CN102681334B - 从容纳容器取出大型表膜构件的取出方法 - Google Patents

从容纳容器取出大型表膜构件的取出方法 Download PDF

Info

Publication number: CN102681334B
Authority: CN; China
Prior art keywords: framework; component; holding; teat; groove
Prior art date: 2007-07-06
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Active

Application number

CN201210140722.8A

Other languages

English (en)

Chinese (zh)

Other versions

CN102681334A (zh

Inventor

谷村彰浩

前田拓郎

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Mitsui Chemicals Inc

Original Assignee

Asahi Chemical Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2007-07-06

Filing date

2008-07-02

Publication date

2015-09-30

2008-07-02 Application filed by Asahi Chemical Co Ltd filed Critical Asahi Chemical Co Ltd

2012-09-19 Publication of CN102681334A publication Critical patent/CN102681334A/zh

2015-09-30 Application granted granted Critical

2015-09-30 Publication of CN102681334B publication Critical patent/CN102681334B/zh

Status Active legal-status Critical Current

2028-07-02 Anticipated expiration legal-status Critical

Links

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Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

General Physics & Mathematics (AREA)
Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Sustainable Development (AREA)
Environmental & Geological Engineering (AREA)
Epidemiology (AREA)
Public Health (AREA)
Life Sciences & Earth Sciences (AREA)
Health & Medical Sciences (AREA)
Preparing Plates And Mask In Photomechanical Process (AREA)
Condensed Matter Physics & Semiconductors (AREA)
Manufacturing & Machinery (AREA)
Computer Hardware Design (AREA)
Microelectronics & Electronic Packaging (AREA)
Power Engineering (AREA)
Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Packaging Frangible Articles (AREA)

CN201210140722.8A 2007-07-06 2008-07-02 从容纳容器取出大型表膜构件的取出方法 Active CN102681334B (zh)

Applications Claiming Priority (5)

Application Number	Priority Date	Filing Date	Title
JP2007-179041		2007-07-06
JP2007179054		2007-07-06
JP2007179041		2007-07-06
JP2007-179054		2007-07-06
CN200880023582.8A CN101689018B (zh)	2007-07-06	2008-07-02	大型表膜构件的框体及该框体的把持方法

Related Parent Applications (1)

Application Number	Title	Priority Date	Filing Date
CN200880023582.8A Division CN101689018B (zh)	2007-07-06	2008-07-02	大型表膜构件的框体及该框体的把持方法

Publications (2)

Publication Number	Publication Date
CN102681334A CN102681334A (zh)	2012-09-19
CN102681334B true CN102681334B (zh)	2015-09-30

Family

ID=40228472

Family Applications (2)

Application Number	Title	Priority Date	Filing Date
CN201210140722.8A Active CN102681334B (zh)	2007-07-06	2008-07-02	从容纳容器取出大型表膜构件的取出方法
CN200880023582.8A Active CN101689018B (zh)	2007-07-06	2008-07-02	大型表膜构件的框体及该框体的把持方法

Family Applications After (1)

Application Number	Title	Priority Date	Filing Date
CN200880023582.8A Active CN101689018B (zh)	2007-07-06	2008-07-02	大型表膜构件的框体及该框体的把持方法

Country Status (5)

Country	Link
JP (2)	JP2010102357A (ko)
KR (2)	KR101264571B1 (ko)
CN (2)	CN102681334B (ko)
TW (2)	TWI498671B (ko)
WO (1)	WO2009008294A1 (ko)

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