BR0312133A - Formas dìmeras e multìmeras de óxidos de monoacifosfinas e bis-acifosfinas, processo para a preparação das mesmas, bem como composição fotopolimerizável - Google Patents
Formas dìmeras e multìmeras de óxidos de monoacifosfinas e bis-acifosfinas, processo para a preparação das mesmas, bem como composição fotopolimerizávelInfo
- Publication number
- BR0312133A BR0312133A BR0312133-0A BR0312133A BR0312133A BR 0312133 A BR0312133 A BR 0312133A BR 0312133 A BR0312133 A BR 0312133A BR 0312133 A BR0312133 A BR 0312133A
- Authority
- BR
- Brazil
- Prior art keywords
- sub
- formula
- dimer
- preparation
- compounds
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 2
- 239000000539 dimer Substances 0.000 abstract 4
- AVUYXHYHTTVPRX-UHFFFAOYSA-N Tris(2-methyl-1-aziridinyl)phosphine oxide Chemical class CC1CN1P(=O)(N1C(C1)C)N1C(C)C1 AVUYXHYHTTVPRX-UHFFFAOYSA-N 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- 239000002253 acid Substances 0.000 abstract 1
- 125000003545 alkoxy group Chemical group 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 125000000732 arylene group Chemical group 0.000 abstract 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 abstract 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 abstract 1
- 239000007795 chemical reaction product Substances 0.000 abstract 1
- 125000000753 cycloalkyl group Chemical group 0.000 abstract 1
- MPQXHAGKBWFSNV-UHFFFAOYSA-N oxidophosphanium Chemical class [PH3]=O MPQXHAGKBWFSNV-UHFFFAOYSA-N 0.000 abstract 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 abstract 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
- C07F9/5337—Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/6564—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms
- C07F9/6568—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms having phosphorus atoms as the only ring hetero atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/6564—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms
- C07F9/6568—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms having phosphorus atoms as the only ring hetero atoms
- C07F9/65685—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms having phosphorus atoms as the only ring hetero atoms the ring phosphorus atom being part of a phosphine oxide or thioxide
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
Abstract
"FORMAS DìMERAS E MULTìMERAS DE óXIDOS DE MONOACIFOSFINAS E BIS-ACIFOSFINAS, PROCESSO PARA A PREPARAçãO DAS MESMAS, BEM COMO COMPOSIçãO FOTOPOLIMERIZáVEL". A invenção refere-se a formas dímeras e multímeras de compostos BAPO de fórmula I formas dímeras e multímeras de compostos MAPO de fórmula II onde R~ 1~ R~ 2~ e R~ 3~ independentemente um do outro são C~ 1~-C~ 12~ alquila, benzila, C~ 1~-C~ 12~ alcóxi, C~ 3~-C~ 6~ cicloalquila ou C~ 5~-C~ 14~ arila, não-substituídas ou substituídas; Q é um resíduo arileno divalente, trivalente ou tetravalente; n é 1-4, m é 0-2, n+m é 2,3 ou 4; com a condição de que R~ 1~ e R~ 3~ sejam diferentes um do outro. A invenção ainda refere-se a um processo para a preparação de formas dímeras ou multímeras de compostos BAPO de fórmula I e de formas dímeras ou multímeras de compostos MAPO de fórmula II, caracterizado pelo fato de que (n+m) equivalentes de uma fosfina dimetalada R~ 1~P(M)~ 2~ são reagidos com um equivalente de um halogeneto de ácido dicarboxílico ou policarboxílico para formar um composto intermediário de fórmula III o composto intermediário é então reagido tanto com (n+m) equivalentes de um outro halogeneto de ácido carboxílico (R~ 2~-CO-Hal) ou com um halogeneto R~ 3~-Hal, e os produtos de reação são então oxidados para formar óxidos de fosfina de fórmula I ou II.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP02405473 | 2002-06-11 | ||
| PCT/EP2003/005801 WO2003104245A1 (en) | 2002-06-11 | 2003-06-03 | Multimer forms of mono- and bis-acylphosphine oxides |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BR0312133A true BR0312133A (pt) | 2005-04-05 |
Family
ID=29724597
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR0312133-0A BR0312133A (pt) | 2002-06-11 | 2003-06-03 | Formas dìmeras e multìmeras de óxidos de monoacifosfinas e bis-acifosfinas, processo para a preparação das mesmas, bem como composição fotopolimerizável |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US7196228B2 (pt) |
| EP (1) | EP1511754B1 (pt) |
| JP (1) | JP2005529167A (pt) |
| KR (1) | KR20050009744A (pt) |
| CN (1) | CN1324037C (pt) |
| AT (1) | ATE402183T1 (pt) |
| AU (1) | AU2003274653A1 (pt) |
| BR (1) | BR0312133A (pt) |
| CA (1) | CA2489246A1 (pt) |
| DE (1) | DE60322388D1 (pt) |
| MX (1) | MXPA04011923A (pt) |
| WO (1) | WO2003104245A1 (pt) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102004008304A1 (de) | 2004-02-20 | 2005-09-08 | Covion Organic Semiconductors Gmbh | Organische elektronische Vorrichtungen |
| CN100340388C (zh) * | 2006-03-03 | 2007-10-03 | 南京师范大学 | 制作三维物体和支撑的打印成型方法 |
| CN100402538C (zh) * | 2006-06-28 | 2008-07-16 | 南通优尚化工有限公司 | 大分子型的多酰基氧化膦光引发剂及生产方法 |
| US20080093776A1 (en) * | 2006-10-05 | 2008-04-24 | 3M Innovative Properties Company | Method of molding ultraviolet cured microstructures and molds |
| EP2451847B1 (en) | 2009-07-06 | 2021-11-24 | IGM Group B.V. | Polymer-bound bisacylphosphine oxides |
| DE102012212429A1 (de) | 2012-07-16 | 2014-01-16 | Voco Gmbh | Dentalhandgerät, Verfahren und Verwendung desselben zum Aushärten lichthärtbaren Materials |
| GB201213163D0 (en) | 2012-07-24 | 2012-09-05 | Lambson Ltd | Photopolymerisation processes and novel compounds therefor |
| ES2720760T3 (es) * | 2012-10-01 | 2019-07-24 | Eth Zuerich | Un procedimiento para la preparación de acilofosfanos |
| JP6016768B2 (ja) * | 2013-02-21 | 2016-10-26 | 富士フイルム株式会社 | インク組成物、インクジェット記録方法、及び、高分子開始剤 |
| WO2015004566A2 (en) * | 2013-07-08 | 2015-01-15 | Basf Se | Liquid bisacylphosphine oxide photoinitiator |
| JP6563028B2 (ja) * | 2015-11-20 | 2019-08-21 | 富士フイルム株式会社 | 光重合開始剤及びその製造方法、重合性組成物、インクジェット記録方法、並びに、アシルホスフィンオキシド化合物 |
| JP6567161B2 (ja) * | 2016-02-25 | 2019-08-28 | 富士フイルム株式会社 | 水性硬化性組成物、及び、水溶性光重合開始剤 |
| EP4059719A4 (en) * | 2019-11-11 | 2022-12-14 | FUJIFILM Corporation | ACTIVE ENERGY RAYS CURING INK AND IMAGE RECORDING METHOD |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2245817A1 (de) * | 1972-09-19 | 1974-03-28 | Dynamit Nobel Ag | Neue halogenhaltige diphosphonsaeureester |
