CN101592537B - Device and method for measuring stress of optical glass - Google Patents
Device and method for measuring stress of optical glass Download PDFInfo
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- CN101592537B CN101592537B CN 200910304198 CN200910304198A CN101592537B CN 101592537 B CN101592537 B CN 101592537B CN 200910304198 CN200910304198 CN 200910304198 CN 200910304198 A CN200910304198 A CN 200910304198A CN 101592537 B CN101592537 B CN 101592537B
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Abstract
The invention provides a stress measuring device with higher precision, which can measure the size, direction and distribution of the stress of optical glass. The stress measuring device of the optical glass comprises a communicated light path interferometer and a stander, wherein the stander comprises a frame and a plane scanning test platform arranged on the frame; and a laser receiving unit and a laser emitting unit of the communicated light path interferometer are arranged on the stander, and can synchronously move front and back, and up and down. The stress measuring device achieves the quantitive measurement of the stress size and the stress uniformity of the optical glass; in addition, the precision is greatly improved, the resolution reaches 0.01nm, and the size of the measurable optical glass is greatly widened. The stress measuring device can better measure the stress optical coefficient of the optical glass; and compared with the other polarized stress meter measuring devices with weight application, the measuring precisions of the pressure and the stress of load are obviously improved, and the measuring precision of the stress optical coefficient can reach 0.03*10<-12>/Pa.
Description
Technical field
The present invention relates to a kind of stress of optical glass device and method, particularly relate to the higher devices and methods therefor that optical glass stress and stress homogeneity are distributed and measure of a kind of precision.
Background technology
Generally; Because the isotropic optical glass of the inhomogeneous feasible script of optical glass internal temperature produces internal stress; Show the birefringent phenomenon of similar crystal; Be about to a branch of polarized light and be decomposed into two bundle orthogonal o light of direction of vibration and e light, and both refractive indexes in this optical glass are also different, form phasic difference (optical path difference) after the outgoing.The existence of this birefringent light path difference; Shown that there is stress in optical glass inside; The excessive cold working that then is unfavorable for perspective of stress; And this birefringent light path difference all there are differences on the logical light face of optical glass everywhere, has shown the inhomogeneous of optical glass internal stress distribution, makes the quality of optical imaging variation.Therefore the stress and the Determination of distribution thereof of optical glass just seem particularly important.
The stress determination of optical glass at present mainly also is to use the polarisation stress ga(u)ge; Some has added quarter-wave plate; Can directly read the optical path difference data of stress birefrin; But its precision is limited, the very little optical glass of less or logical optical thickness especially for stress, and its error at measurment is bigger.
It is the common light path interferometer of principle that a kind of light heterodyne method that adopts has appearred in present field tests at glass sheet and optical thin film; As shown in Figure 1; This common light path interferometer sends laser by stablizing transverse zeeman laser 1; Through being divided into two-way behind the semi-transparent semi-reflecting lens 2, one road transmitted light obtains through rotation half-wave plate 3 synchronously, optical glass sample 4, first polaroid 5, first laser detector 6 successively and sends into the position behind the signal and count 7 mutually; Another road reflected light obtains through second polaroid 10, second laser detector 11 and also sends into the position behind the signal and count 7 mutually; Count 7 mutually through A/D converter 8 input computing machines 9 by the position; Calculate the phasic difference of former and later two signals; The phasic difference that produces when being this wavelength laser through optical glass sample 4, also can find the position angle of corresponding fast axle through synchronous rotation half-wave plate 3 with polaroid 5 simultaneously is stress direction.Because being divided into two-way, the light path of this interferometer forms the heterodyne form; Vibrations in the surrounding environment and interference in air flow are consistent to the influence of two light paths; Two signals are done the influence that difference can be eliminated the external environment factor after relatively, and its measuring speed is fast, measuring accuracy is high.
Mostly the measurement of the stress distribution of optical glass is observational measurement at present, and the stress distribution situation of the optical glass that the polarisation stress ga(u)ge can only the qualitative determination reduced size; And for large-aperture optical glass; Though the stress distribution situation that the concave mirror reflectometry can come qualitative determination large-aperture optical glass through the method that increases the concave mirror bore; But bigbore concave mirror will cause whole optical system for testing to become very long; Take the huge test space; And along with the increase of the test space, it is more and more obvious that the interference of environment also can become, and above two kinds of methods all can't or be difficult to determine the stress direction and the distribution thereof of large-aperture optical glass.
Summary of the invention
Technical matters to be solved by this invention provides the higher stress measurement device of a kind of precision, stress intensity, direction and distribution that can quantitative measurement optical glass.
