AU2002366929A1 - Gas purging method and exposure system, and device production method - Google Patents

Gas purging method and exposure system, and device production method

Info

Publication number
AU2002366929A1
AU2002366929A1 AU2002366929A AU2002366929A AU2002366929A1 AU 2002366929 A1 AU2002366929 A1 AU 2002366929A1 AU 2002366929 A AU2002366929 A AU 2002366929A AU 2002366929 A AU2002366929 A AU 2002366929A AU 2002366929 A1 AU2002366929 A1 AU 2002366929A1
Authority
AU
Australia
Prior art keywords
exposure system
device production
gas purging
production method
purging method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002366929A
Inventor
Naomasa Shiraishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2002366929A1 publication Critical patent/AU2002366929A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AU2002366929A 2001-12-21 2002-12-24 Gas purging method and exposure system, and device production method Abandoned AU2002366929A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2001390668 2001-12-21
JP2001-390668 2001-12-21
PCT/JP2002/013425 WO2003054936A1 (en) 2001-12-21 2002-12-24 Gas purging method and exposure system, and device production method

Publications (1)

Publication Number Publication Date
AU2002366929A1 true AU2002366929A1 (en) 2003-07-09

Family

ID=19188433

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002366929A Abandoned AU2002366929A1 (en) 2001-12-21 2002-12-24 Gas purging method and exposure system, and device production method

Country Status (4)

Country Link
JP (1) JPWO2003054936A1 (en)
AU (1) AU2002366929A1 (en)
TW (1) TWI222668B (en)
WO (1) WO2003054936A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8057929B2 (en) * 2003-10-20 2011-11-15 GM Global Technology Operations LLC Regenerative compressor motor control for a fuel cell power system
US7057702B2 (en) * 2004-06-23 2006-06-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2011258999A (en) * 2005-01-31 2011-12-22 Nikon Corp Exposure device and device manufacturing method
TWI417980B (en) * 2009-02-04 2013-12-01 Hoya Corp Stage cleaner, writing apparatus and substrate processing apparatus
JP5667568B2 (en) 2009-08-07 2015-02-12 株式会社ニコン MOBILE DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
CN108398858B (en) * 2018-03-20 2019-05-10 李笛 A kind of gas isolator and partition method

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60133728A (en) * 1983-12-21 1985-07-16 Seiko Epson Corp Far ultraviolet ray projecting exposure device
AU4653999A (en) * 1999-07-16 2001-02-05 Nikon Corporation Exposure method and system
JP2001068400A (en) * 1999-08-27 2001-03-16 Nikon Corp Light absorbing substance detecting method, and exposure method and apparatus
EP1098225A3 (en) * 1999-11-05 2002-04-10 Asm Lithography B.V. Lithographic projection apparatus with purge gas system and method using the same
JP2002151400A (en) * 2000-11-15 2002-05-24 Canon Inc Aligner, method for maintaining the same and method for manufacturing semiconductor device using the aligner and semiconductor manufacturing factory
JP2002373853A (en) * 2001-06-15 2002-12-26 Canon Inc Aligner

Also Published As

Publication number Publication date
TWI222668B (en) 2004-10-21
TW200307979A (en) 2003-12-16
WO2003054936A1 (en) 2003-07-03
JPWO2003054936A1 (en) 2005-04-28

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase