CN102507143A - Wave plate phase retardation measuring method and optical cement disc - Google Patents
Wave plate phase retardation measuring method and optical cement disc Download PDFInfo
- Publication number
- CN102507143A CN102507143A CN2011102972220A CN201110297222A CN102507143A CN 102507143 A CN102507143 A CN 102507143A CN 2011102972220 A CN2011102972220 A CN 2011102972220A CN 201110297222 A CN201110297222 A CN 201110297222A CN 102507143 A CN102507143 A CN 102507143A
- Authority
- CN
- China
- Prior art keywords
- wave plate
- hole
- contact block
- optical cement
- sleeve pipe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Landscapes
- Polarising Elements (AREA)
Abstract
The invention discloses a wave plate phase retardation on-line measuring method, in order to solve the problem that the accuracy of the existing measuring method is poor. The wave plate phase retardation on-line measuring method provided by the invention leads a measuring beam to pass through a wave plate and a through hole corresponding to the wave plate position on an optical cement disc to obtain a measuring result, and eliminates influence of optical cement stress birefringence and/or optical cement disc processing residual stress birefringence on the measuring result. The method comprises the following steps: processing the through hole on the optical cement disc, bunching a sleeve in the through hole, leading the wave plate to cover the through hole, and leading a rim light adhesive of the wave plate to be on the optical cement disc; and leading the measuring beam to pass through the wave plate and the through hole to obtain the measuring result. The optical cement disc comprises an optical cement disc body, the through hole, a support column and the sleeve. The wave plate phase retardation on-line measuring method provided by the invention has better measuring effect, and higher accuracy.
Description
Technical field
The present invention relates to a kind of wave plate retardation measuring method and contact block.
Background technology
Optical wave plate is the important original paper in the polarization optics, in the optical system relevant with polarized light, has a wide range of applications, like optical interdferometer, optical modulator, optoisolator, CD reading head, ellipsometer etc.As the important composition element in the optical system, the precision of wave plate retardation amount can influence the result of use of total system.In order to process, make high-precision wave plate, need carry out precision control to each link in the wave plate manufacturing process.
In the wave plate manufacturing procedure, wave plate, is ground together to contact block by optical cement, polishes at present.Shown in Figure 1 is used contact block structure in the present wave plate processing, and 1 is contact block, and 2 is wave plate.All polish on contact block and wave plate surface, and surfaceness is very little, and both combine through intermolecular Van der Waals force, and optical cement together.Because the existence of Van der Waals force will inevitably be introduced stress birefrin during optical cement.Table 1 is the bit phase delay data that the wave plate optical cement records when taking off on contact block, can see on the optical cement that the bit phase delay value is different when taking off.
Table 1.Optical cement on contact block when taking off contact block measured value
When in the wave plate processing when dish detects wave plate retardation; The bit phase delay that stress birefrin is introduced can be superimposed upon on the bit phase delay of wave plate; Make measurement result overproof; This makes that wave plate detects on dish different from the result that contact block takes off the back detection with wave plate, and this yield rate that has just caused existing wave plate processing, characterization processes to make wave plate produce is low.
The substrate of wave plate must polish to contact block by optical cement, gets on to measure down bit phase delay from contact block again.In case it is overproof to measure wave plate retardation, optical cement polishes to contact block once more again, can only cancel.This has just caused serious waste, makes that the rate that manufactures a finished product of wave plate is low, and cost is high.
Summary of the invention
In order to overcome above-mentioned defective, the present invention provides a kind of accuracy of measurement high wave plate retardation amount On-line Measuring Method.
For achieving the above object; On the one hand; The present invention provides a kind of wave plate retardation amount On-line Measuring Method; Said method is to make measuring beam pass through hole corresponding with the wave plate position on wave plate and the contact block obtain measurement result, eliminates optical cement stress birefrin and/or the birefringence of the contact block forming residual stress influence to measurement result.
Particularly, said method comprises the steps:
On contact block, process through hole;
String is established sleeve pipe in said through hole;
Wave plate is covered said through hole place, the edge optical cement of wave plate is on said contact block;
Make measuring beam pass wave plate and through hole obtains measurement result.
On the other hand, the present invention provides a kind of contact block, and said contact block comprises: the contact block body, said contact block body is provided with at least one through hole, is provided with the sleeve pipe of light tight material in the said through hole.
Particularly, said through hole and said sleeve pipe interference fit.
Particularly, in the said sleeve pipe support column is set, said sleeve pipe and said support column interference fit.
Particularly, said through hole is processed into by ultrasonic method.
Wave plate retardation amount On-line Measuring Method of the present invention makes measuring beam pass wave plate and through hole; Avoid introducing optical cement stress birefrin and/or the birefringence of contact block forming residual stress influence to measurement result because measuring beam passes contact block; Measurement effect is better, and precision is higher.
Be provided for the through hole that measuring beam passes through on the contact block of the present invention, make wave plate retardation amount on-line measurement precision better; String is established support column in the through hole, makes the processing of wave plate not receive the influence of through hole, is difficult for deforming.
Description of drawings
Fig. 1 is existing wave plate and contact block user mode synoptic diagram.
Fig. 2 is a contact block preferred embodiment user mode synoptic diagram of the present invention.
Fig. 3 is a preferred embodiment partial sectional view shown in Figure 2.
Embodiment
Below in conjunction with Figure of description the present invention is done detailed description.
Wave plate retardation amount On-line Measuring Method of the present invention is to make measuring beam pass through hole corresponding with the wave plate position on wave plate and the contact block obtain measurement result, eliminates optical cement stress birefrin and/or the birefringence of the contact block forming residual stress influence to measurement result.The listed wave plate that is respectively of table 2 is measured and independent measurement wave plate gained bit phase delay measurement data through the contact block through hole.Can know from institute's column data, measure the wave plate retardation amount through through hole on the contact block, wave plate surface diverse location measurement data changes little.
Table 2. is through through hole on the contact block with through contact block wave plate surface diverse location delay measurements data
This method mainly comprises the steps: on contact block, to process through hole; String is established sleeve pipe in through hole; Wave plate is covered through hole place, the edge optical cement of wave plate is on contact block; Make measuring beam pass wave plate and through hole obtains measurement result.
As shown in Figure 2, in order to realize above-mentioned wave plate retardation amount On-line Measuring Method, contact block of the present invention comprises: contact block body 1, contact block body 1 is provided with at least one through hole, is provided with sleeve pipe 3 in the through hole.The shape of contact block body 1 does not have special qualification, is as the criterion with processing and the online detection that is convenient to wave plate, and preferable shape is circular.The quantity of set through hole is set according to concrete request for utilization on the contact block body 1; The position of through hole on contact block body 1 is provided with also decides according to concrete request for utilization, and preferably adopting with the center of circle is the symmetric offset spread mode of symmetric points.Stablize for the unitized construction that makes through hole and sleeve pipe 3, adopt interference fit between the two.Sleeve pipe 3 is processed by light tight material, has avoided the measuring beam oblique fire to get in the contact block body and brings influence to measurement result.The job operation of through hole has a lot, in order to obtain smooth madial wall, preferably uses Ultrasonic Machining.
Test figure shows that the size of through hole can bring influence to the measurement result structure, sees table 3.
The different hole dimensions of table 3 are to measuring the influence of wave plate retardation measurement result
Can see that from data through hole is big more, more little to the measurement result influence, but the hole is excessive, and processing brings difficulty to wave plate, thin wave plate easy deformation.Preferred solution is that support column 4 is set in sleeve pipe 3, and sleeve pipe and support column interference fit are as shown in Figure 3.For better effects if, support column 4 at least one side heads are planar structure, contact with the abundant face in the surface of wave plate 2.
Preferred method of application: note polished surface is protected when ultrasound wave is got through the hole on contact block 1, obtain through hole after the plug glass column all stay, as support column 4.Add steel bushing at glass column, as sleeve pipe 3.Cooperating between glass column and the steel bushing is interference fit, and the inside/outside diameter size of steel bushing is pressed the dimensioned in glass column and contact block hole.Steel bushing is an interference fit with cooperating of contact block hole.
To the contact block 1 of band through hole, be placed on wave plate 2 optical cements on the higher flat board of flatness to the one side of band wave plate 2 then, be placed on glass column in the through hole.The upper surface of glass column is contacted with the lower surface of wave plate 2, promptly be the face contact as far as possible.Push away gently with hand push or with pliers, rigidly connect and contact wave plate 2 bottoms for well, it is too big to exert oneself, and prevents to promote wave plate, can't optical cement on.The installation of glass column and steel bushing for ease also is provided with counterbore 5 on the contact block 1, counterbore 5 is positioned at the end of through hole.
After wave plate 2 is polished to and requires size, rotate steel bushing with hand and take out gently.If push away motionlessly, available pliers rotates gently, takes down steel bushing.When processing next dish wave plate 2, repeat above-mentioned steps.
More than; Be merely preferred embodiment of the present invention, but protection scope of the present invention is not limited thereto, any technician who is familiar with the present technique field is in the technical scope that the present invention discloses; The variation that can expect easily or replacement all should be encompassed within protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion with the protection domain that claim was defined.
Claims (6)
1. wave plate retardation amount On-line Measuring Method; It is characterized in that; Said method is to make measuring beam pass through hole corresponding with the wave plate position on wave plate and the contact block obtain measurement result, eliminates optical cement stress birefrin and/or the birefringence of the contact block forming residual stress influence to measurement result.
2. wave plate retardation amount On-line Measuring Method according to claim 1 is characterized in that said method comprises the steps:
On contact block, process through hole;
String is established sleeve pipe in said through hole;
Wave plate is covered said through hole place, the edge optical cement of wave plate is on said contact block;
Make measuring beam pass wave plate and through hole obtains measurement result.
3. contact block is characterized in that, said contact block comprises: the contact block body, said contact block body is provided with at least one through hole, is provided with the sleeve pipe of light tight material in the said through hole.
4. contact block according to claim 3 is characterized in that, said through hole and said sleeve pipe interference fit.
5. contact block according to claim 3 is characterized in that, in the said sleeve pipe support column is set, said sleeve pipe and said support column interference fit.
6. contact block according to claim 3 is characterized in that said through hole is processed into by ultrasonic method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011102972220A CN102507143A (en) | 2011-09-30 | 2011-09-30 | Wave plate phase retardation measuring method and optical cement disc |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011102972220A CN102507143A (en) | 2011-09-30 | 2011-09-30 | Wave plate phase retardation measuring method and optical cement disc |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102507143A true CN102507143A (en) | 2012-06-20 |
Family
ID=46219250
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011102972220A Pending CN102507143A (en) | 2011-09-30 | 2011-09-30 | Wave plate phase retardation measuring method and optical cement disc |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102507143A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108562547A (en) * | 2018-03-13 | 2018-09-21 | 中国科学院福建物质结构研究所 | Laser crystal thermal stress double refractive inde measuring device and its method |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010043324A1 (en) * | 2000-03-30 | 2001-11-22 | Yoshiyuki Sakairi | Optical fiber characteristics measuring device and optical fiber characteristics measuring method |
| US20030025900A1 (en) * | 2001-08-03 | 2003-02-06 | Tetsuya Araki | Optical fiber measuring apparatus |
| CN1260556C (en) * | 2002-10-18 | 2006-06-21 | 三星电子株式会社 | Measuring system of fibre-optical residual stress |
| JP2010025609A (en) * | 2008-07-16 | 2010-02-04 | Nikon Corp | Wavefront generation optical system and wavefront aberration measuring system |
| CN102176083A (en) * | 2010-11-22 | 2011-09-07 | 福建福晶科技股份有限公司 | Processing and detecting method of ultraviolet multistage wave plate |
-
2011
- 2011-09-30 CN CN2011102972220A patent/CN102507143A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010043324A1 (en) * | 2000-03-30 | 2001-11-22 | Yoshiyuki Sakairi | Optical fiber characteristics measuring device and optical fiber characteristics measuring method |
| US20030025900A1 (en) * | 2001-08-03 | 2003-02-06 | Tetsuya Araki | Optical fiber measuring apparatus |
| CN1260556C (en) * | 2002-10-18 | 2006-06-21 | 三星电子株式会社 | Measuring system of fibre-optical residual stress |
| JP2010025609A (en) * | 2008-07-16 | 2010-02-04 | Nikon Corp | Wavefront generation optical system and wavefront aberration measuring system |
| CN102176083A (en) * | 2010-11-22 | 2011-09-07 | 福建福晶科技股份有限公司 | Processing and detecting method of ultraviolet multistage wave plate |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108562547A (en) * | 2018-03-13 | 2018-09-21 | 中国科学院福建物质结构研究所 | Laser crystal thermal stress double refractive inde measuring device and its method |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102794686B (en) | Smit roof prism polishing and machining technology | |
| WO2010053924A3 (en) | In-line wafer thickness sensing | |
| CN105197882A (en) | Silicon nano cone array coated with gold film as well as preparation method and application thereof | |
| TW200700341A (en) | Process for polishing glass substrate | |
| JPS6219701A (en) | Measuring bar | |
| CN102825519B (en) | Processing method of prism | |
| CN204085362U (en) | Fly wheel assembly is beated comprehensive check tool | |
| CN102507143A (en) | Wave plate phase retardation measuring method and optical cement disc | |
| CN204313767U (en) | The instrument that a kind of compressor blade tenon angle detects | |
| CN203405177U (en) | Measuring device for shape and dimension of thick steel plate | |
| CN102818534B (en) | Detection method for detecting surface shape of plane optical component | |
| CN102642254B (en) | Crystal face directional detection bonding table | |
| CN102176083A (en) | Processing and detecting method of ultraviolet multistage wave plate | |
| CN204421814U (en) | Turbosupercharger middle case cross bore positioning step depth check tool | |
| CN201497460U (en) | Lens edge uniform thickness difference measuring device with adjustable diameter | |
| CN202661700U (en) | High-precision beam splitter prism gluing and adjusting device | |
| TW201237989A (en) | Central positioning structure and method of solar silicon wafer processing | |
| CN210452321U (en) | A frock clamp for detecting product face type on polishing dish | |
| CN202648591U (en) | Large-size axle diameter measuring scale | |
| CN202255238U (en) | R-value measuring device for hand grinding bowl | |
| CN201706995U (en) | Measuring rule | |
| CN201552481U (en) | Positioning assembly device for processing optical prisms | |
| CN206037922U (en) | Utensil is examined to plane degree | |
| CN202956361U (en) | Pipeline surface fault detection device | |
| CN216593066U (en) | Special detection tool for detecting symmetry degree of automobile part |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20120620 |