WO2005060635A3 - Electromagnetic control of chemical catalysis - Google Patents

Electromagnetic control of chemical catalysis Download PDF

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Publication number
WO2005060635A3
WO2005060635A3 PCT/US2004/041832 US2004041832W WO2005060635A3 WO 2005060635 A3 WO2005060635 A3 WO 2005060635A3 US 2004041832 W US2004041832 W US 2004041832W WO 2005060635 A3 WO2005060635 A3 WO 2005060635A3
Authority
WO
WIPO (PCT)
Prior art keywords
catalytic chemical
particles
chemical reaction
structures
electromagnetic control
Prior art date
Application number
PCT/US2004/041832
Other languages
French (fr)
Other versions
WO2005060635A2 (en
Inventor
Leslie Greengard
David A Boyd
Mark Brongersma
Original Assignee
Leslie Greengard
David A Boyd
Mark Brongersma
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leslie Greengard, David A Boyd, Mark Brongersma filed Critical Leslie Greengard
Priority to AU2004305048A priority Critical patent/AU2004305048A1/en
Priority to EP04818015A priority patent/EP1694822A2/en
Priority to CA002549475A priority patent/CA2549475A1/en
Priority to JP2006544100A priority patent/JP2007525315A/en
Publication of WO2005060635A2 publication Critical patent/WO2005060635A2/en
Publication of WO2005060635A3 publication Critical patent/WO2005060635A3/en

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/0046—Sequential or parallel reactions, e.g. for the synthesis of polypeptides or polynucleotides; Apparatus and devices for combinatorial chemistry or for making molecular arrays
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using coherent light, UV to IR, e.g. lasers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00277—Apparatus
    • B01J2219/00495—Means for heating or cooling the reaction vessels
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00277—Apparatus
    • B01J2219/00497—Features relating to the solid phase supports
    • B01J2219/00527—Sheets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00718—Type of compounds synthesised
    • B01J2219/00745—Inorganic compounds
    • B01J2219/00747—Catalysts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites

Abstract

The present disclosure methods and systems that provide heat, via at least Photon-Electron resonance, also known as excitation, of at least a particle utilized, at least in part, to initiate and/or drive at least one catalytic chemical reaction In some implementations, the particles are structures or metallic structures, such as nanostructures (8). The one or more metallic structures are heated at least as a result of interaction of incident electromagnetic radiation, having particular frequencies and/or frequency ranges, with delocalized surface electrons of the one or more particles. This provides a control of catalytic chemical reactions, via spatial and temporal control of generated heat, on the scale of nanometers as well as a method by wnich catalytic chemical reaction temperatures are provided.
PCT/US2004/041832 2003-12-15 2004-12-14 Electromagnetic control of chemical catalysis WO2005060635A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
AU2004305048A AU2004305048A1 (en) 2003-12-15 2004-12-14 Electromagnetic control of chemical catalysis
EP04818015A EP1694822A2 (en) 2003-12-15 2004-12-14 Electromagnetic control of chemical catalysis
CA002549475A CA2549475A1 (en) 2003-12-15 2004-12-14 Electromagnetic control of chemical catalysis
JP2006544100A JP2007525315A (en) 2003-12-15 2004-12-14 Electromagnetic control method of chemical catalyst

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US52986903P 2003-12-15 2003-12-15
US60/529,869 2003-12-15

Publications (2)

Publication Number Publication Date
WO2005060635A2 WO2005060635A2 (en) 2005-07-07
WO2005060635A3 true WO2005060635A3 (en) 2007-05-03

Family

ID=34710144

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2004/041832 WO2005060635A2 (en) 2003-12-15 2004-12-14 Electromagnetic control of chemical catalysis

Country Status (8)

Country Link
EP (1) EP1694822A2 (en)
JP (1) JP2007525315A (en)
KR (1) KR20070026370A (en)
CN (2) CN101090990A (en)
AU (1) AU2004305048A1 (en)
CA (1) CA2549475A1 (en)
WO (1) WO2005060635A2 (en)
ZA (1) ZA200604251B (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI401205B (en) 2008-01-31 2013-07-11 Ind Tech Res Inst Fabricating method for an applied substrate employing photo-thermal effect
CN101519184B (en) * 2008-02-29 2012-05-23 财团法人工业技术研究院 Method for manufacturing application substrate through photo-thermal effect
CN101799420B (en) * 2010-03-10 2012-02-29 中国科学院光电技术研究所 Manufacture method of metal micro-nano structure for improving Raman scattering of molecule
CN102517566B (en) * 2011-12-16 2015-02-04 姜谦 Method for selectively depositing atom layer to film by spray head device
KR102265643B1 (en) 2013-05-21 2021-06-17 네덜란제 오르가니자티에 포오르 토에게파스트-나투우르베텐샤펠리즈크 온데르조에크 테엔오 Chemical conversion process
EP3581371B1 (en) * 2018-06-14 2021-04-14 Fundació Institut de Ciències Fotòniques A method and a system for self-repairing an object
WO2023123067A1 (en) * 2021-12-29 2023-07-06 陆一平 Method and combined structure for forming and adjusting surface plasma pattern of material
WO2023123069A1 (en) * 2021-12-29 2023-07-06 陆一平 Method for adjusting electromagnetic wave reaction on surface of material, and combined structure thereof

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020127170A1 (en) * 2000-09-22 2002-09-12 Eun-Hwa Hong Method of synthesizing carbon nanotubes and apparatus used for the same

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020127170A1 (en) * 2000-09-22 2002-09-12 Eun-Hwa Hong Method of synthesizing carbon nanotubes and apparatus used for the same

Also Published As

Publication number Publication date
ZA200604251B (en) 2008-05-28
AU2004305048A1 (en) 2005-07-07
CN1894438A (en) 2007-01-10
JP2007525315A (en) 2007-09-06
WO2005060635A2 (en) 2005-07-07
CA2549475A1 (en) 2005-07-07
EP1694822A2 (en) 2006-08-30
KR20070026370A (en) 2007-03-08
CN101090990A (en) 2007-12-19

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