BR8001128A - PHOTO-REACTIVE COMPOSITION AND SYSTEM ABLE TO FORM IMAGE - Google Patents
PHOTO-REACTIVE COMPOSITION AND SYSTEM ABLE TO FORM IMAGEInfo
- Publication number
- BR8001128A BR8001128A BR8001128A BR8001128A BR8001128A BR 8001128 A BR8001128 A BR 8001128A BR 8001128 A BR8001128 A BR 8001128A BR 8001128 A BR8001128 A BR 8001128A BR 8001128 A BR8001128 A BR 8001128A
- Authority
- BR
- Brazil
- Prior art keywords
- photo
- form image
- reactive composition
- reactive
- composition
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
- G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
- Printing Plates And Materials Therefor (AREA)
- Graft Or Block Polymers (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US1558479A | 1979-02-27 | 1979-02-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
BR8001128A true BR8001128A (en) | 1980-11-04 |
Family
ID=21772291
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR8001128A BR8001128A (en) | 1979-02-27 | 1980-02-26 | PHOTO-REACTIVE COMPOSITION AND SYSTEM ABLE TO FORM IMAGE |
Country Status (10)
Country | Link |
---|---|
JP (1) | JPS55120028A (en) |
BE (1) | BE881956A (en) |
BR (1) | BR8001128A (en) |
CA (1) | CA1144804A (en) |
DE (1) | DE3007212A1 (en) |
ES (1) | ES8103397A1 (en) |
FR (1) | FR2450473A1 (en) |
GB (1) | GB2044788B (en) |
NL (1) | NL8001085A (en) |
ZA (1) | ZA801085B (en) |
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57141640A (en) * | 1981-02-03 | 1982-09-02 | Konishiroku Photo Ind Co Ltd | Photosensitive image forming material |
JPS57197537A (en) * | 1981-05-29 | 1982-12-03 | Konishiroku Photo Ind Co Ltd | Photosensitive composition |
JPS582847A (en) * | 1981-06-30 | 1983-01-08 | Konishiroku Photo Ind Co Ltd | Lithographic plate |
JPS58199341A (en) * | 1982-05-17 | 1983-11-19 | Tokyo Ohka Kogyo Co Ltd | Heat resistant photosensitive resin composition |
JPS5953836A (en) * | 1982-09-21 | 1984-03-28 | Fuji Photo Film Co Ltd | Photosensitive lithographic plate |
JPS59101644A (en) * | 1982-12-01 | 1984-06-12 | Fuji Photo Film Co Ltd | Photosensitive composition |
US4600679A (en) * | 1984-05-25 | 1986-07-15 | W. R. Grace & Co. | Water-developable, negative-working, diazo lithographic printing plate with oleophilic ester overlayer |
DE3425328A1 (en) * | 1984-07-10 | 1986-01-16 | Hoechst Ag, 6230 Frankfurt | LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE RECORDING MATERIAL MADE THEREOF |
DE3567294D1 (en) * | 1984-12-06 | 1989-02-09 | Hoechst Celanese Corp | Light-sensitive composition |
DE3504658A1 (en) * | 1985-02-12 | 1986-08-14 | Hoechst Ag, 6230 Frankfurt | LIGHT-SENSITIVE MIXTURE AND RECORDING MATERIAL MADE THEREFOR |
DE3605717A1 (en) * | 1985-02-28 | 1986-08-28 | Hoechst Celanese Corp., Somerville, N.J. | POLYMERIZABLE MIXTURE BY RADIATION |
US4851319A (en) * | 1985-02-28 | 1989-07-25 | Hoechst Celanese Corporation | Radiation polymerizable composition, photographic element, and method of making element with diazonium salt, and monofunctional and polyfunctional acrylic monomers |
US5080999A (en) * | 1985-06-10 | 1992-01-14 | Fuji Photo Film Co., Ltd. | Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide |
US4822720A (en) * | 1985-08-02 | 1989-04-18 | Hoechst Celanese Corporation | Water developable screen printing composition |
US4772538A (en) * | 1985-08-02 | 1988-09-20 | American Hoechst Corporation | Water developable lithographic composition |
US4652604A (en) * | 1985-08-02 | 1987-03-24 | American Hoechst Corporation | Radiation-polymerizable composition and element containing a photopolymer composition |
US4780392A (en) * | 1985-08-02 | 1988-10-25 | Hoechst Celanese Corporation | Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer |
US5120772A (en) * | 1985-08-02 | 1992-06-09 | Walls John E | Radiation-polymerizable composition and element containing a photopolymerizable mixture |
US4707437A (en) * | 1985-08-02 | 1987-11-17 | Hoechst Celanese Corporation | Radiation-polymerizable composition and element containing a photopolymer composition |
DE3528309A1 (en) * | 1985-08-07 | 1987-02-12 | Hoechst Ag | LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE RECORDING MATERIAL MADE THEREOF |
