ATE382581T1 - Metallurgisches silizium mittlererer reinheit und verfahren zu seiner herstellung - Google Patents
Metallurgisches silizium mittlererer reinheit und verfahren zu seiner herstellungInfo
- Publication number
- ATE382581T1 ATE382581T1 AT02767591T AT02767591T ATE382581T1 AT E382581 T1 ATE382581 T1 AT E382581T1 AT 02767591 T AT02767591 T AT 02767591T AT 02767591 T AT02767591 T AT 02767591T AT E382581 T1 ATE382581 T1 AT E382581T1
- Authority
- AT
- Austria
- Prior art keywords
- refining
- production
- silicon
- metallurgical silicon
- plasma
- Prior art date
Links
- 229910052710 silicon Inorganic materials 0.000 title abstract 4
- 239000010703 silicon Substances 0.000 title abstract 4
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 3
- 238000007670 refining Methods 0.000 abstract 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 abstract 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- 239000000460 chlorine Substances 0.000 abstract 1
- 229910052801 chlorine Inorganic materials 0.000 abstract 1
- 238000004320 controlled atmosphere Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 abstract 1
- 229910052742 iron Inorganic materials 0.000 abstract 1
- 238000002844 melting Methods 0.000 abstract 1
- 230000007935 neutral effect Effects 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 238000007711 solidification Methods 0.000 abstract 1
- 230000008023 solidification Effects 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/037—Purification
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Treatment Of Steel In Its Molten State (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0109788A FR2827592B1 (fr) | 2001-07-23 | 2001-07-23 | Silicium metallurgique de haute purete et procede d'elaboration |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE382581T1 true ATE382581T1 (de) | 2008-01-15 |
Family
ID=8865792
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT02767590T ATE491668T1 (de) | 2001-07-23 | 2002-07-22 | Metallurgisches silizium hoher reinheit und verfahren zu seiner herstellung |
AT02767591T ATE382581T1 (de) | 2001-07-23 | 2002-07-22 | Metallurgisches silizium mittlererer reinheit und verfahren zu seiner herstellung |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT02767590T ATE491668T1 (de) | 2001-07-23 | 2002-07-22 | Metallurgisches silizium hoher reinheit und verfahren zu seiner herstellung |
Country Status (12)
Country | Link |
---|---|
US (2) | US7858063B2 (de) |
EP (2) | EP1409406B1 (de) |
JP (2) | JP4410847B2 (de) |
CN (2) | CN1295147C (de) |
AT (2) | ATE491668T1 (de) |
BR (2) | BR0211193B1 (de) |
DE (2) | DE60238615D1 (de) |
ES (2) | ES2357501T3 (de) |
FR (1) | FR2827592B1 (de) |
NO (2) | NO335985B1 (de) |
WO (2) | WO2003010090A1 (de) |
ZA (2) | ZA200400276B (de) |
Families Citing this family (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NO333319B1 (no) * | 2003-12-29 | 2013-05-06 | Elkem As | Silisiummateriale for fremstilling av solceller |
FR2869028B1 (fr) * | 2004-04-20 | 2006-07-07 | Efd Induction Sa Sa | Procede et installation de fabrication de blocs d'un materiau semiconducteur |
JP4749730B2 (ja) * | 2005-02-09 | 2011-08-17 | 新日鉄マテリアルズ株式会社 | Siの精錬方法 |
CA2646180A1 (en) * | 2006-03-15 | 2007-09-20 | Reaction Sciences, Inc. | Method for making silicon for solar cells and other applications |
KR101061530B1 (ko) * | 2006-04-04 | 2011-09-01 | 6엔 실리콘 아이엔씨. | 실리콘의 정제 방법 |
US7682585B2 (en) * | 2006-04-25 | 2010-03-23 | The Arizona Board Of Regents On Behalf Of The University Of Arizona | Silicon refining process |
DE102006034061A1 (de) * | 2006-07-20 | 2008-01-24 | REV Renewable Energy Ventures, Inc., Aloha | Polysilanverarbeitung und Verwendung |
WO2008026728A1 (fr) * | 2006-08-31 | 2008-03-06 | Mitsubishi Materials Corporation | Silicium métallique et son procédé de fabrication |
BRPI0716934A2 (pt) * | 2006-09-14 | 2013-09-17 | Silicium Becancour Inc | processo e aparelho para a purificaÇço de material de sÍlica de baixa qualidade |
CA2667999A1 (en) | 2006-09-29 | 2008-03-27 | Shin-Etsu Chemical Co., Ltd. | Method for purification of silicon, silicon, and solar cell |
FR2908125B1 (fr) | 2006-11-02 | 2009-11-20 | Commissariat Energie Atomique | Procede de purification de silicium metallurgique par solidification dirigee |
CN100460320C (zh) * | 2007-03-08 | 2009-02-11 | 陈应天 | 使用自旋仰角跟踪的太阳炉对材料进行真空提纯的方法 |
CA2689603A1 (en) * | 2007-06-08 | 2008-12-11 | Shin-Etsu Chemical Co., Ltd. | Method of solidifying metallic silicon |
US20080314445A1 (en) * | 2007-06-25 | 2008-12-25 | General Electric Company | Method for the preparation of high purity silicon |
US20080314446A1 (en) * | 2007-06-25 | 2008-12-25 | General Electric Company | Processes for the preparation of solar-grade silicon and photovoltaic cells |
KR20100033956A (ko) * | 2007-06-26 | 2010-03-31 | 파나소닉 주식회사 | 금속 실리콘의 정제 방법과 실리콘 덩어리의 제조 방법 |
US8047288B2 (en) | 2007-07-18 | 2011-11-01 | Oxane Materials, Inc. | Proppants with carbide and/or nitride phases |
UA97691C2 (ru) * | 2007-09-13 | 2012-03-12 | Силисиум Беканкур Инк. | Способ получения твердого поликристаллического кремния высокой чистоты |
CN101855391B (zh) | 2007-10-03 | 2014-10-29 | 希里科材料公司 | 用于处理硅粉末来获得硅晶体的方法 |
CN101131371B (zh) * | 2007-10-08 | 2010-06-02 | 苏州阿特斯阳光电力科技有限公司 | 一种精炼冶金硅的杂质含量检测分析方法 |
US20090208770A1 (en) * | 2008-02-14 | 2009-08-20 | Ralf Jonczyk | Semiconductor sheets and methods for fabricating the same |
FR2928641B1 (fr) * | 2008-03-14 | 2010-03-26 | Centre Nat Rech Scient | Procede de purification de silicium pour applications photovoltaiques |
US20090280336A1 (en) * | 2008-05-08 | 2009-11-12 | Ralf Jonczyk | Semiconductor sheets and methods of fabricating the same |
ITMI20081085A1 (it) * | 2008-06-16 | 2009-12-17 | N E D Silicon S P A | Metodo per la preparazione di silicio di grado metallurgico di elevata purezza. |
US8404016B2 (en) * | 2008-08-01 | 2013-03-26 | Ulvac, Inc. | Method for refining metal |
CN102112394B (zh) | 2008-08-12 | 2013-05-15 | 株式会社爱发科 | 硅精制方法 |
WO2010126639A1 (en) * | 2009-04-29 | 2010-11-04 | Calisolar, Inc. | Process control for umg-si material purification |
US8562932B2 (en) | 2009-08-21 | 2013-10-22 | Silicor Materials Inc. | Method of purifying silicon utilizing cascading process |
DE102009056731A1 (de) | 2009-12-04 | 2011-06-09 | Rev Renewable Energy Ventures, Inc. | Halogenierte Polysilane und Polygermane |
CN101974780A (zh) * | 2010-07-28 | 2011-02-16 | 常州天合光能有限公司 | 多晶铸锭晶体生长工艺 |
JP2012036043A (ja) * | 2010-08-09 | 2012-02-23 | Sumco Corp | シリコンインゴットの製造装置および製造方法 |
CN102259859B (zh) * | 2011-06-01 | 2012-12-12 | 宁夏银星多晶硅有限责任公司 | 一种低硼低磷冶金硅的生产工艺 |
ITRM20110426A1 (it) * | 2011-08-08 | 2013-02-09 | N E D Silicon S P A | Metodo perfezionato per la preparazione di silicio di grado metallurgico ad alta purezza, in particolare per uso nel campo fotovoltaico. |
TWI627131B (zh) * | 2012-02-01 | 2018-06-21 | 美商希利柯爾材料股份有限公司 | 矽純化之模具及方法 |
KR101372524B1 (ko) | 2012-02-21 | 2014-03-20 | (주)리뉴에너지 | 일체식 아크 환원 및 슬래그 정련 장치 |
CN102627394B (zh) * | 2012-04-02 | 2014-03-05 | 锦州新世纪多晶硅材料有限公司 | 一种采用冶金法降低金属硅中硼杂质含量的方法 |
WO2014091936A1 (ja) * | 2012-12-10 | 2014-06-19 | 昭和電工株式会社 | ケイ素含有アルミニウム合金鋳塊の製造方法 |
CN108025917A (zh) * | 2015-08-07 | 2018-05-11 | 派洛珍尼西斯加拿大公司 | 二氧化硅生产高纯度硅的方法 |
CN113412237B (zh) * | 2019-04-30 | 2024-06-07 | 瓦克化学股份公司 | 使用颗粒介质精炼粗硅熔体的方法 |
CN115465865B (zh) * | 2022-08-11 | 2023-08-04 | 商南中剑实业有限责任公司 | 一种同步去除工业硅中硼杂质和磷杂质的装置及其方法 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
LU60094A1 (de) * | 1969-12-24 | 1971-08-17 | ||
US4298423A (en) * | 1976-12-16 | 1981-11-03 | Semix Incorporated | Method of purifying silicon |
JPS5913444B2 (ja) * | 1977-11-21 | 1984-03-29 | ユニオン・カ−バイド・コ−ポレ−シヨン | 精製された金属シリコン製造方法 |
US4193975A (en) * | 1977-11-21 | 1980-03-18 | Union Carbide Corporation | Process for the production of improved refined metallurgical silicon |
CA1147698A (en) * | 1980-10-15 | 1983-06-07 | Maher I. Boulos | Purification of metallurgical grade silicon |
DE3215981A1 (de) * | 1982-04-29 | 1983-11-03 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum herstellen hochreiner ausgangsmaterialien fuer die fertigung von silizium fuer solarzellen nach dem carbothermischen reduktionsverfahren |
DE3439550A1 (de) * | 1984-10-29 | 1986-04-30 | Siemens Ag | Verfahren zum herstellen von silizium fuer solarzellen |
FR2585690B1 (fr) | 1985-07-31 | 1987-09-25 | Rhone Poulenc Spec Chim | Procede de purification sous plasma de silicium divise |
JPH0753569B2 (ja) * | 1986-08-07 | 1995-06-07 | 昭和アルミニウム株式会社 | ケイ素の精製方法 |
DE3635064A1 (de) * | 1986-10-15 | 1988-04-21 | Bayer Ag | Verfahren zur raffination von silicium und derart gereinigtes silicium |
US4854968A (en) * | 1986-12-25 | 1989-08-08 | Showa Aluminum Corporation | Method of preparing high-purity metal and rotary cooling member for use in apparatus therefor |
DE3727646A1 (de) * | 1987-08-19 | 1989-03-02 | Bayer Ag | Verfahren zur kontinuierlichen raffination von silicium |
JP3205352B2 (ja) * | 1990-05-30 | 2001-09-04 | 川崎製鉄株式会社 | シリコン精製方法及び装置 |
JP3000109B2 (ja) * | 1990-09-20 | 2000-01-17 | 株式会社住友シチックス尼崎 | 高純度シリコン鋳塊の製造方法 |
JPH04193706A (ja) * | 1990-11-28 | 1992-07-13 | Kawasaki Steel Corp | シリコンの精製方法 |
JPH05262512A (ja) * | 1992-03-17 | 1993-10-12 | Kawasaki Steel Corp | シリコンの精製方法 |
FR2729131B1 (fr) | 1995-01-09 | 1997-02-14 | Pechiney Electrometallurgie | Silicium et ferrosilicium metallurgique a basse teneur en oxygene |
FR2746785B1 (fr) * | 1996-04-02 | 1998-05-22 | Pechiney Electrometallurgie | Silicium metallurgique a structure controlee destine a la synthese des halogenosilanes |
CA2232777C (en) * | 1997-03-24 | 2001-05-15 | Hiroyuki Baba | Method for producing silicon for use in solar cells |
FR2772741B1 (fr) | 1997-12-19 | 2000-03-10 | Centre Nat Rech Scient | Procede et installation d'affinage du silicium |
DE19919832A1 (de) * | 1999-04-30 | 2000-11-09 | Bosch Gmbh Robert | Verfahren zum anisotropen Plasmaätzen von Halbleitern |
WO2002016265A1 (en) * | 2000-08-21 | 2002-02-28 | Astropower, Inc. | Method and apparatus for purifying silicon |
US7588745B2 (en) * | 2004-04-13 | 2009-09-15 | Si Options, Llc | Silicon-containing products |
-
2001
- 2001-07-23 FR FR0109788A patent/FR2827592B1/fr not_active Expired - Fee Related
-
2002
- 2002-07-22 BR BRPI0211193-4A patent/BR0211193B1/pt not_active IP Right Cessation
- 2002-07-22 EP EP02767591A patent/EP1409406B1/de not_active Expired - Lifetime
- 2002-07-22 ES ES02767590T patent/ES2357501T3/es not_active Expired - Lifetime
- 2002-07-22 DE DE60238615T patent/DE60238615D1/de not_active Expired - Lifetime
- 2002-07-22 CN CNB028162331A patent/CN1295147C/zh not_active Expired - Fee Related
- 2002-07-22 CN CNB028162323A patent/CN1295146C/zh not_active Expired - Fee Related
- 2002-07-22 DE DE60224394T patent/DE60224394T2/de not_active Expired - Lifetime
- 2002-07-22 WO PCT/FR2002/002603 patent/WO2003010090A1/fr active IP Right Grant
- 2002-07-22 EP EP02767590A patent/EP1409405B1/de not_active Expired - Lifetime
- 2002-07-22 BR BRPI0211195-0A patent/BR0211195B1/pt not_active IP Right Cessation
- 2002-07-22 AT AT02767590T patent/ATE491668T1/de not_active IP Right Cessation
- 2002-07-22 WO PCT/FR2002/002602 patent/WO2003014019A1/fr active Application Filing
- 2002-07-22 US US10/484,311 patent/US7858063B2/en not_active Expired - Fee Related
- 2002-07-22 JP JP2003515451A patent/JP4410847B2/ja not_active Expired - Fee Related
- 2002-07-22 AT AT02767591T patent/ATE382581T1/de not_active IP Right Cessation
- 2002-07-22 ES ES02767591T patent/ES2298390T3/es not_active Expired - Lifetime
- 2002-07-22 US US10/484,316 patent/US7404941B2/en not_active Expired - Fee Related
- 2002-07-22 JP JP2003518979A patent/JP4523274B2/ja not_active Expired - Fee Related
-
2004
- 2004-01-14 ZA ZA2004/00276A patent/ZA200400276B/en unknown
- 2004-01-16 ZA ZA2004/00346A patent/ZA200400346B/en unknown
- 2004-01-21 NO NO20040285A patent/NO335985B1/no not_active IP Right Cessation
- 2004-01-21 NO NO20040284A patent/NO335984B1/no not_active IP Right Cessation
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |