CN102636957B - 着色感光性树脂组合物及化合物 - Google Patents

着色感光性树脂组合物及化合物 Download PDF

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Publication number
CN102636957B
CN102636957B CN201210038468.0A CN201210038468A CN102636957B CN 102636957 B CN102636957 B CN 102636957B CN 201210038468 A CN201210038468 A CN 201210038468A CN 102636957 B CN102636957 B CN 102636957B
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China
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methyl
compound
hydrogen atom
represent
formula
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CN201210038468.0A
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English (en)
Chinese (zh)
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CN102636957A (zh
Inventor
朴昭妍
辰巳泰基
井上雅人
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Sumitomo Chemical Co Ltd
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Sumitomo Chemical Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D231/00—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings
    • C07D231/02—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings
    • C07D231/10—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D231/14—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D231/16—Halogen atoms or nitro radicals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
CN201210038468.0A 2011-02-14 2012-02-13 着色感光性树脂组合物及化合物 Active CN102636957B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011-028258 2011-02-14
JP2011028258 2011-02-14

Publications (2)

Publication Number Publication Date
CN102636957A CN102636957A (zh) 2012-08-15
CN102636957B true CN102636957B (zh) 2016-06-22

Family

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CN201210038468.0A Active CN102636957B (zh) 2011-02-14 2012-02-13 着色感光性树脂组合物及化合物

Country Status (4)

Country Link
JP (1) JP5807568B2 (ko)
KR (1) KR101766745B1 (ko)
CN (1) CN102636957B (ko)
TW (1) TWI515268B (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2021415B1 (en) 2006-05-18 2017-03-15 Illumina Cambridge Limited Dye compounds and the use of their labelled conjugates
JP2013076006A (ja) * 2011-09-30 2013-04-25 Jsr Corp 着色組成物、カラーフィルタ及び表示素子
CN105263968B (zh) * 2013-06-07 2017-08-22 东友精细化工有限公司 着色固化性树脂组合物
JP2015041104A (ja) * 2013-08-22 2015-03-02 東友ファインケム株式会社 着色感光性樹脂組成物、これを含むカラーフィルタおよび表示装置
JP6160831B2 (ja) * 2013-12-20 2017-07-12 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物、およびカラーフィルタ
CN113168102A (zh) * 2018-10-03 2021-07-23 艾曲迪微***股份有限公司 感光性树脂组合物、图案固化物的制造方法、固化物、层间绝缘膜、覆盖涂层、表面保护膜及电子部件

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5851621A (en) * 1996-05-03 1998-12-22 Ciba Specialty Chemicals Corporation High-capacity storage media
JP2008106111A (ja) * 2006-10-24 2008-05-08 General Technology Kk インパクトプリンタ用油性インク組成物とそれを用いたインクリボンおよびインクロール
CN101482699A (zh) * 2007-12-14 2009-07-15 住友化学株式会社 着色感光性树脂组合物
CN101750894A (zh) * 2008-12-09 2010-06-23 住友化学株式会社 着色感光性树脂组合物

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005320423A (ja) * 2004-05-07 2005-11-17 Fuji Photo Film Co Ltd 色素、並びに、これを含有する染料含有硬化性組成物、カラーフィルタおよびその製造方法
JP5481844B2 (ja) * 2007-12-14 2014-04-23 住友化学株式会社 着色感光性樹脂組成物
JP5760584B2 (ja) * 2011-03-29 2015-08-12 住友化学株式会社 着色硬化性樹脂組成物
JP5993626B2 (ja) * 2011-06-24 2016-09-14 住友化学株式会社 塩及び着色硬化性組成物

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5851621A (en) * 1996-05-03 1998-12-22 Ciba Specialty Chemicals Corporation High-capacity storage media
JP2008106111A (ja) * 2006-10-24 2008-05-08 General Technology Kk インパクトプリンタ用油性インク組成物とそれを用いたインクリボンおよびインクロール
CN101482699A (zh) * 2007-12-14 2009-07-15 住友化学株式会社 着色感光性树脂组合物
CN101750894A (zh) * 2008-12-09 2010-06-23 住友化学株式会社 着色感光性树脂组合物

Also Published As

Publication number Publication date
TWI515268B (zh) 2016-01-01
TW201237118A (en) 2012-09-16
JP5807568B2 (ja) 2015-11-10
KR101766745B1 (ko) 2017-08-09
KR20120093096A (ko) 2012-08-22
JP2012185483A (ja) 2012-09-27
CN102636957A (zh) 2012-08-15

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