CN101648368B - Precise polishing cloth and preparation method thereof - Google Patents
Precise polishing cloth and preparation method thereof Download PDFInfo
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- CN101648368B CN101648368B CN2009100922198A CN200910092219A CN101648368B CN 101648368 B CN101648368 B CN 101648368B CN 2009100922198 A CN2009100922198 A CN 2009100922198A CN 200910092219 A CN200910092219 A CN 200910092219A CN 101648368 B CN101648368 B CN 101648368B
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Abstract
The invention discloses precise polishing cloth and a preparation method thereof. The polishing cloth comprises a cloth base; the cloth base is made of woven cloth material; the surface of the cloth base is provided with a concave pit woven by meridional yarns and zonal yarns and is also provided with a grinding coating formed by coating grinding slurry with grinding micro-powder and the grinding coating is provided with a scrap containing pit which corresponds to the concave pit on the surface of the cloth base. The soft and bouncy cloth base is used as a bottom material and the grinding coating on the surface of the cloth base has the scrap containing pit which has the function of collecting grinding scraps produced in the grinding process. The polishing cloth is used for cleaning a base plate before bonding a polaroid in the process of making Cell of TFT-LCD, and can effectively remove impurities such as glass scraps, remnant glue, oil damage and the like on the surface of the base plate; meanwhile, the grinding scraps produced in the grinding process can be stored in the scrap containing pit, thereby avoiding scratching the glass base plate and meeting the requirements on finished product rate and production efficiency.
Description
Technical field
The present invention relates to the preparation method of a kind of precise polishing cloth and this polishing cloth thereof, this polishing cloth is used for the clean of the substrate surface before Thin Film Transistor-LCD TFT-LCD processing procedure polaroid attaches.
Background technology
LCD (LCD) is used widely in recent years, and TV, mobile phone, notebook computer, camera or the like all adopt LCD, LCD to be deep into our various fields in life.The present most significant end of LCD to belong to Thin Film Transistor-LCD; Be TFT-LCD; Such display has light, low in energy consumption, high color fidelity, high brightness, high-contrast; High response speed, being easy to integrated and advantage such as update, is the perfect adaptation of large-scale semiconductive integrated circuit technique and light source technology.In the manufacture process of TFT-LCD; One of them operation is called the Cell processing procedure; In the Cell processing procedure; Liquid crystal filling, seal, after the cutting, edging, substrate surface can stay impurity such as obstinate chips of glass, sealing compound, oil stain, these impurity must clean up before polaroid attaches follow-up carrying out.Early stage adopt that non-dust cloth wiping, blade are scraped etc. manual mode is removed, efficient is very low, and scratches glass substrate easily, can not satisfy the production needs that advanced lines produces line.In recent years, TFT-LCD manufacturers such as Japan, Taiwan adopt these impurity on the abrasive method clean substrate one after another, and are highly efficient in productivity.That uses at present mainly contains two kinds of grinding-materials: a kind ofly grind cleaning with polyester film as the sand belt of base material; Grinding efficiency is high; But because polyester film is harder; The chips of glass that grinds, blob of viscose etc. are mixed between sand belt and the glass substrate, cause the scuffing of glass substrate easily, influence the yield rate of product; Another kind is to be that ground is made sand belt with the urethane pad, and the grinding yield rate is better, but grinding efficiency is lower slightly.
Summary of the invention
The present invention is directed to the defective or the deficiency that exist in the prior art; The preparation method of a kind of precise polishing cloth and this polishing cloth thereof is provided; The clean that this polishing cloth is used for the Cell processing procedure polaroid attaching prebasal plate of TFT-LCD; Can remove the impurity such as chips of glass, cull, oil stain of substrate surface effectively, avoid again glass substrate is caused scuffing simultaneously.
Goal of the invention of the present invention realizes through following technical scheme:
A kind of precise polishing cloth; Comprise fabricbase, it is characterized in that said fabricbase adopts knitted or woven fabrics; The cloth primary surface has the pit that is formed by warp yarn and weft yams braiding; On said cloth primary surface, have the formed abrasive coating of ground slurry that has abrasive micropowder through coating, said abrasive coating has the bits of appearance hole, and said appearance bits hole is corresponding with the pit of said cloth primary surface.
Blade coating or roller coat or spraying are adopted in said coating; Said ground slurry is the mixture that comprises said abrasive micropowder and adhesive, solvent and curing agent.
Said abrasive micropowder is diamond or carborundum or aluminium oxide or cerium oxide or silica, and particle diameter is the 0.1-30 micron.
The fibre diameter of said fabricbase is 3～20 microns.
The thread density of said fabricbase is 23～49 pieces/centimetre
2
The preparation method of above-mentioned precise polishing cloth is characterized in that may further comprise the steps: abrasive micropowder and adhesive, solvent is even, add curing agent again, and make ground slurry; Ground slurry is coated the cloth primary surface; Form abrasive coating through cured again.
The median particle diameter of said abrasive micropowder is 0.1～20 micron.
Said adhesive refers to: the mixture of one or more in phenolic resins, polyurethane resin, alkyd resins, epoxy resin, acrylate, polyvinyl alcohol, carboxymethyl cellulose, urea-formaldehyde resin, polyether resin, the mylar; Described solvent is: the mixture of one or more in ethyl acetate, ether, benzinum, toluene, methyl alcohol, ethanol, isopropyl alcohol, butanone, cyclohexanone, chloroform, the oxolane or water.
Said curing agent refers to one or more the mixture in PIC, polyamide, acid anhydrides, the polyamine.
Described cured was meant polishing cloth after the dry road of coating machine drying, 40～150 ℃ of held 5～60 hours.
Technique effect of the present invention is following: precise polishing cloth of the present invention is a ground with the whippy fabricbase of softness; The cloth primary surface itself has the pit that is formed by warp yarn and weft yams braiding; Formed rough surface; Therefore on the cloth primary surface, during the coated abrasive coating, make abrasive coating, have the function of collecting the abrasive dust that produces when grinding holding the bits hole with corresponding local formation of the pit of cloth primary surface.During grinding, soft whippy fabricbase is good to the attaching property of glass substrate, through the grinding of precise finiss micro mist, can remove the impurity such as chips of glass, cull, oil stain of substrate surface effectively; Grind the abrasive dust that produces simultaneously and can be stored in place, appearance bits hole, thereby avoid glass substrate is caused scuffing, both satisfied the requirement of yield rate, can satisfy the requirement of production efficiency again.
Description of drawings
Fig. 1 is a structural representation of the present invention.
Reference numeral is listed as follows: 1-abrasive coating, 2-hold the bits hole, 3-fabricbase weft yams, and the 4-fabricbase is yarn radially, 5-fabricbase pit, 6-abrasive micropowder.
The specific embodiment
Below in conjunction with accompanying drawing the present invention is described further:
As shown in Figure 1; A kind of precise polishing cloth, said polishing cloth comprises fabricbase, fabricbase adopts knitted or woven fabrics; The cloth primary surface has by warp yarn 4 pit 5 that 3 braidings form with weft yams; Coating has the formed abrasive coating 1 of ground slurry of abrasive micropowder 6 on the cloth primary surface, and said abrasive coating has the bits of appearance hole 2, and appearance bits hole 2 is corresponding with the position of the pit 5 of cloth primary surface.
Wherein, blade coating or roller coat or spraying are adopted in coating; Ground slurry is the mixture that comprises abrasive micropowder and adhesive, solvent and curing agent; Abrasive micropowder is mainly diamond or carborundum or aluminium oxide or cerium oxide or silica, and particle diameter is the 0.1-30 micron; Fabricbase is meant by a kind of in terylene, polyamide fibre, spandex, polypropylene fibre, the viscose glue or lining that their blending are processed.The fibre diameter of fabricbase is 3～20 microns, is preferably 5～15 microns; The thread density of fabricbase is 23～49 pieces/centimetre
2(150～320 pieces/inch
2), preferably radially yarn density is that 39～102 pieces/centimetre (100～260 pieces/inch) or broadwise yarn density are 23～86 pieces/centimetre (60～220 pieces/inch).
The preparation method of precise polishing cloth may further comprise the steps: abrasive micropowder and adhesive, solvent is even, add curing agent again, and make ground slurry; Ground slurry is coated the cloth primary surface; Form abrasive coating through cured again.
Wherein, the median particle diameter of abrasive micropowder is 0.1～20 micron; Adhesive refers to: the mixture of one or more in phenolic resins, polyurethane resin, alkyd resins, epoxy resin, acrylate, polyvinyl alcohol, carboxymethyl cellulose, urea-formaldehyde resin, polyether resin, the mylar; Solvent refers to: the mixture of one or more in ethyl acetate, ether, benzinum, toluene, methyl alcohol, ethanol, isopropyl alcohol, butanone, cyclohexanone, chloroform, the oxolane, and except that above-mentioned organic solvent, described solvent can also be a water; Curing agent refers to one or more the mixture in PIC, polyamide, acid anhydrides, the polyamine; The solid content of said ground slurry is preferably 10～90%, and the ratio of abrasive micropowder and adhesive is preferably 1: 9～and 9: 1; The method of described coating is meant: blade coating or roller coat or spraying; Described cured was meant polishing cloth after the dry road of coating machine drying, 40～150 ℃ of held 5～60 hours.So that adhesive fully reacts, obtain the good mechanical performance.In addition, as required, in ground slurry, add an amount of additive, said additive is meant one or more the mixture in coupling agent, plasticizer, antistatic additive, wetting agent, dispersant, the scratch resistance agent.
Embodiment 1
In the slurry bucket, add the 200g median particle diameter successively and be 6 microns alumina powder, the 4000g solid content is 50% mylar, 3000g mixed solvent (containing ethyl acetate, toluene, butanone); 20g antistatic additive, 20g dispersant; High-speed stirred was disperseed 10 minutes, added 5000g polyisocyanate curing agent (the new photochemical factory in Shanghai) then, and stirring makes ground slurry; Ground slurry is coated on the cloth primary surface, solidified 24 hours down at 130 ℃.
Embodiment 2
In the slurry bucket, add the 200g median particle diameter successively and be 6 microns alumina powder, the 3000g solid content is 40% mylar, 3000g mixed solvent (containing ethyl acetate, toluene, butanone); 30g antistatic additive, 30g dispersant; High-speed stirred was disperseed 10 minutes, added 4000g polyisocyanate curing agent (the new photochemical factory in Shanghai) then, and stirring makes ground slurry; Slurry is coated on the cloth primary surface, solidified 30 hours down at 130 ℃.
Embodiment 3
In the slurry bucket, add the 200g median particle diameter successively and be 3 microns alumina powder, the 4000g solid content is 50% mylar; 3000g mixed solvent (containing ethyl acetate, toluene, butanone), 20g antistatic additive, 20g dispersant, high-speed stirred was disperseed 10 minutes; Add 5000g polyisocyanate curing agent (the new photochemical factory in Shanghai) then; Stirring makes ground slurry, slurry is coated with is attached to the cloth primary surface, solidifies 30 hours down at 130 ℃.
Should be pointed out that the above specific embodiment can make those skilled in the art more fully understand the invention, but do not limit the present invention in any way creation.Therefore, although this specification has carried out detailed explanation with reference to accompanying drawing and embodiment to the invention,, it will be appreciated by those skilled in the art that still and can make amendment or be equal to replacement the invention; And all do not break away from the technical scheme and the improvement thereof of the spirit and the scope of the utility model, and it all is encompassed in the middle of the protection domain of the invention patent.
Claims (10)
1. precise polishing cloth; Comprise fabricbase, it is characterized in that said fabricbase adopts knitted or woven fabrics; Said cloth primary surface has the pit that is formed by warp yarn and weft yams braiding; On said cloth primary surface, have the formed abrasive coating of ground slurry that has abrasive micropowder through coating, said abrasive coating has the bits of appearance hole, and said appearance bits hole is corresponding with the pit of said cloth primary surface.
2. precise polishing cloth according to claim 1 is characterized in that, blade coating or roller coat or spraying are adopted in said coating; Said ground slurry is the mixture that comprises said abrasive micropowder and adhesive, solvent and curing agent.
3. precise polishing cloth according to claim 1 is characterized in that, said abrasive micropowder is diamond or carborundum or aluminium oxide or cerium oxide or silica, and particle diameter is the 0.1-30 micron.
4. precise polishing cloth according to claim 1 is characterized in that, the fibre diameter of said fabricbase is 3～20 microns.
5. precise polishing cloth according to claim 1 is characterized in that, the thread density of said fabricbase is 23～49 pieces/centimetre
2
6. preparation method like the described precise polishing cloth of one of claim 1 to 5 is characterized in that may further comprise the steps: abrasive micropowder and adhesive, solvent is even, add curing agent again, and make ground slurry; Ground slurry is coated the cloth primary surface; Form abrasive coating through cured again, said abrasive coating has the bits of appearance hole, and said appearance bits hole is corresponding with the pit of said cloth primary surface.
7. the preparation method of precise polishing cloth according to claim 6, the median particle diameter that it is characterized in that said abrasive micropowder is 0.1～20 micron.
8. the preparation method of precise polishing cloth according to claim 6 is characterized in that said adhesive refers to: the mixture of one or more in phenolic resins, polyurethane resin, alkyd resins, epoxy resin, acrylate, polyvinyl alcohol, carboxymethyl cellulose, urea-formaldehyde resin, polyether resin, the mylar; Described solvent refers to: the mixture of one or more in ethyl acetate, ether, benzinum, toluene, methyl alcohol, ethanol, isopropyl alcohol, butanone, cyclohexanone, chloroform, the oxolane or water.
9. the preparation method of precise polishing cloth according to claim 6 is characterized in that said curing agent refers to one or more the mixture in PIC, polyamide, acid anhydrides, the polyamine.
10. the preparation method of precise polishing cloth according to claim 6 is characterized in that described cured is meant polishing cloth after the dry road of coating machine drying, 40～150 ℃ of held 5～60 hours.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009100922198A CN101648368B (en) | 2009-09-07 | 2009-09-07 | Precise polishing cloth and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009100922198A CN101648368B (en) | 2009-09-07 | 2009-09-07 | Precise polishing cloth and preparation method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101648368A CN101648368A (en) | 2010-02-17 |
| CN101648368B true CN101648368B (en) | 2012-08-08 |
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|---|---|---|---|
| CN2009100922198A Active CN101648368B (en) | 2009-09-07 | 2009-09-07 | Precise polishing cloth and preparation method thereof |
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Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012092618A2 (en) * | 2010-12-30 | 2012-07-05 | Saint-Gobain Abrasives, Inc. | Imide cross-linked binders for abrasive articles |
| CN104385120B (en) * | 2014-10-16 | 2017-06-30 | 中国科学院化学研究所 | The preparation method of polyurethane polishing pad |
| CN105671963B (en) * | 2016-02-24 | 2018-05-01 | 无锡旺绿鸿纺织品有限公司 | The manufacturing process of polishing cloth |
| CN107459627A (en) * | 2017-07-26 | 2017-12-12 | 无锡旺绿鸿纺织品有限公司 | For the preparation method and applications for the aqueous epoxy resins for manufacturing polishing cloth |
| CN110640642A (en) * | 2019-10-23 | 2020-01-03 | 中山巨赫研磨科技有限公司 | Concave-convex abrasive cloth and preparation method thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB779358A (en) * | 1953-07-02 | 1957-07-17 | Bay State Abrasive Products Co | Flexible abrasive product |
| CN2614102Y (en) * | 2003-04-28 | 2004-05-05 | 金荣 | Double-sided mesh abrasive belt |
| CN101219530A (en) * | 2008-02-03 | 2008-07-16 | 北京国瑞升科技有限公司 | Granulation type pouncing paper, preparation method and application thereof |
-
2009
- 2009-09-07 CN CN2009100922198A patent/CN101648368B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB779358A (en) * | 1953-07-02 | 1957-07-17 | Bay State Abrasive Products Co | Flexible abrasive product |
| CN2614102Y (en) * | 2003-04-28 | 2004-05-05 | 金荣 | Double-sided mesh abrasive belt |
| CN101219530A (en) * | 2008-02-03 | 2008-07-16 | 北京国瑞升科技有限公司 | Granulation type pouncing paper, preparation method and application thereof |
Non-Patent Citations (2)
| Title |
|---|
| JP平1-310871A 1989.12.14 |
| JP特开平6-91546A 1994.04.05 |
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| CN101648368A (en) | 2010-02-17 |
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Owner name: BEIJING GRISH HITECH CO., LTD. Free format text: FORMER NAME: BEIJING GUORUI SCIENCE AND TECHNOLOGY CO.,LTD. |
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Address after: 100085 Beijing, Haidian District, on the road to information on the ground floor, building 12, C402, C406 room, No. 1 Patentee after: BEIJING GRISH HITECH CO., LTD. Address before: 100085, Room 401, block C, Zhongguancun development building, No. 12 information road, Beijing, Haidian District Patentee before: Beijing Grish Hitech Co., Ltd. |