WO2023273392A1 - 高稳定性准分子激光器装置 - Google Patents
高稳定性准分子激光器装置 Download PDFInfo
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- WO2023273392A1 WO2023273392A1 PCT/CN2022/079621 CN2022079621W WO2023273392A1 WO 2023273392 A1 WO2023273392 A1 WO 2023273392A1 CN 2022079621 W CN2022079621 W CN 2022079621W WO 2023273392 A1 WO2023273392 A1 WO 2023273392A1
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- 238000005259 measurement Methods 0.000 claims abstract description 128
- 238000001514 detection method Methods 0.000 claims abstract description 55
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/1305—Feedback control systems
Definitions
- the present application relates to the field of lasers, in particular to a high-stability excimer laser device.
- the laser output by the excimer laser is widely used in the field of semiconductor chip processing because of its short wavelength, narrow line width, and high energy.
- the laser output by the excimer laser is the most common light source in the field of lithography.
- two FP etalons are used to measure the center wavelength of the laser at the same time.
- One of the FP etalons has a relatively large free spectral path and is used for rough measurement of the center wavelength.
- the other FP etalon has a relatively small free spectral path and is used for the center. The precise measurement of the wavelength, the combination of the two realizes the large-range and high-precision measurement of the central wavelength.
- the present application provides a high-stability excimer laser device to solve the problems existing in the prior art.
- the application provides a high-stability excimer laser device, which includes: a discharge resonator, a line width narrowing module, a detection module, and a control module;
- the line width narrowing module includes a beam expander and an echelle grating sequentially arranged along the laser emission direction from the first side of the discharge resonator;
- the detection module includes a central wavelength precise measurement device and a central wavelength rough measurement device; wherein, the central wavelength rough measurement device includes a reflection device, a beam converging device and a first photoelectric detection device, and the reflection device is used to convert the discharge Part of the light beam emitted from the first side of the resonant cavity is transmitted to the echelle grating, and the beam converging device is arranged in the exit direction of the echelle grating for converging the part of the light beam that is emitted by the echelle grating transmitted to said first photodetection device;
- the central wavelength precision measuring device is arranged on the second side opposite to the first side of the discharge resonant cavity, and is used to receive the laser beam emitted from the second side and perform precise central wavelength measurement;
- the control module is respectively connected with the discharge resonant cavity, the central wavelength precise measurement device and the central wavelength rough measurement device, and is used to measure the The parameters in the discharge resonant cavity are adjusted.
- the beam expander is a beam expander prism group, and the echelle grating is a dispersion grating;
- the reflection device is arranged on the incident side of the light beam of the beam expander prism group, and is located in the optical path after the incident light is reflected by the incident surface of the beam expander; the setting angle of the reflection device satisfies the requirement of receiving the After the light is reflected, it is reflected to the echelle grating twice.
- the converging device is a convex lens or a concave mirror
- the first photodetection device is a charge-coupled device
- the beam converging device is used for converging the dispersed outgoing light so that the converging light is irradiated on the detection surface of the first photodetection device to form interference fringes;
- the first photoelectric detection device is configured to receive the interference fringes, convert the interference fringes into corresponding interference fringe information, and send the interference fringe information to the control module.
- the reflecting device and the beam converging device are arranged inside the line width narrowing module.
- the central wavelength precise measurement device includes a first beam splitter, a homogenizer, a second beam splitter, a collimator, an FP etalon, a second converging mirror, and a second Photoelectric detection device;
- the first beam splitter is used to receive the laser light emitted from the second side of the discharge resonator, split the laser light, and irradiate one of the split laser beams on the homogenizer superior;
- the homogenizer is arranged between the first beam splitter and the second beam splitter, and is used to homogenize the laser light so that the homogenized laser light enters the second beam splitter;
- the second beam splitter is used to split the laser beam emitted by the homogenizer, and irradiate one of the laser beams on the collimating mirror;
- the collimating mirror is arranged between the second beam splitter and the FP etalon, and is used to collimate the laser light irradiated on the FP etalon;
- the FP etalon is used to reflect the laser light passing through the FP etalon multiple times to form multi-level light interference, and converge the multi-level light interference to the second photoelectric through the second converging mirror detection means to form a second interference fringe.
- the detection module further includes an energy detection device, the energy detection device includes a third photodetection device, and the third photodetection device is arranged on another beam of light after splitting by the second beam splitter. In the outgoing direction of the laser, it is used to detect the laser energy information of the laser, and send the laser energy information to the control device.
- control device includes: a central wavelength rough measurement board and a central wavelength fine measurement board;
- the central wavelength coarse measurement board is connected to the first photoelectric detection device and the central wavelength fine measurement board respectively;
- the central wavelength rough measurement board is used to obtain the interference fringe information sent by the first photoelectric detection device, and obtain the rough measurement value of the laser wavelength according to the interference fringe information sent by the first photoelectric detection device;
- the rough measurement value of the laser wavelength is sent to the central wavelength fine measurement board;
- the central wavelength precision measurement board is also connected to the second photoelectric detection device
- the center wavelength precise measurement board is used to obtain the second interference fringe information sent by the second photoelectric detection device, and according to the second interference fringe information, obtain the center wavelength roughness information sent by the center wavelength rough measurement board. Measured value; according to the second interference fringe information and the rough measured value of the central wavelength, obtain the fine measured value of the central wavelength.
- control device further includes a laser tuning controller connected to at least one device of the beam expander for adjusting the beam irradiated by the beam expander to the echelle grating Angle.
- the laser tuning controller is specifically configured to adjust the rotation of at least one component of the beam expander according to the difference between the obtained precise value of the central wavelength and the target value of the central wavelength, so as to adjust the radiation to the echelle grating angle of the beam.
- control device includes: an energy measurement board, a high-voltage power supply controller;
- the energy measurement board is respectively connected to the high-voltage power supply controller and the third photoelectric detection device;
- the energy measurement board is configured to receive the laser energy information sent by the third photoelectric detection device; obtain the laser energy information output by the excimer laser device according to the laser energy information, and send the laser energy information to To the high-voltage power supply controller; the high-voltage power supply controller is connected to the discharge resonant cavity, and is used to receive the laser energy information, and control the laser energy released by the discharge resonant cavity according to the laser energy information.
- the high-stability excimer laser device includes: a discharge resonator, a line width narrowing module, a detection module, and a control module; A beam expander and an echelle grating arranged in sequence; the detection module includes a central wavelength precise measurement device and a central wavelength rough measurement device; wherein, the central wavelength rough measurement device includes a reflection device, a beam converging device and a first photoelectric detector device, the reflecting device is used to transmit part of the light beam emitted from the first side of the discharge resonator to the echelle grating, and the beam converging device is arranged in the outgoing direction of the echelle grating, and is used to transfer the aforementioned part to the echelle grating The light beam is converged by the outgoing light of the echelle grating and then transmitted to the first photodetection device; the central wavelength precise measurement device is arranged on the second side opposite to the first side of the discharge resonant cavity for receiving The laser beam e
- the high-stability excimer laser device realizes the real-time accurate measurement of the central wavelength of the excimer laser through the line width narrowing module, the central wavelength rough measurement device, the detection module, and the central wavelength precise measurement device.
- the driving adjustment module controls the line width narrowing module to adjust, so that the central wavelength of the excimer laser meets the preset central wavelength.
- the above-mentioned device realizes the closed-loop feedback of the central wavelength of the excimer laser, and improves the stability of the laser in the working process.
- Fig. 1 is the structural representation of the highly stable excimer laser device provided by the embodiment of the present application.
- FIG. 2 is a schematic structural diagram of a discharge resonant cavity provided in an embodiment of the present application
- FIG. 3 is a schematic structural diagram of a linewidth narrowing module and a central wavelength rough measurement device provided in an embodiment of the present application;
- Fig. 4 is a schematic structural diagram of the central wavelength precise measurement module provided by the embodiment of the present application.
- FIG. 5 is a schematic diagram of the second interference fringes produced by the FP etalon provided in the embodiment of the present application.
- Fig. 6 is a flow chart of the closed-loop control of the energy released by the excimer laser device and the central wavelength provided by the embodiment of the present application.
- the high-stability excimer laser device realizes real-time accurate measurement of the central wavelength of the excimer laser through a line width narrowing module, a central wavelength rough measurement device, a detection module, and a central wavelength precise measurement device.
- the central wavelength of the molecular laser deviates from the preset central wavelength, it can be adjusted through the line width narrowing module, so that the central wavelength of the excimer laser meets the preset central wavelength.
- the above-mentioned device realizes the closed-loop feedback of the central wavelength of the excimer laser, and improves the stability of the laser in the working process.
- FIG. 1 is a schematic structural diagram of a high-stability excimer laser device provided in an embodiment of the present application.
- FIG. 2 is a schematic structural diagram of a discharge resonant cavity provided by an embodiment of the present application.
- FIG. 3 is a schematic structural diagram of a linewidth narrowing module and a central wavelength rough measurement device provided in an embodiment of the present application.
- FIG. 4 is a schematic structural diagram of a central wavelength precise measurement module provided in an embodiment of the present application.
- the high-stability excimer laser includes: a discharge resonator 1 , a line width narrowing module 2 , a detection module 3 , and a control module 4 .
- a pumping device 27 is arranged in the discharge resonator 1, and the discharge resonator 1 is filled with a mixture of inert gas and halogen gas, and an electrode (EL) connected to the pumping device 27, for example: for a laser with a wavelength of 193nm, its discharge Inside the cavity 1 is a mixed gas of fluorine (F 2 ) and argon (Ar); another example: for a laser with a wavelength of 248nm, the inside of the discharge cavity 1 is a mixed gas of fluorine (F 2 ) and krypton (Kr).
- EL electrode
- the mixed gas in the discharge resonator 1 generates laser light under the action of the electric pulse generated by the pump device 27, and the laser is reflected by the mirrors on both sides of the discharge resonator to realize resonance amplification.
- the laser light enters the linewidth narrowing module 2 from the first side of the discharge resonator 1 (in this embodiment, the right side of FIG. 1 , ie, the side facing the linewidth narrowing module 2, is the first side).
- the natural width of the laser light generated by the above-mentioned mixture of inert gas and halogen gas under the action of the electric pulse is about several hundred picometers.
- the narrowing process is performed to make the spectrum of the laser light released from the other side of the discharge resonator 1 meet the requirements.
- the light outlets on both sides of the discharge resonator 1 are equipped with windows 10 made of CaF2 or fused silica.
- the reflection between the outgoing lasers increases the energy and polarization of the lasers emitted by the laser.
- the line width narrowing module 2 includes a beam expander 5 and an echelle grating 6 sequentially arranged along the laser emission direction of the first side of the discharge resonator 1 .
- the beam expander 5 is composed of several right-angled triangular prisms, and is used to expand the laser beam entering the linewidth narrowing module 2 to reduce the divergence angle of the laser beam irradiated on the echelle grating 6 .
- the beam expander 5 is a key component of the linewidth narrowing module 2, and is also an important element for obtaining a narrow linewidth laser.
- Each prism of the beam expander 5 expands the laser beam incident between the echelle gratings 6, and its beam expansion factor is usually 30 to 60 times.
- the dispersion characteristics of the prism itself also have a certain divergence function for the incident spectrum, so that Prerequisites are provided for the subsequent light splitting of the echelle grating 6 .
- the divergence angle of the laser beam After being expanded by the beam expander 5, the divergence angle of the laser beam will be compressed to reduce the divergence angle of the beam shining on the surface of the echelle grating 6.
- each prism in the beam expander 5 may also be coated with an anti-reflection film to increase the transmittance of the prism.
- the echelle grating 6 is also called a reflective echelle grating, and the echelle grating has the characteristics of small size, strong dispersion ability and high diffraction efficiency.
- the echelle grating 6 is specifically used to disperse the laser light irradiated on the echelle grating 6 through the beam expander 5 so that the light of different wavelengths spreads along the direction of the exit angle.
- the light beam is irradiated on the surface of the echelle grating 6, its incident light and diffracted light satisfy the following grating equation (1):
- ⁇ is the central wavelength of the laser
- ⁇ is the incident angle of the beam on the echelle grating 6
- ⁇ is the exit angle of the beam
- d is the grating constant
- n is the gas refractive index in the line width control device
- m is the interference level Second-rate.
- the light of different wavelengths incident on the echelle grating 6 through the beam expander 5 will spread out along different angles, therefore, only a part of the light with a narrow wavelength range can return to the original path Discharge resonator 1.
- the other end of the discharge resonant cavity 1 opposite to the line width narrowing module 2 is also equipped with an output coupling mirror 11.
- the output coupling mirror 11 and the line width narrowing module 2 form a larger resonant cavity, which oscillates the light returned by the original path Amplified, resulting in a narrower linewidth laser output.
- the incident angle and exit angle of the incident beam are equal, which is basically equal to the blaze angle ⁇ B of the echelle grating, when the magnification of the prism group of the beam expander 5 is M, the beam incident to the line width narrowing module 2
- the angle distribution is f( ⁇ )
- the distribution of the spectrum emitted from the echelle grating along the angle is the following formula (2)
- the blaze angle of the echelle grating is generally greater than 75°.
- slits are added at both ends of the discharge cavity DC to further compress the divergence angle of the laser.
- the laser spectrum passed through the line width narrowing module is greatly narrowed. Reaching about 0.15 to 0.5pm, this laser wavelength can meet the needs of lithography light sources in semiconductor manufacturing.
- the high-stability excimer laser device of this embodiment further includes a detection module 3, and the detection module 3 includes: a central wavelength rough measurement device 3b and a central wavelength fine measurement device 3a.
- the central wavelength rough measuring device includes: a reflecting device 7 , a beam converging device 8 , and a first photoelectric detection device 9 .
- the reflection device 7 is used to transmit the part of the light beam emitted from the first side of the discharge resonator 1 to the echelle grating 6, and the beam converging device 8 is arranged in the exit direction of the echelle grating 6, and is used to pass the aforementioned part of the light beam through the echelle grating 6
- the emitted light is converged and transmitted to the first photodetection device 9;
- the reflector 7 is arranged in the reflection optical path of the incident surface of the first prism, and the reflected light will shine on the reflector 7, and the reflector 7 can be a plane mirror or reflective prism.
- the placement angle of the reflecting device is set so that the reflecting device 7 re-reflects the reflected light onto the echelle grating 6 after receiving the reflected light.
- the echelle grating 6 is an echelle grating.
- This part of the light beam transmitted to the echelle grating by the reflection device 7 is different from the incident angle of the light irradiated on the echelle grating 6 by the beam expander 5, which will be smaller than the blaze angle ⁇ B of the echelle grating, and the incident angle is ⁇ 1 , this part of the light will still be dispersed by the interacting grating 6, and one order (m1) of the light beam emerges at the exit angle ⁇ 1 , and its incident light and outgoing light still satisfy the grating equation of the above formula (1), that is :
- the outgoing light passing through the echelle grating 6 is irradiated on the beam converging device 8, and is focused by the beam converging device 8 onto the surface of the photosensitive element of the first photodetection device 9 to generate first interference fringes.
- the beam converging lens 8 can be a convex lens (group) or a concave mirror, the surface of the convex lens can be coated with an anti-reflection coating, and the surface of the working surface of the concave mirror can be coated with an anti-reflection coating.
- the first photodetection device 9 is specifically a charge-coupled device (charge-coupled device, CCD).
- the first photodetection device 9 is used to convert the first interference fringes into corresponding first interference fringe information, and send the first interference fringe information to the following control module 4 .
- the first photodetection device 9 adopts a linear array CCD,
- the exit angle ⁇ 1 and the wavelength ⁇ of the light (called the first light beam) irradiated on the surface of the echelle grating 6 after being reflected by the reflection device 7 satisfy the following formula (3):
- ⁇ is the change value of the central wavelength
- n is the gas refractive index in the linewidth narrowing device
- ⁇ 1 is the change value of the laser exit angle
- m1 is the interference order
- d is the grating constant.
- the focal length of the beam converging device 8 is set to f1
- the peak position of the first interference fringe is x
- the peak change of the interference fringe and the change of the center wavelength of the laser satisfy the following formula (4):
- ⁇ is the change value of the central wavelength
- ⁇ x is the change value of the peak of the first interference fringe
- ⁇ 1 is the laser emission angle
- the change of the central wavelength of the excimer laser is proportional to the change of the peak position of the first interference fringe
- the first photodetection device 9 collects the first interference fringe information and sends it to the control module 4 to control
- the module 4 can calculate and obtain the peak position of the first interference fringe according to the information of the first interference fringe, so as to obtain a rough measurement value of the central wavelength change ⁇ of the excimer laser.
- the linewidth narrowing and the rough measurement of the center wavelength of the laser are realized at the same time.
- the rough measurement of the center wavelength can be combined with the precise measurement of the center to realize the tuning of the center wavelength of the resonator.
- This scheme makes the overall structure of the laser compact, and the stability and accuracy are greatly improved. Therefore, the reflective device 7 (or the reflective device 7 and the beam converging device 8 ) can be arranged inside the line width narrowing module 2 to make the structure more compact.
- the above components can also be arranged outside the line width narrowing module 2, and those skilled in the art can make adjustments according to actual needs.
- the reflected light of the first prism of the beam expander is used.
- the beam used for rough measurement can also be obtained directly from the beam splitting output from the first side, or the beam expander can be used to The reflected light of the reflective surface of any prism in the prism group will not be repeated here. Any scheme that utilizes the partial beam of the first side output beam and combines the echelle grating 6 of the line width narrowing device to realize the rough measurement of the central wavelength Included within the protection scope of this application.
- the first photodetection device 9 is installed outside the line width narrowing module 2 to prevent the circuit board and electronic components of the first photodetection device 9 from polluting the line width voltage control module 2 .
- the line width narrowing module 2 provided by the embodiment of the present application can also realize the tuning of the central wavelength, and a part of the light with a narrow wavelength range that is incident on the echelle grating 6 through the beam expander 5 returns to the discharge resonator 1 through the original path, At this time, the outgoing angle of this part of the light beam is the same as the incident angle, assuming that the incident angle of the laser light entering the echelle grating 6 through the beam expander 5 is ⁇ 2 , according to the grating equation of formula (1), it can be known that the laser light at this time The wavelength ⁇ satisfies the following formula (5):
- n is the refractive index of the gas in the line width narrowing module 2
- m 2 is the interference order
- d is the grating constant.
- the central wavelength of the laser can be changed by changing the angle at which the light is incident on the echelle grating.
- changing the angle of the last prism in the prism group will also change the angle of the refracted light passing through the prism, and the angle of incident on the echelle grating will also change, thus changing the central wavelength of the laser.
- any other prism in the prism group can also be used to tune the center wavelength. The rotation of the prism can be controlled by the control mechanism, which will be described in detail below.
- the rough measurement and tuning of the central wavelength of the laser are related to the gas refractive index n of the gas inside the linewidth narrowing module 2, and the change in the refractive index will cause the central wavelength of the laser to change. Changes will also cause changes in the rough wavelength.
- the rough measurement of the central wavelength of the excimer laser by using the beam split into the linewidth narrowing module 2 after exiting the laser means that the rough measurement of the central wavelength is consistent with the refractive index n of the gas during the tuning process. Therefore, the rough measurement device 3b of the wavelength of the excimer laser provided by the present application can eliminate the rough measurement error caused by the change of the refractive index of the gas, and improve the rough measurement accuracy of the central wavelength.
- the detection module 3 further includes a central wavelength precision measuring device 3a.
- the central wavelength precision measuring device 3a is disposed on the second side opposite to the first side of the discharge resonant cavity 1 .
- the output coupling mirror 11 is disposed on the second side of the discharge resonant cavity 1 .
- the central wavelength precision measurement device 3a is specifically used to obtain the second interference fringe information of the narrow linewidth laser light emitted by the output coupling mirror 11 of the excimer laser.
- the central wavelength precision measurement device 3a includes a first beam splitter 12, a homogenizer 13, a second beam splitter 14, a collimator 15, an FP etalon 16, and a second convergent mirror 17 , The second photodetection device 18 .
- the first beam splitter 12 is used to receive the laser light emitted from the second side of the discharge resonator 1, and split the laser light emitted from the second side of the discharge resonator 1, and irradiate one of the split laser beams on the uniform light device 13.
- the homogenizer 13 can be an integrating rod, a microlens array or a diffractive optical element, or a combination of these elements. The purpose is to homogenize the incident beam.
- the homogenized light is split by the second beam splitter 14 , part of it enters the collimating mirror 15 , is collimated by the collimating mirror 15 and enters the FP etalon 16 .
- the FP etalon 16 is composed of two high-parallel high-reflection mirrors. After the light beam enters the FP etalon 16, it is reflected multiple times by the two high-reflection mirrors of the FP etalon 16 to form multi-level light interference, and finally passes through the second converging The mirror 17 converges to the surface of the second photodetection device 18 to form the second interference fringes.
- the second converging lens 17 may be a plano-convex lens or a double-convex lens, or a group of lenses.
- a reflector 26 is installed between the second converging mirror 17 and the second photodetecting device 18 for reflecting light.
- FIG. 5 is a schematic diagram of the second interference fringes produced by the FP etalon provided in the embodiment of the present application.
- d FP is the distance between two high reflection mirrors of the FP etalon
- f 2 is the focal length of the second converging mirror 17
- r is the radius of the second interference fringe.
- the laser beam forms second interference fringes on the second photodetection device 18 after passing through the FP etalon 16 and the second converging mirror 17 .
- ⁇ is the central wavelength of the laser output from the laser
- n 2 is the refractive index of the gas inside the FP etalon
- m 3 is the order of the interference fringes of the FP etalon.
- the radius r of the second interference fringes can be calculated , the central wavelength of the excimer laser can be calculated according to the above formula. Further, since the order m 3 of the interference fringe of the FP etalon 16 is an integer, different m 3 can be selected to obtain a set of precise measurement values of the central wavelength of the excimer laser.
- the accuracy of the roughly measured value of the central wavelength needs to be higher than that of the FP 1/2 of the free spectral range of the standard device 16.
- the control device 4 After determining the final result of the central wavelength of the excimer laser, the control device 4 compares the final result of the central wavelength of the excimer laser with the target central wavelength, and if the calculated final result of the central wavelength of the excimer laser is consistent with the target center If the wavelength is different, the control device 4 can drive the prism in the beam expander 5 in the line width narrowing module 2 to rotate to change the incident angle on the echelle grating in the aforementioned Figure 1 to compensate for the deviation of the central wavelength .
- a rotating mechanism can be installed on at least one prism included in the beam expander 5, and the control module 4 is connected with the rotating mechanism 19, so that the prism can be controlled by the rotating mechanism under the control of the control module 4. rotate.
- the detection module further includes an energy detection device for energy detection of the output of the laser.
- the energy detection device is the third photoelectric detection device 20 as shown in FIG. 1 .
- the third photodetection device 20 may be a CCD.
- the third photodetection device 20 receives another beam after splitting the light beam by the second beam splitter 14 to detect the energy of the laser beam, and the third photodetection device 20 also communicates with the following control
- the relevant control unit in the module 4 is connected to convert the light intensity signal of this part of the light into an electrical signal and send it to the control module 4, and the high voltage electrode in the discharge resonant cavity can be controlled by the control module 4.
- the control module 4 of this embodiment includes a central wavelength rough measurement board 21 , a central wavelength precise measurement board 22 , a laser tuning controller 23 , an energy measurement board 24 and a high voltage power supply controller 25 .
- the control module 4 may also include some of the aforementioned components.
- the central wavelength rough measurement board 21 the central wavelength fine measurement board 22 and the laser tuning controller 23 are included.
- the central wavelength rough measurement board 21 is connected to the first photoelectric detection device 9 and the central wavelength precise measurement board 22 respectively, and the central wavelength precise measurement board 22 is also connected to the output end of the second photoelectric detection device 18 and the laser tuning controller 23
- the input end is connected, and the laser tuning controller 23 is connected to the control mechanism of the prism group in the line width narrowing module 2, and the control mechanism can control the rotation of one or several prisms in the prism group, thereby changing the irradiation on the echelle grating. angle of incident light.
- the central wavelength rough measurement board 21 receives the first interference fringe information output by the first photodetection device 9, and obtains a rough measurement value of the central wavelength according to the first interference fringe information, and then sends the rough measurement value of the central wavelength to the central wavelength Precision test board 22.
- the central wavelength precision measurement board 22 receives the second interference fringe information output by the second photodetection device 18, and obtains the precise measurement value group of the central wavelength according to the second interference fringe information, and compares the precise measurement value group of the central wavelength with the central wavelength
- the rough measured value is obtained, and the fine measured value closest to the rough measured value of the center wavelength is obtained as the final result of the center wavelength of the excimer laser.
- Obtain the final result of the central wavelength and send it to the laser tuning controller 23, the laser tuning controller 23 compares the final result of the central wavelength with the preset target central wavelength, obtains the corresponding adjustment parameter, and controls according to the corresponding adjustment parameter
- the line width narrowing module 2 adjusts the central wavelength.
- the adjustment parameter can be the rotation angle of the prism
- the laser tuning controller 23 drives the rotation mechanism of the prism to compensate the deviation value of the center wavelength, and realizes the closed-loop feedback of the center wavelength.
- the input end of the energy detection board 24 is connected with the output end of the third photoelectric detection device 20, and the output end of the energy detection board 24 is connected with the input end of the high voltage power controller 25; the output end of the high voltage power controller 25 is connected with the The pumping means 27 of the discharge resonator 1 are connected.
- the energy detection board 24 determines the energy information released by the excimer laser according to the electrical signal output by the third photodetection device 20, and calculates the difference between the energy information and the preset energy information, and then adjusts it through the high-voltage power supply controller 25
- the voltage released by the pumping device 27 is used to adjust the energy released by the excimer laser.
- the high-stability excimer laser device of the embodiment of the present application by sharing the prism and the echelle grating 6 in the line width narrowing module 2, realizes laser spectral narrowing, rough measurement and tuning of the central wavelength, and rough measurement and tuning of the central wavelength. Tuning in the same environment can eliminate measurement errors and feedback errors caused by changes in the refractive index of gases, and improve the measurement accuracy of the center wavelength and the stability of the laser.
- the central wavelength precision measurement device only has one FP etalon 16 and energy measurement components, which is compact in structure and small in size, which is conducive to improving the stability of the gas inside the detection module, improving the measurement accuracy and stability of laser energy and central wavelength, and ensuring performance and long-term stability of the laser.
- the control module 4 obtains the central wavelength of the laser through calculation, compares it with the target value of the central wavelength, then calculates the rotation angle of the prism, and then drives the rotating mechanism 19 of the prism to compensate the deviation value of the central wavelength, thereby realizing the closed-loop feedback of the central wavelength, which can Effectively improve the central wavelength stability of the excimer laser.
- the energy of the laser is calculated, and the voltage value that needs to be adjusted by the high-voltage power supply is calculated to control the pumping device 27 of the discharge resonator 1, to realize closed-loop energy feedback of the laser, and to realize the stability of the energy or dose of the laser.
- a high-stability excimer laser device which includes: a discharge resonator 1, a line width narrowing module 2, a detection module, and a control module 4;
- the line width narrowing module 2 includes The beam expander 5 and the echelle grating 6 are arranged sequentially from the laser emission direction on the first side of the discharge resonator 1;
- the detection module includes a central wavelength precise measurement device 3a and a central wavelength rough measurement device 3b, which are respectively used to measure the discharge resonant cavity 1 The central wavelength of the outgoing light is finely measured and roughly measured;
- the control module 4 is connected with the discharge resonant cavity 1, the central wavelength fine measuring device 3a and the central wavelength rough measuring device 3b respectively, and is used to measure according to the central wavelength fine measuring device 3a and the central wavelength
- the measurement results of the rough measuring device 3b adjust the parameters in the discharge resonator 1;
- the control module 4 also includes a laser tuning controller 23, and the laser tuning controller 23 is connected with at least one device of the
- FIG. 6 is a flow chart of the closed-loop control of the energy released by the excimer laser device and the central wavelength provided in the embodiment of the present application.
- Step S601 measuring the central wavelength and energy of the excimer laser device.
- Step S602 respectively calculate the difference between the center wavelength and the target center wavelength, and the difference between the energy and the target energy, according to the difference between the center wavelength and the target center wavelength, and the difference between the energy and the target energy value, the prism adjustment parameters for the line width narrowing module 5 and the voltage adjustment parameters for the pumping device 27 are obtained.
- Step S603 respectively judging whether the prism adjustment parameter and the voltage adjustment parameter are greater than a preset parameter threshold
- Step S604 if the prism adjustment parameter and the voltage adjustment parameter are less than or equal to the preset parameter threshold, then continue to judge whether the excimer laser device is in the light emitting state.
- Step S605 if the excimer laser device is in the state of emitting light, return to step S602. If the excimer laser device is not in the state of emitting light, the control process ends.
- Step S606 if the prism adjustment parameter and the voltage adjustment parameter are greater than the preset parameter threshold, adjust the prism angle of the line width narrowing module 5 and the voltage released by the pumping device 27 according to the prism adjustment parameter and the voltage adjustment parameter, and perform the step S605.
- the high-stability excimer laser device realizes the alignment of the excimer laser through the line width narrowing module 5, the central wavelength rough measurement device 3b, the control module 4, and the central wavelength precise measurement device 3a
- the central wavelength of the excimer laser is accurately measured in real time.
- the control module 4 controls the line width narrowing module 2 to adjust so that the central wavelength of the excimer laser meets the preset center wavelength.
- the above-mentioned device realizes the closed-loop feedback of the central wavelength of the excimer laser, and improves the stability of the laser in the working process.
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Abstract
一种高稳定性准分子激光器装置,包括:放电谐振腔、线宽压窄模块、检测模块以及控制模块;所述线宽压窄模块包括沿由所述放电谐振腔第一侧激光出射方向依次设置的扩束装置和中阶梯光栅;检测模块包括中心波长精测装置和中心波长粗测装置;其中,所述中心波长粗测装置包括反射装置、光束会聚装置及第一光电探测装置,用于进行中心波长粗测;中心波长精测装置设置于与所述放电谐振腔的第一侧相对的第二侧,用于接收由第二侧出射的激光束,并进行中心波长精测;所述控制模块分别与所述放电谐振腔、所述中心波长精测装置和中心波长粗测装置相连接,用于根据所述中心波长精测装置和中心波长粗测装置的测量结果,对放电谐振腔中的参数进行调整。
Description
本申请涉及激光器领域,具体涉及一种高稳定性准分子激光器装置。
准分子激光器输出的激光因具有波长短、线宽窄、能量高的特点,被广泛应用于半导体的芯片加工领域,例如:准分子激光器输出的激光是光刻机领域最常见的光源。
随着芯片加工工艺的不断发展,对芯片的尺寸要求已经达到了28nm、14nm甚至是更小。因此,对用于加工芯片的准分子激光器的要求也越来越高。不仅需要激光器能够释放更高的能量以及具备更窄的光谱,同时需要激光器在工作过程中具备稳定性较高的中心波长。对准分子激光器能量和中心波长在线测量、中心波长和能量闭环装置和闭环反馈控制提出了更高的要求。
在专利US6539046和US6317448,提出了采用的FP标准具和光栅联合的中心波长测量法,FP标准具有极高的波长灵敏度,但测量范围比较小,无法满足准分子激光器全量程测量的需求,为此,需要用光栅法对中心波长先进行粗测,然后用FP标准具进行精测,以实现中心波长大范围和高精度测量。
在专利CN109073463中,采用两个FP标准具同时测量激光器中心波长,其中一路FP标准具自由光谱程比较大,用于中心波长的粗测,另一路FP标准具自由光谱程比较小,用于中心波长的精测,二者结合实现中心波长的大范围和高精度测量。
准分子激光器的窄线宽的产生和中心波长的调谐是通过线宽压窄模块完成的,在专利US6192064、US6560254、US10416471、CN1232010、CN102576974和CN107534266中,使用扩束单元和中阶梯光栅对激光器的光谱宽度进行压窄,并通过调整反射镜、棱镜或中阶梯光栅的角度实现中心波长的控制,用于激光器中心波长的调谐。专利US6985508、CN100397732、CN107851958和CN107925214介绍了准分子激光器能量和中心波长的闭环反馈方法,通过实时测量准分子能量和中心波长并闭环反馈,保障了准分子激光 器长期稳定输出。
因此,如何设计准分子激光器,以使准分子激光器在工作过程中能够具备较为稳定的中心波长成为本领域亟需解决的技术问题。
发明内容
本申请提供一种高稳定性准分子激光器装置,以解决现有技术中存在的问题。
本申请提供的一种高稳定性准分子激光器装置,其包括:放电谐振腔、线宽压窄模块、检测模块以及控制模块;
所述线宽压窄模块包括沿由所述放电谐振腔第一侧激光出射方向依次设置的扩束装置和中阶梯光栅;
所述检测模块包括中心波长精测装置和中心波长粗测装置;其中,所述中心波长粗测装置包括反射装置、光束会聚装置及第一光电探测装置,所述反射装置用于将所述放电谐振腔第一侧出射的部分光束传输至所述中阶梯光栅,所述光束会聚装置设置于所述中阶梯光栅的出射方向,用于将前述部分光束经所述中阶梯光栅的出射光会聚后传输至所述第一光电探测装置;
所述中心波长精测装置设置于与所述放电谐振腔第一侧相对的第二侧,用于接收由所述第二侧出射的激光束,并进行中心波长精测;
所述控制模块分别与所述放电谐振腔、所述中心波长精测装置和中心波长粗测装置相连接,用于根据所述中心波长精测装置和中心波长粗测装置的测量结果,对所述放电谐振腔中的参数进行调整。
可选的,所述扩束装置为扩束棱镜组,中阶梯光栅为色散光栅;
所述反射装置设置于所述扩束棱镜组的光束入射的一侧,且位于所述扩束装置的入射面对入射光反射后的光路中;所述反射装置的设置角度满足在接收所述反射光后将其二次反射至所述中阶梯光栅。
可选的,所述会聚装置为凸透镜或凹面镜;所述第一光电探测装置为电荷耦合器件;
所述光束会聚装置,用于会聚所述色散后的出射光,使所述会聚后的光照射在所述第一光电探测装置的探测表面,形成干涉条纹;
所述第一光电探测装置,用于接收所述干涉条纹,将所述干涉条纹转化为对应的干涉条纹信息,并将所述干涉条纹信息发送至所述控制模块。
可选的,所述反射装置和光束会聚装置设置于所述线宽压窄模块内部。
可选的,所述中心波长精测装置包括沿光束出射方向依次设置的第一分束镜、匀光器、第二分束镜、准直镜、FP标准具、第二会聚镜以及第二光电探测装置;
所述第一分束镜,用于接收由所述放电谐振腔第二侧发射的激光,并对所述激光进行分束,并将分束后的其中一束激光照在所述匀光器上;
所述匀光器设置于所述第一分束镜和所述第二分束镜之间,用于对激光匀化,使匀化后的激光进入所述第二分束镜;
所述第二分束镜,用于对经所述匀光器出射的激光进行分束,并将其中一束激光照射在所述准直镜上;
所述准直镜设置于所述第二分束镜与所述FP标准具之间,用于对照射所述FP标准具上的激光进行准直;
所述FP标准具,用于对经过所述FP标准具的激光进行多次反射,形成多级光干涉,并将所述多级光干涉通过所述第二会聚镜会聚到所述第二光电探测装置,以形成第二干涉条纹。
可选的,所述检测模块还包括能量检测装置,所述能量检测装置包括第三光电探测装置,所述第三光电探测装置设置于所述第二分束镜分束后的另一束光的出射方向上,用于检测激光的激光能量信息,并将所述激光能量信息发送至所述控制装置。
可选的,所述控制装置包括:中心波长粗测板卡、中心波长精测板卡;
所述中心波长粗测板卡分别与所述第一光电探测装置和所述中心波长精测板卡相连;
所述中心波长粗测板卡,用于获得所述第一光电探测装置发送的干涉条纹信息,根据所述第一光电探测装置发送的干涉条纹信息,获得所述激光器波长的粗测值;将所述激光器波长的粗测值发送至所述中心波长精测板卡;
所述中心波长精测板卡还与第二光电探测装置相连;
所述中心波长精测板卡,用于获得所述第二光电探测装置发送的第二干涉条纹信息,根据所述第二干涉条纹信息,获得所述中心波长粗测板卡发送的中心波长粗测值;根据所述第二干涉条纹信息和所述中心波长的粗测值,获得所述中心波长的精测值。
可选的,所述控制装置还包括激光调谐控制器,所述激光调谐控制器与所述 扩束装置的至少一个器件相连,用于调节所述扩束装置照射至所述中阶梯光栅的光束的角度。
可选的,所述激光调谐控制器具体用于根据获得的中心波长的精测值与中心波长目标值的差值调节所述扩束装置至少一个器件旋转,从而调整照射至所述中阶梯光栅的光束的角度。
可选的,所述控制装置包括:能量测量板卡、高压电源控制器;
所述能量测量板卡分别与所述高压电源控制器和所述第三光电探测装置相连;
所述能量测量板卡,用于接收所述第三光电探测装置发送的激光能量信息;根据所述激光能量信息获得所述准分子激光装置输出的激光能量信息,并将所述激光能量信息发送至所述高压电源控制器;所述高压电源控制器,与所述放电谐振腔相连,用于接收所述激光能量信息,并根据所述激光能量信息控制所述放电谐振腔释放的激光能量。
与现有技术相比,本申请具有以下优点:
本申请提供的高稳定性准分子激光器装置,包括:放电谐振腔、线宽压窄模块、检测模块以及控制模块;所述线宽压窄模块包括沿由所述放电谐振腔第一侧激光出射方向依次设置的扩束装置和中阶梯光栅;所述检测模块包括中心波长精测装置和中心波长粗测装置;其中,所述中心波长粗测装置包括反射装置、光束会聚装置及第一光电探测装置,所述反射装置用于将所述放电谐振腔第一侧出射的部分光束传输至所述中阶梯光栅,所述光束会聚装置设置于所述中阶梯光栅的出射方向,用于将前述部分光束经所述中阶梯光栅的出射光会聚后传输至所述第一光电探测装置;所述中心波长精测装置设置于与所述放电谐振腔的第一侧相对的第二侧,用于接收由所述第二侧出射的激光束,并进行中心波长精测;所述控制模块分别与所述放电谐振腔、所述中心波长精测装置和中心波长粗测装置相连接,用于根据所述中心波长精测装置和中心波长粗测装置的测量结果,对放电谐振腔中的参数进行调整。
本申请提供的高稳定性准分子激光器装置,通过线宽压窄模块、中心波长粗测装置,以及检测模块、中心波长精测装置实现对准分子激光器的中心波长实时精确测量,在所述准分子激光器的中心波长不满足预设的中心波长的情况下,使所述驱动调节模块控制所述线宽压窄模块进行调节,以使准分子激光器 的中心波长满足预设的中心波长。上述装置实现了对准分子激光器的中心波长的闭环反馈,提高了激光器在工作过程中的稳定性。
图1为本申请实施例提供的高稳定性准分子激光器装置的结构示意图;
图2为本申请实施例提供的放电谐振腔的结构示意图;
图3为本申请实施例提供的线宽压窄模块和中心波长粗测装置的结构示意图;
图4为本申请实施例提供的中心波长精测模块结构示意图;
图5为本申请实施例提供的FP标准具产生的第二干涉条纹的示意图;
图6为本申请实施例提供的准分子激光器装置释放的能量和中心波长的闭环控制流程图。
在下面的描述中阐述了很多具体细节以便于充分理解本申请。但是,本申请能够以很多不同于在此描述的其他方式来实施,本领域技术人员可以在不违背本申请内涵的情况下做类似推广,因此,本申请不受下面公开的具体实施例的限制。
本申请中使用的术语是仅仅出于对特定实施例描述的目的,而非旨在限制本申请。在本申请中和所附权利要求书中所使用的描述方式例如:“一种”、“第一”、和“第二”等,并非对数量上的限定或先后顺序上的限定,而是用来将同一类型的信息彼此区分。
本申请提供的高稳定性准分子激光器装置,其通过线宽压窄模块、中心波长粗测装置、检测模块以及中心波长精测装置实现对准分子激光器的中心波长实时精确测量,在所述准分子激光器的中心波长偏离预设的中心波长的情况下,可通过线宽压窄模块进行调节,以使准分子激光器的中心波长满足预设的中心波长。上述装置实现了对准分子激光器的中心波长的闭环反馈,提高了激光器在工作过程中的稳定性。
为了便于理解本申请提供的高稳定性准分子激光器装置,以下结合图1、图 2、图3、图4对本申请提供的高稳定性激光器装置进行介绍。
其中,图1为本申请实施例提供的高稳定性准分子激光器装置的结构示意图。图2为本申请实施例提供的放电谐振腔的结构示意图。图3为本申请实施例提供的线宽压窄模块和中心波长粗测装置的结构示意图。图4为本申请实施例提供的中心波长精测模块结构示意图。
本实施例中,所述高稳定性准分子激光器包括:放电谐振腔1、线宽压窄模块2、检测模块3、控制模块4。
放电谐振腔1内设置泵浦装置27,放电谐振腔1内充满惰性气体与卤素气体的混合气体,以及与泵浦装置27相连的电极(EL),例如:对于波长为193nm的激光器,其放电谐振腔1内部为氟(F
2)和氩(Ar)的混合气体;又例如:对于波长为248nm的激光器,其放电谐振腔1内部为氟(F
2)和氪(Kr)的混合气体。
在准分子激光器的工作过程中,放电谐振腔1内的混合气体在泵浦装置27产生的电脉冲的作用下,产生激光,激光在放电谐振腔两侧反射镜反射下,实现谐振放大。该激光由放电谐振腔1的第一侧(本实施例中,以附图1的右侧即朝向线宽压窄模块2的一侧为第一侧)射入线宽压窄模块2。然而,由上述惰性气体和卤素气体的混合气体在电脉冲的作用下产生的激光的自然宽度大约为几百皮米,因此,还需要利用线宽压窄模块2对其产生的激光的光谱进行压窄处理,以使放电谐振腔1的另一侧释放的激光的光谱符合要求。
放电谐振腔1两侧的出光口安装有以CaF
2或熔石英为材料的窗口片10,窗口片10与放电谐振腔1的中轴线之间的夹角成布鲁斯特角,以减少窗口片与出射激光之间的反射,提高激光器发出的激光的能量和偏振度。
线宽压窄模块2包括沿放电谐振腔1的第一侧激光出射方向依次设置的扩束装置5、中阶梯光栅6。
扩束装置5由若干直角三角棱镜组成,用于对进入线宽压窄模块2的激光进行扩束,以减小激光照射在中阶梯光栅6上的发散角。
扩束装置5是线宽压窄模块2的关键部件,也是获得窄线宽激光的重要元件。扩束装置5的各个棱镜对入射至中阶梯光栅6之间的激光进行扩束,其扩束倍数通常为30至60倍,同时棱镜本身的色散特性对入射光谱也具有一定的发散功能,从而为中阶梯光栅6的后续分光提供了前提准备。经扩束装置5扩束之后,激光光束的发散角会被压缩,以减小照在中阶梯光栅6表面的光束发 散角。
另外,为了增加扩束装置5中各个棱镜的透过率,扩束装置5的各个棱镜表面还可以镀有增透膜,以增加棱镜的透过率。
中阶梯光栅6,又称反射式阶梯光栅,中阶梯光栅具有体积小、色散能力强、衍射效率高的特点。中阶梯光栅6具体用于对透过扩束装置5照射在中阶梯光栅6上的激光进行色散,以使其以不同波长的光沿出射角方向展开。光束照射在中阶梯光栅6表面时,其入射光和衍射光满足如下光栅方程(1):
nd(sinθ+sinβ)=mλ (1)
其中,λ为激光器的中心波长,θ为光束在中阶梯光栅6上的入射角,β为光束的出射角,d为光栅常数,n为线宽控制装置中的气体折射率,m为干涉级次。
根据公式(1)可以看出,经过扩束装置5入射到中阶梯光栅6上的不同波长的光将沿着不同的角度展开,因此,只有一部分波长范围很窄的光能够按原路返回至放电谐振腔1。放电谐振腔1的与线宽压窄模块2相对的另一端还安装有输出耦合镜11,输出耦合镜11与线宽压窄模块2构成更大谐振腔,将按原路返回的光进行振荡放大,从而产生更窄线宽的激光输出。此时,因为入射光束的入射角和出射角相等,与中阶梯光栅的闪耀角θ
B基本相等,当扩束装置5的棱镜组的放大倍数为M,入射到线宽压窄模块2的光束角度分布为f(θ)时,从中阶梯光栅出射的光谱沿着角度的分布为如下公式(2)
为了实现更窄光谱,中阶梯光栅的闪耀角一般大于75°,同时在放电腔DC两端加上狭缝,进一步压缩激光器的发散角,经过线宽压窄模块的激光器光谱被大幅压窄,达到0.15至0.5pm左右,该激光波长即可满足半导体制造中光刻光源的需求。
本实施例的高稳定性准分子激光器装置,还包括检测模块3,检测模块3包括:中心波长粗测装置3b和中心波长精测装置3a。本实施例中,中心波长粗测装置,包括:反射装置7、光束会聚装置8、第一光电探测装置9。反射装置7用于将放电谐振腔1第一侧出射的部分光束传输至中阶梯光栅6,光束会聚装置8设置于中阶梯光栅6的出射方向,用于将前述部分光束经中阶梯光栅6的出射光会聚后传输至第一光电探测装置9;
如图1和图3中所示,放电谐振腔1由第一侧出射的激光照射在扩束装置5中的第一个棱镜后,大部分光会经过该第一个棱镜并向第二个棱镜传播,但是仍会有一小部分光在第一个棱镜入射表面发生反射。需要说明的是,即使棱镜组的各个棱镜表面都镀有增透膜,但仍然会有一部分光发生反射,本申请正是利用这一部分发生反射的光完成对准分子激光器的中心波长的粗测过程。
请继续参考图1和图3,反射装置7设置在第一个棱镜的入射面对入射光反射的反射光路中,经反射后的光会照射至反射装置7上,反射装置7可以为平面镜或反射棱镜。设置反射装置的放置角度,使该反射装置7在接收反射光后将反射光二次反射至中阶梯光栅6上。如上所述,本实施例中,中阶梯光栅6为中阶梯光栅。这一部分经反射装置7传输至中阶梯光栅的光束与经扩束装置5照射在中阶梯光栅6上的光的入射角不同,会比中阶梯光栅的闪耀角θ
B小,设入射角为θ
1,这部分光依然会被中阶梯光栅6色散开,其中一个级次(m1)的光束以出射角β
1出射,其入射光和出射光仍然满足上述公式(1)的光栅方程,即:
nd(sinθ
1+sinβ
1)=m
1λ
经中阶梯光栅6的出射光照射在光束会聚装置8上,并被光束会聚装置8聚焦到第一光电探测装置9的感光元件表面,产生第一干涉条纹。本实施例中,光束汇聚透镜8可以为凸透镜(组)或凹面镜,凸透镜表面可以镀增透膜,凹面镜工作面表面可以镀减反膜。第一光电探测装置9具体为一种电荷耦合器件(charge-coupled device,CCD)。在本申请实施例中,第一光电探测装置9用于将第一干涉条纹转换为对应的第一干涉条纹信息,并将第一干涉条纹信息发送至如下的控制模块4。在本申请的一个可选实施例中,第一光电探测装置9采用线阵CCD,
在放电谐振腔1激光波长发生变化时,经过反射装置7反射后照射在中阶梯光栅6表面的光(称为第一路光束)的出射角β
1和波长λ满足以下公式(3):
其中,△λ为中心波长的变化值,n为线宽压窄装置中的气体折射率,△β
1为激光出射角的变化值,m
1为干涉级次,d为光栅常数。
进一步的,如果设光束会聚装置8的焦距为f
1,第一干涉条纹的峰值位置为 x,则干涉条纹的峰值变化与激光器中心波长的变化满足以下公式(4):
其中,△λ为中心波长的变化值,△x为第一干涉条纹峰值的变化值,β
1为激光出射角。
由上述公式(4)可见,准分子激光器的中心波长的变化与第一干涉条纹的峰值位置变化呈正比,第一光电探测装置9采集第一干涉条纹信息并将其发送至控制模块4,控制模块4可以根据第一干涉条纹信息计算并获得第一干涉条纹的峰值位置,就可以得到准分子激光器的中心波长变化△λ的粗测值。中心波长λ=λ
0+△λ,λ
0为中心波长的理论值,因此得到中心波长的粗测值。
上述的实施例中,通过共用在线宽压窄模块中的棱镜和中阶梯光栅,同时实现了激光器的线宽压窄与中心波长粗测。如下面,该中心波长粗测可以与中心精确测量相结合,实现对谐振腔中心波长调谐。该方案使得激光器整体结构紧凑,稳定性和精确性大大提高。因此,所述的反射装置7(或反射装置7和光束会聚装置8),可以设置于所述线宽压窄模块2的内部,使得结构更为紧凑。当然,上述部件也可以设置于线宽压窄模块2的外部,本领域技术人员可以根据实际需要做出调整。
如上所述,本实施例中利用扩束装置第一个棱镜的反射光,在其他实施例中,还可以直接从第一侧输出的光束分光获得用于粗测的光束,或者利用扩束装置的棱镜组中任一棱镜的反射面的反射光,在此不再赘述,任何利用第一侧输出光束的部分光束并结合线宽压窄装置的中阶梯光栅6实现中心波长粗测的方案均包含在本申请保护范围之内。
此外,优选的,第一光电探测装置9安装在线宽压窄模块2外部,以防止第一光电探测装置9的电路板和电子元件对线宽压控制模块2产生污染。
另外,本申请实施例提供的线宽压窄模块2还能实现中心波长的调谐,经过扩束装置5入射到中阶梯光栅6的一部分波长范围很窄的光原路返回至放电谐振腔1,此时这部分光束的出射角度与入射角度相同,假设透过扩束装置5光线入射进入中阶梯光栅6的激光的入射角为θ
2,根据公式(1)的光栅方程可知,此时激光的波长λ满足以下公式(5):
其中,n为线宽压窄模块2中的气体折射率,m
2为干涉级次,d为光栅常数。
由此可见,通过改变光线入射到中阶梯光栅的角度就可以改变激光器的中心波长。如图1和图3所示,改变棱镜组最后一个棱镜的角度,经过该棱镜折射光的角度也发生改变,入射到中阶梯光栅的角度也发生改变,从而改变了激光器的中心波长,当然,除了旋转最后一个棱镜也可以棱镜组中的其它任何一个棱镜,同样可以实现中心波长的调谐。通过控制机构可控制棱镜的旋转,下面将具体描述。
另外,通过上述公式(4)和(5)可知,激光器的中心波长的粗测与调谐均与线宽压窄模块2内部气体的气体折射率n相关,折射率变化,会引起激光器中心波长的改变,同时也会引起粗测波长的变化。而利用从激光器出射后被分束在线宽压窄模块2内的光束对准分子激光器的中心波长进行粗测,意味着获得对中心波长进行粗测和调谐过程中气体折射率n是一致的。因此,本申请提供的准分子激光器波长的粗测装置3b,可以消除气体折射率变化引起的粗测误差,提高了中心波长粗测时的粗测精度。
此外,本申请的实施例中,检测模块3还包括中心波长精测装置3a。本实施例中,中心波长精测装置3a设置于与放电谐振腔1的第一侧相对的第二侧。如图1中所示。输出耦合镜11设置于放电谐振腔1第二侧。中心波长精测装置3a具体用于获得由准分子激光器的输出耦合镜11发出的窄线宽的激光的第二干涉条纹信息。
如图1和图4所示,中心波长精测装置3a包括第一分束镜12、匀光器13、第二分束镜14、准直镜15、FP标准具16、第二会聚镜17、第二光电探测装置18。
第一分束镜12用于接收放电谐振腔1第二侧发射的激光,并对放电谐振腔1第二侧发射的激光进行分束,并将分束后的其中一束激光照在匀光器13上。其中匀光器13可以是积分棒、微透镜阵列或者是衍射光学元件,也可以是这几种元件的组合。目的是对入射的光束进行匀化。
匀化后的光被第二分束镜14分束,一部分进入准直镜15,被准直镜15准直并进入FP标准具16。
FP标准具16有两片高度平行的高反镜组成,光束进入FP标准具16后,经过FP标准具16的两片高反镜的多次反射,形成多级光干涉,最后经第二会 聚镜17,会聚到第二光电探测装置18表面,形成第二干涉条纹。其中,第二会聚镜17可以是平凸透镜或双凸透镜,也可以是一组透镜。另外,为了减少中心波长精测装置3a的体积,第二会聚镜17和第二光电探测装置18之间还安装有反射镜26,用于对光线进行反射。
请参考图5,其为本申请实施例提供的FP标准具产生第二干涉条纹的示意图。如图5所示,d
FP为FP标准具的两个高反镜之间的间距,f
2为第二会聚镜17的焦距,r为第二干涉条纹的半径。激光束在经过FP标准具16和第二会聚镜17后在第二光电探测装置18上形成第二干涉条纹。
假设λ为激光器输出激光的中心波长,n
2为FP标准具内气体的折射率,m
3为FP标准具干涉条纹的级次。则第二干涉条纹满足以下公式(6):
可见,第二光电探测装置18在将第二干涉条纹转换为对应的第二干涉条纹信息后,将第二干涉条纹信息发送至下述的控制模块后,可计算得到第二干涉条纹的半径r,根据上述公式即可计算得到准分子激光器的中心波长。进一步的,因为FP标准具16干涉条纹的级次m
3为整数,可以选取不同的m
3,以获得准分子激光器的中心波长的精测值组。同时,将准分子激光器的中心波长的精测值组中的各个精测值与准分子激光器的中心波长的粗测值进行比较,获得与中心波长粗测值最为接近的精测值,作为准分子激光器中心波长的最终结果。
另外,为了避免出现FP标准具16的不同干涉级次计算得到的中心波长的值与中心波长粗测值都比较接近,不易确定干涉级次,需要让中心波长的粗测值的精度高于FP标具器16的自由光谱程的1/2。
在确定完准分子激光器的中心波长的最终结果后,控制装置4将准分子激光器的中心波长的最终结果与目标中心波长进行对比,如果计算得到的准分子激光器的中心波长的最终结果与目标中心波长不同,则控制装置4可驱动线宽压窄模块2中的扩束装置5中的棱镜旋转,以改变入射到前述图1中的中阶梯光栅上的入射角,以补偿中心波长的偏差值。具体而言,为了实现上述控制过程,可以在扩束装置5中包含的至少一个棱镜上安装旋转机构,控制模块4与旋转机构19相连,以在控制模块4的控制下通过旋转机构对棱镜进行旋转。
此外,检测模块还包括能量检测装置,以对激光器输出进行能量检测,本实施例中,能量检测装置为如图1所示的第三光电探测装置20。第三光电探测装 置20可以是CCD。具体而言,通过第三光电探测装置20接收第二分束镜14在将光束分束后的另一束,以实现对激光束能量进行探测,第三光电探测装置20还与下述的控制模块4中相关控制单元相连接,以将这一部分光的光强信号转化为电信号并发送至控制模块4,通过控制模块4可控制对放电谐振腔中的高压电极进行控制。
请继续参考图1,本实施例的控制模块4包括中心波长粗测板卡21、中心波长精测板卡22、激光调谐控制器23、能量测量板卡24以及高压电源控制器25。当然,控制模块4也可以包括前述组件中的部分组件。例如仅包括中心波长粗测板卡21、中心波长精测板卡22和激光调谐控制器23。
中心波长粗测板卡21与第一光电探测装置9、中心波长精测板卡22分别相连,中心波长精测板卡22还与第二光电探测装置18的输出端以及激光调谐控制器23的输入端相连,激光调谐控制器23的连接至线宽压窄模块2中的棱镜组的控制机构上,该控制机构可控制棱镜组中一个或几个棱镜的旋转,从而改变照射在中阶梯光栅上入射光的角度。
中心波长粗测板卡21接收第一光电探测装置9的输出的第一干涉条纹信息,并根据第一干涉条纹信息获得中心波长的粗测值,进而将中心波长的粗测值发送至中心波长精测板卡22。
中心波长精测板卡22接收第二光电探测装置18输出的第二干涉条纹信息,并根据第二干涉条纹信息获得中心波长的精测值组,同时对比中心波长的精测值组和中心波长的粗测值,获得与中心波长粗测值最为接近的精测值,作为准分子激光器中心波长的最终结果。获得中心波长的最终结果,并发送至激光调谐控制器23,激光调谐控制器23将中心波长的最终结果与预设的目标中心波长进行对比,获得对应的调节参数,并根据对应的调节参数控制线宽压窄模块2调节中心波长。具体而言,调节参数可以是棱镜旋转角度,然后激光调谐控制器23驱动棱镜的旋转机构,去补偿中心波长的偏差值,实现了中心波长的闭环反馈,通过提升中心波长测量和反馈精度以及闭环反馈单元的速度,可以有效提升准分子激光器的中心波长稳定性,从而可以满足光刻机对光源波长稳定性的需求。
此外,能量检测板卡24的输入端与第三光电探测装置20的输出端相连,能量检测板卡24的输出端与高压电源控制器25的输入端相连;高压电源控制器25的输出端与放电谐振腔1的泵浦装置27相连。能量检测板卡24根据第三光电探测装置20输出的电信号确定准分子激光器释放的能量信息,并计算该能 量信息与预设的能量信息之间的差值,进而通过高压电源控制器25调整泵浦装置27释放的电压,以调节准分子激光器释放的能量。
本申请实施例的高稳定性准分子激光器装置,通过共用在线宽压窄模块2中的棱镜和中阶梯光栅6,实现了激光器光谱压窄、中心波长粗测和调谐,中心波长的粗测和调谐同在一个环境中,可以消除气体折射率变化引起的测量误差和反馈误差,提升了中心波长测量精度和激光器稳定性。同时,中心波长精测装置只有一路FP标准具16和能量测量组件,结构紧凑,体积小,有利于提升检测模块内部的气体的稳定性,提高激光器能量和中心波长的测量精度和稳定性,保障了激光器的性能和长期稳定性。
控制模块4通过计算得到激光器中心波长,与中心波长目标值进行对比,然后计算出棱镜旋转角度,然后驱动棱镜的旋转机构19,去补偿中心波长的偏差值,实现了中心波长的闭环反馈,可以有效提升准分子激光器的中心波长稳定性。通过能量反馈控制链路,计算得到激光器能量,计算出需要高压电源调整的电压值,去控制放电谐振腔1的泵浦装置27,实现激光器的能量闭环反馈,实现激光器能量或者剂量的稳定性。
本申请的另外的实施例,还提供一种高稳定性准分子激光器装置,其包括:放电谐振腔1、线宽压窄模块2、检测模块以及控制模块4;线宽压窄模块2包括沿由放电谐振腔1第一侧激光出射方向依次设置的扩束装置5和中阶梯光栅6;检测模块包括中心波长精测装置3a和中心波长粗测装置3b,分别用于对述放电谐振腔1的出射光中心波长进行精测和粗测;控制模块4分别与放电谐振腔1、中心波长精测装置3a和中心波长粗测装置3b相连接,用于根据中心波长精测装置3a和中心波长粗测装置3b的测量结果,对放电谐振腔1中的参数进行调整;控制模块4还包括激光调谐控制器23,激光调谐控制器23与扩束装置5的至少一个器件相连,用于调节扩束装置5照射至中阶梯光栅的光束的角度。
为了便于理解上述对准分子激光器装置释放的能量和中心波长的控制,以下结合图6对上述控制过程进行介绍。请参考图6,其为本申请实施例提供的准分子激光器装置释放的能量和中心波长的闭环控制流程图。
上述过程是在激光器正常工作的前提下,执行如下步骤:
步骤S601,测量准分子激光器装置的中心波长和能量。
步骤S602,分别计算中心波长与目标中心波长之间的差值,和能量与目标 能量之间的差值,根据中心波长与目标中心波长之间的差值,和能量与目标能量之间的差值,获得针对线宽压窄模块5的棱镜调节参数和针对泵浦装置27的电压调节参数。
步骤S603,分别判断棱镜调节参数和电压调节参数是否大于预设的参数阈值;
步骤S604,若棱镜调节参数和电压调节参数小于或等于预设的参数阈值,则继续判断准分子激光器装置是否处于出光状态。
步骤S605,若准分子激光器装置处于出光状态,则返回步骤S602。若准分子激光器装置不处于出光状态,则控制流程结束。
步骤S606,若棱镜调节参数和电压调节参数大于预设的参数阈值,则根据棱镜调节参数和电压调节参数,调整线宽压窄模块5的棱镜角度和泵浦装置27释放的电压,并执行步骤S605。
综上所述,本申请实施例提供的高稳定性准分子激光装置,通过线宽压窄模块5、中心波长粗测装置3b,以及控制模块4、中心波长精测装置3a实现对准分子激光器的中心波长实时精确测量,在准分子激光器的中心波长不满足预设的中心波长的情况下,使控制模块4控制线宽压窄模块2进行调节,以使准分子激光器的中心波长满足预设的中心波长。上述装置实现了对准分子激光器的中心波长的闭环反馈,提高了激光器在工作过程中的稳定性。
本申请虽然以较佳实施例公开如上,但其并不是用来限定本申请,任何本领域技术人员在不脱离本申请的精神和范围内,都可以做出可能的变动和修改,因此本申请的保护范围应当以本申请权利要求所界定的范围为准。
Claims (10)
- 一种高稳定性准分子激光器装置,其特征在于,包括:放电谐振腔(1)、线宽压窄模块(2)、检测模块以及控制模块(4);所述线宽压窄模块(2)包括沿由所述放电谐振腔(1)第一侧激光出射方向依次设置的扩束装置(5)和中阶梯光栅(6);所述检测模块包括中心波长精测装置(3a)和中心波长粗测装置(3b);其中,所述中心波长粗测装置(3b)包括反射装置(7)、光束会聚装置(8)及第一光电探测装置(9),所述反射装置(7)用于将所述放电谐振腔(1)第一侧出射的部分光束传输至所述中阶梯光栅(6),所述光束会聚装置(8)设置于所述中阶梯光栅(6)的出射方向,用于将前述部分光束经所述中阶梯光栅(6)的出射光会聚后传输至所述第一光电探测装置(9);所述中心波长精测装置(3a)设置于与所述放电谐振腔(1)第一侧相对的第二侧,用于接收由所述第二侧出射的激光束,并进行中心波长精测;所述控制模块(4)分别与所述放电谐振腔(1)、所述中心波长精测装置(3a)和中心波长粗测装置(3b)相连接,用于根据所述中心波长精测装置(3a)和中心波长粗测装置(3b)的测量结果,对所述放电谐振腔(1)中的参数进行调整。
- 根据权利要求1所述的装置,其特征在于,所述扩束装置(5)为扩束棱镜组;所述反射装置(7)设置于所述扩束棱镜组的光束入射的一侧,且位于所述扩束装置(5)的入射面对入射光反射后的光路中;所述反射装置(7)的设置角度满足在接收所述反射光后将其二次反射至所述中阶梯光栅(6)。
- 根据权利要求2所述的装置,其特征在于,所述光束会聚装置(8)为凸透镜或凹面镜;所述第一光电探测装置(9)为电荷耦合器件;所述光束会聚装置(8),用于会聚所述色散后的出射光,使所述会聚后的光照射在所述第一光电探测装置(9)的探测表面,形成干涉条纹;所述第一光电探测装置(9),用于接收所述干涉条纹,将所述干涉条纹转化为对应的干涉条纹信息,并将所述干涉条纹信息发送至所述控制模块(4)。
- 根据权利要求1至3任一所述的装置,其特征在于,所述反射装置(7)和光束会聚装置(8)设置于所述线宽压窄模块(2)内部。
- 根据权利要求1所述的装置,其特征在于,所述中心波长精测装置(3a)包括沿光束出射方向依次设置的第一分束镜(12)、匀光器(13)、第二分束镜(14)、准直镜(15)、FP标准具(16)、第二会聚镜(17)以及第二光电探测装置(18);所述第一分束镜(12),用于接收由所述放电谐振腔(1)第二侧发射的激光,并对所述激光进行分束,并将分束后的其中一束激光照在所述匀光器(13)上;所述匀光器(13)设置于所述第一分束镜(14)和所述第二分束镜(17)之间,用于对激光匀化,使匀化后的激光进入所述第二分束镜(17);所述第二分束镜(14),用于对经所述匀光器(13)出射的激光进行分束,并将其中一束激光照射在所述准直镜(15)上;所述准直镜(15)设置于所述第二分束镜(17)与所述FP标准具(16)之间,用于对照射所述FP标准具上的激光进行准直;所述FP标准具(16),用于对经过所述FP标准具(16)的激光进行多次反射,形成多级光干涉,并将所述多级光干涉通过所述第二会聚镜(17)会聚到所述第二光电探测装置(18),以形成第二干涉条纹。
- 根据权利要求5所述的装置,其特征在于,所述检测模块(4)还包括能量检测装置(20),所述能量检测装置包括第三光电探测装置(20),所述第三光电探测装置(20)设置于所述第二分束镜(14)分束后的另一束光的出射方向上,用于检测激光的激光能量信息,并将所述激光能量信息发送至所述控制装置。
- 根据权利要求1、2、3、5或6所述的装置,其特征在于,所述控制装置包括:中心波长粗测板卡(21)、中心波长精测板卡(22);所述中心波长粗测板卡(21)分别与所述第一光电探测装置(9)和所述中心波长精测板卡(22)相连;所述中心波长粗测板卡(21),用于获得所述第一光电探测装置(9)发送的干涉条纹信息,根据所述第一光电探测装置(9)发送的干涉条纹信息,获得所述激光器波长的粗测值;将所述激光器波长的粗测值发送至所述中心波长精测板卡(22);所述中心波长精测板卡(22)还与第二光电探测装置(18)相连;所述中心波长精测板卡(22),用于获得所述第二光电探测装置(18)发送的第二干涉条纹信息,根据所述第二干涉条纹信息,获得所述中心波长粗测板卡(21)发送的中心波长粗测值;根据所述第二干涉条纹信息和所述中心波长的粗测值,获得所述中心波长的精测值。
- 根据权利要求7所述的装置,其特征在于,所述控制装置(4)还包括激光调谐控制器(23),所述激光调谐控制器(23)与所述扩束装置(5)的至少一个器件相连,用于调节所述扩束装置(5)照射至所述中阶梯光栅(6)的光束的角度。
- 根据权利要求8所述的装置,其特征在于,所述激光调谐控制器(23)具体用于根据获得的中心波长的精测值与中心波长目标值的差值调节所述扩束装置(5)至少一个器件旋转,从而调整照射至所述中阶梯光栅(6)的光束的角度。
- 根据权利要求7所述的装置,其特征在于,所述控制装置(4)包括:能量测量板卡(24)、高压电源控制器(25);所述能量测量板卡(24)分别与所述高压电源控制器(25)和所述第三光电探测装置(20)相连;所述能量测量板卡(24),用于接收所述第三光电探测装置(20)发送的激光能量信息;根据所述激光能量信息获得所述准分子激光装置输出的激光能量信息,并将所述激光能量信息发送至所述高压电源控制器(25);所述高压电源控制器(25),与所述放电谐振腔(1)相连,用于接收所述激光能量信息,并根据所述激光能量信息控制所述放电谐振腔(1)释放的激光能量。
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US6317448B1 (en) * | 1999-09-23 | 2001-11-13 | Cymer, Inc. | Bandwidth estimating technique for narrow band laser |
CN102155997A (zh) * | 2011-03-16 | 2011-08-17 | 中国科学院上海光学精密机械研究所 | 光纤型激光波长计 |
CN105973480A (zh) * | 2016-07-14 | 2016-09-28 | 中国科学院上海光学精密机械研究所 | 光栅二次衍射型激光波长计 |
CN113659417A (zh) * | 2021-07-01 | 2021-11-16 | 北京科益虹源光电技术有限公司 | 高稳定性准分子激光器装置 |
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