ATA1242002A - Verfahren und einrichtung zum optischen testen von halbleiterbauelementen - Google Patents

Verfahren und einrichtung zum optischen testen von halbleiterbauelementen

Info

Publication number
ATA1242002A
ATA1242002A AT0012402A AT1242002A ATA1242002A AT A1242002 A ATA1242002 A AT A1242002A AT 0012402 A AT0012402 A AT 0012402A AT 1242002 A AT1242002 A AT 1242002A AT A1242002 A ATA1242002 A AT A1242002A
Authority
AT
Austria
Prior art keywords
semiconductor components
testing semiconductor
optically testing
optically
components
Prior art date
Application number
AT0012402A
Other languages
English (en)
Other versions
AT411496B (de
Original Assignee
Gornik Erich Dipl Ing Dr
Pogany Dionyz Dipl Ing Dr
Innovationsagentur Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gornik Erich Dipl Ing Dr, Pogany Dionyz Dipl Ing Dr, Innovationsagentur Gmbh filed Critical Gornik Erich Dipl Ing Dr
Priority to AT0012402A priority Critical patent/AT411496B/de
Priority to PCT/AT2003/000018 priority patent/WO2003062844A1/de
Priority to EP03702185A priority patent/EP1468301A1/de
Priority to US10/502,503 priority patent/US20050036151A1/en
Publication of ATA1242002A publication Critical patent/ATA1242002A/de
Application granted granted Critical
Publication of AT411496B publication Critical patent/AT411496B/de

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/1717—Systems in which incident light is modified in accordance with the properties of the material investigated with a modulation of one or more physical properties of the sample during the optical investigation, e.g. electro-reflectance
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G01N21/45—Refractivity; Phase-affecting properties, e.g. optical path length using interferometric methods; using Schlieren methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/302—Contactless testing
    • G01R31/308—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Engineering & Computer Science (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Electromagnetism (AREA)
  • Toxicology (AREA)
  • General Engineering & Computer Science (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
AT0012402A 2002-01-25 2002-01-25 Verfahren und einrichtung zum optischen testen von halbleiterbauelementen AT411496B (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
AT0012402A AT411496B (de) 2002-01-25 2002-01-25 Verfahren und einrichtung zum optischen testen von halbleiterbauelementen
PCT/AT2003/000018 WO2003062844A1 (de) 2002-01-25 2003-01-20 Verfahren und einrichtung zum optischen testen von halbleiterbauelementen
EP03702185A EP1468301A1 (de) 2002-01-25 2003-01-20 Verfahren und einrichtung zum optischen testen von halbleiterbauelementen
US10/502,503 US20050036151A1 (en) 2002-01-25 2003-01-20 Method and device for opically testing semiconductor elements

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
AT0012402A AT411496B (de) 2002-01-25 2002-01-25 Verfahren und einrichtung zum optischen testen von halbleiterbauelementen

Publications (2)

Publication Number Publication Date
ATA1242002A true ATA1242002A (de) 2003-06-15
AT411496B AT411496B (de) 2004-01-26

Family

ID=3633746

Family Applications (1)

Application Number Title Priority Date Filing Date
AT0012402A AT411496B (de) 2002-01-25 2002-01-25 Verfahren und einrichtung zum optischen testen von halbleiterbauelementen

Country Status (4)

Country Link
US (1) US20050036151A1 (de)
EP (1) EP1468301A1 (de)
AT (1) AT411496B (de)
WO (1) WO2003062844A1 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6512385B1 (en) * 1999-07-26 2003-01-28 Paul Pfaff Method for testing a device under test including the interference of two beams
US9952161B2 (en) 2001-12-06 2018-04-24 Attofemto, Inc. Methods for obtaining and analyzing digital interferometric data for computer testing and developing semiconductor and anisotropic devices and materials
US7733499B2 (en) 2001-12-06 2010-06-08 Attofemto, Inc. Method for optically testing semiconductor devices
US8462350B2 (en) 2001-12-06 2013-06-11 Attofemto, Inc. Optically enhanced holographic interferometric testing methods for the development and evaluation of semiconductor devices, materials, wafers, and for monitoring all phases of development and manufacture
US20070030492A1 (en) * 2005-05-04 2007-02-08 Lukas Novotny Apparatus and method for sizing nanoparticles based on optical forces and interferometric field detection
US20090323061A1 (en) * 2006-02-28 2009-12-31 Lukas Novotny Multi-color hetereodyne interferometric apparatus and method for sizing nanoparticles
WO2009073259A2 (en) * 2007-09-14 2009-06-11 University Of Rochester Common-path interferometer rendering amplitude and phase of scattered light
JP5274862B2 (ja) 2008-03-10 2013-08-28 東京エレクトロン株式会社 温度測定装置及び温度測定方法
US8704155B2 (en) * 2009-12-11 2014-04-22 Washington University Nanoscale object detection using a whispering gallery mode resonator
US11754488B2 (en) 2009-12-11 2023-09-12 Washington University Opto-mechanical system and method having chaos induced stochastic resonance and opto-mechanically mediated chaos transfer
US20150285728A1 (en) 2009-12-11 2015-10-08 Washington University Detection of nano-scale particles with a self-referenced and self-heterodyned raman micro-laser
US9012830B2 (en) * 2009-12-11 2015-04-21 Washington University Systems and methods for particle detection
US8625083B2 (en) * 2011-03-12 2014-01-07 Ken Roberts Thin film stress measurement 3D anisotropic volume
KR20150116512A (ko) * 2014-04-07 2015-10-16 삼성전자주식회사 검사 장치 및 검사 대상물 검사 방법
EP3382378B1 (de) * 2017-03-29 2022-10-26 Mitsubishi Electric R&D Centre Europe B.V. Optische überwachung
US11079432B2 (en) * 2019-02-19 2021-08-03 Nxp B.V. Integrated laser voltage probe pad for measuring DC or low frequency AC electrical parameters with laser based optical probing techniques
JP7334664B2 (ja) * 2020-04-02 2023-08-29 株式会社島津製作所 応力発光測定方法および応力発光測定装置
CN112945385A (zh) * 2021-01-26 2021-06-11 同济大学 一种多反射干涉自动测量***
CN114088734B (zh) * 2021-11-18 2022-06-24 广东电网有限责任公司 一种复合绝缘子内部缺陷检测***及方法
CN117762170B (zh) * 2022-09-23 2024-07-09 深圳市力子光电科技有限公司 一种eml光器件tec驱动电路

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4682605A (en) * 1985-10-02 1987-07-28 Murray Electronics Associates Limited Liquid crystal matrix for extended range high resolution temperature mapping
US4818110A (en) * 1986-05-06 1989-04-04 Kla Instruments Corporation Method and apparatus of using a two beam interference microscope for inspection of integrated circuits and the like
US4841150A (en) * 1987-12-28 1989-06-20 The United States Of America As Represented By The Secretary Of The Air Force Reflection technique for thermal mapping of semiconductors
US4957367A (en) * 1988-05-31 1990-09-18 Lev Dulman Inteferometric imaging system
US5229303A (en) * 1989-08-29 1993-07-20 At&T Bell Laboratories Device processing involving an optical interferometric thermometry using the change in refractive index to measure semiconductor wafer temperature
US5414513A (en) * 1993-07-21 1995-05-09 Northrop Grumman Corporation Printed circuit inspection system utilizing interference fringes
KR100255961B1 (ko) * 1994-03-11 2000-05-01 아끼구사 나오유끼 물리량 측정방법 및 장치, 반도체 장치의 제조방법과 파장측정방법 및 장치
DE19516842C2 (de) * 1994-05-06 2003-10-23 Fraunhofer Ges Forschung Bestimmung mechanischer Spannungs- oder Verschiebungsfelder
SG66376A1 (en) * 1997-07-03 1999-07-20 Inst Of Microlectronics Nation Multiwavelength imaging and spectroscopic photoemission microscope system
DE29715904U1 (de) * 1997-09-01 1997-10-23 OMECA Messtechnik GmbH, 14513 Teltow Interferenzoptische Meßeinrichtung
US6181416B1 (en) * 1998-04-14 2001-01-30 Optometrix, Inc. Schlieren method for imaging semiconductor device properties
US6323951B1 (en) * 1999-03-22 2001-11-27 Boxer Cross Incorporated Apparatus and method for determining the active dopant profile in a semiconductor wafer
US6496261B1 (en) * 1999-09-24 2002-12-17 Schlumberger Technologies, Inc. Double-pulsed optical interferometer for waveform probing of integrated circuits

Also Published As

Publication number Publication date
US20050036151A1 (en) 2005-02-17
AT411496B (de) 2004-01-26
WO2003062844A1 (de) 2003-07-31
EP1468301A1 (de) 2004-10-20

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