BR8901395A - Processo para preparacao de revestimentos fotocurados - Google Patents
Processo para preparacao de revestimentos fotocuradosInfo
- Publication number
- BR8901395A BR8901395A BR898901395A BR8901395A BR8901395A BR 8901395 A BR8901395 A BR 8901395A BR 898901395 A BR898901395 A BR 898901395A BR 8901395 A BR8901395 A BR 8901395A BR 8901395 A BR8901395 A BR 8901395A
- Authority
- BR
- Brazil
- Prior art keywords
- preparing
- photocured coatings
- photocured
- coatings
- preparing photocured
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
- G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Structural Engineering (AREA)
- Architecture (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Paints Or Removers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Epoxy Resins (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US17457988A | 1988-03-29 | 1988-03-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
BR8901395A true BR8901395A (pt) | 1989-11-07 |
Family
ID=22636685
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR898901395A BR8901395A (pt) | 1988-03-29 | 1989-03-27 | Processo para preparacao de revestimentos fotocurados |
Country Status (14)
Country | Link |
---|---|
EP (1) | EP0335629A3 (pt) |
JP (1) | JPH029480A (pt) |
KR (1) | KR890014180A (pt) |
CN (1) | CN1037041A (pt) |
AU (1) | AU607318B2 (pt) |
BR (1) | BR8901395A (pt) |
DK (1) | DK149489A (pt) |
FI (1) | FI891480A (pt) |
IL (1) | IL89775A0 (pt) |
MX (1) | MX169037B (pt) |
MY (1) | MY103987A (pt) |
NO (1) | NO891226L (pt) |
PH (1) | PH26033A (pt) |
ZA (1) | ZA892266B (pt) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2604438B2 (ja) * | 1988-09-19 | 1997-04-30 | 旭電化工業株式会社 | 樹脂の光学的造形方法 |
JP2632961B2 (ja) * | 1988-09-13 | 1997-07-23 | 旭電化工業株式会社 | 樹脂の光学的造形方法 |
AU655580B2 (en) * | 1990-04-23 | 1995-01-05 | Minnesota Mining And Manufacturing Company | Energy curable cationically and free-radically polymerizable pressure-sensitive compositions |
US5238744A (en) * | 1990-08-16 | 1993-08-24 | Minnesota Mining And Manufacturing Company | Tough polymeric mixtures |
US5102924A (en) * | 1990-08-16 | 1992-04-07 | Minnesota Mining And Manufacturing Company | Polymeric mixtures and process therefor |
CA2048232A1 (en) * | 1990-09-05 | 1992-03-06 | Jerry W. Williams | Energy curable pressure-sensitive compositions |
EP0487086B2 (en) * | 1990-11-22 | 2008-08-13 | Canon Kabushiki Kaisha | Method of preparing volume type phase hologram member using a photosensitive recording medium |
JP2849021B2 (ja) * | 1993-04-12 | 1999-01-20 | 日本ペイント株式会社 | 体積ホログラム記録用感光性組成物 |
JPH0732696U (ja) * | 1993-11-25 | 1995-06-16 | 防衛庁技術研究本部長 | 水中吸音材ユニット |
IT1274039B (it) * | 1994-09-02 | 1997-07-14 | Atohaas C V Ora Atohaas Holdin | Processo per la preparazione di articoli formati a base di polimeri acrilici rivestiti con un film antigraffio e antiabrasione |
US6100007A (en) * | 1998-04-06 | 2000-08-08 | Ciba Specialty Chemicals Corp. | Liquid radiation-curable composition especially for producing cured articles by stereolithography having high heat deflection temperatures |
WO2001021326A1 (en) * | 1999-09-22 | 2001-03-29 | Surmodics, Inc. | Water-soluble coating agents bearing initiator groups and coating process |
WO2005123803A1 (ja) * | 2004-06-17 | 2005-12-29 | Three Bond Co., Ltd. | 光カチオン重合性組成物及びそれを用いたオプトエレクトロニクス部品 |
CN100399138C (zh) * | 2006-06-26 | 2008-07-02 | 友达光电股份有限公司 | 液晶面板及其制造方法 |
JP5163602B2 (ja) * | 2009-07-06 | 2013-03-13 | 大日本印刷株式会社 | 高低パターン層形成体の製造方法 |
JP5726912B2 (ja) * | 2010-02-13 | 2015-06-03 | マクアリスター テクノロジーズ エルエルシー | 再放射面を有する化学反応器ならびにその関連システムおよび方法 |
JP5607486B2 (ja) * | 2010-10-08 | 2014-10-15 | サーモディクス,インコーポレイティド | 開始剤基を有する水溶性コーティング剤およびコーティング方法 |
CN102566285B (zh) * | 2010-12-09 | 2014-05-28 | 远东新世纪股份有限公司 | 制造微结构的方法及该微结构 |
DE102011077612A1 (de) * | 2011-06-16 | 2012-12-20 | Evonik Röhm Gmbh | Verfahren zur kontinuierlichen inline Herstellung von beschichteten polymeren Substraten oder Laminaten |
JP5855899B2 (ja) | 2011-10-27 | 2016-02-09 | 日立オートモティブシステムズ株式会社 | Dc−dcコンバータ及び電力変換装置 |
CN108473822B (zh) * | 2015-12-30 | 2021-11-12 | 3M创新有限公司 | 双阶段结构粘结粘合剂 |
US10858541B2 (en) | 2017-12-19 | 2020-12-08 | Rohm And Haas Electronic Materials Llc | Curable composition |
CN109467385B (zh) * | 2018-01-15 | 2021-09-03 | 杭州创屹机电科技有限公司 | 一种抗菌环保3d打印陶瓷材料及其制备方法 |
CN109467387A (zh) * | 2018-01-15 | 2019-03-15 | 杭州创屹机电科技有限公司 | 一种低孔隙率3d打印陶瓷制品及其制备方法 |
CN109485436A (zh) * | 2018-01-15 | 2019-03-19 | 杭州创屹机电科技有限公司 | 一种3d打印陶瓷材料两步光固化成型方法 |
JP2019137721A (ja) * | 2018-02-06 | 2019-08-22 | スリーエム イノベイティブ プロパティズ カンパニー | 樹脂組成物、隙間充填用接着剤、隙間充填用接着剤の製造方法及び隙間充填方法 |
CN114641145A (zh) * | 2020-12-16 | 2022-06-17 | 深南电路股份有限公司 | 一种线路板及其线路板阻焊层的制作方法 |
CN114721229B (zh) * | 2022-03-18 | 2023-07-28 | 浙江鑫柔科技有限公司 | 一种新型非对称性紫外曝光方法 |
CN117255495A (zh) * | 2022-06-09 | 2023-12-19 | 庆鼎精密电子(淮安)有限公司 | 降低防焊层表面离子含量的方法、背光模组及其制造方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4849320A (en) * | 1986-05-10 | 1989-07-18 | Ciba-Geigy Corporation | Method of forming images |
GB8715435D0 (en) * | 1987-07-01 | 1987-08-05 | Ciba Geigy Ag | Forming images |
-
1989
- 1989-03-16 MX MX015294A patent/MX169037B/es unknown
- 1989-03-21 NO NO89891226A patent/NO891226L/no unknown
- 1989-03-21 PH PH38367A patent/PH26033A/en unknown
- 1989-03-24 MY MYPI89000370A patent/MY103987A/en unknown
- 1989-03-27 BR BR898901395A patent/BR8901395A/pt not_active Application Discontinuation
- 1989-03-28 DK DK149489A patent/DK149489A/da not_active Application Discontinuation
- 1989-03-28 IL IL89775A patent/IL89775A0/xx unknown
- 1989-03-28 AU AU31748/89A patent/AU607318B2/en not_active Ceased
- 1989-03-28 EP EP19890302993 patent/EP0335629A3/en not_active Withdrawn
- 1989-03-28 ZA ZA892266A patent/ZA892266B/xx unknown
- 1989-03-28 FI FI891480A patent/FI891480A/fi not_active Application Discontinuation
- 1989-03-29 JP JP1075241A patent/JPH029480A/ja active Pending
- 1989-03-29 CN CN89101874A patent/CN1037041A/zh active Pending
- 1989-03-29 KR KR1019890004015A patent/KR890014180A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
IL89775A0 (en) | 1989-09-28 |
AU3174889A (en) | 1989-10-05 |
DK149489A (da) | 1989-09-30 |
NO891226L (no) | 1989-10-02 |
MY103987A (en) | 1993-10-30 |
JPH029480A (ja) | 1990-01-12 |
AU607318B2 (en) | 1991-02-28 |
EP0335629A2 (en) | 1989-10-04 |
PH26033A (en) | 1992-01-29 |
EP0335629A3 (en) | 1991-10-09 |
FI891480A (fi) | 1989-09-30 |
NO891226D0 (no) | 1989-03-21 |
MX169037B (es) | 1993-06-17 |
KR890014180A (ko) | 1989-10-23 |
CN1037041A (zh) | 1989-11-08 |
DK149489D0 (da) | 1989-03-28 |
FI891480A0 (fi) | 1989-03-28 |
ZA892266B (en) | 1989-11-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FB19 | Grant procedure suspended (art. 19) | ||
FA2 | Application deemed withdrawn (art. 19(5)) | ||
B15K | Others concerning applications: alteration of classification |
Ipc: G03F 7/095 (2006.01), G03F 7/20 (2006.0 |