WO2023020300A1 - 一种激光辅助电沉积制备梯度镀层的方法及装置 - Google Patents

一种激光辅助电沉积制备梯度镀层的方法及装置 Download PDF

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WO2023020300A1
WO2023020300A1 PCT/CN2022/110471 CN2022110471W WO2023020300A1 WO 2023020300 A1 WO2023020300 A1 WO 2023020300A1 CN 2022110471 W CN2022110471 W CN 2022110471W WO 2023020300 A1 WO2023020300 A1 WO 2023020300A1
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laser
substrate
layer
workpiece substrate
workpiece
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PCT/CN2022/110471
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French (fr)
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沈文嵘
徐坤
唐阳帆
冷志豪
张朝阳
鲁金忠
王亮
张嘉蓓
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江苏大学
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34—Pretreatment of metallic surfaces to be electroplated
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating

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  • the invention relates to the technical field of composite special processing, in particular to a method and device for preparing gradient coatings by laser-assisted electrodeposition, which is suitable for the preparation of high-performance surface coatings.
  • Electrodeposition technology is a reduction reaction, which is mainly applied to the surface coating of workpieces to modify and modify them to improve surface properties.
  • a single electrodeposition technology will have low deposition rate, poor uniformity of deposition layer and defects such as pinholes, pitting and internal stress during the manufacturing process.
  • Laser-assisted electrodeposition technology uses the high energy density of the laser beam to assist the electrochemical reaction process in the electrodeposition process, which can increase the deposition rate and improve the coating performance.
  • the above invention prepares gradient coatings by changing electrochemical parameters such as current density and duty cycle. Although a single electrochemical parameter can be changed to obtain a coating with better functionality and a dense surface, there are many parameter variable groups, which reduces production efficiency and increases costs in industrial production.
  • the ideal gradient coating should achieve a complete gradient change in composition and structure from the substrate to the coating surface, but the existing methods for preparing gradient coatings do not have high bonding strength with the substrate, and are less affected by external forces in practical applications. Easy to peel off.
  • the present invention provides a method for preparing gradient coatings by laser-assisted electrodeposition.
  • This method can simultaneously prepare a three-layer gradient structure of substrate-remelting layer-coating, which is used to eliminate coatings.
  • the interface between the material and the base material is conducive to the combination of the coating and the base, and improves the peeling phenomenon of the coating.
  • the device provided by the present invention can realize the relative movement between the laser beam and the substrate of the workpiece, so that the heat accumulation effect of multiple pulsed lasers can be used to induce instantaneous remelting on the surface of the workpiece.
  • the present invention achieves the above-mentioned technical purpose through the following technical means.
  • a method for preparing gradient coatings by laser-assisted electrodeposition While using pulsed laser and electrochemical reaction to electrodeposit the deposited layer on the substrate of the workpiece, the heat of the pulsed laser is used to remelt the deposited layer on the surface of the workpiece substrate to obtain a uniform distribution. remelted layer.
  • the residual thermal stress of the pulsed laser is used to induce an electrochemical reaction on the upper surface of the remelted layer to obtain a coating.
  • a device for preparing a gradient coating by laser-assisted electrodeposition including a laser irradiation system, a control system, and an electrochemical processing system; Above; the control system is used to control the laser irradiation system and the electrochemical processing system; in the process of laser processing and electrochemical reaction, the laser beam and the workpiece substrate move relatively.
  • a separator is provided between the workpiece substrate and the anode substrate in the processing system.
  • the workpiece substrate and the anode substrate are attached to the separator.
  • the separator is made of corrosion-resistant insulating material.
  • the laser irradiation system includes a pulsed laser, a reflecting mirror and a focusing lens; the laser is emitted by the pulsed laser, the transmission direction is changed by the reflecting mirror, and then focused by the focusing lens, and the focused laser beam is irradiated on the workpiece substrate.
