ATE141740T1 - Vorrichtung zur bearbeitung eines feststoffes - Google Patents

Vorrichtung zur bearbeitung eines feststoffes

Info

Publication number
ATE141740T1
ATE141740T1 AT92910430T AT92910430T ATE141740T1 AT E141740 T1 ATE141740 T1 AT E141740T1 AT 92910430 T AT92910430 T AT 92910430T AT 92910430 T AT92910430 T AT 92910430T AT E141740 T1 ATE141740 T1 AT E141740T1
Authority
AT
Austria
Prior art keywords
pct
jet
sec
date
solid
Prior art date
Application number
AT92910430T
Other languages
English (en)
Inventor
Eugene Zorina
Vladimir Ivanov
Pavel Kulik
Alexis Logoshin
Alim Tchabanov
George Pavlov
Vecleslav Shvetchov
Original Assignee
Opa Overseas Publishers Ass Am
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Opa Overseas Publishers Ass Am filed Critical Opa Overseas Publishers Ass Am
Application granted granted Critical
Publication of ATE141740T1 publication Critical patent/ATE141740T1/de

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/36—Circuit arrangements
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/3494—Means for controlling discharge parameters
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/40—Details, e.g. electrodes, nozzles using applied magnetic fields, e.g. for focusing or rotating the arc

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Sink And Installation For Waste Water (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Processing Of Meat And Fish (AREA)
  • Polarising Elements (AREA)
  • Treatment Of Sludge (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
AT92910430T 1991-05-24 1992-05-19 Vorrichtung zur bearbeitung eines feststoffes ATE141740T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SU914935913A RU2030811C1 (ru) 1991-05-24 1991-05-24 Установка для плазменной обработки твердого тела

Publications (1)

Publication Number Publication Date
ATE141740T1 true ATE141740T1 (de) 1996-09-15

Family

ID=21574339

Family Applications (1)

Application Number Title Priority Date Filing Date
AT92910430T ATE141740T1 (de) 1991-05-24 1992-05-19 Vorrichtung zur bearbeitung eines feststoffes

Country Status (8)

Country Link
US (1) US5474642A (de)
EP (1) EP0586441B1 (de)
JP (1) JPH07508855A (de)
AT (1) ATE141740T1 (de)
DE (1) DE69213004T2 (de)
GB (1) GB2256939B (de)
RU (1) RU2030811C1 (de)
WO (1) WO1992021220A1 (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2075135C1 (ru) 1995-01-13 1997-03-10 Акционерное общество Научно-производственная фирма "А3" Установка для плазмоструйной обработки пластин
JP3521587B2 (ja) * 1995-02-07 2004-04-19 セイコーエプソン株式会社 基板周縁の不要物除去方法及び装置並びにそれを用いた塗布方法
WO1996032742A1 (fr) * 1995-04-11 1996-10-17 Zakrytoe Aktsionernoe Obschestvo Nauchno-Proizvodstvennaya Firma 'az' Installation destinee au traitement par flux plasmiques de plaques
WO1997018344A1 (fr) * 1995-11-13 1997-05-22 Ist Instant Surface Technology S.A. Procede de traitement de surface et dispositif de mise en oeuvre du procede
US6105534A (en) * 1996-05-31 2000-08-22 Ipec Precision, Inc. Apparatus for plasma jet treatment of substrates
EP0902961B1 (de) 1996-05-31 2000-07-05 IPEC Precision, Inc. Verfahren zum behandeln eines scheibens mit einem plasmastrahl
US6406760B1 (en) 1996-06-10 2002-06-18 Celestech, Inc. Diamond film deposition on substrate arrays
US6173672B1 (en) * 1997-06-06 2001-01-16 Celestech, Inc. Diamond film deposition on substrate arrays
US5767627A (en) * 1997-01-09 1998-06-16 Trusi Technologies, Llc Plasma generation and plasma processing of materials
US6139678A (en) * 1997-11-20 2000-10-31 Trusi Technologies, Llc Plasma processing methods and apparatus
DE19807086A1 (de) * 1998-02-20 1999-08-26 Fraunhofer Ges Forschung Verfahren zum Beschichten von Oberflächen eines Substrates, Vorrichtung zur Durchführung des Verfahrens, Schichtsystem sowie beschichtetes Substrat
DE69913518T2 (de) * 1999-08-31 2004-11-11 Agfa-Gevaert Verfahren zur Erneuerung einer Flachdruckplatte
US6467297B1 (en) 2000-10-12 2002-10-22 Jetek, Inc. Wafer holder for rotating and translating wafers
AU2001261619A1 (en) * 2000-05-15 2001-11-26 Jetek, Inc. System for precision control of the position of an atmospheric plasma jet
US6423923B1 (en) 2000-08-04 2002-07-23 Tru-Si Technologies, Inc. Monitoring and controlling separate plasma jets to achieve desired properties in a combined stream
EP1205962A1 (de) * 2000-11-10 2002-05-15 Jobin Yvon S.A. Verfahren zur Plasmazustandsüberwachung und -kontrolle in einem Plasmaspektrometer sowie Spektrometer zur Durchführung dieses Verfahrens
US6749764B1 (en) * 2000-11-14 2004-06-15 Tru-Si Technologies, Inc. Plasma processing comprising three rotational motions of an article being processed
US7591957B2 (en) 2001-01-30 2009-09-22 Rapt Industries, Inc. Method for atmospheric pressure reactive atom plasma processing for surface modification
US7510664B2 (en) * 2001-01-30 2009-03-31 Rapt Industries, Inc. Apparatus and method for atmospheric pressure reactive atom plasma processing for shaping of damage free surfaces
US6660177B2 (en) 2001-11-07 2003-12-09 Rapt Industries Inc. Apparatus and method for reactive atom plasma processing for material deposition
US6936546B2 (en) * 2002-04-26 2005-08-30 Accretech Usa, Inc. Apparatus for shaping thin films in the near-edge regions of in-process semiconductor substrates
US7371992B2 (en) 2003-03-07 2008-05-13 Rapt Industries, Inc. Method for non-contact cleaning of a surface
US20040173316A1 (en) * 2003-03-07 2004-09-09 Carr Jeffrey W. Apparatus and method using a microwave source for reactive atom plasma processing
JP5346944B2 (ja) * 2007-10-19 2013-11-20 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 向上したトライボロジー特性のポリアセタール組成物
JP6146807B2 (ja) * 2013-05-30 2017-06-14 学校法人文理学園 プラズマ処理装置及びプラズマ処理方法
US9633862B2 (en) * 2015-08-31 2017-04-25 Kabushiki Kaisha Toshiba Semiconductor manufacturing apparatus and semiconductor manufacturing method

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3278796A (en) * 1962-06-15 1966-10-11 Hitachi Ltd Magnetically controllable plasma flame generator
US4021675A (en) * 1973-02-20 1977-05-03 Hughes Aircraft Company System for controlling ion implantation dosage in electronic materials
US4487162A (en) * 1980-11-25 1984-12-11 Cann Gordon L Magnetoplasmadynamic apparatus for the separation and deposition of materials
JPS57205769A (en) * 1981-06-15 1982-12-16 Fuji Electric Corp Res & Dev Ltd Base material reproducting method of electrophotographic receptor
US4609810A (en) * 1984-06-25 1986-09-02 The Perkin-Elmer Corporation Apparatus for controlling a plasma
US4675530A (en) * 1985-07-11 1987-06-23 Eaton Corporation Charge density detector for beam implantation
EP0334184B1 (de) * 1988-03-16 1996-08-14 Hitachi, Ltd. Mikrowellenionenquelle
JPH0223613A (ja) * 1988-07-12 1990-01-25 Tokyo Ohka Kogyo Co Ltd プラズマ反応装置
US5062364A (en) * 1989-03-29 1991-11-05 Presstek, Inc. Plasma-jet imaging method
US5091049A (en) * 1989-06-13 1992-02-25 Plasma & Materials Technologies, Inc. High density plasma deposition and etching apparatus
US5000771A (en) * 1989-12-29 1991-03-19 At&T Bell Laboratories Method for manufacturing an article comprising a refractory dielectric body
US5120703A (en) * 1990-04-17 1992-06-09 Alfred University Process for preparing oxide superconducting films by radio-frequency generated aerosol-plasma deposition in atmosphere
JP2840699B2 (ja) * 1990-12-12 1998-12-24 株式会社 半導体エネルギー研究所 被膜形成装置及び被膜形成方法
US5336355A (en) * 1991-12-13 1994-08-09 Hughes Aircraft Company Methods and apparatus for confinement of a plasma etch region for precision shaping of surfaces of substances and films
US5290382A (en) * 1991-12-13 1994-03-01 Hughes Aircraft Company Methods and apparatus for generating a plasma for "downstream" rapid shaping of surfaces of substrates and films

Also Published As

Publication number Publication date
US5474642A (en) 1995-12-12
EP0586441B1 (de) 1996-08-21
DE69213004D1 (de) 1996-09-26
GB9115179D0 (en) 1991-08-28
EP0586441A1 (de) 1994-03-16
DE69213004T2 (de) 1996-12-19
WO1992021220A1 (en) 1992-11-26
GB2256939B (en) 1994-07-06
RU2030811C1 (ru) 1995-03-10
JPH07508855A (ja) 1995-09-28
GB2256939A (en) 1992-12-23

Similar Documents

Publication Publication Date Title
ATE141740T1 (de) Vorrichtung zur bearbeitung eines feststoffes
DE69202513D1 (de) Verfahren zum Erzeugen eines Explosionsdruckes und Vorrichtung dafür.
GB9107751D0 (en) Treatment of material
FI972093A0 (fi) Jäteveden käsittelymenetelmä ja -laitos
EP0725164A3 (de) Verfahren und Vorrichtung zur Plasmaerzeugung und Verfahren zur Bearbeitung eines Halbleiters
DE68907891D1 (de) Vorrichtung und verfahren zur kuehlung eines plasmabogens.
DE3884071D1 (de) Vorrichtung zur Formkorrektur eines Gegenstandes durch Laserbehandlung.
DE69300975D1 (de) Vorrichtung zur kosmetischen Behandlung eines menschlichen Körpers durch Entfernung von Fettgewebe.
EP0764309A4 (de) Apparat und verfahren zur beschleunigung der verarbeitung von datenmatrizen und beschleunigt verarbeitete datenmatrizen
AU4122197A (en) Device for prohibiting the crossing of a zone boundary by an animal
ATE187344T1 (de) Vorrichtung zur erzeugung gesundheitsverträglicher atemluft in nasalen überdruck-beatmungsgeräten
DE68917550D1 (de) Verfahren und Vorrichtung zur Plasmabehandlung.
IL121394A (en) Depilation apparatus
ATE130535T1 (de) Vorrichtung zum bearbeiten eines mechanischen werkstücks.
NO995582L (no) Fremgangsmåte og apparat for behandling av vannsystemer
DE69216309D1 (de) Oberflächenbehandlungsvorrichtung
DE69201687D1 (de) Vorrichtung zur Einstellung des Arbeitseffekts der Steuerorgane eines Luftfahrzeuges.
MY113227A (en) Tube-shaped film having its inner peripheral surface treated, method for treating inner peripheral surface of tube-shaped film and apparatus therefor
DE69911804D1 (de) Vorrichtung zum beschichten von gegenständen mittels pvd
ATE141065T1 (de) Verfahren und vorrichtung zur überkopf-behandlung von flaschen
TW279242B (en) The wasted-gas processing method & device for CVD apparatus
DE69003597D1 (de) Verfahren und vorrichtung zur beruehrungsfreien bearbeitung mittels dynamischer prozesssteuerung.
AU4571693A (en) Device for cleaning contaminated topsoil
JPS534648A (en) Apparatus for facial treatment
ATA145389A (de) Vorrichtung zum eintragen und bzw. oder austragen von schuettgut

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties