CN101090990A - Electromagnetic control of chemical catalysis - Google Patents

Electromagnetic control of chemical catalysis Download PDF

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CN101090990A
CN101090990A CNA2004800373641A CN200480037364A CN101090990A CN 101090990 A CN101090990 A CN 101090990A CN A2004800373641 A CNA2004800373641 A CN A2004800373641A CN 200480037364 A CN200480037364 A CN 200480037364A CN 101090990 A CN101090990 A CN 101090990A
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reactant
works
electromagnetic radiation
reaction
chemical reaction
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莱斯利·格林歌德
大卫·A·博伊德
马克·布隆格斯马
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/0046—Sequential or parallel reactions, e.g. for the synthesis of polypeptides or polynucleotides; Apparatus and devices for combinatorial chemistry or for making molecular arrays
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using coherent light, UV to IR, e.g. lasers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00277—Apparatus
    • B01J2219/00495—Means for heating or cooling the reaction vessels
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00277—Apparatus
    • B01J2219/00497—Features relating to the solid phase supports
    • B01J2219/00527—Sheets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00718—Type of compounds synthesised
    • B01J2219/00745—Inorganic compounds
    • B01J2219/00747—Catalysts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites

Abstract

The present disclosure methods and systems that provide heat, via at least Photon-Electron resonance, also known as excitation, of at least a particle utilized, at least in part, to initiate and/or drive at least one catalytic chemical reaction. In some implementations, the particles are structures or metallic structures, such as nanostructures. The one or more metallic structures are heat at least as a result of interaction of incident electromagnetic radiation, having particular frequencies and/or frequency ranges, with delocalized surface electrons of the one or more particles. This provides a control of catalytic chemical reactions, via spatial and temporal control of generated heat, on the scale of nanometers as well as a method by which catalytic chemical reaction temperatures are provided .

Description

The electromagnetic control of chemical catalysis
Related application
The application requires to be filed on December 15th, 2003, denomination of invention is the U.S. Provisional Patent Application No.60/529 of " process for chemical vapor deposition of materials with via of the nanostructure of array: the auxiliary CVD of photoelectricity ", 869 interests and right of priority, this application is all quoted as a reference at this paper.
Technical field
The present invention relates to micron or the local heating of nanostructure and relevant use and methods for using them.More particularly, on the one hand, instruction herein also provides the very partial heating to specific nanometer and micrometer structure, in order to influence catalyzed chemical reaction.On the one hand, as explaining, provide heat to a kind of like this chemical reaction herein, structure or its most of the going up and/or its adjacent that provides is provided this chemical reaction, and described structure or its most of meeting are at least owing to photon-electron resonances produces heat.
Background technology
In large-scale, successive chemical process, use catalyzer to know.Many catalyzed reactions have temperature limitation.The method of prior art uses macroscopical heat to be provided for the heat of these reactions usually, and needs comprehensive convection current, conduction or radiation comprehensively comprehensively usually.The example of these macroscopical thermals source is the gas of nichrome wire, stove, lamp or heating.
The intrinsic problem of using these conventional heating means be difficult to from the time go up and the space on temperature, the near zone of catalyzer and/or the heat that applies of control catalyst.For example, it is desirable to make scheduled time that reaction takes place than by with the relevant definite time much shorter of time constant of container or base material on every side (wherein or on it/its adjacent, these reactions will take place respectively).For example, if can provide the required heat and container and/or the chamber and/or the base material of non-circumference in very little, specific area/location, just can carry out time control to the temperature of use and the temperature of catalyzer to a greater degree, promptly, reaction times will obviously shorten, because the thermal mass of container or base material can be left in the basket.Also have, it is desirable to, on nanometer and/or micron number magnitude, make the reaction compartment localization.
The heat that is produced when being attached to photon on the metal nanoparticle can draw by following: radius is that the polarization α of the small metal ball of R can be shown:
α = 4 πϵ 0 R 3 ϵ - ϵ m ϵ + 2 ϵ m
In the formula, ε 0Be the freeboard specific inductivity, ε is the particulate specific inductivity, ε mIt is the specific inductivity of nano particle.When following condition satisfied, generation was used for resonance time dependent, the space stationary field:
[ε Real number(ω)+(2 ε m)] 2+ [ε Imaginary number(ω)] 2=minimum value.
This condition can satisfy with precious metal, and known corresponding nanostructure has the strong absorption relevant with photon-electron resonances at the spectrographic visible part." optical property of metal cluster " of U.K.Kreibig and M.Vollmer (Springer-Verlag publishes, New York, 1995) all quoted as a reference in this article.In the position near resonant frequency, absorbing increases near an order of magnitude.Absorb fully under suitable resonant frequency as fruit granule, simple Stefan-Boltzman calculates, that is, and and energy/area-σ T 4(in the formula, σ is the Stefan-Boltzman constant) just can estimate the required power of particle temperature that reaches selected.
As seen from above-mentioned, the reaction of the nanometer scale of localization is to wish, and needs to be used for relevant equipment, structure, the method and system in various uses and field.
Summary of the invention
According to an aspect of the present invention, provide the technology that is used for chemical process.Method of micron or nanostructure (thing) and uses thereof also is provided.The present invention can be used for other field and purposes, for example life science, chemistry, Materials science, nanotechnology, electronics and other field.
In some illustrative embodiments, promote the chemical reaction of temperature influence by the heat of the selected localization that provides by photoelectric interaction at least (in document and prior art, being also referred to as plasmon resonance sometimes).
In an embodiment and embodiment, the invention provides the auxiliary chemical vapor deposition of photoelectricity (PACVD), it utilizes the heat that is produced by photoelectric interaction in the structure of nano-scale as thermal source, in order to initiation or the promotion catalyzed chemical reaction relevant with the deposition of material.
In some illustrative embodiments, the reactant that reaction product can instruction just according to the present invention heats by photoelectric interaction.The reactant that heats in this mode can be used in other step and/or the method, if necessary.Specifically, according to the instruction that provides herein, the preset frequency of specific electromagnetic radiation and/or frequency range applications have encouraged the structural photon-electron resonances at least at nano-scale, and have controlled the heating and the relative temperature (thus chemical reaction can take place) of the structure of nano-scale.
In some illustrative embodiments, laser provides and has been used for encouraging the electromagnetic radiation of photon-electron resonances at least.
In some illustrative embodiments, the invention provides the method for using light source such as laser source and conventional optics that required electromagnetic radiation is provided, it utilizes the power density more much lower than the power density that is commonly used to heating material in the prior art optionally to drive the structure of photon-electron resonances with the heating nano-scale, excites thus, promotion and/or initiation reaction.
Some illustrative embodiments can be used to spatial control is carried out in the chemical treatment on the catalytic base material of nanometer scale such as chemosynthesis, deposition and/or degraded.This also provides the time control to the height of the temperature of method/reaction.Stop electromagnetic radiation flux and inject the decline very fast that the structure of nano-scale can cause temperature on the structure of nano-scale, that is, the photon-electron resonances of setting up in advance of these structures can weaken/reduce, and the heat of the relevant localization that produces also is like this.
The present invention also provides the micrometer structure of the chemical catalysis that is used for electromagnetic control or the technology of nanostructure.More particularly, instruction herein provides and has been used for strengthening method, system and the corresponding structure of chemical reaction by based on known catalytic micrometer structure and bonded catalysis based on the heating/temperature control of the photoelectric interaction of electromagnetic drive.
In an illustrative embodiments; this method comprises provides reactant; for example; but be not limited to reactive materials; for example; adjacent with one or more particles and with having preset frequency; promptly; with the photon-electron resonance frequency of the surface electronic of one or more works that is electromagnetic radiation (for example, coming self-excitation light source or other source) the one or more particulate 2 of radiation that " P-ERF " (for example, perhaps many particles of particle) mate or mate basically; 2; 6,6-tetramethyl--3, the 5-heptadione closes titanium, SiH 4And GeH 4Term " adjacent " comprises direct contact the between an object and another object.As disclosed herein, reactant can be any element or the compound that can react or react a part, the heat generation of described reaction because of being subjected to being produced by the excitation of photon-electron resonances at least.Effect of electromagnetic radiation at least with preset frequency causes one or more particulate temperature to be elevated to chosen temperature (for example, temperature of reaction) at least.This method is by the induce reaction chemical reaction of thing of the increase on one or more particulate temperature at least.
In an illustrative embodiments, the invention provides another kind of use electromagnetic radiation and quicken the method for catalyzed chemical reaction.This method comprises provides one or more particles.Preferably, described one or more particle has thermal characteristics.This method be included in one or more particle position adjacent or its on apply at least a reactant, and with the described one or more particles of the electromagnetic radiation irradiation of frequency with preliminary election.This method comprises that the effect of electromagnetic radiation at least by the frequency with preliminary election is elevated to chosen temperature at least with described one or more particle temperatures with thermal characteristics, and causes the catalyzed chemical reaction of at least a reactant by the rising of described at least one or more particulate temperature.This heat can be used for other operation, for example is used for the formation of initiation reaction product.
In some illustrative embodiments, the particle itself by radiation and photoelectric interaction heating can be the catalyzer in the enhanced chemical reaction process.In other illustrative embodiments, a plurality of particles can use together, in these particles some can be used to by aforementioned photoelectric interaction localized temperature be raise, and other particle strengthens the required chemical reaction in suitable temperature or temperature range then as catalysed particulate.The benefit of room and time control can be fit to a kind of in the above-mentioned situation or both.
In addition, the invention provides the method that reaction product is provided by the heat of the generation of photon-electron resonances at least of the structure that provides (being to place the specific mode on the base material in some embodiments) in utilization.The method that exemplifies comprises the base material that the pattern that comprises at least a or multiple structure (preferably one or more nanostructures) is provided, and this base material is made by selected material.This method comprises the P-ERF of the selected material of determining described nanostructure, and use to provide and have at least a portion that electromagnet source on above-mentioned P-ERF or the electromagnetic radiation of the predetermined frequency of eclipsed basically encourages selected material, with generation and the increase that causes selected material heat energy.This method is included in base material and on the selected material that P-ERF is energized/and adjacent provides at least a reactant, and produces required reaction product according to the reactant that is provided at least.
According to described embodiment, one or more in the feature that the present invention has exemplified below also providing, they will further be described by the application's specification sheets and the following detailed description.
1. in metal Nano structure, use photon-electron excitation to be enough to the method for means of heating of the localization of initiating chamical reaction as forming localized temperature gradients or generation.
2. also disclose according to the embodiment that exemplifies and in metal Nano structure, carried out photon-electron excitation to heat the works (as pre-formed articles) in the space of determining partly.Easy order of steps provides as follows:
A. by any effective means (including but not limited to beamwriter lithography method, sedimentation and nano-imprint method), on base material (pre-formed articles), develop and/or provide at least a metal Nano structure, such as but not limited to the array of palladium or gold.
B. calculate and/or utilize interval, granularity of P-ERF (for example, perhaps range of frequency), the metallic nanostructure of given selected material etc.
C. use light source in each of described at least one nanostructure, to cause photon-electron resonances with suitable frequency and/or range of frequency and sufficient intensity.This can concentrate by use or dispersive light source (can encourage all metallic nanostructure simultaneously) is finished.
D. in the space of determining, carry out step (c), thereby at least a reactant (for example, the precursor of vaporization) is provided and makes it to contact (metallic nanostructure catalyzed chemical reaction) with the metallic nanostructure that heats.
The control electromagnetic radiation source can be used to start at least/stops to heat.Owing to be the interaction (it produces the heating of metal construction (but not whole base material) by photon-electron resonances) of incidence electromagnetic radiation and metallic nanostructure, heating can cause very apace, also can disappear very apace.From metallic structures, remove incidence electromagnetic radiation flux, can cool off very fast owing to the little metallic structures that causes of size/quality of metallic structures with suitable frequency or range of frequency.
According to described embodiment, can comprise in these features one or more.Certainly, many changes, modification and selection have been one of ordinary skill in the art would recognize that.Specifically, should be understood that dissimilar particles, nano particle or nanostructure can be used in the Same Way.Some particles or nano particle can be used to controlled temperature in the above described manner, rather than have catalytic activity.When reaching suitable temperature, other particle can occur playing catalyzer on the pre-formed articles of agent.
In addition, in conjunction with some embodiments that provide herein, provide and the compatible method and apparatus of conventional manufacturing/treatment technology, and equipment is not done big change.Preferably, the instruction that provides herein provides the combination of the improved method of the design rule that is used for nanometer or smaller szie.These and other benefit will further be described by this specification sheets and following detailed description.
In the embodiment that some exemplify, be to cause by the excitation of photon-electron resonances at least to the specific localization heating of described works such as nanostructure.In other embodiments, the bonded result of the effect that the heating of the specific localization of these works produces as other effect or to the electromagnetic radiation of described works takes place, and causes heat to produce to required temperature.Cause the effect that exemplifies of localization heating of the present invention can comprise photon-electron resonances excitation, phonon lattice vibration, electron hole formation/kinetics and the damping of youth road, perhaps their arbitrary combination.
On the one hand, instruction of the present invention provides the heating that utilizes localization to promote the method for chemical reaction, may further comprise the steps: the base material that is provided with at least a works on it is provided, introducing at least a reactant with described at least a works position adjacent, and with the described at least a works of electromagnetic radiation irradiation.In some embodiments, many works are provided.Described electromagnetic radiation has predetermined frequency or range of frequency, and it can be absorbed by described at least a works, and preferentially encourages the photon-electron resonances at least of described a kind of works.This just provides and has produced the heat of localization from described at least a works, and as the result of photon-electron resonances at least, the described temperature that raises promotes at least a catalyzed chemical reaction that has described at least a reactant to participate in, and this reaction provides at least a reaction product.
In some embodiments, provide at least a works with required configuration on described base material, so that pre-formed articles to be provided, this has determined the position that described at least a catalyzed chemical reaction takes place.Described pre-formed articles can comprise many structures or a kind of structure, and wherein, the perhaps many works of described at least a works have and are selected from for example shape of particle, point, ball, silk, line, film and their arbitrary combination.In some embodiments, described particle, point, ball, silk, line, film and their arbitrary combination have the size (highly, any one in length, width, diameter, radius, the diagonal lines etc. or combination) of nanometer scale.In some embodiments, described particle and/or ball can have the radius of about 0.5-500 nanometer, the radius of perhaps about 1-100 nanometer.
In the embodiment that some exemplify, described at least a works is or comprises at least a metal.Described metal can be a kind of in gold, copper, silver, titanium, aluminium, nickel, palladium, platinum, ruthenium, iridium, iron, cobalt, rhodium, osmium, the zinc, perhaps their arbitrary combination.Described at least a metal can be used as in the described at least a chemical reaction catalyzer and/or as the localization thermal source under temperature of reaction, to provide heat.In the embodiment that some exemplify, described at least a reactant can be gas, liquid, plasma body, solid or their arbitrary combination.
In the embodiment that some exemplify, described at least a works is or comprises at least a element, the perhaps combination of the element in the periodic table of elements, perhaps their arbitrary combination.Described at least a works can be used as the catalyzer in the described at least a chemical reaction and/or is used as the thermal source of localization, to provide heat under chemical reaction temperature.In the embodiment that some exemplify, described at least a reactant can be gas, liquid, plasma body, solid or their arbitrary combination.
In the embodiment that some exemplify, the described at least a chemical reaction that has at least a reactant to participate in can be, for example decomposition reaction, and wherein, described at least a reaction product is or comprises the composition of described at least a reactant.In some embodiments, described at least a reactant is the compound with element-specific ratio, wherein, described at least a reaction product has the element ratio identical with described compound, and described at least a chemical reaction can cause the change of at least a characteristic of described compound.The change that exemplifies comprises, for example the rearranging of atom, the change of bond number, the change of key type, the change of bond angle.In some embodiments, described reaction causes the change of at least a characteristic, and this characteristic has caused the generation of the isomer of described at least a reactant.In some embodiments, the generation of described isomer can cause the generation of enantiomer.
In the embodiment that some exemplify, described have at least a chemical reaction of at least a reactant participation to be, for example any in replacement(metathesis)reaction, addition reaction, elimination reaction, the condensation reaction, perhaps their arbitrary combination.In some embodiments, described at least a reactant combines with at least a second reactant, forms reaction product.
In some embodiments, the form of the laser that is provided by laser source is provided in electromagnetic radiation.According to the present invention, can use various laser sources and laser.For example, electromagnetic radiation can be uv-radiation, visible radiation or ir radiation, perhaps their arbitrary combination.In some embodiments, at least a portion of the described base material of electromagnetic radiation irradiation that provides.
On the one hand, the invention provides method, wherein, described at least a reactant is a carbon compound.In some embodiments, provide at least the second reactant, wherein, described at least a reactant is a carbon compound, and second reactant is a hydrogen-containing compound.
In the embodiment that some exemplify, described base material is by silicon, perhaps III/V family material or the silicon on isolator, and perhaps germanium is perhaps quartzy, perhaps glass, perhaps their arbitrary combination is formed.
In the embodiment that some exemplify, the subgroup (subset) of many works or described many works is aimed in the electromagnetic radiation that will have predetermined frequency or range of frequency.Described many works can comprise the works of at least the first subgroup and second subgroup, and the composition of each subgroup is different.In one embodiment, described first subgroup is heated to first temperature of reaction (electromagnetic radiation irradiation that it provides and the first subgroup results of interaction), to drive at least a catalytic chemical reaction.In the step that another exemplifies, other electromagnetic radiation is provided, and wherein, predetermined frequency or the range of frequency different with the electromagnetic radiation that before provided is provided in described other electromagnetic radiation, and in second subgroup of base material, excite photon-electron resonances at least, be provided for the heat of other reaction thus.
The present invention also provides method and apparatus, wherein, except the described photon-electron resonances that is used to provide disclosed heat, at least a by in the phonon lattice vibration, electron hole formation/kinetics, the damping of youth road also, perhaps their arbitrary combination provides the heat of localization at least in part.
The present invention also provides and has been used for the auxiliary sedimentary demonstration equipment of photoelectricity.In the embodiment that some exemplify, these equipment comprise that definite space, inlet that at least one is communicated with described predetermined space are in order to import predetermined space, the base material that has deposited the base material of at least a works on it and be positioned at predetermined space with at least a reactant.Electromagnetic radiation source also is provided, and it is set to the electromagnetic radiation irradiation base material with preset frequency or range of frequency, and this electromagnetic radiation is absorbed and encouraged the photon-electron resonances at least of described at least a works by described at least a works.In some embodiments, provide electromagnetic radiation to make it shine at least a portion of the base material that is provided with described at least a works on it.This provides the heat of the localization of certain temperature from described at least a works, and it is the result of photon-electron resonances at least, and promotes at least a catalyzed chemical reaction that has described at least a reactant to participate in.Described equipment also comprises at least one outlet that is communicated with described predetermined space.Described at least one outlet can be used for conducting at least a from described predetermined spatial reaction product.Some embodiments can comprise second inlet that is communicated with described predetermined space and/or from described predetermined spatial second outlet.
In the embodiment of some equipment that exemplify, described at least a works comprises at least a metal, for example, but is not limited in gold, copper, silver, titanium, aluminium, nickel, palladium, platinum, ruthenium, iridium, iron, the zinc any, perhaps their arbitrary combination.The form/shape of described at least a works can be any in particle, point, ball, silk, line and the film, and their arbitrary combination.As mentioned above, the embodiment utilization of some described equipment has at least a works of nanometer scale size, and this works has the form/shape as particle, point, ball, silk, line, film and their arbitrary combination.The size that exemplifies, for example height, width, thickness etc. can be the arbitrary values in the 0.5-500 nanometer.Wherein some are about the 1-100 nanometer, and other are about the 10-50 nanometer.
According to described embodiment, at least a metal of described at least a works can be the catalyzer in the described at least a deposition reaction, and/or is used as the thermal source of described reaction.At least a reactant that exemplifies can be any or the arbitrary combination in gas, liquid, plasma body or the solid.
Various other purpose of the present invention, feature and advantage can more fully be understood with reference to following embodiment and accompanying drawing.
Description of drawings
Fig. 1 is schematic works and at least a reactant.
Figure 1A is surface, incidence electromagnetic radiation, the surface electronic on described works surface and the schematic close-up view of at least a reactant of works.
Figure 1B illustrates the first exemplary material layer that places on the described works, and the example surface electronics of second incidence electromagnetic radiation, second reactant and sedimentary exemplary first material layer.
Fig. 1 C is illustrated in the second material settled layer on described first material layer.
Fig. 2 A illustrates exemplary substrate and many works.
Fig. 2 B is the synoptic diagram of the amplification of the reactant in works shown in Fig. 2 A and the exemplary chemical reaction.
Fig. 3 A illustrates exemplary substrate, many works and two kinds of reactants.
Fig. 3 B is the synoptic diagram of the amplification of works shown in Fig. 3 A and another kind of exemplary reaction.
Fig. 4 A illustrates exemplary substrate, many works and reactant.
Fig. 4 B is the synoptic diagram of the amplification of the works shown in Fig. 4 A and another exemplary reaction.
Fig. 5 is the synoptic diagram of the amplification of another kind of exemplary configurations thing, heat and another kind of exemplary reaction.
Fig. 6 is the structural representation of exemplary apparatus of the present invention.
Embodiment
Provide the description to the embodiment that exemplifies, and with reference to constituting its a part of accompanying drawing, described accompanying drawing illustrates by the explanation to the embodiment that exemplifies of herein instruction.It being understood that other embodiment and the purposes of the instruction that can utilize herein, and under prerequisite without departing from the spirit and scope of the present invention, can carry out the 26S Proteasome Structure and Function change.In addition, described accompanying drawing just is used for describing, and is irrelevant or be not subjected to their restriction with concrete size, scale or ratio.
Technology that relates to micrometer structure thing or nanostructure and uses thereof is provided.More particularly, on the one hand, the invention provides a kind of method, system and corresponding structure thing, and they can be used for the new depositing operation formation nanostructure of various uses and the application in the micrometer structure thing in use.As just an example, described depositing operation can be applicable to form one or more layers film when making electron device such as unicircuit, memory media, storage media (volatile and nonvolatile).Be appreciated that the present invention has more wide range of applications.By specific works (for example, but be not limited to particle, bar, silk, ball etc.) incidence electromagnetic radiation ionized surface electronic carried out the heat that the excitation of photon-electron resonances at least produced can be used for various manufacturing process, the especially manufacturing of nanometer scale, chemical treatment and other need produce the very purposes of the heat of localization.
According to certain embodiments of the present invention, these works that can produce heat after the described raying are of a size of about 0.5-500 nanometer, preferably about 1-100 nanometer, the perhaps any concrete scope of their intermediary, in described scope, can be provided at the photon-electron resonances at least that heat is provided under required temperature such as the temperature of reaction.
In one embodiment, use the method for the film of the auxiliary method manufactured materials of photoelectricity can press described according to the embodiment of the present invention:
Base material with surf zone is provided, metal base is set, preferably metallic nanostructure thereon.In this embodiment, described metallic structures can be the one or more particles with specific thermal characteristics (that is, can provide the ability of suitable photon-electron resonances when being exposed to the electromagnetic radiation following time with suitable P-ERF or P-ERF scope).Described P-ERF is a kind of like this frequency, is converted into collective electron motion in the solid structure thing effectively from electromagnetic electromagnetic energy under this frequency.Described photon-electron resonance frequency can obtain by untiing the Maxwell equation with suitable restricted condition, perhaps can be rule of thumb by reflection or absorption spectrometry.Described one or more particle is arranged at least a portion surf zone of described base material.With described one or more particle position adjacent at least a reactant is provided.Described at least a reactant is grouped into by at least a one-tenth, but described reactant can comprise two or more compositions.In selected area of space, described one or more particles are with having the electromagnetic radiation irradiation of the frequency of selection in advance.Described area of space can be limited by the one or more particulate position on base material basically.The area of space that is hit also can comprise on its of base material described one or more particulate zone is not set.Described area of space also can comprise than its of described base material and be provided with little zone, described one or more particulate zone, and for example, radiation drops on some particles in the given time, and not on other.
The previously selected frequency of the electromagnetic radiation of irradiation is/basically consistent frequency consistent with the P-ERF of the metallic structures (here being described one or more particle) that is provided with.This has caused described one or more particulate temperature with thermal characteristics to be increased to chosen temperature at least, because be subjected to having the described at least effect of electromagnetic radiation of previously selected frequency.Base material on every side can not be heated to temperature and be higher than described one or more particles disposed thereon significantly.This heating very specific, localization is (because of photon-electron resonances takes place, photon-electron resonances then produces because of the interaction of surface electronic with predetermined frequency and described one or more particulate delocalizations) provide required energy (promptly, heat) with initiating chamical reaction (this reaction has at least a reactant to participate in), described energy shows as the rising of temperature at least of described one or more particulate.This has caused the formation/sedimentary reaction that can be used for based on the film of the material of described at least a reactant.
It only is for illustrative purposes that metallic structures 8 among Fig. 1 and the 1A-1C is shown as square, and it can be any desired shape, disclosed in as mentioned.Incidence electromagnetic radiation 4 has encouraged the photon-electron resonances of metallic structures 8, and for example in the array on the base material in the CVD environment 2, this environment comprises at least a reactant, such as but not limited to the precursor 6 of vaporization.
Figure 1A-1C is the in-plant synoptic diagram on the surface of works of the present invention, and by the photoelectric interaction in the nanoscale structures thing, heat produces from the works of the invention described above.In Figure 1A, with metallic structures 8 as an example, ionized surface electronic is described as " e -".Have incidence electromagnetic radiation 4 excitations of the frequency consistent and formed photon-electron resonances with the photon-electron resonances of these surface electronics, and photon-electron resonances generate heat to temperature of reaction, under this temperature of reaction, reaction between metallic structures 8 and at least a reactant such as the precursor 6 and/or for example reaction between the precursor 6 itself cause the formation and the settling 10 of material.In some embodiments, described at least a works plays catalyzer and heat producer.As instruction herein, when making the heat localization, chemical reaction and associated any deposition can take place.
Referring to Figure 1B, the material itself of forming settling 10 has ionized surface electronic and (is expressed as " e in this article -").Introduce second incidence electromagnetic radiation 20 and second reactant, as second precursor 21.Described second incidence electromagnetic radiation 20 has and these surface electronics (e -) the frequency of photon-electron resonances unanimity, and excitation and form the heat of at least the second photon-electron resonances and relevant generation.The heats that derives from the photoelectric interaction in the nano particle is relevant with the mean kinetic energy of conduction electron, and incidence electromagnetic radiation can cause the vibration of electronics in the metallic surface zone, increases mean kinetic energy thus.The kinetic energy of described surface electronic with certain some mode at random finally transfer on the electronics (that is body electronics) in interior surface.This is the basis of radiation heating.But if described electromagnetic radiation on P-ERF or approach, then can produce the collective vibration or the resonance of surface electronic, and heating will maximize.Along with the size of works reduces, surface-volume ratio (be directly proportional with 1/R, wherein R is the particulate radius) increases.Specifically, nano particle has high surface-volume ratio, thereby with respect to the body electronics, has more surface electronic.It is generally acknowledged that this shows with the electromagnetic radiation of plasmon resonance frequency nano particle has been carried out effective heating.The optimal absorption frequency can be determined according to the shape of each nano particle and the geometry arrangement of nano particle collective (for example, on a surface).For each spheroidal particle, the calculating of absorption spectrum is traced back to the works of early stage Mie in last century.Recent experimental evidence shows that this heat-processed can very fast time scale be carried out.The heat that produces can be increased to the temperature that is enough to initiating chamical reaction.Can apply described heat between the settling 10 and second precursor 21 and/or between second precursor 21 itself, form second material and settling 18 on the settling 10 that causes formerly producing.
The example that can be used to form the metal of metallic structures comprises Cu, Ag, Au, Ni, Pd, Pt, Rh and Ir etc., owing to have the ionized surface electronic that is called plasmon, described metal has the absorption resonance of visible wavelength.By utilizing because photon-electron resonances at least and relevant heating that the excitation of these surface electronics produces to metal Nano structure, the works of available suitable incident light wavelength and energy heating nano-scale (promptly, nanostructure is such as but not limited to ball, line, array and bar) to the temperature that is suitable for promoting deposition reaction (including but not limited to the material growth).
In some embodiments, the base material of bottom can be by silicon, perhaps (periodictable) III/V family material, and the silicon on isolator, perhaps germanium is perhaps quartzy, perhaps glass, perhaps their arbitrary combination is formed.In this article in any situation of Miao Shuing, the electromagnetic radiation that provides can constant speed provide and/or pulse on base material, and owing to the result with the photoelectric interaction at least of some compositions of described works perhaps many structures produces heat.In some embodiments, these compositions are the nanostructures that contain metal.Promoted reaction provides the reaction product of random number of types, and some of them can be deposited on the base material 2.
In some embodiments, base material can be by silicon, perhaps (periodictable) III/V family material, and the silicon on isolator, perhaps germanium is perhaps quartzy, perhaps a kind of in the glass, perhaps their arbitrary combination is formed.In this article in any situation of Miao Shuing, the electromagnetic radiation that provides can constant speed provide and/or pulse on base material, and owing to produce heat with the result of the photoelectric interaction at least of the perhaps many works of described works (in some embodiments, for containing the nanostructure of metal).
Various chemical reactions can occur in described at least a works or many works (for example, array) are gone up or its adjacent.In addition, can be as described at least one structure of the thermal source that localizes simultaneously as the catalyzer at least a chemical reaction.As previously mentioned, described at least a works, preferably contain metal as, but be not limited to gold, copper, silver, titanium, aluminium, nickel, palladium, platinum, ruthenium, iridium, iron, cobalt, osmium, zinc, rhodium or their arbitrary combination.Provide in the particulate embodiment of many nanostructures at some, at least some are only as thermal source, and some are only as catalytic unit.Provide in the embodiment of many works at some, the works of at least the first and second subgroups can be provided.Described subgroup (works) can be made up of identical materials, and has mutually different shape/form, is arranged on the base material 2 (for example, an array and a ***ine).Other embodiment that can imagine is included in the works of the some subgroups on the base material, form by different materials, the works of each subgroup has specific thermal characteristics, for example, at least photon-electron resonances, thus heat (electromagnetic radiation of these frequencies or range of frequency does not then have the effect of exciting light electric resonance at least for other subgroup) can by the electromagnetic radiation of specific frequency or range of frequency the time, can be produced.This provides specific heat by specific subgroup, being used for specific chemical reaction, everything occur in base material on described other second subgroup position adjacent.
As previously mentioned, at least a works can be provided, it is particle, point, ball, silk, line, film or their arbitrary combination, size with nanometer scale, that is, have the one or any suitable combination in height, length, width, radius, diagonal lines, the diameter, its value is 0.5-500nm, preferably 1-100nm, the perhaps any range between them.
According to the reactant of the chemical reaction that exemplifies provided by the invention can be in gas, liquid, plasma body or the solid any one.According to the present invention, can provide various types of reactions.The reaction that exemplifies can be decomposition reaction, and wherein, at least a reaction product is or contains the composition of described at least a reactant.This is shown among Fig. 2 A, and wherein, many metallic structures 8 are shown on the base material 2,4 irradiations of the electromagnetic radiation with predetermined frequency or range of frequency of the photon-electron resonances at least that excites each metallic structures 8 of being attended the meeting.The decomposition reactant 62 that exemplifies also is provided.Fig. 2 B is the schematic enlarged view of single metal works 8, this works produces heat (being expressed as many wavy lines 29 here) under chemical reaction temperature, described heat is to be caused by the photon-electron resonances that excites as results of interaction between the electromagnetic radiation 4 of the photoelectricity electronics of metallic structures 8 and suitable photon-electron resonance frequency or range of frequency at least.The rising of this temperature occurs in catalyzer (can be described metallic structures) position adjacent, on catalyzer and/or in the partial consecutive position of catalyzer.The decomposition reactant 62 that exemplifies is decomposed, and is broken at least two part 62A and 62B, and at least a required reaction product is provided.The reaction of describing among Fig. 2 A and the 2B that exemplifies is sometimes referred to as elimination reaction, wherein, and reactant cancellation by being broken for component portion.
The chemical reaction that another kind exemplifies can be a replacement(metathesis)reaction, wherein, described at least a reactant and at least a second reactant reaction are replaced as itself or itself a part with the part of second reactant, and/or add and be bonded on second reactant, produce reaction product.This schematically is shown among Fig. 3 A, and wherein, in the embodiment that this exemplifies, many metallic structures 8 are provided on the base material 2.Suitable electromagnetic radiation 4 is provided,, produces heat from described many metallic structures 8 in the exciting light electric resonance at least of many metallic structures 8.Here, first reactant that exemplifies represents that with a diabolo 62 that connects second reactant that exemplifies is represented with a pair of circle 6 that connects.Shown in the schematic enlarged view of Fig. 3 B, heat 29 is with catalyzer (can be metallic structures) position adjacent, provide required temperature of reaction on catalyzer and/or in the partial consecutive position of catalyzer, and at least a chemical reaction takes place.In this embodiment, in the trilateral one (can be the part of first reactant that exemplifies) by the displacement of the part of described second reactant, forms the reaction product that at least one has a part of first reactant and a part of second reactant.In Fig. 3 B, this is expressed as the circle and the trilateral 64 of connection.In the reaction that another kind exemplifies, the integral body of first reactant and at least the second reactant is in conjunction with forming the addition reaction product.Promptly, as shown in Figure 5, second reactant that is denoted as first reactant of star 82 and is denoted as circle 83 adds under the chemical reaction temperature that provides and lumps together, and forms addition reaction product (be expressed as a pair of star 82 here, and circle 83 forms addition reaction products 88).
