CN101073033A - Method of housing large pellicle - Google Patents
Method of housing large pellicle Download PDFInfo
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- CN101073033A CN101073033A CN200480044532.XA CN200480044532A CN101073033A CN 101073033 A CN101073033 A CN 101073033A CN 200480044532 A CN200480044532 A CN 200480044532A CN 101073033 A CN101073033 A CN 101073033A
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- large pellicle
- pallet
- framework
- diaphragm
- casing
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
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- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Library & Information Science (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Packaging Frangible Articles (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Packages (AREA)
Abstract
According to the invention, an IP core is clocked during a debugging operation by switching from the clock used for testing the device under test to a clock oscillator or any other free-running clock source.
Description
Technical field
The present invention relates to the accommodation method and the container structure body thereof of large pellicle (ペ リ Network Le), described accommodation method can be with the area of guard shield film at 1000cm
2Above large pellicle is accommodated in stable status in the casing that is made of pallet and lid, and described large pellicle is used for preventing adhering to foreign matter on employed photomask of photo-mask process when making the thin film transistor (TFT) (TFT) that constitutes LSI, LCD (LCD) and color filter (CF) etc. or the graticule.
Background technology
In making process such as semiconductor circuit pattern in the past, as record in aftermentioned patent documentation 1 like that, the employing dust prevention that is called guard shield prevents that foreign matter is attached on photomask or the graticule usually.The structure of guard shield is as follows: sprawl and be bonded with thickness and be nitrocellulose or transparent polymeric films such as cellulose derivative or fluoropolymer (hereinafter referred to as the guard shield film) below the 10 μ m on the upper limb face of the framework of several micron thickness of the shape that the shape that has with photomask or graticule is complementary; and; lower edge face at this framework scribbles binding material, and the bounding force with regulation is stained with diaphragm on this binding material.
Above-mentioned binding material is used for guard shield is anchored at photomask or graticule, and, for can remaining to this binding material, the bounding force that makes this binding material is used for this purposes, and use diaphragm to protect the adhesive surface of this binding material.Be transported to this guard shield user's the process from the fabricator, go up or prevent the guard shield damage attached to guard shield film etc. in order to prevent foreign matter, usually this guard shield is accommodated in the casing that is made of pallet and lid, and then this casing is contained in Dust-proof bag etc. transports.
Will be as the area of object of the present invention at 1000cm
2The casing that is made of pallet and lid that above large pellicle is taken in adopts the vacuum forming moulding usually, and the past is accommodated in large pellicle in the casing by cover lid after large pellicle being placed on the pallet.When making above-mentioned casing, to in a planned way manufacture and design, so that be accommodated in the framework of the large pellicle in the casing and the interval between the lid more than 0mm and less than 1mm, at this compartment, lid is pushed down large pellicle, causes large pellicle to move in casing and generation friction or dust thereby prevented to transport medium vibration.
, for taking in area at 1000cm
2The large-size box of above guard shield, there are the following problems.Promptly, in large-size box, owing to there is the clearance issues of guard shield and casing, perhaps exist casing to be difficult to satisfy the problems such as requirement of planarization, cause large pellicle around and the interval between the lid of casing can not be controlled at more than the 0mm exactly and less than the scope of 1mm, therefore, under the condition of keeping the formed precision that satisfies existing design philosophy, be difficult to produce large-size box.
Therefore, in the time of in large pellicle being accommodated in the large-size box made from existing design philosophy, during being spaced apart 0mm so that lid and contacting between large pellicle and lid with large pellicle, lid is pushed down the framework of large pellicle, thereby when transporting large pellicle etc., between the framework of lid and large pellicle, produce friction and dust occurs, thereby produce foreign matter attached to the problem on the large pellicle.
In addition, between large pellicle and lid, be spaced apart 1mm when above, can not push down large pellicle with lid and make it to keep stable, thereby when transporting large pellicle, large pellicle occurs moving in casing or vibration, cause between casing and large pellicle, producing friction and dust occurring, thereby the generation foreign matter is attached to the problem on the large pellicle.
In order to solve above-mentioned problems, the application's applicant has finished patent documentation 2, patent documentation 3 or patent documentation 4 described inventions as described later, has proposed patented claim.
The technology of record is in the aftermentioned patent documentation 2: the outstanding teat that erects that is provided with on the tray surface of the casing of taking in guard shield; and; side at this teat is provided with undercut portions, is maintained fixed the guard shield that places on the pallet among inserting this undercut portions by the diaphragm with guard shield.In addition, the technology of record is in the patent documentation 3: the binding material that will have the regulation bounding force earlier is coated in the diaphragm lower surface of guard shield, when being placed on guard shield on the pallet, by diaphragm is bonded on the pallet guard shield is remained fixed on the pallet.In addition; the technology of record is in the patent documentation 4: the end face by the casing lid hangs bar-shaped pressing body; when covering this lid on pallet, push down the diaphragm that is placed on the guard shield on the pallet from the top with this pressing body, thus guard shield is remained fixed on the pallet.
Patent documentation 1: special public clear 54-28718 communique
Patent documentation 2: the spy opens flat 11-38597 communique
Patent documentation 3: the spy opens flat 11-24238 communique
Patent documentation 4: the spy opens flat 11-52553 communique
Summary of the invention
The invention that is recorded in above-mentioned patent documentation 2~patent documentation 4 is very effective to taking in over commonly used 5 inches or 6 inches this casings that are used for semi-conductive guard shield, still, and to taking in area as the guard shield of object of the present invention at 1000cm
2When the casing of above large pellicle is used these inventions, there are some problems described later.
In the technology of patent documentation 2, adopt vacuum forming with low cost and that be easy to make, the outstanding teat that erects that is provided with on tray surface, and in the darker undercut portions of the side of this teat setting, there is the problem that is difficult to obtain enough formed precisions in this method.In addition, when adopting injection moulding moulding pallet, though, adopting injection moulding to come the 1000cm of moulding as object of the present invention because the formed precision height can carry out above-mentioned moulding
2During above large pellicle, need extremely large-scale make-up machine, therefore, cost improves and is impracticable, simultaneously owing to pallet dimension shaping and deformation occurs very greatly, and is difficult to side at teat with the not only narrow but also dark undercut portions of high precision setting.
In the technology of patent documentation 3; binding material is coated in diaphragm following of guard shield diaphragm is sticked on the surface of pallet; this method is for being effective as semiconductor with this small size casing of the casing of guard shield; but; in the large-size box of as the present invention, taking in large pellicle; because formed precision may be not enough, in the position of the placement guard shield of pallet warpage appears sometimes.So the deformation effect that the pallet warpage produces is to diaphragm, the bounding force reduction of binding material is peeled off or made to a part that makes diaphragm from binding material, caused thus being difficult to guard shield is attached to problem on the photomask equably.
In the technology of patent documentation 4, the method for employing is: the pressing body with the end face that hangs on the casing lid pushes to be maintained fixed guard shield the diaphragm that is placed on the guard shield on the pallet.As the casing of taking in semiconductive shield; can keep formed precision under the situation of 5 inches~6 inches and so on small box body; but; as mentioned above; in the large-size box of taking in as the large pellicle of object of the present invention; not only formed precision is not enough and warpage appears in casing moulding; therefore; when adopting above-mentioned technology; when covering lid on casing; the problem that occurs is, the pressing body that is arranged at lid one side be difficult to correctly and positively to push down guard shield diaphragm so that this guard shield be maintained fixed.
The accommodation method of the large pellicle that the present invention relates to and container structure body thereof are the brand-new technology of developing in view of above-mentioned problems; this accommodation method and container structure body thereof are characterised in that; part or all of the outer peripheral edges of the diaphragm of large pellicle gives prominence to and forms surplus limit laterally; when being placed on guard shield on the pallet, should surplus limit being bonded in tray surface with adhesive tape and coming positively guard shield to be remained fixed on the pallet.
The accommodation method of the large pellicle that the present invention relates to and container structure body thereof are the technology that fundamentally addresses the above problem.First scheme of the present invention is the accommodation method of large pellicle, and this method comprises area at 1000cm
2Above large pellicle is accommodated in the process in the casing that is made of pallet and lid; described large pellicle comprises framework, be bonded in guard shield film on the upper limb face of this framework, be coated in the binding material on the lower edge face of this framework and be used to protect this binding material and be bonded in diaphragm below the framework; described accommodation method is characterised in that; part or all of the outer peripheral edges of the diaphragm of described large pellicle gives prominence to and forms surplus limit laterally; and; utilize adhesive tape to be fixed on the described pallet on surplus limit, thereby large pellicle is accommodated in the casing.Guard shield area herein is the external diameter area of framework.
In above-mentioned first scheme,, thereby when being placed on guard shield on the pallet, the described surplus limit that protrudes in the outside of guard shield housing can be attached on the surface of pallet because part or all of the outer peripheral edges of the diaphragm of guard shield is outstanding laterally and form surplus limit.And, in the present invention, utilize adhesive tape that described surplus limit is sticked on the pallet, therefore, just guard shield positively can be remained fixed on the pallet with stable status by shirtsleeve operation extremely.
In addition; in the present invention; owing to adopt the adhesive tape be imbued with flexibility that the diaphragm of large pellicle is sticked on the pallet; therefore; even under the inadequate situation of the formed precision of pallet; perhaps occur under the situation of warpage, also can large pellicle correctly and positively be remained fixed on the pallet with not being affected at pallet.
Alternative plan of the present invention is the accommodation method of the large pellicle of first scheme of the present invention, and wherein, the width on the surplus limit of the described diaphragm of formation is that 6mm is above, length is more than the 20mm.
In above-mentioned alternative plan, preferred embodiment is that the length on the surplus limit of described diaphragm is more than the 50mm, and further preferred embodiment is that described length is more than the 300mm.In addition, in the present invention, the area of large pellicle is at 4000cm
2When above, it is effective especially that the length on the surplus limit of said protection film is made more than the 300mm.
In above-mentioned second invention; since the size on the surplus limit that on the diaphragm of large pellicle, is provided be width more than the 6mm, length is more than 20mm; therefore; when being positioned over large pellicle on the pallet; the width of this surplus limit with broad can be overlapped on the surface of pallet; and, can utilize adhesive tape that surplus limit stably and is positively remained fixed on the surface of pallet.
Third party's case of the present invention is of the present invention first or the accommodation method of the large pellicle of alternative plan, consider formed precision, at the framework that is placed on the large pellicle on the pallet of above-mentioned casing and cover whole spaces between the lid on this pallet and the interval more than the 1mm is set at least takes in.
In above-mentioned third party's case, because by at the framework that is positioned over the large pellicle on the casing pallet with cover and the interval more than the 1mm is set between the lid on this pallet at least comes large pellicle is taken in, therefore, when transporting large pellicle, also need not to worry large pellicle because vibration etc. are former thereby come in contact and produce friction with lid.In addition, as mentioned above, owing to can utilize adhesive tape large pellicle to be remained fixed on the pallet with stable status, thereby need not to push down large pellicle with lid, so, can easily design casing, and, the formed precision of casing and the problem of distortion all can also be solved.
Cubic case of the present invention is large pellicle container structure body, and this structure is at 1000cm with area
2Above large pellicle is accommodated in the structure in the casing that is made of pallet and lid; described large pellicle comprises framework, be bonded in guard shield film on the upper limb face of this framework, be coated in the binding material on the lower edge face of this framework and be used to protect this binding material and stick to diaphragm below the framework; wherein; in this structure; part or all of the outer peripheral edges of the diaphragm of described large pellicle has outstanding laterally surplus limit; and, utilize adhesive tape to be fixed on the described pallet on surplus limit.
The large pellicle container structure body that the 5th scheme of the present invention is a cubic case of the present invention, wherein, the width on the surplus limit of said protection film is that 6mm is above, length is more than the 20mm.
The 6th scheme of the present invention is the large pellicle container structure body of the of the present invention the 4th or the 5th scheme, wherein, is placed on the framework of the large pellicle on the pallet of above-mentioned casing and covers have the interval more than the 1mm at least between the lid on this pallet.
In order to prevent in the photo-mask process when the thin film transistor (TFT) (TFT) that constitutes LCD (LCD) and color filter (CF) etc. are made to adhere to foreign matter on employed photomask or the graticule, use guard shield area is at 1000cm
2Above large pellicle, the present invention can bring into play useful effect as the accommodation method and the container structure body thereof of this large pellicle.
In the accommodation method and container structure body thereof of the large pellicle that the present invention relates to; because part or all of the outer peripheral edges of the diaphragm of guard shield gives prominence to and forms surplus limit laterally; therefore; when being placed on guard shield on the pallet, having the described surplus limit that protrudes in the guard shield housing outside and can be attached to effect on the tray surface.And, in the present invention, owing to utilize adhesive tape that described surplus limit is sticked on the pallet, just guard shield positively can be remained fixed in effect on the pallet with stable status so also have by shirtsleeve operation extremely.In addition; owing to utilize the adhesive tape be imbued with flexibility that the surplus limit with flexibility of guard shield diaphragm is sticked on the pallet; so have following effect: even under the inadequate situation of the formed precision of pallet; perhaps occur under the situation of warpage, also can guard shield correctly and positively be remained fixed on the pallet with not being affected at pallet.
In addition; in the present invention; the size that is arranged on the surplus limit on the diaphragm of guard shield is made as width more than the 6mm, in the situation of length more than 20mm; also has following effect: when being positioned over guard shield on the pallet; the width of this surplus limit with broad can be attached on the surface of pallet; and, can utilize adhesive tape that surplus limit is stable and positively remain fixed on the surface of pallet.
In addition, in the present invention, at the framework that is positioned over the large pellicle on the pallet of casing with cover and between the lid on this pallet, be provided with in the situation that take at the interval more than the 1mm at least, when transporting large pellicle, also need not to worry large pellicle because vibration etc. are former thereby contact with lid and rub.In addition, as mentioned above, utilizing adhesive tape large pellicle to be remained fixed in stable status in the situation on the pallet, need not to push down large pellicle with lid, so have following effect: can easily design casing, and, the formed precision of casing and the problem of distortion all can also be solved.
Description of drawings
Fig. 1 is the accommodation method of large pellicle of the present invention and the longitudinal profile key diagram of container structure body thereof.
Fig. 2 is the amplification key diagram at the main position of the accommodation method of large pellicle of Fig. 1 and container structure body thereof.
Fig. 3 is the large pellicle that uses in the accommodation method of the large pellicle of Fig. 1 and container structure body thereof the planimetric map with diaphragm.
Fig. 4 is the large pellicle that uses in the accommodation method of the large pellicle of Fig. 1 and container structure body thereof the planimetric map with diaphragm.
Fig. 5 is the figure of example of the shape of expression diaphragm.
Embodiment
With reference to the accompanying drawings the accommodation method of the large pellicle that the present invention relates to and an embodiment of container structure body thereof are specifically described.Fig. 1 is the accommodation method of the large pellicle that the present invention relates to and the longitudinal profile key diagram of container structure body thereof; Fig. 2 is the amplification key diagram at the main position of the accommodation method of large pellicle of Fig. 1 and container structure body thereof; Fig. 3 is the large pellicle that uses in the accommodation method of the large pellicle of Fig. 1 and container structure body thereof the planimetric map with diaphragm, and Fig. 4 and Fig. 3 similarly are the planimetric maps of the large pellicle usefulness diaphragm that uses in the accommodation method of the large pellicle of Fig. 1 and container structure body thereof.
In Fig. 1, Fig. 2 (a) and Fig. 2 (b), A is a large pellicle, and as the detailed description of having done, A is that the guard shield area is at 1000cm
2Above large pellicle, it is constructed as follows: framework 1, utilize bonding agent 2 to stick to guard shield film 3 on the upper limb face of described framework 1, be coated in the binding material 4 on the lower edge face of described framework and be used to protect this binding material 4 and stick to diaphragm 5 on the binding material 4.
In the above-described embodiment; binding material 4 has been coated on the lower edge face of framework 1; but, use in advance binding material 4 and diaphragm 5 to be formed in the situation of the resulting stratiform binding material of stratiform, as long as this stratiform binding material lamination is adhered on the lower edge face of framework 1.But, in this manual, also comprise above-mentioned situation and only be generically and collectively referred to as " being coated with ".Then, the large pellicle A that as above constitutes is accommodated among the casing B that is made of pallet 6 and lid 7.Can will seal around the interface of lid and pallet with adhesive tape, perhaps clip 8 is installed in the bight of pallet 6 and lid 7.
Be provided with surplus limit 5a in that the outside of the outer peripheral edges of the diaphragm 5 of above-mentioned large pellicle A is outstanding, this surplus limit 5a is adhered fixed on the surface of pallet 6 by adhesive tape described later.The inventor carries out various experiments repeatedly, and the result shows that preferably the width W of this surplus limit 5a is that 6mm is above, length L is more than the 20mm.Thereby the surplus limit 5a that can utilize adhesive tape 9 easily will have this size is adhered fixed on the surface of pallet 6 with stable status.In addition, in the present invention, more preferably described length L is more than the 50mm, and further preferred described length L is more than the 300mm.In addition, preferably at least 2 limits of guard shield framework, with each edge lengths more than 5% as the length on surplus limit; Preferred at least on 2 relative limits, with each edge lengths more than 5% as the length on surplus limit.In addition, about width W and the length L of above-mentioned surplus limit 5a, the upper limit of the situation of pallet end as surplus limit run on surplus limit.
When implementing accommodation method of the present invention and container structure body thereof; as above-mentioned illustrated in figures 1 and 2; large pellicle A is placed on the central portion of the pallet 6 of casing B; and; use the adhesive tape 9 of Rack and length; the surplus limit 5a that gives prominence at the diaphragm 5 in the outside of the framework 1 of large pellicle A is sticked on the surface of pallet 6, large pellicle A simply and positively can be remained fixed in the central portion of pallet 6 thus with stable status extremely.
In accommodation method of the present invention and container structure body thereof; as mentioned above; the adhesive tape 9 that utilization is imbued with flexibility will be given prominence on the surplus limit 5a with flexibility of the diaphragm 5 in the outside of the framework 1 of large pellicle A is adhered fixed surface at the pallet 6 of casing B; therefore; even the formed precision of the pallet 6 of casing B is insufficient or warpage appears in pallet 6, also can be simply large pellicle A is fixed on the pallet 6 with stable status and is not subjected to the influence of these problems.
In addition, preferably adhere to adhesive tape 9 and paste in whole the mode that covers surplus limit 5a, if but the effect that can obtain to be adhered fixed also can paste in the mode that part covers.
In addition, in accommodation method of the present invention and container structure body thereof, owing to can positively remain fixed in large pellicle A on the pallet 6 of casing B with stable status, so need not to push down large pellicle A with the lid 7 of casing B, therefore, can make the interval D between the framework 1 of lid 7 and large pellicle A is more than the 1mm.Therefore, because large pellicle A and lid 7 have enough intervals,, thereby need not to worry to occur the problem of dust so the vibration that can not occur when transporting etc. causes large pellicle A and lid generation friction situation.In addition, consider that from the keeping of large pellicle, the aspect of cleaning above-mentioned interval D is preferably below 300mm.
When surplus limit 5a is set, shown in Fig. 3 (a)~Fig. 3 (d) or Fig. 4 (a)~Fig. 4 (d), can be in the outside of the outer rim of diaphragm 5 outstandingly be provided with that width W is more than the 6mm, length L is the surplus limit 5a more than the 20mm on the diaphragm 5 of above-mentioned large pellicle A.
Promptly; Fig. 3 (a) is the structure that the outside central authorities on the long limit of the diaphragm 5 that central authorities of large pellicle A is not adhered to are provided with surplus limit 5a, and Fig. 3 (b) is the structure that surplus limit 5a is set in the outside central authorities of the minor face of the diaphragm 5 that central authorities of large pellicle A is not adhered to.Fig. 3 (c) is structure that surplus limit 5a is set in each outside, limit central authorities of the long limit of the diaphragm 5 that central authorities of large pellicle A is not adhered to and minor face, and Fig. 3 (d) is the long limit of the diaphragm 5 that adheres in the central authorities to large pellicle A and each central structure that surplus limit 5a is set in the outside, limit of minor face.
Fig. 4 (a) is the almost whole structure of the surplus limit 5a of arranged outside of length at the outside central authorities on the long limit of the diaphragm 5 that central authorities of large pellicle A is not adhered to and minor face, and Fig. 4 (b) is the structure that surplus limit 5a is set respectively in the central authorities of the outside of almost whole length on the long limit of the diaphragm 5 that central authorities of large pellicle A is not adhered to and minor face.In addition, in the situation of Fig. 4 (c), the long limit of the diaphragm 5 that central authorities of large pellicle A is not adhered to and minor face almost all length surplus limit 5a is set continuously.In the situation of Fig. 4 (d), be the long limit of the diaphragm 5 that adheres in central authorities and minor face to large pellicle A almost all length the structure of surplus limit 5a is set continuously.
In addition, Fig. 5 has provided the example of the shape of diaphragm.
As the material of the diaphragm that uses in the present invention, preferably use pet resin, polyvinyl resin etc.In addition, for the thickness of diaphragm, preferred used thickness is the diaphragm of 30 μ m~500 μ m.
For the material of the casing that uses among the present invention, can use resins such as pet resin, acrylonitrile-butadiene-styrene resin, acryl resin, polycarbonate resin or Corvic.In addition, also can use the anti-static type resin.Especially preferably use the few resin of air output.
In addition, as the base material of the adhesive tape that uses among the present invention, can use for example tygon, polypropylene, polyethylene terephthalate, Polyvinylchloride or nonwoven fabric etc.In addition, as the bonding agent of adhesive tape, can use the bonding agent of acrylic compounds for example or polyvinyl alcohol (PVA) etc.In addition, as adhesive tape, optimize the few adhesive tape of tolerance.In addition, also can be to have implemented the adhesive tape that electrostatic prevention is handled.
The inventor uses the accommodation method and the container structure body thereof of the large pellicle of the present invention with aforesaid structure to test, and the result has obtained the good result shown in the following embodiment.
With physical dimension be 427mm * 294mm, on the large pellicle A that the central part of the long limit of diaphragm 5 and minor face is respectively equipped with the surplus limit 5a that is of a size of W 10mm * L 100mm is placed on by the pallet 6 that carries out the casing B that vacuum forming obtains with the ABS resin material; utilize adhesive tape 9 (adhesive tape size: 15mm * 120mm) above-mentioned surplus limit 5a is adhered fixed on pallet 6; then; lid 7 is covered on described pallet 6, clip 8 is installed in the bight of described pallet 6 and lid 7 both are fixed.At this moment, consider formed precision, the framework 1 of large pellicle A and the interval D between the lid 7 are remained on more than the 3.6mm.Grow the test that distance is transported large pellicle with this state, the result does not find between large pellicle A and casing B to occur friction, and, on the guard shield film 3 of large pellicle A and framework 1 around any place also find no dust and adhere to.And large pellicle A is held fixing with the state that is placed at first.The maximum impact value that long distance is transported test is 10cm/s
2
With physical dimension be 905mm * 750mm, on the large pellicle A that the central part of the long limit of diaphragm 5 and minor face is respectively equipped with the surplus limit 5a that is of a size of W 10mm * L 100mm is placed on by the pallet 6 that carries out the casing B that vacuum forming obtains with the ABS resin material; utilize adhesive tape 9 (adhesive tape size: 15mm * 120mm) above-mentioned surplus limit 5a is adhered fixed on pallet 6; then; lid 7 is covered on described pallet 6, clip 8 is installed in the bight of described pallet 6 and lid 7 both are fixed.At this moment, consider formed precision, the framework 1 of large pellicle A and the interval D between the lid 7 are remained on more than the 3.6mm.With the foregoing description 1 identical condition under transport test, the result does not find between large pellicle A and casing B to occur friction, and, on the guard shield film 3 of large pellicle A and framework 1 around any place also find no dust and adhere to.And large pellicle A same state with initial placement the time remains fixed on the pallet 6 with being stabilized.
To have the physical dimension of guard shield as shown in table 1 below and be arranged at the long limit of diaphragm and the size on the surplus limit of the central portion of minor face (the large pellicle A of W * L) is placed on by on the pallet 6 that carries out the casing B that vacuum forming obtains with the ABS resin material; utilize adhesive tape 9 that above-mentioned surplus limit 5a is adhered fixed on pallet 6; then; lid 7 is covered on described pallet 6, will seal around the docking site of described pallet 6 and lid 7 with belt.The framework 1 of fixed band size and large pellicle A and the interval D between the lid 7 are shown in following table 1.With the foregoing description 1 identical condition under these guard shield casings are transported test, the result does not find to occur friction between large pellicle A and casing B, and large pellicle A same state with initial placement the time remains fixed on the pallet 6 with being stabilized.
[table 1]
Embodiment | The guard shield size | Surplus limit size (W * L) | Interval D | The fixed |
3 | 427×294 | 10×70 | 15 | 15×90 |
4 | 782×474 | 10×70 | 15 | 15×90 |
5 | 905×750 | 10×500 | 30 | 15×600 |
6 | 1136×783 | 10×500 | 30 | 15×600 |
Unit: mm
Comparative example 1
With physical dimension be 427mm * 294mm large pellicle A directly (not using adhesive tape 9) be placed on by carrying out with the ABS resin material on the pallet 6 that vacuum forming obtains, then, cover on pallet 6 lid 7 also fixing with clip 8, interval D between the framework 1 of lid 7 and large pellicle A is remained on design size 0.5mm, in this state, under the condition identical, transport test with the foregoing description 1, found that the vestige that friction between large pellicle A and lid 7, occurs, and discovery is attached with tiny dust on the part of the guard shield film 3 of large pellicle A.
Comparative example 2
Adopt the mode identical with comparative example 1, with physical dimension is that the large pellicle A of 427mm * 294mm directly is placed on the pallet 6, then, consider formed precision, the interval D of covering between the framework 1 of lid on the pallet 67 and large pellicle A is remained on more than the 3.6mm, in this state, under the condition identical, transport test, found that the vestige that friction between large pellicle A and lid 7, occurs with embodiment 1.And, find around the framework 1 of large pellicle A, to be attached with tiny dust.
Industrial applicibility
As long as use accommodation method and the container structure body thereof of large pellicle of the present invention, just can be accommodated in casing with stable state large pellicle and can transport safely with no damage large pellicle, and irrelevant with the height of the formed precision of casing or the no situation that sex change occurs.
Claims (6)
1. the accommodation method of a large pellicle, this method comprises area at 1000cm
2Above large pellicle is accommodated in the process in the casing that is made of pallet and lid; described large pellicle comprises framework, be bonded in guard shield film on the upper limb face of this framework, be coated in the binding material on the lower edge face of this framework and be used to protect this binding material and the following diaphragm that sticks to this framework; described accommodation method is characterised in that; part or all of the outer peripheral edges of the diaphragm of described large pellicle gives prominence to and forms surplus limit laterally; and; utilize adhesive tape to be fixed on the described pallet on surplus limit, thus large pellicle is accommodated in the described casing.
2. the accommodation method of large pellicle according to claim 1, wherein, the width on the surplus limit of the described diaphragm of formation is that the above and length of 6mm is more than the 20mm.
3. the accommodation method of large pellicle according to claim 1 and 2 wherein, is placed on the framework of the large pellicle on the pallet of described casing and covers and the interval more than the 1mm is set between the lid on the described pallet at least takes in described large pellicle.
