CN102465253A - Vacuum film plating piece and manufacturing method thereof - Google Patents
Vacuum film plating piece and manufacturing method thereof Download PDFInfo
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- CN102465253A CN102465253A CN2010105334284A CN201010533428A CN102465253A CN 102465253 A CN102465253 A CN 102465253A CN 2010105334284 A CN2010105334284 A CN 2010105334284A CN 201010533428 A CN201010533428 A CN 201010533428A CN 102465253 A CN102465253 A CN 102465253A
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Abstract
The invention provides a vacuum film plating piece. The piece which comprises a matrix and a color layer formed on the matrix is characterized in that: the color layer comprises a TiCN layer and an AlON layer sequentially formed on the matrix; and the chorma region of the color layer in a CIE LAB color system is characterized in that L* a coordinate figure is between 39 and 42, a* a coordinate figure is between 14 and 18 and b* a coordinate figure is between 14 and 18. The invention also provides a manufacturing method of the vacuum film plating piece. The vacuum film plating piece has a kumquat color.
Description
Technical field
The present invention relates to a kind of vacuum plating part and method of manufacture thereof, relate in particular to a kind of vacuum plating part and method of manufacture thereof that presents the cumquat look.
Background technology
Vacuum coating technology is a very film technique of environmental protection.With the formed rete of the mode of vacuum plating have high firmness, high-wearing feature, good chemicalstability, with matrix bond firmly and advantage such as bright metal appearance, so vacuum plating is more and more wider in the application in cosmetic surface treatments field.
In ornamental vacuum plating field, be a very crucial technical indicator to the design and the control of the color of institute's coatings.The color that at present adopts vacuum coating technology stably to produce only limits to gold, silver color, black, minority colour system such as rose-red, compares with film-forming process such as baking vanish, anodizing, and vacuum plating is not strong in the competitive power in cosmetic surface treatments field.
Summary of the invention
In view of this, the present invention provides a kind of vacuum plating part that presents the cumquat look.
A kind of method of manufacture of above-mentioned vacuum plating part also is provided in addition.
A kind of vacuum plating part comprises matrix and is formed at the color layers on the matrix that said color layers comprises TiCN layer and the AlON layer that is formed at successively on the matrix, and the chroma areas that this color layers appears is in the L of CIE LAB colour system
*Coordinate between 39 to 42, a
*Coordinate between 14 to 18, b
*Coordinate is between 14 to 18.
A kind of method of manufacture of vacuum plating part may further comprise the steps:
Matrix is provided;
Adopt the magnetron sputtering embrane method, on this matrix, form color layers, this color layers comprises TiCN layer and the AlON layer that is formed at successively on the matrix, and the chroma areas that this color layers appears is in CIE LAB colour system L
*Coordinate between 39 to 42, a
*Coordinate between 14 to 18, b
*Coordinate forms this color layers and comprises the steps: between 14 to 18
Using the titanium target, is reactant gases with acetylene gas and nitrogen, and the flow of acetylene gas and nitrogen is respectively 2～30sccm, 50～300sccm, depositing Ti CN layer on matrix, and depositing time is 20～120min;
Adopting the aluminium target, is reactant gases with nitrogen and oxygen, and the flow of nitrogen and oxygen is respectively 10～100sccm, 100～300sccm, depositing Al ON layer on said TiCN layer, and depositing time is 20～60min.
The method of manufacture of above-mentioned vacuum plating part changes the composition of TiCN layer through the flow control to reactant gases acetylene gas and nitrogen, promptly changes the ratio of carbon atom, nitrogen-atoms and titanium atom in the TiCN layer; Change the composition of AlON layer through flow control, promptly change the ratio of Sauerstoffatom in the AlON layer, nitrogen-atoms and aluminium atom, thereby reach the purpose that makes color layers demonstrate the cumquat look reactant gases oxygen and nitrogen.Can demonstrate the metal appearance of attractive cumquat look with the prepared vacuum plating part of this method, enrich the color of vacuum coating, greatly improve the outward appearance competitive power of product.
Description of drawings
Fig. 1 is the cross-sectional schematic of the vacuum plating part of preferred embodiment of the present invention.
The main element nomenclature
Vacuum plating part 10
TiCN layer 151
AlON layer 153
Embodiment
Vacuum plating part of the present invention can be electronic device housing, also can be rims of spectacle, casing for clock and watch, metal bathroom spare and building appliance.
See also Fig. 1, the vacuum plating part 10 of preferred embodiment of the present invention comprises matrix 11 and is formed at the color layers 15 on the matrix 11.The material of said matrix 11 can be metal, glass, pottery or plastics.
