ATE262689T1 - Phasenschiebermaske-rohling, phasenschiebermaske und herstellungsverfahren - Google Patents

Phasenschiebermaske-rohling, phasenschiebermaske und herstellungsverfahren

Info

Publication number
ATE262689T1
ATE262689T1 AT01300097T AT01300097T ATE262689T1 AT E262689 T1 ATE262689 T1 AT E262689T1 AT 01300097 T AT01300097 T AT 01300097T AT 01300097 T AT01300097 T AT 01300097T AT E262689 T1 ATE262689 T1 AT E262689T1
Authority
AT
Austria
Prior art keywords
phase shifter
shifter mask
shift mask
phase shift
manufacturing
Prior art date
Application number
AT01300097T
Other languages
English (en)
Inventor
Satoshi Okazaki
Ichiro Kaneko
Jiro Moriya
Masayuki Suzuki
Tamotsu Maruyama
Original Assignee
Shinetsu Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Chemical Co filed Critical Shinetsu Chemical Co
Application granted granted Critical
Publication of ATE262689T1 publication Critical patent/ATE262689T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Physical Vapour Deposition (AREA)
AT01300097T 2000-01-05 2001-01-05 Phasenschiebermaske-rohling, phasenschiebermaske und herstellungsverfahren ATE262689T1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2000000332 2000-01-05
JP2000000336 2000-01-05
JP2000000333 2000-01-05
JP2000309453 2000-10-10

Publications (1)

Publication Number Publication Date
ATE262689T1 true ATE262689T1 (de) 2004-04-15

Family

ID=27480906

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01300097T ATE262689T1 (de) 2000-01-05 2001-01-05 Phasenschiebermaske-rohling, phasenschiebermaske und herstellungsverfahren

Country Status (6)

Country Link
US (1) US6511778B2 (de)
EP (1) EP1116999B1 (de)
KR (1) KR20010070403A (de)
AT (1) ATE262689T1 (de)
DE (1) DE60102397T2 (de)
TW (1) TW497006B (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6511788B1 (en) * 1999-02-12 2003-01-28 Sony Corporation Multi-layered optical disc
JP2001235849A (ja) * 2000-02-24 2001-08-31 Shin Etsu Chem Co Ltd 位相シフトマスク及びその製造方法
JP2001305713A (ja) 2000-04-25 2001-11-02 Shin Etsu Chem Co Ltd フォトマスク用ブランクス及びフォトマスク
TW541605B (en) * 2000-07-07 2003-07-11 Hitachi Ltd Fabrication method of semiconductor integrated circuit device
JP2004029081A (ja) * 2002-06-21 2004-01-29 Canon Inc 位相シフトマスク、該位相シフトマスクを用いたパタン形成法、該パタン形成法による固体素子
KR100494442B1 (ko) * 2002-10-22 2005-06-13 주식회사 에스앤에스텍 하프톤 위상 시프트 블랭크 마스크 및 포토 마스크의제조방법
JP4049372B2 (ja) * 2002-10-23 2008-02-20 Ｈｏｙａ株式会社 ハーフトーン型位相シフトマスクブランクスの製造方法
US6875546B2 (en) * 2003-03-03 2005-04-05 Freescale Semiconductor, Inc. Method of patterning photoresist on a wafer using an attenuated phase shift mask
US7026076B2 (en) 2003-03-03 2006-04-11 Freescale Semiconductor, Inc. Method of patterning photoresist on a wafer using a reflective mask with a multi-layer ARC
KR101018567B1 (ko) * 2004-06-22 2011-03-03 호야 가부시키가이샤 그레이 톤 마스크 블랭크, 그레이 톤 마스크 및 그 제조방법과 액정 표시 장치의 제조 방법
JP4867152B2 (ja) * 2004-10-20 2012-02-01 ソニー株式会社 固体撮像素子
US7906252B2 (en) * 2006-03-06 2011-03-15 Taiwan Semiconductor Manufacturing Co., Ltd. Multiple resist layer phase shift mask (PSM) blank and PSM formation method
JP4509050B2 (ja) * 2006-03-10 2010-07-21 信越化学工業株式会社 フォトマスクブランク及びフォトマスク
JP4883278B2 (ja) * 2006-03-10 2012-02-22 信越化学工業株式会社 フォトマスクブランク及びフォトマスクの製造方法
US8615663B2 (en) * 2006-04-17 2013-12-24 Broadcom Corporation System and method for secure remote biometric authentication
JP4737426B2 (ja) 2006-04-21 2011-08-03 信越化学工業株式会社 フォトマスクブランク

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3350095B2 (ja) * 1992-03-24 2002-11-25 株式会社東芝 マスクの修正方法
US5631109A (en) * 1992-07-17 1997-05-20 Kabushiki Kaisha Toshiba Exposure mask comprising transparent and translucent phase shift patterns
JP3262303B2 (ja) * 1993-08-17 2002-03-04 大日本印刷株式会社 ハーフトーン位相シフトフォトマスク及びハーフトーン位相シフトフォトマスク用ブランクス
JPH07295203A (ja) * 1994-04-27 1995-11-10 Dainippon Printing Co Ltd ハーフトーン位相シフトフォトマスク用ブランクスの製造方法
KR100311704B1 (ko) 1993-08-17 2001-12-15 기타오카 다카시 하프톤위상쉬프트포토마스크,하프톤위상쉬프트포토마스크용블랭크스및그블랭크스의제조방법
KR0147493B1 (ko) 1995-10-25 1998-08-01 김주용 하프톤 위상반전마스크 제조방법
US5935735A (en) 1996-10-24 1999-08-10 Toppan Printing Co., Ltd. Halftone phase shift mask, blank for the same, and methods of manufacturing these
JPH10186632A (ja) 1996-10-24 1998-07-14 Toppan Printing Co Ltd ハーフトーン型位相シフトマスク用ブランク及びハーフトーン型位相シフトマスク
JP2904170B2 (ja) 1996-12-27 1999-06-14 日本電気株式会社 ハーフトーン位相シフトマスク及びハーフトーン位相シフトマスクの欠陥修正方法
JPH11184067A (ja) 1997-12-19 1999-07-09 Hoya Corp 位相シフトマスク及び位相シフトマスクブランク
JPH11184063A (ja) 1997-12-25 1999-07-09 Ulvac Seimaku Kk 位相シフトフォトマスクブランクス及び位相シフトフォトマスクの製造方法並びにサイドエッチング量の制御方法

Also Published As

Publication number Publication date
EP1116999A1 (de) 2001-07-18
DE60102397D1 (de) 2004-04-29
EP1116999B1 (de) 2004-03-24
US6511778B2 (en) 2003-01-28
KR20010070403A (ko) 2001-07-25
DE60102397T2 (de) 2005-02-24
TW497006B (en) 2002-08-01
US20010006754A1 (en) 2001-07-05

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Legal Events

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