4. large pellicle container structure body, this structure is to have taken in area at 1000cm in the casing that is made of pallet and lid
2The structure of above large pellicle; described large pellicle comprises framework, be bonded in guard shield film on the upper limb face of this framework, be coated in the binding material on the lower edge face of this framework and be used to protect this binding material and the following diaphragm that sticks to this framework; in described large pellicle container structure body; part or all of the outer peripheral edges of the diaphragm of described large pellicle has outstanding laterally surplus limit; and, utilize adhesive tape to be fixed on the described pallet on surplus limit.
5. large pellicle container structure body according to claim 4, wherein, the width on the surplus limit of described diaphragm is more than the 6mm and length is more than the 20mm.
6. according to claim 4 or 5 described large pellicle container structure bodies, wherein, be placed on the framework of the large pellicle on the pallet of described casing and cover and between the lid on the described pallet, have the interval more than the 1mm at least.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2004/017953 WO2006059388A1 (en) | 2004-12-02 | 2004-12-02 | Method of housing large pellicle |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2012102741288A Division CN102819184A (en) | 2004-12-02 | 2004-12-02 | Storage method for large-scale shield |
Publications (1)
Publication Number | Publication Date |
---|---|
CN101073033A true CN101073033A (en) | 2007-11-14 |
Family
ID=36564832
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200480044532.XA Pending CN101073033A (en) | 2004-12-02 | 2004-12-02 | Method of housing large pellicle |
Country Status (3)
Country | Link |
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JP (1) | JPWO2006059388A1 (en) |
CN (1) | CN101073033A (en) |
WO (1) | WO2006059388A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5269438B2 (en) * | 2007-03-13 | 2013-08-21 | 旭化成イーマテリアルズ株式会社 | Protective film for large pellicle and storage method for large pellicle |
JP2010060992A (en) * | 2008-09-05 | 2010-03-18 | Asahi Kasei E-Materials Corp | Large pellicle structure and large pellicle housing structure |
JP7017900B2 (en) | 2016-11-11 | 2022-02-09 | 旭化成株式会社 | Pellicle structure, pellicle storage and fixing method |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0542073Y2 (en) * | 1985-06-05 | 1993-10-22 | ||
JPS62143948U (en) * | 1986-03-07 | 1987-09-10 | ||
JPH10114388A (en) * | 1996-10-07 | 1998-05-06 | Nikon Corp | Pellicle container |
JP3797753B2 (en) * | 1997-06-30 | 2006-07-19 | 旭化成エレクトロニクス株式会社 | Pellicle storage structure and storage method |
JPH1138597A (en) * | 1997-07-22 | 1999-02-12 | Asahi Kasei Denshi Kk | Structure for housing pellicle |
JPH1138598A (en) * | 1997-07-23 | 1999-02-12 | Mitsui Chem Inc | Pellicle and its housing case |
JPH11202477A (en) * | 1998-01-14 | 1999-07-30 | Oki Electric Ind Co Ltd | Fitting structure for pellicle |
JP2004240010A (en) * | 2003-02-04 | 2004-08-26 | Asahi Kasei Electronics Co Ltd | Method of housing pellicle |
JP4497845B2 (en) * | 2003-06-04 | 2010-07-07 | 旭化成イーマテリアルズ株式会社 | Large pellicle storage method |
-
2004
- 2004-12-02 WO PCT/JP2004/017953 patent/WO2006059388A1/en active Application Filing
- 2004-12-02 JP JP2006546555A patent/JPWO2006059388A1/en active Pending
- 2004-12-02 CN CN200480044532.XA patent/CN101073033A/en active Pending
Also Published As
Publication number | Publication date |
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WO2006059388A1 (en) | 2006-06-08 |
JPWO2006059388A1 (en) | 2008-08-07 |
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Owner name: ASAHI KASEI ELECTRONICS MATERIALS CO., LTD. Free format text: FORMER OWNER: ASAHI KASEI ELECTRONICS COMPONENTS CO., LTD. Effective date: 20090619 |
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Application publication date: 20071114 |