CN102373412A - Vacuum-plated part and its manufacturing method - Google Patents
Vacuum-plated part and its manufacturing method Download PDFInfo
- Publication number
- CN102373412A CN102373412A CN2010102589436A CN201010258943A CN102373412A CN 102373412 A CN102373412 A CN 102373412A CN 2010102589436 A CN2010102589436 A CN 2010102589436A CN 201010258943 A CN201010258943 A CN 201010258943A CN 102373412 A CN102373412 A CN 102373412A
- Authority
- CN
- China
- Prior art keywords
- matrix
- color layers
- vacuum plating
- plating part
- coordinate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
- C23C14/025—Metallic sublayers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
- Y10T428/12576—Boride, carbide or nitride component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
- Y10T428/12611—Oxide-containing component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention provides a vacuum-plated part. The vacuum-plated part comprises a matrix and a color layer formed on the matrix. The color layer is a TiAlOC layer. The chroma area of the color layer in a CIE LAB color system is as follows: L* coordinate is from 28 to 32; a* coordinate is from -1 to 1; and b* coordinate is from -1 to 1. The invention also provides a manufacturing method of the above vacuum-plated part. The vacuum-plated part provided by the invention is black.
Description
Technical field
The present invention relates to a kind of vacuum plating part and method of manufacture manufacturing thereof.
Background technology
Vacuum coating technology is the film technique of an environmental protection.With the formed rete of the mode of vacuum plating have high firmness, high-wearing feature, good chemicalstability, with matrix bond firmly and advantage such as bright metal appearance, so vacuum plating is more and more wider in the application in cosmetic surface treatments field.But vacuum coating technology also has certain limitation, in making ater rete process, occur easily heterochromatic, black in band blue or black in be with phenomenons such as red, so had a strong impact on the attractive in appearance of black rete.Present reported black rete L value (being brightness value) the best can only reach about 35, in order to obtain the big difficulty of L value existence that purer black continues to reduce rete.Therefore, it is necessary developing the lower black plated film spare of a kind of L value real.
Summary of the invention
In view of this, the present invention provides the vacuum plating part of the lower black of a kind of L value.
A kind of method of manufacture of above-mentioned vacuum plating part also is provided in addition.
A kind of vacuum plating part comprises that a matrix and is formed at the color layers on the matrix, and this color layers is an oxidation of coal titanium aluminium lamination, and the colourity district that this color layers appears is in the L of CIE LAB colour system
*Coordinate between 28 to 32, a
*Coordinate between-1 to 1, b
*Coordinate is between-1 to 1.
A kind of method of manufacture of vacuum plating part may further comprise the steps:
One matrix is provided;
Use a titanium target and an aluminium target; The feeding flow is that oxygen and the flow of 15～20sccm is the acetylene gas of 15～20sccm; On matrix, form a color layers through magnetron sputtering coating method; This color layers is a TiAlOC layer, and its thickness is 0.3～1 μ m, and the chroma areas that appears is in the L of CIE LAB colour system
*Coordinate between 28 to 32, a
*Coordinate between-1 to 1, b
*Coordinate is between-1 to 1.
Compared to prior art, the method for manufacture of above-mentioned vacuum plating part adopts titanium target and aluminium target as target, changes the composition of color layers through the flow control to reactant gases nitrogen and acetylene gas, thereby makes the L of color layers
*Coordinate demonstrates pure black between 28 to 32.Can demonstrate the metal appearance of attractive ater with the prepared vacuum plating part of this method.
Description of drawings
Fig. 1 is the cross-sectional schematic of the vacuum plating part of preferred embodiment of the present invention.
The main element nomenclature
Vacuum plating part 10
Matrix 11
Substrate layer 13
Color layers 15
Embodiment
Vacuum plating part of the present invention can be electronic device housing, also can be rims of spectacle, casing for clock and watch, metal bathroom spare and building appliance etc.
Shown in Figure 1ly be the vacuum plating part 10 of preferred embodiment of the present invention, it comprises a matrix 11, a substrate layer 13 and a color layers 15.Substrate layer 13 directly combines with matrix 11, and color layers 15 is formed at the surface of substrate layer 13.
The material of matrix 11 can be metal, glass, pottery or plastics.
Substrate layer 13 is formed between matrix 11 and the color layers 15, with the sticking power of enhance color layer 15 on matrix 11.Substrate layer 13 can be a titanium layer or other can provide the coating of adhesion effect.The thickness of substrate layer 13 is approximately 0.01～0.1 μ m.The color of substrate layer 13 is good with the tone that does not influence the color layers color, such as can be pastel shades such as silver color, white and pearl.
Color layers 15 is an oxidation of coal titanium aluminium (TiAlOC) layer.The chroma areas that this color layers 15 appears is in the L of CIE LAB colour system
*Coordinate between 28 to 32, a
*Coordinate between-1 to 1, b
*Coordinate demonstrates black between-1 to 1.The thickness of this color layers 15 is approximately 0.3～1 μ m.
The method of manufacture of above-mentioned vacuum plating part 10 mainly comprises the steps:
One matrix 11 is provided, and matrix 11 is put into the ultrasonic cleaner that is loaded with ethanol and/or acetone soln shakes cleaning, to remove the impurity and the greasy dirt on matrix 11 surfaces.Dry for standby after cleaning finishes.The material of said matrix 11 can be metal, glass, pottery or plastics.
Again argon plasma is carried out on the surface of matrix 11 and clean, further remove the greasy dirt on matrix 11 surfaces, to improve matrix 11 surfaces and follow-up coating's adhesion.Method that argon plasma cleans is carried out on the surface of matrix 11 comprise the steps: matrix 11 is put on the work rest of Vakuumkammer of a medium frequency magnetron sputtering coating equipment, vacuumizing this Vakuumkammer to vacuum tightness is 8.0 * 10
-3Pa, in Vakuumkammer, feeding purity with the flow of 300～600sccm (standard state ml/min) is 99.999% argon gas, in matrix 11 apply-300～-bias voltage of 800V, plasma is carried out on matrix 11 surfaces cleans, scavenging period is 5～10min.
Adopt the mode of magnetron sputtering on matrix 11, to form a substrate layer 13.This substrate layer 13 is a titanium layer.The concrete operation method and the processing parameter that form this substrate layer 13 are: said plasma clean accomplish after, regulate argon flow amount to 10～200sccm, heat this Vakuumkammer to 50～180 ℃, and the revolution rotating speed that work rest is set is 1～4rpm, be preferably 3rpm; Open the power supply of the titanium target placed the medium frequency magnetron sputtering coating equipment, the power that the titanium target is set is 5～11kw, and to matrix 11 apply-50～-bias voltage of 200V, deposition substrate layer 13.The time that deposits this substrate layer 13 is 3～10min.
After forming this substrate layer 13, the purity that in Vakuumkammer, feeds 15～20sccm is that the purity of 99.99% oxygen and 15～20sccm is 99.8% acetylene gas, apply-50～-being biased on the matrix 11 of 200V; Open titanium target and aluminium target simultaneously, matrix 11 is continued plated film, with one color layers 15 of plating on substrate layer 13, this color layers 15 is a TiAlOC layer.The time that deposits this color layers 15 is 10～60min.The power of said titanium target and aluminium target all is set to 5～11kw.
The chroma areas that said color layers 15 appears is in the L of CIE LAB colour system
*Coordinate between 28 to 32, a
*Coordinate between-1 to 1, b
*Coordinate demonstrates black between-1 to 1.
The method of manufacture of above-mentioned vacuum plating part adopts titanium target and aluminium target as target, changes the composition of color layers 15 through the control to reactant gases nitrogen and acetylene gas flow, thereby makes the L of color layers 15
*Coordinate demonstrates pure black between 28 to 32.Simultaneously, through selecting suitable bias voltage, the sedimentation rate of control titanium atom, aluminium atom, carbon atom and Sauerstoffatom, but the compactness of enhance color layer 15.In addition, select the flow of suitable bias voltage, acetylene and oxygen, can guarantee higher sedimentation rate, thereby can further improve the production efficiency of this vacuum plating part 10.
Claims (10)
1. vacuum plating part, comprise that a matrix and is formed at the color layers on the matrix, is characterized in that: this color layers is an oxidation of coal titanium aluminium lamination, and the colourity district that this color layers appears is in the L of CIE LAB colour system
*Coordinate between 28 to 32, a
*Coordinate between-1 to 1, b
*Coordinate is between-1 to 1.
2. vacuum plating part as claimed in claim 1 is characterized in that: the thickness of said color layers is 0.3～1 μ m.
3. vacuum plating part as claimed in claim 1 is characterized in that: this vacuum plating part comprises that also one is formed at the substrate layer between matrix and the color layers, and this substrate layer is a titanium layer.
4. vacuum plating part as claimed in claim 3 is characterized in that: the thickness of this substrate layer is 0.01～0.1 μ m.
5. vacuum plating part as claimed in claim 1 is characterized in that: the material of this matrix is a kind of in metal, glass, pottery and the plastics.
6. the method for manufacture of a vacuum plating part may further comprise the steps:
One matrix is provided;
Use a titanium target and an aluminium target; The feeding flow is that oxygen and the flow of 15～20sccm is the acetylene gas of 15～20sccm; On matrix, form a color layers through magnetron sputtering coating method; This color layers is a TiAlOC layer, and its thickness is 0.3～1 μ m, and the chroma areas that appears is in the L of CIE LAB colour system
*Coordinate between 28 to 32, a
*Coordinate between-1 to 1, b
*Coordinate is between-1 to 1.
7. the method for manufacture of vacuum plating part as claimed in claim 6 is characterized in that: in forming the process of this color layers, to matrix apply-50～-bias voltage of 200V.
8. the method for manufacture of vacuum plating part as claimed in claim 7 is characterized in that: the depositing time of this color layers is 10～60min, and the thickness of this color layers is 0.3～1 μ m.
9. the method for manufacture of vacuum plating part as claimed in claim 6 is characterized in that: the method for manufacture of this vacuum plating part also is included in and forms before the color layers step of plating one titanium substrate layer on matrix.
10. the method for manufacture of vacuum plating part as claimed in claim 9; It is characterized in that: the processing parameter that forms this titanium substrate layer is: with titanium target and aluminium target is target, and the power that titanium target and aluminium target are set is 5～11kw, and the flow of argon gas is 10～200sccm; Sputter temperature is 50～180 ℃; The revolution rotating speed is 1～4rpm, the bias voltage that matrix is applied is-50～-200V, depositing time is 3～10min.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010102589436A CN102373412A (en) | 2010-08-20 | 2010-08-20 | Vacuum-plated part and its manufacturing method |
| US13/010,947 US8455095B2 (en) | 2010-08-20 | 2011-01-21 | Article and method for manufacturing same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010102589436A CN102373412A (en) | 2010-08-20 | 2010-08-20 | Vacuum-plated part and its manufacturing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102373412A true CN102373412A (en) | 2012-03-14 |
Family
ID=45594309
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010102589436A Pending CN102373412A (en) | 2010-08-20 | 2010-08-20 | Vacuum-plated part and its manufacturing method |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US8455095B2 (en) |
| CN (1) | CN102373412A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111791024A (en) * | 2020-06-01 | 2020-10-20 | 肇庆宏旺金属实业有限公司 | Method for processing common sand super-black steel stainless steel plate |
| CN114059013A (en) * | 2020-07-30 | 2022-02-18 | 深圳市万普拉斯科技有限公司 | Workpiece, preparation method thereof and electronic equipment |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4714660A (en) * | 1985-12-23 | 1987-12-22 | Fansteel Inc. | Hard coatings with multiphase microstructures |
| GB2226334A (en) * | 1988-11-25 | 1990-06-27 | Atomic Energy Authority Uk | Multilayer coatings |
| CN101191197A (en) * | 2006-11-21 | 2008-06-04 | 比亚迪股份有限公司 | Magnetron sputtering ion plating method |
| US20080240876A1 (en) * | 2007-04-01 | 2008-10-02 | Iscar Ltd. | Cutting Insert Having Ceramic Coating |
| CN101666557A (en) * | 2008-09-01 | 2010-03-10 | 北京有色金属研究总院 | Non-vacuum solar spectrum selective absorption film and preparation method thereof |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7455918B2 (en) * | 2004-03-12 | 2008-11-25 | Kennametal Inc. | Alumina coating, coated product and method of making the same |
| US8080312B2 (en) * | 2006-06-22 | 2011-12-20 | Kennametal Inc. | CVD coating scheme including alumina and/or titanium-containing materials and method of making the same |
-
2010
- 2010-08-20 CN CN2010102589436A patent/CN102373412A/en active Pending
-
2011
- 2011-01-21 US US13/010,947 patent/US8455095B2/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4714660A (en) * | 1985-12-23 | 1987-12-22 | Fansteel Inc. | Hard coatings with multiphase microstructures |
| GB2226334A (en) * | 1988-11-25 | 1990-06-27 | Atomic Energy Authority Uk | Multilayer coatings |
| CN101191197A (en) * | 2006-11-21 | 2008-06-04 | 比亚迪股份有限公司 | Magnetron sputtering ion plating method |
| US20080240876A1 (en) * | 2007-04-01 | 2008-10-02 | Iscar Ltd. | Cutting Insert Having Ceramic Coating |
| CN101666557A (en) * | 2008-09-01 | 2010-03-10 | 北京有色金属研究总院 | Non-vacuum solar spectrum selective absorption film and preparation method thereof |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111791024A (en) * | 2020-06-01 | 2020-10-20 | 肇庆宏旺金属实业有限公司 | Method for processing common sand super-black steel stainless steel plate |
| CN114059013A (en) * | 2020-07-30 | 2022-02-18 | 深圳市万普拉斯科技有限公司 | Workpiece, preparation method thereof and electronic equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| US20120045640A1 (en) | 2012-02-23 |
| US8455095B2 (en) | 2013-06-04 |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C05 | Deemed withdrawal (patent law before 1993) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20120314 |