In some embodiments, at least a reactant of at least a chemical reaction that provides is an initial compounds 73, and it has specific element ratio, and described element is represented with circle, squares and triangles in Fig. 4 A.As previously mentioned, provide suitable electromagnetic radiation 4, the photon-electron resonances at least by metallic structures 8 produces suitable heat to chemical reaction temperature, and at least a chemical reaction takes place, as shown in Fig. 4 B.Here, described at least a reaction and at least a reaction product (be expressed as variation after compound 79) have the element ratio identical with initial compounds 73, and described at least a chemical reaction causes the change of at least a characteristic of initial compounds 73.The change that exemplifies comprises any in the change of the change of change, key type of the rearranging of atom, bond number and bond angle, perhaps their arbitrary combination.In some embodiments, described at least a reaction makes at least a characteristic of initial compounds 73 change, and for example causes the isomer of described at least a reactant to produce.In some embodiments, the generation of this isomer can cause the generation of enantiomer.
The equipment that exemplifies according to an aspect of the present invention is depicted schematically among Fig. 6.In this embodiment, described equipment comprises definite space 1200, be communicated with, be used at least a reactant is imported from least one reactant feeder 1204 at least one inlet in the space of determining 1200 with the space of determining 1200, be provided with the base material 2 (it is the array 7 that comprises for example many metallic structures 8) of at least a works on it here.Other structure also should be thought within scope of the present invention and instruction.Base material 2 is positioned within described definite space, and electromagnetic radiation source 1202 is provided.Described electromagnetic radiation source 1202 is set to the described base material of electromagnetic radiation irradiation (described base material and/or its part are provided with at least a works) with preset frequency or range of frequency, described electromagnetic radiation meeting by described at least a works (here, as an example, be shown as array 7 with many metallic structures 8) absorb, and encourage the photon-electron resonances at least of described many metallic structures 8.In some embodiments, provide electromagnetic radiation 4 to make it shine at least a portion of the base material that is provided with at least a works on it.Like this, described at least a works consequently, has produced the heat of localization to I haven't seen you for ages photon-electron resonances, and it reaches chemical reaction temperature, thereby at least a chemical reaction that has at least a reactant that is provided by reactant feeder 1204 to participate in is provided.At least one outlet 1219 that is communicated with the space of determining 1200 also is provided.Described at least one outlet 1219 can be used at least a reactant is derived from the space of determining 1200.In some embodiments, also can have is communicated with the space of determining 1200 second enter the mouth 1218 and in the second reactant feeder 1206 of second reactant is arranged.In addition, in this embodiment, also can provide other outlet 1220 that is communicated with space 1200 fluids of determining, and Analytical equipment 1210, for example gas chromatograph.In addition, also can provide vacuum pump 1208, it can be used to collect at least a reaction product and/or reaction product is sucked Analytical equipment 1210.Certainly, as shown in Figure 6, for example can provide suitable valve 1205.Equipment of the present invention is always operated and can be undertaken by at least one computer system 1021 monitoring and the control of reaction, and it operationally is communicated with each integral part of the equipment of assembling, as shown in Figure 6.Reactant supply-pipe 1204 and 1206 reactant can be required state (as gas, liquid, solid or plasma body or their arbitrary combination) be provided to definite space 1200.
In some embodiments of described equipment, described at least a works (here, be many metallic structures 8) contain at least a metal, a kind of such as but not limited in gold, copper, silver, titanium, aluminium, nickel, palladium, platinum, ruthenium, rhodium, iridium, iron and the zinc, perhaps their arbitrary combination.The form/shape of described at least a works can be any in particle, point, ball, silk, line, the film, and perhaps their arbitrary combination is disclosed in as mentioned.As mentioned above, in some embodiments of equipment, utilize at least a shape/form for example to be the works of particle, point, ball, silk, line, film and their arbitrary combination, this works has the size of nanometer scale.The size of these works, for example height, width, thickness, diameter, length or their arbitrary combination are about the 0.5-500 nanometer.In some embodiments, the size of described at least a works is about the 1-100 nanometer, is about the 10-50 nanometer in other embodiments.These sizes make photon-electron resonances can produce the heat of required temperature of reaction.
According to described embodiment, the described at least a metal of described at least a works is the catalyzer of described at least a chemical reaction, and/or is used as the thermal source of chemical reaction.The temperature of the chemical reaction that exemplifies can be a hundreds of degree centigrade, for example, and 60-1200 ℃, and according to the present invention, the heating of localization can reach described temperature.In various embodiments, for example apply laser, may command chemical time and temperature by pulse feature.According to the present invention, the equipment that exemplifies that provides herein can hold various chemical reactions, as mentioned above.
In some embodiments, the equipment that exemplifies comprises at least one electromagnetic radiation source 1202, can get self-excitation light source, such as but not limited to solid laser, semiconductor diode laser, helium-neon gas laser, argon ion gas laser, krypton ion gas laser, xenon ion gas laser, tunable laser and/or lamp.Preferably, the wavelength of described pre-selected is about 100 nanometers to about 10 microns.Electromagenetic wave radiation 4 in the described equipment can comprise a kind of in uv-radiation, visible radiation or the ir radiation or their arbitrary combination.Described electromagnetic radiation source provides the electromagnetic radiation of the pulse with preset frequency or range of frequency.
As mentioned above, electromagnetic radiation of the present invention can be provided by the light source of any amount such as laser source or lamp.Electromagnetic radiation 4 can be the arbitrary combination of any or they in ultraviolet electromagnetic radiation, visible light electromagnetic radiation or the infrared electromagnetic radiation.
Though photon-electron resonances is described in detail, expects that also various other effects (individually or with arbitrary combination) can help above-mentioned very localization, specific thermogenesis.They can comprise the damping of youth road, electron hole formation/kinetics and phonon lattice vibration, with the form of arbitrary combination and effect.
It is also understood that, embodiment of Miao Shuing and embodiment are only used for illustrative purpose herein, various changes or modification to it are that those skilled in the art can predict, and drop within the application's spirit and scope, appending claims and their combination.

Claims (75)

1. a heating of using the localization that photon-electron resonances produces promotes the method for catalyzed chemical reaction, comprising:
The base material that is provided with at least a works on it is provided;
At least a reactant is introduced and described at least a works position adjacent;
With the described at least a works of electromagnetic radiation irradiation, wherein, described electromagnetic radiation has predetermined frequency or range of frequency, encourages described at least a works, makes its photon-electron resonances at least;
Make the described at least a works heat of photon-electron resonances, generation localization at least, reach the catalyzed chemical reaction temperature, promote at least a catalyzed chemical reaction that has described at least a reactant to participate in; And
Produce at least a reaction product.
2. the method for claim 1 is characterized in that, described at least a works is provided on the described base material with required configuration, forms pre-formed articles.
3. the method for claim 1 is characterized in that, described at least a works contains at least a metal.
4. method as claimed in claim 3 is characterized in that, described at least a works has the form that is selected from particle, point, ball, silk, line, film and their arbitrary combination.
5. method as claimed in claim 4 is characterized in that, described at least a metal is selected from gold, copper, silver, titanium, aluminium, nickel, palladium, platinum, ruthenium, iridium, iron, cobalt, osmium, zinc, rhodium and their arbitrary combination.
6. method as claimed in claim 5 is characterized in that, described at least a metal is used as catalyzer in described at least a catalytic chemical reaction.
7. method as claimed in claim 5 is characterized in that, described at least a metal provides the heat of described catalyzed chemical reaction temperature only as the thermal source of localization.
8. method as claimed in claim 4 is characterized in that, described point, ball, silk, line, film and their arbitrary combination are nano level.
9. method as claimed in claim 5 is characterized in that, described metal is by one or more granulometric composition, and each particulate diameter is about the 0.5-500 nanometer.
10. the method for claim 1 is characterized in that, described at least a reactant is a gas.
11. the method for claim 1 is characterized in that, described at least a reactant is a liquid.
12. the method for claim 1 is characterized in that, described at least a reactant is a plasma body.
13. the method for claim 1 is characterized in that, described at least a reactant is a solid.
14. the method for claim 1 is characterized in that, the described at least a chemical reaction that has described at least a reactant to participate in is decomposition reaction, and described at least a reaction product is or contains the composition of described at least a reactant.
15. the method for claim 1, it is characterized in that, described at least a reactant is the compound with element-specific ratio, wherein, described at least a reaction product has the element ratio identical with described compound, and described at least a catalyzed chemical reaction causes the change of at least a performance of described compound.
16. method as claimed in claim 15 is characterized in that, the change of described at least a performance is selected from the rearranging of atom, the change of bond number, the change of key type, the change of bond angle and their arbitrary combination.
17. method as claimed in claim 15 is characterized in that, the change of described at least a performance causes the generation of the isomer of described at least a reactant.
18. the method for claim 1 is characterized in that, the generation of described isomer comprises the generation of enantiomer.
19. the method for claim 1, it is characterized in that, the described at least a catalyzed chemical reaction that has described at least a reactant to participate in is a replacement(metathesis)reaction, wherein, the described at least a reactant and at least the second reactant reaction, with a part of itself replacing described second reactant, produce described reaction product.
20. the method for claim 1, it is characterized in that the described at least a catalyzed chemical reaction that has described at least a reactant to participate in is addition reaction, wherein, the described at least a reactant and at least the second reactant mutually combine, and form described reaction product.
21. the method for claim 1, it is characterized in that the described at least a catalyzed chemical reaction that has described at least a reactant to participate in is an elimination reaction, wherein, described at least a reactant is broken for described reaction product, and described reaction product comprises at least two parts.
22. the method for claim 1 is characterized in that, the form of the laser that is provided by laser source is provided in described electromagnetic radiation.
23. the method for claim 1 is characterized in that, described electromagnetic radiation is selected from uv-radiation, visible radiation, ir radiation and their arbitrary combination.
24. the method for claim 1 is characterized in that, described electromagnetic radiation with predetermined frequency or range of frequency is applied on the described at least a works with impulse form.
25. the method for claim 1 is characterized in that, the described at least a portion that is provided with the base material of described at least a works on it of described electromagnetic radiation irradiation with predetermined frequency or range of frequency.
26. the method for claim 1 is characterized in that, described electromagnetic radiation with predetermined frequency or range of frequency is absorbed by described at least a works at least in part.
27. the method for claim 1 is characterized in that, described at least a works is combined to form on described base material by nano-imprint, deposition or beamwriter lithography method or they.
28. a method of utilizing the heating promotion chemical reaction of localization comprises:
The base material that is provided with many works on it is provided;
At least a reactant is introduced and described many works position adjacent;
With the described many works of electromagnetic radiation irradiation, wherein, described electromagnetic radiation has predetermined frequency or range of frequency, encourages described many structures, makes its photon-electron resonances at least;
Make described many works heat of photon-electron resonances, generation localization at least, reach the catalyzed chemical reaction temperature, promote at least a chemical reaction that has described at least a reactant to participate in; And
At least a reaction product is provided.
29. method as claimed in claim 28 is characterized in that, described many works are provided on the described base material with required configuration shape, form pre-formed articles.
30. method as claimed in claim 28 is characterized in that, described many works contain at least a metal.
31. method as claimed in claim 28 is characterized in that, described electromagnetic radiation with predetermined frequency or range of frequency is absorbed by described many works at least in part.
32. method as claimed in claim 30 is characterized in that, described at least a metal is selected from gold, copper, silver, titanium, aluminium, nickel, palladium, platinum, ruthenium, iridium, iron, cobalt, zinc, osmium, rhodium and their arbitrary combination.
33. method as claimed in claim 28 is characterized in that, described base material is by silicon, perhaps III/V family material or the silicon on isolator, and perhaps germanium is perhaps quartzy, perhaps glass, perhaps their arbitrary combination is formed.
34. method as claimed in claim 32 is characterized in that, described metal construction is by granulometric composition, and each particulate diameter is about the 0.5-500 nanometer.
35. method as claimed in claim 32 is characterized in that, described metal construction is by granulometric composition, and each particulate diameter is about the 1-100 nanometer.
36. method as claimed in claim 28 is characterized in that, the form of the laser that is provided by laser source is provided in described electromagnetic radiation.
37. method as claimed in claim 28 is characterized in that, described electromagnetic radiation is selected from uv-radiation, visible radiation, ir radiation and their arbitrary combination.
38. method as claimed in claim 28 is characterized in that, described at least a reactant is a gas.
39. method as claimed in claim 28 is characterized in that, described at least a reactant is a liquid.
40. method as claimed in claim 28 is characterized in that, described at least a reactant is a plasma body.
41. method as claimed in claim 28 is characterized in that, described at least a reactant is a solid.
42. method as claimed in claim 28 is characterized in that, described electromagnetic radiation with predetermined frequency or range of frequency is applied on the subgroup of described many works or described many works with the form of pulse.
43. method as claimed in claim 28 is characterized in that, described many works are made up of the works of the first subgroup and the works of second subgroup at least, and each subgroup is different on forming.
44. method as claimed in claim 28 is characterized in that, with described first subgroup of described electromagnetic radiation irradiation, makes it be heated to first temperature of reaction, drives described at least a catalyzed chemical reaction.
45. method as claimed in claim 43, it is characterized in that, also comprise the step that another kind of electromagnetic radiation is provided, wherein, described another kind of electromagnetic radiation has predetermined frequency or the range of frequency different with above-mentioned electromagnetic radiation, the works that encourages described second subgroup is photon-electron resonances at least, produces the heat that is used for another chemical reaction.
46. method as claimed in claim 28, it is characterized in that, except described photon-electron resonances, the heat of localization is at least a by in phonon lattice vibration, electron hole formation/kinetics and the damping of youth road at least in part, and perhaps their arbitrary combination provides.
47. method as claimed in claim 28 is characterized in that, described many works are combined to form on described base material by nano-imprint, deposition or beamwriter lithography method or they.
48. an equipment that is used to carry out chemical catalysis comprises:
Reaction chamber;
At least one is communicated with, is used at least a reactant is imported the inlet of described reaction chamber with described reaction chamber;
Be provided with the base material of at least a works on it, described base material is positioned at described reaction chamber;
Be used to shine the electromagnetic radiation source of described base material, described electromagnetic radiation has predetermined frequency or range of frequency, can be absorbed by described at least a works, and encourage described at least a works, make its photon-electron resonances at least, produce the heat of localization, reach the catalyzed chemical reaction temperature, promote at least a catalyzed chemical reaction that has described at least a reactant to participate in; And
At least one is communicated with described reaction chamber, is used for the outlet of at least a reaction product from described reaction chamber derivation.
49. equipment as claimed in claim 48 is characterized in that, described at least a works contains at least a metal.
50. equipment as claimed in claim 48 is characterized in that, described at least a works has the form of the group of being selected from down: particle, point, ball, silk, line, film and their arbitrary combination.
51. equipment as claimed in claim 49 is characterized in that, described at least a metal is selected from gold, copper, silver, titanium, aluminium, nickel, palladium, platinum, ruthenium, iridium, iron, cobalt, osmium, rhodium and their arbitrary combination.
52. equipment as claimed in claim 49 is characterized in that, described at least a metal is the catalyzer of described at least a chemical reaction.
53. equipment as claimed in claim 49 is characterized in that, described at least a metal only as the thermal source of localization, provides the heat that reaches described chemical reaction temperature.
54. equipment as claimed in claim 50 is characterized in that, described particle, point, ball, silk, line, film and their arbitrary combination have nano-grade size.
55. equipment as claimed in claim 54 is characterized in that, described nano-grade size is about the 0.5-500 nanometer.
56. equipment as claimed in claim 54 is characterized in that, described nano-grade size is about the 1-100 nanometer.
57. equipment as claimed in claim 48 is characterized in that, described at least a reactant is a gas.
58. equipment as claimed in claim 48 is characterized in that, described at least a reactant is a liquid.
59. equipment as claimed in claim 48 is characterized in that, described at least a reactant is a plasma body.
60. equipment as claimed in claim 48 is characterized in that, described at least a reactant is a solid.
61. equipment as claimed in claim 48 is characterized in that, described at least the second inlet is communicated with described reaction chamber.
62. equipment as claimed in claim 48 is characterized in that, the described at least a catalyzed chemical reaction that has described at least a reactant to participate in is decomposition reaction, and described at least a reaction product is or contains the composition of described at least a reactant.
63. equipment as claimed in claim 48, it is characterized in that, described at least a reactant is the compound with element-specific ratio, wherein, described at least a reaction product has the element ratio identical with described compound, and described at least a catalyzed chemical reaction causes the change of at least a performance of described compound.
64., it is characterized in that the change of described at least a performance is selected from the rearranging of atom, the change of bond number, the change of key type, the change of bond angle and their arbitrary combination as the described equipment of claim 63.
65., it is characterized in that the change of described at least a performance causes the generation of the isomer of described at least a reactant as the described equipment of claim 63.
66., it is characterized in that the generation of described isomer comprises enantiomer as the described equipment of claim 65.
67. equipment as claimed in claim 48, it is characterized in that, the described at least a catalyzed chemical reaction that has described at least a reactant to participate in is a replacement(metathesis)reaction, wherein, the described at least a reactant and at least the second reactant reaction, with itself part displacement, produce described reaction product with described second reactant.
68. equipment as claimed in claim 48, it is characterized in that the described at least a catalyzed chemical reaction that has described at least a reactant to participate in is addition reaction, wherein, the described at least a reactant and at least the second reactant mutually combine, and form described reaction product.
69. equipment as claimed in claim 48, it is characterized in that the described at least a catalyzed chemical reaction that has described at least a reactant to participate in is an elimination reaction, wherein, described at least a reactant is broken for described reaction product, and described reaction product comprises at least two parts.
70. equipment as claimed in claim 48 is characterized in that, described electromagnetic radiation is selected from uv-radiation, visible radiation, ir radiation and their arbitrary combination.
71. equipment as claimed in claim 48 is characterized in that, described electromagnetic radiation source provides the electromagnetic radiation of the chopping with predetermined frequency or range of frequency.
72. equipment as claimed in claim 48 is characterized in that, the described electromagnetic radiation source that electromagnetic radiation with predetermined frequency or range of frequency is provided is set to shine described at least a portion that is provided with the base material of described at least a works on it.
73. equipment as claimed in claim 48 is characterized in that, described at least a works is combined to form on described base material by nano-imprint, deposition or beamwriter lithography method or they.
74. the heating with the localization of photon-electron resonances generation promotes the method for catalyzed chemical reaction, comprising:
Expose to less a kind of works with electromagnetic radiation, wherein, described electromagnetic radiation has predetermined frequency or range of frequency, encourages described at least a works, makes its photon-electron resonances at least;
At least a reactant is introduced and described at least a works position adjacent;
Make the heat of the localization that described at least a works produces by photon-electron resonances at least reach the catalyzed chemical reaction temperature, promote at least a catalyzed chemical reaction that has described at least a reactant to participate in; And
The base material that is provided with at least a works on it is provided.
75. as the described method of claim 74, it is characterized in that, also comprise producing at least a reaction product.
CNA2004800373641A 2003-12-15 2004-12-14 Electromagnetic control of chemical catalysis Pending CN101090990A (en)

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WO2023123069A1 (en) * 2021-12-29 2023-07-06 陆一平 Method for adjusting electromagnetic wave reaction on surface of material, and combined structure thereof

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TWI401205B (en) 2008-01-31 2013-07-11 Ind Tech Res Inst Fabricating method for an applied substrate employing photo-thermal effect
CN101519184B (en) * 2008-02-29 2012-05-23 财团法人工业技术研究院 Method for manufacturing application substrate through photo-thermal effect
CN101799420B (en) * 2010-03-10 2012-02-29 中国科学院光电技术研究所 Manufacture method of metal micro-nano structure for improving Raman scattering of molecule
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WO2023123069A1 (en) * 2021-12-29 2023-07-06 陆一平 Method for adjusting electromagnetic wave reaction on surface of material, and combined structure thereof

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