GB1141544A - Polymer compositions - Google Patents

Polymer compositions

Info

Publication number
GB1141544A
GB1141544A GB3145966A GB3145966A GB1141544A GB 1141544 A GB1141544 A GB 1141544A GB 3145966 A GB3145966 A GB 3145966A GB 3145966 A GB3145966 A GB 3145966A GB 1141544 A GB1141544 A GB 1141544A
Authority
GB
United Kingdom
Prior art keywords
dabp
diallyl
allyl
methyl
benzil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3145966A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to GB3145966A priority Critical patent/GB1141544A/en
Priority to DE19661547849 priority patent/DE1547849A1/en
Priority to FR69943A priority patent/FR1487028A/en
Publication of GB1141544A publication Critical patent/GB1141544A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F263/00—Macromolecular compounds obtained by polymerising monomers on to polymers of esters of unsaturated alcohols with saturated acids as defined in group C08F18/00
    • C08F263/06—Macromolecular compounds obtained by polymerising monomers on to polymers of esters of unsaturated alcohols with saturated acids as defined in group C08F18/00 on to polymers of esters with polycarboxylic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

1,141,544. Unsaturated carboxylic ester polymers in photosensitive compositions. G. O. SHIPTON (FMC Corp.). 13 July, 1966, No. 31459/66. Heading C3P. [Also in Division G2] A photosensitive composition comprises (a) a prepolymer of an unsaturated carboxylic ester having at least two carbon to carbon double bonds, at least one of which is an allyl ester group, and (b) a sensitizing agent which, upon absorbing actinic radiation at room temperature, accelerates cross-linking of said prepolymer. A wide variety of conventional photosensitizers may be used, while suitable prepolymers include those of allyl methacrylate, diallyl succinate, allyl cinnamate, diallyl isophthalate, diallyl terephthalate, triallyl mellitate and tetra-allyl pyromellitate. In the examples, photosensitive compositions comprising the following prepolymers and sensitizers in a variety of solvents are prepared: (1) allyl methacrylate, benzil, 4,41 - bis - (dimethylamino)-benzophenone, (2) allyl methacrylate/ styrene, methylether of benzoin, (3) diallyl succinate / piperonal / 4,4 - bis - (dimethylamino / benzophenone (DABP), (4) diallyl maleate / DABP, (5) diallyl maleate / methyl methacrylate, DABP, (6) allylcinnamate/styrene, 2 - keto - 3 - methyl - 1,3 - diazobenzanthrone, (7 , 8 and 9) diallyl isophthalate, methylether of benzoin or DABP, (10) triallyl trimellitate, DABP, (11) tetra-allyl pyromellitate, DABP, (12-18) diallyl isophthalate, benzil, methyl ether of benzoin, 1,2 - benzanthraquinone, 2- methylanthraquinone, piperonal, 2 - keto - 3 - methyl - 1,3 - diazabenzanthrone or 1 - methyl- 2 - benzoyl - methylene - # -naphthothiazoline, (21) triallyl mellitate, benzil, (22-23) diallyl terephthalate or tetra-allylpyromellitate, DABP, benzophenone and benzil.
GB3145966A 1966-07-13 1966-07-13 Polymer compositions Expired GB1141544A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
GB3145966A GB1141544A (en) 1966-07-13 1966-07-13 Polymer compositions
DE19661547849 DE1547849A1 (en) 1966-07-13 1966-07-13 Photosensitive mass
FR69943A FR1487028A (en) 1966-07-13 1966-07-19 Photo-sensitive compositions

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB3145966A GB1141544A (en) 1966-07-13 1966-07-13 Polymer compositions
DEF0049686 1966-07-13
FR69943A FR1487028A (en) 1966-07-13 1966-07-19 Photo-sensitive compositions

Publications (1)

Publication Number Publication Date
GB1141544A true GB1141544A (en) 1969-01-29

Family

ID=27210489

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3145966A Expired GB1141544A (en) 1966-07-13 1966-07-13 Polymer compositions

Country Status (3)

Country Link
DE (1) DE1547849A1 (en)
FR (1) FR1487028A (en)
GB (1) GB1141544A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2429818A1 (en) * 1978-06-26 1980-01-25 Lord Corp LOW GLOSS FINISH LAYERS OBTAINED BY INTENSITY GRADIENT HARDENING
US4687727A (en) * 1982-09-21 1987-08-18 Fuji Photo Film Co., Ltd. Light-sensitive planographic printing plate with layer of diazo resin containing photopolymerizable composition
US4956261A (en) * 1986-12-23 1990-09-11 Hoechst Aktiengesellschaft Photosensitive diazo and photopolymerizable recording material with a photosensitive diazo intermediate layer

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA980163A (en) * 1970-12-23 1975-12-23 Jack R. Celeste Photocrosslinkable compositions and elements containing heterocyclic nitrogen-containing compounds
AU526602B2 (en) * 1977-10-06 1983-01-20 Polychrome Corp. Lithographic printing plate
NL8001085A (en) * 1979-02-27 1980-08-29 Minnesota Mining & Mfg PHOTOSENSITIVE MATERIALS AND OBJECTS.
EP0653682A1 (en) * 1993-11-16 1995-05-17 Agfa-Gevaert N.V. Imaging element comprising a photopolymerizable composition and method for producing images therewith

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2429818A1 (en) * 1978-06-26 1980-01-25 Lord Corp LOW GLOSS FINISH LAYERS OBTAINED BY INTENSITY GRADIENT HARDENING
US4687727A (en) * 1982-09-21 1987-08-18 Fuji Photo Film Co., Ltd. Light-sensitive planographic printing plate with layer of diazo resin containing photopolymerizable composition
US4956261A (en) * 1986-12-23 1990-09-11 Hoechst Aktiengesellschaft Photosensitive diazo and photopolymerizable recording material with a photosensitive diazo intermediate layer

Also Published As

Publication number Publication date
FR1487028A (en) 1967-06-30
DE1547849A1 (en) 1969-12-11

Similar Documents

Publication Publication Date Title
GB1415378A (en) Photopolymerisable compositions and elements
FR1313807A (en) New monomers, polymers of unsaturated acids, varnishes and coated articles
GB1141544A (en) Polymer compositions
CA1032288A (en) Photosensitive resin composition consisting of an unsaturated polyester, a cross-linking agent and a photosensitizer
ES399317A1 (en) Photopolymerizable compositions and their use
JPS51123140A (en) Photosensitive compositions and processing method thereof
ES278596A1 (en) Method of treating polyester polymer materials to improve their adhesion characteristics
FR2349608A1 (en) CURING COMPOSITIONS CONSISTING OF AN UNSATURATED EPOXYESTER AND AN ETHYLENICALLY UNSATURATED MONOMER
GB1217949A (en) Process for producing cured plastics articles
ES443409A1 (en) Laminated panes
ATE17128T1 (en) CURING POLYESTER COMPOSITIONS.
JPS5227455A (en) Process for preparing a high polymer material having water absorption properties
GB1164514A (en) Photographic Hardening Agents and Their Use in Gelatin Compositions
GB1470059A (en) Photocrosslinkable coating compositions
FR2286856A1 (en) VULCANIZABLE CARBOXYL POLYMER COMPOSITIONS
GB974920A (en) Improvements in and relating to the manufacture of suppositories
KR830002816A (en) Semi-esters and their compositions
FR2283908A1 (en) ETHYLENICALLY UNSATURATED RESINOUS COMPOUNDS AND ULTRAVIOLET CURING COMPOSITIONS
GB1137903A (en) Polyester resin compositions
JPS524367A (en) Dressing mirror
JPS52108479A (en) Photo-curable resin compositions
GB1331464A (en) Photosensitive materials and their use in producing coloured images
JPS5228589A (en) Unsaturated polyester resin composition
SU612906A1 (en) Light-sensitive glass
JPS5379985A (en) Production of polymeric polyol