CN101910945A - 感光性树脂组合物 - Google Patents

感光性树脂组合物 Download PDF

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Publication number
CN101910945A
CN101910945A CN2008801228906A CN200880122890A CN101910945A CN 101910945 A CN101910945 A CN 101910945A CN 2008801228906 A CN2008801228906 A CN 2008801228906A CN 200880122890 A CN200880122890 A CN 200880122890A CN 101910945 A CN101910945 A CN 101910945A
Authority
CN
China
Prior art keywords
methyl
acid
photosensitive polymer
formula
phenyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2008801228906A
Other languages
English (en)
Chinese (zh)
Inventor
城内公之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Publication of CN101910945A publication Critical patent/CN101910945A/zh
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Manufacturing & Machinery (AREA)
  • Organic Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Metallurgy (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electroluminescent Light Sources (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Optical Filters (AREA)
CN2008801228906A 2007-12-27 2008-12-10 感光性树脂组合物 Pending CN101910945A (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2007-336497 2007-12-27
JP2007336497 2007-12-27
JP2008022615 2008-02-01
JP2008-022615 2008-02-01
PCT/JP2008/072902 WO2009084430A1 (ja) 2007-12-27 2008-12-10 感光性樹脂組成物

Publications (1)

Publication Number Publication Date
CN101910945A true CN101910945A (zh) 2010-12-08

Family

ID=40824150

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2008801228906A Pending CN101910945A (zh) 2007-12-27 2008-12-10 感光性树脂组合物

Country Status (5)

Country Link
JP (1) JP5212063B2 (ko)
KR (1) KR20100099271A (ko)
CN (1) CN101910945A (ko)
TW (1) TW200937122A (ko)
WO (1) WO2009084430A1 (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103034056A (zh) * 2011-10-07 2013-04-10 住友化学株式会社 着色感光性树脂组合物
CN114846040A (zh) * 2019-12-25 2022-08-02 Dic株式会社 聚合物和包含该聚合物的涂布组合物

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5349159B2 (ja) * 2009-06-19 2013-11-20 住友化学株式会社 感光性樹脂組成物
KR101759929B1 (ko) 2009-11-20 2017-07-20 코오롱인더스트리 주식회사 감광성 수지 조성물
WO2011062446A2 (ko) * 2009-11-20 2011-05-26 코오롱인더스트리 주식회사 감광성 수지 조성물
JP5534174B2 (ja) * 2010-01-21 2014-06-25 大日本印刷株式会社 タッチパネル部材、並びに、上記タッチパネル部材を用いた表示装置及びタッチパネル
KR101073147B1 (ko) * 2010-04-05 2011-10-12 삼성모바일디스플레이주식회사 터치 스크린 패널 일체형 평판표시장치 및 그 제조방법
KR20120021488A (ko) * 2010-08-03 2012-03-09 주식회사 동진쎄미켐 네가티브 감광성 수지 조성물
KR20110126025A (ko) * 2010-09-03 2011-11-22 삼성전기주식회사 저항막방식 터치패널
JP2012092187A (ja) * 2010-10-26 2012-05-17 Daicel Corp 印刷用溶剤組成物
WO2012077770A1 (ja) * 2010-12-10 2012-06-14 旭硝子株式会社 ネガ型感光性樹脂組成物、光学素子用隔壁およびその製造方法、該隔壁を有する光学素子の製造方法、ならびに、撥インク剤溶液
JP2012159657A (ja) * 2011-01-31 2012-08-23 Asahi Kasei E-Materials Corp 光硬化型樹脂組成物及びそれを用いたパターン形成された基材の製造方法、並びに該基材を備える電子部品
JP2013160825A (ja) * 2012-02-02 2013-08-19 Sumitomo Chemical Co Ltd 感光性樹脂組成物
JP6854147B2 (ja) * 2017-02-17 2021-04-07 大阪有機化学工業株式会社 フォトスペーサー用樹脂、フォトスペーサー用樹脂組成物、フォトスペーサー及びカラーフィルタ
KR102156872B1 (ko) 2017-09-27 2020-09-16 주식회사 엘지화학 포토폴리머 조성물
KR102244648B1 (ko) 2017-12-08 2021-04-26 주식회사 엘지화학 포토폴리머 조성물
KR102037357B1 (ko) * 2018-06-21 2019-11-26 (주)라이타이저 색변환 다이오드의 제조방법
KR102338107B1 (ko) * 2018-09-14 2021-12-09 주식회사 엘지화학 홀로그램 매체

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4139548B2 (ja) * 2000-04-06 2008-08-27 富士フイルム株式会社 ポジ型フォトレジスト組成物
KR101011656B1 (ko) * 2003-03-07 2011-01-28 아사히 가라스 가부시키가이샤 감광성 수지 조성물 및 그 도막 경화물
JP2004277493A (ja) * 2003-03-13 2004-10-07 Asahi Glass Co Ltd 含シリコン樹脂および感光性樹脂組成物
JP2005134439A (ja) * 2003-10-28 2005-05-26 Asahi Glass Co Ltd 感光性樹脂組成物及びその硬化物
JP5114022B2 (ja) * 2006-01-23 2013-01-09 富士フイルム株式会社 パターン形成方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103034056A (zh) * 2011-10-07 2013-04-10 住友化学株式会社 着色感光性树脂组合物
CN114846040A (zh) * 2019-12-25 2022-08-02 Dic株式会社 聚合物和包含该聚合物的涂布组合物

Also Published As

Publication number Publication date
JP2009205137A (ja) 2009-09-10
JP5212063B2 (ja) 2013-06-19
TW200937122A (en) 2009-09-01
KR20100099271A (ko) 2010-09-10
WO2009084430A1 (ja) 2009-07-09

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C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20101208