JPS6278544A (en) * | 1985-10-01 | 1987-04-10 | Fuji Photo Film Co Ltd | Photosensitive composition |
JPS62238553A (en) * | 1986-04-10 | 1987-10-19 | Nippon Foil Mfg Co Ltd | Photosensitive resin composition |
US4877711A (en) * | 1986-05-19 | 1989-10-31 | Fuji Photo Film Co., Ltd. | Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group |
DE3644160A1 (en) * | 1986-12-23 | 1988-07-14 | Hoechst Ag | LIGHT-SENSITIVE RECORDING MATERIAL WITH A LIGHT-SENSITIVE INTERLAYER |
US4886731A (en) * | 1987-01-05 | 1989-12-12 | Cookson Graphics Inc. | Multilayer photopolymeric printing plates with photoreactive diazo compounds and photopolymerizable compositions |
JPH0727208B2 (en) * | 1987-04-20 | 1995-03-29 | 富士写真フイルム株式会社 | Photosensitive composition |
DE3738863A1 (en) * | 1987-11-16 | 1989-05-24 | Hoechst Ag | LIGHT-SENSITIVE PRINTING PLATE FOR WATERLESS OFFSET PRINTING |
US5286594A (en) * | 1988-01-29 | 1994-02-15 | International Paper Company | Photographic elements utilizing a single photosensitive layer containing a photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles |
US5340681A (en) * | 1988-01-29 | 1994-08-23 | International Paper Company | Method for preparing photographic elements having single photosensitive layer containing photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles; and negative image formation process |
CA2000712A1 (en) * | 1988-10-21 | 1990-04-21 | Thomas Dunder | Negative-working, photopolymerizable color proofing film without triplet oxygen quenching |
DE3903001A1 (en) * | 1989-02-02 | 1990-08-16 | Hoechst Ag | LIGHT-SENSITIVE MIXTURE AND LIGHT-SENSITIVE RECORDING MATERIAL MADE THEREOF |
JP6962216B2 (en) * | 2018-01-24 | 2021-11-05 | 日本製鉄株式会社 | Anti-rust treatment liquid for welded steel pipes, chemical conversion treatment methods for welded steel pipes, molded products of welded steel pipes and welded steel pipes |
CN113105570B (en) * | 2021-04-12 | 2022-05-03 | 之江实验室 | Liquid two-photon initiator and preparation method and application thereof |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1141544A (en) * | 1966-07-13 | 1969-01-29 | Gordon Owen Shipton | Polymer compositions |
US3905815A (en) * | 1971-12-17 | 1975-09-16 | Minnesota Mining & Mfg | Photopolymerizable sheet material with diazo resin layer |
IT1000315B (en) * | 1972-12-14 | 1976-03-30 | Polychrome Corp | IMPROVEMENT IN POTOSENSITIVE UNSATURATED DIAZOIC MONOMERE COMPOSITIONS |
FI207474A (en) * | 1973-08-16 | 1975-02-17 | Hercules Inc | |
JPS50108003A (en) * | 1974-02-01 | 1975-08-26 | ||
JPS50114122A (en) * | 1974-02-16 | 1975-09-06 | ||
GB1523762A (en) * | 1975-02-25 | 1978-09-06 | Oce Van Der Grinten Nv | Photocopying materials |
US4042386A (en) * | 1976-06-07 | 1977-08-16 | Napp Systems | Photosensitive compositions |
JPS549619A (en) * | 1977-06-23 | 1979-01-24 | Oji Paper Co | Photosensitive composition |
AU526602B2 (en) * | 1977-10-06 | 1983-01-20 | Polychrome Corp. | Lithographic printing plate |
-
1980
- 1980-02-22 NL NL8001085A patent/NL8001085A/en not_active Application Discontinuation
- 1980-02-25 ES ES488890A patent/ES8103397A1/en not_active Expired
- 1980-02-26 FR FR8004164A patent/FR2450473A1/en not_active Withdrawn
- 1980-02-26 BR BR8001128A patent/BR8001128A/en unknown
- 1980-02-26 ZA ZA00801085A patent/ZA801085B/en unknown
- 1980-02-26 CA CA000346444A patent/CA1144804A/en not_active Expired
- 1980-02-26 DE DE19803007212 patent/DE3007212A1/en not_active Ceased
- 1980-02-26 GB GB8006481A patent/GB2044788B/en not_active Expired
- 1980-02-27 JP JP2394780A patent/JPS55120028A/en active Pending
- 1980-02-27 BE BE0/199576A patent/BE881956A/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
NL8001085A (en) | 1980-08-29 |
JPS55120028A (en) | 1980-09-16 |
FR2450473A1 (en) | 1980-09-26 |
ES488890A0 (en) | 1981-02-16 |
GB2044788A (en) | 1980-10-22 |
DE3007212A1 (en) | 1980-08-28 |
BE881956A (en) | 1980-08-27 |
ZA801085B (en) | 1981-07-29 |
ES8103397A1 (en) | 1981-02-16 |
GB2044788B (en) | 1983-05-25 |
CA1144804A (en) | 1983-04-19 |
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