CA1090183A - System for illuminating an annular field - Google Patents

System for illuminating an annular field

Info

Publication number
CA1090183A
CA1090183A CA287,089A CA287089A CA1090183A CA 1090183 A CA1090183 A CA 1090183A CA 287089 A CA287089 A CA 287089A CA 1090183 A CA1090183 A CA 1090183A
Authority
CA
Canada
Prior art keywords
axis
field
illuminating
mirror
disposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA287,089A
Other languages
English (en)
French (fr)
Inventor
David A. Markle
Abe Offner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Biosystems Inc
Original Assignee
Perkin Elmer Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Perkin Elmer Corp filed Critical Perkin Elmer Corp
Priority to CA354,214A priority Critical patent/CA1110890A/en
Application granted granted Critical
Publication of CA1090183A publication Critical patent/CA1090183A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08Catadioptric systems
    • G02B17/0836Catadioptric systems using more than three curved mirrors
    • G02B17/0848Catadioptric systems using more than three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0028Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed refractive and reflective surfaces, e.g. non-imaging catadioptric systems
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0095Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00Photographic printing apparatus
    • G03B27/32Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52Details
    • G03B27/54Lamp housings; Illuminating means
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70225Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Microscoopes, Condenser (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
CA287,089A 1976-09-22 1977-09-20 System for illuminating an annular field Expired CA1090183A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CA354,214A CA1110890A (en) 1976-09-22 1980-06-17 System for illuminating an annular field

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US72535176A 1976-09-22 1976-09-22
US725,351 1976-09-22

Publications (1)

Publication Number Publication Date
CA1090183A true CA1090183A (en) 1980-11-25

Family

ID=24914185

Family Applications (1)

Application Number Title Priority Date Filing Date
CA287,089A Expired CA1090183A (en) 1976-09-22 1977-09-20 System for illuminating an annular field

Country Status (7)

Country Link
JP (1) JPS5341079A (de)
CA (1) CA1090183A (de)
CH (1) CH623659A5 (de)
DE (1) DE2742488A1 (de)
FR (1) FR2372379A1 (de)
GB (1) GB1589784A (de)
IT (1) IT1090469B (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4321628A (en) * 1980-04-02 1982-03-23 Xerox Corporation Scanning apparatus
GB2173608A (en) * 1985-03-25 1986-10-15 Richard George Bingham Imaging system having three curved and one aspherical mirror
JPH11326759A (ja) * 1998-05-18 1999-11-26 Ricoh Co Ltd 画像表示装置
JP2001228401A (ja) 2000-02-16 2001-08-24 Canon Inc 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1541379A (fr) * 1966-11-02 1968-10-04 Eltro Gmbh Procédé et dispositif de formation d'images
US3644030A (en) * 1968-07-12 1972-02-22 Ricoh Kk Light source system
US3748015A (en) * 1971-06-21 1973-07-24 Perkin Elmer Corp Unit power imaging catoptric anastigmat
DE2410924A1 (de) * 1973-03-09 1974-09-26 Perkin Elmer Corp Vorrichtung zur fotografischen belichtung einer oberflaeche
DE2348567A1 (de) * 1973-09-27 1975-04-17 Guido Georg Reinert Fluoreszenzlampe des entladungsroehrentyps mit uv-strahlendem leuchtstoff, sogenannter schwarzlichtleuchtstoffroehre fuer die beobachtung feiner strukturen mittels einer lupe, eines stereomikroskops oder aequivalenter optischer geraete
US3878419A (en) * 1973-12-17 1975-04-15 Carlo F Lafiandra Precision base mercury vapor lamp
CH597618A5 (de) * 1975-12-02 1978-04-14 Zelacolor Syst

Also Published As

Publication number Publication date
CH623659A5 (en) 1981-06-15
DE2742488A1 (de) 1978-03-23
GB1589784A (en) 1981-05-20
IT1090469B (it) 1985-06-26
DE2742488C2 (de) 1988-01-21
FR2372379B1 (de) 1982-08-13
FR2372379A1 (fr) 1978-06-23
JPS5341079A (en) 1978-04-14
JPH0315170B2 (de) 1991-02-28

Similar Documents

Publication Publication Date Title
US4241390A (en) System for illuminating an annular field
EP0095622B1 (de) Optisches System
KR100451339B1 (ko) 높은개구수의링필드광학축소시스템
JPH075365A (ja) オフアクシス反射屈折型投影光学系
US4747678A (en) Optical relay system with magnification
KR100724784B1 (ko) 두 개의 중간 이미지를 포함하는 카타디옵트릭 대물렌즈
US6213610B1 (en) Catoptric reduction projection optical system and exposure apparatus and method using same
US5559338A (en) Deep ultraviolet optical imaging system for microlithography and/or microfabrication
US4953960A (en) Optical reduction system
USRE39024E1 (en) Exposure apparatus having catadioptric projection optical system
TWI420249B (zh) 投影曝光裝置、投影曝光方法及投影物
JPH043528B2 (de)
JPH0627382A (ja) 再投影光学システム
KR20000011933A (ko) 카타다이옵트릭광학시스템및그를구비한노광장치
JP2000031041A (ja) 縮小オブジェクティブ
JP2001343589A (ja) 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法
US8134687B2 (en) Illumination system of a microlithographic exposure apparatus
US6144495A (en) Projection light source
US6597511B2 (en) Microlithographic illuminating system and microlithographic projection exposure arrangement incorporating said system
KR100888011B1 (ko) 리소그래피 시스템의 조명 시스템에서 사용되는 릴레이렌즈
JPS61502640A (ja) 球面鏡によりガウスビ−ムを整形する装置
CA1090183A (en) System for illuminating an annular field
JP2002323658A (ja) 照明システムの分割形対物レンズ
JPH06118341A (ja) 走査型投影装置
Wood et al. Short‐wavelength annular‐field optical system for imaging tenth‐micron features

Legal Events

Date Code Title Description
MKEX Expiry
MKEX Expiry

Effective date: 19971125