CN101981071A - 透明复合材料及其制造方法 - Google Patents

透明复合材料及其制造方法 Download PDF

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Publication number
CN101981071A
CN101981071A CN2009801113127A CN200980111312A CN101981071A CN 101981071 A CN101981071 A CN 101981071A CN 2009801113127 A CN2009801113127 A CN 2009801113127A CN 200980111312 A CN200980111312 A CN 200980111312A CN 101981071 A CN101981071 A CN 101981071A
Authority
CN
China
Prior art keywords
transparent composite
methyl
resin
manufacture method
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2009801113127A
Other languages
English (en)
Chinese (zh)
Inventor
门脇靖
岛村显治
樋田良二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Publication of CN101981071A publication Critical patent/CN101981071A/zh
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/04—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters
    • C08F299/0485—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters from polyesters with side or terminal unsaturations
    • C08F299/0492—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters from polyesters with side or terminal unsaturations the unsaturation being in acrylic or methacrylic groups
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/20—Silicates
    • C01B33/36—Silicates having base-exchange properties but not having molecular sieve properties
    • C01B33/38—Layered base-exchange silicates, e.g. clays, micas or alkali metal silicates of kenyaite or magadiite type
    • C01B33/44—Products obtained from layered base-exchange silicates by ion-exchange with organic compounds such as ammonium, phosphonium or sulfonium compounds or by intercalation of organic compounds, e.g. organoclay material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0392—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electromagnetism (AREA)
  • Polymers & Plastics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
CN2009801113127A 2008-04-14 2009-04-13 透明复合材料及其制造方法 Pending CN101981071A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP104768/2008 2008-04-14
JP2008104768 2008-04-14
PCT/JP2009/057427 WO2009128414A1 (ja) 2008-04-14 2009-04-13 透明複合材料及びその製造方法

Publications (1)

Publication Number Publication Date
CN101981071A true CN101981071A (zh) 2011-02-23

Family

ID=41199106

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2009801113127A Pending CN101981071A (zh) 2008-04-14 2009-04-13 透明复合材料及其制造方法

Country Status (7)

Country Link
US (1) US8163842B2 (ko)
EP (1) EP2270059A4 (ko)
JP (1) JPWO2009128414A1 (ko)
KR (1) KR20110003473A (ko)
CN (1) CN101981071A (ko)
TW (1) TW201005016A (ko)
WO (1) WO2009128414A1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103788723A (zh) * 2014-02-27 2014-05-14 新疆大学 改性皂石、聚乳酸/黄腐植酸季铵盐改性皂石复合材料及其制备方法和制品

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013228656A (ja) * 2011-06-28 2013-11-07 Mitsubishi Rayon Co Ltd 光学フィルム、光学シート、面発光体及び光学シートの製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4874728A (en) * 1987-03-26 1989-10-17 United Catalyst Inc. Organophilic clay modified with silane compounds
JP2000109526A (ja) * 1998-10-09 2000-04-18 Showa Highpolymer Co Ltd 人造大理石用樹脂組成物及びそれを用いた人造大理石成形品
US6890502B2 (en) * 2001-08-24 2005-05-10 Southern Clay Products, Inc. Synthetic clay compositions and methods for making and using
CA2474694A1 (en) * 2002-02-06 2003-08-14 Sekisui Chemical Co., Ltd. Resin composition_and products containing the same
WO2005073264A1 (ja) * 2004-01-30 2005-08-11 Nippon Steel Chemical Co., Ltd. 硬化性樹脂組成物
US7704671B2 (en) 2005-09-27 2010-04-27 Fujifilm Corporation Lithographic printing plate precursor and lithographic printing method
JP5172121B2 (ja) 2005-09-27 2013-03-27 富士フイルム株式会社 平版印刷版原版および平版印刷方法
JP2007182519A (ja) * 2006-01-10 2007-07-19 Nippon Paint Co Ltd アンチブロッキング性光硬化性樹脂組成物、それを基材上に被覆硬化したアンチブロッキング性構造体およびその製法
JP2007268711A (ja) 2006-03-30 2007-10-18 Teijin Dupont Films Japan Ltd フレキシブルディスプレイ基板用積層ポリエステルフィルム
US8518524B2 (en) 2006-07-21 2013-08-27 Showa Denko K.K. Transparent composite material
JP2008045121A (ja) 2006-07-21 2008-02-28 Showa Denko Kk 透明複合材料

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103788723A (zh) * 2014-02-27 2014-05-14 新疆大学 改性皂石、聚乳酸/黄腐植酸季铵盐改性皂石复合材料及其制备方法和制品
CN103788723B (zh) * 2014-02-27 2015-06-24 新疆大学 改性皂石、聚乳酸/黄腐植酸季铵盐改性皂石复合材料及其制备方法和制品

Also Published As

Publication number Publication date
US20110040015A1 (en) 2011-02-17
JPWO2009128414A1 (ja) 2011-08-04
EP2270059A1 (en) 2011-01-05
EP2270059A4 (en) 2011-06-29
KR20110003473A (ko) 2011-01-12
TW201005016A (en) 2010-02-01
WO2009128414A1 (ja) 2009-10-22
US8163842B2 (en) 2012-04-24

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Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20110223