Said color layers 15 comprises TiCN layer 151 and the AlON layer 153 that is formed at successively on the substrate layer 13.The chroma areas that this color layers 15 appears is in the L of CIE LAB colour system
*Coordinate between 39 to 42, a
*Coordinate between 14 to 18, b
*Coordinate shows as the cumquat look between 14 to 18.The thickness of color layers 15 is 0.5～2.0 μ m.The thickness of said TiCN layer 151 is 0.3～1.0 μ m, and the thickness of said AlON layer 153 is 0.2～1.0 μ m.
Said vacuum plating part 10 also comprises the substrate layer 13 that is formed between matrix 11 and the color layers 15, in order to the sticking power of enhance color layer 15 on matrix 11.This substrate layer 13 can be titanium layer or other can provide the coating of adhesion effect, and its thickness is 0.01～0.1 μ m.The color of this substrate layer 13 is good with the tone that does not influence the color layers color, such as can be pastel shades such as silver color, white and pearl.
The method of manufacture of above-mentioned vacuum plating part 10 mainly comprises the steps:
Again argon plasma is carried out on the surface of matrix 11 and clean, further remove the greasy dirt on matrix 11 surfaces, to improve matrix 11 surfaces and follow-up coating's adhesion.Method that argon plasma cleans is carried out on the surface of matrix 11 comprises the steps: matrix 11 is put on the work rest of coating chamber of magnetron sputtering coating equipment, to this coating chamber vacuumize handle to vacuum tightness be 8.0 * 10
-3Pa, in coating chamber, feeding purity with the flow of 300～600sccm (standard state ml/min) is 99.999% argon gas, regulate to be biased into-300～-800V, plasma clean is carried out on matrix 11 surfaces, scavenging period is 5～10min.
Adopt the mode of magnetron sputtering on matrix 11, to form substrate layer 13.In the present embodiment, this substrate layer 13 is a titanium layer.The concrete operation method and the processing parameter that form this substrate layer 13 are: after said plasma clean is accomplished; With the argon gas is working gas; Regulate its flow to 100～300sccm; It is 40～80% that dutycycle is set, and heats this coating chamber to 80～180 ℃ (being that sputter temperature is 80～180 ℃), and the revolution rotating speed that work rest is set is 1.0～3.0rpm; Open the power supply of the titanium target placed magnetron sputtering coater, it is 5～12kw that its power is set, to matrix 11 apply-50～-bias voltage of 180V, deposition substrate layer 13.The time that deposits this substrate layer 13 is 10～30min, is preferably 20min.
After forming this substrate layer 13, on this substrate layer 13, form color layers 15.This color layers 15 comprises TiCN layer 151 and the AlON layer 153 that is formed at successively on the substrate layer 13.The concrete operations and the processing parameter that form said color layers 15 are following:
With acetylene gas and nitrogen is reactant gases; The feeding flow is that acetylene gas and the flow of 2～30sccm are the nitrogen of 50～300sccm in coating chamber; To matrix 11 apply-50～-bias voltage of 180V; Heat this coating chamber to 50～180 ℃ (being that sputter temperature is 50～180 ℃), keep the power of flow and titanium target of said argon gas constant, with plating TiCN layer 151 on substrate layer 13.The time that deposits this TiCN layer 151 is 20～120min, is preferably 60min.Wherein, the flow of said acetylene gas is preferably 15sccm, and the flow of said nitrogen is preferably 110sccm.
After forming this TiCN layer 151, stopping to feed said acetylene gas, is reactant gases with nitrogen and oxygen; The flow that nitrogen is set is 10～100sccm; In coating chamber, feeding flow is the oxygen of 100～300sccm, opens the power supply of the aluminium target that has placed magnetron sputtering coater, and it is 3～5kw that its power is set; Keep the flow of said argon gas, the bias voltage and the sputter temperature that put on the matrix 11 constant, depositing Al ON layer 153 on said TiCN layer 151.Depositing time is 20～60min, is preferably 20min.
The chroma areas that said color layers 15 appears is in the L of CIE LAB colour system
*Coordinate between 39 to 42, a
*Coordinate between 14 to 18, b
*Coordinate is between 14 to 18.
The method of manufacture of above-mentioned vacuum plating part changes the composition of TiCN layer 151 through the flow control to reactant gases acetylene gas and nitrogen, promptly changes the ratio of carbon atom, nitrogen-atoms and titanium atom in the TiCN layer 151; Change the composition of AlON layer 153 through flow control, promptly change the ratio of Sauerstoffatom in the AlON layer 153, nitrogen-atoms and aluminium atom, thereby reach the purpose that makes color layers 15 demonstrate the cumquat look reactant gases oxygen and nitrogen.Simultaneously, through selecting suitable bias voltage, the sedimentation rate of control carbon atom, nitrogen-atoms, Sauerstoffatom, titanium atom and aluminium atom, but the compactness of enhance color layer 15.In addition, select the flow and the bias voltage of suitable acetylene gas, nitrogen and oxygen, can guarantee higher sedimentation rate, also can improve the production efficiency of this vacuum plating part 10.
Claims (10)
1. a vacuum plating part comprises matrix and is formed at the color layers on the matrix, it is characterized in that: said color layers comprises TiCN layer and the AlON layer that is formed at successively on the matrix, and the chroma areas that this color layers appears is in the L of CIE LAB colour system
*Coordinate between 39 to 42, a
*Coordinate between 14 to 18, b
*Coordinate is between 14 to 18.
2. vacuum plating part as claimed in claim 1 is characterized in that: the thickness of said color layers is 0.5～2.0 μ m; Wherein, the thickness of said TiCN layer is 0.3～1.0 μ m, and the thickness of said AlON layer is 0.2～1.0 μ m.
3. vacuum plating part as claimed in claim 1 is characterized in that: said vacuum plating part also comprises the substrate layer that is formed between matrix and the color layers, and this substrate layer is a titanium layer.
4. vacuum plating part as claimed in claim 3 is characterized in that: the thickness of this substrate layer is 0.01～0.1 μ m.
5. vacuum plating part as claimed in claim 1 is characterized in that: the material of this matrix is a kind of in metal, glass, pottery and the plastics.
6. the method for manufacture of a vacuum plating part may further comprise the steps:
Matrix is provided;
Adopt the magnetron sputtering embrane method, on this matrix, form color layers, this color layers comprises TiCN layer and the AlON layer that is formed at successively on the matrix, and the chroma areas that this color layers appears is in CIE LAB colour system L
*Coordinate between 39 to 42, a
*Coordinate between 14 to 18, b
*Coordinate forms this color layers and comprises the steps: between 14 to 18
Using the titanium target, is reactant gases with acetylene gas and nitrogen, and the flow of acetylene gas and nitrogen is respectively 2～30sccm, 50～300sccm, depositing Ti CN layer on matrix, and depositing time is 20～120min;
Adopting the aluminium target, is reactant gases with nitrogen and oxygen, and the flow of nitrogen and oxygen is respectively 10～100sccm, 100～300sccm, depositing Al ON layer on said TiCN layer, and depositing time is 20～60min.
7. the method for manufacture of vacuum plating part as claimed in claim 6 is characterized in that: when forming this TiCN layer, to matrix apply-50～-bias voltage of 180V, the power of titanium target is 5～12kw.
8. the method for manufacture of vacuum plating part as claimed in claim 6 is characterized in that: when forming this AlON layer, to matrix apply-50～-bias voltage of 180V, the power of aluminium target is 3～5kw.
9. the method for manufacture of vacuum plating part as claimed in claim 6 is characterized in that: the method for manufacture of this vacuum plating part also is included in and forms before the color layers step of magnetron sputtering substrate layer on matrix.
10. the method for manufacture of vacuum plating part as claimed in claim 9 is characterized in that: said substrate layer is a titanium layer, and the processing parameter that forms this substrate layer is: adopting the titanium target is target; It is 5～12kw that its power is set; With the argon gas is working gas, and its flow is 100～300sccm, to matrix apply-50～-bias voltage of 180V; Sputter temperature is 80～180 ℃, and depositing time is 20～30min.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010105334284A CN102465253A (en) | 2010-11-05 | 2010-11-05 | Vacuum film plating piece and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010105334284A CN102465253A (en) | 2010-11-05 | 2010-11-05 | Vacuum film plating piece and manufacturing method thereof |
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| Publication Number | Publication Date |
|---|---|
| CN102465253A true CN102465253A (en) | 2012-05-23 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010105334284A Pending CN102465253A (en) | 2010-11-05 | 2010-11-05 | Vacuum film plating piece and manufacturing method thereof |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003253473A (en) * | 2001-12-28 | 2003-09-10 | Citizen Watch Co Ltd | Ornament having white coating film and manufacturing method thereof |
| JP2007075941A (en) * | 2005-09-13 | 2007-03-29 | Ngk Spark Plug Co Ltd | Cutting insert and cutting tool |
| CN101830092A (en) * | 2009-03-13 | 2010-09-15 | 中国科学院福建物质结构研究所 | Method for preparing corrosion-resistant colored decorative film |
-
2010
- 2010-11-05 CN CN2010105334284A patent/CN102465253A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003253473A (en) * | 2001-12-28 | 2003-09-10 | Citizen Watch Co Ltd | Ornament having white coating film and manufacturing method thereof |
| JP2007075941A (en) * | 2005-09-13 | 2007-03-29 | Ngk Spark Plug Co Ltd | Cutting insert and cutting tool |
| CN101830092A (en) * | 2009-03-13 | 2010-09-15 | 中国科学院福建物质结构研究所 | Method for preparing corrosion-resistant colored decorative film |
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Application publication date: 20120523 |