AU2003211556A1 - Exposure equipment and device manufacturing method - Google Patents

Exposure equipment and device manufacturing method

Info

Publication number
AU2003211556A1
AU2003211556A1 AU2003211556A AU2003211556A AU2003211556A1 AU 2003211556 A1 AU2003211556 A1 AU 2003211556A1 AU 2003211556 A AU2003211556 A AU 2003211556A AU 2003211556 A AU2003211556 A AU 2003211556A AU 2003211556 A1 AU2003211556 A1 AU 2003211556A1
Authority
AU
Australia
Prior art keywords
device manufacturing
exposure equipment
exposure
equipment
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003211556A
Inventor
Naomasa Shiraishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2003211556A1 publication Critical patent/AU2003211556A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70716Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU2003211556A 2002-03-01 2003-02-28 Exposure equipment and device manufacturing method Abandoned AU2003211556A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2002055380 2002-03-01
JP2002-55380 2002-03-01
JP2002/220103 2002-07-29
JP2002220103 2002-07-29
PCT/JP2003/002374 WO2003075327A1 (en) 2002-03-01 2003-02-28 Exposure equipment and device manufacturing method

Publications (1)

Publication Number Publication Date
AU2003211556A1 true AU2003211556A1 (en) 2003-09-16

Family

ID=27790931

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003211556A Abandoned AU2003211556A1 (en) 2002-03-01 2003-02-28 Exposure equipment and device manufacturing method

Country Status (4)

Country Link
JP (1) JPWO2003075327A1 (en)
AU (1) AU2003211556A1 (en)
TW (1) TW200305065A (en)
WO (1) WO2003075327A1 (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001118783A (en) * 1999-10-21 2001-04-27 Nikon Corp Exposure method and device, and device manufacturing method
JP2001319873A (en) * 2000-02-28 2001-11-16 Nikon Corp Projection aligner, its manufacturing method, and adjusting method
JP2001272488A (en) * 2000-03-27 2001-10-05 Toshiba Corp Stage device
EP1172698B1 (en) * 2000-07-14 2006-02-08 ASML Netherlands B.V. Lithographic projection apparatus, device manufacturing method, device manufactured thereby and gas composition

Also Published As

Publication number Publication date
WO2003075327A1 (en) 2003-09-12
TW200305065A (en) 2003-10-16
JPWO2003075327A1 (en) 2005-06-30

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase