CN100401189C - 光固化性·热固化性树脂组合物 - Google Patents
光固化性·热固化性树脂组合物 Download PDFInfo
- Publication number
- CN100401189C CN100401189C CNB028209362A CN02820936A CN100401189C CN 100401189 C CN100401189 C CN 100401189C CN B028209362 A CNB028209362 A CN B028209362A CN 02820936 A CN02820936 A CN 02820936A CN 100401189 C CN100401189 C CN 100401189C
- Authority
- CN
- China
- Prior art keywords
- composition
- weight portions
- resin composition
- photo
- curable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/10—Esters; Ether-esters
- C08K5/101—Esters; Ether-esters of monocarboxylic acids
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
Abstract
Description
Claims (7)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP323634/2001 | 2001-10-22 | ||
JP2001323634 | 2001-10-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1697858A CN1697858A (zh) | 2005-11-16 |
CN100401189C true CN100401189C (zh) | 2008-07-09 |
Family
ID=19140499
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB028209362A Expired - Lifetime CN100401189C (zh) | 2001-10-22 | 2002-10-18 | 光固化性·热固化性树脂组合物 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20040198861A1 (zh) |
JP (1) | JP4148896B2 (zh) |
KR (1) | KR100855168B1 (zh) |
CN (1) | CN100401189C (zh) |
TW (1) | TW593487B (zh) |
WO (1) | WO2003035766A1 (zh) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200903160A (en) * | 2007-04-27 | 2009-01-16 | Sumitomo Chemical Co | Photosensitive resin composition |
JP6268466B2 (ja) * | 2013-09-29 | 2018-01-31 | 株式会社村田製作所 | 電子部品の製造方法 |
CN104950573A (zh) * | 2014-03-31 | 2015-09-30 | 太阳油墨(苏州)有限公司 | 光固化性热固化性树脂组合物、干膜、固化物、及印刷电路板 |
CN104356359A (zh) * | 2014-10-27 | 2015-02-18 | 上海应用技术学院 | 一种可uv固化水性环氧丙烯酸酯树脂及制备方法 |
CN105807564A (zh) * | 2014-12-31 | 2016-07-27 | 太阳油墨(苏州)有限公司 | 光固化性热固化性树脂组合物、固化物、以及印刷电路板 |
CN106832226B (zh) * | 2015-12-04 | 2019-06-14 | 广东生益科技股份有限公司 | 一种无卤环氧树脂组合物以及含有它的预浸料、层压板和印制电路板 |
US10328635B1 (en) | 2017-12-06 | 2019-06-25 | Massivit 3D Printing Technologies Ltd. | Complex shaped 3D objects fabrication |
US11054742B2 (en) * | 2018-06-15 | 2021-07-06 | Taiwan Semiconductor Manufacturing Co., Ltd. | EUV metallic resist performance enhancement via additives |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08193073A (ja) * | 1995-01-13 | 1996-07-30 | Taiyo Ink Mfg Ltd | メラミンの有機酸塩及びそれを用いた熱硬化性もしくは光硬化性・熱硬化性コーティング組成物 |
JP2000029212A (ja) * | 1998-07-10 | 2000-01-28 | Taiyo Ink Mfg Ltd | 光硬化性・熱硬化性樹脂組成物及び樹脂絶縁パターン形成方法 |
WO2001073510A1 (fr) * | 2000-03-29 | 2001-10-04 | Kanagawa University | Composition de resine photodurcissante/thermodurcissante, couche seche photosensible preparee au moyen de cette resine et procede de creation de configurations |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61243869A (ja) * | 1985-04-19 | 1986-10-30 | Taiyo Ink Seizo Kk | レジストインキ組成物 |
JPH0717737B2 (ja) * | 1987-11-30 | 1995-03-01 | 太陽インキ製造株式会社 | 感光性熱硬化性樹脂組成物及びソルダーレジストパターン形成方法 |
JPH02109052A (ja) * | 1988-10-19 | 1990-04-20 | Tokyo Ohka Kogyo Co Ltd | 感光性樹脂組成物 |
US5206116A (en) * | 1991-03-04 | 1993-04-27 | Shipley Company Inc. | Light-sensitive composition for use as a soldermask and process |
US6338936B1 (en) | 1998-02-02 | 2002-01-15 | Taiyo Ink Manufacturing Co., Ltd. | Photosensitive resin composition and method for formation of resist pattern by use thereof |
JP2002148799A (ja) * | 2000-11-14 | 2002-05-22 | Mitsubishi Gas Chem Co Inc | 耐燃性に優れたレジスト組成物 |
JP4382978B2 (ja) * | 2000-12-04 | 2009-12-16 | 学校法人神奈川大学 | 光硬化性・熱硬化性樹脂組成物 |
JP5027357B2 (ja) * | 2001-03-30 | 2012-09-19 | 太陽ホールディングス株式会社 | 光硬化性熱硬化性樹脂組成物及びプリント配線板 |
-
2002
- 2002-10-18 WO PCT/JP2002/010856 patent/WO2003035766A1/ja active Application Filing
- 2002-10-18 JP JP2003538273A patent/JP4148896B2/ja not_active Expired - Lifetime
- 2002-10-18 KR KR1020047005866A patent/KR100855168B1/ko active IP Right Grant
- 2002-10-18 CN CNB028209362A patent/CN100401189C/zh not_active Expired - Lifetime
- 2002-10-22 TW TW091124376A patent/TW593487B/zh not_active IP Right Cessation
-
2004
- 2004-04-21 US US10/828,213 patent/US20040198861A1/en not_active Abandoned
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08193073A (ja) * | 1995-01-13 | 1996-07-30 | Taiyo Ink Mfg Ltd | メラミンの有機酸塩及びそれを用いた熱硬化性もしくは光硬化性・熱硬化性コーティング組成物 |
JP2000029212A (ja) * | 1998-07-10 | 2000-01-28 | Taiyo Ink Mfg Ltd | 光硬化性・熱硬化性樹脂組成物及び樹脂絶縁パターン形成方法 |
WO2001073510A1 (fr) * | 2000-03-29 | 2001-10-04 | Kanagawa University | Composition de resine photodurcissante/thermodurcissante, couche seche photosensible preparee au moyen de cette resine et procede de creation de configurations |
Also Published As
Publication number | Publication date |
---|---|
JPWO2003035766A1 (ja) | 2005-02-10 |
JP4148896B2 (ja) | 2008-09-10 |
US20040198861A1 (en) | 2004-10-07 |
KR20040058011A (ko) | 2004-07-02 |
KR100855168B1 (ko) | 2008-08-29 |
TW593487B (en) | 2004-06-21 |
CN1697858A (zh) | 2005-11-16 |
WO2003035766A1 (fr) | 2003-05-01 |
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Legal Events
Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
EE01 | Entry into force of recordation of patent licensing contract |
Assignee: TAIYO INK (SUZHOU) Co.,Ltd. Assignor: TAIYO INK MFG. Co.,Ltd.|FUJIMORI KOGYO Co.,Ltd. Contract fulfillment period: 2008.11.26 to 2009.5.31 Contract record no.: 2009990000033 Denomination of invention: Active energy line cured resin, optical solidified and thermosetting resin composition containing said resin and its condensate Granted publication date: 20080709 License type: General permission Record date: 20090114 |
|
LIC | Patent licence contract for exploitation submitted for record |
Free format text: COMMON LICENSE; TIME LIMIT OF IMPLEMENTING CONTACT: 2008.11.26 TO 2009.5.31; CHANGE OF CONTRACT Name of requester: TAIYANG PRINTING INK ( SUZHOU) CO., LTD. Effective date: 20090114 |
|
EE01 | Entry into force of recordation of patent licensing contract |
Assignee: TAIYO INK (SUZHOU) Co.,Ltd. Assignor: TAIYO INK MFG. Co.,Ltd. Contract fulfillment period: 2009.5.26 to 2010.5.25 Contract record no.: 2009990000747 Denomination of invention: Active energy line cured resin, optical solidified and thermosetting resin composition containing said resin and its condensate Granted publication date: 20080709 License type: General permission Record date: 20090714 |
|
LIC | Patent licence contract for exploitation submitted for record |
Free format text: COMMON LICENSE; TIME LIMIT OF IMPLEMENTING CONTACT: 2009.5.26 TO 2010.5.25; CHANGE OF CONTRACT Name of requester: TAIYANG PRINTING INK ( SUZHOU) CO., LTD. Effective date: 20090714 |
|
EE01 | Entry into force of recordation of patent licensing contract |
Assignee: TAIYO INK (SUZHOU) Co.,Ltd. Assignor: TAIYO INK MFG. Co.,Ltd. Contract record no.: 2010990000679 Denomination of invention: Active energy line cured resin, optical solidified and thermosetting resin composition containing said resin and its condensate Granted publication date: 20080709 License type: Common License Open date: 20051116 Record date: 20100830 |
|
C56 | Change in the name or address of the patentee |
Owner name: TAIYO HOLDING CO., LTD. Free format text: FORMER NAME: TAIYO INK MANUFACTURING CO., LTD. |
|
CP01 | Change in the name or title of a patent holder |
Address after: Tokyo, Japan Patentee after: TAIYO HOLDINGS Co.,Ltd. Address before: Tokyo, Japan Patentee before: TAIYO INK MFG. Co.,Ltd. |
|
EC01 | Cancellation of recordation of patent licensing contract |
Assignee: TAIYO INK (SUZHOU) Co.,Ltd. Assignor: TAIYO INK MFG. Co.,Ltd. Contract record no.: 2010990000679 Date of cancellation: 20110302 |
|
EE01 | Entry into force of recordation of patent licensing contract |
Assignee: TAIYO INK (SUZHOU) Co.,Ltd. Assignor: TAIYO HOLDINGS Co.,Ltd. Contract record no.: 2011990000116 Denomination of invention: Active energy line cured resin, optical solidified and thermosetting resin composition containing said resin and its condensate Granted publication date: 20080709 License type: Common License Open date: 20051116 Record date: 20110302 |
|
CX01 | Expiry of patent term | ||
CX01 | Expiry of patent term |
Granted publication date: 20080709 |