CN101835339A - Panel electrode radio-frequency capacitance coupling argon-oxygen/argon-nitrogen plasma generator under constant pressure - Google Patents

Panel electrode radio-frequency capacitance coupling argon-oxygen/argon-nitrogen plasma generator under constant pressure Download PDF

Info

Publication number
CN101835339A
CN101835339A CN 201010180725 CN201010180725A CN101835339A CN 101835339 A CN101835339 A CN 101835339A CN 201010180725 CN201010180725 CN 201010180725 CN 201010180725 A CN201010180725 A CN 201010180725A CN 101835339 A CN101835339 A CN 101835339A
Authority
CN
China
Prior art keywords
electrode
argon
radio frequency
oxygen
plasma generator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN 201010180725
Other languages
Chinese (zh)
Other versions
CN101835339B (en
Inventor
李寿哲
武启
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dalian University of Technology
Original Assignee
Dalian University of Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dalian University of Technology filed Critical Dalian University of Technology
Priority to CN2010101807255A priority Critical patent/CN101835339B/en
Publication of CN101835339A publication Critical patent/CN101835339A/en
Application granted granted Critical
Publication of CN101835339B publication Critical patent/CN101835339B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)

Abstract

The invention relates to a panel electrode radio-frequency capacitance coupling argon-oxygen/argon-nitrogen plasma generator under constant pressure, which belongs to the field of plasma technology. The generator is composed of two water-cooling plate metal electrodes, the surfaces of which are parallel, wherein, one electrode is connected to a radio-frequency power supply through a matcher; the other electrode is connected to the ground and discharges under open constant pressure; and insulation material slats are bonded to the electrode adjacent to a gas inlet to form a gas inlet channel, the gas inlet channel is connected to a distribution system through a plurality of gas inlet conduits, and uniform and stable cold plasma formed by discharge between gaps of electrode plates flows out from electrode outlet ends to form extensive plasma jet. The invention has the advantage that extensive, uniform and stable low-temperature cold plasma jet with high concentration of reactive particles is generated by using argon-oxygen or argon-nitrogen as working gas so that the application of the plasma technology in surface cleaning, sterilization, disinfection, oxidation of circuit boards and surface modification can be realized.

Description

Normal pressure lower plate electrode radio frequency capacitive coupling argon oxygen/argon-nitrogen plasma generator
Technical field
The invention belongs to technical field of plasma, relate to that to use argon gas under the driving at radio-frequency power supply under the open condition of atmospheric pressure be carrier gas, mixture of oxygen or nitrogen isoreactivity gas produce large tracts of land, the technology of cold-plasma jet uniformly by glow discharge simultaneously.
Background technology
In recent years, atmospheric pressure nonequilibrium plasma discharge technology is owing to broken away from the restriction of vacuum chamber and caused domestic and international researcher's extensive interest in boundless application prospects in field such as biomedicine, electronics industry, national defence.Compare with traditional low pressure discharge material Processing by Plasma process, atmospheric pressure nonequilibrium plasma material processing, need under vacuum condition, not carry out, greatly reduce the construction and the maintenance cost of equipment like this, solve the restriction that is subjected to the vacuum chamber volume in the practical application simultaneously, and can produce a large amount of living radicals under the situation of lower at discharge gas temperature (25-200 ℃).Late 1960s is to the beginning of the seventies, Schwab etc. utilize air, under atmospheric pressure adopt and earlier two metal electrodes are placed contact condition, the method for separating gradually again when electric current reaches certain value has obtained radio frequency glow discharge or the arc discharge under the atmospheric pressure.Kanazawa in 1988 etc. have proposed to realize the condition of stable discharging under the atmospheric pressure: with the helium is carrier gas, covers one deck dielectric at electrode surface, and used power work frequency is more than KHz.The Selwyn of U.S. LosAlamous National Laboratory in 1998 and the Hicks of University of California in Los Angeles etc. have proposed atmospheric pressure plasma fluidics.Its plasma generator mainly adopts plate and the coaxial type electrode, and this two speciogenesis device all adopts the bare metal electrode structure, and is carrier gas doping active gases with the helium.In recent years, this novel plasma source has attracted domestic and international many scholars' attention.Though is that carrier gas adopts the radio frequency Atomospheric pressure glow discharge plasma source of metal electrode structure to have lot of advantages with the helium, because the high and on-stream helium that needs to use big flow of the price of helium itself is faced with the too high problem of running expense this atmospheric pressure nonequilibrium plasma source being generalized in the industrial production application.One of its solution is that the cheap argon gas of employing is carrier gas, and sneaks into oxygen or nitrogen active gases, realizes producing the cold plasma source of living radical.Yet, in with the plasma source of common structure, be carrier gas and the generation of often guiding discharge wild effect when sneaking into active gases with argon gas, and the doping ratio of active gases is too small, the reliability that has influenced the yield of living radical in the plasma source greatly and used, thus its effect reduced.In addition, though can obtain argon oxygen or argon-nitrogen plasma by the form that adopts dielectric barrier discharge, but the plasma temperature that is produced is very high, be not suitable for carrying out the processing on temperature-sensitivmaterial material surface, and the uniformity of the plasma that is produced reduces greatly owing to hot necking phenomenon under big electric current.A kind of plasma source structure that we propose has in the present invention realized that in argon oxygen or argon nitrogen binary gas large tracts of land evenly discharges, not only obtained the low cold-plasma jet of plasma temperature, and its physics and chemical work window have obtained very big improving.
Summary of the invention
The purpose of this invention is to provide a kind of by stable discharging can produce large tracts of land, uniformly, the cold plasma of high concentration living radical, clean and numerous areas such as circuit board oxidation provides application technology at biological antibiotic, purification, body surface.
In order to achieve the above object, technical scheme of the present invention is: comprise two smooth surfaces and the plate shaped water-cooling metal electrode that is parallel to each other, insulation lath, quartz glass plate and an insulated enclosure shell.The plasma discharge main body comprises RF driven electrode and ground electrode, wherein radio frequency electrode links to each other with radio-frequency power supply through adaptation, ground electrode ground connection, both sides at discharge range seal it with quartz glass, sparking electrode is fixed on the electrode tip holder shell with insulating material, end at insulating material is provided with a plurality of air vent holes, this air vent hole links to each other with air induction conduit, air induction conduit is connected with air distribution system, and this air vent hole introduces behind the gas buffer chamber gas by entering discharge range behind the plenum duct of constructing between two electrodes.Described flat-type plasma generator, its radio frequency electrode and ground electrode are the water-cooled metal plate electrode, this electrode surface is smooth and be parallel to each other, electrode surface bonding bar shaped collets in this generator neighbour gas buffer chamber, the gross thickness of these bar shaped collets is less than the spacing between two metal electrodes, the orientation of placing is vertical with the direction of air-flow, thereby the formation plenum duct forms plasma discharge between the bare metal electrode that is not covered by the bar shaped collets in the plenum duct downstream of this bar shaped collets structure.
Plasma generator of the present invention, discharge spacing range between its radio frequency electrode and the ground electrode is 1~2.5 millimeter, the radio-frequency power supply operating frequency is the industrial standard frequency of 13.56MHz, the breakdown rms voltage of gas is in 500V, and this radio frequency discharge is to carry out under the open condition of atmospheric pressure.
Plasma generator of the present invention, its air distribution system be air supply source the gas of confession be argon gas or helium, perhaps argon gas and oxygen, the mist of argon gas and nitrogen.During discharge, the volume ratio of logical oxygen and argon gas or nitrogen and argon gas be less than or equal to 1%.
Plasma generator of the present invention, the radio frequency electrode and the ground electrode outside are installed on the electrode tip holder shell with the insulating material sealing, and the discharge range side seals with quartz glass plate, as observation window.
Plasma generator of the present invention, described air vent hole are arranged in the tightst mode and are made and evenly to distribute by the gas flow rate field in the plasma generator region of discharge.Described insulation crust material is an electrical insulating material; Electrode is that stainless steel, copper or aluminum are done.
Effect of the present invention and benefit are: mix in argon gas under the condition of oxygen or nitrogen, form between radio frequency electrode and the ground electrode between uniform and stable plasma discharge region, port forms the large tracts of land cold-plasma jet.Plasma source proposed by the invention is simple in structure, easy operating and maintenance, and manufacturing cost is low, simultaneously because this plasma source has used argon gas greatly to reduce as its running expense of carrier gas.Also have, the density of the living radical that the described plasma generator of working under the open condition of normal pressure produces greatly increases, can finish large-area surface modification treatment work efficiently, be applied in many association areas such as biological antibiotic, purification, body surface cleaning and circuit board oxidations.
Description of drawings
Accompanying drawing 1 is the side structure cross-sectional schematic of the binary gas flat-type plasma generator that designs of the present invention.
Accompanying drawing 2 is Facad structure cross-sectional schematic of the binary gas RF plasma generator that designs of the present invention.
Among Fig. 1, Fig. 2: 1 RF driven electrode; 2 top crown recirculated waters are imported and exported; 3 pole plate gaps; 4 ground electrodes; 5 bottom crown recirculated waters are imported and exported; 6 electrode tip holder shells; 7 gas buffer chambeies; 8 bottom crown water cooling chambers; 9 insulating material laths; 10 quartz glass plates; 11 air vent holes; 12 top crown water cooling chambers.
Embodiment
Be described in detail the specific embodiment of the present invention below in conjunction with technical scheme and accompanying drawing.
Consult Fig. 1 and Fig. 2, the side structure cross-sectional schematic of the binary gas flat-type plasma generator that Fig. 1 designs for the present invention, Fig. 2 is a front section view.Described low-temperature plasma generator, comprise plate shaped stainless steel metal water-cooled RF driven electrode 1, intake-outlet 2 links to each other with the water-cooled circulator, ground electrode 4, and bonding thickness is the lath 9 of 1 millimeter polytetrafluoroethylene, the width of lath can be according to the actual conditions conversion, the particular location of lath as shown in drawings, RF driven electrode 1 is connected with radio-frequency power supply through adaptation, ground electrode 4 ground connection, be provided with certain discharge interval 3 between radio frequency electrode 1 and the ground electrode 4, the scope at this interval is generally the 1-2.5 millimeter, the discharge spacing can be adjusted by changing the installation site of electrode on electrode tip holder shell 6, and in the end connection gas buffer chamber 7 of this discharging gap, the side in this chamber is provided with a plurality of air vent holes of arranging side by side 8, link to each other with gas cylinder through air distribution system, using gases is a helium, argon gas, the mist of argon gas and oxygen or argon gas and nitrogen.
Radio frequency electrode 1 and ground electrode 4 are fixed in the electrode tip holder shell 6, and with quartz glass plate 10 sealings, sheet glass 10 is inserted on the electrode tip holder shell 6 respectively in the both sides of discharging gap 3, and the blended rubber sealing makes it to become a watch window.
Radio frequency electrode 1 and ground electrode 4, for the rectangular flat plate metal electrode, by stainless steel, metals such as copper or aluminium process; Radio frequency electrode 1 and ground electrode 4 all are furnished with water cooling chamber 12 and 8, import and export 2 by recirculated water respectively and link to each other with the water-cooled circulator of outside with 5, and insulating material lath 9 can be electrical insulating materials such as polytetrafluoroethylene, pottery, glass.

Claims (6)

1. a normal pressure lower plate electrode radio frequency capacitive coupling argon oxygen/argon-nitrogen plasma generator is characterized in that: comprise two smooth surfaces and the plate shaped water-cooling metal electrode that is parallel to each other, an insulation lath, quartz glass plate and insulated enclosure shell; The plasma discharge main body comprises RF driven electrode and ground electrode, wherein radio frequency electrode links to each other with radio-frequency power supply through adaptation, ground electrode ground connection, both sides at discharge range seal it with quartz glass, sparking electrode is fixed on the electrode tip holder shell with insulating material, end at insulating material is provided with a plurality of air vent holes, this air vent hole links to each other with air induction conduit, air induction conduit is connected with air distribution system, and this air vent hole introduces behind the gas buffer chamber gas by entering discharge range behind the plenum duct of constructing between two electrodes; Described flat-type plasma generator, its radio frequency electrode and ground electrode are the water-cooled metal plate electrode, this electrode surface is smooth and be parallel to each other, electrode surface bonding bar shaped collets in this generator neighbour gas buffer chamber, the gross thickness of these bar shaped collets is less than the spacing between two metal electrodes, the orientation of placing is vertical with the direction of air-flow, thereby the formation plenum duct forms plasma discharge between the bare metal electrode that is not covered by the bar shaped collets in the plenum duct downstream of this bar shaped collets structure.
2. a kind of normal pressure lower plate electrode radio frequency capacitive coupling argon oxygen/argon-nitrogen plasma generator according to claim 1, it is characterized in that: radio frequency electrode and ground electrode are the plate shaped water-cooling metal electrodes that electrode surface is smooth and be parallel to each other, electrode surface bonding bar shaped collets in this generator neighbour gas buffer chamber, the gross thickness of these bar shaped collets is less than the spacing between two metal electrodes, the orientation of placing is vertical with the direction of air-flow, thereby forms plenum duct.
3. a kind of normal pressure lower plate electrode radio frequency capacitive coupling argon oxygen/argon-nitrogen plasma generator according to claim 1, it is characterized in that: the discharge spacing range between radio frequency electrode and the ground electrode is 1~2.5 millimeter.
4. a kind of normal pressure lower plate electrode radio frequency capacitive coupling argon oxygen/argon-nitrogen plasma generator according to claim 1, it is characterized in that: this air distribution system be air supply source the gas of confession be argon gas or helium, perhaps argon gas and oxygen, the mist of argon gas and nitrogen.
5. a kind of normal pressure lower plate electrode radio frequency capacitive coupling argon oxygen/argon-nitrogen plasma generator according to claim 1, it is characterized in that: the insulating material in the described electrode tip holder shell is Ya Keli or polytetrafluoroethylene; Electrode is for stainless steel, copper or aluminum are done.
6. a kind of normal pressure lower plate electrode radio frequency capacitive coupling argon oxygen/argon-nitrogen plasma generator according to claim 1, it is characterized in that: described insulation bar shaped block of material is polytetrafluoroethylene or other electrical insulating material.
CN2010101807255A 2010-05-20 2010-05-20 Panel electrode radio-frequency capacitance coupling argon-oxygen/argon-nitrogen plasma generator under constant pressure Expired - Fee Related CN101835339B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2010101807255A CN101835339B (en) 2010-05-20 2010-05-20 Panel electrode radio-frequency capacitance coupling argon-oxygen/argon-nitrogen plasma generator under constant pressure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2010101807255A CN101835339B (en) 2010-05-20 2010-05-20 Panel electrode radio-frequency capacitance coupling argon-oxygen/argon-nitrogen plasma generator under constant pressure

Publications (2)

Publication Number Publication Date
CN101835339A true CN101835339A (en) 2010-09-15
CN101835339B CN101835339B (en) 2012-05-23

Family

ID=42719212

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2010101807255A Expired - Fee Related CN101835339B (en) 2010-05-20 2010-05-20 Panel electrode radio-frequency capacitance coupling argon-oxygen/argon-nitrogen plasma generator under constant pressure

Country Status (1)

Country Link
CN (1) CN101835339B (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102387654A (en) * 2011-10-29 2012-03-21 大连理工大学 Microscale low-temperature plasma jet generating device of atmospheric pressure
CN102510654A (en) * 2011-10-18 2012-06-20 大连理工大学 Atmospheric-pulse-modulated microwave plasma generation device
CN102883515A (en) * 2012-09-24 2013-01-16 西安交通大学 Array device of atmospheric pressure flat dielectric barrier plasma jet discharge
CN103776818A (en) * 2013-12-26 2014-05-07 四川大学 Glow discharge-based plasma generator and spectrum detection system formed by same
CN103841741A (en) * 2014-03-12 2014-06-04 中国科学院电工研究所 Barometric pressure plasma generator based on dielectric barrier discharge
CN105722339A (en) * 2016-02-29 2016-06-29 江西合力泰科技有限公司 Metal ring mounting method for biological recognition module
TWI788034B (en) * 2020-12-07 2022-12-21 日商東芝三菱電機產業系統股份有限公司 Active gas generation apparatus

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5549780A (en) * 1990-10-23 1996-08-27 Semiconductor Energy Laboratory Co., Ltd. Method for plasma processing and apparatus for plasma processing
JP2001314752A (en) * 2000-05-12 2001-11-13 Hokushin Ind Inc Plasma reaction vessel and method for decomposing gas by plasma
CN2682773Y (en) * 2004-03-18 2005-03-02 中国科学院微电子研究所 Normal pressure radio frequency low-temperature cold plasma discharge channel apparatus
CN201414256Y (en) * 2009-05-27 2010-02-24 中国科学院微电子研究所 Large-area planar normal-pressure radio frequency cold plasma system

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5549780A (en) * 1990-10-23 1996-08-27 Semiconductor Energy Laboratory Co., Ltd. Method for plasma processing and apparatus for plasma processing
JP2001314752A (en) * 2000-05-12 2001-11-13 Hokushin Ind Inc Plasma reaction vessel and method for decomposing gas by plasma
CN2682773Y (en) * 2004-03-18 2005-03-02 中国科学院微电子研究所 Normal pressure radio frequency low-temperature cold plasma discharge channel apparatus
CN201414256Y (en) * 2009-05-27 2010-02-24 中国科学院微电子研究所 Large-area planar normal-pressure radio frequency cold plasma system

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
《Applied Physics Letters》 20070202 Jin-Pyo Lim et al. Atmospheric-pressure argon/oxygen plasma-discharge source with a stepped electrode 051504-1~051504-3 1-6 第90卷, 2 *
《Applied Physics Letters》 20070627 Han S. Uhm et al. Sterilization of bacterial endospores by an atmospheric-pressure argon plasma jet 261501-1~261501-3 1-6 第90卷, 2 *

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102510654A (en) * 2011-10-18 2012-06-20 大连理工大学 Atmospheric-pulse-modulated microwave plasma generation device
CN102387654A (en) * 2011-10-29 2012-03-21 大连理工大学 Microscale low-temperature plasma jet generating device of atmospheric pressure
CN102883515A (en) * 2012-09-24 2013-01-16 西安交通大学 Array device of atmospheric pressure flat dielectric barrier plasma jet discharge
CN103776818A (en) * 2013-12-26 2014-05-07 四川大学 Glow discharge-based plasma generator and spectrum detection system formed by same
CN103776818B (en) * 2013-12-26 2016-06-08 四川大学 Spectral detection system based on the plasma producing apparatus of glow discharge and composition
CN103841741A (en) * 2014-03-12 2014-06-04 中国科学院电工研究所 Barometric pressure plasma generator based on dielectric barrier discharge
CN105722339A (en) * 2016-02-29 2016-06-29 江西合力泰科技有限公司 Metal ring mounting method for biological recognition module
TWI788034B (en) * 2020-12-07 2022-12-21 日商東芝三菱電機產業系統股份有限公司 Active gas generation apparatus

Also Published As

Publication number Publication date
CN101835339B (en) 2012-05-23

Similar Documents

Publication Publication Date Title
CN101835339B (en) Panel electrode radio-frequency capacitance coupling argon-oxygen/argon-nitrogen plasma generator under constant pressure
CN102427653B (en) Atmospheric non-equilibrium plasma source for introducing mini-glow discharge mode
TW200721273A (en) Plasma processing equipment, plasma processing method, dielectric window for use therein and method for producing the same
CN100358198C (en) Method for uniform glow discharge in atmosphere air
CN103841741A (en) Barometric pressure plasma generator based on dielectric barrier discharge
CN204469510U (en) A kind of low-temperature plasma emission-control equipment
CN207638962U (en) The enhanced direct current alternating electrode low-temperature plasma jet array of atmospheric dielectric barrier discharge
CN103442509A (en) Reciprocating type multi-ionization-cavity atmospheric-pressure unbalance plasma reactor
CN205071427U (en) Simple and easy atmospheric pressure cold plasma generator
US8438989B2 (en) Surface feed-in electrodes for deposition of thin film solar cell and signal feed-in method thereof
CN101998747A (en) Low-temperature plasma device
CN103143245A (en) Louver type large-area cold plasma exhaust gas processing device
CN107979907A (en) The enhanced direct current alternating electrode low-temperature plasma jet array of atmospheric dielectric barrier discharge
CN203407057U (en) Dielectric-barrier-enhancement-type multi-electrode glow discharge low-temperature plasma brush array generator
CN102560426B (en) Automatic circulation plasma vapor phase deposition system
CN204539603U (en) Atmospheric pressure discharges cold plasma generator
CN207243464U (en) A kind of integrated ozone electric discharge device
CN202841676U (en) Linear array type atmospheric pressure cold plasma jet generating device
CN107088362A (en) A kind of plasma body cooperative catalytic treatment VOCs reactor
CN106957048B (en) Stack type cascading efficient ozone generating device and application thereof
CN109119322B (en) Magnetic enhanced plasma source
CN205491411U (en) Developments parallel -plate plasma generator
CN105555002A (en) Dynamic parallel-plate plasma generator
CN202269086U (en) Plasma gas generator
CN2870385Y (en) Large-area flat-board normal-pressure radio-frequency cold plasma discharge apparatus

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20120523

Termination date: 20150520

EXPY Termination of patent right or utility model