BR6914892D0 - Material copiador fotossensivel e um processo para a preparacao de um molde de impressao - Google Patents

Material copiador fotossensivel e um processo para a preparacao de um molde de impressao

Info

Publication number
BR6914892D0
BR6914892D0 BR214892/69A BR21489269A BR6914892D0 BR 6914892 D0 BR6914892 D0 BR 6914892D0 BR 214892/69 A BR214892/69 A BR 214892/69A BR 21489269 A BR21489269 A BR 21489269A BR 6914892 D0 BR6914892 D0 BR 6914892D0
Authority
BR
Brazil
Prior art keywords
photosensitive
preparation
printing template
copier material
copier
Prior art date
Application number
BR214892/69A
Other languages
English (en)
Inventor
R Moraw
Original Assignee
Kalle Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19681813443 external-priority patent/DE1813443C3/de
Application filed by Kalle Ag filed Critical Kalle Ag
Publication of BR6914892D0 publication Critical patent/BR6914892D0/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
BR214892/69A 1968-12-09 1969-12-09 Material copiador fotossensivel e um processo para a preparacao de um molde de impressao BR6914892D0 (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19681813443 DE1813443C3 (de) 1968-12-09 Lichtdruckplatte mit einer Diazokopierschicht

Publications (1)

Publication Number Publication Date
BR6914892D0 true BR6914892D0 (pt) 1973-01-11

Family

ID=5715630

Family Applications (1)

Application Number Title Priority Date Filing Date
BR214892/69A BR6914892D0 (pt) 1968-12-09 1969-12-09 Material copiador fotossensivel e um processo para a preparacao de um molde de impressao

Country Status (10)

Country Link
AT (1) AT296345B (pt)
BE (1) BE741653A (pt)
BR (1) BR6914892D0 (pt)
CH (1) CH512083A (pt)
ES (1) ES373165A1 (pt)
FR (1) FR2025641A1 (pt)
GB (1) GB1293396A (pt)
IL (1) IL33344A (pt)
NL (1) NL6916962A (pt)
SE (1) SE358974B (pt)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5929245A (ja) * 1982-08-11 1984-02-16 Hitachi Ltd 感光性組成物及びそれを用いたパタ−ン形成方法
GB8529958D0 (en) * 1985-12-05 1986-01-15 Vickers Plc Radiation sensitive devices
EP0737894B1 (en) * 1995-02-15 2000-06-07 Agfa-Gevaert N.V. A diazo based imaging element having improved storage stability
US6451827B2 (en) 1998-05-12 2002-09-17 Wyeth 2,3,5-substituted biphenyls useful in the treatment of insulin resistance and hyperglycemia
US6699896B1 (en) 1998-05-12 2004-03-02 Wyeth Oxazole-aryl-carboxylic acids useful in the treatment of insulin resistance and hyperglycemia
US6110963A (en) * 1998-05-12 2000-08-29 American Home Products Corporation Aryl-oxo-acetic acids useful in the treatment of insulin resistance and hyperglycemia
US6232322B1 (en) 1998-05-12 2001-05-15 American Home Products Corporation Biphenyl oxo-acetic acids useful in the treatment of insulin resistance and hyperglycemia
US6063815A (en) * 1998-05-12 2000-05-16 American Home Products Corporation Benzopenones useful in the treatment of insulin resistance and hyperglycemia
US6214877B1 (en) 1998-05-12 2001-04-10 John A. Butera 2,3,5-substituted biphenyls useful in the treatment of insulin resistance and hyperglycemia
US6221902B1 (en) 1998-05-12 2001-04-24 American Home Products Corporation Biphenyl sulfonyl aryl carboxylic acids useful in the treatment of insulin resistance and hyperglycemia
US6310081B1 (en) 1999-05-10 2001-10-30 American Home Products Corporation Biphenyl sulfonyl aryl carboxylic acids useful in the treatment of insulin resistance and hyperglycemia

Also Published As

Publication number Publication date
NL6916962A (pt) 1970-06-11
CH512083A (de) 1971-08-31
DE1813443A1 (de) 1970-06-25
IL33344A (en) 1973-07-30
IL33344A0 (en) 1970-01-29
FR2025641A1 (pt) 1970-09-11
SE358974B (pt) 1973-08-13
ES373165A1 (es) 1971-12-16
DE1813443B2 (de) 1976-07-22
BE741653A (pt) 1970-05-13
GB1293396A (en) 1972-10-18
AT296345B (de) 1972-02-10

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