  • control system includes a computer and a motion controller; the computer controls the pulse laser, the DC pulse power supply and the motion controller; the motion controller controls the x-y-z three-axis motion platform.
  • the processing system includes a DC pulse power supply, a working tank, a workpiece substrate, an anode substrate, a separator, and an x-y-z three-axis motion platform; the working tank is installed on the x-y-z three-axis motion platform; the positive pole of the DC pulse power supply It is connected to the anode substrate, and the negative electrode is connected to the workpiece substrate; the workpiece substrate and the anode substrate are attached to the upper and lower sides of the separator and completely immersed in the deposition solution.
  • the method of the present invention can synchronously prepare the three-layer gradient structure of substrate-remelting layer-coating, eliminate the interface between coating material and base material, facilitate the combination of coating and base, improve the peeling phenomenon of coating, and can also Guarantee the surface properties of the workpiece substrate.
  • the obtained remelted layer is a metallurgical combination of the substrate and the deposited layer, with uniform texture and high bonding force.
  • the device of the present invention can realize the relative movement between the laser beam and the substrate of the workpiece, so that the heat accumulation effect of multiple pulsed lasers can be used to induce instantaneous remelting on the surface of the workpiece.
  • a partition is set between the workpiece substrate and the anode substrate, the partition prevents electrolysis of the back of the workpiece substrate and the anode substrate, and at the same time facilitates the installation and positioning of the workpiece substrate and the anode substrate.
  • the thickness of the coating is controllable, changing the composition of the deposition solution or the electrochemical parameters to continue to prepare a new coating on the surface of the coating can achieve a multi-layer gradient structure.
  • Fig. 1 is a schematic diagram of a device for preparing gradient coatings by laser-assisted electrodeposition according to an embodiment of the present invention
  • Fig. 2 is the substrate-remelting layer-plating layer gradient structure schematic diagram in processing
  • Figure 3 is a schematic diagram of pulsed laser heat accumulation.
  • first and second are used for descriptive purposes only, and cannot be interpreted as indicating or implying relative importance or implicitly specifying the quantity of indicated technical features. Thus, a feature defined as “first” and “second” may explicitly or implicitly include one or more of these features.
  • “plurality” means two or more, unless otherwise specifically defined.
  • a method for preparing a gradient coating by laser-assisted electrodeposition in which a deposition layer 18 is electrodeposited on a workpiece substrate 12 using pulsed laser and electrochemical reaction, and at the same time, the heat of the pulsed laser is used to remelt the deposition layer 18 on the surface of the workpiece substrate 12, A uniformly distributed remelted layer 19 is obtained.
  • the residual thermal stress of the pulsed laser is used to induce an electrochemical reaction on the upper surface of the remelted layer 19 to obtain the coating 20 .
  • a device for preparing a gradient coating by laser-assisted electrodeposition including a laser irradiation system, a control system, and an electrochemical processing system; Above; the control system is used to control the laser irradiation system and the electrochemical processing system; in the process of laser processing and electrochemical reaction, the laser beam 17 and the workpiece substrate 12 move relatively.
  • a separator 11 is provided between the workpiece substrate 12 and the anode substrate 10 in the processing system.
  • the workpiece substrate 12 and the anode substrate 10 are attached to the separator 11 .
  • the separator 11 is made of corrosion-resistant insulating material.
  • the laser irradiation system includes a pulsed laser 1, a reflector 2 and a focusing lens 3;
  • the focused laser beam 17 is irradiated on the workpiece substrate 12;
  • the control system includes a computer 15 and a motion controller 14;
  • the computer 15 controls the pulse laser 1, the DC pulse power supply 13 and the motion controller 14;
  • the motion control The device 14 controls the x-y-z three-axis motion platform 9;
  • the electrochemical machining system includes a DC pulse power supply 13, a working tank 4, a workpiece substrate 12, an anode substrate 10, a separator 11 and an x-y-z three-axis moving platform 9;
  • the working tank 4 Installed on the x-y-z three-axis motion platform 9;
  • the positive pole of the DC pulse power supply 13 is connected to the anode substrate 10, and the negative pole is connected to the workpiece substrate 12;
  • the workpiece substrate 12 and the anode substrate 10 are attached to the upper and lower sides of the separator 11 and completely immer
  • a working fluid circulation system the working fluid circulation system includes a liquid storage tank 8, a micropump 7, a filter 6 and a throttle valve 5; the inlet of the micropump 7 is connected to the liquid storage tank 8, the outlet is connected to the working tank 4, and the The filter 6 is connected in series with the throttle valve 5 in the circuit.
  • the micropump works to ensure that the concentration of the solution in the working tank is uniform.
  • the thermal effect of the laser and the electrodeposition reaction are used to obtain a gradient coating with a remelted layer 19 structure on the surface of the workpiece.
  • the positive pole and negative pole of the DC power supply 13 are respectively connected to the anode substrate 10 and the workpiece substrate 12, and the ammeter 16 is connected in series to form an electrodeposition circuit;
  • the laser beam 17 is focused by the optical path transmission system and the focusing lens 3, irradiates on the surface of the workpiece substrate 12, induces electrodeposition reaction in the laser irradiation area to form the deposited layer 18, and utilizes the heat accumulation effect of multiple pulse lasers to induce Instantaneous remelting, so that the components of the deposited layer 18 and the substrate 12 are mixed to form a remelted layer 19 .
  • the residual heat continues to induce electrochemical deposition on the surface of the remelting layer 19 to realize a three-layer gradient structure of the substrate 12 - the remelting layer 19 - the coating layer 20 .
  • the concrete implementation method of the present invention is as follows:
  • the workpiece substrate 12 and the anode substrate 10 are relatively and parallelly pasted on both sides of the separator 11, the upper surface of the separator 11 is pasted with the workpiece substrate 12 and connected with the negative electrode of the electrochemical power supply 13, the lower surface of the separator 11 is pasted with the anode substrate 10 and Connect to the positive electrode of the electrochemical power supply 13;
  • the workpiece substrate 12 and the lower end of the anode substrate 10 are immersed in the deposition solution.
  • the power is turned on, the workpiece substrate 12 and the anode substrate 11 form an electrochemical circuit in the deposition solution and the micropump 7 is turned on for circulating liquid replacement to ensure the solution in the working tank 4.
  • Electrodeposition can occur, for example, localized deposition occurs when the laser single pulse energy is greater than 4.5uj;
  • the pulse laser 1 set the movement path and laser parameters, and use the thermal effect of the laser to accelerate the electrodeposition reaction in the irradiated area to induce the deposition layer 18; at the same time, the heat accumulation of multiple pulse lasers causes instantaneous remelting on the surface of the workpiece, thereby obtaining a uniform distribution After the remelting layer 19, the residual thermal stress is used to induce electrochemical deposition to form the coating 20; after continuous processing, a three-layer gradient structure of the substrate 18-remelting layer 19-coating 20 can be obtained.
  • the laser when the laser is added to induce electrochemical deposition, the original electrochemical parameters do not need to be adjusted.
  • the electrochemical parameters and laser parameters are different. This scheme takes electroplating gold as an example. For example, when the electrochemical voltage is 2.4v, the electrodeposition reaction does not occur.
  • the laser single pulse energy is 5uj, and the electrochemical deposition reaction can occur. Among them, the laser pulse frequency is not greater than 2Mhz.

