BE881956A - PHOTOSENSITIVE COMPOSITIONS AND IMPRESSIVE SYSTEMS COMPRISING SUCH COMPOSITIONS - Google Patents

PHOTOSENSITIVE COMPOSITIONS AND IMPRESSIVE SYSTEMS COMPRISING SUCH COMPOSITIONS

Info

Publication number
BE881956A
BE881956A BE0/199576A BE199576A BE881956A BE 881956 A BE881956 A BE 881956A BE 0/199576 A BE0/199576 A BE 0/199576A BE 199576 A BE199576 A BE 199576A BE 881956 A BE881956 A BE 881956A
Authority
BE
Belgium
Prior art keywords
compositions
impressive
systems
photosensitive
photosensitive compositions
Prior art date
Application number
BE0/199576A
Other languages
French (fr)
Inventor
P Fuchs
Original Assignee
Minnesota Mining & Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining & Mfg filed Critical Minnesota Mining & Mfg
Publication of BE881956A publication Critical patent/BE881956A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Graft Or Block Polymers (AREA)
  • Printing Plates And Materials Therefor (AREA)
BE0/199576A 1979-02-27 1980-02-27 PHOTOSENSITIVE COMPOSITIONS AND IMPRESSIVE SYSTEMS COMPRISING SUCH COMPOSITIONS BE881956A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US1558479A 1979-02-27 1979-02-27

Publications (1)

Publication Number Publication Date
BE881956A true BE881956A (en) 1980-08-27

Family

ID=21772291

Family Applications (1)

Application Number Title Priority Date Filing Date
BE0/199576A BE881956A (en) 1979-02-27 1980-02-27 PHOTOSENSITIVE COMPOSITIONS AND IMPRESSIVE SYSTEMS COMPRISING SUCH COMPOSITIONS

Country Status (10)

Country Link
JP (1) JPS55120028A (en)
BE (1) BE881956A (en)
BR (1) BR8001128A (en)
CA (1) CA1144804A (en)
DE (1) DE3007212A1 (en)
ES (1) ES488890A0 (en)
FR (1) FR2450473A1 (en)
GB (1) GB2044788B (en)
NL (1) NL8001085A (en)
ZA (1) ZA801085B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111630206A (en) * 2018-01-24 2020-09-04 日本制铁株式会社 Antirust treatment liquid for welded steel pipe, chemical conversion treatment method for welded steel pipe, and welded steel pipe molded product

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57141640A (en) * 1981-02-03 1982-09-02 Konishiroku Photo Ind Co Ltd Photosensitive image forming material
JPS57197537A (en) * 1981-05-29 1982-12-03 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS582847A (en) * 1981-06-30 1983-01-08 Konishiroku Photo Ind Co Ltd Lithographic plate
JPS58199341A (en) * 1982-05-17 1983-11-19 Tokyo Ohka Kogyo Co Ltd Heat resistant photosensitive resin composition
JPS5953836A (en) * 1982-09-21 1984-03-28 Fuji Photo Film Co Ltd Photosensitive lithographic plate
JPS59101644A (en) * 1982-12-01 1984-06-12 Fuji Photo Film Co Ltd Photosensitive composition
US4600679A (en) * 1984-05-25 1986-07-15 W. R. Grace & Co. Water-developable, negative-working, diazo lithographic printing plate with oleophilic ester overlayer
DE3425328A1 (en) * 1984-07-10 1986-01-16 Hoechst Ag, 6230 Frankfurt LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE RECORDING MATERIAL MADE THEREOF
DE3567294D1 (en) * 1984-12-06 1989-02-09 Hoechst Celanese Corp Light-sensitive composition
DE3504658A1 (en) * 1985-02-12 1986-08-14 Hoechst Ag, 6230 Frankfurt LIGHT-SENSITIVE MIXTURE AND RECORDING MATERIAL MADE THEREFOR
US4851319A (en) * 1985-02-28 1989-07-25 Hoechst Celanese Corporation Radiation polymerizable composition, photographic element, and method of making element with diazonium salt, and monofunctional and polyfunctional acrylic monomers
DE3605717A1 (en) * 1985-02-28 1986-08-28 Hoechst Celanese Corp., Somerville, N.J. POLYMERIZABLE MIXTURE BY RADIATION
US5080999A (en) * 1985-06-10 1992-01-14 Fuji Photo Film Co., Ltd. Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide
US5120772A (en) * 1985-08-02 1992-06-09 Walls John E Radiation-polymerizable composition and element containing a photopolymerizable mixture
US4780392A (en) * 1985-08-02 1988-10-25 Hoechst Celanese Corporation Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer
US4652604A (en) * 1985-08-02 1987-03-24 American Hoechst Corporation Radiation-polymerizable composition and element containing a photopolymer composition
US4707437A (en) * 1985-08-02 1987-11-17 Hoechst Celanese Corporation Radiation-polymerizable composition and element containing a photopolymer composition
US4822720A (en) * 1985-08-02 1989-04-18 Hoechst Celanese Corporation Water developable screen printing composition
US4772538A (en) * 1985-08-02 1988-09-20 American Hoechst Corporation Water developable lithographic composition
DE3528309A1 (en) * 1985-08-07 1987-02-12 Hoechst Ag LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE RECORDING MATERIAL MADE THEREOF
JPS6278544A (en) * 1985-10-01 1987-04-10 Fuji Photo Film Co Ltd Photosensitive composition
JPS62238553A (en) * 1986-04-10 1987-10-19 Nippon Foil Mfg Co Ltd Photosensitive resin composition
US4877711A (en) * 1986-05-19 1989-10-31 Fuji Photo Film Co., Ltd. Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group
DE3644160A1 (en) * 1986-12-23 1988-07-14 Hoechst Ag LIGHT-SENSITIVE RECORDING MATERIAL WITH A LIGHT-SENSITIVE INTERLAYER
US4886731A (en) * 1987-01-05 1989-12-12 Cookson Graphics Inc. Multilayer photopolymeric printing plates with photoreactive diazo compounds and photopolymerizable compositions
JPH0727208B2 (en) * 1987-04-20 1995-03-29 富士写真フイルム株式会社 Photosensitive composition
DE3738863A1 (en) * 1987-11-16 1989-05-24 Hoechst Ag LIGHT-SENSITIVE PRINTING PLATE FOR WATERLESS OFFSET PRINTING
US5286594A (en) * 1988-01-29 1994-02-15 International Paper Company Photographic elements utilizing a single photosensitive layer containing a photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles
US5340681A (en) * 1988-01-29 1994-08-23 International Paper Company Method for preparing photographic elements having single photosensitive layer containing photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles; and negative image formation process
CA2000712A1 (en) * 1988-10-21 1990-04-21 Thomas Dunder Negative-working, photopolymerizable color proofing film without triplet oxygen quenching
DE3903001A1 (en) * 1989-02-02 1990-08-16 Hoechst Ag LIGHT-SENSITIVE MIXTURE AND LIGHT-SENSITIVE RECORDING MATERIAL MADE THEREOF
CN113105570B (en) * 2021-04-12 2022-05-03 之江实验室 Liquid two-photon initiator and preparation method and application thereof

