WO2022188161A1 - 显示面板及显示装置 - Google Patents

显示面板及显示装置 Download PDF

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Publication number
WO2022188161A1
WO2022188161A1 PCT/CN2021/080508 CN2021080508W WO2022188161A1 WO 2022188161 A1 WO2022188161 A1 WO 2022188161A1 CN 2021080508 W CN2021080508 W CN 2021080508W WO 2022188161 A1 WO2022188161 A1 WO 2022188161A1
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WO
WIPO (PCT)
Prior art keywords
base substrate
light
substrate
layer
display panel
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PCT/CN2021/080508
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English (en)
French (fr)
Inventor
史鲁斌
王洪润
李付强
刘文渠
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京东方科技集团股份有限公司
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Application filed by 京东方科技集团股份有限公司 filed Critical 京东方科技集团股份有限公司
Priority to PCT/CN2021/080508 priority Critical patent/WO2022188161A1/zh
Priority to US17/771,706 priority patent/US11875596B2/en
Priority to CN202180000476.3A priority patent/CN115943445A/zh
Publication of WO2022188161A1 publication Critical patent/WO2022188161A1/zh

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V40/00—Recognition of biometric, human-related or animal-related patterns in image or video data
    • G06V40/10—Human or animal bodies, e.g. vehicle occupants or pedestrians; Body parts, e.g. hands
    • G06V40/12—Fingerprints or palmprints
    • G06V40/13—Sensors therefor
    • G06V40/1318—Sensors therefor using electro-optical elements or layers, e.g. electroluminescent sensing
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/30—Collimators
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136222—Colour filters incorporated in the active matrix substrate
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/10—Image acquisition
    • G06V10/12—Details of acquisition arrangements; Constructional details thereof
    • G06V10/14—Optical characteristics of the device performing the acquisition or on the illumination arrangements
    • G06V10/147—Details of sensors, e.g. sensor lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/13306—Circuit arrangements or driving methods for the control of single liquid crystal cells
    • G02F1/13312—Circuits comprising photodetectors for purposes other than feedback

Definitions

  • the present disclosure relates to the field of display technology, and in particular, to a display panel and a display device.
  • Fingerprint recognition has important applications in today's society.
  • Common fingerprint recognition sensors include capacitive, ultrasonic and optical sensors.
  • the optical type is mainly based on a photosensitive sensor, which realizes fingerprint recognition by detecting the difference in light reflection between valleys and ridges.
  • Embodiments of the present disclosure provide a display panel and a display device, and the specific solutions are as follows:
  • an embodiment of the present disclosure provides a display panel, comprising: a counter substrate and an array substrate facing each other, and a liquid crystal layer located between the counter substrate and the array substrate, the array substrate comprising: :
  • a color filter layer is located on the first base substrate;
  • the color filter layer includes a black matrix and a plurality of color resistors, the black matrix includes a plurality of pixel openings and a plurality of first light-transmitting holes, each of which is One of the color resistors is arranged in the pixel opening;
  • a plurality of photosensors are located between the color filter layer and the first base substrate, and the orthographic projections of the multiple photosensors on the first base substrate are located on the first base of the black matrix. within the orthographic projection on the base substrate, and the orthographic projection of each photosensitive sensor on the first base substrate covers the orthographic projection of at least one of the first light-transmitting holes on the first base substrate .
  • the opposite substrate includes a second base substrate, and a light shielding layer on the second base substrate;
  • the light-shielding layer includes a plurality of second light-transmitting holes, and the orthographic projection of the second light-transmitting holes on the first base substrate is the same as the orthographic projection of the first light-transmitting holes on the first base substrate.
  • the orthographic projections overlap each other.
  • the orthographic projection of the second light-transmitting hole on the first substrate is the same as the orthographic projection of the first light-transmitting hole on the first substrate
  • the orthographic projections on the substrate are substantially coincident, and the orthographic projection center of the second light-transmitting hole on the first base substrate and the orthographic projection center of the first light-transmitting hole on the first base substrate roughly coincident.
  • the light shielding layer includes: a collimation film attached to the second base substrate;
  • the collimating film is disposed on the entire surface, or the orthographic projection of the collimating film on the first base substrate is located within the orthographic projection of the black matrix on the first base substrate.
  • the alignment film includes: a collimation hole layer, and flexible flexible layers located in sequence on the side of the collimation hole layer away from the second base substrate Matrix layer and collimating lens layer;
  • the collimating lens layer includes a microlens array and a thickness between the microlens array and the flexible base layer;
  • the collimation hole layer includes a plurality of light shielding parts and a collimating hole array located between the light shielding parts. Corresponding to the main optical axis of the microlens;
  • the collimation hole is the second light-transmitting hole, and in the area where the photosensitive sensor is located, each of the collimation holes and the microlenses are correspondingly arranged on the first substrate substrate.
  • the projection overlaps with the orthographic projection of one of the first light-transmitting holes on the first base substrate.
  • the collimation film includes at least two collimation hole layers arranged in layers and a light-transmitting layer located between every two adjacent collimation hole layers;
  • Each of the collimation hole layers includes a plurality of light shielding parts and an array of collimation holes located between the light shielding parts;
  • each of the collimation hole arrays is substantially the same, and the orthographic projection centers of the correspondingly arranged collimation holes on the first substrate are substantially coincident;
  • the collimation hole is the second light transmission hole, and in the area where the photosensitive sensor is located, the orthographic projection of each collimation hole on the first substrate The orthographic projections of the light holes on the first base substrate overlap correspondingly.
  • the opposite substrate further includes: a polarizer located on a side of the second base substrate away from the liquid crystal layer;
  • the collimating film is located between the second base substrate and the polarizer.
  • the opposite substrate further includes: a polarizer and a protective cover plate located on a side of the second base substrate away from the liquid crystal layer;
  • the collimation film is located between the polarizer and the protective cover plate, or the collimation film is located on a side of the protective cover plate away from the second base substrate.
  • the opposite substrate further includes: a side of the alignment film facing the second substrate substrate and/or a position away from the alignment film The adhesive layer on one side of the second base substrate.
  • the light shielding layer includes: a light shielding pattern patterned and formed on the second base substrate;
  • the orthographic projection of the light shielding pattern on the first base substrate is located within the orthographic projection of the black matrix on the first base substrate.
  • the light-shielding pattern is located on a side of the second base substrate facing the liquid crystal layer.
  • the opposite substrate further includes a protective cover plate located on a side of the second base substrate away from the liquid crystal layer;
  • the light shielding pattern is located on a side of the protective cover plate facing the liquid crystal layer.
  • the shapes of the first light-transmitting holes and the second light-transmitting holes are circular, and the first light-transmitting holes and the second light-transmitting holes are circular.
  • the aperture of the light hole is 3 ⁇ m-6 ⁇ m.
  • the array substrate further includes: a common electrode and a plurality of pixel electrodes;
  • the plurality of pixel electrodes are located on the side of the color filter layer away from the first base substrate, and the common electrode is located between the layer where the pixel electrodes are located and the color filter layer;
  • the array substrate further includes: a plurality of pixel electrodes located on a side of the color filter layer away from the first base substrate;
  • the orthographic projection of the pixel electrode on the first base substrate is located within the orthographic projection of the color resist on the first base substrate;
  • the opposite substrate further includes: an alignment layer and a common electrode; wherein, the alignment layer is in contact with the liquid crystal layer, and the common electrode is located on a side of the alignment layer away from the liquid crystal layer.
  • the photosensitive sensor includes a first electrode and a second electrode opposite to each other, and a photosensitive sensor located between the first electrode and the second electrode layer;
  • the photosensitive layer includes a P-type semiconductor layer, an intrinsic semiconductor layer and an N-type semiconductor layer that are stacked.
  • an embodiment of the present disclosure provides a display device including the above-mentioned display panel and a backlight module; wherein, the display panel is located on a light-emitting side of the backlight module.
  • FIG. 1 is a schematic structural diagram of a display panel provided by an embodiment of the present disclosure
  • Fig. 2 is a kind of sectional structure schematic diagram along line I-II in Fig. 1;
  • FIG. 3 is a schematic diagram of a corresponding relationship between a photosensitive sensor and a first light-transmitting hole according to an embodiment of the present disclosure
  • Fig. 4 is another kind of cross-sectional structure schematic diagram along line I-II in Fig. 1;
  • Fig. 5 is another kind of cross-sectional structure schematic diagram along line I-II in Fig. 1;
  • Fig. 6 is another kind of cross-sectional structure schematic diagram along line I-II in Fig. 1;
  • FIG. 7 is a schematic structural diagram of a collimating film provided by an embodiment of the present disclosure.
  • FIG. 8 is another schematic structural diagram of a collimating film provided by an embodiment of the present disclosure.
  • Fig. 9 is another kind of cross-sectional structure schematic diagram along line I-II in Fig. 1;
  • Fig. 10 is another kind of cross-sectional structure schematic diagram along line I-II in Fig. 1;
  • Fig. 11 is another kind of cross-sectional structure schematic diagram along line I-II in Fig. 1;
  • Fig. 12 is another kind of cross-sectional structure schematic diagram along the line I-II in Fig. 1;
  • Fig. 13 is the enlarged structural schematic diagram of Z region in Fig. 2;
  • FIG. 14 is a structural diagram of a pixel circuit of a photosensitive device
  • FIG. 15 is a working timing diagram of the pixel circuit shown in FIG. 14;
  • FIG. 16 is a schematic structural diagram of a display device provided by an embodiment of the present disclosure.
  • Liquid crystal displays are generally fabricated in a cell-to-cell manner with an array (Array) substrate and a color filter (CF) substrate. Due to the limitation of cell accuracy, the width of the black matrix (BM) contained in the color filter substrate is generally designed to be larger than the area of the uncontrollable area of the liquid crystal (ie, the gap between the pixel electrodes) to prevent light leakage. However, after the width of the black matrix increases, the pixel aperture ratio will decrease. For the solution of integrating a photosensitive sensor on an array substrate to realize fingerprint recognition, since the photosensitive sensor needs to occupy a certain wiring space, the pixel aperture ratio is further reduced. In addition, since the photosensitive sensor on the array substrate is far away from the opening of the black matrix on the color filter substrate, it is difficult to adjust the optical path, which easily affects the resolution of the photosensitive sensor.
  • an embodiment of the present disclosure provides a display panel, as shown in FIG. 1 to FIG. 3 , comprising: a counter substrate 001 and an array substrate 002 located opposite to each other, and a display panel located on the opposite side.
  • a display panel located on the opposite side.
  • the array substrate 002 may include:
  • the color filter layer 202 is located on the first base substrate 201; the color filter layer 202 includes a black matrix BM and a plurality of color resistors, and the black matrix BM includes a plurality of pixel openings O 1 and a plurality of first light-transmitting holes O 2 , Each pixel opening O1 is provided with a color resistance; the color resistances include but are not limited to red color resistance R, green color resistance G, and blue color resistance B;
  • a plurality of photosensitive sensors 203 are located between the color filter layer 202 and the first base substrate 201, and the orthographic projections of the plurality of photosensitive sensors 203 on the first base substrate 201 are located on the first base substrate 201 of the black matrix BM.
  • the orthographic projection covers the orthographic projection of the at least one first light-transmitting hole O 2 on the first base substrate 201 .
  • one photosensitive sensor 203 corresponds to one first transparent hole O 2 ; in other embodiments, as shown in FIG. 3 , one photosensitive device 203 corresponds to nine first transparent holes O 2 .
  • Optical aperture O 2 corresponds.
  • the color filter layer 202 by fabricating the color filter layer 202 on the array substrate, the cell-to-cell process of the color filter layer 202 and the array substrate is avoided, so there is no need to increase the width of the black matrix BM, thereby It ensures a high pixel aperture ratio and is more suitable for high-resolution liquid crystal display products. Moreover, since the black matrix BM and the photosensitive sensor 203 are both located on the array substrate, the distance between the photosensitive sensor 203 and the first light-transmitting hole O 2 of the black matrix BM is relatively short, which facilitates the adjustment of the optical path and improves the resolution of the photosensitive sensor 203 .
  • FIG. 1 only schematically shows an arrangement of the color resists 104 , and other arrangements known to those skilled in the art may also be used during specific implementation, which is not limited herein.
  • FIG. 1 only shows that there is a photosensitive sensor 203 (corresponding to the position of the second opening O 2 ) at the column gap between the blue color resist B and the red color resist R.
  • the photosensitive device 103 can also be arranged in The column gap between the blue color resist B and the green color resist G, the column gap between the red color resist R and the green color resist G, and the row gap of each color resist.
  • the opposite substrate 001 includes a second base substrate 101 and a light shielding layer 102 located on the second base substrate 101
  • the light-shielding layer 102 includes a plurality of second light-transmitting holes O 3 , the orthographic projections of the second light-transmitting holes O 3 on the first base substrate 201 and the first light-transmitting holes O 2 on the first base substrate 201 The orthographic projections overlap each other.
  • the light with a smaller angle in the reflected light of the finger F can be irradiated to the photosensitive surface of the photosensitive sensor 203 through the overlapping first light-transmitting holes O 2 and the second light-transmitting holes O 3 , thereby effectively avoiding different valleys,
  • the high-angle light reflected by the ridges interferes with the accuracy of fingerprint recognition.
  • the material of the light shielding layer 102 may be black resin or the like.
  • the orthographic projections of the first light-transmitting holes on the O 2 first base substrate 101 are approximately coincident, and the center of the orthographic projections of the second light-transmitting holes O 3 on the first base substrate 101 and the first light-transmitting holes O 2 are in the same position.
  • the centers of orthographic projections on the first base substrate 101 are substantially coincident.
  • the shapes of the first light-transmitting holes O 2 and the second light-transmitting holes O 3 may be circular, and the first light-transmitting holes O 2 and the second light-transmitting holes O 2
  • the pore size of O3 can be 3 ⁇ m-6 ⁇ m.
  • the shapes of the first light-transmitting holes O 2 and the second light-transmitting holes O 3 may also be square or other shapes, as long as they can achieve the effect of collimating light with a small angle.
  • the light shielding layer 102 may include: a collimation film a attached to the second base substrate 101 ; in some implementations, the collimating film a may be arranged on the entire surface (as shown in FIG. 4 , FIG. 6 and FIG. 7 ), or the orthographic projection of the collimating film a on the first substrate 201 may be located on the first substrate BM of the black matrix BM. in the orthographic projection on the base substrate 201 (as shown in FIG. 5 ).
  • the collimating film a Since the area between the collimating holes (ie the second light transmission holes O 3 ) of the collimating film a is opaque to light, if the collimating film a is set on the entire surface, a part of the light transmittance will be lost, and in this case, it is possible to The influence on the display effect can be reduced by increasing the brightness of the backlight; however, in order to reduce the influence on the light transmittance as much as possible, the collimating film a can be arranged only in the area where the black matrix BM is located.
  • the collimation film a may include at least two collimation hole layers a 1 arranged in layers and a light-transmitting layer a 4 located between every two adjacent collimation hole layers a 1 ;
  • the straight hole layer a 1 includes a plurality of light shielding parts a 11 and an array of collimating holes a 12 located between the light shielding parts a 11 ; the distribution of each collimating hole a 12 array is approximately the same, and the corresponding collimating holes are arranged in the first
  • the orthographic projection centers on a base substrate 201 are approximately coincident; the collimation hole is the second light-transmitting hole O 3 , and in the area where the photosensitive sensor 203 is located, each collimation hole a 12 is on the first base substrate 201
  • the orthographic projection correspondingly overlaps with the orthographic projection of one first light-transmitting hole O 2 on the first base substrate 201 .
  • the opposite substrate may further include: first polarized lights sequentially located on the side of the second base substrate 101 away from the liquid crystal layer 003 sheet 103 and protective cover plate 104; in some embodiments, in order to facilitate the attachment of the collimating film a, the collimating film a may be located between the second base substrate 101 and the first polarizer 103 and located in the first polarizer 103 and the protective cover plate 104, or located on the side of the protective cover plate 104 away from the second base substrate 101, which is not limited herein.
  • the collimation film a when the collimation film a is located on the side of the protective cover 104 away from the second base substrate 101, in order to avoid the collimation film a being scratched during use and affecting the collimation effect, the collimation film a can be Attach protective film.
  • transparent optical adhesive or the like may be used to attach the alignment film a.
  • the opposite substrate may further include: the alignment film a facing the second substrate The side of the substrate 101 and/or the adhesive layer 105 located on the side of the alignment film a away from the second base substrate 101 .
  • the light shielding layer 102 may include: a light shielding pattern b patterned on the second base substrate 101 ;
  • the orthographic projection on the first base substrate 201 is located within the orthographic projection of the black matrix BM on the first base substrate 201 , so that the light shielding layer 102 plays a collimating role without affecting the light transmittance of the display panel.
  • the shading pattern b may be located on the side of the second base substrate 101 facing the liquid crystal layer 003 ; or, As shown in FIG. 11 , the light shielding pattern b may also be located on the side of the protective cover plate 104 facing the liquid crystal layer 003 .
  • the above-mentioned display panel provided by the embodiment of the present disclosure may be applicable to an advanced extra-dimensional field switching (ADS) mode.
  • the array substrate 002 may further include: a common electrode 204 and a A plurality of pixel electrodes 205; the plurality of pixel electrodes 205 are located on the side of the color filter layer 202 away from the first base substrate 201, and the common electrode 204 is located between the layer where the plurality of pixel electrodes 205 are located and the color filter layer 202;
  • the orthographic projection on the first base substrate 201 and the orthographic projection of the common electrode 204 on the first base substrate 201 overlap each other at the pixel opening O1.
  • the above-mentioned display panel provided by the embodiment of the present disclosure may also be applicable to a twisted nematic (TN) mode.
  • the array substrate 002 may further include: a position where the color filter layer 202 is away from the first base substrate 201 .
  • the photosensor 203 may include a first electrode 2031 and a second electrode 2032 opposite to each other, and a first electrode 2031 and a second electrode 2031 located on the first electrode 2031 and the second electrode 2032 .
  • the photosensitive layer 2033 between the electrodes 2032; the photosensitive layer 2033 includes a stacked P-type semiconductor layer, an intrinsic semiconductor layer and an N-type semiconductor layer.
  • the P-type semiconductor layer is located between the first electrode 2031 and the intrinsic semiconductor layer, and the N-type semiconductor layer is located between the intrinsic semiconductor layer and the second electrode 2032; or, the N-type semiconductor layer is located between the first electrode 2031 and the intrinsic semiconductor layer. Between the semiconductor layers, the P-type semiconductor layer is located between the intrinsic semiconductor layer and the second electrode 2032 .
  • the photosensitive sensor 203 may not only be the above-mentioned photosensitive device having a PIN structure, but also an organic photosensitive sensor or other types of photosensitive sensors, which are not limited herein.
  • the photosensitive sensor 203 may be driven by a pixel circuit of either an active type (APS) or a passive type (PPS) driving method.
  • APS active type
  • PPS passive type
  • the APS pixel circuit shown in FIG. 14 is composed of a photodiode (Pinned-Photodiode, PPD), ie, a photosensitive sensor 203, a transmission transistor MTX, a reset transistor MRST, a source follower MSF, and a row selection transistor MSEL.
  • PPD Photodiode
  • a transmission transistor MTX Transmission transistor
  • MRST reset transistor
  • a source follower MSF a row selection transistor MSEL.
  • the characteristic of this 4T-APS pixel circuit is that the transmission tube MTX can effectively reduce the thermal noise and dark current of the pixel, and the source follower MSF plays a role of buffer amplification, which can amplify the current generated by the photodiode PPD and output it.
  • the working sequence of the 4T-APS pixel is shown in Figure 15, which can be divided into three stages: reset, integration, and transfer.
  • 1 represents a high-level signal
  • 0 represents a low-level signal, wherein 1 and 0 represent its logic levels, only to better explain the working process of the APS pixel circuit, and It is not the potential applied to the gate of each transistor at the time of implementation.
  • the array substrate may further include: a light blocking layer 206 , a buffer layer 207 , a pixel transistor TFT, a gate insulating layer 208 , an interlayer Insulating layer 209, first planarizing layer 210, protective layer 211, second planarizing layer 212, organic insulating layer (OC) 213, first insulating layer 214, second insulating layer 215, second alignment layer 216, and second polarizer 217.
  • the opposite substrate may further include a fourth planarization layer 107 .
  • Other essential components of the display panel should be understood by those of ordinary skill in the art, and will not be repeated here, nor should it be used as a limitation of the present disclosure.
  • an embodiment of the present disclosure also provides a display device, as shown in FIG. 16 , comprising the above-mentioned display panel and a backlight module 004 provided by the embodiment of the present disclosure; wherein, the display panel is located at the back of the backlight module 004 . light output side.
  • the backlight module 004 may be a direct type backlight module, or may also be an edge type backlight module, which is not limited herein.
  • the implementation of the display device can refer to the above-mentioned embodiment of the display panel, and the repetition will not be repeated.
  • the above-mentioned display devices provided by the embodiments of the present disclosure may be: mobile phones, tablet computers, televisions, monitors, notebook computers, digital photo frames, navigators, smart watches, fitness wristbands, personal digital assistants, etc.
  • the display device provided by the embodiments of the present disclosure may further include, but is not limited to, a radio frequency unit, a network module, an audio output unit, an input unit, a sensor, a display unit, a user input unit, an interface unit, a memory, a processor, and a power supply.

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Abstract

一种显示面板及显示装置，包括相对而置的对向基板（001）和阵列基板（002），以及位于对向基板（001）与阵列基板（002）之间的液晶层（003），阵列基板（002）包括：第一衬底基板（201）；彩膜层（202），位于第一衬底基板（201）之上；彩膜层（202）包括黑矩阵（BM）和多个色阻，黑矩阵（BM）包括多个像素开口（O 1）和多个第一透光孔（O 2），每个像素开口（O 1）内设置一个色阻；多个光敏传感器（203），位于彩膜层（202）与第一衬底基板（201）之间，多个光敏传感器（203）在第一衬底基板（201）上的正投影位于黑矩阵（BM）在第一衬底基板上（201）的正投影内，且每个光敏传感器（203）在第一衬底基板（201）上的正投影覆盖至少一个第一透光孔（O 1）在第一衬底基板（201）上的正投影。

Description

显示面板及显示装置 技术领域
本公开涉及显示技术领域，尤其涉及一种显示面板及显示装置。
背景技术
指纹识别在当今社会中具有重要应用，常见的指纹识别传感器包括电容式、超声波式和光学式。其中光学式主要基于光敏传感器，通过检测谷和脊对光反射差异来实现指纹识别。
发明内容
本公开实施例提供了一种显示面板及显示装置，具体方案如下：
一方面，本公开实施例提供了一种显示面板，包括：相对而置的对向基板和阵列基板，以及位于所述对向基板与所述阵列基板之间的液晶层，所述阵列基板包括：
第一衬底基板；
彩膜层，位于所述第一衬底基板之上；所述彩膜层包括黑矩阵和多个色阻，所述黑矩阵包括多个像素开口和多个第一透光孔，每个所述像素开口内设置一个所述色阻；
多个光敏传感器，位于所述彩膜层与所述第一衬底基板之间，所述多个光敏传感器在所述第一衬底基板上的正投影位于所述黑矩阵在所述第一衬底基板上的正投影内，且每个所述光敏传感器在所述第一衬底基板上的正投影覆盖至少一个所述第一透光孔在所述第一衬底基板上的正投影。
可选地，在本公开实施例提供的上述显示面板中，所述对向基板包括第二衬底基板，以及位于所述第二衬底基板上的遮光层；
所述遮光层包括多个第二透光孔，所述第二透光孔在所述第一衬底基板上的正投影与所述第一透光孔在所述第一衬底基板上的正投影相互交叠。
可选地，在本公开实施例提供的上述显示面板中，所述第二透光孔在所述第一衬底基板上的正投影与所述第一透光孔在所述第一衬底基板上的正投影大致重合，且所述第二透光孔在所述第一衬底基板上的正投影中心与所述第一透光孔在所述第一衬底基板上的正投影中心大致重合。
可选地，在本公开实施例提供的上述显示面板中，所述遮光层包括：贴附在所述第二衬底基板上的准直膜；
所述准直膜整面设置，或者所述准直膜在所述第一衬底基板上的正投影位于所述黑矩阵在所述第一衬底基板上的正投影内。
可选地，在本公开实施例提供的上述显示面板中，所述准直膜包括：一个准直孔层、以及依次位于所述准直孔层背离所述第二衬底基板一侧的柔性基体层和准直透镜层；
所述准直透镜层包含微透镜阵列、以及位于所述微透镜阵列与所述柔性基体层之间的肉厚；
所述准直孔层包括多个遮光部、以及位于所述遮光部之间的准直孔阵列，所述准直孔阵列与所述微透镜阵列的分布大致相同，每个准直孔均在对应微透镜的主光轴上；
所述准直孔为所述第二透光孔，且在所述光敏传感器所在区域内，每个对应设置的所述准直孔和所述微透镜在所述第一衬底基板上的正投影与一个所述第一透光孔在所述第一衬底基板上的正投影对应交叠。
可选地，在本公开实施例提供的上述显示面板中，所述准直膜包括至少两个层叠设置的准直孔层和位于每相邻两个准直孔层之间的透光层；
各所述准直孔层包括多个遮光部、以及位于所述遮光部之间的准直孔阵列；
各所述准直孔阵列的分布大致相同，且对应设置的准直孔在所述第一衬底基板上的正投影中心大致重合；
所述准直孔为所述第二透光孔，且在所述光敏传感器所在区域内，每个所述准直孔在所述第一衬底基板上的正投影与一个所述第一透光孔在所述第 一衬底基板上的正投影对应交叠。
可选地，在本公开实施例提供的上述显示面板中，所述对向基板还包括：位于所述第二衬底基板背离所述液晶层一侧的偏光片；
所述准直膜位于所述第二衬底基板与所述偏光片之间。
可选地，在本公开实施例提供的上述显示面板中，所述对向基板还包括：位于所述第二衬底基板背离所述液晶层一侧的偏光片和保护盖板；
所述准直膜位于所述偏光片与所述保护盖板之间，或者，所述准直膜位于所述保护盖板背离所述第二衬底基板的一侧。
可选地，在本公开实施例提供的上述显示面板中，所述对向基板还包括：位于所述准直膜面向所述第二衬底基板一侧和/或位于所述准直膜远离所述第二衬底基板一侧的胶粘层。
可选地，在本公开实施例提供的上述显示面板中，所述遮光层包括：构图形成在所述第二衬底基板上的遮光图案；
所述遮光图案在所述第一衬底基板上的正投影位于所述黑矩阵在所述第一衬底基板上的正投影内。
可选地，在本公开实施例提供的上述显示面板中，所述遮光图案位于所述第二衬底基板面向所述液晶层的一侧。
可选地，在本公开实施例提供的上述显示面板中，所述对向基板还包括位于所述第二衬底基板背离所述液晶层一侧的保护盖板；
所述遮光图案位于所述保护盖板面向所述液晶层的一侧。
可选地，在本公开实施例提供的上述显示面板中，所述第一透光孔和所述第二透光孔的形状为圆形，所述第一透光孔和所述第二透光孔的孔径为3μm-6μm。
可选地，在本公开实施例提供的上述显示面板中，所述阵列基板还包括：公共电极和多个像素电极；
所述多个像素电极位于所述彩膜层背离所述第一衬底基板的一侧，所述公共电极位于所述多个像素电极所在层与所述彩膜层之间；
所述像素电极在所述第一衬底基板上的正投影与所述公共电极在所述第一衬底基板上的正投影在所述像素开口处相互交叠。
可选地，在本公开实施例提供的上述显示面板中，所述阵列基板还包括：位于所述彩膜层背离所述第一衬底基板一侧的多个像素电极；
所述像素电极在所述第一衬底基板上的正投影位于所述色阻在所述第一衬底基板上的正投影内；
所述对向基板还包括：取向层和公共电极；其中，所述取向层与所述液晶层接触，所述公共电极位于所述取向层背离所述液晶层的一侧。
可选地，在本公开实施例提供的上述显示面板中，所述光敏传感器包括相对而置的第一电极和第二电极，以及位于所述第一电极和所述第二电极之间的感光层；所述感光层包括层叠设置的P型半导体层、本征半导体层和N型半导体层。
另一方面，本公开实施例提供了一种显示装置，包括上述显示面板、以及背光模组；其中，所述显示面板位于所述背光模组的出光侧。
附图说明
图1为本公开实施例提供的显示面板的一种结构示意图；
图2为沿图1中I-II线的一种剖面结构示意图；
图3为本公开实施例提供的光敏传感器与第一透光孔的对应关系示意图；
图4为沿图1中I-II线的又一种剖面结构示意图；
图5为沿图1中I-II线的又一种剖面结构示意图；
图6为沿图1中I-II线的又一种剖面结构示意图；
图7为本公开实施例提供的准直膜的一种结构示意图；
图8为本公开实施例提供的准直膜的又一种结构示意图；
图9为沿图1中I-II线的又一种剖面结构示意图；
图10为沿图1中I-II线的又一种剖面结构示意图；
图11为沿图1中I-II线的又一种剖面结构示意图；
图12为沿图1中I-II线的又一种剖面结构示意图；
图13为图2中Z区域的放大结构示意图；
图14为光敏器件的一种像素电路结构图；
图15为图14所示像素电路的工作时序图；
图16为本公开实施例提供的显示装置的结构示意图。
具体实施方式
为使本公开实施例的目的、技术方案和优点更加清楚，下面将结合本公开实施例的附图，对本公开实施例的技术方案进行清楚、完整地描述。需要注意的是，附图中各图形的尺寸和形状不反映真实比例，目的只是示意说明本公开内容。显然，所描述的实施例是本公开的一部分实施例，而不是全部的实施例。基于所描述的本公开实施例，本领域普通技术人员在无需创造性劳动的前提下所获得的所有其它实施例，都属于本公开保护的范围。
除非另作定义，此处使用的技术术语或者科学术语应当为本公开所属领域内具有一般技能的人士所理解的通常意义。本公开说明书以及权利要求书中使用的“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性，而只是用来区分不同的组成部分。“包括”或者“包含”等类似的词语意指出现该词前面的元件或者物件涵盖出现在该词后面列举的元件或者物件及其等同，而不排除其他元件或者物件。“内”、“外”、“上”、“下”等仅用于表示相对位置关系，当被描述对象的绝对位置改变后，则该相对位置关系也可能相应地改变。
液晶显示器一般采用阵列(Array)基板和彩膜(CF)基板对盒的方式制备。由于对盒精度的限制，一般彩膜基板所含黑矩阵(BM)的宽度设计要大于液晶不可控区域(即像素电极的间隙处)的面积，以防止漏光现象的产生。但是黑矩阵的宽度增加以后，会导致像素开口率的降低。对于在阵列基板上集成光敏传感器实现指纹识别的方案，由于光敏传感器需要占用一定的布线空间，使得像素开口率进一步降低。此外，由于阵列基板上的光敏传感器与 彩膜基板上黑矩阵的开口距离较远，导致光路较难调整，容易影响光敏传感器的分辨率。
为了至少解决相关技术中存在的上述技术问题，本公开实施例提供了一种显示面板，如图1至图3所示，包括：相对而置的对向基板001和阵列基板002，以及位于对向基板001与阵列基板002之间的液晶层003；其中，阵列基板002可以包括：
第一衬底基板201；
彩膜层202，位于第一衬底基板201之上；彩膜层202包括黑矩阵BM和多个色阻，黑矩阵BM包括多个像素开口O 1和多个第一透光孔O 2，每个像素开口O 1内设置一个色阻；色阻包括但不限于红光色阻R、绿光色阻G和蓝光色阻B；
多个光敏传感器203，位于彩膜层202与第一衬底基板201之间，多个光敏传感器203在第一衬底基板201上的正投影位于黑矩阵BM在第一衬底基板201上的正投影内，且每个光敏传感器203在第一衬底基板201上的正投影覆盖至少一个第一透光孔O 2在第一衬底基板201上的正投影。在一些实施例中，如图2所示，一个光敏传感器203与一个第一透光孔O 2对应；在另一些实施例中，如图3所示，一个光敏器件203与九个第一透光孔O 2对应。
在本公开实施例提供的上述显示面板中，通过将彩膜层202制作在阵列基板上，从而避免了彩膜层202与阵列基板的对盒工艺，因此无需增大黑矩阵BM的宽度，从而保证了较高的像素开口率，更适合高分辨率的液晶显示产品。并且，由于黑矩阵BM与光敏传感器203均位于阵列基板上，使得光敏传感器203与黑矩阵BM的第一透光孔O 2之间的距离较近，便于调节光路，提高光敏传感器203的分辨率。
需要说明的是，图1仅示意性给出了色阻104的一种排布方式，在具体实施时，还可以为本领域技术人员已知的其他排布方式，在此不做限定。另外，图1仅示出了蓝光色阻B与红光色阻R的列间隙处具有光敏传感器203(对应第二开口O 2的位置)，在一些实施例中，光敏器件103还可以设置在 蓝光色阻B与绿光色阻G的列间隙、红光色阻R与绿光色阻G的列间隙、以及各色阻的行间隙处。
可选地，在本公开实施例提供的上述显示面板中，如图3至图10所示，对向基板001包括第二衬底基板101，以及位于第二衬底基板101上的遮光层102；遮光层102包括多个第二透光孔O 3，第二透光孔O 3在第一衬底基板201上的正投影与第一透光孔O 2在第一衬底基板201上的正投影相互交叠。
手指F的反射光线中较小角度的光线，可以透过相互交叠的第一透光孔O 2和第二透光孔O 3照射至光敏传感器203的感光面，从而有效了避免不同谷、脊反射的大角度光线干扰指纹识别的准确度。另外，遮光层102的材料可以为黑色树脂等。
可选地，在本公开实施例提供的上述显示面板中，为了获得较好的准直效果，如图3所示，第二透光孔O 3在第一衬底基板101上的正投影与第一透光孔在O 2第一衬底基板101上的正投影大致重合，且第二透光孔O 3在第一衬底基板101上的正投影中心与第一透光孔O 2在第一衬底基板101上的正投影中心大致重合。
应当理解的是，在实际工艺中，由于工艺条件的限制或对位精度等其他因素的影响，上述“大致重合”可能会完全重合，也可能会有一些偏差，因此上述特征之间“大致重合”的关系只要满足误差允许即可，均属于本公开的保护范围。
在一些实施例中，为获得较好的准直效果，第一透光孔O 2和第二透光孔O 3的形状可以为圆形，第一透光孔O 2和第二透光孔O 3的孔径可以为3μm-6μm。当然，第一透光孔O 2和第二透光孔O 3的形状也可以为方形或其他形状，只要可以起到对小角度光线准直的效果即可。
可选地，在本公开实施例提供的上述显示面板中，如图4至图7所示，遮光层102可以包括：贴附在第二衬底基板101上的准直膜a；在一些实施例中，准直膜a可以整面设置(如图4、图6和图7所示)，或者准直膜a在第一衬底基板201上的正投影可以位于黑矩阵BM在第一衬底基板201上的正 投影内(如图5所示)。
由于准直膜a的准直孔(即第二透光孔O 3)之间的区域不透光，所以在准直膜a整面设置的情况下，会损失一部分透光率，此时可以通过增加背光亮度的方式来减小对显示效果的影响；但为了尽可能减小对透光率的影响，可以仅设置在黑矩阵BM所在区域设置准直膜a。
可选地，在本公开实施例提供的上述显示面板中，如图8所示，准直膜a可以包括：一个准直孔层a 1、以及依次位于准直孔层a 1背离第二衬底基板101一侧的柔性基体层a 2和准直透镜层a 3；准直透镜层a 3包含微透镜a 31阵列、以及位于微透镜a 31阵列与柔性基体层a 2之间的肉厚a 32；准直孔层a 1包括多个遮光部a 11、以及位于遮光部a 11之间的准直孔a 12阵列，准直孔a 12阵列与微透镜a 31阵列的分布大致相同，每个准直孔a 12均在对应微透镜a 31的主光轴上；准直孔为第二透光孔O 3，且在光敏传感器203所在区域内，每个对应设置的准直孔a 12和微透镜a 31在第一衬底基板201上的正投影与一个第一透光孔O 2在第一衬底基板201上的正投影对应交叠。或者，如图9所示，准直膜a可以包括至少两个层叠设置的准直孔层a 1和位于每相邻两个准直孔层a 1之间的透光层a 4；各准直孔层a 1包括多个遮光部a 11、以及位于遮光部a 11之间的准直孔a 12阵列；各准直孔a 12阵列的分布大致相同，且对应设置的准直孔在第一衬底基板201上的正投影中心大致重合；准直孔为第二透光孔O 3，且在光敏传感器203所在区域内，每个准直孔a 12在第一衬底基板201上的正投影与一个第一透光孔O 2在第一衬底基板201上的正投影对应交叠。
可选地，在本公开实施例提供的上述显示面板中，如图4至图7所示，对向基板还可以包括：依次位于第二衬底基板101背离液晶层003一侧的第一偏光片103和保护盖板104；在一些实施例中，为了便于贴附准直膜a，该准直膜a可以位于第二衬底基板101与第一偏光片103之间、位于第一偏光片103与保护盖板104之间、或者位于保护盖板104背离第二衬底基板101的一侧，在此不做限定。并且，在准直膜a位于保护盖板104背离第二衬底基板101的一侧时，为了避免准直膜a在使用过程中被划伤而影响准直效果， 可以在准直膜a上贴附保护膜。
在一些实施例中，可采用透明光学胶(OCA)等来贴附准直膜a，则如图4至图7所示，对向基板还可以包括：位于准直膜a面向第二衬底基板101一侧和/或位于准直膜a远离第二衬底基板101侧的胶粘层105。
可选地，在本公开实施例提供的上述显示基板中，如图10和图11所示，遮光层102可以包括：构图形成在第二衬底基板101上的遮光图案b；遮光图案b在第一衬底基板201上的正投影位于黑矩阵BM在第一衬底基板201上的正投影内，以使得遮光层102起到准直作用的同时，不会影响显示面板的透光率。
可选地，在本公开实施例提供的上述显示面板中，为便于制作遮光图案b，如图10所示，遮光图案b可以位于第二衬底基板101面向液晶层003的一侧；或者，如图11所示，遮光图案b还可以位于保护盖板104面向液晶层003的一侧。
可选地，本公开实施例提供的上述显示面板可以适用于高级超维场开关(ADS)模式，具体如图2、图4至图11所示，阵列基板002还可以包括：公共电极204和多个像素电极205；多个像素电极205位于彩膜层202背离第一衬底基板201的一侧，公共电极204位于多个像素电极205所在层与彩膜层202之间；像素电极205在第一衬底基板201上的正投影与公共电极204在第一衬底基板201上的正投影在像素开口O 1处相互交叠。或者，本公开实施例提供的上述显示面板还可以适用于扭转向列(TN)模式，具体如图12所示，阵列基板002还可以包括：位于彩膜层202背离第一衬底基板201一侧的多个像素电极205；该像素电极205在第一衬底基板201上的正投影位于色阻在第一衬底基板201上的正投影内；对向基板001还可以包括：第一取向层106和公共电极204；其中，第一取向层106与液晶层003接触，公共电极204位于第一取向层106背离液晶层003的一侧。
可选地，在本公开实施例提供的上述显示基板中，如图13所示，光敏传感器203可以包括相对而置的第一电极2031和第二电极2032，以及位于第一 电极2031和第二电极2032之间的感光层2033；感光层2033包括层叠设置的P型半导体层、本征半导体层和N型半导体层。其中，P型半导体层位于第一电极2031与本征半导体层之间，N型半导体层位于本征半导体层与第二电极2032之间；或者，N型半导体层位于第一电极2031与本征半导体层之间，P型半导体层位于本征半导体层与第二电极2032之间。
需要说明的是，本公开中光敏传感器203不仅可以为上述具有PIN结构的光敏器件，还可以为有机光敏传感器或者其他种类的光敏传感器，在此不做限定。另外，可以采用主动式(APS)或被动式(PPS)中的任一驱动方式的像素电路对光敏传感器203进行驱动。
图14和图15为APS像素电路的原理图及驱动时序。具体而言：图14所示APS像素电路由光电二极管(Pinned-Photodiode,PPD)——即光敏传感器203、传输管MTX、复位管MRST、源极跟随器MSF以及行选管MSEL组成。这种4T-APS像素电路的特点在于传输管MTX可以有效降低像素的热噪声与暗电流，源极跟随器MSF起到一个缓冲放大的作用，可以将光电二极管PPD产生的电流放大后输出。4T-APS像素的工作时序如图15所示，可分为复位、积分、转移三个阶段。在复位阶段，复位信号端RST＝1，传输控制信号端TX＝1，复位管MRST及传输管MTX管导通，FD节点完成复位，光电二极管PPD发生钳位，为收集光生电荷做准备；在积分阶段，复位信号端R ST＝0，传输控制信号端TX＝0，复位管MRST及MTX管关断，光生电荷被光电二极管PPD收集，扫描信号端SEL＝1，行选通管MSEL导通，FD节点的复位信号通过源极跟随器MSF输出到列线PO上，即复位阶段的像素输出电压；在转移阶段，传输控制信号端TX＝1，传输管MTX导通，光电二极管PPD积累的光生电荷被转移到FD节点，电荷信号转换为电压信号，FD节点的电压(积分阶段的电压)再次通过源极跟随器MSF输出到列线PO上。
需要说明的是，以上描述中以1表示高电平信号，0表示低电平信号，其中，1和0代表其逻辑电平，仅是为了更好的解释上述APS像素电路的工作过程，而不是在具体实施时施加在各晶体管的栅极上的电位。
一般地，在本公开实施例提供的上述显示面板中，如图2至图13所示，阵列基板还可以包括：挡光层206、缓冲层207、像素晶体管TFT、栅绝缘层208、层间绝缘层209、第一平坦层210、保护层211、第二平坦层212、有机绝缘层(OC)213、第一绝缘层214、第二绝缘层215、第二取向层216和第二偏光片217。对向基板还可以包括第四平坦层107。对于显示面板的其它必不可少的组成部分均为本领域的普通技术人员应该理解具有的，在此不做赘述，也不应作为对本公开的限制。
基于同一发明构思，本公开实施例还提供了一种显示装置，如图16所示，包括本公开实施例提供的上述显示面板、以及背光模组004；其中，显示面板位于背光模组004的出光侧。在一些实施例中，该背光模组004可以为直下式背光模组，或者，还可以为侧入式背光模组，在此不做限定。并且，由于该显示装置解决问题的原理与上述显示面板解决问题的原理相似，因此，该显示装置的实施可以参见上述显示面板的实施例，重复之处不再赘述。
在一些实施例中，本公开实施例提供的上述显示装置可以为：手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪、智能手表、健身腕带、个人数字助理等任何具有显示功能的产品或部件。本公开实施例提供的显示装置还可以包括但不限于：射频单元、网络模块、音频输出单元、输入单元、传感器、显示单元、用户输入单元、接口单元、存储器、处理器、以及电源等部件。本领域技术人员可以理解，上述显示装置的组成并不构成对显示装置的限定，显示装置可以包括上述更多或更少的部件，或者组合某些部件，或者不同的部件布置。
显然，本领域的技术人员可以对本公开实施例进行各种改动和变型而不脱离本公开实施例的精神和范围。这样，倘若本公开实施例的这些修改和变型属于本公开权利要求及其等同技术的范围之内，则本公开也意图包含这些改动和变型在内。

Claims (17)

  1. 一种显示面板，其中，包括：相对而置的对向基板和阵列基板，以及位于所述对向基板与所述阵列基板之间的液晶层，所述阵列基板包括：
    第一衬底基板；
    彩膜层，位于所述第一衬底基板之上，所述彩膜层包括黑矩阵和多个色阻，所述黑矩阵包括多个像素开口和多个第一透光孔，每个所述像素开口内设置一个所述色阻；
    多个光敏传感器，位于所述彩膜层与所述第一衬底基板之间，所述多个光敏传感器在所述第一衬底基板上的正投影位于所述黑矩阵在所述第一衬底基板上的正投影内，且每个所述光敏传感器在所述第一衬底基板上的正投影覆盖至少一个所述第一透光孔在所述第一衬底基板上的正投影。
  2. 如权利要求1所述的显示面板，其中，所述对向基板包括第二衬底基板，以及位于所述第二衬底基板上的遮光层；
    所述遮光层包括多个第二透光孔，所述第二透光孔在所述第一衬底基板上的正投影与所述第一透光孔在所述第一衬底基板上的正投影相互交叠。
  3. 如权利要求2所述的显示面板，其中，所述第二透光孔在所述第一衬底基板上的正投影与所述第一透光孔在所述第一衬底基板上的正投影大致重合，且所述第二透光孔在所述第一衬底基板上的正投影中心与所述第一透光孔在所述第一衬底基板上的正投影中心大致重合。
  4. 如权利要求2所述的显示面板，其中，所述遮光层包括：贴附在所述第二衬底基板上的准直膜；
    所述准直膜整面设置，或者所述准直膜在所述第一衬底基板上的正投影位于所述黑矩阵在所述第一衬底基板上的正投影内。
  5. 如权利要求4所述的显示面板，其中，所述准直膜包括：一个准直孔层、以及依次位于所述准直孔层背离所述第二衬底基板一侧的柔性基体层和准直透镜层；
    所述准直透镜层包含微透镜阵列、以及位于所述微透镜阵列与所述柔性基体层之间的肉厚；
    所述准直孔层包括多个遮光部、以及位于所述遮光部之间的准直孔阵列，所述准直孔阵列与所述微透镜阵列的分布大致相同，每个准直孔均在对应微透镜的主光轴上；
    所述准直孔为所述第二透光孔，且在所述光敏传感器所在区域内，每个对应设置的所述准直孔和所述微透镜在所述第一衬底基板上的正投影与一个所述第一透光孔在所述第一衬底基板上的正投影对应交叠。
  6. 如权利要求4所述的显示面板，其中，所述准直膜包括至少两个层叠设置的准直孔层和位于每相邻两个准直孔层之间的透光层；
    各所述准直孔层包括多个遮光部、以及位于所述遮光部之间的准直孔阵列；
    各所述准直孔阵列的分布大致相同，且对应设置的准直孔在所述第一衬底基板上的正投影中心大致重合；
    所述准直孔为所述第二透光孔，且在所述光敏传感器所在区域内，每个所述准直孔在所述第一衬底基板上的正投影与一个所述第一透光孔在所述第一衬底基板上的正投影对应交叠。
  7. 如权利要求4所述的显示面板，其中，所述对向基板还包括：位于所述第二衬底基板背离所述液晶层一侧的偏光片；
    所述准直膜位于所述第二衬底基板与所述偏光片之间。
  8. 如权利要求4所述的显示面板，其中，所述对向基板还包括：位于所述第二衬底基板背离所述液晶层一侧的偏光片和保护盖板；
    所述准直膜位于所述偏光片与所述保护盖板之间，或者，所述准直膜位于所述保护盖板背离所述第二衬底基板的一侧。
  9. 如权利要求4所述的显示面板，其中，所述对向基板还包括：位于所述准直膜面向所述第二衬底基板一侧和/或位于所述准直膜远离所述第二衬底基板一侧的胶粘层。
  10. 如权利要求2-9任一项所述的显示面板，其中，所述遮光层包括：构图形成在所述第二衬底基板上的遮光图案；
    所述遮光图案在所述第一衬底基板上的正投影位于所述黑矩阵在所述第一衬底基板上的正投影内。
  11. 如权利要求10所述的显示面板，其中，所述遮光图案位于所述第二衬底基板面向所述液晶层的一侧。
  12. 如权利要求10所述的显示面板，其中，所述对向基板还包括位于所述第二衬底基板背离所述液晶层一侧的保护盖板；
    所述遮光图案位于所述保护盖板面向所述液晶层的一侧。
  13. 如权利要求2-12任一项所述的显示面板，其中，所述第一透光孔和所述第二透光孔的形状为圆形，所述第一透光孔和所述第二透光孔的孔径为3μm-6μm。
  14. 如权利要求1-13任一项所述的显示面板，其中，所述阵列基板还包括：公共电极和多个像素电极；
    所述多个像素电极位于所述彩膜层背离所述第一衬底基板的一侧，所述公共电极位于所述多个像素电极所在层与所述彩膜层之间；
    所述像素电极在所述第一衬底基板上的正投影与所述公共电极在所述第一衬底基板上的正投影在所述像素开口处相互交叠。
  15. 如权利要求1-13任一项所述的显示面板，其中，所述阵列基板还包括：位于所述彩膜层背离所述第一衬底基板一侧的多个像素电极；
    所述像素电极在所述第一衬底基板上的正投影位于所述色阻在所述第一衬底基板上的正投影内；
    所述对向基板还包括：取向层和公共电极；其中，所述取向层与所述液晶层接触，所述公共电极位于所述取向层背离所述液晶层的一侧。
  16. 如权利要求1-15任一项所述的显示面板，其中，所述光敏传感器包括相对而置的第一电极和第二电极，以及位于所述第一电极和所述第二电极之间的感光层；
    所述感光层包括层叠设置的P型半导体层、本征半导体层和N型半导体层。
  17. 一种显示装置，其中，包括如权利要求1-16任一项所述的显示面板、以及背光模组；其中，所述显示面板位于所述背光模组的出光侧。
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CN211857087U (zh) * 2020-02-24 2020-11-03 宁波激智科技股份有限公司 一种减干涉准直膜
CN111291710A (zh) * 2020-02-25 2020-06-16 京东方科技集团股份有限公司 指纹识别模组及显示装置
CN112364760A (zh) * 2020-11-10 2021-02-12 京东方科技集团股份有限公司 一种显示装置

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