AU3193900A - Exposure system and aberration measurement method for its projection optical system, and production method for device - Google Patents

Exposure system and aberration measurement method for its projection optical system, and production method for device

Info

Publication number
AU3193900A
AU3193900A AU31939/00A AU3193900A AU3193900A AU 3193900 A AU3193900 A AU 3193900A AU 31939/00 A AU31939/00 A AU 31939/00A AU 3193900 A AU3193900 A AU 3193900A AU 3193900 A AU3193900 A AU 3193900A
Authority
AU
Australia
Prior art keywords
projection optical
aberration measurement
optical system
production method
measurement method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU31939/00A
Other languages
English (en)
Inventor
Jun Ishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU3193900A publication Critical patent/AU3193900A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU31939/00A 1999-03-18 2000-03-17 Exposure system and aberration measurement method for its projection optical system, and production method for device Abandoned AU3193900A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP11/73657 1999-03-18
JP7365799 1999-03-18
PCT/JP2000/001643 WO2000055890A1 (fr) 1999-03-18 2000-03-17 Systeme d'exposition et procede de mesure d'aberration pour son systeme optique de projection, et procede de production pour ce dispositif

Publications (1)

Publication Number Publication Date
AU3193900A true AU3193900A (en) 2000-10-04

Family

ID=13524581

Family Applications (1)

Application Number Title Priority Date Filing Date
AU31939/00A Abandoned AU3193900A (en) 1999-03-18 2000-03-17 Exposure system and aberration measurement method for its projection optical system, and production method for device

Country Status (2)

Country Link
AU (1) AU3193900A (fr)
WO (1) WO2000055890A1 (fr)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002029495A1 (fr) * 2000-10-05 2002-04-11 Asml Us, Inc. Capteur montable et amovible
KR100893516B1 (ko) 2000-12-28 2009-04-16 가부시키가이샤 니콘 결상특성 계측방법, 결상특성 조정방법, 노광방법 및노광장치, 프로그램 및 기록매체, 그리고 디바이스 제조방법
CN1491427A (zh) * 2001-02-06 2004-04-21 ������������ʽ���� 曝光装置、曝光法和器件制造法
TWI221000B (en) 2001-02-13 2004-09-11 Nikon Corp Manufacturing method of exposure apparatus, adjustment method of exposure apparatus, and exposure method
DE10120446C2 (de) 2001-04-26 2003-04-17 Zeiss Carl Projektionsbelichtungsanlage sowie Verfahren zur Kompensation von Abbildungsfehlern in einer Projektionsbelichtungsanlage, insbesondere für die Mikro-Lithographie
JP2003045794A (ja) * 2001-05-10 2003-02-14 Nikon Corp 光学特性計測方法、投影光学系の調整方法、露光方法、及び露光装置の製造方法、並びにマスク検査方法
JP4661015B2 (ja) * 2001-09-26 2011-03-30 株式会社ニコン 波面収差測定装置及び波面収差測定方法、並びに、露光装置及びデバイスの製造方法
KR100927560B1 (ko) * 2002-01-29 2009-11-23 가부시키가이샤 니콘 이미지 형성 상태 조정 시스템, 노광 방법 및 노광 장치, 그리고 프로그램 및 정보 기록 매체
JP2003257812A (ja) 2002-02-27 2003-09-12 Nikon Corp 結像光学系の評価方法、結像光学系の調整方法、露光装置および露光方法
JP4352458B2 (ja) 2002-03-01 2009-10-28 株式会社ニコン 投影光学系の調整方法、予測方法、評価方法、調整方法、露光方法及び露光装置、露光装置の製造方法、プログラム並びにデバイス製造方法
JP4327412B2 (ja) * 2002-06-06 2009-09-09 株式会社日立製作所 波面収差測定装置及び露光装置
WO2018037448A1 (fr) 2016-08-22 2018-03-01 三菱電機株式会社 Dispositif de mesure de front d'onde et dispositif d'assemblage de système optique
JP7123403B2 (ja) * 2019-04-04 2022-08-23 株式会社Ｑｄレーザ 画像検査装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5424552A (en) * 1991-07-09 1995-06-13 Nikon Corporation Projection exposing apparatus
JP3634550B2 (ja) * 1997-04-03 2005-03-30 株式会社ルネサステクノロジ 投影レンズの収差測定方法
JPH10281934A (ja) * 1997-04-07 1998-10-23 Nikon Corp 投影光学系の結像特性計測方法、及び該方法を使用する投影露光装置

Also Published As

Publication number Publication date
WO2000055890A1 (fr) 2000-09-21

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase