CN102043288A - Substrate positioning apparatus and method for positioning substrate with the same - Google Patents
Substrate positioning apparatus and method for positioning substrate with the same Download PDFInfo
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- CN102043288A CN102043288A CN2009102602315A CN200910260231A CN102043288A CN 102043288 A CN102043288 A CN 102043288A CN 2009102602315 A CN2009102602315 A CN 2009102602315A CN 200910260231 A CN200910260231 A CN 200910260231A CN 102043288 A CN102043288 A CN 102043288A
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- liner
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Nonlinear Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Liquid Crystal (AREA)
Abstract
The present invention discloses a substrate positioning apparatus and a method for positioning a substrate with the same. The substrate positioning apparatus comprises a substrate position adjusting unit which is provided on a saddle, wherein the substrate is placed on the saddle. The substrate position adjusting unit moves the substrate or rotates the substrate along a horizontal direction. Therefore, compared with a routine technique of positioning the substrate through wholly moving the saddle, the substrate positioning apparatus can reduce the driving force for positioning the substrate and can position the substrate accurately and easily.
Description
Technical field
The present invention relates to a kind of machine of being used for treatment substrate of being installed in and be placed in the base positioner of the substrate on the saddle and a kind of method of utilizing this base positioner location substrate with the location.
Background technology
Usually, flat-panel monitor (FPD) is to approach and light image display device than televisor with Braun (Braun) pipe or monitor.LCD (LCD), plasma display (PDP), Field Emission Display (FED) and Organic Light Emitting Diode (OLED) are to have developed and the representative instance of the flat-panel monitor that uses.
LCD is the image display device that shows desired image by this way, thereby promptly according to the light transmissive of image information supplies data signals to liquid crystal cells of arranging with matrix shape and control liquid crystal cells.LCD is thin and light and have many other advantages, comprises low-power consumption and low operating voltage, and therefore is widely used.To describe the typical method of making the liquid crystal panel that is used for this type of LCD below in detail.
At first, on upper substrate, form colored filter and common electrode.After this, on the infrabasal plate of upper substrate, forming thin film transistor (TFT) (TFT) and pixel electrode.Subsequently, alignment film is coated to upper substrate and infrabasal plate respectively.After this friction matching film provides pre-dumping angle and aligned orientation with the liquid crystal molecule in being in the liquid crystal layer that will be formed between the alignment film.
After this, by the coating fluid sealant in the substrate at least one form sealant pattern, with keep between the substrate the gap, prevent that liquid crystal from oozing out and hermetic sealing substrate between the space.Subsequently, liquid crystal layer is formed between the substrate, thereby makes liquid crystal panel.
In the technology of making liquid crystal panel, glue spreader is used for forming sealant pattern on substrate.Glue spreader comprises that substrate lays thereon saddle, has fluid sealant through the head unit of the nozzle of its discharge and a supporting member of supporting head unit.
When on substrate, forming sealant pattern, the relative position between glue spreader control basal plate and the nozzle.In other words, when discharge from nozzle fluid sealant to substrate when forming sealant pattern, glue spreader that is to say along the nozzle of vertical direction slip-on head unit along Z-direction, that is to say along horizontal direction moving nozzle and/or substrate with the gap between suitable control nozzle and the substrate and along X-axis and Y direction.
Thus, be placed on the saddle with after forming sealant pattern on the substrate, must carry out operation with respect to the position of cut-out governing substrate at substrate.This operation is carried out by rotary plate or along the horizontal direction moving substrate.
Yet, in routine techniques, must whole rotation or move the saddle of laying substrate on it along horizontal direction, with rotary plate or along the horizontal direction moving substrate.Therefore, the structure that is used for mobile saddle is complicated, and needs big driving force to drive saddle.Especially, make more greatly that at saddle having large-area substrate can be placed under the situation on the saddle, it is obvious that above-mentioned shortcoming becomes.Thus, if be difficult to accurately rotate or move this big saddle, then can not be accurately and easily carry out the location of substrate.
Summary of the invention
Therefore, make the present invention under the situation of the above problem that in considering prior art, has occurred, and an object of the present invention is to provide a kind of can be accurately and easily locate the base positioner of substrate, and a kind of method of utilizing this base positioner location substrate.
On the one hand, the invention provides a kind of base positioner, comprising: saddle, it has one or more through holes; The substrate orientation regulon, it has and the liner rotary unit that is placed in the contacted liner of substrate on the saddle, the liner lift unit that promotes liner and rotation liner; And gas supply unit, it is communicated with the through hole of saddle with supply gas to through hole.
In addition, the substrate orientation regulon also can have the liner mobile unit that moves liner along horizontal direction.
On the other hand, the invention provides a kind of base positioner, comprising: saddle, it has one or more through holes; The substrate position regulon, it has and is placed in the contacted liner of substrate on the saddle, the liner lift unit that promotes liner and the liner mobile unit that moves liner along horizontal direction; And gas supply unit, it is communicated with the through hole of saddle with supply gas to through hole.
The substrate position regulon can comprise a plurality of substrate position regulons that are arranged on the saddle.
The liner mobile unit can comprise: the first liner mobile unit that moves liner along first direction; And the second liner mobile unit that moves liner along second direction perpendicular to first direction.
In addition, can be formed with through hole in the liner, and suction unit can be communicated with air-breathing through this through hole with the through hole of liner.
In addition, base positioner also can comprise and being communicated with the through hole of saddle to discharge the exhaust unit of gas through through hole.
Aspect another, the invention provides a kind of method of utilizing base positioner location substrate, this base positioner comprises: the saddle with one or more through holes; The substrate position regulon, it has and is placed in the contacted liner of substrate on the saddle, the liner lift unit that promotes liner, the liner rotary unit of rotation liner and the liner mobile unit that moves liner along horizontal direction; And gas supply unit, it is communicated with the through hole of saddle with supply gas to through hole, and this method may further comprise the steps: (a) substrate is placed on the saddle; (b) utilize the liner lift unit to promote liner; (c) substrate is attached to the upper surface of liner; (d) in the mode of through hole from the gas supply unit supply gas to saddle from the saddle lifting substrate that makes progress; And the position of (e) regulating substrate in the mode of utilizing liner rotary unit rotation liner or utilize the liner mobile unit to move liner along horizontal direction.
Step (b) can be carried out before at step (a).
In addition, can in liner, form through hole.Suction unit can be communicated with air-breathing through this through hole with the through hole of liner.Step (c) can comprise through the through hole of liner air-breathing in the suction unit to utilize suction substrate to be attached to the step of the upper surface of liner.
In base positioner according to the present invention, can be arranged on the substrate position regulon rotary plate on the saddle or locate substrate by utilization along the horizontal direction moving substrate.Therefore, compare, but the present invention can reduce to locate the structure of required driving force of substrate and simplification device with routine techniques.
Description of drawings
Above-mentioned and other the purpose, feature and advantage of the present invention will be from more being expressly understood below in conjunction with the detailed description of accompanying drawing, in the accompanying drawings:
Fig. 1 shows the planimetric map of saddle of the base positioner of first embodiment of the invention;
Fig. 2 is the sectional view of saddle that has shown the base positioner of Fig. 1;
Fig. 3 is the side view of substrate position regulon that has shown the base positioner of Fig. 1;
Fig. 4 is the planimetric map that has shown the substrate position regulon of Fig. 3;
Fig. 5 is the synoptic diagram of liner that has shown the substrate position regulon of Fig. 3;
Fig. 6 shows the figure of operation of substrate position regulon of the base positioner of Fig. 1;
Fig. 7 shows the planimetric map of the substrate position regulon of base positioner second embodiment of the invention;
Fig. 8 shows the figure of operation of substrate position regulon of the base positioner of Fig. 7;
Fig. 9 shows the side view according to the substrate position regulon of the base positioner of the 3rd embodiment of the present invention;
Figure 10 shows the figure of operation of substrate position regulon of the base positioner of Fig. 9;
Figure 11 shows the side view according to the substrate position regulon of the base positioner of the 4th embodiment of the present invention;
Figure 12 and Figure 13 show the figure of operation of substrate position regulon of the base positioner of Figure 11;
Figure 14 is the planimetric map of saddle that has shown the base positioner of Figure 11; And
Figure 15 and Figure 16 show the figure of operation of substrate position regulon of the base positioner of Figure 14.
Embodiment
Hereinafter, describe preferred implementation with reference to the accompanying drawings in detail according to the apparatus and method of location of the present invention substrate.
＜the first embodiment 〉
The base positioner of first embodiment of the invention is described with reference to Fig. 1 to Fig. 6 below.
As shown in Figures 1 to 4, the base positioner of first embodiment of the invention comprises saddle 10, substrate position regulon 20 and gas supply unit 30.Saddle 10 has one or more through holes 11 therein.Put on saddle 10 the substrate Building S.Substrate position regulon 20 is arranged on the saddle 10 and flatly moves the substrate S that is seated on the saddle 10.Gas supply unit 30 be communicated with the through hole 11 of saddle 10 and supply gas to through hole 11.In addition, base positioner also comprises exhaust unit 40, and it is communicated with the through hole 11 of saddle 10 and to utilize suction substrate S is attached to saddle 10 through through hole 11 discharge gases.
As shown in Figure 1, at least one substrate position regulon 20 is arranged on the saddle 10.As shown in Figure 3 and Figure 4, substrate position regulon 20 comprises and the contacted liner 21 of substrate S, the liner lift unit 22 that promotes liner 21 and the liner mobile unit 23 that moves horizontally liner 21.
As shown in Figure 5, one or more through holes 211 are formed in the liner 21.Suction unit 50 is communicated with air-breathing from through hole 211 with through hole 211.In having the substrate position regulon 20 of said structure, air-breathing by the operation of suction unit 50 from through hole 211, make substrate S can be attached to the upper surface of liner 21 reliably by suction.Here, through hole 211 crooked pre-determined numbers make them have the corresponding area of area with the upper surface of liner 21.
As shown in Figure 3, liner lift unit 22 comprises cylinder 221 and actuator lever 222.Cylinder 221 is by hydraulic pressure or atmospheric pressure operation.Actuator lever 222 is connected to liner 21 with cylinder 221.Liner lift unit 22 according to the present invention is not limited to the structure that comprises cylinder 221 and actuator lever 222, and various structures are as making ball-screw be connected to the structure of rotation motor, or the structure of employing linear motor, can be applicable to liner lift unit 22, as long as it can upwards promote liner 21.Liner lift unit 22 is used for promoting liner 21 and makes that substrate S contacts with the upper surface of liner 21 when regulating the position of substrate S.When the position adjustments of substrate S had been finished, liner lift unit 22 moves down liner 21 made liner 21 move away from substrate S.
As shown in Figure 3 and Figure 4, liner mobile unit 23 comprises thereon support unit 231 of the lower end of liner lift unit 22 supporting, is connected to the ball-screw 232 of support unit 231 and the rotation motor 233 of swing roller leading screw 232.In having the liner mobile unit 23 of above structure, rotatablely moving of rotation motor 233 converts linear movement to by ball-screw 232.Thereby the support unit 231 that is connected to ball-screw 232 is linear mobile.In addition, liner lift unit 22 is linear mobile by the linear movement of support unit 231.As a result, liner 21 linear moving.Simultaneously, in first embodiment of the present invention, adopt rotation motor 233 and ball-screw 232 so that the structure of linear mobile liner mobile unit 23 although liner mobile unit 23 has been shown as to have, the present invention is not limited thereto.In other words, liner mobile unit 23 can have various structures, for example, adopts linear motor or passes through hydraulic pressure or the structure of the cylinder of atmospheric pressure operation, as long as it can linear mobile liner lift unit 22.In addition, in the base positioner of first embodiment, although liner 21 has been shown as linear the moving of mode of moving liner lift unit 22 with liner mobile unit 23, but structure that the present invention is not limited thereto, for example, it can be configured such that liner mobile unit 23 is directly connected to liner 21 with direct mobile liner 21.
As shown in Figure 2, gas supply unit 30 comprises steam supply valve 31 and positive pressure source 32.Steam supply valve 31 is connected to the flow channel 12 that is communicated with the through hole 11 of saddle 10.Positive pressure source 32 is connected to steam supply valve 31.In order to regulate the operation of substrate S position, gas supply unit 30 through flow channel 12 and through hole 11 between saddle 10 and substrate S supply gas and therefore with substrate S from the lifting that makes progress of the upper surface of saddle 10.Then, the friction between the upper surface of substrate S and saddle 10 is eliminated from the upper surface of the saddle 10 lifting substrate S that makes progress by utilizing gas supply unit 30.Therefore, can easily regulate the operation of substrate S position.In addition, can prevent that substrate S from damaging.
Simultaneously, as shown in Figure 2, the base positioner of first embodiment of the invention also comprises exhaust unit 40.Exhaust unit 40 comprises vent valve 41 and negative pressure source 42.Vent valve 41 is connected to the flow channel 12 that is communicated with the through hole 11 of saddle 10.Negative pressure source 42 is connected to vent valve 41.Effect with exhaust unit 40 of above structure is through through hole 11 and flow channel 12 gas to be discharged to the outside from the space between saddle 10 and the substrate S, makes to have finished metacoxal plate S is attached to saddle 10 by suction upper surface in the operation of the position of regulating substrate S.Thus, the suction that can utilize exhaust unit 40 to transmit is attached to substrate S the upper surface of saddle 10 reliably.
The suction unit 50 that is used to utilize suction that substrate S is attached to liner 21 can be connected to the negative pressure source 42 of the exhaust unit 40 of the upper surface that utilizes suction substrate S to be attached to saddle 10.
The operation of the base positioner of first embodiment of the invention is described with reference to Fig. 6 hereinafter.
When substrate S was placed on the saddle 10, whether pick-up unit that contiguous saddle 10 is provided with such as camera or position transducer measurement substrate S were arranged in the tram on the saddle 10.If substrate S is arranged in the tram on the saddle 10, the operation of the treatment substrate S that then is scheduled to.Yet,, regulate the operation of substrate S if substrate S is not arranged in the tram on the saddle 10.
In order to regulate the position of substrate S, at first, by the move up liner 21 of substrate position regulon 20 of liner lift unit 22.Thereby the upper surface of liner 21 contacts with substrate S.Preferably, before substrate S is placed on the saddle 10, can be in advance the liner 21 of substrate position regulon 20 be arranged in the upwards position that it will move to this position.In the case, when substrate S was placed on the saddle 10, the upper surface of liner 21 can directly contact with substrate S.
Simultaneously, be provided with in the present invention under the situation of suction unit 50, can through the through hole 211 of liner 21 gas be drawn to the outside from the space between substrate S and the liner 21 by the operation of suction unit 50.Therefore, substrate S can be attached to the upper surface of liner 21 by suction.
In addition, in above operation or subsequently, gas supply unit 30 is by flow channel 12 and through hole 11 supply gas between substrate S and saddle 10.Therefore, substrate S rises from saddle 10.
After this, as shown in Figure 6, move liner 21 along horizontal direction by the operation of liner mobile unit 23.Therefore, the substrate S that is attached to liner 21 also moves along horizontal direction.
If by finishing the adjusting of the position of substrate S along horizontal direction moving substrate S, then the operation of gas supply unit 30 and suction unit 50 stops, and exhaust unit 40 is operated simultaneously or subsequently.Therefore, the gas between saddle 10 and the substrate S is expelled to the outside through through hole 11 and flow channel 12, makes substrate S be attached to the upper surface of saddle 10 by suction.
As mentioned above, in the base positioner of first embodiment of the invention, can move horizontally the position that substrate S regulates substrate S by the substrate position regulon 20 that utilization is arranged on the saddle 10.Therefore, move the routine techniques of locating substrate with saddle integral body wherein and compare, but the present invention can reduce to locate the structure of required driving force of substrate S and simplification device.
＜the second embodiment 〉
Hereinafter, with reference to Fig. 7 and Fig. 8 detailed description base positioner second embodiment of the invention.In the description of following second embodiment, identical reference number will be used for representing and the corresponding member of the member of first embodiment, and will omit further instruction.
As shown in Figure 7, in base positioner second embodiment of the invention, the liner mobile unit 23 of substrate position regulon 20 comprises the first liner mobile unit 234 that moves liner 21 along first direction A, and the second liner mobile unit 235 that moves liner 21 along the second direction B perpendicular to first direction A.Adopt the mode identical with first embodiment, the first liner mobile unit 234 and the second liner mobile unit 235 comprise separately the lower end of supporting liner lift unit 22 support unit 231, be connected to the ball-screw 232 of support unit 231 and the rotation motor 2332 of swing roller leading screw 232.Liner mobile unit 23 can have various structures and can comprise linear motor for example or the cylinder by hydraulic pressure or atmospheric pressure operation, as long as it can linear mobile liner lift unit 22.
In having second embodiment of said structure, when the operation of the position of regulating substrate S behind the lifting substrate S that makes progress at upper surface from saddle 10, as shown in Figure 8, the substrate S that has been attached to the upper surface of liner 21 can move along the operation of first direction A by the first liner mobile unit 234, and it can pass through the second liner mobile unit 235 and moves along the operation perpendicular to the second direction B of first direction A.
As mentioned above, in base positioner second embodiment of the invention, liner 21 can move along first direction with perpendicular to the second direction of first direction.Therefore, can easily regulate the operation of the position of substrate S.
＜the three embodiment 〉
Hereinafter, describe base positioner in detail with reference to Fig. 9 and Figure 10 according to the 3rd embodiment of the present invention.In the description of following the 3rd embodiment, identical reference number will be used for representing and the corresponding member of the member of first or second embodiment, and will omit further instruction.
As shown in Figure 9, in the base positioner according to the 3rd embodiment of the present invention, substrate position regulon 20 comprises liner lift unit that with the contacted liner 21 of substrate S, upwards promotes liner 21 and the liner rotary unit 24 that rotates liner 21.
In having the 3rd embodiment of said structure, when the operation of the position of regulating substrate S behind the lifting substrate S that makes progress at upper surface from saddle 10, as shown in figure 10, can rotate the substrate S of the upper surface that is attached to liner 21 by the operation of liner rotary unit 24.
As mentioned above, in base positioner according to the 3rd embodiment of the present invention, owing to liner 21 can be rotated by liner rotary unit 24, in other words, because substrate S is rotatable, so can easily regulate the position of substrate S.
＜the four embodiment 〉
Hereinafter, with reference to the base positioner of Figure 11 to Figure 16 detailed description according to the 4th embodiment of the present invention.In the description of following the 4th embodiment, identical reference number will be used for representing the corresponding member of member with first, second or the 3rd embodiment, and will omit further instruction.
As shown in figure 11, in the base positioner according to the 4th embodiment of the present invention, substrate position regulon 20 comprises the liner lift unit 22 that with the contacted liner 21 of substrate S, upwards promotes liner 21, moves the liner mobile unit 23 of liner 21 and the liner rotary unit 24 of rotation liner 21 along horizontal direction.
In having the 4th embodiment of said structure, when the operation of the position of regulating substrate S, as shown in figure 12, can be by moving the substrate S that liner mobile unit 23 moves the upper surface that has been attached to liner 21 along horizontal direction, and it can be by operation rotation of liner rotary unit 24.Therefore, can accurately regulate the position of substrate S.
In addition, liner mobile unit 23 can comprise the first liner mobile unit 234 that moves liner 21 along first direction A, and moving the second liner mobile unit 235 of liner 21 along second direction B perpendicular to first direction A, the mode that moves is identical with the mode of above-mentioned second embodiment.In the case, when the operation of the position of regulating substrate S, as shown in figure 12, substrate S is not only rotatable, and can move along first direction A with perpendicular to the second direction B of first direction A.Therefore, can regulate the position of substrate S more accurately.
Simultaneously, as shown in figure 14, can comprise a plurality of substrate position regulons 20 away from the center arrangement of saddle 10 according to the base positioner of the 4th embodiment of the present invention.
In this structure, as shown in figure 15, can by along the liner 21 of first direction A or second direction B moving substrate position regulating unit 20 along first direction A or second direction B moving substrate S.Thus, under the situation that several substrate position regulons 20 are set, owing to substrate S is supported on a plurality of bearing positions, so can carry out the position adjustments of substrate S more reposefully.
Simultaneously, as shown in figure 16, a pair of substrate position regulon 20 can be arranged on the saddle 10.Here, one of two substrate position regulons 20 be configured such that its liner 21 along first or second direction move horizontally.Remaining one of two substrate position regulons 20 is configured such that its liner 21 rotations are with rotary plate S.In the case, the liner 21 that is rotated the substrate position regulon 20 of motion can rotate by the operation of rotation motor 241, perhaps alternately, though its under static state also can by along first or the moving of liner 21 of the substrate position regulon 20 that moves of second direction rotate.
As mentioned above, in base positioner, when regulating the position of substrate S, because substrate S not only can move along horizontal direction, and rotatable, so can be easily and accurately regulate the operation of substrate S position according to the 4th embodiment of the present invention.
The technical spirit of Miao Shuing can be implemented independently in embodiments of the present invention, perhaps can implement the various combinations between them.
In addition, not only can be applicable to glue spreader, and the various substrate board treatments that can be applicable in semiconductor fabrication process, use, for example be used for liquid crystal is applied to device on the substrate according to base positioner of the present invention.
Claims (10)
1. base positioner comprises:
Saddle has one or more through holes;
The substrate position regulon comprises: liner, and it contacts with substrate on being placed in described saddle; Promote the liner lift unit of described liner; And the liner rotary unit that rotates described liner; And
Gas supply unit is communicated with the described through hole of described saddle, arrives described through hole with supply gas.
2. base positioner as claimed in claim 1, wherein, described substrate position regulon also comprises the liner mobile unit that moves described liner along horizontal direction.
3. base positioner comprises:
Saddle has one or more through holes;
The substrate position regulon comprises: liner, and it contacts with substrate on being placed in described saddle; Promote the liner lift unit of described liner; And the liner mobile unit that moves described liner along horizontal direction; And
Gas supply unit is communicated with the described through hole of described saddle, arrives described through hole with supply gas.
4. base positioner as claimed in claim 3, wherein, described substrate position regulon comprises a plurality of substrate position regulons that are arranged on the described saddle.
5. as each described base positioner in the claim 2 to 4, wherein, described liner mobile unit comprises:
Move the first liner mobile unit of described liner along first direction; And
Move the second liner mobile unit of described liner along second direction perpendicular to described first direction.
6. as each described base positioner in the claim 1 to 4, wherein, in described liner, be formed with through hole, and suction unit is communicated with air-breathing through described through hole with the described through hole of described liner.
7. as each described base positioner in the claim 1 to 4, also comprise:
Exhaust unit is communicated with the described through hole of described saddle, with through described through hole exhaust.
8. method of utilizing base positioner location substrate, described base positioner comprises: saddle has one or more through holes; The substrate position regulon has and is placed in the contacted liner of described substrate on the described saddle, promotes the liner lift unit of described liner, the liner rotary unit of the described liner of rotation and the liner mobile unit that moves described liner along horizontal direction; And gas supply unit, be communicated with the described through hole of described saddle with supply gas to described through hole, said method comprising the steps of:
(a) described substrate is placed on the described saddle;
(b) utilize described liner lift unit to promote described liner;
(c) described substrate is attached to the upper surface of described liner;
(d) in mode from described gas supply unit supply gas to the described through hole of described saddle from the described saddle described substrate of lifting that makes progress; And
(e) regulate the position of described substrate in the mode of utilizing described liner rotary unit to rotate described liner or to utilize described liner mobile unit to move described liner along horizontal direction.
9. method as claimed in claim 8, wherein, described step (b) is carried out before in described step (a).
10. method as claimed in claim 8 or 9 wherein, is formed with through hole in described liner, and suction unit is communicated with the described through hole of described liner, with air-breathing through described through hole, and
Described step (c) comprise through the described through hole of described liner air-breathing in the described suction unit to utilize suction described substrate to be attached to the step of the upper surface of described liner.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2009-0099540 | 2009-10-20 | ||
| KR1020090099540A KR20110042733A (en) | 2009-10-20 | 2009-10-20 | Apparatus and method for positioning substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102043288A true CN102043288A (en) | 2011-05-04 |
Family
ID=43909571
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009102602315A Pending CN102043288A (en) | 2009-10-20 | 2009-12-25 | Substrate positioning apparatus and method for positioning substrate with the same |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR20110042733A (en) |
| CN (1) | CN102043288A (en) |
| TW (1) | TW201115676A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107265838A (en) * | 2016-04-07 | 2017-10-20 | 塔工程有限公司 | Scribing equipment |
| CN107265839A (en) * | 2016-04-07 | 2017-10-20 | 塔工程有限公司 | Scribing equipment |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101133467B1 (en) * | 2009-10-20 | 2012-04-09 | 강경호 | Cradle For Automatic Vehicle |
| KR102068000B1 (en) * | 2012-11-19 | 2020-01-20 | 주식회사 탑 엔지니어링 | Substrate Loading Device for Deposition Apparatus |
-
2009
- 2009-10-20 KR KR1020090099540A patent/KR20110042733A/en active Search and Examination
- 2009-12-25 CN CN2009102602315A patent/CN102043288A/en active Pending
- 2009-12-25 TW TW098144948A patent/TW201115676A/en unknown
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107265838A (en) * | 2016-04-07 | 2017-10-20 | 塔工程有限公司 | Scribing equipment |
| CN107265839A (en) * | 2016-04-07 | 2017-10-20 | 塔工程有限公司 | Scribing equipment |
| CN107265838B (en) * | 2016-04-07 | 2021-07-06 | 塔工程有限公司 | Scribing equipment |
| CN107265839B (en) * | 2016-04-07 | 2021-07-06 | 塔工程有限公司 | Scribing equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20110042733A (en) | 2011-04-27 |
| TW201115676A (en) | 2011-05-01 |
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Application publication date: 20110504 |