CN101893429B - Super-precision surface measuring system based on polarization phase-shifting microscopy interference technology - Google Patents
Super-precision surface measuring system based on polarization phase-shifting microscopy interference technology Download PDFInfo
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Abstract
The invention provides a super-precision surface measuring system based on a polarization phase-shifting microscopy interference technology, belonging to the field of an optical precision measurement technology. The system comprises a light source (1), a collimating mirror (2), a linear polarizer (3), a depolarization amici prism (4), a microscope (5), a polarization amici prism (6), a reference plane mirror (8), 1/4 wave plate (9), an analyzer (10), an imaging device (11) and a data processing system (12). The invention combines the polarization phase-shifting technology and the Michelson interference microscopy, overcomes a series of problems of the PZT phase-shifting method in a general phase-shifting microscopy interference system and has the advantages of simple structure, simple and accurate phase-shifting, high measuring precision, fast measuring speed and the like.
Description
Technical Field
The invention discloses a measuring system based on polarization phase shift micro-interferometry, and belongs to the technical field of optical precision measurement. The system is mainly applied to the measurement of ultra-precise (nano-to submicron) surface profiles and structures.
Background
With the continuous development of precision measurement technology, phase-shift interference microscopy has been widely used. It is a phase interference measuring method combining optical interferometry and digital phase shift technology, and has the characteristics of three-dimensional non-contact and nano-scale resolution (see reference document [1 ]). The measurement principle is as follows: a precise phase shifting device is added in a microscopic interference light path of the system, so that relative phase shift is continuously generated between the measuring light and the reference light to form a plurality of interference patterns on a time sequence, a detector detects the sequence interference light intensity at each pixel point, and the light intensity value is sent to a computer for calculation to obtain the measured phase at each pixel point. However, the phase-shift interference microscopy needs to accurately give a phase shift amount, and the commonly adopted method of driving the phase shift of the reference mirror by piezoelectric ceramics (PZT) has a phase shift error due to the nonlinear influence of PZT (see reference [2]), and the PZT phase shift changes the relative position of the reference mirror and the microscope, so that the reference wave surface of each phase-shift interference is actually changed, and a measurement error is introduced.
Reference [1] J.Schwindower, "Advanced evaluation technique in interferometry," in prog.Opt.28, 271-359(1990) [2] J.E.Greivekamp and J.H.Brunning, "Phase shifting interferometry," in Optical Shop Testing, D.Malara, Ed., pp.547-655, Wily, Hoboken, NJ (2007).
Reference [2] Wyant JC. Effect of piezoelectric transducer non-linear on phase shifting interferometry. appl. Opt.26: 1112-6(1987).
Disclosure of Invention
The invention aims to overcome a series of problems of a PZT phase shifting method in a common phase shifting microscopy interference system, provides a polarization phase shifting microscopy interference system combining a polarization phase shifting technology with Michelson interference microscopy, and realizes the measurement of ultra-precise (nano to submicron) surface profile and structure.
The purpose of the invention is realized by the following technical scheme.
A polarized phase shift microscopic interference system for measuring the profile and structure of ultraprecise surface is composed of light source, collimator, linear polarizer, depolarizing beam splitter, microscope, polarizing beam splitter, reference plane mirror, 1/4 wave plate, analyzer, imaging unit and data processing system,
monochromatic light emitted from a light source passes through a collimating mirror and a linear polarizer to become linearly polarized collimated light, the linearly polarized collimated light is reflected by a depolarizing beam splitter prism to enter a microscope, the linearly polarized collimated light is vertically divided into an s component along the X-axis direction and a p component along the Y-axis direction by the depolarizing beam splitter prism after being emitted, the s component is reflected back as reference light after being incident on a reference plane mirror, the p component is incident on a measured surface after being transmitted through the depolarizing beam splitter prism, and is reflected back as measurement light after recording height information of the measured surface; the reference light and the measuring light are converged at the splitting plane of the polarization splitting prism, then pass through the 1/4 wave plate and the analyzer together to generate polarization phase shift interference, the imaging equipment detects the interference pattern, and the interference pattern is input into the data processing system to be processed to obtain the microscopic profile and structure of the measured surface.
The invention has the advantages that the polarization phase-shifting technology and Michelson interference microscopy are combined, and the invention has the characteristics of simple structure, simple phase shifting, high precision, high measurement speed and the like.
Drawings
FIG. 1 is a schematic diagram of the optical path of a polarization phase-shifting microscopy interference system of the present invention. The system comprises a 1-monochromatic point light source, a 2-collimating mirror, a 3-linear polarizer, a 4-depolarizing beam splitter prism, a 5-long working distance microscope, a 6-polarizing beam splitter prism, a 7-measured object, an 8-plane reference mirror, a 9-1/4 slide, a 10-analyzer, 11-imaging equipment and 12-a data processing system.
Detailed Description
The present invention combines the use of Polarized phase-shifting (Polarized phase-shifting) techniques with Michelson interference microscopy. As shown in fig. 1, the surface measurement system of the present invention includes a light source 1, a collimating mirror 2, a linear polarizer 3, a depolarizing beam splitter 4, a long working distance microscope 5, a polarizing beam splitter 6, a reference plane mirror 8, a 1/4 wave plate 9, an analyzer 10, an imaging device 11, and a data processing system 12.
Monochromatic light emitted from a light source 1 passes through a collimating mirror 2 and a linear polarizer 3 to become linearly polarized collimated light, is reflected by a depolarizing beam splitter prism 4 to enter a long working distance microscope 5, and is vertically divided into two parts, namely an s component along the X-axis direction and a p component along the Y-axis direction after being emitted by a polarizing beam splitter prism 6. The s component is reflected by the polarization beam splitter prism 6, enters the reference mirror 8 and is reflected back to serve as reference light, the p component is transmitted by the polarization beam splitter prism 6 and enters the surface 7 to be measured, height information of the surface to be measured is recorded, and the p component is reflected back to serve as measuring light. The two beams of light are merged at the splitting plane of the polarization splitting prism 6, pass through 1/4 wave plate 9 and analyzer 10 together, and undergo polarization interference, wherein the optical axis of 1/4 wave plate must be 45 ° to the X axis. Phase-shifting interference is achieved by rotation of the analyzer 10, and when the analyzer 10 is rotated by an angle β, a phase shift of 2 β is produced. Then, the imaging device 11 (preferably CCD) detects and obtains a multi-step phase shift interferogram, the phase extraction algorithm and the phase unwrapping algorithm process the multi-step phase shift interferogram to obtain a phase distribution, and the microscopic profile and structure of the surface to be measured can be obtained according to the relationship between the phase distribution and the height of the surface to be measured.
The system of the present invention has the important functions of the polarization splitting prism 4 and the polarization splitting prism 6. The depolarization beam splitter prism 4 mainly changes the incident direction of light, but does not change the polarization state of the incident light; the polarization beam splitter prism 6 mainly splits incident linearly polarized light into two beams of light having orthogonal polarization states. If the depolarizing beam splitter 4 is replaced by a polarizing beam splitter or a normal beam splitter, the measurement result will be influenced by double images and even measurement failure will result.
The linear polarizer 3, the depolarization beam splitter prism 4, the polarization beam splitter prism 6, the 1/4 wave plate 9, the analyzer 10 and the like in the system form the realization of polarization interference, and are beneficial to improving the environmental interference resistance of the optical system. Meanwhile, the polarization direction of the linear polarizer 3 is adjusted, so that the device can be conveniently adapted to different measured surface reflectivities, and the light intensity of the measuring light and the reference light is adjusted, thereby adjusting the good contrast of the interference pattern.
In the system of the present invention, the phase shift is realized by the rotation of the analyzer 10, and since the rotation angle can have high accuracy and is convenient for linear control, high phase shift accuracy can be ensured. Meanwhile, the phase shift is realized, and the problems that the wave surface of the reference light can be changed and the measurement error is introduced by a phase shift method such as a PZT driving reference mirror phase shift method do not exist.
Claims (2)
1. A polarization phase-shift microscopic interference system is used for realizing the measurement of ultra-precise surface profile and structure, and comprises a light source (1), a collimating mirror (2), a linear polarizer (3), a depolarization beam splitter prism (4), a microscope (5), a polarization beam splitter prism (6), a reference plane mirror (8), a 1/4 wave plate (9), an analyzer (10), an imaging device (11) and a data processing system (12),
monochromatic light emitted from a light source (1) passes through a collimating mirror (2) and a linear polarizer (3) to become linearly polarized collimated light, the linearly polarized collimated light is reflected by a depolarizing beam splitter prism (4) to enter a microscope (5), the linearly polarized collimated light is vertically split into an s component along an X-axis direction and a p component along a Y-axis direction by a polarizing beam splitter prism (6) after being emitted, the s component is incident on a reference plane mirror (8) and then reflected back to serve as reference light, the p component is incident on a measured surface (7) after being transmitted through the polarizing beam splitter prism (6), and the height information of the measured surface (7) is recorded and then reflected back to serve as measurement light; the reference light and the measuring light are converged at the splitting plane of the polarization splitting prism (6), then pass through an 1/4 wave plate (9) and an analyzer (10) together to generate polarization phase shift interference, the interference pattern is obtained by detection of the imaging device (11), and the interference pattern is input into a data processing system (12) to be processed to obtain the measured surface micro-profile and structure; wherein,
the processing of the data processing system (12) comprises the steps of carrying out phase extraction and phase unwrapping processing on the interferogram so as to obtain phase distribution, and obtaining the microscopic outline and structure of the measured surface according to the relation between the phase distribution and the height of the measured surface;
the phase-shifting interference is realized by 1/4 wave plate (9) and analyzer (10) combination, and rotating analyzer (10).
2. A polarization phase shifting microscopy interference system according to claim 1 wherein polarization phase shifting is combined with microscopy interference to form a polarization phase shifting microscopy interference system for phase shifting interferometry of surface micro-profiles and structures.
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| CN102539381B (en) * | 2010-12-24 | 2013-10-30 | 南京理工大学 | Refractive index chromatography device based on micro-off-axis microscopic interference projection |
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| TWI472715B (en) * | 2013-07-18 | 2015-02-11 | Univ Nan Kai Technology | An interferometric configuration based of synchronous measurement of dynamic surface profile |
| CN103344198B (en) * | 2013-07-25 | 2016-05-11 | 哈尔滨工业大学 | The measuring instrument and the measuring method that detect for tiny spherical surface surface profile |
| CN103513429A (en) * | 2013-10-16 | 2014-01-15 | 中国科学院半导体研究所 | Collimation light splitter system |
| CN103712554B (en) * | 2013-12-27 | 2016-04-27 | 华南师范大学 | Based on the Dual-channel space-time mixing phase shift fizeau interferometer of crossed polarized light |
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| CN108931207A (en) * | 2018-08-16 | 2018-12-04 | 西安工业大学 | The interference microscope equipment and method of LED illumination |
| CN109163673B (en) * | 2018-08-17 | 2019-07-05 | 华中科技大学 | A kind of multi-wavelength and the bisynchronous surface method for real-time measurement of phase shift interference and system |
| CN110186388B (en) * | 2019-05-13 | 2021-04-06 | 天津大学 | Synchronous phase shift measurement system and method based on white light interference spectrum |
| CN110095085A (en) * | 2019-05-31 | 2019-08-06 | 西安工业大学 | A kind of real-time phase shift interference with common path microscope equipment and method |
| CN111238397B (en) * | 2020-02-10 | 2021-03-02 | 北京理工大学 | Transient digital Moire phase-shifting interferometry device and method for optical element surface shape |
| CN113029960A (en) * | 2021-04-18 | 2021-06-25 | 中国人民解放军空军工程大学 | High-precision real-time three-dimensional measurement system and method for measuring micro-defects on surface of aviation component |
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Non-Patent Citations (4)
| Title |
|---|
| 刘晓军等.同步相移干涉表面精密测量.《中国机械工程》.2009,第20卷(第18期),2218-2222. * |
| 刘晓军等.基于偏振相移的干涉条纹细分原理.《华中科技大学学报》.2008,第36卷(第6期),4-6. * |
| 史金辉等.消偏振分光棱镜的设计与性能分析.《哈尔滨工程大学学报》.2008,第29卷(第9期),1019-1022. * |
| 林永昌等.全介质宽波段消偏振分光镜.《北京理工大学学报》.1991,第11卷(第4期),10-15. * |
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