AU2002212616A1 - Atmospheric plasma method for treating sheet electricity conducting materials and device therefor - Google Patents
Atmospheric plasma method for treating sheet electricity conducting materials and device thereforInfo
- Publication number
- AU2002212616A1 AU2002212616A1 AU2002212616A AU1261602A AU2002212616A1 AU 2002212616 A1 AU2002212616 A1 AU 2002212616A1 AU 2002212616 A AU2002212616 A AU 2002212616A AU 1261602 A AU1261602 A AU 1261602A AU 2002212616 A1 AU2002212616 A1 AU 2002212616A1
- Authority
- AU
- Australia
- Prior art keywords
- treated
- jet
- jets
- plasma
- cathodic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/44—Plasma torches using an arc using more than one torch
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Inorganic Chemistry (AREA)
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Treatment Of Fiber Materials (AREA)
- Chemical Vapour Deposition (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Discharge Heating (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
The electric current for the generation of the cathodic and anodic plasma jets (15) is divided into three parts, one passing through the object (2) being treated and the two others supplying the jets. The cathodic jet is at an acute angle( 25 to 60 degrees) to the treated surface and the anodic jet is at an angle about 90 degrees to the surface. A series of alternate cathode and anode jets are used in a direction transversal to the direction of displacement of the abject being treated. The electrical supply feeding the jets forms a loop circuit which is closed by a part of the object being treated. The circuit includes means for varying the electric current passing through the treated object. The plasma jet generator includes an electrode, a stabilizer channel, a pipe forming the jet, and supply system for introduction and control of gas flow for protection of the electrode and gas flow to the jet. Up stream of the plasma treatment zone an air current stabilizer, which includes a cooling system is used. Aero-dynamic bearings are fitted in front and behind the plasma generators.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP00811065 | 2000-11-10 | ||
EP00811065 | 2000-11-10 | ||
PCT/IB2001/002121 WO2002039791A1 (en) | 2000-11-10 | 2001-11-12 | Atmospheric plasma method for treating sheet electricity conducting materials and device therefor |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2002212616A1 true AU2002212616A1 (en) | 2002-05-21 |
Family
ID=8175021
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2002212616A Abandoned AU2002212616A1 (en) | 2000-11-10 | 2001-11-12 | Atmospheric plasma method for treating sheet electricity conducting materials and device therefor |
Country Status (12)
Country | Link |
---|---|
US (1) | US6949716B2 (en) |
EP (2) | EP1613133B1 (en) |
JP (1) | JP2004514054A (en) |
CN (1) | CN1265684C (en) |
AT (1) | ATE315326T1 (en) |
AU (1) | AU2002212616A1 (en) |
BR (1) | BR0115035A (en) |
CA (1) | CA2424891A1 (en) |
DE (1) | DE60116522T2 (en) |
EA (1) | EA004439B1 (en) |
UA (1) | UA75613C2 (en) |
WO (1) | WO2002039791A1 (en) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10157191A1 (en) * | 2001-11-23 | 2003-06-05 | Fritzmeier Georg Gmbh & Co | Microbiological energy source for driving a consumer |
KR100464856B1 (en) * | 2002-11-07 | 2005-01-05 | 삼성전자주식회사 | Method for etching a surface of workpiece and a backside of silicon substrate |
FR2856079B1 (en) * | 2003-06-11 | 2006-07-14 | Pechiney Rhenalu | SURFACE TREATMENT METHOD FOR ALUMINUM ALLOY TILES AND BANDS |
SG114754A1 (en) * | 2004-02-25 | 2005-09-28 | Kulicke & Soffa Investments | Laser cleaning system for a wire bonding machine |
JP2005285520A (en) * | 2004-03-29 | 2005-10-13 | Hiroshi Takigawa | Electrode for plasma generation, plasma generator, and plasma treatment device |
JP4658506B2 (en) * | 2004-03-31 | 2011-03-23 | 浩史 滝川 | Power supply circuit for generating pulsed arc plasma and pulsed arc plasma processing apparatus |
JP2005293945A (en) * | 2004-03-31 | 2005-10-20 | Tama Tlo Kk | Plasma heating device, and electrode with nozzle |
DE102004033728B4 (en) * | 2004-07-13 | 2009-07-23 | Plasmatreat Gmbh | Method for processing and bonding workpieces made of a metal or a metal alloy with a hydrated oxide and / or hydroxide layer |
PL1778393T3 (en) | 2004-08-13 | 2020-11-16 | Sanovo Biosecurity A/S | Method for enhancing a process involving a solid object and a gas |
AT9951U1 (en) * | 2004-11-19 | 2008-06-15 | Vetrotech Saint Gobain Int Ag | METHOD AND DEVICE FOR STRIP AND LAYER-MACHINING OF SURFACES OF GLASS PANES |
DE102005012296A1 (en) * | 2005-03-17 | 2006-09-21 | Sms Demag Ag | Method and device for descaling a metal strip |
US20060219754A1 (en) * | 2005-03-31 | 2006-10-05 | Horst Clauberg | Bonding wire cleaning unit and method of wire bonding using same |
