CN101128774B - Photosensitive resin composition for forming light shielding layer, light shielding layer and color filter - Google Patents
Photosensitive resin composition for forming light shielding layer, light shielding layer and color filter Download PDFInfo
- Publication number
- CN101128774B CN101128774B CN2006800056119A CN200680005611A CN101128774B CN 101128774 B CN101128774 B CN 101128774B CN 2006800056119 A CN2006800056119 A CN 2006800056119A CN 200680005611 A CN200680005611 A CN 200680005611A CN 101128774 B CN101128774 B CN 101128774B
- Authority
- CN
- China
- Prior art keywords
- light shield
- shield layer
- photosensitive polymer
- polymer combination
- forms
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Abstract
A photosensitive resin composition for forming a light shielding layer is a photosensitive resin composition for forming a light shielding layer with a film thickness of more than 2 m, comprising (A) a light shielding pigment, (B) an alkali soluble resin, (C) a photopolymerizable compound and (D) a photopolymerization initiator, and is characterized in that the (A) light shielding pigment comprises a perylene black pigment.
Description
Technical field
The present invention relates to a kind of light shield layer forms with photosensitive polymer combination and the light shield layer and the color filter that use its formation.
The spy of application was willing to that the present invention advocates right of priority to it 2005-No. 048507 based on February 24th, 2005, quoted its content at this.
Background technology
In the color filter that in colour display device for example, uses, has the structure of surrounding usually by the cancellate black light shield layer that is called as black matrix by the pixel of red (R), green (G), blue (B) formation of all kinds.
As one of manufacture method of this color filter, proposed to deceive matrix as the next door, form the method (for example following patent documentation 1) of the dyed layer of color filter with ink-jetting style.
In addition, in being not limited to the various display device of color filter, also can be by the contrast that black matrix improves image is set on the border between each pixel.
Black matrix for example can use photoresist (photo resist) composition that contains black pigment, utilizes photoetching (photolithograph) method to form.Usually use carbon black (for example patent documentation 1) as black pigment.
In addition, be pigment for perylene (ペ リ レ Application), in following patent documentation 2,3, put down in writing and be that the light shield layer of pigment forms the example with resist with black pigment such as carbon black and perylene.
Patent documentation 1: the spy opens communique 2004-No. 325736
Patent documentation 2: the spy opens flat 4-No. 190362 communiques
Patent documentation 3: the spy opens flat 6-No. 289602 communiques
In recent years, (optical density is hereinafter referred to as the OD value for the higher optical density of black matrix needs.)。Usually can form black matrix with the thickness below the 2 μ m, but as long as than in the past more heavy back form the thickness of black matrix, just can form the black matrix of higher OD value.
But if form the black matrix of thick film with the photo-corrosion-resisting agent composition that contains common black pigment, then seeing through of the exposure light in the exposure process becomes insufficient, is easy to generate and becomes inhomogenous ill-exposed.In other words, thus exist and to produce the bad problem that is difficult to form well the black matrix of thick film of curing owing to sensitivity is low.
Summary of the invention
The present invention In view of the foregoing proposes just, and its purpose is to provide a kind of light shield layer that can form the light shield layer of thick film well to form with photosensitive polymer combination and uses this light shield layer to form light shield layer and the color filter that forms with photosensitive polymer combination.
In order to achieve the above object, light shield layer of the present invention form with photosensitive polymer combination be a kind of containing (A) light-proofness pigment, (B) alkali soluble resin, (C) optical polymerism compound and (D) Photoepolymerizationinitiater initiater be used to form the photosensitive polymer combination of thickness above the light shield layer of 2 μ m, it is characterized in that it is black pigment that described (A) light-proofness pigment contains perylene.
The invention provides a kind of light shield layer that uses light shield layer of the present invention to form and form with photosensitive polymer combination.
The present invention also provides a kind of color filter that uses light shield layer of the present invention to form the black matrix that forms with photosensitive polymer combination that is provided with.
Utilize light shield layer of the present invention to form and use photosensitive polymer combination, can form the light shield layer of thick film well.Like this, can form the higher black matrix of OD value.
And then, even thicken red (R), green (G), blue (B) thus dyed layer make color denseer, also can make contrast abundant.
Be provided with and use light shield layer of the present invention to form the color filter of the black matrix that forms with photosensitive polymer combination, so more colored the demonstration becomes possibility owing to can make contrast abundant as mentioned above.
Embodiment
In the present invention, as the light-proofness pigment, using perylene is black pigment (the following perylene series pigments that is called simply).As concrete example, can enumerate the perylene series pigments of following general formula (I) expression and the perylene series pigments of following general formula (II) expression.In addition, in commercially available product, can preferably use ProductName; K0084, K0086, BASF AG's system etc.
[changing 1]
(in the formula, R
1, R
2Independently of one another, the alkylidene of expression carbon number 1～3, R
3, R
4Independently of one another, expression hydrogen atom, hydroxyl, methoxyl or acetyl group.)
[changing 2]
(in the formula, R
5, R
6Independently of one another, the alkylidene of expression carbon number 1～7.)
It is synthetic that the compound of the compound of described general formula (I) expression and general formula (II) expression for example can use the spy to open the method for putting down in writing in clear 62-No. 1753 communiques, special public clear 63-No. 26784 communiques.That is, with perylene-3,5,9,10-tetrabasic carboxylic acid or its dianhydride and amine are raw material, add thermal response in water or organic solvent.Then, the rough thing that obtains is precipitated again or in water, organic solvent or their mixed solvent, make the rough thing that obtains again crystallization obtain desired substance.
In the present invention, the perylene series pigments can use separately a kind of or and with two or more.
In addition, form with in the photosensitive polymer combination at light shield layer, be in disperse state in order to make the perylene series pigments, the mean grain size of perylene series pigments is preferably 10～1000nm.
Light shield layer of the present invention forms the content with the perylene series pigments in the photosensitive polymer combination, and (B) alkali soluble resin 100 mass parts are preferably 5～250 mass parts relatively.Preferred scope is 10～200 mass parts.Content by making the perylene series pigments can arrive good light-proofness more than the lower limit of above-mentioned scope.In addition, for prevent ill-exposed or solidify bad, preferably below the higher limit of above-mentioned scope.
In addition, and, also can regulate tone etc. with other black, red, blue, green, yellow, the purple pigments beyond (A) light-proofness pigment.These other pigments can suitably use known pigment, black pigments such as preferred carbon black.The use amount of other pigments preferably sets into the perylene series pigments, and to account for pigment integral body be that the ratio that perylene series pigments and other pigments amount to is more than the 85 quality %.More preferably more than the 90 quality %, also can be 100 quality %.
By being made as more than the above-mentioned lower limit, can be stated light shield layer in the use and be formed sensitivity when forming the thick film that surpasses 2 μ m with photosensitive polymer combination, can also realize the good shading rate of photomask simultaneously.
Especially,, use under the situation of carbon black,, then do not exist and reduce the situation that above-mentioned light shield layer forms the sensitivity of using photosensitive polymer combination, can improve shading rate if this carbon black is 15 quality % in total pigment as other pigment.
＜(B) alkali soluble resin〉(I) alkali soluble resin
As the alkali soluble resin among the present invention, can enumerate from acrylic acid, methacrylic acid etc. have select in the monomer of carboxyl more than one with from methyl acrylate, methyl methacrylate, ethyl acrylate, Jia Jibingxisuanyizhi, acrylic acid 2-hydroxyl ethyl ester, methacrylic acid 2-hydroxyl ethyl ester, methacrylic acid 2-hydroxy-propyl ester, acrylic acid N-butyl ester, methacrylic acid N-butyl ester, isobutyl acrylate, isobutyl methacrylate, the acrylic acid benzyl ester, the methacrylic acid benzyl ester, acrylic acid phenoxy group ester, methacrylic acid phenoxy group ester, isobornyl acrylate, IBOMA, methyl propenoic acid glycidyl base ester, styrene, acrylamide, the multipolymer of more than one that select in the vinyl cyanide etc.; Or
Resins such as phenol phenolic varnish type epoxy acrylic ester polymer, phenol phenolic varnish type epoxy methacrylates polymkeric substance, cresols phenolic varnish type epoxy acrylic ester polymer, cresols phenolic varnish type epoxy methacrylates polymkeric substance, bisphenol-a epoxy acrylate polymkeric substance, bisphenol S type epoxy acrylic ester polymer.
Cross-linking efficiency is enhanced these resins owing to be imported into acryloyl group or methacryl, thereby the photostability of filming, resistance to chemical reagents are outstanding.
Constitute in the monomer component of described alkali soluble resin, acrylic acid, methacrylic acid etc. has the content of monomer component of carboxyl preferably in the scope of 5～40 quality %.
(II) has the alkali soluble resin of photo-curable
In addition, as alkali soluble resin, also can be suitable for the polymkeric substance of following general formula (1) expression.
The compound of this general formula (1) expression so form with in the photoresist at the photomask that contains it, can further improve sensitivity owing to himself have optical polymerism (photo-curable) by improving ultraviolet transmitance.
[changing 3]
(X is the base of following chemical formula (2) expression in the formula, and Y is for removing acid anhydride's (-CO-O-CO-) residue (residue) from dicarboxylic anhydride, and Z is for removing 2 acid anhydrides' residue from tetracarboxylic anhydride.)
[changing 4]
As the concrete example of the dicarboxylic anhydride of the described Y that derives (remove acid anhydride before dicarboxylic anhydride), for example can enumerate maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrobenzene dicarboxylic acid anhydride, hexahydro phthalic anhydride, methyl first bridge tetrabydrophthalic anhydride, chlorendic anhydride, methyltetrahydro phthalate anhydride, glutaric anhydride etc.
In addition, as the tetracarboxylic dianhydride's of the described Z that derives (remove 2 acid anhydrides before tetracarboxylic dianhydride) concrete example, for example can enumerate tetracarboxylic dianhydrides such as PMA, benzophenone tetracarboxylic dianhydride, biphenyl tetracarboxylic dianhydride, xenyl ether tetracarboxylic dianhydride etc.
(B) alkali soluble resin can for separately a kind of or mix use two or more.In addition, can only use described alkali soluble resin (I), can only use alkali soluble resin (II), also can and use both with photo-curable.
Matter average molecular weight (Mw) (utilizing the polystyrene conversion standard of gel permeation chromatography (Gel Permeation Chromatography)) to (B) alkali soluble resin among the present invention is not particularly limited, be preferably 1000～1000000, more preferably 3000～50000, most preferably be 5000～15000.If less than the upper limit of this scope, the dissolubility to the resist solvent of abundance when then having as resist, if greater than the lower limit of this scope, then resist pattern cross sectional shape is good.
＜(C) optical polymerism compound 〉
As the optical polymerism compound among the present invention, can enumerate methacrylate, methyl methacrylate, acrylic acid 2-hydroxyl ethyl ester, methacrylic acid 2-hydroxyl ethyl ester, methacrylic acid 2-hydroxy-propyl ester, glycol diacrylate, ethylene glycol dimethacrylate, triethylene glycol diacrylate, tetraethylene glycol diacrylate, tetraethylene glycol dimethacrylate, propylene glycol diacrylate, the propylene glycol dimethylacrylate, trimethylolpropane triacrylate, trimethylol-propane trimethacrylate, tetra methylol propane tetraacrylate, tetra methylol propane tetramethyl acrylate, pentaerythritol triacrylate, pentaerythritol acrylate trimethyl, tetramethylol methane tetraacrylate, pentaerythrite tetramethyl acrylate, dipentaerythritol five acrylate, dipentaerythritol pentamethyl acrylate, dipentaerythritol acrylate, dipentaerythritol hexamethyl acrylate, 1,6-hexanediyl ester, the acrylic acid benzyl ester, the methacrylic acid benzyl ester, Ka Er many (カ Le De) epoxy radicals diacrylate, acrylic acid, methacrylic acid etc., but be not limited to these.
The optical polymerism compound can be used alone or and with two or more.
Wherein, in the present invention, the polymkeric substance with alkali-soluble of optical polymerism contains in described (B) alkali soluble resin (II), and the monomer with optical polymerism contains in (C) optical polymerism compound.
With described alkali soluble resin (I) when (B) alkali soluble resin, (C) use level of optical polymerism compound this resin (I) 100 mass parts relatively are preferably the scope of 5～500 mass parts.Preferred scope is 20～300 mass parts.
Use level by making (C) optical polymerism compound is more than the lower limit of above-mentioned scope, and the curing when being difficult to expose is bad, can obtain sufficient thermotolerance, resistance to chemical reagents.In addition, for obtain good film forming ability, film after preventing to develop is residual, preferably below the higher limit of above-mentioned scope.
＜(D) Photoepolymerizationinitiater initiater 〉
As (D) Photoepolymerizationinitiater initiater among the present invention; can enumerate 1-hydroxy-cyclohexyl phenyl ketone; 2-hydroxyl-2-methyl-1-phenyl-propane-1-ketone; 1-[4-(2-hydroxyl-oxethyl) phenyl]-2-hydroxyl-2-methyl-1-propane-1-ketone; 1-(4-isopropyl phenyl)-2-hydroxyl-2-methylpropane-1-ketone; 1-(4-dodecylphenyl)-2-hydroxyl-2-methylpropane-1-ketone; 2; 2-dimethoxy-1; 2-diphenylethane-1 ketone; two (4-dimethylaminophenyl) ketone; 2-methyl-1-[4-(methyl sulfo-) phenyl]-2-morpholino-1-acetone; 2-benzyl-2-dimethylamino-1-(4-morpholino phenyl)-1-butanone; 2; 4; 6-trimethylbenzene formyl diphenyl phosphine oxide; 4-benzoyl-4 '-methyl dimethoxy base sulfide; 4-dimethylamino benzoic acid; 4-dimethylamino methyl benzoate; 4-dimethylamino ethyl benzoate; 4-dimethylamino butyl benzoate; 4-dimethylamino benzoic acid-2-ethylhexyl; 4-dimethylamino benzoic acid, 2-isopentyl ester; benzyl-β-methoxy ethyl acetal; the benzyl dimethyl acetal; 1-phenyl-1; 2-propanedione-2-(adjacent ethoxy carbonyl) oxime; adjacent benzophenone methyl formate; 2; 4-diethyl thioxanthone; 2-clopenthixal ketone; 2; 4-dimethyl thioxanthones; 1-chlorine-4-propoxyl group thioxanthones; thioxanthene; 2-diuril ton; 2; 4-diethyl thioxanthene; 2-methyl thioxanthene; 2-isopropyl thioxanthene; 2-EAQ; the prestox anthraquinone; 1; 2-benzo anthraquinone; 2; 3-diphenyl anthraquinone; azoisobutyronitrile; benzoyl peroxide; cumene peroxide; 2-mercaptobenzimidazole; 2-mercaptobenzoxazole; 2-mercaptobenzothiazoler; 2-(Chloro-O-Phenyl)-4; 5-two (m-methoxyphenyl)-imidazolinyl dimers; Benzophenone; 2-dichloro-benzenes ketone; p; p '-two (dimethylamino) benzophenone; 4; 4 '-two (diethylin) benzophenone; 4; 4 '-dichloro benzophenone; 3; 3-dimethyl-4-methoxy benzophenone; benzil; benzoin; benzoin methylether; benzoin ethyl ether; benzoin iso-propylether; benzoin n-butylether; the benzoin isobutyl ether; the benzoin butyl ether; acetophenone; 2; 2-diethoxy acetophenone acetate; to dimethyl acetophenone acetate; to the dimethylamino propiophenone; ww-dichloroacetophenone; tribromo-acetyl benzene; to tert-butyl group acetophenone; to the dimethylamino acetophenone; to tert-butyl group tribromo-acetyl benzene; to tert-butyl group ww-dichloroacetophenone; α; α-dichloro-4-phenoxy group acetophenone; thioxanthones; 2-methyl thioxanthones; 2-isopropyl thioxanthone; Dibenzosuberone; amyl group-4-dimethylamino benzoate; 9-phenylacridine; 1; 7-two-(9-acridinyl) heptane; 1; 5-two-(9-acridinyl) pentane; 1; 3-two-(9-acridinyl) propane; to the methoxyl triazine; 2; 4; 6-three (trichloromethyl)-s-triazines; 2-methyl-4; 6-two (trichloromethyl)-s-triazines; 2-[2-(5-methylfuran-2-acyl group) vinyl]-4; 6-two (trichloromethyl)-s-triazines; 2-[2-(furans-2-acyl group) vinyl]-4; 6-two (trichloromethyl)-s-triazines; 2-[2-(4-diethylin-2-aminomethyl phenyl) vinyl]-4; 6-two (trichloromethyl)-s-triazines; 2-[2-(3; 4-Dimethoxyphenyl) vinyl]-4; 6-two (trichloromethyl)-s-triazines; 2-(4-methoxyphenyl)-4; 6-two (trichloromethyl)-s-triazines; 2-(4-ethoxybenzene vinyl)-4; 6-two (trichloromethyl)-s-triazines; 2-(4-positive propoxy phenyl)-4; 6-two (trichloromethyl)-s-triazines; 2; 4-two-trichloromethyl-6-(3-bromine-4-methoxyl) phenyl-s-triazine; 2; 4-two-trichloromethyl-6-(2-bromine-4-methoxyl) phenyl-s-triazine; 2; 4-two-trichloromethyl-6-(3-bromine-4-methoxyl) styryl phenyl-s-triazine; 2,4-two-trichloromethyl-6-(2-bromine-4-methoxyl) styryl phenyl-s-triazine etc.
Wherein, preferably use triazines such as methoxyl triazines; 2,4,6-three (trichloromethyl)-s-triazines, 2-methyl-4,6-two (trichloromethyl)-s-triazines, 2-[2-(5-methylfuran-2-acyl group) vinyl]-4,6-two (trichloromethyl)-s-triazines, 2-[2-(furans-2-acyl group) vinyl]-4,6-two (trichloromethyl)-s-triazines, 2-[2-(4-diethylin-2-aminomethyl phenyl) vinyl]-4,6-two (trichloromethyl)-s-triazines, 2-[2-(3,4-Dimethoxyphenyl) vinyl]-4,6-two (trichloromethyl)-s-triazines, 2-(4-methoxyphenyl)-4,6-two (trichloromethyl)-s-triazines, 2-(4-ethoxybenzene vinyl)-4,6-two (trichloromethyl)-s-triazines, 2-(4-positive propoxy phenyl)-4,6-two (trichloromethyl)-s-triazines etc. have the triazines of halogenated methyl; Deng triaizine compounds, 2-(Chloro-O-Phenyl)-4,5-two (m-methoxyphenyl)-imidazolinyl dimers; Deng imidazolinyl compond and 2-benzyl-dimethylamino-1-(4-morpholino phenyl)-butane 1 ketone; Deng the amino ketones compound.
In addition, as other preferred Photoepolymerizationinitiater initiaters, can enumerate the compound of following general formula (III) expression.
[changing 5]
(in the formula, X ' is the base of general formula (IV) or general formula (V) expression, R
11Be phenyl, the alkyl of carbon number 1～20, CN, NO
2Or the haloalkyl of carbon number 1～4, R
12Be the acyl group of carbon number 2～12 or the alkylol acyl group of carbon number 4～6 (ア Le ケ ノ イ Le base).)