| DE2830928A1 (de) * | 1978-07-14 | 1980-01-31 | Basf Ag | Lichthaertbare form-, traenk- und ueberzugsmassen |
| DE2965566D1 (en) * | 1978-07-14 | 1983-07-07 | Basf Ag | Acylphosphinoxide compounds, their preparation and their use |
| DE2909994A1 (de) * | 1979-03-14 | 1980-10-02 | Basf Ag | Acylphosphinoxidverbindungen, ihre herstellung und verwendung |
| DE2830927A1 (de) * | 1978-07-14 | 1980-01-31 | Basf Ag | Acylphosphinoxidverbindungen und ihre verwendung |
| DE59010615D1 (de) | 1989-08-04 | 1997-02-06 | Ciba Geigy Ag | Mono- und Diacylphosphinoxide |
| US5218009A (en) * | 1989-08-04 | 1993-06-08 | Ciba-Geigy Corporation | Mono- and di-acylphosphine oxides |
| DE4240964A1 (de) * | 1992-12-05 | 1994-06-09 | Basf Ag | Arenbisphosphinoxide |
| TW303379B (pt) * | 1994-03-02 | 1997-04-21 | Ciba Sc Holding Ag | |
| US6174874B1 (en) * | 1998-09-21 | 2001-01-16 | Merck Frosst Canada & Co. | Phosphonic acids derivatives as inhibitors of protein tyrosine phosphate 1B (PTP-1B) |
| GB2360283B (en) * | 2000-02-08 | 2002-08-21 | Ciba Sc Holding Ag | Monoacylarylphosphines and acylphosphine oxides and sulphides |
| GB2365430B (en) | 2000-06-08 | 2002-08-28 | Ciba Sc Holding Ag | Acylphosphine photoinitiators and intermediates |
| KR20050044549A (ko) | 2001-11-20 | 2005-05-12 | 시바 스페셜티 케미칼스 홀딩 인크. | 아실포스핀 및 이의 유도체의 멀티머 형태 |
-
2003
- 2003-06-03 AT AT03740176T patent/ATE402183T1/de not_active IP Right Cessation
- 2003-06-03 JP JP2004511314A patent/JP2005529167A/ja active Pending
- 2003-06-03 WO PCT/EP2003/005801 patent/WO2003104245A1/en active IP Right Grant
- 2003-06-03 BR BR0312133-0A patent/BR0312133A/pt not_active Application Discontinuation
- 2003-06-03 AU AU2003274653A patent/AU2003274653A1/en not_active Abandoned
- 2003-06-03 MX MXPA04011923A patent/MXPA04011923A/es not_active Application Discontinuation
- 2003-06-03 CA CA002489246A patent/CA2489246A1/en not_active Abandoned
- 2003-06-03 EP EP03740176A patent/EP1511754B1/en not_active Expired - Lifetime
- 2003-06-03 DE DE60322388T patent/DE60322388D1/de not_active Expired - Lifetime
- 2003-06-03 US US10/517,231 patent/US7196228B2/en not_active Expired - Fee Related
- 2003-06-03 CN CNB038134772A patent/CN1324037C/zh not_active Expired - Fee Related
- 2003-06-03 KR KR10-2004-7020102A patent/KR20050009744A/ko not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| EP1511754B1 (en) | 2008-07-23 |
| AU2003274653A1 (en) | 2003-12-22 |
| JP2005529167A (ja) | 2005-09-29 |
| ATE402183T1 (de) | 2008-08-15 |
| MXPA04011923A (es) | 2005-03-31 |
| KR20050009744A (ko) | 2005-01-25 |
| US20050245768A1 (en) | 2005-11-03 |
| US7196228B2 (en) | 2007-03-27 |
| WO2003104245A1 (en) | 2003-12-18 |
| CA2489246A1 (en) | 2003-12-18 |
| CN1324037C (zh) | 2007-07-04 |
| EP1511754A1 (en) | 2005-03-09 |
| CN1659175A (zh) | 2005-08-24 |
| DE60322388D1 (de) | 2008-09-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B11A | Dismissal acc. art.33 of ipl - examination not requested within 36 months of filing | ||
| B11Y | Definitive dismissal - extension of time limit for request of examination expired [chapter 11.1.1 patent gazette] |