SK51082006A3 (en) * | 2006-12-05 | 2008-07-07 | Fakulta Matematiky, Fyziky A Informatiky Univerzitfakulta Matematiky, Fyziky A Informatiky Univerzity Komensk�Hoy Komensk�Ho | Apparatus and treatment method of surface of metals and metalloids, oxides of metals and oxides of metalloids and nitrides of metalloids |
DK2153704T3 (en) * | 2007-05-11 | 2018-04-23 | Force Tech | AMPLIFICATION OF PLASMA SURFACE MODIFICATION BY USING HIGH-INTENSITY AND HIGH-EFFECT ULTRA WAVES |
MX2011010862A (en) * | 2009-04-14 | 2011-12-16 | Dawonsys Co Ltd | Surface treatment apparatus and method using plasma. |
DE102012104224A1 (en) * | 2012-05-15 | 2013-11-21 | Plasmatreat Gmbh | Device for e.g. cleaning high-speed wire, has dielectric small tube portion surrounding channel and arranged in plasma nozzle such that channel is partially electrically insulated against discharge space that is formed within plasma nozzle |
JP6482014B2 (en) * | 2014-07-30 | 2019-03-13 | 株式会社イーツーラボ | Plasma surface treatment apparatus and plasma surface treatment system |
NL2014022B1 (en) * | 2014-12-19 | 2016-10-12 | Ihc Holland Ie Bv | Device and method for crushing rock by means of pulsed electric energy. |
JP6224139B2 (en) * | 2016-01-22 | 2017-11-01 | 沖野 晃俊 | Plasma processing equipment |
DE102020114016A1 (en) | 2020-05-26 | 2021-12-02 | Einhell Germany Ag | Plasma treatment of a carrier film for an electrode of a lithium-ion battery |
KR102451424B1 (en) * | 2020-07-14 | 2022-10-05 | 이창훈 | System and method for cleaning surface of substrate using roll-to-roll plasma generating device |
DE102021118156A1 (en) | 2021-07-14 | 2023-01-19 | Rolls-Royce Deutschland Ltd & Co Kg | Method for surface treatment of a wire, a superconducting device, an electric machine, an aircraft and a surface treatment device |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3050616A (en) * | 1957-09-09 | 1962-08-21 | Union Carbide Corp | Arc process and apparatus |
FR2039566A5 (en) * | 1969-03-31 | 1971-01-15 | Soudure Autogene Elect | |
US3940641A (en) * | 1974-04-05 | 1976-02-24 | Reynolds Metals Company | Plasma jet electrode for magnetohydrodynamic generators |
GB1493394A (en) | 1974-06-07 | 1977-11-30 | Nat Res Dev | Plasma heater assembly |
US5548611A (en) * | 1993-05-19 | 1996-08-20 | Schuller International, Inc. | Method for the melting, combustion or incineration of materials and apparatus therefor |
JP3204801B2 (en) * | 1993-06-18 | 2001-09-04 | 富士写真フイルム株式会社 | Vacuum glow discharge processing apparatus and processing method |
US6278241B1 (en) * | 1995-11-13 | 2001-08-21 | Tepla Ag | Four-nozzle plasma generator for forming an activated jet |
JP2000500273A (en) | 1995-11-13 | 2000-01-11 | イエステ インスタント サーフェイス テクノロジー ソシエテ アノニム | Plasma arc stream generator with closed configuration |
WO1997018694A1 (en) * | 1995-11-13 | 1997-05-22 | Ist Instant Surface Technology S.A. | Plasma jet reactor |
JPH11106947A (en) * | 1997-09-29 | 1999-04-20 | Nkk Corp | Surface modifying method of metallic sheet |
JPH11222530A (en) * | 1998-02-06 | 1999-08-17 | Nitto Denko Corp | Production of fluororesin-coated metallic wire |
-
2001
- 2001-11-12 EP EP05021750A patent/EP1613133B1/en not_active Expired - Lifetime
- 2001-11-12 EP EP01980831A patent/EP1332650B1/en not_active Expired - Lifetime
- 2001-11-12 AT AT01980831T patent/ATE315326T1/en not_active IP Right Cessation
- 2001-11-12 JP JP2002542180A patent/JP2004514054A/en active Pending
- 2001-11-12 AU AU2002212616A patent/AU2002212616A1/en not_active Abandoned
- 2001-11-12 CA CA002424891A patent/CA2424891A1/en not_active Abandoned
- 2001-11-12 WO PCT/IB2001/002121 patent/WO2002039791A1/en active IP Right Grant
- 2001-11-12 CN CNB018182291A patent/CN1265684C/en not_active Expired - Fee Related
- 2001-11-12 US US10/399,414 patent/US6949716B2/en not_active Expired - Fee Related
- 2001-11-12 DE DE60116522T patent/DE60116522T2/en not_active Expired - Lifetime
- 2001-11-12 BR BR0115035-9A patent/BR0115035A/en not_active IP Right Cessation
- 2001-11-12 EA EA200300416A patent/EA004439B1/en not_active IP Right Cessation
- 2001-12-11 UA UA2003054134A patent/UA75613C2/en unknown
Also Published As
Publication number | Publication date |
---|---|
US20040026385A1 (en) | 2004-02-12 |
US6949716B2 (en) | 2005-09-27 |
EP1332650A1 (en) | 2003-08-06 |
DE60116522T2 (en) | 2006-08-03 |
DE60116522D1 (en) | 2006-03-30 |
EP1613133B1 (en) | 2013-01-16 |
CN1471800A (en) | 2004-01-28 |
EP1613133A3 (en) | 2011-04-27 |
CN1265684C (en) | 2006-07-19 |
ATE315326T1 (en) | 2006-02-15 |
JP2004514054A (en) | 2004-05-13 |
UA75613C2 (en) | 2006-05-15 |
EA200300416A1 (en) | 2003-10-30 |
BR0115035A (en) | 2004-02-03 |
WO2002039791A1 (en) | 2002-05-16 |
EA004439B1 (en) | 2004-04-29 |
EP1332650B1 (en) | 2006-01-04 |
EP1613133A2 (en) | 2006-01-04 |
CA2424891A1 (en) | 2002-05-16 |
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