DE60308471D1 - Verfahren und Vorrichtung zur Inspektion von Oberflächen - Google Patents
Verfahren und Vorrichtung zur Inspektion von OberflächenInfo
- Publication number
- DE60308471D1 DE60308471D1 DE60308471T DE60308471T DE60308471D1 DE 60308471 D1 DE60308471 D1 DE 60308471D1 DE 60308471 T DE60308471 T DE 60308471T DE 60308471 T DE60308471 T DE 60308471T DE 60308471 D1 DE60308471 D1 DE 60308471D1
- Authority
- DE
- Germany
- Prior art keywords
- inspecting surfaces
- inspecting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
Landscapes
- Immunology (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Pathology (AREA)
- Health & Medical Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002370946A JP4391082B2 (ja) | 2002-12-20 | 2002-12-20 | 表面検査方法及びその装置 |
JP2002370946 | 2002-12-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60308471D1 true DE60308471D1 (de) | 2006-11-02 |
DE60308471T2 DE60308471T2 (de) | 2007-04-12 |
Family
ID=32376350
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60308471T Expired - Lifetime DE60308471T2 (de) | 2002-12-20 | 2003-12-06 | Verfahren und Vorrichtung zur Inspektion von Oberflächen |
Country Status (7)
Country | Link |
---|---|
US (1) | US7245388B2 (de) |
EP (1) | EP1431752B1 (de) |
JP (1) | JP4391082B2 (de) |
KR (1) | KR101199082B1 (de) |
CN (1) | CN100480689C (de) |
DE (1) | DE60308471T2 (de) |
TW (1) | TWI334185B (de) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4316853B2 (ja) * | 2002-10-09 | 2009-08-19 | 株式会社トプコン | 表面検査方法および装置 |
JP2006284211A (ja) * | 2005-03-31 | 2006-10-19 | Dainippon Screen Mfg Co Ltd | ムラ検査装置およびムラ検査方法 |
US7791724B2 (en) * | 2006-06-13 | 2010-09-07 | Asml Netherlands B.V. | Characterization of transmission losses in an optical system |
JP5132911B2 (ja) * | 2006-10-03 | 2013-01-30 | 浜松ホトニクス株式会社 | レーザ加工方法 |
KR101133209B1 (ko) * | 2010-02-23 | 2012-04-09 | 나노전광 주식회사 | 산란광에 의한 기판 표면의 결함 검출 장치 및 그 검출 방법 |
JP5563372B2 (ja) * | 2010-05-20 | 2014-07-30 | 第一実業ビスウィル株式会社 | 外観検査装置 |
KR101311251B1 (ko) * | 2010-11-12 | 2013-09-25 | 주식회사 고영테크놀러지 | 검사장치 |
CN102788769A (zh) * | 2011-05-18 | 2012-11-21 | 联景光电股份有限公司 | 晶圆检测装置及使用其的晶圆检测方法 |
US9606069B2 (en) * | 2014-06-25 | 2017-03-28 | Kla-Tencor Corporation | Method, apparatus and system for generating multiple spatially separated inspection regions on a substrate |
AU2015369663A1 (en) * | 2014-12-22 | 2017-05-11 | California Institute Of Technology | Epi-illumination fourier ptychographic imaging for thick samples |
JP6465345B2 (ja) * | 2014-12-26 | 2019-02-06 | 株式会社荏原製作所 | 研磨パッドの表面性状測定方法および装置 |
CN108507909B (zh) * | 2017-02-28 | 2021-04-09 | 上海微电子装备(集团)股份有限公司 | 一种平板颗粒度检测装置 |
KR102384553B1 (ko) * | 2017-03-23 | 2022-04-08 | 에이에스엠엘 네델란즈 비.브이. | 구조체의 비대칭 모니터링 |
KR102648920B1 (ko) * | 2018-12-07 | 2024-03-19 | 삼성디스플레이 주식회사 | 레이저 결정화 장치의 모니터링 시스템 및 이를 이용한 레이저 결정화 방법 |
JP2020204579A (ja) * | 2019-06-18 | 2020-12-24 | 住友電工デバイス・イノベーション株式会社 | ウェハの表面検査方法、表面検査装置、および電子部品の製造方法 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5288085A (en) * | 1976-01-17 | 1977-07-22 | Canon Inc | Defect detection system |
JPH0820371B2 (ja) * | 1988-01-21 | 1996-03-04 | 株式会社ニコン | 欠陥検査装置及び欠陥検査方法 |
US5179422A (en) * | 1991-05-15 | 1993-01-12 | Environmental Research Institute Of Michigan | Contamination detection system |
JPH05129399A (ja) * | 1991-11-01 | 1993-05-25 | Toshiba Corp | 表面付着粒子検出装置 |
US5773316A (en) * | 1994-03-11 | 1998-06-30 | Fujitsu Limited | Method and device for measuring physical quantity, method for fabricating semiconductor device, and method and device for measuring wavelength |
JP3386278B2 (ja) * | 1994-03-11 | 2003-03-17 | 富士通株式会社 | 測定方法及び装置並びに半導体装置の製造方法 |
JPH0894446A (ja) * | 1994-09-20 | 1996-04-12 | Fujitsu Ltd | 波長測定方法及び装置 |
US6104481A (en) * | 1997-11-11 | 2000-08-15 | Kabushiki Kaisha Topcon | Surface inspection apparatus |
JP2000131037A (ja) | 1998-10-26 | 2000-05-12 | Hitachi Denshi Ltd | 物体形状検査装置 |
JP2000216208A (ja) | 1999-01-20 | 2000-08-04 | Hitachi Ltd | 外観検査方法および装置ならびに半導体装置の製造方法 |
JP4409701B2 (ja) * | 2000-02-25 | 2010-02-03 | 株式会社トプコン | 表面検査装置 |
JP4418078B2 (ja) * | 2000-04-03 | 2010-02-17 | 株式会社トプコン | 表面検査装置 |
US6731384B2 (en) * | 2000-10-10 | 2004-05-04 | Hitachi, Ltd. | Apparatus for detecting foreign particle and defect and the same method |
US7050178B2 (en) * | 2001-07-13 | 2006-05-23 | Rudolph Technologies, Inc. | Method and apparatus for increasing signal to noise ratio in a photoacoustic film thickness measurement system |
KR100437024B1 (ko) * | 2001-10-18 | 2004-06-23 | 엘지전자 주식회사 | 박막 검사 방법 및 그 장치 |
-
2002
- 2002-12-20 JP JP2002370946A patent/JP4391082B2/ja not_active Expired - Fee Related
-
2003
- 2003-12-03 KR KR1020030087116A patent/KR101199082B1/ko not_active IP Right Cessation
- 2003-12-06 EP EP03028011A patent/EP1431752B1/de not_active Expired - Lifetime
- 2003-12-06 DE DE60308471T patent/DE60308471T2/de not_active Expired - Lifetime
- 2003-12-10 TW TW092134868A patent/TWI334185B/zh not_active IP Right Cessation
- 2003-12-10 US US10/732,064 patent/US7245388B2/en not_active Expired - Fee Related
- 2003-12-22 CN CNB2003101220759A patent/CN100480689C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US7245388B2 (en) | 2007-07-17 |
TWI334185B (en) | 2010-12-01 |
JP2004205214A (ja) | 2004-07-22 |
KR20040055577A (ko) | 2004-06-26 |
DE60308471T2 (de) | 2007-04-12 |
EP1431752B1 (de) | 2006-09-20 |
CN1510416A (zh) | 2004-07-07 |
TW200423278A (en) | 2004-11-01 |
US20040119971A1 (en) | 2004-06-24 |
EP1431752A3 (de) | 2004-11-03 |
KR101199082B1 (ko) | 2012-11-07 |
EP1431752A2 (de) | 2004-06-23 |
CN100480689C (zh) | 2009-04-22 |
JP4391082B2 (ja) | 2009-12-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |