CN102149844A - 涂覆体系、涂覆的工件及其生产方法 - Google Patents
涂覆体系、涂覆的工件及其生产方法 Download PDFInfo
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Abstract
涂覆体系包括:至少一个A型层,A型层基本由(AlyCr1-y)X组成,其中X描绘由N、CN、BN、NO、CNO、CBN、BNO和CNBO组成的群组中的一种,y描述金属相部分的化学计量组成;和至少一个B型层,B型层基本由(AluCr1-u-v-wSivMew)X组成,其中X描绘由N、CN、BN、NO、CNO、CBN、BNO或CNBO组成的群组中的一种,且其中Me描绘由W、Nb、Mo和Ta组成的群组中的一种或所述群组中两种或更多种组分的混合物,u、v和w描述金属相部分的化学计量组成。所述A型层与所述B型层的厚度比高于1。所述工件包括所述涂覆体系。通过此,提供优良的磨损防护,且可将所述涂覆体系和工件用于大量不同应用中。在PVD方法中使用两种类型的靶可非常有效地沉积涂覆体系,其中在沉积A型层期间和在沉积B型层期间一种类型的靶是活性的。
Description
技术领域
本发明涉及涂覆的工件及其生产领域。更详细地讲,本发明涉及通过磨损防护涂层防护工件以免磨损及所述涂层的沉积。
发明背景
TiAlN涂层广泛用作磨损防护应用的物理气相沉积(physical vapor deposition,PVD)涂层。据报道AlCrN体系展示诸如硬度和热硬度的优异机械性质、引起涂覆部件的优异应用寿命的热和摩擦学性质。如本领域中通常所了解,没有明确标出化学计量系数,例如,AlCrN更确切地代表(AlyCr1-y)N(0<y<1)。
US 7 226 670公开了涂覆有包括至少一种由(AlyCr1-y)X构成的膜的膜层体系的工件,其中X=N、C、B、CN、BN、CBN、NO、CO、BO、CNO、BNO或BNCO,所述工件为铣削工具、滚刀、球头铣刀、平面或异型刀具、清洁工具、铰刀、用于车削和铣削的刀片、冲模或注模,其显示出优异的磨损防护性能。
US 7 348 074公开了由具有10层封装(packet)的多层结构组成的涂覆原理。这些原理在钻孔应用中显示出优良防护性能。
美国专利申请US 2008/0229891公开了多层涂层,其包括包含物质(TiAl)X(其中X=N、CN、CNO或NO)或(AlCr)X(其中X=N、CN、CNO或NO)的至少一个层A,且包括具有(AlCrSiMe)X的至少一个层B,其中X=N、CN、CNO或NO,其中Me代表Nb、Mo、Ta或W。
此外,所述US 2008/0229891公开了设计成由至少两个不同结晶相组成的所述至少一个层B的层结构。这例如可为立方和六方相部分。
在所述US 2008/0229891中,进一步公开了层A和层B之间的厚度比是一个重要问题,在此意义上层A与层B的厚度比超过1似乎展示出低劣性能。
所有这些现有技术涂层对于或多或少的具体应用显示出优良磨损防护性能。因此,仍然需要提供用于大量不同应用的磨损防护涂层。
发明概述
因此,本发明的一个目的是形成没有上述缺点的涂覆体系。具体地说,将提供可用于大量不同应用的涂覆体系。另外,将提供相应涂覆的工件和生产所述工件的相应方法。
本发明的另一目的是提供涂覆体系、相应涂覆的工件和生产提供改善的磨损防护和/或耐磨性质的所述工件的方法。
本发明的另一目的是提供用于涂覆工件的涂覆体系、相应涂覆的工件和生产所述工件的方法,所述工件提供用于非常广泛的应用的寿命增加的工具。其中,所述应用可包括连续和间歇切削应用,包括但不限于钻凿、铣削、铰削、车削、打孔、螺纹攻丝和滚刀应用。
本发明的另一目的是提供用于涂覆工件的涂覆体系、相应涂覆的工件和生产所述工件的方法,其中所述工件为用于机械加工部件的工件,所述部件可由诸如铁质和非铁金属以及复合材料的各种材料制成。
本发明的另一目的是提供用于涂覆工件的涂覆体系、相应涂覆的工件和生产所述工件的方法,其中所述工件可在各种工作条件下使用,诸如干式切削、用乳液和/或液体冷却剂切削、用最少量的润滑油(minimal quantity lubrication,MQL)切削和用气态冷却剂切削。
本发明的另一目的是提供用于涂覆工件的涂覆体系、相应涂覆的工件和生产所述工件的方法,其中所述工件为钻头、端铣刀、刀片或滚刀。
本发明的另一目的是提供用于涂覆工件的涂覆体系、相应涂覆的工件和生产所述工件的方法,其中所述工件底材基本是钢制的,具体地说,由高速钢、硬质合金、立方氮化硼、金属陶瓷或陶瓷材料制成。
本发明的另一目的是提供用于涂覆工件的涂覆体系、相应涂覆的工件和生产所述工件的方法,其中所述工件适用于机械加工以下材料中的至少一种、优选大部分:铁质和非铁材料、优选硬化钢、退火钢、合金钢、低碳钢、不锈钢、钛基合金、镍基合金和复合材料。
本发明的另一目的是提供用于涂覆工件的涂覆体系、相应涂覆的工件和生产所述工件的方法,其中所述涂层将具有优异的机械性质和热性质,特别是硬度、热硬度和抗氧化性。
本发明的另一目的是提供用于涂覆工件的涂覆体系、相应涂覆的工件和生产所述工件的方法,其中所述涂层在低温和高温应用条件下将对工件提供优异的防护。
本发明的另一目的是提供用于生产涂覆工件、尤其是如上所述的工件的方法,其尤其是可时间有效地进行。
本发明的另一目的是提供用于生产涂覆工件、尤其是如上所述的工件的方法,其尤其是可简单地进行。
其它目的从以下描述和实施方案中显现。
这些目的中的至少一个通过本专利权利要求书中的涂覆体系、工件和/或方法来至少部分地实现。
所述涂覆体系为包括至少一个基本由(AlyCr1-y)X组成的层A的多层涂层,其中X=N、CN、BN、NO、CNO、CBN、BNO或CNBO,且y描述金属相部分的化学计量组成。提出所述多层涂层还包含至少一个基本由(AluCr1-u-v-wSivMew)X组成的层B,其中X=N、CN、BN、NO、CNO、CBN、BNO或CNBO,其中Me=W、Nb、Mo、Ta或其混合物,且其中u、v、w描述金属相部分的化学计量组成。通过此,可提供磨损防护涂覆体系,其可用于大量不同应用。
系数y更确切且根据本领域中约定代表0<y<1的数,并且更确切地说且根据本领域中约定,u为0<u<1的数,v为0<v<1的数,且w为0<w<1的数,其中u+v+w=1。此外,更确切地说且根据本领域中约定,X的化学计量值始终为1,即,如果X包括多于一种化学元素,则这些元素的化学计量系数之和为1,例如,如果X=BNO,X描绘B1-a-bNaOb(且0<a<1且0<b<1)。
在一个实施方案中,实现了层A与层B的厚度比高于1,更优选高于约1.5。通过此,可以实现特别优良的磨损防护。较厚的A型层与较薄的B型层组合产生优良的结果。
在一个可与一个或多个先前阐明的实施方案组合的实施方案中,所述至少一个B型层设计成包含至少两个结晶相,更详细地讲,所述至少一个B型层基本包括正好两个结晶相。
在该实施方案中,所述至少一个B型层的第一结晶相为立方相,所述至少一个B型层的第二结晶相为六方相。
在这种情况下,在一个具体实施方案中,六方相含量小于所述至少一个B型层的层体积的50%,更详细地讲,总共为5%-40%。
在一个可与一个或多个先前阐述的实施方案组合的实施方案中,所述至少一个A型层基本为立方结构。
在一个可与一个或多个先前阐述的实施方案组合的实施方案中,所述至少一个A型层的金属部分的化学计量组成的特点在于0.5<y<0.7。
在一个可与一个或多个先前阐述的实施方案组合的实施方案中,所述至少一个B型层的金属部分的化学计量组成的特征在于0.5<u<0.7、0.01<v<0.15且0.002<w<0.1,更详细地讲w<0.05。
在一个可与一个或多个先前阐述的实施方案组合的实施方案中,B型层直接沉积到A型层上。
在一个可与一个或多个先前阐述的实施方案组合的实施方案中,B型层夹在第一A型层和第二A型层之间。
在一个可与一个或多个先前阐述的实施方案组合的实施方案中,A型层和B型层形成段,所述涂覆体系为具有多个所述段的涂覆体系。
在一个可与一个或多个先前阐述的实施方案组合的实施方案中,所述涂覆体系包括另外层,尤其是所述其它层形成功能层。例如,所述其它层为粘附层,更详细地讲直接沉积到底材上,尤其是直接在第一A型层之下,或者,例如所述其它层为顶层,即,所述层作为最后层沉积,尤其为装饰性顶层。
本发明的工件包括本发明的涂覆体系。所述工件以类似方式受益于所述涂覆体系的优势。
在一个实施方案(其实际上是各种可能的实施方案的列举)中,所述工件为由以下各工件组成的群组中的至少一种:工具、机械加工工具、铣削工具、切削工具、车削工具、钻孔工具、螺纹攻丝工具、铰刀、端铣刀、钻头、切削刀片、齿轮切削工具、刀片、滚刀、清洁工具、用于车削和铣削的刀片。
在一个可与一个或多个先前阐述的实施方案组合的实施方案(且其实际上是各种可能的实施方案的列举)中,所述工件具有基本由以下各材料组成的群组中的至少一种制成的主体:铁质金属、非铁金属、复合材料、硬质合金、金属陶瓷、立方氮化硼、陶瓷材料、钢、高速钢。
一方面,本发明包括用于生产涂覆的工件的方法,更详细地讲,PVD(物理气相沉积)方法,其允许不仅在单独的沉积方法中而且在一种沉积方法内合成涂覆体系,更详细地讲,本发明的涂覆体系。
生产涂覆的工件的方法包括以下步骤:
a)在所述工件上沉积至少一个A型层;和
b)在所述工件上沉积至少一个不同于所述A型的B型层;
其中
所述至少一个A型层使用X型的nX靶沉积;和
所述至少一个B型层使用不同于所述X型的Y型的nY靶且同时使用所述X型的nXy靶沉积;
其中nX、nY和nXy为≥1的整数,且至少一个所述X型的所述靶在步骤a)和步骤b)两者期间为活性的。这样的话可实现显著减少的沉积时间。在沉积B型层和沉积A型层二者期间,一种或多种靶可为活性的。在工艺稳定性方面,这也可以是有利的。沉积可在很少时间内进行,沉积步骤可在不破坏真空的情况下在同一真空室中进行。
在一个实施方案中,使得nX≥nXy。
在一个实施方案中,使得nX=nXy。在这种情况下,在沉积所述至少一个A型层期间具有活性的X型的所有靶在沉积所述至少一个B型层期间也为活性的。
在一个可与先前阐述的方法实施方案组合的方法实施方案中,A型层基本由(AlyCr1-y)X组成,其中X描绘由N、CN、BN、NO、CNO、CBN、BNO和CNBO组成的群组中的一种,y描述金属相部分的化学计量组成;且B型层基本由(AluCr1-u-v-wSivMew)X组成,其中X描绘由N、CN、BN、NO、CNO、CBN、BNO或CNBO组成的群组中的一种,且其中Me描绘由W、Nb、Mo和Ta组成的群组中的一种或所述群组中两种或更多种组分的混合物,u、v和w描述金属相部分的化学计量组成。
在一个可与先前阐述的方法实施方案组合的方法实施方案中,所述A型层与所述B型层的厚度比高于1,尤其是高于约1.5。换句话说,进行步骤a)和b)以使得A型层的厚度比B型层的厚度大,尤其大超过约1.5倍。
在一个可与先前阐述的方法实施方案组合的方法实施方案中,所述X型的靶包含Al和Cr,Y型的靶包含Al、Cr、Si且所述Me提供在所述B型层中。
在一个可与先前阐述的方法实施方案组合的方法实施方案中,步骤a)和b)使用物理气相沉积方法、尤其是阴极电弧蒸镀方法进行。
在一个可与先前阐述的方法实施方案组合的方法实施方案中,所述沉积方法的特征在于沉积温度<650℃、优选约500℃或低于约500℃,和/或反应气氛主要包括N和/或总气体压力处于0.5-10Pa、优选>2Pa,和/或偏压为40-200V,和/或其中沉积多层结构中的所述至少一个A型层期间的偏压低于沉积所述至少一个B型层期间的偏压。
本发明包括具有相应涂覆体系的特征的方法和根据本发明的工件,反之亦然。
所述方法的优势对应于相应涂覆体系和工件的优势,反之亦然。
其它实施方案和优势从从属权利要求书和附图中显现。
附图简述
下文中,通过实施例和所包括的附图更加详细地描述本发明。附图显示:
图1为显示根据本发明的一个实施方案的涂层的结构的SEM(扫描电子显微镜法)图像;
图2为分别A型单层和B型单层的XRD(X射线衍射)图;
图3为示例性构造的真空沉积腔室的俯视示意详图;
图4为示例性构造的真空沉积腔室的俯视示意详图;
图5为涂覆体系的层结构;
图6为涂覆体系的层结构;
图7为涂覆体系的层结构;
图8为示例性构造的真空沉积腔室的俯视示意详图;
图9为涂覆体系的层结构,其包括另外的顶层(例如装饰性顶层),其可在如图8中所示构造的真空沉积腔室中沉积。
附图中所用的附图标记及其含义汇总于附图标记列表中。所述实施方案为示例性的且不应限制本发明。
发明详述
在下文中,将更加密切地结合一些应用实施例来说明本发明。
如上所述,本发明的一个可能的目的是提供对于非常广泛的应用显示优良防护耐磨性的涂覆体系(或简言之“涂层”)。为了证实本发明涂层优于现有技术涂层的优越性,我们首先通过描述如何制备涂层来介绍许多现有技术涂层以及许多不同的本发明涂层。
随后,我们将在代表各种应用的高度不同的机械加工条件下论述不同应用实例,所述应用诸如为钻凿或铣削软质、退火或硬质材料,并论述与现有技术涂层相比本发明涂层的性能。
所有以下涂层已使用阴极电弧蒸镀在电弧蒸镀设备中合成。将工件放置到合适电弧蒸镀设备的腔室(真空室)中。在所述涂覆设备中,使用例如表1中所示的靶。
表1指出6种样品(涂层)中的每一种的所用靶的元素组成(原子百分数)和各个沉积层的元素组成。最后,表1显示对于四种不同应用(应用1-应用4)的应用测试结果。
层厚度处于磨损防护涂层的通常厚度范围。涂覆体系的总厚度通常不超过约20μm。
表1
1、2和3号样品是本领域所知的涂层。
1号现有技术涂层描述用如表1所示的组成为70%Al和30%Cr的六个相同AlCr靶沉积的AlCrN单层。所述沉积在纯N2气氛中在3.5Pa的气体压力和-40到-100V的偏压下在500℃下在底材处进行。
2号现有技术涂层与1号实施例不同,其使用四个AlCr靶和两个TiSi靶进行。所述靶的组成见表1。蒸镀在纯N2气氛中在3.5Pa的气体压力和-40V的偏压下在约500℃下在底材处进行。2号现有技术涂层合成为具有AlCrN底层、接着10层封装(AlCrN、TiSiN、AlCrTiSiN)和TiSiN顶层的多层涂层。
3号现有技术涂层使用四个AlCrSiW靶和两个TiAl靶沉积,所述靶的组成在表1中的相应行中提到。首先沉积TiAlN支撑层,接着是AlCrSiWN主层。主层与支撑层之间的厚度关系在1∶2.5范围内。蒸镀在纯N2气氛中在3.5Pa下和调整在-40V到-100V的偏压下在约600℃下在底材处进行。
4、5和6号涂层的沉积在500℃的沉积温度和4Pa的总压力下在氮气氛中使用如表1所示的相应靶组成进行。所有三个涂层包括第一层(也称为“层I”或A型层或层A)和第二层(也称为“层II”或B型层或层B)。
4号涂层为根据本发明的第一实施方案的涂层。在此,对于第一层,使用具有如表1中在X靶列中所示的组成的四个AlCr靶,同时对样品施力-40V到-100V的较低偏压。这可以是恒定的,或者可以变化。对于第二层,使用所述四个AlCr靶和另外组成如表1中Y靶列所示的两个AlCrSiW靶,同时对样品施加-100V到-200V的较高偏压。沉积第二层期间的偏压的绝对值比沉积第一层期间的偏压高至少50V、或优选100V。所得Al浓度以及所选偏压引起第二层中的一部分六方相,因此上文对于本发明的特定实施方案所描述,其中第二层(层B,更确切地说B型层)包括至少两个结晶相(通常立方相和六方相)。
涂层5为根据本发明的第二实施方案的涂层。与4号涂层相比,其具有较高钨含量,而铝含量没有显著降低且仍然远远超过60%(见表1)。
与此形成对比,6号涂层显示60%或更低的铝百分数。没有使用钨,即靶不含钨,见表1。在该构造中,没有得到六方相部分。
表1的最后四列显示不同应用测试的结果。
应用测试1(“应用1”)定义如下:
铣削条件:
工件(待铣削):DIN 1.2344(45HRC)
切削工具:4槽端铣刀,微米颗粒碳化物级
切削速度:120mmin-1
进料速率:0.1毫米/齿
切削径向深度:0.5mm
切削轴向深度:10mm
冷却剂:润滑剂6%乳液
铣削操作:侧铣
单程长度:15m
寿命结束:各单程之后的磨损测量:对于寿命结束的标准:在单程结束时vbmax>120μm
应用测试2(“应用2”)定义如下:
铣削条件:
工件(待铣削):DIN 1.1191(190HB)
切削速度:400mmin-1
进料速率:0.2毫米/齿
切削径向深度:0.5mm
切削轴向深度:10mm
冷却剂:干式切削
铣削操作:侧铣
单程长度:50m
寿命结束:各单程之后的磨损测量:对于寿命结束的标准:在单程结束时vbmax>120μm
应用测试3(“应用3”)定义如下:
铣削条件:
工件(待铣削):DIN GGG50
切削速度:120mmin-1
进料速率:0.25毫米/齿
切削深度:6x直径
冷却剂:内部冷却-润滑剂6%乳液
铣削操作:钻凿
单程长度:200个孔
寿命结束:各单程之后的磨损测量:对于寿命结束的标准:在单程结束时vbmax>250μm
应用测试4(“应用4”)定义如下:
铣削条件:
工件(待铣削):DIN 1.2344(52HRC)
切削速度:147mmin-1
进料速率:0.15毫米/齿
切削径向深度:4mm
切削轴向深度:0.8mm
冷却剂:压缩空气
铣削操作:侧铣
单程长度:15m
寿命结束:各单程之后的磨损测量:对于寿命结束的标准:在单程结束时vbmax>200μm
vbmax表示如本领域中公知的最大容许侧面磨损。
如从表1的最后四列可见,在所有四个应用测试中涂层4和5显示最佳结果和第二佳结果。因此,这些涂层不仅适用于大量应用,而且可沉积在多种工件上。
此外,如从表1中与第一应用测试、第三测试和第四测试有关的列中可见,非现有技术涂层提供比现有技术涂层明显更好的结果。
应注意到,制备4和5号涂层所需的涂覆时间(即270min)显著低于制备2号涂层所需的时间(340min)和制备3号涂层所需的时间(410min),并且完全在1号涂层的涂覆时间(即240min)的范围内。这本质上是由于如对于第二层(层B,在表1中称为层II)同时使用不同靶。在整个沉积过程期间(至少在沉积层I(层A)或层II(层B)的时候)靶X可为活性的,而仅在沉积层II(层B)时活化靶Y(除靶X之外)。
图1显示根据本发明的一个实施方案的涂层的结构的SEM(扫描电子显微镜法)图像。由此可见,图1中涂覆体系的总厚度为约3μm,层A与层B的厚度比为约2。
图2分别显示A型单层和B型单层的XRD(X射线衍射)图。六方相显示具有较低强度但较高平均值的峰,表明六方晶颗粒的较低粒度。
图3显示示例性构造的真空沉积腔室的俯视示意详图。指示了六个靶,两个Y型和四个X型。待涂覆的工件位于由圆形和圆形箭头表示的样品转盘上。六个工件示意性显示为矩形。所述构造适于生产诸如上文论述的4、5或6号涂层的涂层。
以图3的方式,图4显示示例性构造的真空沉积腔室的俯视示意详图。
图5显示涂覆体系的层结构。涂覆体系由沉积在底材(图5中虚线)上的A型层和沉积在所述A型层上的B型层组成,上文论述的4、5和6号涂层(参照表1)的情况也一样。还注意到A层比B层厚。为了沉积A层,活化X型靶,且为了沉积B层,活化所述X型靶和另外Y型靶,同样参照图3和图4。此外,当使用两类型X和Y型靶时,可能还沉积第三类型层,即,C型层,其仅使用一个或多个Y型靶沉积。所述层例如可配置在A层与底材之间,以形成例如粘附层,或者其可沉积到B层之上,以形成顶层,例如装饰性顶层。
图6显示涂覆体系的层结构。在这种情况下,涂覆体系为具有六个层的多层***,所述层由三对层组成,其各自为A型层和B型层;一个A层和一个B层形成一个层段,其重复出现。如图6所示,还可提供,在各层段中,A层的厚度大于B层的厚度。
图7显示涂覆体系的层结构。在这种情况下,在底材上提供三层。一个层B夹在两个层A之间。
以图3和图4的方式,图8显示示例性构造的真空沉积腔室的俯视示意详图。在这种情况下,提供三种类型的靶:X型、Y型、Z型。这允许沉积三种不同类型的层或者甚至四种不同类型的层,而至少部分同时使用两种或所有三种类型的靶。考虑到还单独使用各类型的靶,可能沉积达到七种不同类型的层;且考虑到活化并钝化一个或多个同一类型的靶,可沉积甚至更多不同类型的层。
在一种简单情况下,可使用图8中所示的构造来沉积图9中所示的涂覆体系。
图9显示涂覆体系的层结构,其包括另外的顶层(例如装饰性顶层),其可在如图8中所示构造的真空沉积腔室中沉积。例如,为了沉积层A,仅活化靶X;为了沉积层B,活化靶X和另外靶Y;为了沉积层D,例如仅活化靶Z或者靶Z与一种或两种其它类型靶中的一个或多个靶的一些组合。
Claims (25)
1.涂覆体系,其包括
至少一个A型层,A型层基本由(AlyCr1-y)X组成,其中X描绘由N、CN、BN、NO、CNO、CBN、BNO和CNBO组成的群组中的一种,y描述金属相部分的化学计量组成;
至少一个B型层,B型层基本由(AluCr1-u-v-wSivMew)X组成,其中X描绘由N、CN、BN、NO、CNO、CBN、BNO或CNBO组成的群组中的一种,且其中Me描绘由W、Nb、Mo和Ta组成的群组中的一种或所述群组中两种或更多种组分的混合物,u、v和w描述金属相部分的化学计量组成;
其中所述A型层与所述B型层的厚度比高于1。
2.权利要求1的涂覆体系,其中所述厚度比高于约1.5。
3.权利要求1或2的涂覆体系,所述至少一个B型层包括至少两个结晶相。
4.前述权利要求中任一项的涂覆体系,所述至少一个B型层包括立方相和六方相。
5.权利要求4的涂覆体系,所述至少一个B型层中所述六方相的含量小于所述至少一个B型层的50%体积。
6.权利要求4或5的涂覆体系,所述至少一个B型层中所述六方相的含量大于所述至少一个B型层的5%体积且小于所述至少一个B型层的40%体积。
7.前述权利要求中任一项的涂覆体系,所述至少一个A型层基本为立方结构。
8.前述权利要求中任一项的涂覆体系,其中0.5<y<0.7。
9.前述权利要求中任一项的涂覆体系,其中0.5<u<0.7、0.01<v<0.15、0.002<w<0.1,尤其是w<0.05。
10.前述权利要求中任一项的涂覆体系,其中所述至少一个B型层直接沉积到所述至少一个A型层上。
11.前述权利要求中任一项的涂覆体系,其包括夹在第一A型层和第二A型层之间的B型层。
12.前述权利要求中任一项的涂覆体系,其包括多个层段,其中一种所述层段由一个A型层和一个B型层形成。
13.工件,其包括前述权利要求中任一项的涂覆体系。
14.权利要求13的工件,其中所述工件为由以下各物组成的群组中的至少一种:
工具;
机械加工工具;
铣削工具;
切削工具;
车削工具;
钻孔工具;
螺纹攻丝工具;
铰刀;
端铣刀;
钻头;
切削刀片;
齿轮切削工具;
刀片;
滚刀;
清洁工具;
用于车削和铣削的刀片。
15.权利要求13或14的工件,所述工件具有基本由由以下各材料组成的群组中的至少一种制成的主体:
铁质金属;
非铁金属;
复合材料;
硬质合金;
金属陶瓷;
立方氮化硼;
陶瓷材料;
钢;
高速钢。
16.生产涂覆的工件的方法,其包括以下步骤:
a)在所述工件上沉积至少一个A型层;和
b)在所述工件上沉积至少一个不同于所述A型的B型层;
其中
所述至少一个A型层使用X型的nX靶沉积;和
所述至少一个B型层使用不同于所述X型的Y型nY靶且同时使用所述X型的nXy靶沉积;
其中nX、nY和nXy为≥1的整数,且至少一个所述X型的所述靶在步骤a)和步骤b)两者期间为活性的。
17.权利要求16的方法,其中
A型层基本由(AlyCr1-y)X组成,其中X描绘由N、CN、BN、NO、CNO、CBN、BNO和CNBO组成的群组中的一种,y描述金属相部分的化学计量组成;和
B型层基本由(AluCr1-u-v-wSivMew)X组成,其中X描绘由N、CN、BN、NO、CNO、CBN、BNO或CNBO组成的群组中的一种,且其中Me描绘由W、Nb、Mo和Ta组成的群组中的一种或所述群组中两种或更多种组分的混合物,u、v和w描述金属相部分的化学计量组成。
18.权利要求17的方法,其中所述A型层与所述B型层的厚度比高于1,尤其是高于约1.5。
19.权利要求17或18的方法,其中所述X型的靶包含Al和Cr,Y型的靶包含Al、Cr、Si,且所述Me提供在所述B型层中。
20.权利要求16-19中任一项的方法,其中步骤a)和b)使用物理气相沉积方法、尤其是阴极电弧蒸镀方法进行。
21.权利要求16-20中任一项的方法,其包括在进行步骤a)和b)期间保持所述工件处于低于约650℃、尤其是在约500℃下或低于约500℃的温度。
22.权利要求16-21中任一项的方法,其包括在进行步骤a)和b)期间将所述工件暴露于总气体压力为0.5Pa-10Pa、尤其是>2Pa的反应气氛。
23.权利要求23的方法,所述反应气氛主要包括N。
24.权利要求16-23中任一项的方法,其包括在进行步骤a)和b)期间对所述工件施加40V-200V的偏压。
25.权利要求16-24中任一项的方法,其包括在进行步骤a)期间向所述工件施加偏压且在进行步骤b)期间向所述工件施加较低偏压。
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US20110111193A1 (en) | 2011-05-12 |
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US8491989B2 (en) | 2013-07-23 |
KR20110033248A (ko) | 2011-03-30 |
EP2310549B1 (en) | 2017-12-06 |
TWI450998B (zh) | 2014-09-01 |
RU2011104495A (ru) | 2012-08-20 |
RU2528930C2 (ru) | 2014-09-20 |
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