CN103182804A - Film-coating member and manufacturing method thereof - Google Patents
Film-coating member and manufacturing method thereof Download PDFInfo
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- CN103182804A CN103182804A CN 201110450593 CN201110450593A CN103182804A CN 103182804 A CN103182804 A CN 103182804A CN 201110450593 CN201110450593 CN 201110450593 CN 201110450593 A CN201110450593 A CN 201110450593A CN 103182804 A CN103182804 A CN 103182804A
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Abstract
The invention provides a film-coating member with a quality feeling of vitreous enamel. The film-coating member comprises a substrate, a transparent layer formed on the surface of the substrate, a first color layer formed on the surface of the transparent layer, a first resin layer formed on the surface of the first color layer, a second color layer formed on partial surface of the first resin layer and a second resin layer formed on the surfaces of the second color layer and the first resin layer. The film-coating member has a smooth and glossy surface, a quality feeling like the vitreous enamel and bright colors. Besides, the film-coating member has relatively high strength and is not such fragile as ceramic products. Besides, the invention also provides a manufacturing method of the film-coating member.
Description
Technical field
The present invention relates to a kind of plated film spare and preparation method thereof, relate in particular to a kind of surface and be plated film spare of vitreous enamel texture and preparation method thereof.
Background technology
Vitreous enamel generally is that the base substrate upper surface glazing double sintering at silicate forms, and vitreous enamel makes the smooth exquisiteness of ceramic surface, and is moist as beautiful.Yet ceramic itself has light crisp frangible characteristics, very easily broken the damage.
Existing employing physical gas phase deposition technology (PVD) presents metal-like usually at the various retes of the preparation of metal surface, the PVD rete that difficult preparation has vitreous enamel texture.
Summary of the invention
In view of this, be necessary to provide a kind of surface to present the plated film spare of vitreous enamel texture.
In addition, also be necessary to provide a kind of preparation method of above-mentioned plated film spare.
A kind of plated film spare, it comprises base material, be formed at the hyaline layer of substrate surface, be formed at transparent layer surface first color layers, be formed at the first color layers surface first resin bed, be formed at second color layers of the first resin bed part surface, and second resin bed that is formed at second color layers and first resin layer surface; This hyaline layer is aluminum oxynitride or silicon oxynitride layer, this first color layers and second color layers are carbide, nitride, carbonitride, nitrogen oxide or the oxycarbide of at least a metal in titanium, chromium, zinc and the aluminium, and this first resin bed and second resin bed are transparent resin bed.
A kind of preparation method of plated film spare, it comprises the steps:
Base material is provided;
Surface at this base material forms hyaline layer, and this hyaline layer is aluminum oxynitride or silicon oxynitride layer;
Form first color layers on the surface of this hyaline layer, carbide, nitride, carbonitride, nitrogen oxide or oxycarbide that this first color layers is at least a metal in titanium, chromium, zinc and the aluminium;
Form first resin bed on the surface of this first color layers, this first resin bed is transparent resin bed;
The mode that adopts exposure imaging technology or adhesive tape to cover forms the shielded area on the surface of first resin bed;
Form one second color layers on the surface of first resin bed that is formed with the shielded area, the method that forms second color layers is identical with the method that forms first color layers, and second color layers is carbide, nitride, carbonitride, nitrogen oxide or the oxycarbide of at least a metal in titanium, chromium, zinc and the aluminium;
Remove the adhesive tape on the shielded area or cover printing ink;
Surface and first resin bed in second color layers are not sprayed one second resin bed by the surface that second color covers, and this second resin bed is transparent resin bed.
The present invention forms hyaline layer, first color layers, transparent first resin bed, second color layers and the second transparent resin bed successively on the surface of base material, by this comprehensive function of five layers, not only make the smooth surface, moist of described plated film spare, present the texture as the vitreous enamel; Also can make the surface of plated film spare present pattern effect attractive in appearance.In addition, this plated film spare has higher intensity, and is light crisp frangible unlike ceramic; And the rete adhesion-tight of this plated film spare.