[changing 6]
(in the formula, R
13～R
17Independently of one another, be alkyl, phenyl or benzenesulfonyl (Off ェ ニ Le ス Le Off ァ ニ the Le) (C of hydrogen atom, halogen atom, carbon number 1～12
6H
5S-).)
[changing 7]
(in the formula, R
18～R
19Independently of one another, be the alkyl or phenyl of hydrogen atom, halogen atom, carbon number 1～12.)
The compound of above-mentioned general formula (III) expression is the compound that utilizes the method put down in writing in the spy opens 2000-No. 80068 communiques to obtain.This compound is compared high with other known Photoepolymerizationinitiater initiaters to the susceptibility of light, thereby can activate effectively with the light of few exposure the optical polymerism compound is solidified.
In the present invention, as Photoepolymerizationinitiater initiater, can be also with multiple.Particularly preferred and use general formula (III) to represent compound and other at least a compounds.So also use at least two kinds of compounds (Photoepolymerizationinitiater initiater) thereby can activate effectively and further improve sensitivity or development edge (margin), so preferred with the light of few exposure.
In following compound and other at least a combination of compounds with general formula (III) expression, preferred example is shown in (1)～(3).
(1) combination of the compound beyond at least a Photoepolymerizationinitiater initiater of the O shown in the preferred above-mentioned general formula (III)-acyl group oxime compound and this O-acyl group oxime compound (Photoepolymerizationinitiater initiater beyond the compound of above-mentioned general formula (III) expression).
In above-mentioned O-acyl group oxime compound, from point to the sensitivity of light or the easy degree that obtains, in general formula (III), preferred R
11Be n-hexyl (C
6H
13-), R
12Be benzoyl, X ' general formula (IV) expression, simultaneously, R
13, R
14, R
16, R
17Be hydrogen atom, R
15Be benzenesulfonyl (Off ェ ニ Le ス Le Off ァ ニ Le) (C
6H
5S-) be 1,2-acetyl caproyl-1-[4-(phenyl sulfo-) phenyl]-2-(O-benzoyl oximes) of following formula (VI) expression.
[changing 8]
And then, in above-mentioned O-acyl group oxime compound, from the point of further raising to the sensitivity of light, in general formula (III), preferred R
11Be methyl, R
12Be acetyl group, X ' is with described general formula (V) expression, simultaneously, and R
18Be ethyl, R
19For methyl is ethyl ketone-1-[9-ethyl-6-(2-methyl benzoyl)-9H-carbazole-3-acyl group]-1-(O-acetyl group oxime) of following formula (VII) expression.
[changing 9]
(2) Photoepolymerizationinitiater initiater of general formula (IV) expression and the combination of triaizine compounds of the X ' shown in the also preferred above-mentioned general formula (III).
Particularly as triaizine compounds, and preferred especially following formula (VIII), following formula (IX), following formula (X) (in the formula, R
21, R
22The alkyl of expression carbon number 1～3.) expression triaizine compounds.In addition, 2-benzyl-dimethylamino-1-(4-morpholino phenyl)-butane 1 ketone also can similarly use with above-mentioned triaizine compounds.
[changing 10]
[changing 11]
[changing 12]
(3) shown in the also preferred above-mentioned general formula (III), X ' is with the Photoepolymerizationinitiater initiater of general formula (V) expression and the combination of 2-benzyl-dimethylamino-1-(4-morpholino phenyl)-butane 1 ketone.In addition, above-mentioned triaizine compounds also can replace 2-benzyl-dimethylamino-1-(4-morpholino phenyl)-butane 1 ketone similarly to use.
Cooperate ratio between compound other compounds (particularly triaizine compounds, imidazoles acyl group (イ ミ ダ ゾ イ Le) compound and amino ketones compound) in addition of the compound of general formula (III) expression and general formula (III) expression; be preferably 10:90～90:10 with mass ratio, preferred especially 20:80～80:20.Cooperate ratio in above-mentioned scope between compound by making general formula (III) expression and compound other compounds in addition of general formula (III) expression, two kinds of compounds can interact effectively, can further improve light shield layer and form sensitivity, the development edge of using photosensitive polymer combination.
Light shield layer of the present invention forms with relative (B) alkali soluble resin 100 mass parts of the use level of above-mentioned (D) Photoepolymerizationinitiater initiater in the photosensitive polymer combination, is preferably the scope of 0.1～30 mass parts.
For improvement, the viscosity of coating are regulated, can form with cooperating (E) organic solvent in the photosensitive polymer combination at light shield layer of the present invention.
As organic solvent, can enumerate benzene, toluene, dimethylbenzene, methyl ethyl ketone, acetone, hexone, cyclohexanone, methyl alcohol, ethanol, propyl alcohol, butanols, hexanol, cyclohexanol, ethylene glycol, diethylene glycol, glycerine, glycol monomethyl ether, ethylene glycol monoethyl ether, the propylene glycol monomethyl ether, propylene glycol monoethyl ether, diethylene glycol monomethyl ether, carbitol, diethylene glycol dimethyl ether, diethyl carbitol, 3-methoxyl butylacetic acid ester, 3-methyl-3-methoxyl butylacetic acid ester, propylene glycol monomethyl ether acetic acid esters (PGMEA), propylene glycol monomethyl ether propionic ester, Benzenediol one ether propionate ester, dimethyl carbonate, ethyl carbonate, propyl carbonate, butyl carbonate etc.Wherein, reveal outstanding dissolubility with the solvable component list in the photosensitive polymer combination, and can make the favorable dispersibility of insoluble composition such as pigment, so preferably because 3-methoxyl butylacetic acid ester not only forms light shield layer.
Use amount to (E) organic solvent is not particularly limited, can be can suitably setting at the concentration of coatings such as substrate, corresponding coating thickness.The viscosity that light shield layer among the present invention forms with photosensitive polymer combination is 5～100cp, is preferably 10～50cp, more preferably 20～30cp.In addition, solid component concentration is in the scope of 5～100 quality %, preferred 20～50 quality %.
In addition, also can in forming with photosensitive polymer combination, light shield layer of the present invention add thermal polymerization inhibitor, defoamer, surfactant etc.
As above-mentioned thermal polymerization inhibitor, can be known thermal polymerization inhibitor in the past, can enumerate quinhydrones, quinhydrones monoethyl ether etc.
As above-mentioned defoamer, can be known defoamer in the past, can enumerate silicone-based, fluorine based compound.
As above-mentioned surfactant, can be known surfactant in the past, can enumerate the compound of negative ion system, cationic, nonionic system etc.
＜light shield layer forms the compound method with photosensitive polymer combination 〉
Light shield layer of the present invention forms with photosensitive polymer combination can utilize following method preparation.
The organic additive that adds (A) light-proofness pigment, (B) alkali soluble resin, (C) optical polymerism compound, (D) Photoepolymerizationinitiater initiater and add as required, mix (dispersion milling) with stirring machines such as 3 roller mills, bowl mill, sand mills, filter with for example 5 μ m membrane filters, the preparation light shield layer forms uses photosensitive polymer combination.
Light shield layer of the present invention forms with photosensitive polymer combination and is preferred for forming (thickness than 2 μ m is thick) light shield layer that thickness surpasses 2 μ m.The upper limit to this light shield layer is not particularly limited, and can form than heavy back with possible scope.The preferable range of the thickness of this light shield layer is about 3～10 μ m, and preferred scope is 3～8 μ m, and then preferred range is about 4～6 μ m.
Light shield layer among the present invention be for example in various display device around each pixel or the black matrix of the boundary member setting between display part and the non-display part.As the example of the display device that possesses this black matrix, can enumerate plasma display display device etc.
The formation method of＜light shield layer 〉
Below, as using light shield layer of the present invention to form an embodiment that forms the method for light shield layer with photosensitive polymer combination, the example of the method that forms black matrix is described.
At first, on substrate, japanning method non-contact type apparatus for coating such as (the curtain flow coater) coating of flowing of contact transfer printing type apparatus for coating such as using roll coater, reverse coating machine (reverse coater), rod is coated with machine or spinner (spinner) (rotary apparatus for coating), curtain formula.Substrate can use the substrate with photopermeability, for example is the glass substrate of thick 0.5～1.1mm.
Form adhesiveness in order to improve glass substrate and light shield layer, also silane-coating coupling agent on glass substrate in advance with photosensitive polymer combination.Perhaps also can when forming with photosensitive polymer combination, add the preparation light shield layer silane coupling agent.
After above-mentioned coating, its dry removing is desolvated.Drying means is not particularly limited, for example can uses hot plate, with 80 ℃～120 ℃, preferred 90 ℃～100 ℃ 60 seconds～120 seconds method of temperature drying for (1); (2) at room temperature, place the method for a few hours～a few days; (3) being placed on tens of minutes～a few hours in warm wind well heater or the infrared heater removes any one of the method for desolvating.
Then, by the mask of minus, actinic energy rays such as irradiation ultraviolet radiation, excimer laser partly expose.The energy line amount of irradiation forms the difference with the composition of photosensitive polymer combination according to light shield layer, but preference is as 30～2000mJ/cm
2About.
By using the film after developing liquid developing exposes to form black matrix pattern.Developing method is not particularly limited, for example can uses infusion process, gunite etc.As the concrete example of developer solution, can enumerate the aqueous solution of the developer solution of organic systems such as monoethanolamine, diethanolamine, triethanolamine or NaOH, potassium hydroxide, sodium carbonate, ammonia, quaternary ammonium salt etc.
Utilize light shield layer of the present invention to form and use photosensitive polymer combination,, also can utilize photoetching process to form good pattern even thickness surpasses 2 μ m.Thereby, can form the light shield layer of the thick films such as black matrix of thick film.
This may be because by using the perylene series pigments as the light-proofness pigment, resin combination can realize seeing through the characteristic of exposing light and visible light being carried out shading.
＜distance piece 〉
In addition, the certain light shield layer of the thickness that uses light shield layer of the present invention to form to form with photosensitive polymer combination is in the LCD with the structure of accommodating liquid crystal between two substrates, simultaneously as the distance piece that be provided with under state clamping between by these two substrates for two substrate distance being remained certain.Thickness to light shield layer with such distance piece function is not particularly limited, and is preferably to surpass 2 μ m.
In LCD in the past, the spacer arrangement that forms with spherical distance piece particle or with photosensitive polymer combination is between two substrates.Use under the situation of spherical distance piece particle, when applying vibration or impacting, distance piece moves in liquid crystal, and the alignment films that is provided with on the substrate inner face may be impaired, if but utilize the present invention then can address this is that.In addition, use as mentioned above under the situation of the distance piece that forms with photosensitive polymer combination, essentially form black matrix in addition, if but utilize the present invention then do not need other formation, the manufacturing process of LCD can be reduced.
And then, because distance piece has light-proofness, so can prevent that the distance piece part is owing to often being in " whiting " that the light transmission state causes.
＜color filter 〉
Utilize the present invention, can form black matrix in thick film ground.Thereby, form and use photosensitive polymer combination thereby in the peristome of ink-jetting style, form in the formation of the black matrix in the method that dyed layer forms color filter preferred especially light shield layer of the present invention at preformed black matrix.Black matrix in this method plays the effect of so-called next door (cofferdam (bank)).
In the present invention, the thickness of the black matrix that uses as the next door in the ink-jetting style (cofferdam) is not particularly limited, and preferably surpasses 2 μ m.
Using light shield layer of the present invention to form with photosensitive polymer combination formation can similarly carry out with the formation method of above-mentioned light shield layer as the method for the black matrix in next door (cofferdam).
Then; after the black matrix that forms as next door (cofferdam), use ink-jetting style in the peristome of this black matrix, to be coated with the operation and the operation that makes this painted liquid-solidization of China ink of painted black liquid repeatedly, form dyed layer; and then form transparent protective film as required, make color filter thus.The method of utilizing ink-jetting style to form dyed layer can be used known gimmick.
Utilize the present invention, can form the black matrix that uses as next door (cofferdam) in the ink-jetting style in thick film ground, so can prevent that the painted black liquid of giving to the peristome of black matrix from surpassing the next door and overflowing thereby take place colour mixture between pixel.
In addition, compare, can use low viscous painted black liquid with the situation of black matrix thin (next door is low).
In addition, also can be according to utilized photoetching process to form color filter in the past.
[embodiment]
(synthesis example 1 of alkali soluble resin)
Open communique 2001-No. 354735 according to the spy, in the 500mL four-hole boiling flask, add bis-phenol olefin type epoxy resin 235g (epoxide equivalent 235) and tetramethyl-ammonium chloride 110mg, 2,6-di-t-butyl-4-methylphenol 100mg and acrylic acid 72.0g, to wherein being blown into air, the while was with 90～100 ℃ of heating for dissolving with 25mL/ minute speed.
Then, be directly slowly to heat up under the state of gonorrhoea at solution, make it be heated to 120 ℃ of dissolvings fully.Become transparent thickness gradually at this solution, but still continue to stir.
, measure acid number around here, continuing stirring until becomes less than 1.0mgKOH/g.Acid number arrives target needs 12 hours.Then, be cooled to room temperature, obtain the bis-phenol olefin type epoxy acrylate of following chemical formula (3) expression of water white transparency and solid shape.
[changing 13]
Then, in the bis-phenol olefin type epoxy resin 307.0g that obtains like this, add also dissolving of propylene glycol monomethyl ether acetic acid esters 600g, mix xenyl dicarboxylic acid dianhydride 78g and teabrom 1g then, slowly heat up, it was reacted 4 hours down at 110～115 ℃.
After the disappearance of confirming anhydride group, mix 1,2,3,6-tetrahydrochysene phthalate anhydride 38.0g, make its 90 ℃ reaction 6 hours, obtain that (X is for removing the divalent residue of 2 hydroxyls in the formula from the compound that above-mentioned chemical formula (3) is represented, Y is from 1 with above-mentioned chemical formula (1), 2, remove acid anhydride's divalent residue in 3,6-tetrahydrochysene phthalate anhydride, Z is for removing 2 acid anhydrides' 4 valency residues from biphenyl tetracarboxylic dianhydride.Mol ratio=the 50.0/50.0 of Y/Z in the formula.) expression compound 1.Utilize IR spectrum to confirm the disappearance of acid anhydrides.
(embodiment 1)
Mix each composition with following cooperation, the preparation light shield layer forms uses photosensitive polymer combination.
As (B) alkali soluble resin, the compound 1 that uses 100 mass parts in above-mentioned synthesis example 1, to obtain.
As (C) composition, use 50 mass parts dipentaerythritol tetraacrylate.
As (A) light-proofness pigment, using 30 mass parts perylenes is black pigment dispersion liquid (C.I. pigment black 31:15%, spreading agent 10%, solvent: PGMEA).
As (D) Photoepolymerizationinitiater initiater, use 30 mass parts west Bart different chemicals company (CIBASPECIALTY CHEMICALS) system, ProductName: Irgacure369, compound name: 2-benzyl-2-dimethylamino-1-(4-morpholino phenyl)-butane-1-ketone.
As (E) organic solvent, service property (quality) is the mixed solvent of 1:3 than PGMEA:3-methoxyl butylacetic acid ester.It is 30 quality % that the use amount of organic solvent is adjusted to solid component concentration.
(1H-360s: ミ カ サ corporate system) light shield layer that is coated on above-mentioned preparation on glass substrate forms and use photosensitive polymer combination, and with 90 ℃ of dryings 2 minutes on hot plate, formation is filmed to use spin coater.
Then, with exposure machine (EXM-1066-E01: オ-Network corporate system), with irradiation energy line amount 20mJ/cm
2Exposure.After the exposure,, developed 60 seconds with spray regime with potassium hydroxide 0.04% developer solution.And then, with 200 ℃ carry out 30 minutes after cure, form matrix pattern, the dot pattern of 20 μ m of thickness 2.5, the black matrix of isolated patterns.The OD value of the black matrix that forms is 3.0.
The shape of the black matrix that obtains is good.
(comparative example 1)
In the cooperation of the foregoing description 1, as (A) light-proofness pigment, do not use the perylene series pigments, replace it to use 50 mass parts carbon black dispersion liquids " CF Black EX-1455 " (to drive state's pigment corporate system, contain 24% carbon black), in addition, carry out similarly to Example 1, the preparation light shield layer forms uses photosensitive polymer combination.
The light shield layer that use obtains forms and uses photosensitive polymer combination, carries out similarly to Example 1, and the black matrix of the matrix pattern of the 20 μ m of formation thickness 2 μ m, dot pattern, isolated patterns, but regardless of shape, all peel off, can not form.
(embodiment 2)
In the cooperation of embodiment 1,30 mass parts that replace perylene series pigments dispersion liquid, use 40 mass parts to mix the pigment mixed liquor that this perylene pigment dispersion liquid and described carbon black dispersion liquid " CF Black EX-1455 " obtain with the ratio of 90:10, the preparation light shield layer forms uses photosensitive polymer combination.
The light shield layer that use obtains forms and uses photosensitive polymer combination, carries out similarly to Example 1, and formation is filmed, with 30mJ/cm
2Exposure.After the exposure,, developed 60 seconds with spray regime with potassium hydroxide 0.04% developer solution.And then, with 200 ℃ carry out 30 minutes after cure, form matrix pattern, the dot pattern of the 20 μ m of thickness 3 μ m, the black matrix of isolated patterns.The OD value of the black matrix that forms is 4.5.
The shape of the black matrix that obtains is good.
(embodiment 3)
In the cooperation of embodiment 1,30 mass parts that replace perylene series pigments dispersion liquid, (contain 23.4% C.I. pigment blue 15: the pigment mixed liquor that 6) obtains, the preparation light shield layer forms uses photosensitive polymer combination to use 40 mass parts to mix this perylene pigment dispersion liquid and red pigment dispersion liquid (containing 23.4% C.I. paratonere 177) and blue pigment dispersion liquid with the ratio of 88:5:7.
The light shield layer that use obtains forms and uses photosensitive polymer combination, carries out similarly to Example 1, and formation is filmed, with 200mJ/cm
2Exposure.After the exposure, use the TMAH0.1% developer solution, developed 60 seconds with spray regime.And then, with 250 ℃ carry out 30 minutes after cure, form the distance piece that the dot pattern of the 20 μ m of thickness 5 μ m constitutes.The OD value of the distance piece that forms is 4.0.
The shape of the distance piece that obtains is good.
(comparative example 2)
In the cooperation of the foregoing description 3,40 mass parts that replace described dispersible pigment dispersion, use 40 mass parts carbon black dispersion liquids " CF Black EX 1 " (to drive state's pigment corporate system, contain 24% carbon black) the pigment mixed liquor that obtains, in addition, carry out similarly to Example 1, the preparation light shield layer forms uses photosensitive polymer combination.
The light shield layer that use obtains forms and uses photosensitive polymer combination, carries out similarly to Example 3, forms the dot pattern of the 20 μ m of thickness 5 μ m.The OD value of the distance piece that forms is 4.0.
Wrinkle takes place in the surface of the distance piece that obtains, and being in can not be as the state of distance piece.
Utilizability on the industry
The present invention goes for light shield layer and forms with photosensitive polymer combination and the light shield layer and the colour filter that use its formation.
Claims (8)
1. a light shield layer forms and uses photosensitive polymer combination, it is characterized in that, it is to contain (A) light-proofness pigment, (B) alkali soluble resin, (C) optical polymerism compound and (D) Photoepolymerizationinitiater initiater and be used to form the photosensitive polymer combination that thickness surpasses the light shield layer of 2 μ m
Described (A) light-proofness pigment contains the perylene series pigments that is selected from following general formula (I) expression and the perylene series pigments of following general formula (II) expression, and the ratio of the described perylene series pigments in described (A) light-proofness pigment is more than the 85 weight %,
[changing 1]
In the formula, R
1, R
2Independently of one another, the alkylidene of expression carbon number 1～3, R
3, R
4Independently of one another, expression hydrogen atom, hydroxyl, methoxyl or acetyl group,
[changing 2]
In the formula, R
5, R
6Independently of one another, the alkylidene of expression carbon number 1～7,
Described (B) alkali soluble resin has photo-curable, and is the compound by following general formula (1) expression,
X is the base of following chemical formula (2) expression in the formula (1), and Y is for removing the residue of acid anhydride-CO-O-CO-from dicarboxylic anhydride, and Z removes 2 acid anhydrides' residue from tetracarboxylic anhydride,
。
2. light shield layer according to claim 1 forms and uses photosensitive polymer combination, wherein,
Described thickness is 3～10 μ m.
3. light shield layer according to claim 1 and 2 forms and uses photosensitive polymer combination, wherein,
With respect to described (B) alkali soluble resin 100 mass parts, contain described perylene series pigments 5～250 mass parts.
4. light shield layer according to claim 1 and 2 forms and uses photosensitive polymer combination, wherein,
Described light shield layer is the light shield layer with distance piece function.
5. light shield layer according to claim 1 and 2 forms and uses photosensitive polymer combination, wherein,
Described light shield layer is to form dyed layer with ink-jetting style in the peristome of preformed black matrix to make black matrix in the method for color filter.
6. light shield layer, it is to use claim 1 or 2 described light shield layers to form the light shield layer that forms with photosensitive polymer combination.
7. color filter, it is to be provided with the color filter that uses claim 1 or 2 described light shield layers to form the black matrix that forms with photosensitive polymer combination.
8. any described light shield layer forms the use that forms to light shield layer with photosensitive polymer combination in the claim 1～5.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005048507A JP4794870B2 (en) | 2005-02-24 | 2005-02-24 | Photosensitive resin composition for forming light shielding layer, light shielding layer and color filter |
| JP048507/2005 | 2005-02-24 | ||
| PCT/JP2006/302234 WO2006090590A1 (en) | 2005-02-24 | 2006-02-09 | Photosensitive resin composition for forming light shielding layer, light shielding layer and color filter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101128774A CN101128774A (en) | 2008-02-20 |
| CN101128774B true CN101128774B (en) | 2011-07-20 |
Family
ID=36927232
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2006800056119A Active CN101128774B (en) | 2005-02-24 | 2006-02-09 | Photosensitive resin composition for forming light shielding layer, light shielding layer and color filter |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP4794870B2 (en) |
| KR (1) | KR100919148B1 (en) |
| CN (1) | CN101128774B (en) |
| TW (1) | TWI308669B (en) |
| WO (1) | WO2006090590A1 (en) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007322485A (en) * | 2006-05-30 | 2007-12-13 | Nippon Sheet Glass Co Ltd | Alkali developable black photosensitive resin composition for formation of light-tight partition |
| JP2008304710A (en) * | 2007-06-07 | 2008-12-18 | Hitachi Chem Co Ltd | Photosensitive resin composition and photosensitive film |
| JP5352175B2 (en) * | 2008-03-26 | 2013-11-27 | 太陽ホールディングス株式会社 | Photosensitive resin composition, cured product thereof, and printed wiring board having solder resist layer made of the cured product |
| JP5306952B2 (en) * | 2009-09-29 | 2013-10-02 | 太陽ホールディングス株式会社 | Photosensitive resin composition and cured product thereof, and printed wiring board |
| JP5673302B2 (en) * | 2010-06-08 | 2015-02-18 | 東洋インキＳｃホールディングス株式会社 | Black resin composition and black matrix |
| JP5007453B2 (en) * | 2010-06-11 | 2012-08-22 | 株式会社タムラ製作所 | Black curable resin composition |
| WO2013062011A1 (en) * | 2011-10-25 | 2013-05-02 | 三菱化学株式会社 | Colored photosensitive resin composition, colored spacer, color filter, and liquid crystal display device |
| JP5916373B2 (en) * | 2011-12-22 | 2016-05-11 | 東京応化工業株式会社 | Photosensitive resin composition for black column spacer, black column spacer, display device, and method for forming black column spacer |
| JP2013134263A (en) * | 2011-12-22 | 2013-07-08 | Tokyo Ohka Kogyo Co Ltd | Photosensitive resin composition for black column spacer, black column spacer, display device, and method for forming black column spacer |
| US9217070B2 (en) * | 2012-06-01 | 2015-12-22 | Basf Se | Black colorant mixture |
| TW201423272A (en) * | 2012-11-27 | 2014-06-16 | Jsr Corp | Photosensitive composition, colorant dispersion solution, light filter and light sensor |
| JP6095104B2 (en) * | 2012-12-26 | 2017-03-15 | 日本化薬株式会社 | Active energy ray-curable resin composition, colored spacer for display element, and black matrix |
| JP6065645B2 (en) * | 2013-02-27 | 2017-01-25 | 三菱化学株式会社 | Photosensitive resin composition, cured product obtained by curing the same, color filter, and liquid crystal display device |
| KR20230085213A (en) | 2013-09-25 | 2023-06-13 | 미쯔비시 케미컬 주식회사 | Photosensitive coloring composition, black matrix, coloring spacer, image display device, and pigment dispersion |
| JP2015069181A (en) * | 2013-09-30 | 2015-04-13 | Jsr株式会社 | Radiation-sensitive resin composition, cured film, method for forming the same and display element |
| CN103819082A (en) * | 2014-02-20 | 2014-05-28 | 北京京东方光电科技有限公司 | Cutting method of liquid crystal panel, and liquid crystal panel |
| JP6730006B2 (en) * | 2015-05-21 | 2020-07-29 | 株式会社きもと | Optical shading member and manufacturing method thereof |
| JP6713746B2 (en) * | 2015-10-08 | 2020-06-24 | 日鉄ケミカル＆マテリアル株式会社 | Photosensitive resin composition for light-shielding film having spacer function, light-shielding film, liquid crystal display device, method for producing photosensitive resin composition for light-shielding film having spacer function, method for producing light-shielding film, and production of liquid crystal display device Method |
| JP6318132B2 (en) * | 2015-11-11 | 2018-04-25 | 株式会社有沢製作所 | Colored photosensitive resin composition |
| JP5916939B2 (en) * | 2015-12-24 | 2016-05-11 | 東京応化工業株式会社 | Method for forming black column spacer |
| KR102411817B1 (en) | 2018-03-09 | 2022-06-22 | 동우 화인켐 주식회사 | A black photo sensitive resin composition, a color filter comprising a black metrics, a column spacer or a black column spacer prepared by using the composition, and a liquid crystal display device comprising the color filter |
| JP2022065931A (en) | 2020-10-16 | 2022-04-28 | 山陽色素株式会社 | Black pigment dispersion |
| KR20220145534A (en) | 2021-04-22 | 2022-10-31 | 제이에스알 가부시끼가이샤 | Photosensitive resin composition for forming black matrix, method for forming black matrix, black matrix and organic el device |
| JP2023004245A (en) | 2021-06-25 | 2023-01-17 | 山陽色素株式会社 | Black pigment dispersion and chromatic color pigment dispersion |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003105226A (en) * | 2001-09-28 | 2003-04-09 | Toda Kogyo Corp | Coloring material for black matrix, coloring composition for black matrix containing the same, and color filter |
| JP2003139938A (en) * | 2001-11-07 | 2003-05-14 | Fuji Photo Film Co Ltd | Method for manufacturing multicolor picture sheet, multicolor picture sheet and color filter |
| JP2004347916A (en) * | 2003-05-23 | 2004-12-09 | Toyo Ink Mfg Co Ltd | Photosensitive color composition for forming color filter, and color filter |
| JP2004346218A (en) * | 2003-05-23 | 2004-12-09 | Toyo Ink Mfg Co Ltd | Colored composition, color filter production method, and black matrix substrate production method |
| CN1564083A (en) * | 2004-03-26 | 2005-01-12 | 奇美实业股份有限公司 | Light sensitive resin compsn. for black matrix |
| CN1570764A (en) * | 2004-04-30 | 2005-01-26 | 奇美实业股份有限公司 | Light-sensitive resin composition for black matrix |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10268121A (en) * | 1997-03-21 | 1998-10-09 | Sumitomo Rubber Ind Ltd | Ink for black matrix, and black matrix using it |
-
2005
- 2005-02-24 JP JP2005048507A patent/JP4794870B2/en active Active
-
2006
- 2006-02-09 CN CN2006800056119A patent/CN101128774B/en active Active
- 2006-02-09 WO PCT/JP2006/302234 patent/WO2006090590A1/en not_active Application Discontinuation
- 2006-02-09 KR KR1020077019562A patent/KR100919148B1/en active IP Right Grant
- 2006-02-15 TW TW95105103A patent/TWI308669B/en active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003105226A (en) * | 2001-09-28 | 2003-04-09 | Toda Kogyo Corp | Coloring material for black matrix, coloring composition for black matrix containing the same, and color filter |
| JP2003139938A (en) * | 2001-11-07 | 2003-05-14 | Fuji Photo Film Co Ltd | Method for manufacturing multicolor picture sheet, multicolor picture sheet and color filter |
| JP2004347916A (en) * | 2003-05-23 | 2004-12-09 | Toyo Ink Mfg Co Ltd | Photosensitive color composition for forming color filter, and color filter |
| JP2004346218A (en) * | 2003-05-23 | 2004-12-09 | Toyo Ink Mfg Co Ltd | Colored composition, color filter production method, and black matrix substrate production method |
| CN1564083A (en) * | 2004-03-26 | 2005-01-12 | 奇美实业股份有限公司 | Light sensitive resin compsn. for black matrix |
| CN1570764A (en) * | 2004-04-30 | 2005-01-26 | 奇美实业股份有限公司 | Light-sensitive resin composition for black matrix |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200641523A (en) | 2006-12-01 |
| KR20070100383A (en) | 2007-10-10 |
| KR100919148B1 (en) | 2009-09-28 |
| JP4794870B2 (en) | 2011-10-19 |
| WO2006090590A1 (en) | 2006-08-31 |
| CN101128774A (en) | 2008-02-20 |
| TWI308669B (en) | 2009-04-11 |
| JP2006235153A (en) | 2006-09-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101128774B (en) | Photosensitive resin composition for forming light shielding layer, light shielding layer and color filter | |
| CN1869816B (en) | Photosensitive composition and color filter formed thereof | |
| US5821016A (en) | Colored image forming material and color filter obtained therefrom | |
| CN101051186B (en) | Negative photosensitive resin composition | |
| CN101359175A (en) | Photoresist compistion | |
| KR20060128715A (en) | Negative photosensitive resin composition | |
| CN104423148A (en) | A color photosensitive resin composition, color filter and display device comprising the same | |
| JP2007286478A (en) | Photosensitive composition and color filter formed from the same | |
| CN101872121A (en) | Photosensitive polymer combination and cured film and next door | |
| CN102770809A (en) | Colored photosensitive resin composition for preparation of color filter of solid-state image sensing device using 300 nm or less ultrashort wave exposure equipment, color filter using same, and solid-state image sensing device containing same | |
| CN104950600A (en) | Method of manufacturing black column spacer, black column spacer and color filter | |
| JP2009237362A (en) | Polymerizable composition, color filter and method for manufacturing the same, and liquid crystal display | |
| CN106019826A (en) | Photosensitive Resin Composition, Black Column Spacer Using the Same and Color Filter | |
| CN100520577C (en) | Photosensitive composition for forming light shading film, black bottom formed from said light shading film for photosensitive composition | |
| CN104914674A (en) | Colored photosensitive resin composition | |
| CN101738859A (en) | Photosensitive resin composition and display | |
| JP2006259266A (en) | Photosensitive resin composition and color filter | |
| CN102445847A (en) | Colored photosensitive resin composition, color filter and liquid crystal display | |
| TW201808874A (en) | Flourene multifunctional photoinitiator, method of production, and the use thereof, and photopolymer comprising the same and the use thereof | |
| CN105388705A (en) | Coloured photosensitive resin composition | |
| CN104238269A (en) | Photosensitive resin composition and application thereof | |
| CN101943863B (en) | Photosensitive resin composition for black resist, and light shielding film of color filter | |
| JP4108303B2 (en) | Curable resin composition, color filter, method for producing color filter, and liquid crystal display device | |
| JP5363844B2 (en) | Alkali-soluble photosensitive coloring composition and color filter | |
| CN103376650B (en) | Light shield layer forms the manufacture method with photonasty substrate composition |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |