CN102345102A - 真空镀膜件及其制备方法 - Google Patents

真空镀膜件及其制备方法 Download PDF

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CN102345102A
CN102345102A CN2010102450620A CN201010245062A CN102345102A CN 102345102 A CN102345102 A CN 102345102A CN 2010102450620 A CN2010102450620 A CN 2010102450620A CN 201010245062 A CN201010245062 A CN 201010245062A CN 102345102 A CN102345102 A CN 102345102A
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matrix
vacuum plating
plating part
color layers
coordinate
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张新倍
陈文荣
蒋焕梧
陈正士
马闯
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Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
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Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
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Priority to CN2010102450620A priority Critical patent/CN102345102A/zh
Priority to US13/010,957 priority patent/US20120034452A1/en
Publication of CN102345102A publication Critical patent/CN102345102A/zh
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C23C14/025—Metallic sublayers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0664—Carbonitrides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

本发明提供一种真空镀膜件。该真空镀膜件包括一基体及一形成于基体上的颜色层。该颜色层为一TiCN层，该颜色层呈现的色度区域于CIE LAB表色***的L*坐标介于36至48之间，a*坐标介于4至5之间，b*坐标介于2至4之间。本发明还提供一种上述真空镀膜件的制备方法。本发明的真空镀膜件呈现出巧克力色。

Description

真空镀膜件及其制备方法
技术领域
本发明涉及一种真空镀膜件及其制备方法，尤其涉及一种呈现巧克力色的真空镀膜件及其制备方法。
背景技术
真空镀膜技术是一个非常环保的成膜技术。以真空镀膜的方式所形成的膜层具有高硬度、高耐磨性、良好的化学稳定性、与基体结合牢固以及亮丽的金属外观等优点，因此真空镀膜在装饰性表面处理领域的应用越来越广。
在装饰性真空镀膜领域中，对所镀膜层的颜色的设计与控制是一个非常关键的技术指标。目前采用真空镀膜技术能够稳定地生产的颜色仅限于金色、银色、黑色、玫瑰红等少数色系，与烤漆、阳极处理等成膜工艺相比，真空镀膜在装饰性表面处理领域的竞争力不强。
发明内容
有鉴于此，本发明提供一种呈现巧克力色的真空镀膜件。
另外，还提供一种上述真空镀膜件的制备方法。
一种真空镀膜件，包括一基体及一形成于基体上的颜色层，该颜色层为一TiCN层，所述颜色层呈现的色度区域于CIE LAB表色***的L*坐标介于36至48之间，a*坐标介于4至5之间，b*坐标介于2至4之间。
一种真空镀膜件的制备方法，包括以下步骤：
提供一基体；
使用一钛靶，通入流量为40～80sccm的氮气及流量为5～20sccm的乙炔气体，通过磁控溅射镀膜方法在基体上形成一颜色层，该颜色层为一TiCN层，其厚度为0.5～3μm，呈现的色度区域于CIE LAB表色***L*坐标介于36至48之间，a*坐标介于4至5之间，b*坐标介于2至4之间。
相较于现有技术，上述真空镀膜件的制备方法，通过对反应气体氮气及乙炔气体的流量控制来改变颜色层的成分，即改变颜色层中氮原子、碳原子与钛原子的比例，从而达到使颜色层呈现出巧克力色的目的。以该方法所制得的真空镀膜件可呈现出具吸引力的巧克力色的金属外观，丰富了真空镀膜层的颜色，极大地提高了产品的外观竞争力。
附图说明
图1为本发明较佳实施例的真空镀膜件的剖视示意图。
主要元件符号说明
真空镀膜件                10
基体                      11
衬底层                    13
颜色层                    15
具体实施方式
本发明的真空镀膜件可以为电子装置外壳，也可以为眼镜边框、钟表外壳、金属卫浴件及建筑用件。
请参阅图1，本发明较佳实施例的真空镀膜件10包括一基体11、一衬底层13及一颜色层15。衬底层13直接与基体11结合，颜色层15形成于衬底层13的表面。
基体11的材质为铝合金、镁合金或不锈钢，优选为不锈钢。
衬底层13形成于基体11与颜色层15之间，以增强颜色层15于基体11上的附着力。衬底层13可为一钛层或其它可提供附着效果的涂层。衬底层13的厚度大约为0.05～0.2μm，优选厚度为0.1μm。衬底层13的颜色以不影响颜色层颜色的色调为佳，比如可为银色、白色及灰白色等浅色调。
颜色层15为一碳氮化钛(TiCN)层。所述颜色层15呈现的色度区域于CIE LAB表色***的L*坐标介于36至48之间，a*坐标介于4至5之间，b*坐标介于2至4之间，呈现出巧克力色。颜色层15的厚度大约为0.5～3μm，优选厚度为1μm。
上述真空镀膜件10的制备方法主要包括如下步骤：
提供一基体11，将基体11放入盛装有乙醇及/或丙酮溶液的超声波清洗器中进行震动清洗，以除去基体11表面的杂质和油污。清洗完毕后烘干备用。基体11的材质为铝合金、镁合金或不锈钢，优选为不锈钢。
对基体11的表面进行氩气等离子清洗，进一步去除基体11表面的油污，以改善基体11表面与后续涂层的结合力。对基体11的表面进行氩气等离子清洗的方法包括如下步骤：将基体11放入一磁控溅射镀膜机的真空室内的工件架上，抽真空至真空度为8.0×10-3Pa，以300～600sccm(标准状态毫升/分钟)的流量向真空室内通入纯度为99.999％的氩气，施加-300～-800V的偏压于基体11，对该基体11表面进行等离子清洗，清洗时间为5～10min。
采用磁控溅射的方式在基体11的表面形成一衬底层13。该衬底层13为一钛层。形成该衬底层13的具体操作方法及工艺参数为：在所述等离子清洗完成后，调节氩气流量至100～200sccm，设置占空比为30～70％，加热该真空室至100～150，并设置工件架的公转转速为2.0～5.0rpm；开启已置于磁控溅射镀膜机中的钛靶的电源，设定功率为8～11kw，并对基体11施加-100～-200V的偏压，沉积衬底层13。沉积该衬底层13的时间为5～15min。
形成该衬底层13后，向真空室内通入40～80sccm的纯度为99.999％的氮气及5～20sccm的纯度为99.8％的乙炔气体，设置占空比为10～100％，并对基体11施加-10～-250V的偏压，对基体11继续镀膜，以在衬底层13上镀覆一颜色层15，该颜色层15为一TiCN层。沉积该颜色层15的时间为10～30min，优选为15min。
所述颜色层15呈现的色度区域于CIE LAB表色***的L*坐标介于36至48之间，a*坐标介于4至5之间，b*坐标介于2至4之间，呈现出巧克力色。
上述真空镀膜件的制备方法，通过对反应气体氮气及乙炔气体流量的控制来改变颜色层15的成分，即改变颜色层15中氮原子、碳原子与钛原子的比例，从而达到使颜色层15呈现出巧克力色的目的。同时，通过选择合适的偏压及钛靶的功率，控制氮原子、碳原子与钛原子的沉积速率，可增强颜色层15的致密性。另外，选择合适的氮气及乙炔气体的流量与偏压，能够保证较高的沉积速率，从而可进一步提高该真空镀膜件10的生产效率。

Claims (10)

1.一种真空镀膜件，包括一基体及一形成于基体上的颜色层，其特征在于：该颜色层为一TiCN层，所述颜色层呈现的色度区域于CIE LAB表色***的L*坐标介于36至48之间，a*坐标介于4至5之间，b*坐标介于2至4之间。
2.如权利要求1所述的真空镀膜件，其特征在于：所述颜色层的厚度为0.5～3μm。
3.如权利要求1所述的真空镀膜件，其特征在于：该真空镀膜件还包括一形成于基体与颜色层之间的衬底层，该衬底层为一钛层。
4.如权利要求3所述的真空镀膜件，其特征在于：该衬底层的厚度为0.05～0.2μm。
5.如权利要求1所述的真空镀膜件，其特征在于：该基体的材质为不锈钢、铝合金、或镁合金。
6.一种真空镀膜件的制备方法，包括以下步骤：
提供一基体；
使用一钛靶，通入流量为40～80sccm的氮气及流量为5～20sccm的乙炔气体，通过磁控溅射镀膜方法在基体上形成一颜色层，该颜色层为一TiCN层，其厚度为0.5～3μm，呈现的色度区域于CIE LAB表色***L*坐标介于36至48之间，a*坐标介于4至5之间，b*坐标介于2至4之间。
7.如权利要求6所述的真空镀膜件的制备方法，其特征在于：形成该颜色层时，对基体施加-10～-250V的偏压。
8.如权利要求7所述的真空镀膜件的制备方法，其特征在于：该颜色层的沉积时间为10～30min。
9.如权利要求6所述的真空镀膜件的制备方法，其特征在于：该真空镀膜件的制备方法还包括在形成颜色层前在基体上磁控溅射一钛衬底层的步骤。
10.如权利要求9所述的真空镀膜件的制备方法，其特征在于：形成该钛衬底层的工艺参数为：以钛靶为靶材，钛靶的功率为8～11kw，氩气的流量为100～200sccm，占空比为30～70％，溅射温度为100～150，公转转速为2.0～5.0rpm，对基体施加的偏压为-150～-200V，沉积时间为5～15min。
CN2010102450620A 2010-08-04 2010-08-04 真空镀膜件及其制备方法 Pending CN102345102A (zh)

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Application publication date: 20120208