Description of drawings
Fig. 1 is the cutaway view of the plated film spare of a preferred embodiment of the present invention;
Fig. 2 is the schematic top plan view of a preferred embodiment of the present invention vacuum coating equipment.
The main element symbol description
| Plated film spare | 10 |
| |
11 |
| Prime coat | 12 |
| Hyaline layer | 13 |
| First color layers | 14 |
| First resin bed | 15 |
| Second color layers | 16 |
| Second resin bed | 17 |
| |
20 |
| |
21 |
| |
23 |
| |
24 |
| |
25 |
| Vavuum |
30 |
The following specific embodiment will further specify the present invention in conjunction with above-mentioned accompanying drawing.
The specific embodiment
See also Fig. 1, the plated film spare 10 of the present invention's one preferred embodiments comprises base material 11, be formed at the prime coat 12 on base material 11 surfaces, be formed at prime coat 12 surfaces hyaline layer 13, be formed at hyaline layer 13 surfaces first color layers 14, be formed at first color layers, 14 surfaces first resin bed 15, be formed at second color layers 16 of first resin bed, 15 part surfaces and be formed at second color layers 16 and second resin bed 17 on first resin bed, 15 surfaces.
The material of this base material 11 is preferably stainless steel, aluminium alloy or magnesium alloy, but is not limited to above-mentioned material.
This prime coat 12 is silicon layer or aluminium lamination, and its thickness is 50-200nm.Prime coat 12 is in order to improve the adhesion between base material 11 and the hyaline layer 13.
This hyaline layer 13 is aluminum oxynitride or silicon oxynitride layer, and its thickness is 600-800nm.This hyaline layer 13 is for through polishing, and it can improve the glossiness of first color layers 14 that is formed at its surface.
This first color layers 14 is carbide, nitride, carbonitride, nitrogen oxide or the oxycarbide of at least a metal in titanium, chromium, zinc and the aluminium.The color of this first color layers 14 can be colors such as black, silver color, gold, blueness.The thickness of this first color layers 14 is 500-800nm.
This first resin bed 15 is resin bed transparent, Gao Guang, and its main component is polyvinyl resin, and its thickness is 3-5 μ m.
This second color layers 16 forms certain pattern effect, and second color layers 16 can be discontinuous.This second color layers 16 is carbide, nitride, carbonitride, nitrogen oxide or the oxycarbide of at least a metal in titanium, chromium, zinc and the aluminium.The material of this second color layers 16 can be with first color layers 14 identical or different, what its color also can be with first color layers 14 is identical or different.The thickness of this second color layers 16 is 500-800nm.
This second resin bed 17 is formed at the surface of second color layers 16 and the surface that first resin bed 15 is not covered by second color layers 16.The material of this second resin bed 17 is identical with first resin bed 15.The thickness of this second resin bed 17 is 3-5 μ m.This second resin bed 17 not only can be used as outermost protective layer, also has the effect that anti-fingerprint can be played in low surface because of it.
The smooth surface of this plated film spare 10, moist, texture is as vitreous enamel, and is not only bright-colored, and present pattern effect attractive in appearance.In addition, this plated film spare 10 also has higher intensity, and is light crisp frangible unlike ceramic.This plated film spare 10 can be used as the shell of electronic installations such as mobile phone, MP3.
See also Fig. 2, a vacuum coating equipment 20 is provided, this vacuum coating equipment 20 comprises a coating chamber 21 and is connected in a vavuum pump 30 of coating chamber 21 that vavuum pump 30 is in order to vacuumize coating chamber 21.Be provided with pivoted frame (not shown), first target 23 and second target 24 in this coating chamber 21.Pivoted frame drives base material 11 along 25 revolution of circular track, and base material 11 also rotation along track 25 revolution the time.The material of first target 23 can be aluminium or silicon, and the material of second target 24 can be aluminium, zinc, titanium or chromium.
The preparation method of the plated film spare 10 of the present invention's one preferred embodiments, it comprises the steps:
(1) provide base material 11, the material of this base material 11 is preferably stainless steel, aluminium alloy or magnesium alloy, but is not limited to above-mentioned material.
(2) this base material 11 is carried out surface preparation.This surface preparation can comprise conventional carries out that the absolute ethyl alcohol ultrasonic wave cleans and steps such as oven dry to base material 11.
(3) form prime coat 12 on the surface of this base material 11, this prime coat 12 is silicon layer or aluminium lamination.This base material 11 is put on the pivoted frame of vacuum coating equipment 20, closed coating chamber 21, coating chamber 21 is evacuated to 3.0 * 10
-5Torr, the temperature of control base material 11 is 20-200 ℃, open first target 23, the power that first target 23 is set is 5-8Kw, feed the working gas argon gas, the flow of argon gas is 100-300 mark condition ml/min (sccm), and the bias voltage that base material 11 is applied is (100)-(300) V, and the plated film time is 10-30min.The thickness of this prime coat 12 is 50-200nm.
(4) continue to form hyaline layer 13 on the surface of prime coat 12, this hyaline layer 13 is aluminum oxynitride or silicon oxynitride layer.Continue to use first target 23, keep power, the bias voltage of base material 11, the argon flow amount of first target 23 constant, and feed reacting gas oxygen and nitrogen simultaneously in coating chamber 21, the flow of oxygen is 50-200sccm, the flow of nitrogen is 80-300sccm, and the plated film time is 15-35min.The thickness of this hyaline layer 13 is 600-800nm.
(5) close first target 23, close gas, vacuum breaker takes out sample, has the base material 11 of prime coat 12 and hyaline layer 13 to carry out steps such as polishing, ultrasonic wave cleaning, oven dry to coating surface.Hyaline layer after the polishing can improve follow-up plating in the glossiness of 14 layers in first color on its surface.
(6) surface of the hyaline layer 13 of continuation after polishing forms first color layers 14, and this first color layers 14 can be carbide, nitride, carbonitride, nitrogen oxide or the oxycarbide of at least a metal in titanium, chromium, zinc and the aluminium.The color of this first color layers 14 can be colors such as black, silver color, gold, blueness.This base material 11 is put on the pivoted frame of vacuum coating equipment 20, closed coating chamber 21, coating chamber 21 is evacuated to 3.0 * 10
-5Torr, the temperature of control base material 11 is 20-200 ℃, open second target 24, the power that second target 24 is set is 8-10Kw, feeds the working gas argon gas, the flow of argon gas is 100-300sccm, feed reacting gas, reacting gas can be one or more in acetylene, nitrogen and the oxygen, and flow rate of reactive gas can be adjusted according to the needs of color, the bias voltage that base material 11 is applied is (100)-(300) V, and the plated film time is 30-45min.The thickness of this first color layers 14 is 500-800nm.
(7) close first target 23, close gas, vacuum breaker takes out sample, sprays first resin bed 15 on the surface of first color layers 14.This first resin bed 15 is the polyvinyl resin layer, and its thickness is 3-5 μ m.
(8) mode that adopts exposure imaging technology or adhesive tape to cover forms the shielded area on the surface of first resin bed 15.
(9) form second color layers 16 on the surface of first resin bed 15 that is formed with the shielded area, method ginseng above-mentioned steps (6).This second color layers 16 is carbide, nitride, carbonitride, nitrogen oxide or the oxycarbide of at least a metal in titanium, chromium, zinc and the aluminium.The material of this second color layers 16 can be with first color layers 14 identical or different.Because in the process of sputter second color layers 16, sputtering particle can bombard to first resin bed 15 and make it softening, so after intact second color layers 16 of sputter, product needs to place some hours in air, so that first resin bed 15 solidifies.
(10) remove the adhesive tape on the shielded area or cover printing ink.
(11) utilize laser-engraving technique that the second unnecessary color layers 16 is removed, with the meticulous LOGO pattern of further formation.Can not guarantee precision owing to cover in the step (8), so need to adopt laser-engraving technique to guarantee the precision of LOGO pattern.
(12) spray one second resin bed 17 with reference to step (7) on the surface of first resin bed 15 and second color layers 16.The material of this second resin bed 17 is identical with first resin bed 15.