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  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

本发明公开了一种激光辅助电沉积制备梯度镀层的方法及装置，在工件基板上利用脉冲激光和电化学反应电沉积出沉积层的同时利用脉冲激光的热量对工件基板表面的沉积层进行重熔，获得均匀分布的重熔层，随后利用残余热量诱导电镀，在重熔层表面获得镀层。本发明方法可以同步制备出基材-重熔层-镀层的三层梯度结构，消除了镀层材料与基体材料的界面，有利于镀层与基体的结合，改善了镀层剥落现象，同时还能保证工件基板的表面性能。另外，本发明装置可以实现激光束和工件基板之间的相对运动，从而可利用多个脉冲激光的热量累积效应在工件表面引发瞬时重熔。

Description

一种激光辅助电沉积制备梯度镀层的方法及装置 技术领域
本发明涉及复合特种加工技术领域，尤其涉及到一种激光辅助电沉积制备梯度镀层的方法及装置，适用于高性能表面镀层的制备。
背景技术
电沉积技术的本质是还原反应，主要应用于工件表面镀层，对其进行修饰、改性，提高表面性能。单一的电沉积技术在制造过程中会出现沉积速率低，沉积层均匀性差和针孔、麻点以及内应力等缺陷。激光辅助电沉积技术是利用激光束所具有的高能量密度来辅助电沉积过程中的电化学反应过程，可提高沉积速率、改善镀层性能。
国内外对于制备梯度镀层有一定研究，中国专利“一种耐磨抗蚀Ni-Co-B-Sc梯度镀层及其制备方法”中调节电镀液pH值为3～6，按照以下电流密度档位循环电镀一定时间：0.1～0.3A/dm 2、0.3～0.5A/dm 2、0.5～0.7A/dm 2、0.7～0.9A/dm 2，每档电流密度电镀时间1～5min，时间到了就切换至下一档，最后一档时间到切换至第一档，如此循环一定的总电镀时间最终得到梯度结构的镀层。中国专利“一种还原氧化石墨烯-镍基梯度镀层及其制备方法”中在镀液中添加了氧化石墨烯，并采用功能梯度电镀工艺，所得梯度镀层中含有还原氧化石墨烯，能够有效增强镀层抵抗腐蚀性物质侵扰的能力。具体方式为依次进行第一电镀、第二电镀和第三电镀；所述第一电镀的占空比为0.70～0.85，第二电镀的占空比为0.55～0.60，第三电镀的占空比为0.20～0.40从而得到所述梯度镀层。
以上发明是通过改变电流密度、占空比等电化学参数制备梯度镀层。改变单一的电化学参数虽然能得到功能性较好，表面致密的镀层，但是参数变量组较多，工业生产中降低了生产效率，成本上升。对镀层来说，理想的梯度镀层应该是从基体到镀层表面实现完全的组成与结构的梯度变化，但是现有制备梯度镀层的方法与基体的结合强度不高，在实际应用中受到外力影响较易剥落。
发明内容
针对现有技术中存在不足，本发明提供了一种激光辅助电沉积制备梯度镀层的方法，本方法可以同步制备出基材-重熔层-镀层的三层梯度结构，该结构用于消除镀层材料与基体材料的界面，有利于镀层与基体的结合，改善了镀层剥落现象。另外，本发明提供的装置可以实现激光束和工件基板之间的相对运动，从而可利用多个脉冲激光的热量累积效应在工件表面引发瞬时重熔。
本发明是通过以下技术手段实现上述技术目的的。
一种激光辅助电沉积制备梯度镀层的方法，在工件基板上利用脉冲激光和电化学反应电沉积出沉积层的同时利用脉冲激光的热量对工件基板表面的沉积层进行重熔，获得均匀分布的重熔层。
进一步的，在获得重熔层的同时利用脉冲激光的残余热应力诱导重熔层上表面发生电化学反应得到镀层。
一种激光辅助电沉积制备梯度镀层的方法的装置，包括激光辐照***、控制***和电化学加工***；所述激光辐照***用来发出脉冲激光并使得脉冲激光辐照在电化学加工***上；所述控制***用来控制激光辐照***和电化学加工***；在激光加工和电化学反应过程中，激光束与工件基板相对移动。
进一步的，所述加工***中工件基板和阳极基板之间设置有隔板。
进一步的，所述工件基板和阳极基板与隔板之间贴合。
进一步的，所述隔板为耐蚀绝缘材料。
进一步的，所述激光辐照***包括脉冲激光器、反射镜和聚焦透镜；激光由脉冲激光器发出，经反射镜改变传输方向，再通过聚焦透镜聚焦，聚焦后的激光束辐照在工件基板上。
进一步的，所述控制***包括计算机和运动控制器；所述计算机控制脉冲激光器、直流脉冲电源和运动控制器；所述运动控制器控制x-y-z三轴运动平台。
进一步的，所述加工***包括直流脉冲电源、工作槽、工件基板、阳极基板、隔板和x-y-z三轴运动平台；所述工作槽安装于x-y-z三轴运动平台上；所述直流脉冲电源的正极与阳极基板相连，负极与工件基板相连；工件基板及阳极基板贴于隔板的上下两面并完全浸没于沉积液中。
有益效果：
1.本发明方法可以同步制备出基材-重熔层-镀层的三层梯度结构，消除了镀层材料与基体材料的界面，有利于镀层与基体的结合，改善了镀层剥落现象，同时还能保证工件基板的表面性能。
2.得到的重熔层是基底与沉积层的冶金结合，质地均匀，结合力高。
3.本发明装置可以实现激光束和工件基板之间的相对运动，从而可利用多个脉冲激光的热量累积效应在工件表面引发瞬时重熔。
4.在工件基板和阳极基板之间设置隔板，隔板防止工件基板和阳极基板背面电解，同时方便工件基板和阳极基板的安装和定位。
5.镀层厚度可控，更改沉积液成分或者电化学参数继续在所述镀层表面制备新镀层，可实现多层梯度结构。
附图说明
图1为根据本发明实施例涉及到的激光辅助电沉积制备梯度镀层的装置示意图；
图2为正在加工过程中的基体-重熔层-镀层梯度结构示意图；
图3为脉冲激光热量累积示意图。
附图标记如下：
1-脉冲激光器；2-反射镜；3-聚焦透镜；4-工作槽；5-节流阀；6-过滤器；7-微型泵；8-储液槽；9-x-y-z三轴运动平台；10-阳极基板；11-隔板；12-工件基板；13-直流脉冲电源；14-运动控制器；15-计算机；16-电流表；17-激光束；18-沉积层；19-重熔层；20-镀层；21-支架。
具体实施方式
下面详细描述本发明的实施例，所述实施例的示例在附图中示出，其中自始至终相同或类似的标号表示相同或类似的元件或具有相同或类似功能的元件。下面通过参考附图描述的实施例是示例性的，旨在用于解释本发明，而不能理解为对本发明的限制。
在本发明的描述中，需要理解的是，术语“中心”、“纵向”、“横向”、“长度”、“宽度”、“厚度”、“上”、“下”、“轴向”、“径向”、“竖直”、“水平”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本发明和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本发明的限制。此外，术语“第一”、“第二”仅用于描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个该特征。在本发明的描述中，“多个”的含义是两个或两个以上，除非另有明确具体的限定。
在本发明中，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”、“固定”等术语应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通。对于本领域的普通技术人员而言，可以根据具体情况理解上述术语在本发明中的具体含义。
一种激光辅助电沉积制备梯度镀层的方法，在工件基板12上利用脉冲激光和电化学反应电沉积出沉积层18的同时利用脉冲激光的热量对工件基板12表面的沉积层18进行重熔，获得均匀分布的重熔层19。
其中，在获得重熔层19的同时利用脉冲激光的残余热应力诱导重熔层19上表面发生电化学反应得到镀层20。
一种激光辅助电沉积制备梯度镀层的方法的装置，包括激光辐照***、控制***和电化学加工***；所述激光辐照***用来发出脉冲激光并使得脉冲激光辐照在电化学加工***上；所述控制***用来控制激光辐照***和电化学加工***；在激光加工和电化学反应过程中，激光束17与工件基板12相对移动。
其中，所述加工***中工件基板12和阳极基板10之间设置有隔板11。所述工件基板12和阳极基板10与隔板11之间贴合。所述隔板11为耐蚀绝缘材料。
结合附图1、图2和附3，激光辐照***包括脉冲激光器1、反射镜2和聚焦透镜3；激光由脉冲激光器1发出，经反射镜2改变传输方向，再通过聚焦透镜3聚焦，聚焦后的激光束17辐照在工件基板12上；所述控制***包括计算机15和运动控制器14；所述计算机15控制脉冲激光器1、直流脉冲电源13和运动控制器14；所述运动控制器14控制x-y-z三轴运动平台9；所述电化学加工***包括直流脉冲电源13、工作槽4、工件基板12、阳极基板10、隔板11和x-y-z三轴运动平台9；所述工作槽4安装于x-y-z三轴运动平台9上；所述直流脉冲电源13的正极与阳极基板10相连，负极与工件基板12相连；工件基板12及阳极基板10贴于隔板11的上下两面并完全浸没于沉积液中。
工作液循环***，所述工作液循环***包括储液槽8、微型泵7、过滤器6和节流阀5；所述微型泵7进口接储液槽8，出口接工作槽4，所述过滤器6与节流阀5串联在回路中。在电化学反应过程中，通过微型泵工作确保工作槽中溶液的浓度均匀。
利用激光的热效应和电沉积反应在工件表面获得具有重熔层19结构的梯度镀层，直流电源13正极、负极分别接阳极基板10和工件基板12，串联电流表16构成电沉积回路；激光器1发出的激光束17经过光路传输***和聚焦透镜3的聚焦，辐照在工件基板12表面，在激光辐照区域诱导电沉积反应出沉积层18的同时利用多个脉冲激光的热量累积效应在工件表面引发瞬时重熔，使得沉积层18成分和基底12成分混合得到重熔层19。激光辐照结束后，残余热量在重熔层19表面继续诱导电化学沉积，实现一种基材12-重熔层19-镀层20的三层梯度结构。
本发明具体实施方法如下：
绘制运动路径模型，并输入到计算机15中；
对工件基板12进行表面预处理；
将工件基板12与阳极基板10相对且平行地贴在隔板11的两面，隔板11的上表面贴工件基板12并与电化学电源13负极相连，隔板11的下表面贴阳极基板10并与电化学电源13正极相连；
将隔板11的支架安装在工作槽4中，并在电化学回路中串联电流表16；将工作槽4安 装在x-y-z运动平台9上，调节x-y-z三轴运动平台9的高度，使激光聚焦于工件基板12表面；
使工件基板12及阳极基板10下端浸没于沉积液中，通电时，工件基板12与阳极基板11在沉积液内构成电化学回路并开启微型泵7进行循环换液，保证工作槽4中溶液的浓度均匀；
打开电化学电源13设置电化学电压参数，在电沉积金的试验中，电化学电压为小于3v时，该参数满足无激光辐照时不发生电化学沉积反应，在合适参数的激光辐照下可发生电沉积，比如当激光单脉冲能量大于4.5uj时发生定域沉积；
开启脉冲激光器1，设置运动路径和激光参数，利用激光的热效应加速辐照区域的电沉积反应诱导出沉积层18；同时，多个脉冲激光热量累积使工件表面发生瞬时重熔，从而获得均匀分布的重熔层19后利用残余热应力诱导电化学沉积出镀层20；持续加工后，可获得基材18-重熔层19-镀层20的三层梯度结构。
关闭激光，调整电参数继续电沉积，提高镀层20厚度。
更改沉积液成分或者电化学参数继续在所述镀层表面制备新镀层，实现多层梯度结构。
需要说明的是，当加入激光进行诱导电化学沉积加工时，不需要调节原先的电化学参数。目标镀层所需金属不一样时，电化学参数和激光参数不同。本方案以电镀金为例，比如，当电化学电压为2.4v，不发生电沉积反应，当加入激光后，激光单脉冲能量为5uj就可发生电化学沉积反应，其中，激光脉冲频率不大于2Mhz。
在本说明书的描述中，参考术语“一个实施例”、“一些实施例”、“示例”、“具体示例”、或“一些示例”等的描述意指结合该实施例或示例描述的具体特征、结构、材料或者特点包含于本发明的至少一个实施例或示例中。在本说明书中，对上述术语的示意性表述不一定指的是相同的实施例或示例。而且，描述的具体特征、结构、材料或者特点可以在任何的一个或多个实施例或示例中以合适的方式结合。
尽管上面已经示出和描述了本发明的实施例，可以理解的是，上述实施例是示例性的，不能理解为对本发明的限制，本领域的普通技术人员在不脱离本发明的原理和宗旨的情况下在本发明的范围内可以对上述实施例进行变化、修改、替换和变型。

Claims (8)

  1. 一种激光辅助电沉积制备梯度镀层的方法，其特征在于，在工件基板(12)上利用脉冲激光和电化学反应电沉积出沉积层(18)的同时激光束(17)与工件基板(12)相对移动利用多个脉冲激光的热量累积效应对工件基板(12)表面的沉积层(18)进行重熔，获得重熔层(19)；
    在获得重熔层(19)的同时利用脉冲激光的残余热应力诱导重熔层(19)上表面发生电化学反应得到基材-重熔层(19)-镀层(20)。
  2. 根据权利要求1所述的激光辅助电沉积制备梯度镀层的方法的装置，包括激光辐照***、控制***和电化学加工***；所述激光辐照***用来发出脉冲激光并使得脉冲激光辐照在电化学加工***上；所述控制***用来控制激光辐照***和电化学加工***；其特征在于，在激光加工和电化学反应过程中，激光束(17)与工件基板(12)相对移动。
  3. 根据权利要求2所述的激光辅助电沉积制备梯度镀层的方法的装置，其特征在于，所述电化学加工***中工件基板(12)和阳极基板(10)之间设置有隔板(11)。
  4. 根据权利要求2所述的激光辅助电沉积制备梯度镀层的方法的装置，其特征在于，所述工件基板(12)和阳极基板(10)与隔板(11)之间贴合。
  5. 根据权利要求3所述的激光辅助电沉积制备梯度镀层的方法的装置，其特征在于，所述隔板(11)为耐蚀绝缘材料。
  6. 根据权利要求2所述的激光辅助电沉积制备梯度镀层的方法的装置，其特征在于，所述激光辐照***包括脉冲激光器(1)、反射镜(2)和聚焦透镜(3)；激光由脉冲激光器(1)发出，经反射镜(2)改变传输方向，再通过聚焦透镜(3)聚焦，聚焦后的激光束(17)辐照在工件基板(12)上。
  7. 根据权利要求2所述的激光辅助电沉积制备梯度镀层的方法的装置，其特征在于，所述控制***包括计算机(15)和运动控制器(14)；所述计算机(15)控制脉冲激光器(1)、直流脉冲电源(13)和运动控制器(14)；所述运动控制器(14)控制x-y-z三轴运动平台(9)。
  8. 根据权利要求2所述的激光辅助电沉积制备梯度镀层的方法的装置，其特征在于，所述加工***包括直流脉冲电源(13)、工作槽(4)、工件基板(12)、阳极基板(10)、隔板(11)和x-y-z三轴运动平台(9)；所述工作槽(4)安装于x-y-z三轴运动平台(9)上；所述直流脉冲电源(13)的正极与阳极基板(10)相连，负极与工件基板(12)相连；工件基板(12)及阳极基板(10)贴于隔板(11)的上下两面并完全浸没于沉积液中。
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