70N。被覆件10表面膜层组织均匀、致密度高。
上述被覆件10的制备方法,在溅射沉积所述结合层13、过渡层15及硬质层17的过程中采用离子束对硬质基体11表面进行辅助轰击,有效提高膜层的致密度,从而明显提高耐磨性能。与没有离子束辅助沉积的溅射方法相比,要获得具有相同表面硬度的膜层,采用本发明的离子束辅助溅射沉积的膜层厚度更小,所需镀膜时间更短。
Claims (12)
1.一种具有硬质涂层的被覆件,包括硬质基体,其特征在于:该被覆件还包括形成于该硬质基体上的钛金属层、形成于该钛金属层上的钛铬合金层及形成于该钛铬合金层上TiCrN层。
2.如权利要求1所述的被覆件,其特征在于:该被覆件的表面显微维氏硬度为600HV0.025~700HV0.025。
3.如权利要求1所述的被覆件,其特征在于:所述钛铬合金层中钛的原子百分含量为30%~40%,铬的原子百分含量为60%~70%。
4.如权利要求1所述的被覆件,其特征在于:所述TiCrN层中钛的原子百分含量为25.6%~37.0%,铬的原子百分含量为51.7%~67.6%,氮的原子百分含量为5.4%~13.8%。
5.如权利要求1所述的被覆件,其特征在于:所述钛金属层与钛铬合金层的厚度均为0.1~0.4μm;所述TiCrN层的厚度为1.3~1.7μm。
6.如权利要求1所述的被覆件,其特征在于:该钛金属层、钛铬合金层及TiCrN层通过离子束辅助溅射形成。
7.如权利要求1所述的被覆件,其特征在于:该硬质基体为高速钢、硬质合金、陶瓷、不锈钢、钛合金、镁合金及铝合金中的一种。
8.一种具有硬质涂层的被覆件的制备方法,包括以下步骤:
提供硬质基体;
于该硬质基体上离子束辅助溅射钛金属层;
于该钛金属层上离子束辅助溅射钛铬合金层;
于该钛铬合金层离子束辅助溅射TiCrN层。
9.如权利要求8所述的被覆件的制备方法,其特征在于:形成所述钛金属层的步骤是在如下条件下进行:使用钛靶,以氩气为溅射气体,氩气的分压为0.3~0.5Pa,同时采用离子源产生的离子束对硬质基体进行轰击,所述离子源的电源功率为1~1.5kW,钛靶的电源功率为3.8~4.2kW,沉积时间为5~10分钟。
10.如权利要求8所述的被覆件的制备方法,其特征在于:形成所述钛铬合金层的步骤是在如下条件下进行:使用钛靶及铬靶,以氩气为溅射气体,氩气的分压为0.3~0.5Pa,同时采用离子源产生的离子束对硬质基体进行轰击,所述离子源的电源功率为1~1.5kW,钛靶及铬靶的电源功率均为3.8~4.2kW,沉积时间为5~10分钟。
11.如权利要求8所述的被覆件的制备方法,其特征在于:形成所述TiCrN层的步骤是在如下条件下进行:使用钛靶及铬靶,以氩气为溅射气体,氩气的分压为0.3~0.5Pa,以氮气为反应气体,氩气与氮气产生的分压之比为1.5~2.0,同时采用离子源产生的离子束对硬质基体进行轰击,所述离子源的电源功率为1~1.5kW,钛靶及铬靶的电源功率均为3.8~4.2kW,沉积时间为30~50分钟。
12.如权利要求8所述的被覆件的制备方法,其特征在于:形成所述钛金属层、钛铬合金层及TiCrN层的步骤是在6.0×10-3~9.0×10-3Pa的本底真空度以及150~250℃的温度下进行。
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