The present invention also will provide a kind of measuring method of said apparatus.
The technical scheme that technical solution problem of the present invention is adopted is: the stress of optical glass device; Comprise common light path interferometer; Also comprise frame; Said frame comprises a framework and is arranged on the surface sweeping test platform on the framework that the laser pick-off unit and the laser emission element of said common light path interferometer are installed on the said frame, and laser pick-off unit and laser emission element can move forward and backward and move up and down synchronously.
Further, the stable transverse zeeman laser in the said common light path interferometer, semi-transparent semi-reflecting lens, rotate half-wave plate, second polaroid, second laser detector synchronously and be placed in the laser emission element; First polaroid, first laser detector are placed in the laser pick-off unit.
Further; Said framework is made up of two horizontal drive lead screws and four columns; Two horizontal drive lead screws are parallel to each other; And keep vertical with four columns, and said four columns are slide bars of lower slider in vertical direction, said laser emission element and laser pick-off unit are installed in respectively on two horizontal drive lead screws and four columns.
Further, the photoelastic coefficient measurement mechanism is installed on said column.
Further; Said photoelastic coefficient device comprises photoelastic coefficient device frame, U type anchor clamps and pressure transducer; Said pressure transducer be arranged on U type anchor clamps directly over, said pressure transducer and U type anchor clamps are installed on the said photoelastic coefficient device frame through web member respectively.
Further, in said photoelastic coefficient device frame, be provided with screw mandrel moving up and down, can drive pressure transducer and U type anchor clamps moving up and down in opposite directions respectively.
The measuring method of stress of optical glass device may further comprise the steps:
1) the optical glass stress sample is placed on the sweep test platform; Set automatic scanner or manual scanning program on computers; Through moving forward and backward of two horizontal drive lead screws and sliding up and down of four columns; Drive the front and back of laser emission element and laser pick-off unit and move up and down, the optical glass stress sample is carried out point by point scanning;
2) position mutually meter receive behind the two paths of signals through the A/D converter light signal converted into behind the electric signal in the input computing machine; Computing machine carries out a series of corresponding calculation process; Calculate and demonstrate the stress birefringence optical path difference size and Orientation of each analyzing spot position, obtain the size and Orientation distribution situation of the stress on the logical optical cross-section of optical glass stress sample quantitatively.
Further; Above-mentioned steps 2 backs also have step 3) the photoelastic coefficient sample to be put into the U type anchor clamps of photoelastic coefficient device; Through the motor rotary screw; U type anchor clamps and top pressure transducer are moved from both direction up and down simultaneously in opposite directions; This two-part move toward one another will be to 2 generation pressure up and down of photoelastic coefficient sample, and this force value is read and sent to computing machine by pressure transducer, and then measures the numerical value of the stress intensity of photoelastic coefficient sample central point under the different loads according to the method for aforesaid step 1 and step 2; The data that form a lot of load pressure-optical path differences are right, can measure formula according to photoelastic coefficient and carry out data fitting and the final photoelastic coefficient that obtains the photoelastic coefficient sample.
Further, the machining precision of said photoelastic coefficient sample is: right cylinder sample side surface correct grinding, tapering are not more than 1/100, out-of-roundness is not more than 5/100, the logical light face depth of parallelism of right cylinder sample is not more than 1/100.
Further, the machining precision of said photoelastic coefficient sample is: thickness: 15 ± 0.1mm, diameter: 20 ± 0.1mm.
The invention has the beneficial effects as follows: the present invention has realized the quantitative measurment that optical glass stress size and stress homogeneity distribute; And precision is greatly improved, and resolution reaches 0.01nm, on test speed, is significantly improved simultaneously; But the photometry glass size is relaxed greatly; Especially move the characteristics of difficulty to large scale optical glass, reduce operation easier greatly, improved testing efficiency.The present invention also can well measure the photoelastic coefficient of optical glass; Having the polarisation stress ga(u)ge determinator that counterweight exerts pressure with other compares; The mensuration precision of load pressure and stress all is significantly improved, and the mensuration precision of photoelastic coefficient can reach ± 0.03 * 10-12/Pa.
Description of drawings
Fig. 1 is the synoptic diagram of common light path interferometer.
Fig. 2 is the front view of apparatus of the present invention.
Fig. 3 is the side view of Fig. 2.
Fig. 4 is the photoelastic coefficient schematic representation of apparatus.
Embodiment
Optical glass to be measured is processed two kinds of specimen, and a kind of is the optical glass stress sample 18 of measuring glass strain, and shape can be cuboid; As shown in Figure 2; Another kind is a photoelastic coefficient sample 22 of measuring the glass light elasticity coefficient, is shaped as right cylinder, and is as shown in Figure 4.
As shown in Figures 2 and 3; Device of the present invention is made up of common light path interferometer and frame; Wherein, the stable transverse zeeman laser 1 in the common light path interferometer, semi-transparent semi-reflecting lens 2, rotate half-wave plate 3, second polaroid 10, second laser detector 11 synchronously and be placed in the laser emission element 12; First polaroid 5, first laser detector 6 are placed in the laser pick-off unit 13, and the position counts 7 mutually, A/D converter 8 and computing machine 9 are placed on the optional position; Frame comprises a tetragonal body framework 14 and is arranged on the surface sweeping test platform 16 on the tetragonal body framework 14; Tetragonal body framework 14 is made up of two horizontal drive lead screws 15 and four columns; Two horizontal drive lead screws 15 of the right and left are parallel to each other; And it is vertical with four columns maintenances of frame; Laser emission element 12 and laser pick-off unit 13 are installed in respectively on two horizontal drive lead screws 15 and four columns, make the light source and first laser detector, 6 collimations in the laser pick-off unit 13 of stable transverse zeeman laser 1 emission in the laser emission element 12 also move forward and backward synchronously; Four columns are the slide bars of lower slider in vertical direction, make the light source of stable transverse zeeman laser 1 emission in the laser emission element 12 and first laser detector 6 in the laser pick-off unit 13 move up and down synchronously; Sweep test platform 16 is vertical with four columns, and its big I is made according to the size of optical glass stress sample 18.
In order to measure the photoelastic coefficient of optical glass; The present invention is installed in photoelastic coefficient device 17 on any column of four columns; As shown in Figure 3; Photoelastic coefficient device 17 comprises U type anchor clamps 19; The photoelastic coefficient sample 22 that is processed into behind the suitable shape is installed in the U type anchor clamps 19, pressure transducer 20 be arranged on U type anchor clamps 19 directly over, pressure transducer 20 is installed on the photoelastic coefficient device frame 21 of photoelastic coefficient device 17 through web member respectively with U type anchor clamps 19; In photoelastic coefficient device frame 21, be provided with screw mandrel moving up and down, can drive pressure transducer 20 and U type anchor clamps 19 moving up and down in opposite directions respectively by driven by motor.During measurement; Through the motor rotary screw; Make U type anchor clamps 19 and pressure transducer 20 simultaneously from both direction is mobile in opposite directions lentamente up and down; To being installed in 2 generation pressure up and down of the photoelastic coefficient sample 22 in the U type anchor clamps 19, measure corresponding stress birefringence optical path difference from photoelastic coefficient sample 22 central points simultaneously, can calculate the photoelastic coefficient of this sample according to the formula of disk compression method.
The machining precision of measuring the sample of photoelastic coefficient preferably guarantees: right cylinder sample side surface correct grinding, tapering are not more than 1/100, out-of-roundness is not more than 5/100, the logical light face depth of parallelism of right cylinder sample is not more than 1/100, thickness t is 15 ± 0.1mm, diameter of phi 20 ± 0.1mm.
Method for measuring stress of the present invention may further comprise the steps:
1) optical glass stress sample 18 is placed on the sweep test platform 16; On computing machine 9, set automatic scanner or manual scanning program; Through moving forward and backward of two horizontal drive lead screws 15 and sliding up and down of four columns; Drive the front and back and the same up and down moved further of laser emission element 12 and laser pick-off unit 13, the optical glass sample is carried out point by point scanning;
2) position is counted 7 mutually and is received behind the two paths of signals through A/D converter 8 light signal is converted into behind the electric signal in the input computing machine 9; Computing machine 9 carries out a series of corresponding calculation process; Calculate and demonstrate the stress birefringence optical path difference size and Orientation of each analyzing spot position, obtain the size and Orientation distribution situation of the stress on the optical glass stress sample 18 logical optical cross-sections quantitatively;
3) photoelastic coefficient sample 22 is put into the U type anchor clamps 19 of photoelastic coefficient device 17; Through the motor rotary screw; U type anchor clamps 19 and top pressure transducer 20 are moved from both direction up and down simultaneously lentamente in opposite directions; This two-part move toward one another will be little by little to sample up and down 2 produce pressure, and computing machine 9 read and sent to this force value can by pressure transducer 20.And then measure the numerical value of the stress intensity of photoelastic coefficient sample 22 central points under the different loads according to the method for aforesaid step 1 and step 2; The data that form a lot of load pressure-optical path differences are right; The data that collect some to after, can measure formula according to photoelastic coefficient and carry out data fitting and the final photoelastic coefficient that obtains photoelastic coefficient sample 22.
Claims (10)
1. stress of optical glass device; Comprise common light path interferometer; It is characterized in that, also comprise frame, said frame comprises a framework (14) and is arranged on the surface sweeping test platform (16) on the framework (14); The laser pick-off unit (13) and the laser emission element (12) of said common light path interferometer are installed on the said frame, and laser pick-off unit (13) and laser emission element (12) can move forward and backward and move up and down synchronously.
2. stress of optical glass device as claimed in claim 1; It is characterized in that, the stable transverse zeeman laser (1) in the said common light path interferometer, semi-transparent semi-reflecting lens (2), rotate half-wave plate (3), second polaroid (10), second laser detector (11) synchronously and be placed in the laser emission element (12); First polaroid (5), first laser detector (6) are placed in the laser pick-off unit (13).
3. according to claim 1 or claim 2 stress of optical glass device; It is characterized in that; Said framework (14) is made up of two horizontal drive lead screws (15) and four columns, and two horizontal drive lead screws (15) are parallel to each other, and keeps vertical with four columns; Said four columns are slide bars of lower slider in vertical direction, and said laser emission element (12) and laser pick-off unit (13) are installed in respectively on two horizontal drive lead screws (15) and four columns.
4. stress of optical glass device as claimed in claim 3 is characterized in that, photoelastic coefficient device (17) is installed on said column.
5. stress of optical glass device as claimed in claim 4; It is characterized in that; Said photoelastic coefficient device (17) comprises photoelastic coefficient device frame (21), U type anchor clamps (19) and pressure transducer (20); Said pressure transducer (20) be arranged on U type anchor clamps (19) directly over, said pressure transducer (20) and U type anchor clamps (19) are installed on the said photoelastic coefficient device frame (21) through web member respectively.
6. stress of optical glass device as claimed in claim 5 is characterized in that, in said photoelastic coefficient device frame (21), is provided with screw mandrel moving up and down, can drive pressure transducer (20) and U type anchor clamps (19) moving up and down in opposite directions respectively.
7. the measuring method of stress of optical glass device is characterized in that, may further comprise the steps:
1) optical glass stress sample (18) is placed on the sweep test platform (16); On computing machine (9), set automatic scanner or manual scanning program; Through moving forward and backward of two horizontal drive lead screws (15) and sliding up and down of four columns; Drive the front and back of laser emission element (12) and laser pick-off unit (13) and move up and down, optical glass stress sample (18) is carried out point by point scanning;
2) position mutually meter (7) receive behind the two paths of signals and to import in the computing machine (9) after converting light signal into electric signal through A/D converter (8); Computing machine (9) carries out a series of corresponding calculation process; Calculate and demonstrate the stress birefringence optical path difference size and Orientation of each analyzing spot position, obtain the size and Orientation distribution situation of the stress on the logical optical cross-section of optical glass stress sample (18) quantitatively.
8. the measuring method of stress of optical glass device as claimed in claim 7; It is characterized in that; Above-mentioned steps 2) back also has step 3) photoelastic coefficient sample (22) to be put into the U type anchor clamps (19) of photoelastic coefficient device (17); Through the motor rotary screw; U type anchor clamps (19) and top pressure transducer (20) are moved from both direction up and down simultaneously in opposite directions; This two-part move toward one another will to photoelastic coefficient sample (22) up and down 2 produce pressure, computing machine (9) is read and sent to this force value by pressure transducer (20), and then according to aforesaid step 1) and step 2) method mensuration different loads under the numerical value of stress intensity of photoelastic coefficient sample (22) central point; The data that form a lot of load pressure-optical path differences are right, can measure formula according to photoelastic coefficient and carry out data fitting and the final photoelastic coefficient that obtains photoelastic coefficient sample (22).
9. the measuring method of stress of optical glass device as claimed in claim 8; It is characterized in that the machining precision of said photoelastic coefficient sample (22) is: right cylinder sample side surface correct grinding, tapering are not more than 1/100, out-of-roundness is not more than 5/100, the logical light face depth of parallelism of right cylinder sample is not more than 1/100.
10. the measuring method of stress of optical glass device as claimed in claim 9 is characterized in that, the machining precision of said photoelastic coefficient sample (22) is: thickness: 15 ± 0.1mm, diameter: 20 ± 0.1mm.
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| CN 200910304198 CN101592537B (en) | 2009-07-10 | 2009-07-10 | Device and method for measuring stress of optical glass |
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| CN 200910304198 CN101592537B (en) | 2009-07-10 | 2009-07-10 | Device and method for measuring stress of optical glass |
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