BR0213354A - Bases nitrogenadas fotoativáveis - Google Patents
Bases nitrogenadas fotoativáveisInfo
- Publication number
- BR0213354A BR0213354A BR0213354-7A BR0213354A BR0213354A BR 0213354 A BR0213354 A BR 0213354A BR 0213354 A BR0213354 A BR 0213354A BR 0213354 A BR0213354 A BR 0213354A
- Authority
- BR
- Brazil
- Prior art keywords
- base
- photoactivable
- nitrogenous bases
- benzylically
- polymerizable
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
- C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
- C07D487/04—Ortho-condensed systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Photoreceptors In Electrophotography (AREA)
- Paints Or Removers (AREA)
- Polymerisation Methods In General (AREA)
- Light Receiving Elements (AREA)
- Luminescent Compositions (AREA)
- Polyesters Or Polycarbonates (AREA)
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polyurethanes Or Polyureas (AREA)
- Epoxy Resins (AREA)
- Indole Compounds (AREA)
- Plural Heterocyclic Compounds (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Abstract
"BASES NITROGENADAS FOTOATIVáVEIS". A presente invenção refere-se a compostos de fórmula I (I) em que R~ 1~, é um radical aromático ou heteroaromático que é capaz de absorver luz na faixa de comprimentos de onda de 200 nm a 650 nm e é não-substituído ou é substituído uma ou mais vezes por C~ 1~,-C~ 18~alquila, C~ 2~-C~ 18~ alquenila, C~ 2~-C~ 18~alquinila, C~ 1~-C~ 18~haloalquila, NO~ 2~, NR~ 10~R~ 11~, CN, OR~ 12~, SR~ 12~, C(O)R~ 13~, C(O)OR~ 14~, halogênio ou um radical de fórmula II e que, quando da absorção, acarreta uma fotoeliminação que leva à geração de um grupo amidina, R~ 2~ e R~ 3~, independentemente um do outro, são hidrogênio, C~ 1~-C~ 18~alquila ou fenila que é não-substituída ou é substituída uma ou mais vezes por C~ 1-C~ 18~alquila, CN, OR~ 2~, SR~ 12~, halogênio ou C~ 1~-C~ 18~haloalquila; R~ 5~ é C~ 1~-C~ 18~alquila ou NR~ 8~R~ 9~; R~ 4~, R~ 6~, R~ 7~, R~ 8~, R~ 9~, R~ 10~ e R~ 11~, independentemente um do outro, são hidrogênio ou C~ 1~-C~ 18~alquila; ou R~ 4~ e R~ 6~ juntos formam uma ponte C~ 2~-C~ 12~alquileno que é não-substituído ou é substituído por um ou mais radicais C~ 1~-C~ 4~alquila; ou R~ 5~ e R~ 7~, independentemente de R~ 4~ e R~ 6~, juntos formam uma ponte C~ 2~ -C~ 12~alquileno que é não-substituído ou é substituído por um ou mais radicais C~ 1~-C~ 4~aLquila; ou se R~ 5~ por um radical NR~ 8~R~ 9~, R~ 7~ e R~ 9~ juntos formam uma ponte C~ 2~ -C~ 12~alquileno que é não-substituído ou é substituído por um ou mais radicais C~ 1~-C~ 4~alquila; e R~ 12~, R~ 13~ e R~ 14~, independentemente um do outro, são hidrogênio ou C~ 1~-C~ 18~ alquila; são adequados como fotoiniciadores para compostos que reagem sob catálise de uma base.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH19112001 | 2001-10-17 | ||
| PCT/EP2002/011238 WO2003033500A1 (en) | 2001-10-17 | 2002-10-08 | Photoactivable nitrogen bases |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BR0213354A true BR0213354A (pt) | 2004-10-26 |
Family
ID=4566758
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR0213354-7A BR0213354A (pt) | 2001-10-17 | 2002-10-08 | Bases nitrogenadas fotoativáveis |
Country Status (14)
| Country | Link |
|---|---|
| US (2) | US7538104B2 (pt) |
| EP (1) | EP1436297B1 (pt) |
| JP (1) | JP4454309B2 (pt) |
| KR (1) | KR100938769B1 (pt) |
| CN (1) | CN1571788B (pt) |
| AT (1) | ATE360629T1 (pt) |
| AU (1) | AU2002346968B2 (pt) |
| BR (1) | BR0213354A (pt) |
| CA (1) | CA2459374C (pt) |
| DE (1) | DE60219812T8 (pt) |
| MX (1) | MXPA04003564A (pt) |
| RU (1) | RU2332419C2 (pt) |
| WO (1) | WO2003033500A1 (pt) |
| ZA (1) | ZA200401523B (pt) |
Families Citing this family (47)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5283303B2 (ja) * | 2003-12-25 | 2013-09-04 | Ｄｉｃ株式会社 | 転写材用硬化性樹脂組成物、転写材および保護層の形成方法 |
| US20050234208A1 (en) | 2004-04-14 | 2005-10-20 | Matthias Koch | Fast curing polydiorganosiloxanes |
| US20070249484A1 (en) * | 2004-07-21 | 2007-10-25 | Johannes Benkhoff | Process for the Photoactivation and use of a Catalyst by an Inverted Two-Stage Procedure |
| ATE497502T1 (de) * | 2006-06-27 | 2011-02-15 | Basf Se | Zu langen wellenlängen verschobene benzotriazol- uv-absorber und deren verwendung |
| US20090298962A1 (en) * | 2006-09-29 | 2009-12-03 | Katia Studer | Photolatent bases for systems based on blocked isocyanates |
| EP2145231B1 (en) | 2007-04-03 | 2011-09-14 | Basf Se | Photoactivable nitrogen bases |
| JP4874854B2 (ja) * | 2007-04-10 | 2012-02-15 | 富士フイルム株式会社 | ホログラフィック記録用組成物およびホログラフィック記録媒体 |
| US20080308003A1 (en) * | 2007-06-13 | 2008-12-18 | Krol Andrew M | UV inkjet resist |
| KR101157720B1 (ko) * | 2007-06-14 | 2012-06-20 | 세키스이가가쿠 고교가부시키가이샤 | 광 경화형 점접착제 조성물 |
| JP2009126974A (ja) * | 2007-11-26 | 2009-06-11 | Three Bond Co Ltd | 樹脂組成物 |
| CN101925616A (zh) * | 2008-01-28 | 2010-12-22 | 巴斯夫欧洲公司 | 用于氧化还原固化可自由基固化的配制剂的光潜脒碱 |
| US8329771B2 (en) | 2008-03-31 | 2012-12-11 | San-Apro Limited | Photobase generator |
| DE102008043218A1 (de) | 2008-09-24 | 2010-04-01 | Evonik Goldschmidt Gmbh | Polymere Werkstoffe sowie daraus bestehende Kleber- und Beschichtungsmittel auf Basis multialkoxysilylfunktioneller Präpolymerer |
| DE102008049848A1 (de) | 2008-10-01 | 2010-04-08 | Tesa Se | Mehrbereichsindikator |
| JP5521999B2 (ja) * | 2009-11-26 | 2014-06-18 | 住友化学株式会社 | 化学増幅型フォトレジスト組成物及びレジストパターンの製造方法 |
| JP5925201B2 (ja) | 2010-06-30 | 2016-05-25 | スリーエム イノベイティブ プロパティズ カンパニー | 二重反応性シラン官能基を含むオンデマンド型硬化性組成物 |
| JP5818890B2 (ja) | 2010-06-30 | 2015-11-18 | スリーエム イノベイティブ プロパティズ カンパニー | 二重反応性シラン官能基を含む硬化性組成物 |
| CN102959024B (zh) | 2010-06-30 | 2016-08-24 | 3M创新有限公司 | 可固化聚硅氧烷涂层组合物 |
| KR101958343B1 (ko) | 2011-12-16 | 2019-03-15 | 쓰리본드 화인 케미칼 가부시키가이샤 | 경화성 수지조성물 |
| US9006357B2 (en) | 2011-12-29 | 2015-04-14 | 3M Innovative Properties Company | Curable polysiloxane composition |
| CN105164184A (zh) | 2011-12-29 | 2015-12-16 | 3M创新有限公司 | 可固化聚硅氧烷涂料组合物 |
| JP6223357B2 (ja) * | 2011-12-29 | 2017-11-01 | スリーエム イノベイティブ プロパティズ カンパニー | 硬化性ポリシロキサン組成物及びそれらから作製される感圧接着剤 |
| US9035008B2 (en) | 2011-12-29 | 2015-05-19 | 3M Innovative Properties Company | Curable-on-demand polysiloxane coating composition |
| US9018322B2 (en) | 2012-06-21 | 2015-04-28 | FRC-DeSoto International, Inc. | Controlled release amine-catalyzed, Michael addition-curable sulfur-containing polymer compositions |
| JP6183642B2 (ja) * | 2012-08-10 | 2017-08-23 | 株式会社リコー | 活性光線硬化組成物、並びにこれを用いた活性光線硬化型インクジェット印刷用インク組成物及び活性光線硬化型接着剤組成物 |
| US20160152783A1 (en) | 2013-07-18 | 2016-06-02 | Cemedine Co., Ltd. | Photocurable composition |
| WO2015088021A1 (ja) | 2013-12-13 | 2015-06-18 | セメダイン株式会社 | 接着性を有する光硬化性組成物 |
| DE102014202609B4 (de) * | 2014-02-13 | 2020-06-04 | tooz technologies GmbH | Aminkatalysierte Thiolhärtung von Epoxidharzen |
| US9328275B2 (en) | 2014-03-07 | 2016-05-03 | Prc Desoto International, Inc. | Phosphine-catalyzed, michael addition-curable sulfur-containing polymer compositions |
| US9328274B2 (en) | 2014-03-07 | 2016-05-03 | Prc-Desoto International, Inc. | Michael acceptor-terminated urethane-containing fuel resistant prepolymers and compositions thereof |
| WO2016066435A1 (de) * | 2014-10-29 | 2016-05-06 | Tesa Se | Klebemassen mit aktivierbaren gettermaterialien |
| CN105630255B (zh) * | 2014-10-31 | 2019-01-18 | 昆山瑞咏成精密设备有限公司 | 单片式ogs触摸屏及其制作方法 |
| AU2016256577B2 (en) | 2015-04-29 | 2019-04-04 | Bsn Medical Gmbh | Medical bathing device |
| BR112017023446A2 (pt) | 2015-04-29 | 2018-07-31 | 3M Innovative Properties Co | método para a fabricação de uma rede polimérica a partir de um politiol e um poliepóxido |
| JP6942058B2 (ja) | 2015-04-29 | 2021-09-29 | ビーエスエヌ メディカル ゲーエムベーハー | Ｎｏ生成のための多段階プロセス |
| JP2019534363A (ja) | 2016-11-03 | 2019-11-28 | スリーエム イノベイティブ プロパティズ カンパニー | シーラントを航空機用部品に適用する方法 |
| CA3042861A1 (en) | 2016-11-03 | 2018-05-11 | 3M Innovative Properties Company | Compositions including a photolatent amine, camphorquinone, and a coumarin and related methods |
| CA3042860A1 (en) | 2016-11-03 | 2018-05-11 | 3M Innovative Properties Company | Polythiol sealant compositions |
| WO2018106531A1 (en) | 2016-12-05 | 2018-06-14 | Arkema Inc. | Initiator blends and photocurable compositions containing such initiator blends useful for 3d printing |
| EP3746494B1 (de) * | 2018-02-02 | 2024-05-29 | Basf Se | Polyurethane mit geringen emissionen organischer verbindungen |
| JP2021529840A (ja) * | 2018-04-26 | 2021-11-04 | ヘンケル・アクチェンゲゼルシャフト・ウント・コムパニー・コマンディットゲゼルシャフト・アウフ・アクチェンＨｅｎｋｅｌ ＡＧ ＆ Ｃｏ． ＫＧａＡ | 硬化性組成物における潜在性触媒として使用するための第四級窒素化合物。 |
| CN110643286B (zh) | 2018-06-27 | 2021-11-19 | 3M创新有限公司 | Uv固化组合物及包含该组合物的胶膜、胶带和粘结构件 |
| US20210371667A1 (en) | 2018-09-27 | 2021-12-02 | 3M Innovative Properties Company | Composition including amino-functional silanes and method of applying a sealant to a substrate |
| WO2020202076A1 (en) | 2019-04-04 | 2020-10-08 | 3M Innovative Properties Company | Method of irradiating a composition through a substrate |
| CN113150714B (zh) | 2020-01-07 | 2023-03-10 | 3M创新有限公司 | 聚氨酯基可uv固化组合物及包含其的胶膜、胶带和粘结构件 |
| EP3848179A1 (de) | 2020-01-10 | 2021-07-14 | Carl Zeiss Vision International GmbH | Inkjet-verfahren zur herstellung eines brillenglases |
| CN111795960B (zh) * | 2020-08-10 | 2022-08-09 | 齐齐哈尔大学 | 一种光谱法和比色法检测不同形式碘的分子平台及其制备方法和应用 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0448154A1 (en) | 1990-03-20 | 1991-09-25 | Akzo Nobel N.V. | Coating composition including a blocked basic catalyst |
| JP2654339B2 (ja) | 1992-11-24 | 1997-09-17 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 感光性レジスト組成物及び基板上にレジスト像を形成する方法 |
| WO1994028075A1 (en) | 1993-05-26 | 1994-12-08 | Akzo Nobel N.V. | Coating composition including a uv-deblockable basic catalyst |
| JP3206310B2 (ja) * | 1994-07-01 | 2001-09-10 | ダイキン工業株式会社 | 表面改質されたフッ素樹脂成形品 |
| US5998496A (en) | 1995-10-31 | 1999-12-07 | Spectra Group Limited, Inc. | Photosensitive intramolecular electron transfer compounds |
| BR9707687A (pt) | 1996-02-22 | 1999-07-27 | Dsm Nv | Fotocatalisador aniônico |
| KR100505529B1 (ko) * | 1997-01-22 | 2005-08-04 | 시바 스페셜티 케미칼스 홀딩 인크. | α-아미노 케톤을 기본으로 하는 광 활성화 질소 함유 염기 |
| KR100542419B1 (ko) | 1997-02-26 | 2006-01-11 | 시바 스페셜티 케미칼스 홀딩 인크. | α-암모늄 케톤, 이미늄 케톤 또는 아미디늄 케톤 및 아릴 보레이트계의 광활성화 가능한 질소 함유 염기, 이의 제조방법 및 이를 포함하는 조성물 |
| JPH10306141A (ja) | 1997-03-06 | 1998-11-17 | Toray Ind Inc | 半導体装置およびエポキシ樹脂組成物 |
| AU720834B2 (en) * | 1997-03-18 | 2000-06-15 | Ciba Specialty Chemicals Holding Inc. | Photoactivatable nitrogen-containing bases based on alpha-amino alkenes |
| EP0898202B1 (en) | 1997-08-22 | 2000-07-19 | Ciba SC Holding AG | Photogeneration of amines from alpha-aminoacetophenones |
| AU5620499A (en) | 1998-08-21 | 2000-03-14 | Ciba Specialty Chemicals Holding Inc. | Photoactivatable bases containing nitrogen |
| ES2277924T3 (es) | 2000-05-26 | 2007-08-01 | Akzo Nobel Coatings International B.V. | Composicion de revestimiento fotoactivable. |
-
2002
- 2002-10-08 KR KR1020047005628A patent/KR100938769B1/ko active IP Right Grant
- 2002-10-08 AU AU2002346968A patent/AU2002346968B2/en not_active Ceased
- 2002-10-08 DE DE60219812T patent/DE60219812T8/de active Active
- 2002-10-08 BR BR0213354-7A patent/BR0213354A/pt not_active Application Discontinuation
- 2002-10-08 RU RU2004115329/04A patent/RU2332419C2/ru not_active IP Right Cessation
- 2002-10-08 JP JP2003536239A patent/JP4454309B2/ja not_active Expired - Fee Related
- 2002-10-08 AT AT02782851T patent/ATE360629T1/de not_active IP Right Cessation
- 2002-10-08 CN CN028206002A patent/CN1571788B/zh not_active Expired - Lifetime
- 2002-10-08 MX MXPA04003564A patent/MXPA04003564A/es active IP Right Grant
- 2002-10-08 US US10/491,813 patent/US7538104B2/en not_active Expired - Lifetime
- 2002-10-08 EP EP02782851A patent/EP1436297B1/en not_active Expired - Lifetime
- 2002-10-08 CA CA2459374A patent/CA2459374C/en not_active Expired - Fee Related
- 2002-10-08 WO PCT/EP2002/011238 patent/WO2003033500A1/en active IP Right Grant
-
2004
- 2004-02-25 ZA ZA200401523A patent/ZA200401523B/en unknown
-
2008
- 2008-11-12 US US12/291,604 patent/US8252784B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| US8252784B2 (en) | 2012-08-28 |
| KR100938769B1 (ko) | 2010-01-27 |
| ZA200401523B (en) | 2004-12-14 |
| EP1436297B1 (en) | 2007-04-25 |
| CA2459374C (en) | 2011-02-08 |
| US7538104B2 (en) | 2009-05-26 |
| ATE360629T1 (de) | 2007-05-15 |
| EP1436297A1 (en) | 2004-07-14 |
| JP2005511536A (ja) | 2005-04-28 |
| CN1571788A (zh) | 2005-01-26 |
| DE60219812D1 (de) | 2007-06-06 |
| CN1571788B (zh) | 2012-08-01 |
| US20040242867A1 (en) | 2004-12-02 |
| WO2003033500B1 (en) | 2003-12-11 |
| MXPA04003564A (es) | 2004-07-23 |
| RU2004115329A (ru) | 2005-10-27 |
| JP4454309B2 (ja) | 2010-04-21 |
| WO2003033500A1 (en) | 2003-04-24 |
| US20090076200A1 (en) | 2009-03-19 |
| DE60219812T2 (de) | 2008-01-24 |
| DE60219812T8 (de) | 2008-05-21 |
| AU2002346968B2 (en) | 2008-04-10 |
| CA2459374A1 (en) | 2003-04-24 |
| KR20050034614A (ko) | 2005-04-14 |
| RU2332419C2 (ru) | 2008-08-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| BR0213354A (pt) | Bases nitrogenadas fotoativáveis | |
| BR0313330A (pt) | Piperidina-ftalazonas substituìdas com pirrolidinadiona como inibidores de pde4 | |
| EA200500017A1 (ru) | Новые соединения | |
| EA200500721A1 (ru) | Пиримидины, ингибирующие chk, pdk и акт, их получение и применение в качестве лекарственных средств | |
| ATE423557T1 (de) | Carbocyclische kaliumkanalhemmer | |
| BR0213140A (pt) | Fungicidas de pirazol-pirimidina | |
| BRPI0414598A (pt) | indóis substituìdos | |
| BRPI0411897A (pt) | pirroldihidroisoquinolinas como inibidores de pde10 | |
| DK1109812T3 (da) | Pyrrolobenzodiazepiner | |
| GB0130341D0 (en) | Compounds | |
| BRPI0414593A (pt) | derivados de ácido sulfonamida substituìda-indol-2-carboxìlico como inibidores de pai-1 | |
| BR0215622A (pt) | Inibidores da dpiv com base em glutaminila | |
| EA200100773A1 (ru) | Замещенные 1-гетероциклические диариламины | |
| EA200601007A1 (ru) | 7-фенилалкилзамещённые 2-хинолиноны и 2-хиноксалиноны в качестве ингибиторов поли(адф-рибоза)полимеразы | |
| ECSP045255A (es) | Cumarinas utiles como biomarcadores | |
| DK1501507T3 (da) | Tetrahydropyranyl-cyclopentyl-tertrahydropyridopyrindin-modulatorer af kemokin-receptor-aktivitet | |
| EA200301142A1 (ru) | Производные гетероциклилокси-, -тиокси- и -аминобензазола в качестве лигандов 5-гидрокситриптамина-6 | |
| PT1086096E (pt) | Benzamidas com substituintes etra-hidrofuraniloxi como inibidores da fosfodiesterase 4 | |
| BR0317284A (pt) | Inibidores aminocianopiridina de proteìna quinase-2 ativada com proteìna quinase ativada com mitógeno | |
| DK1419163T3 (da) | Tricykliske imidazopyridiner | |
| ATE549024T1 (de) | Chinazolin-kaliumkanalhemmer | |
| BR0312863A (pt) | Derivados de aldeìdo de polietileno glicol | |
| ATE282605T1 (de) | 2-thio-subsituierte imidazolderivative und ihre verwendung in der pharmazie | |
| BR0007922A (pt) | Compostos calcilìticos | |
| BRPI0415285A (pt) | derivados de aminoalcanol |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B06F | Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette] | ||
| B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
| B11B | Dismissal acc. art. 36, par 1 of ipl - no reply within 90 days to fullfil the necessary requirements |