CN101172573A - Silver nano-grain array mould plate and preparation method thereof - Google Patents
Silver nano-grain array mould plate and preparation method thereof Download PDFInfo
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- CN101172573A CN101172573A CNA2006100164238A CN200610016423A CN101172573A CN 101172573 A CN101172573 A CN 101172573A CN A2006100164238 A CNA2006100164238 A CN A2006100164238A CN 200610016423 A CN200610016423 A CN 200610016423A CN 101172573 A CN101172573 A CN 101172573A
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- array mould
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Abstract
The invention discloses a silver nm particle array template, which is prepared by a self assembling method. The average size of the silver nmo particles is 10 to 500 nm, and the density is 10 <8> to 10 <12> / cm <2>. The invention also discloses a preparation method of the silver nm particle array template, and the process steps are as follows: step one, a layer of uniform silver film is deposited on a base plate by using vacuum deposition film equipment; step two, discrete nm particles are formed to the deposit silver film through heat annealing process, therefore, the silver nm particle array template distributed at random can be prepared. The invention has the advantages that the silver template is prepared with the self assembling method, the average size of the silver nm particles is 10 to 500 nm, the density is 10 <8> to 10 <12> / cm <2>, and the size and the density of the nm particles can be controlled by the thickness of the silver film; the preparation method is simple, the operation is easy, and the cost is low; the silver template has the advantages of high density and random distribution, thereby being helpful to the design and the production of the device products of magnetic recording media, and flat field emitters and so on.
Description
(1) technical field:
The present invention relates to a kind of nano-grain array mould plate and preparation method thereof, particularly a kind of silver nano-grain array mould plate and preparation method thereof.
(2) background technology:
Because nanostructured has many novel physical, chemical characteristic, after it planar lines up array according to certain rule, has broad application prospects in fields such as magnetic storage, array electronic device, detectors.The two dimension assembling and the controllability growth that how to realize nanostructure are the keys of preparation, and the method for constructing this two-dimensional nanostructure array mainly contains nanoprocessing method, self-assembly method, template etc.The nanoprocessing method is to utilize pre-designed dot pattern gated sweep probe or FIB to process one by one, for example scan-probe assistant depositing or etching, FIB (FIB) and electron beam processing etc.; This method has controllability preferably to yardstick, shape and the arrangement of nanostructured, but prepares a very consuming time and effort of nano-structure array in this way, realizes that the cost of large-area nano array of structures preparation is higher.Self-assembly method be a kind of comparatively simple, in substrate surface preparation method from bottom to top, its reticular density, unit yardstick can be controlled by assembling condition within the specific limits; Compare with the nanoprocessing method, its technology is simple, be applicable to large-area preparation; But its lattice type is generally random arrangement or shortrange order, generally is applied to fields such as magnetic recording media, flat field transmitter.Template is meant that the nano-structure array that utilizes nanoprocessing method or self-assembly method to make is template, makes another nano-structure array in conjunction with other technologies of preparing; Many nano-structure arrays that utilize self-assembly method to make all have been used as template, as polystyrene ball array, porous anodized aluminum film, cellular glass, the poly-carbonic acid film of ion(ic) etching etc.; Template generally comprises two kinds of patterns: a kind of is template confinement growth, another kind is to utilize mask plate to realize that in conjunction with lithographic technique the processing of object construction and the figure of template shift, the latter is a kind of in the top-down preparation method of substrate surface, and this method also can realize the batch duplicating of template graphics further combined with nanometer embossing.Research to method for preparing template at present is subject to people's attention day by day.
By vacuum-deposited nanometer grade thickness metallic film is carried out The high temperature anneal, film is dissolved and be recrystallized, form the self-assembling nanoparticles array of random arrangement.The diameter of this nano particle distributes within the specific limits, and average diameter and reticular density can be controlled by the thickness of deposit film, and along with reducing of film thickness, average diameter diminishes simultaneously that reticular density increases.But whether this nano-grain array can be used as template, prepares other nano-structure arrays in conjunction with lithographic technique, yet there are no the correlative study report.
(3) summary of the invention:
The objective of the invention is provides a kind of silver nano-grain array mould plate and preparation method thereof at above-mentioned technology status.
Technical scheme of the present invention:
A kind of silver nano-grain array mould plate utilizes the self-assembly method preparation, and it is characterized in that: the mean size of silver nano-grain is 10～500nm, density 10
8～10
12/ cm
2, and the size of particle and density can be by silver-colored film thickness controls.
A kind of preparation method of above-mentioned silver nano-grain array mould plate is characterized in that processing step is as follows: 1) utilize vacuum deposition film equipment, deposition layer of even silver film on substrate; 2) make the silver-colored film of deposition form discrete nano particle by thermal anneal process, can make the silver nano-grain array mould plate of random arrangement.
A kind of preparation method of above-mentioned silver nano-grain array mould plate is characterized in that: vacuum deposition film equipment is ion beam sputtering instrument, magnetic control sputtering device, vacuum thermal evaporation instrument or electron beam evaporation instrument.
A kind of preparation method of above-mentioned silver nano-grain array mould plate is characterized in that: base material is silicon, silica or simple glass.
A kind of preparation method of above-mentioned silver nano-grain array mould plate is characterized in that: deposition Ag film thickness is 2～100nm.
A kind of preparation method of above-mentioned silver nano-grain array mould plate is characterized in that: thermal anneal process is in vacuum or has under the protective gas atmosphere and carry out that protective gas is hydrogen, nitrogen or argon gas.
A kind of preparation method of above-mentioned silver nano-grain array mould plate is characterized in that: the thermal annealing temperature is 300～600 ℃, and annealing time is 0.5～1 hour.
Advantage of the present invention is: silver-colored template adopts the self-assembly method preparation, and the mean size of nano particle is 10～500nm, density 10
8～10
12/ cm
2, and the size of particle and density can be by silver-colored film thickness controls; The preparation method is simple, easy operating, cost are low; The silver nano-grain array mould plate that this law makes has the characteristics of high density, random arrangement, helps designing and producing of device products such as magnetic recording media, flat field transmitter, has range of application comparatively widely.
(4) specific embodiment:
Embodiment 1: a kind of self-assembly method prepares the method for silver nano-grain template, and its processing step is as follows: 1) utilize magnetic control sputtering device, and deposition one deck silver film on the Si substrate, thickness is 8nm; 2) make the silver-colored film of deposition form discrete nano particle by thermal anneal process, thermal anneal process is carried out under the atmosphere of high pure nitrogen protection, and annealing temperature is 300 ℃, and annealing time 0.5 hour can make the silver nano-grain template of random arrangement.It is tested with AFM, and test result shows that the latticed form of silver-colored particle is a random alignment, and average diameter of particles is 60nm, and maximum gauge is 100nm, and density is 7.8 * 10
9Individual/cm
2
Embodiment 2: a kind of self-assembly method prepares the method for silver nano-grain template, and its processing step is as follows: 1) utilize magnetic control sputtering device, at SiO
2Deposition one deck silver film on the substrate, thickness is 8nm; 2) under vacuum environment, anneal and obtain SiO
2The silver nano-grain template on surface, annealing temperature is 600 ℃, annealing time 1 hour can make the silver nano-grain template of random arrangement.It is tested with AFM, and test result shows that the latticed form of silver-colored particle is a random alignment, and average diameter of particles is 60nm, and maximum gauge is 120nm, and density is 7.7 * 10
9Individual/cm
2
Embodiment 3: a kind of self-assembly method prepares the method for silver nano-grain template, and its processing step is as follows: 1) utilize the vacuum thermal evaporation instrument, and deposition one deck silver film on common glass substrates, thickness is 4nm; 2) make the silver-colored film of deposition form discrete nano particle by thermal anneal process, thermal anneal process is carried out under the atmosphere of high-purity argon gas protection, and annealing temperature is 300 ℃, and annealing time 45 minutes can make the silver nano-grain template of random arrangement.It is tested with AFM, and test result shows that the latticed form of silver-colored particle is a random alignment, and the particle particle diameter is less than 50nm, and density is 5 * 10
10Individual/cm
2, comparing among this silver template and embodiment 1 and the embodiment 2 has the density of littler diameter and Geng Gao, shows that the yardstick of particle and density can be controlled by film thickness.
Be the practicality of validation template, utilize reactive ion etching equipment that the silver-colored particle figure of random arrangement is carved to glass basic surface, etching adopts anisotropic plasma, and working gas is CF
4, etching air pressure is 2.4Pa, and power is 100W, and the time is 5 minutes; Be that 10% dilute nitric acid solution is removed Ag with concentration at last, can obtain nano-structure array at glass surface with identical lattice type and density.It is tested with AFM, and test result shows: the glass surface cylindricality nanostructured average height of gained is 15nm, has and the identical latticed form of initial silver-colored template, and the diameter of column construction is no more than 60nm, and density is 5.1 * 10
10Individual/cm
2, with initial silver-colored particle basically identical.The result of embodiment 3 shows: the silver nano-grain that is made by thermal anneal process silver film has resistance to corrosion preferably, can be used as template, realizes the transfer of template graphics by further reactive ion etching process.
Claims (7)
1. a silver nano-grain array mould plate utilizes the self-assembly method preparation, and it is characterized in that: the mean size of silver nano-grain is 10～500nm, density 10
8～10
12/ cm
2, and the size of particle and density can be by silver-colored film thickness controls.
2. the preparation method of an above-mentioned silver nano-grain array mould plate is characterized in that processing step is as follows: 1) utilize vacuum deposition film equipment, deposition layer of even silver film on substrate; 2) make the silver-colored film of deposition form discrete nano particle by thermal anneal process, can make the silver nano-grain array mould plate of random arrangement.
3. the preparation method of an above-mentioned silver nano-grain array mould plate, it is characterized in that: vacuum deposition film equipment is ion beam sputtering instrument, magnetic control sputtering device, vacuum thermal evaporation instrument or electron beam evaporation instrument.
4. the preparation method of an above-mentioned silver nano-grain array mould plate, it is characterized in that: base material is silicon, silica or simple glass.
5. the preparation method of an above-mentioned silver nano-grain array mould plate is characterized in that: deposition Ag film thickness is 2～100nm.
6. the preparation method of an above-mentioned silver nano-grain array mould plate is characterized in that: thermal anneal process is in vacuum or has under the protective gas atmosphere and carry out that protective gas is hydrogen, nitrogen or argon gas.
7. the preparation method of an above-mentioned silver nano-grain array mould plate is characterized in that the thermal annealing temperature is 300～600 ℃, and annealing time is 0.5～1 hour.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2006100164238A CN101172573A (en) | 2006-11-01 | 2006-11-01 | Silver nano-grain array mould plate and preparation method thereof |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2006100164238A CN101172573A (en) | 2006-11-01 | 2006-11-01 | Silver nano-grain array mould plate and preparation method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101172573A true CN101172573A (en) | 2008-05-07 |
Family
ID=39421360
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Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101625973A (en) * | 2008-07-10 | 2010-01-13 | 国家纳米技术与工程研究院 | Method for preparing nano-rod array on silicon chip |
| CN102233424A (en) * | 2010-05-07 | 2011-11-09 | 国家纳米科学中心 | Silver nano superstructure array, and preparation method and application thereof |
| ITMI20100827A1 (en) * | 2010-05-10 | 2011-11-11 | Angela Bassoli | PROCEDURE FOR CONSERVATION AND AESTHETIC COVERING OF VEGETABLE PRODUCTS IN GENERAL. |
| CN102367164A (en) * | 2011-10-27 | 2012-03-07 | 无锡英普林纳米科技有限公司 | One-dimensional microstructural array and preparation method thereof |
| CN102660733A (en) * | 2012-05-09 | 2012-09-12 | 复旦大学 | Silver nanoparticle film with mixed valent state, preparation method thereof and application thereof |
| CN103424429A (en) * | 2013-06-25 | 2013-12-04 | 复旦大学 | Nanotube microsystem based molecular screening method and nanotube microsystem chip |
| CN103820826A (en) * | 2012-11-19 | 2014-05-28 | 中国科学院合肥物质科学研究院 | Preparation method for shape-controllable silver nanosheet assembly structure array and application of shape-controllable silver nanosheet assembly structure array |
| CN103866246A (en) * | 2014-01-24 | 2014-06-18 | 中国科学院长春光学精密机械与物理研究所 | Ag nano-material having ultraviolet band with hybrid quadrupole and preparation method thereof |
| CN105568228A (en) * | 2016-02-29 | 2016-05-11 | 南京理工大学 | Preparation method of radial metal nanowire-ceramic composite film |
| CN108004506A (en) * | 2017-12-07 | 2018-05-08 | 青岛大学 | A kind of noble metal nano particles based on In alloys and preparation method thereof |
| CN113846292A (en) * | 2021-07-28 | 2021-12-28 | 深圳赛陆医疗科技有限公司 | Biological sequencing chip, substrate, nanoparticle array substrate and preparation method |
-
2006
- 2006-11-01 CN CNA2006100164238A patent/CN101172573A/en active Pending
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101625973A (en) * | 2008-07-10 | 2010-01-13 | 国家纳米技术与工程研究院 | Method for preparing nano-rod array on silicon chip |
| CN102233424A (en) * | 2010-05-07 | 2011-11-09 | 国家纳米科学中心 | Silver nano superstructure array, and preparation method and application thereof |
| CN102233424B (en) * | 2010-05-07 | 2013-08-07 | 国家纳米科学中心 | Silver nano superstructure array, and preparation method and application thereof |
| ITMI20100827A1 (en) * | 2010-05-10 | 2011-11-11 | Angela Bassoli | PROCEDURE FOR CONSERVATION AND AESTHETIC COVERING OF VEGETABLE PRODUCTS IN GENERAL. |
| CN102367164A (en) * | 2011-10-27 | 2012-03-07 | 无锡英普林纳米科技有限公司 | One-dimensional microstructural array and preparation method thereof |
| CN102660733A (en) * | 2012-05-09 | 2012-09-12 | 复旦大学 | Silver nanoparticle film with mixed valent state, preparation method thereof and application thereof |
| CN103820826A (en) * | 2012-11-19 | 2014-05-28 | 中国科学院合肥物质科学研究院 | Preparation method for shape-controllable silver nanosheet assembly structure array and application of shape-controllable silver nanosheet assembly structure array |
| CN103424429A (en) * | 2013-06-25 | 2013-12-04 | 复旦大学 | Nanotube microsystem based molecular screening method and nanotube microsystem chip |
| CN103424429B (en) * | 2013-06-25 | 2016-04-06 | 复旦大学 | Based on molecular screening method and the nanotube network-on-chip of nanotube micro-system |
| CN103866246A (en) * | 2014-01-24 | 2014-06-18 | 中国科学院长春光学精密机械与物理研究所 | Ag nano-material having ultraviolet band with hybrid quadrupole and preparation method thereof |
| CN105568228A (en) * | 2016-02-29 | 2016-05-11 | 南京理工大学 | Preparation method of radial metal nanowire-ceramic composite film |
| CN108004506A (en) * | 2017-12-07 | 2018-05-08 | 青岛大学 | A kind of noble metal nano particles based on In alloys and preparation method thereof |
| CN113846292A (en) * | 2021-07-28 | 2021-12-28 | 深圳赛陆医疗科技有限公司 | Biological sequencing chip, substrate, nanoparticle array substrate and preparation method |
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