JPS5751655B2 - - Google Patents

Info

Publication number
JPS5751655B2
JPS5751655B2 JP52128237A JP12823777A JPS5751655B2 JP S5751655 B2 JPS5751655 B2 JP S5751655B2 JP 52128237 A JP52128237 A JP 52128237A JP 12823777 A JP12823777 A JP 12823777A JP S5751655 B2 JPS5751655 B2 JP S5751655B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52128237A
Other languages
Japanese (ja)
Other versions
JPS5356018A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5356018A publication Critical patent/JPS5356018A/ja
Publication of JPS5751655B2 publication Critical patent/JPS5751655B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP12823777A 1976-10-27 1977-10-27 Flame resisting illumination sensitive element Granted JPS5356018A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US73597976A 1976-10-27 1976-10-27
US78090777A 1977-03-24 1977-03-24

Publications (2)

Publication Number Publication Date
JPS5356018A JPS5356018A (en) 1978-05-22
JPS5751655B2 true JPS5751655B2 (xx) 1982-11-02

Family

ID=27112970

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12823777A Granted JPS5356018A (en) 1976-10-27 1977-10-27 Flame resisting illumination sensitive element

Country Status (9)

Country Link
JP (1) JPS5356018A (xx)
CA (1) CA1116919A (xx)
CH (1) CH630767A5 (xx)
DE (1) DE2747947C2 (xx)
FR (1) FR2369590A1 (xx)
GB (1) GB1588368A (xx)
IT (1) IT1089005B (xx)
NL (1) NL7711723A (xx)
SE (1) SE435106B (xx)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63158157U (xx) * 1987-04-07 1988-10-17

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NO159729C (no) * 1978-11-01 1989-02-01 Coates Brothers & Co Fremgangsmaate for fremstilling av et moenster av loddemetall paa et lag elektrisk ledende metall baaret av et ikke-ledende underlag.
DE3136818C2 (de) * 1980-09-19 1990-08-02 Hitachi Chemical Co., Ltd., Tokio/Tokyo Verwendung eines lichtempfindlichen Gemisches und eines lichtempfindlichen Aufzeichnungsmaterials zur Bildung einer Lötmaske
JPS5764734A (en) * 1980-10-08 1982-04-20 Hitachi Chem Co Ltd Photosensitive resin composition and photosensitive element
DE3114931A1 (de) * 1981-04-13 1982-10-28 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes photopolymerisierbares kopiermaterial
US4752553A (en) * 1982-04-01 1988-06-21 M&T Chemicals Inc. High resolution solder mask photopolymers for screen coating over circuit traces
JPS5969752A (ja) * 1982-10-14 1984-04-20 Sekisui Chem Co Ltd 光重合可能な画像形成用組成物
US5196296A (en) * 1989-10-06 1993-03-23 Nippon Steel Corporation Epoxy acrylate resins and photosensitive resin compositions therefrom
DE69703419T2 (de) * 1996-08-02 2001-06-21 Du Pont Flexible, flammhemmende fotopolymerisierbare Zusammensetzung zur Beschichtung von Leiterplatten
CN1324402C (zh) 2001-10-30 2007-07-04 钟渊化学工业株式会社 感光性树脂组合物、使用该组合物的感光性薄膜及层压体

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS498281A (xx) * 1972-05-11 1974-01-24
JPS49107048A (xx) * 1973-02-12 1974-10-11
JPS5046315A (xx) * 1973-08-29 1975-04-25
JPS5179342A (xx) * 1974-12-26 1976-07-10 Fuji Photo Film Co Ltd

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA614181A (en) * 1961-02-07 J. Mcgraw William Photopolymerizable compositions, elements and processes
US3261686A (en) * 1963-04-23 1966-07-19 Du Pont Photopolymerizable compositions and elements
DE1950120A1 (de) * 1968-10-09 1970-04-30 Du Pont Heterogene fotopolymerisierbare Masse
US3682800A (en) * 1969-07-25 1972-08-08 Toray Industries Method for producing acrylonitrile copolymers
US3657088A (en) * 1969-12-17 1972-04-18 Bayer Ag Moulding and coating masses hardenable by uv irradiation
GB1312492A (en) * 1969-12-19 1973-04-04 Mccall Corp Crosslinked polymers and process therefor
US3887450A (en) * 1971-02-04 1975-06-03 Dynachem Corp Photopolymerizable compositions containing polymeric binding agents
DE2344680A1 (de) * 1973-09-05 1975-03-20 Bruno Prof Dr Vollmert Photopolymerisierbare mischung und deren verwendung zur herstellung von reliefdruckplatten

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS498281A (xx) * 1972-05-11 1974-01-24
JPS49107048A (xx) * 1973-02-12 1974-10-11
JPS5046315A (xx) * 1973-08-29 1975-04-25
JPS5179342A (xx) * 1974-12-26 1976-07-10 Fuji Photo Film Co Ltd

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63158157U (xx) * 1987-04-07 1988-10-17

Also Published As

Publication number Publication date
SE7712054L (sv) 1978-04-28
SE435106B (sv) 1984-09-03
DE2747947A1 (de) 1978-05-03
GB1588368A (en) 1981-04-23
IT1089005B (it) 1985-06-10
FR2369590B1 (xx) 1981-11-13
CA1116919A (en) 1982-01-26
JPS5356018A (en) 1978-05-22
CH630767A5 (en) 1982-06-30
FR2369590A1 (fr) 1978-05-26
NL7711723A (nl) 1978-05-02
DE2747947C2 (de) 1983-12-22

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