JP5952051B2 - 硬質塗層を有する被覆部材及びその製造方法 - Google Patents
硬質塗層を有する被覆部材及びその製造方法 Download PDFInfo
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- C—CHEMISTRY; METALLURGY
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
- Y10T428/12597—Noncrystalline silica or noncrystalline plural-oxide component [e.g., glass, etc.]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12729—Group IIA metal-base component
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12736—Al-base component
- Y10T428/12743—Next to refractory [Group IVB, VB, or VIB] metal-base component
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12806—Refractory [Group IVB, VB, or VIB] metal-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
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Description
11 硬質基材
13 結合層
15 中間層
17 硬質層
30 イオンビームによって補助されたスパッタリング装置
31 真空室
32 真空ポンプ
33 気体源通路
34 イオン源室
35 イオン源通路
36 加熱器
37 回転枠
38 チタンターゲット
39 クロムターゲット
Claims (9)
- 硬質基材に形成された硬質塗層を有する被覆部材であって、
前記被覆部材は、前記硬質基材に形成された結合層と、前記結合層に形成された中間層と、前記中間層に形成された硬質層と、を備えており、
前記結合層は、チタン金属層であり、前記中間層は、チタン・クロム合金層であり、前記硬質層は、チタン・クロム窒素層であり、前記被覆部材の表面のマイクロビッカース硬さは600HV 0.025 〜700HV 0.025 であることを特徴とする硬質塗層を有する被覆部材。 - 前記中間層のチタン原子の含有量は30原子%〜40原子%であり、クロム原子の含有量は60原子%〜70原子%であることを特徴とする請求項1に記載の硬質塗層を有する被覆部材。
- 前記硬質層のチタン原子の含有量が25.6原子%〜37.0原子%であり、クロム原子の含有量が51.7原子%〜67.6原子%であり、窒素の含有量が5.4原子%〜13.8原子%であることを特徴とする請求項1に記載の硬質塗層を有する被覆部材。
- 前記結合層及び前記中間層の厚さは、それぞれ0.1μm〜0.4μmであり、前記硬質層の厚さは、1.3μm〜1.7μmであることを特徴とする請求項1に記載の硬質塗層を有する被覆部材。
- 請求項1から4のいずれか一項に記載の硬質塗層を有する被覆部材の製造方法であって、
硬質基材を提供するステップと、
イオンビームによって補助されたスパッタリング装置を利用して、前記硬質基材にチタン金属層を被覆するステップと、
イオンビームによって補助されたスパッタリング装置を利用して、前記チタン金属層にチタン・クロム合金層を被覆するステップと、
イオンビームによって補助されたスパッタリング装置を利用して、前記チタン・クロム合金層にチタン・クロム窒素層を被覆するステップと、
を備えていることを特徴とする硬質塗層を有する被覆部材の製造方法。 - 前記チタン金属層は、チタンターゲットを使用し、スパッタリングの気体はアルゴン気体であり、アルゴン気体の分圧は0.3Pa〜0.5Paであり、イオン源から発射されたイオンビームは硬質基材の表面に衝突するものであり、前記イオン源の電源のパワーは1kw〜1.5kwであり、チタンターゲットの電源のパワーは3.8kw〜4.2kwであり、被覆時間は5分〜10分である、という条件で形成されることを特徴とする請求項5に記載の硬質塗層を有する被覆部材の製造方法。
- 前記チタン・クロム合金層は、チタンターゲット及びクロムターゲットを使用し、スパッタリングの気体はアルゴン気体であり、アルゴン気体の分圧は0.3Pa〜0.5Paであり、イオン源から発射されたイオンビームは硬質基材の表面に衝突するものであり、前記イオン源の電源のパワーは1kw〜1.5kwであり、チタンターゲットの電源のパワーは3.8kw〜4.2kwであり、被覆時間は5分〜10分である、という条件で形成されることを特徴とする請求項5に記載の硬質塗層を有する被覆部材の製造方法。
- 前記チタン・クロム窒素層は、チタンターゲット及びクロムターゲットを使用し、スパッタリングの気体はアルゴン気体であり、アルゴン気体の分圧は0.3〜0.5Paであり、窒素を反応気体として、前記アルゴン気体と前記窒素との分圧比は1.5〜2.0であり、イオン源から発射されたイオンビームは硬質基材の表面に衝突するものであり、前記イオン源の電源のパワーは1kw〜1.5kwであり、チタンターゲットの電源のパワーは3.8kw〜4.2kwであり、被覆時間は30分〜50分である、という条件で形成されることを特徴とする請求項5に記載の硬質塗層を有する被覆部材の製造方法。
- 前記チタン金属層、前記チタン・クロム合金層及び前記チタン・クロム窒素層を形成する過程で、真空度が6.0×10−3Pa〜9.0×10−3Paに保持され、且つ温度が150℃〜250℃に保持されることを特徴とする請求項5に記載の硬質塗層を有する被覆部材の製造方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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CN2011100779356A CN102719796A (zh) | 2011-03-30 | 2011-03-30 | 具有硬质涂层的被覆件及其制备方法 |
CN201110077935.6 | 2011-03-30 |
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JP2012211390A JP2012211390A (ja) | 2012-11-01 |
JP5952051B2 true JP5952051B2 (ja) | 2016-07-13 |
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US (1) | US8778491B2 (ja) |
JP (1) | JP5952051B2 (ja) |
CN (1) | CN102719796A (ja) |
TW (1) | TWI502090B (ja) |
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CN103866251B (zh) * | 2012-12-18 | 2016-09-21 | 中国科学院兰州化学物理研究所 | 柱塞表面类金刚石薄膜批量化沉积方法 |
CN103921498B (zh) * | 2013-01-15 | 2017-08-29 | 深圳富泰宏精密工业有限公司 | 具有硬质膜层的不锈钢制品及其制备方法 |
CN103935076B (zh) * | 2013-01-23 | 2018-04-20 | 深圳富泰宏精密工业有限公司 | 壳体及其制作方法 |
CN103935075B (zh) * | 2013-01-23 | 2018-07-03 | 深圳富泰宏精密工业有限公司 | 壳体及其制作方法 |
CN104032260B (zh) * | 2013-03-08 | 2018-02-06 | 深圳富泰宏精密工业有限公司 | 壳体及其制作方法 |
CN103161733B (zh) * | 2013-03-15 | 2015-04-08 | 鲁东大学 | 一种Ti/TiCrN纳米多层涂层叶轮及其制备方法 |
CN104032269A (zh) * | 2014-06-04 | 2014-09-10 | 江苏科技大学 | NbN-Ag硬质薄膜及制备方法 |
CN104887060B (zh) * | 2015-06-25 | 2018-05-25 | 武汉苏泊尔炊具有限公司 | 不粘炊具及不粘炊具的制作方法 |
CN105887023B (zh) * | 2016-06-15 | 2018-07-03 | 东莞市普拉提纳米科技有限公司 | TiCrN+MoS2/Cr/Ti组合润滑涂层刀具及其制备工艺 |
CN105887024B (zh) * | 2016-06-15 | 2018-10-02 | 济宁学院 | TiCrN&MoS2/Cr/Ti叠层涂层刀具及其制备工艺 |
CN105861997B (zh) * | 2016-06-15 | 2018-07-17 | 济宁学院 | TiCrN/MoS2多元减摩润滑涂层刀具及其制备工艺 |
CN105925941B (zh) * | 2016-06-15 | 2018-09-28 | 济宁学院 | TiAlCrN+MoS2/Ti/Al/Cr组合润滑涂层刀具及其制备工艺 |
TWI800190B (zh) * | 2021-12-30 | 2023-04-21 | 欣興電子股份有限公司 | 玻璃載板保護結構及其製法 |
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DE4243915A1 (de) * | 1992-12-23 | 1994-06-30 | Hauzer Techno Coating Europ B | Verfahren zur mehrstufigen Beschichtung von Substraten |
JP3154403B2 (ja) * | 1997-11-17 | 2001-04-09 | 住友電気工業株式会社 | 被覆金型 |
CA2327031C (en) * | 1999-11-29 | 2007-07-03 | Vladimir Gorokhovsky | Composite vapour deposited coatings and process therefor |
US6558822B2 (en) * | 2000-05-25 | 2003-05-06 | Ebara Corporation | Cr-containing titanium nitride film |
WO2003041919A2 (en) * | 2001-11-13 | 2003-05-22 | Acme United Corporation | Coating for stationery cutting implements |
JP3996809B2 (ja) * | 2002-07-11 | 2007-10-24 | 住友電工ハードメタル株式会社 | 被覆切削工具 |
US7939172B2 (en) * | 2006-05-17 | 2011-05-10 | G & H Technologies, Llc | Wear resistant vapor deposited coating, method of coating deposition and applications therefor |
JP2008240079A (ja) * | 2007-03-28 | 2008-10-09 | Tungaloy Corp | 被覆部材 |
JP5714481B2 (ja) * | 2008-04-29 | 2015-05-07 | エージェンシー フォー サイエンス,テクノロジー アンド リサーチ | 無機傾斜バリア膜及びそれらの製造方法 |
JP5245569B2 (ja) * | 2008-06-24 | 2013-07-24 | 大同特殊鋼株式会社 | ダイカスト用金型 |
CN101323945A (zh) * | 2008-07-25 | 2008-12-17 | 西南大学 | 含应力缓和层的硬质薄膜及其制备方法 |
CN101831615B (zh) * | 2010-05-11 | 2011-11-09 | 广东工业大学 | 一种纳米复合钛铬铝硅氮化物刀具涂层及其制备方法 |
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US8778491B2 (en) | 2014-07-15 |
TW201239118A (en) | 2012-10-01 |
JP2012211390A (ja) | 2012-11-01 |
US20120251838A1 (en) | 2012-10-04 |
CN102719796A (zh) | 2012-10-10 |
TWI502090B (zh) | 2015-10-01 |
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