CN101910945A - 感光性树脂组合物 - Google Patents
感光性树脂组合物 Download PDFInfo
- Publication number
- CN101910945A CN101910945A CN2008801228906A CN200880122890A CN101910945A CN 101910945 A CN101910945 A CN 101910945A CN 2008801228906 A CN2008801228906 A CN 2008801228906A CN 200880122890 A CN200880122890 A CN 200880122890A CN 101910945 A CN101910945 A CN 101910945A
- Authority
- CN
- China
- Prior art keywords
- methyl
- acid
- photosensitive polymer
- formula
- phenyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
- G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
- Manufacturing & Machinery (AREA)
- Organic Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Metallurgy (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electroluminescent Light Sources (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Optical Filters (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-336497 | 2007-12-27 | ||
JP2007336497 | 2007-12-27 | ||
JP2008022615 | 2008-02-01 | ||
JP2008-022615 | 2008-02-01 | ||
PCT/JP2008/072902 WO2009084430A1 (ja) | 2007-12-27 | 2008-12-10 | 感光性樹脂組成物 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN101910945A true CN101910945A (zh) | 2010-12-08 |
Family
ID=40824150
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2008801228906A Pending CN101910945A (zh) | 2007-12-27 | 2008-12-10 | 感光性树脂组合物 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5212063B2 (ko) |
KR (1) | KR20100099271A (ko) |
CN (1) | CN101910945A (ko) |
TW (1) | TW200937122A (ko) |
WO (1) | WO2009084430A1 (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103034056A (zh) * | 2011-10-07 | 2013-04-10 | 住友化学株式会社 | 着色感光性树脂组合物 |
CN114846040A (zh) * | 2019-12-25 | 2022-08-02 | Dic株式会社 | 聚合物和包含该聚合物的涂布组合物 |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5349159B2 (ja) * | 2009-06-19 | 2013-11-20 | 住友化学株式会社 | 感光性樹脂組成物 |
KR101759929B1 (ko) | 2009-11-20 | 2017-07-20 | 코오롱인더스트리 주식회사 | 감광성 수지 조성물 |
WO2011062446A2 (ko) * | 2009-11-20 | 2011-05-26 | 코오롱인더스트리 주식회사 | 감광성 수지 조성물 |
JP5534174B2 (ja) * | 2010-01-21 | 2014-06-25 | 大日本印刷株式会社 | タッチパネル部材、並びに、上記タッチパネル部材を用いた表示装置及びタッチパネル |
KR101073147B1 (ko) * | 2010-04-05 | 2011-10-12 | 삼성모바일디스플레이주식회사 | 터치 스크린 패널 일체형 평판표시장치 및 그 제조방법 |
KR20120021488A (ko) * | 2010-08-03 | 2012-03-09 | 주식회사 동진쎄미켐 | 네가티브 감광성 수지 조성물 |
KR20110126025A (ko) * | 2010-09-03 | 2011-11-22 | 삼성전기주식회사 | 저항막방식 터치패널 |
JP2012092187A (ja) * | 2010-10-26 | 2012-05-17 | Daicel Corp | 印刷用溶剤組成物 |
WO2012077770A1 (ja) * | 2010-12-10 | 2012-06-14 | 旭硝子株式会社 | ネガ型感光性樹脂組成物、光学素子用隔壁およびその製造方法、該隔壁を有する光学素子の製造方法、ならびに、撥インク剤溶液 |
JP2012159657A (ja) * | 2011-01-31 | 2012-08-23 | Asahi Kasei E-Materials Corp | 光硬化型樹脂組成物及びそれを用いたパターン形成された基材の製造方法、並びに該基材を備える電子部品 |
JP2013160825A (ja) * | 2012-02-02 | 2013-08-19 | Sumitomo Chemical Co Ltd | 感光性樹脂組成物 |
JP6854147B2 (ja) * | 2017-02-17 | 2021-04-07 | 大阪有機化学工業株式会社 | フォトスペーサー用樹脂、フォトスペーサー用樹脂組成物、フォトスペーサー及びカラーフィルタ |
KR102156872B1 (ko) | 2017-09-27 | 2020-09-16 | 주식회사 엘지화학 | 포토폴리머 조성물 |
KR102244648B1 (ko) | 2017-12-08 | 2021-04-26 | 주식회사 엘지화학 | 포토폴리머 조성물 |
KR102037357B1 (ko) * | 2018-06-21 | 2019-11-26 | (주)라이타이저 | 색변환 다이오드의 제조방법 |
KR102338107B1 (ko) * | 2018-09-14 | 2021-12-09 | 주식회사 엘지화학 | 홀로그램 매체 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4139548B2 (ja) * | 2000-04-06 | 2008-08-27 | 富士フイルム株式会社 | ポジ型フォトレジスト組成物 |
KR101011656B1 (ko) * | 2003-03-07 | 2011-01-28 | 아사히 가라스 가부시키가이샤 | 감광성 수지 조성물 및 그 도막 경화물 |
JP2004277493A (ja) * | 2003-03-13 | 2004-10-07 | Asahi Glass Co Ltd | 含シリコン樹脂および感光性樹脂組成物 |
JP2005134439A (ja) * | 2003-10-28 | 2005-05-26 | Asahi Glass Co Ltd | 感光性樹脂組成物及びその硬化物 |
JP5114022B2 (ja) * | 2006-01-23 | 2013-01-09 | 富士フイルム株式会社 | パターン形成方法 |
-
2008
- 2008-12-09 JP JP2008312955A patent/JP5212063B2/ja active Active
- 2008-12-10 WO PCT/JP2008/072902 patent/WO2009084430A1/ja active Application Filing
- 2008-12-10 CN CN2008801228906A patent/CN101910945A/zh active Pending
- 2008-12-10 KR KR1020107015182A patent/KR20100099271A/ko not_active Application Discontinuation
- 2008-12-17 TW TW97149106A patent/TW200937122A/zh unknown
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103034056A (zh) * | 2011-10-07 | 2013-04-10 | 住友化学株式会社 | 着色感光性树脂组合物 |
CN114846040A (zh) * | 2019-12-25 | 2022-08-02 | Dic株式会社 | 聚合物和包含该聚合物的涂布组合物 |
Also Published As
Publication number | Publication date |
---|---|
JP2009205137A (ja) | 2009-09-10 |
JP5212063B2 (ja) | 2013-06-19 |
TW200937122A (en) | 2009-09-01 |
KR20100099271A (ko) | 2010-09-10 |
WO2009084430A1 (ja) | 2009-07-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20101208 |