BR9811384A - Método para fabricação de oxinitreto de silìcio - Google Patents

Método para fabricação de oxinitreto de silìcio

Info

Publication number
BR9811384A
BR9811384A BR9811384-4A BR9811384A BR9811384A BR 9811384 A BR9811384 A BR 9811384A BR 9811384 A BR9811384 A BR 9811384A BR 9811384 A BR9811384 A BR 9811384A
Authority
BR
Brazil
Prior art keywords
silicon oxynitride
heated
making silicon
gas stream
closed reaction
Prior art date
Application number
BR9811384-4A
Other languages
English (en)
Portuguese (pt)
Inventor
David F Dawson-Elli
Carlton M Truesdale
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Inc filed Critical Corning Inc
Publication of BR9811384A publication Critical patent/BR9811384A/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
    • C01B21/0821—Oxynitrides of metals, boron or silicon
    • C01B21/0823—Silicon oxynitrides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B15/00—Peroxides; Peroxyhydrates; Peroxyacids or salts thereof; Superoxides; Ozonides
    • C01B15/055—Peroxyhydrates; Peroxyacids or salts thereof
    • C01B15/14—Peroxyhydrates; Peroxyacids or salts thereof containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/308—Oxynitrides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Vapour Deposition (AREA)
  • Silicon Compounds (AREA)
BR9811384-4A 1997-08-29 1998-08-05 Método para fabricação de oxinitreto de silìcio BR9811384A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US5724197P 1997-08-29 1997-08-29
PCT/US1998/016358 WO1999011573A1 (en) 1997-08-29 1998-08-05 Method for fabricating silicon oxynitride

Publications (1)

Publication Number Publication Date
BR9811384A true BR9811384A (pt) 2000-08-29

Family

ID=22009383

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9811384-4A BR9811384A (pt) 1997-08-29 1998-08-05 Método para fabricação de oxinitreto de silìcio

Country Status (9)

Country Link
EP (1) EP1025041A1 (ja)
JP (1) JP2001514151A (ja)
KR (1) KR20010023452A (ja)
CN (1) CN1268099A (ja)
BR (1) BR9811384A (ja)
CA (1) CA2297329A1 (ja)
ID (1) ID24748A (ja)
TW (1) TW509660B (ja)
WO (1) WO1999011573A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1130633A1 (en) * 2000-02-29 2001-09-05 STMicroelectronics S.r.l. A method of depositing silicon oxynitride polimer layers

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4788309A (en) * 1985-04-26 1988-11-29 Sri International Method of forming compounds having Si-N groups and resulting products
US5166104A (en) * 1986-02-12 1992-11-24 Toa Nenryo Kogyo Kabushiki Kaisha Polysiloxazanes, silicon oxynitride fibers and processes for producing same

Also Published As

Publication number Publication date
EP1025041A1 (en) 2000-08-09
CN1268099A (zh) 2000-09-27
WO1999011573A1 (en) 1999-03-11
TW509660B (en) 2002-11-11
ID24748A (id) 2000-08-03
CA2297329A1 (en) 1999-03-11
AU8694298A (en) 1999-03-22
AU731687B2 (en) 2001-04-05
JP2001514151A (ja) 2001-09-11
KR20010023452A (ko) 2001-03-26

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Legal Events

Date Code Title Description
B08F Application fees: application dismissed [chapter 8.6 patent gazette]