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1547849A1 (en) * 1966-07-13 1969-12-11 Fmc Corp Photosensitive mass
US3905815A (en) * 1971-12-17 1975-09-16 Minnesota Mining & Mfg Photopolymerizable sheet material with diazo resin layer
IT1000315B (en) * 1972-12-14 1976-03-30 Polychrome Corp IMPROVEMENT IN POTOSENSITIVE UNSATURATED DIAZOIC MONOMERE COMPOSITIONS
FI207474A (en) * 1973-08-16 1975-02-17 Hercules Inc
JPS50108003A (en) * 1974-02-01 1975-08-26
JPS50114122A (en) * 1974-02-16 1975-09-06
GB1523762A (en) * 1975-02-25 1978-09-06 Oce Van Der Grinten Nv Photocopying materials
US4042386A (en) * 1976-06-07 1977-08-16 Napp Systems Photosensitive compositions
JPS549619A (en) * 1977-06-23 1979-01-24 Oji Paper Co Photosensitive composition
AU526602B2 (en) * 1977-10-06 1983-01-20 Polychrome Corp. Lithographic printing plate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111630206A (en) * 2018-01-24 2020-09-04 日本制铁株式会社 Antirust treatment liquid for welded steel pipe, chemical conversion treatment method for welded steel pipe, and welded steel pipe molded product
CN111630206B (en) * 2018-01-24 2022-04-08 日本制铁株式会社 Antirust treatment liquid for welded steel pipe, chemical conversion treatment method for welded steel pipe, and welded steel pipe molded product

Also Published As

Publication number Publication date
BR8001128A (en) 1980-11-04
FR2450473A1 (en) 1980-09-26
ZA801085B (en) 1981-07-29
GB2044788B (en) 1983-05-25
DE3007212A1 (en) 1980-08-28
CA1144804A (en) 1983-04-19
JPS55120028A (en) 1980-09-16
NL8001085A (en) 1980-08-29
GB2044788A (en) 1980-10-22
ES8103397A1 (en) 1981-02-16
ES488890A0 (en) 1981-02-16

Similar Documents

Publication Publication Date Title
BE881956A (en) PHOTOSENSITIVE COMPOSITIONS AND IMPRESSIVE SYSTEMS COMPRISING SUCH COMPOSITIONS
IT1164523B (en) ANTI-BREATHING COMPOSITIONS IN EMULSION
IT8019397A0 (en) LIGHT-POLYMERISABLE ORGANOPOLYSILOXANE COMPOSITIONS.
IT8024229A0 (en) VULCANIZABLE COMPOSITIONS AND RELATED PROCEDURE.
BR8007913A (en) EMULSION COMPOSITION
BR8001956A (en) CLEANING AND CLEANING COMPOSITION
NL191556C (en) Absorbent object.
IT1149914B (en) T-HYDROPHTHALYMIDE N-SUBSTITUTE AND HERBICIDE COMPOSITION
IT1129096B (en) LUBRICANT COMPOSITION
BR8004998A (en) DESONDORANT COMPOSITION
BR8001749A (en) COPOLIETERESTER COMPOSITION
IT8019894A0 (en) ANTI-COCCIDIOUS COMPOSITIONS.
BR8003510A (en) ORGANOPOLYSILOXAN COMPOSITION
BR8004999A (en) DISORDORING COMPOSITION
BR8001133A (en) CONICO BEARING
NO800164L (en) Roentgen-CONTRAST AGENT.
RO80247A (en) ACARICIDA COMPOSITION
BR8006541A (en) BEARING BEARING
IT8025607A0 (en) LINCOMYCIN AND CLINDAMICIN ANALOGUES.
NZ183134A (en) I-i-(3-aryloxy-2-hydroxypropyl)-4-piperidyl-3-aryl-imid-azolidin or hexahydropyrimidin-2-ones; and pharmaceutical compositions
RO79731A (en) ERBICIDA COMPOSITION
BR8007525A (en) PERFECT CENTRAL BEARING SET
DK491880A (en) LEPIDOPTERICIDE ISOTHIOUR INGREDIENTS
DK153331C (en) GREASE COMPOSITION
IT8024632A0 (en) SAPONIFYING COMPOSITION.

Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: MINNESOTA MINING AND MFG CY

Effective date: 19860228