The present invention forms the hyaline layer 13, first color layers 14 of polishing, transparent first resin bed 15, second color layers 16 and the second transparent resin bed 17 successively on the surface of base material 11, by this comprehensive function of five layers, not only make the smooth surface, moist of described plated film spare 10, present the texture as the vitreous enamel; Also can make the surface of plated film spare 10 present pattern effect attractive in appearance.In addition, this plated film spare 10 has higher intensity, and is light crisp frangible unlike ceramic; And the rete adhesion-tight of this plated film spare 10.
Come the present invention is specifically described below by embodiment.
Embodiment 1
The employed vacuum coating equipment 20 of present embodiment is the medium frequency magnetron sputtering coating machine.
The material of the employed base material 11 of present embodiment is aluminium alloy.
Sputter prime coat 12: use the aluminium target, the power of aluminium target is 8kw, and argon flow amount is 200sccm, and the bias voltage of base material 11 is-100V, base material 11 temperature be 100 ℃, the plated film time is 10min; This prime coat 12 is aluminium lamination, and its thickness is 65nm.
Sputter hyaline layer 13: continue to use the aluminium target, keep power, the argon flow amount of aluminium target, the bias voltage that puts on base material, base material 11 temperature-resistant, feed reacting gas oxygen and nitrogen, the flow of oxygen is 50sccm, the flow of nitrogen is 80sccm, and the plated film time is 35min; This hyaline layer 13 is the aluminum oxynitride layer, and its thickness is 600nm.
Close the aluminium target, close gas, vacuum breaker takes out sample, has the base material 11 of hyaline layer 13 to carry out hand throwing processing to coating surface and makes hyaline layer 13 surfaces become bright, carry out steps such as ultrasonic wave cleaning, oven dry then.
Sputter first color layers 14: use the titanium target, the power of titanium target is 10kw, and argon flow amount is 300sccm, the bias voltage of base material 11 is-100V, base material 11 temperature be 100 ℃, feed reacting gas nitrogen, the flow of reacting gas nitrogen is 100sccm, and the plated film time is 30min; This first color layers 14 is titanium nitride layer, and its thickness is 750nm.
Spray first resin bed 15: the spraying polyethylene resin is in first color layers, 14 surfaces, and the thickness of first resin bed 15 is 3 μ m.
Adopt the exposure imaging technology, form on the surface of first resin bed 15 and cover ink area.
Sputter second color layers 16: the step of method ginseng sputter first color layers 14, the plated film time is 30min; This second color layers 16 also is titanium nitride layer, and its thickness is 750nm.
Printing ink is covered in removal, and utilizes laser-engraving technique that unnecessary second color layers, 16 carvings are fallen, with the meticulous LOGO pattern of further formation.
Spray second resin bed 17: the step of method ginseng spraying first resin bed 15, the thickness of this second resin bed 17 is 3 μ m.The material of this second resin bed 17 is identical with first resin bed 15.
Embodiment 2
The employed vacuum coating equipment 20 of present embodiment is the medium frequency magnetron sputtering coating machine.
The material of the employed base material 11 of present embodiment is stainless steel.
Sputter prime coat 12: use silicon target, the power of silicon target is 5kw, and argon flow amount is 200sccm, and the bias voltage of base material 11 is-100V, base material 11 temperature be 100 ℃, the plated film time is 25min; This prime coat 12 is silicon layer, and its thickness is 80nm.
Sputter hyaline layer 13: continue to use silicon target, keep power, the argon flow amount of silicon target, the bias voltage that puts on base material, base material 11 temperature-resistant, feed reacting gas oxygen and nitrogen, the flow of oxygen is 50sccm, the flow of nitrogen is 80sccm, and the plated film time is 35min; This hyaline layer 13 is silicon oxynitride layer, and its thickness is 600nm.
Close silicon target, close gas, vacuum breaker takes out sample, has the base material 11 of prime coat 12 and hyaline layer 13 to carry out hand throwing processing to coating surface and makes hyaline layer 13 surfaces become bright, carry out steps such as ultrasonic wave cleaning, oven dry then.
Sputter first color layers 14: use the chromium target, the power of chromium target is 10kw, and argon flow amount is 300sccm, the bias voltage of base material 11 is-100V, base material 11 temperature be 100 ℃, feed reacting gas nitrogen, the flow of reacting gas nitrogen is 100sccm, and the plated film time is 30min; This first color layers 14 is chromium nitride layer, and its thickness is 750nm.
Spray first resin bed 15: the spraying polyethylene resin is in first color layers, 14 surfaces, and the thickness of first resin bed 15 is 3 μ m.
Adopt adhesive tape to cover method, form the masking tape district on the surface of first resin bed 15.
Sputter second color layers 16: the step of method ginseng sputter first color layers 14, the plated film time is 30min; This second color layers 16 is chromium nitride layer, and its thickness is 750nm.
Remove masking tape, and utilize laser-engraving technique that unnecessary second color layers, 16 carvings are fallen, with the meticulous LOGO pattern of further formation.
Spray second resin bed 17: the step of method ginseng spraying first resin bed 15, the thickness of this second resin bed 17 is 3 μ m.The material of this second resin bed 17 is identical with first resin bed 15.
The present invention forms the hyaline layer 13, first color layers 14 of polishing, transparent first resin bed 15, second color layers 16 and the second transparent resin bed 17 successively on the surface of base material 11, by this comprehensive function of five layers, not only make the smooth surface, moist of described plated film spare 10, present the texture as the vitreous enamel; Also can make the surface of plated film spare 10 present pattern effect attractive in appearance.In addition, this plated film spare 10 has higher intensity, and is light crisp frangible unlike ceramic; And the rete adhesion-tight of this plated film spare 10.
Claims (16)
1. plated film spare, it comprises base material, it is characterized in that: this plated film spare also comprises hyaline layer, first color layers that is formed at transparent layer surface, first resin bed that is formed at the first color layers surface that are formed at substrate surface, is formed at second color layers of the first resin bed part surface, and second resin bed that is formed at second color layers and first resin layer surface; This hyaline layer is aluminum oxynitride or silicon oxynitride layer, this first color layers and second color layers are carbide, nitride, carbonitride, nitrogen oxide or the oxycarbide of at least a metal in titanium, chromium, zinc and the aluminium, and this first resin bed and second resin bed are transparent resin bed.
2. plated film spare as claimed in claim 1 is characterized in that: this first resin bed and second resin bed are the polyvinyl resin layer.
3. plated film spare as claimed in claim 1 is characterized in that: this hyaline layer is for through polishing, and the thickness of this hyaline layer is 600-800nm.
4. plated film spare as claimed in claim 1 is characterized in that: the thickness of this first color layers is 500-800nm.
5. plated film spare as claimed in claim 1 is characterized in that: the thickness of this first resin bed is 3-5 μ m.
6. plated film spare as claimed in claim 1 is characterized in that: the thickness of second color layers is 500-800nm.
7. plated film spare as claimed in claim 1 is characterized in that: the thickness of second resin bed is 3-5 μ m.
8. plated film spare as claimed in claim 1 is characterized in that: the material of this base material is stainless steel, aluminium alloy or magnesium alloy.
9. plated film spare as claimed in claim 1 is characterized in that: this plated film spare also comprises the prime coat that is formed between base material and the hyaline layer.
10. plated film spare as claimed in claim 9 is characterized in that: this prime coat is silicon layer or aluminium lamination, and the thickness of prime coat is 50-200nm.
11. the preparation method of a plated film spare, it comprises the steps:
Base material is provided;
Surface at this base material forms hyaline layer, and this hyaline layer is aluminum oxynitride or silicon oxynitride layer;
Form first color layers on the surface of this hyaline layer, carbide, nitride, carbonitride, nitrogen oxide or oxycarbide that this first color layers is at least a metal in titanium, chromium, zinc and the aluminium;
Form first resin bed on the surface of this first color layers, this first resin bed is transparent resin bed;
The mode that adopts exposure imaging technology or adhesive tape to cover forms the shielded area on the surface of first resin bed;
Form one second color layers on the surface of first resin bed that is formed with the shielded area, the method that forms second color layers is identical with the method that forms first color layers, and second color layers is carbide, nitride, carbonitride, nitrogen oxide or the oxycarbide of at least a metal in titanium, chromium, zinc and the aluminium;
Remove the adhesive tape on the shielded area or cover printing ink;
Surface and first resin bed in second color layers are not sprayed one second resin bed by the surface that second color covers, and this second resin bed is transparent resin bed.
12. the preparation method of plated film spare as claimed in claim 11, it is characterized in that: the method that forms described hyaline layer is: adopt magnetron sputtering method, use aluminium target or silicon target, the temperature of control base material is 20-200 ℃, the power that aluminium target or silicon target are set is 5-8Kw, be working gas with the argon gas, the flow of argon gas is 100-300sccm, be reacting gas with oxygen and nitrogen, the flow of oxygen is 50-200sccm, the flow of nitrogen is 80-300sccm, and the bias voltage that base material is applied is (100)-(300) V, and the plated film time is 15-35min; The rete that sputter is formed carries out polishing then.
13. the preparation method of plated film spare as claimed in claim 11, it is characterized in that: the method that forms described first color layers and second color layers is: adopt magnetron sputtering method, use second target, second target is aluminium target, zinc target, titanium target or chromium target, the power that second target is set is 8-10Kw, be working gas with the argon gas, the flow of argon gas is 100-300sccm, reacting gas is one or more in acetylene, nitrogen and the oxygen, the bias voltage that base material is applied is (100)-(300) V, and the plated film time is 30-45min.
14. the preparation method of plated film spare as claimed in claim 11 is characterized in that: this method also is included in and forms before the hyaline layer, forms prime coat on the surface of base material, this prime coat be arranged at and hyaline layer between.
15. the preparation method of plated film spare as claimed in claim 14, it is characterized in that: the method that forms described prime coat is: adopt magnetron sputtering method, use aluminium target or silicon target, the temperature of control base material is 20-200 ℃, the power that aluminium target or silicon target are set is 5-8Kw, is working gas with the argon gas, and the flow of argon gas is 100-300sccm, the bias voltage that base material is applied is (100)-(300) V, and the plated film time is 10-30min.
16. the preparation method of plated film spare as claimed in claim 11 is characterized in that: this first resin bed and second resin bed are the polyvinyl resin layer, and all adopt the method for spraying to form.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201110450593 CN103182804A (en) | 2011-12-29 | 2011-12-29 | Film-coating member and manufacturing method thereof |
| TW101100012A TW201326438A (en) | 2011-12-29 | 2012-01-02 | Coated article and method for making the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201110450593 CN103182804A (en) | 2011-12-29 | 2011-12-29 | Film-coating member and manufacturing method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103182804A true CN103182804A (en) | 2013-07-03 |
Family
ID=48674372
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201110450593 Pending CN103182804A (en) | 2011-12-29 | 2011-12-29 | Film-coating member and manufacturing method thereof |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN103182804A (en) |
| TW (1) | TW201326438A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109652781A (en) * | 2018-12-17 | 2019-04-19 | 佛山市易晟达科技有限公司 | A kind of cover board |
| CN111587000A (en) * | 2020-05-15 | 2020-08-25 | Oppo广东移动通信有限公司 | Ceramic-like electronic equipment shell, preparation method thereof and electronic equipment |
-
2011
- 2011-12-29 CN CN 201110450593 patent/CN103182804A/en active Pending
-
2012
- 2012-01-02 TW TW101100012A patent/TW201326438A/en unknown
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109652781A (en) * | 2018-12-17 | 2019-04-19 | 佛山市易晟达科技有限公司 | A kind of cover board |
| CN111587000A (en) * | 2020-05-15 | 2020-08-25 | Oppo广东移动通信有限公司 | Ceramic-like electronic equipment shell, preparation method thereof and electronic equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201326438A (en) | 2013-07-01 |
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Application publication date: 20130703 |