CH630767A5 - Radiation-sensitive element, containing a composition which can be photo-polymerised - Google Patents

Radiation-sensitive element, containing a composition which can be photo-polymerised Download PDF

Info

Publication number
CH630767A5
CH630767A5 CH1304577A CH1304577A CH630767A5 CH 630767 A5 CH630767 A5 CH 630767A5 CH 1304577 A CH1304577 A CH 1304577A CH 1304577 A CH1304577 A CH 1304577A CH 630767 A5 CH630767 A5 CH 630767A5
Authority
CH
Switzerland
Prior art keywords
composition
ether
photopolymerizable
radiation
ethylenically unsaturated
Prior art date
Application number
CH1304577A
Other languages
German (de)
English (en)
Inventor
Joseph Edmund Gervay
Yvan Philip Pilette
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Publication of CH630767A5 publication Critical patent/CH630767A5/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
CH1304577A 1976-10-27 1977-10-26 Radiation-sensitive element, containing a composition which can be photo-polymerised CH630767A5 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US73597976A 1976-10-27 1976-10-27
US78090777A 1977-03-24 1977-03-24

Publications (1)

Publication Number Publication Date
CH630767A5 true CH630767A5 (en) 1982-06-30

Family

ID=27112970

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1304577A CH630767A5 (en) 1976-10-27 1977-10-26 Radiation-sensitive element, containing a composition which can be photo-polymerised

Country Status (9)

Country Link
JP (1) JPS5356018A (xx)
CA (1) CA1116919A (xx)
CH (1) CH630767A5 (xx)
DE (1) DE2747947C2 (xx)
FR (1) FR2369590A1 (xx)
GB (1) GB1588368A (xx)
IT (1) IT1089005B (xx)
NL (1) NL7711723A (xx)
SE (1) SE435106B (xx)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NO159729C (no) * 1978-11-01 1989-02-01 Coates Brothers & Co Fremgangsmaate for fremstilling av et moenster av loddemetall paa et lag elektrisk ledende metall baaret av et ikke-ledende underlag.
DE3136818C2 (de) * 1980-09-19 1990-08-02 Hitachi Chemical Co., Ltd., Tokio/Tokyo Verwendung eines lichtempfindlichen Gemisches und eines lichtempfindlichen Aufzeichnungsmaterials zur Bildung einer Lötmaske
JPS5764734A (en) * 1980-10-08 1982-04-20 Hitachi Chem Co Ltd Photosensitive resin composition and photosensitive element
DE3114931A1 (de) * 1981-04-13 1982-10-28 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes photopolymerisierbares kopiermaterial
US4752553A (en) * 1982-04-01 1988-06-21 M&T Chemicals Inc. High resolution solder mask photopolymers for screen coating over circuit traces
JPS5969752A (ja) * 1982-10-14 1984-04-20 Sekisui Chem Co Ltd 光重合可能な画像形成用組成物
JPS63158157U (xx) * 1987-04-07 1988-10-17
US5196296A (en) * 1989-10-06 1993-03-23 Nippon Steel Corporation Epoxy acrylate resins and photosensitive resin compositions therefrom
EP0822448B1 (en) * 1996-08-02 2000-11-02 E.I. Du Pont De Nemours And Company Flexible, flame-retardant, photoimageable composition for coating printed circuits
WO2003038526A1 (fr) 2001-10-30 2003-05-08 Kaneka Corporation Composition de resine photosensible et films et stratifies photosensibles ainsi obtenus

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA614181A (en) * 1961-02-07 J. Mcgraw William Photopolymerizable compositions, elements and processes
US3261686A (en) * 1963-04-23 1966-07-19 Du Pont Photopolymerizable compositions and elements
DE1950120A1 (de) * 1968-10-09 1970-04-30 Du Pont Heterogene fotopolymerisierbare Masse
US3682800A (en) * 1969-07-25 1972-08-08 Toray Industries Method for producing acrylonitrile copolymers
US3657088A (en) * 1969-12-17 1972-04-18 Bayer Ag Moulding and coating masses hardenable by uv irradiation
GB1312492A (en) * 1969-12-19 1973-04-04 Mccall Corp Crosslinked polymers and process therefor
US3887450A (en) * 1971-02-04 1975-06-03 Dynachem Corp Photopolymerizable compositions containing polymeric binding agents
JPS498281A (xx) * 1972-05-11 1974-01-24
JPS5537869B2 (xx) * 1973-02-12 1980-09-30
JPS5335722B2 (xx) * 1973-08-29 1978-09-28
DE2344680A1 (de) * 1973-09-05 1975-03-20 Bruno Prof Dr Vollmert Photopolymerisierbare mischung und deren verwendung zur herstellung von reliefdruckplatten
JPS5179342A (xx) * 1974-12-26 1976-07-10 Fuji Photo Film Co Ltd

Also Published As

Publication number Publication date
SE7712054L (sv) 1978-04-28
GB1588368A (en) 1981-04-23
DE2747947A1 (de) 1978-05-03
DE2747947C2 (de) 1983-12-22
IT1089005B (it) 1985-06-10
FR2369590B1 (xx) 1981-11-13
SE435106B (sv) 1984-09-03
JPS5356018A (en) 1978-05-22
FR2369590A1 (fr) 1978-05-26
NL7711723A (nl) 1978-05-02
CA1116919A (en) 1982-01-26
JPS5751655B2 (xx) 1982-11-02

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PL Patent ceased