WO2022107463A1 - ケトン誘導体の製造方法 - Google Patents
ケトン誘導体の製造方法 Download PDFInfo
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- WO2022107463A1 WO2022107463A1 PCT/JP2021/036517 JP2021036517W WO2022107463A1 WO 2022107463 A1 WO2022107463 A1 WO 2022107463A1 JP 2021036517 W JP2021036517 W JP 2021036517W WO 2022107463 A1 WO2022107463 A1 WO 2022107463A1
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- 150000002576 ketones Chemical class 0.000 title claims abstract description 64
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 26
- 150000004795 grignard reagents Chemical class 0.000 claims abstract description 116
- 239000007818 Grignard reagent Substances 0.000 claims abstract description 98
- 150000007970 thio esters Chemical class 0.000 claims abstract description 81
- 150000001879 copper Chemical class 0.000 claims abstract description 51
- 238000000034 method Methods 0.000 claims abstract description 39
- 238000002156 mixing Methods 0.000 claims abstract description 16
- 125000001424 substituent group Chemical group 0.000 claims description 301
- 125000004432 carbon atom Chemical group C* 0.000 claims description 87
- 125000000217 alkyl group Chemical group 0.000 claims description 78
- 239000003153 chemical reaction reagent Substances 0.000 claims description 67
- 229910052799 carbon Inorganic materials 0.000 claims description 60
- 125000003118 aryl group Chemical group 0.000 claims description 59
- 239000010949 copper Substances 0.000 claims description 47
- 125000001072 heteroaryl group Chemical group 0.000 claims description 37
- 125000005843 halogen group Chemical group 0.000 claims description 34
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 31
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 30
- 229910052802 copper Inorganic materials 0.000 claims description 29
- 125000000592 heterocycloalkyl group Chemical group 0.000 claims description 23
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 23
- 125000005842 heteroatom Chemical group 0.000 claims description 22
- 125000003342 alkenyl group Chemical group 0.000 claims description 18
- 125000005018 aryl alkenyl group Chemical group 0.000 claims description 14
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 12
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 224
- 150000001875 compounds Chemical class 0.000 description 156
- 239000000243 solution Substances 0.000 description 132
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 112
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 105
- 238000006243 chemical reaction Methods 0.000 description 99
- 125000006239 protecting group Chemical group 0.000 description 87
- -1 4-ethyloxybenzyl Chemical group 0.000 description 69
- 239000000203 mixture Substances 0.000 description 57
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 56
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 53
- 238000005481 NMR spectroscopy Methods 0.000 description 51
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 45
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 45
- 239000012044 organic layer Substances 0.000 description 45
- 150000001721 carbon Chemical group 0.000 description 43
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 37
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 36
- 239000000725 suspension Substances 0.000 description 32
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 30
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 30
- 150000002596 lactones Chemical class 0.000 description 30
- 239000011777 magnesium Substances 0.000 description 30
- 150000003573 thiols Chemical class 0.000 description 30
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 29
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 27
- 238000004458 analytical method Methods 0.000 description 25
- 238000004009 13C{1H}-NMR spectroscopy Methods 0.000 description 23
- 238000010791 quenching Methods 0.000 description 23
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 22
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 22
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 22
- 230000000171 quenching effect Effects 0.000 description 22
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 18
- 125000003545 alkoxy group Chemical group 0.000 description 18
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 17
- 239000007864 aqueous solution Substances 0.000 description 17
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 16
- 239000011541 reaction mixture Substances 0.000 description 16
- 239000007787 solid Substances 0.000 description 16
- 125000001188 haloalkyl group Chemical group 0.000 description 15
- 239000011734 sodium Substances 0.000 description 15
- 239000002904 solvent Substances 0.000 description 15
- 125000003277 amino group Chemical group 0.000 description 14
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 13
- NIXOIRLDFIPNLJ-UHFFFAOYSA-M magnesium;benzene;bromide Chemical compound [Mg+2].[Br-].C1=CC=[C-]C=C1 NIXOIRLDFIPNLJ-UHFFFAOYSA-M 0.000 description 13
- 238000002360 preparation method Methods 0.000 description 13
- 239000000377 silicon dioxide Substances 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 12
- VMQMZMRVKUZKQL-UHFFFAOYSA-N Cu+ Chemical compound [Cu+] VMQMZMRVKUZKQL-UHFFFAOYSA-N 0.000 description 12
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 12
- 125000002723 alicyclic group Chemical group 0.000 description 12
- 238000004440 column chromatography Methods 0.000 description 12
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 12
- 239000010410 layer Substances 0.000 description 12
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 11
- 229910021595 Copper(I) iodide Inorganic materials 0.000 description 11
- 125000000732 arylene group Chemical group 0.000 description 11
- 239000003795 chemical substances by application Substances 0.000 description 11
- 125000000524 functional group Chemical group 0.000 description 11
- 125000005549 heteroarylene group Chemical group 0.000 description 11
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 10
- 125000004448 alkyl carbonyl group Chemical group 0.000 description 10
- 239000007810 chemical reaction solvent Substances 0.000 description 10
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 9
- 125000002947 alkylene group Chemical group 0.000 description 9
- 239000000047 product Substances 0.000 description 9
- YQTCQNIPQMJNTI-UHFFFAOYSA-N 2,2-dimethylpropan-1-one Chemical group CC(C)(C)[C]=O YQTCQNIPQMJNTI-UHFFFAOYSA-N 0.000 description 8
- 239000007848 Bronsted acid Substances 0.000 description 8
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical group [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 8
- 125000004414 alkyl thio group Chemical group 0.000 description 8
- 238000007796 conventional method Methods 0.000 description 8
- 125000003106 haloaryl group Chemical group 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 8
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 7
- 229940123518 Sodium/glucose cotransporter 2 inhibitor Drugs 0.000 description 7
- 239000012445 acidic reagent Substances 0.000 description 7
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 7
- SFJMFSWCBVEHBA-UHFFFAOYSA-M copper(i)-thiophene-2-carboxylate Chemical compound [Cu+].[O-]C(=O)C1=CC=CS1 SFJMFSWCBVEHBA-UHFFFAOYSA-M 0.000 description 7
- 229910052749 magnesium Inorganic materials 0.000 description 7
- PAAZPARNPHGIKF-UHFFFAOYSA-N 1,2-dibromoethane Chemical compound BrCCBr PAAZPARNPHGIKF-UHFFFAOYSA-N 0.000 description 6
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 229910021589 Copper(I) bromide Inorganic materials 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 125000005129 aryl carbonyl group Chemical group 0.000 description 6
- 229940125782 compound 2 Drugs 0.000 description 6
- 125000004663 dialkyl amino group Chemical group 0.000 description 6
- 229910052731 fluorine Inorganic materials 0.000 description 6
- 125000001153 fluoro group Chemical group F* 0.000 description 6
- 125000004438 haloalkoxy group Chemical group 0.000 description 6
- 125000004995 haloalkylthio group Chemical group 0.000 description 6
- 239000000543 intermediate Substances 0.000 description 6
- 239000012046 mixed solvent Substances 0.000 description 6
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 6
- RWWYLEGWBNMMLJ-YSOARWBDSA-N remdesivir Chemical compound NC1=NC=NN2C1=CC=C2[C@]1([C@@H]([C@@H]([C@H](O1)CO[P@](=O)(OC1=CC=CC=C1)N[C@H](C(=O)OCC(CC)CC)C)O)O)C#N RWWYLEGWBNMMLJ-YSOARWBDSA-N 0.000 description 6
- RWWYLEGWBNMMLJ-MEUHYHILSA-N remdesivir Drugs C([C@@H]1[C@H]([C@@H](O)[C@@](C#N)(O1)C=1N2N=CN=C(N)C2=CC=1)O)OP(=O)(N[C@@H](C)C(=O)OCC(CC)CC)OC1=CC=CC=C1 RWWYLEGWBNMMLJ-MEUHYHILSA-N 0.000 description 6
- KXXZPIFZTPWOJJ-UHFFFAOYSA-N s-butyl benzenecarbothioate Chemical compound CCCCSC(=O)C1=CC=CC=C1 KXXZPIFZTPWOJJ-UHFFFAOYSA-N 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 229910052717 sulfur Inorganic materials 0.000 description 6
- 229930192474 thiophene Natural products 0.000 description 6
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 6
- MITGKKFYIJJQGL-UHFFFAOYSA-N 9-(4-chlorobenzoyl)-6-methylsulfonyl-2,3-dihydro-1H-carbazol-4-one Chemical compound ClC1=CC=C(C(=O)N2C3=CC=C(C=C3C=3C(CCCC2=3)=O)S(=O)(=O)C)C=C1 MITGKKFYIJJQGL-UHFFFAOYSA-N 0.000 description 5
- 229910052801 chlorine Inorganic materials 0.000 description 5
- 125000001309 chloro group Chemical group Cl* 0.000 description 5
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 5
- 229940125773 compound 10 Drugs 0.000 description 5
- VTXVGVNLYGSIAR-UHFFFAOYSA-N decane-1-thiol Chemical compound CCCCCCCCCCS VTXVGVNLYGSIAR-UHFFFAOYSA-N 0.000 description 5
- 125000005155 haloalkylene group Chemical group 0.000 description 5
- 125000005216 haloheteroaryl group Chemical group 0.000 description 5
- ZLVXBBHTMQJRSX-VMGNSXQWSA-N jdtic Chemical compound C1([C@]2(C)CCN(C[C@@H]2C)C[C@H](C(C)C)NC(=O)[C@@H]2NCC3=CC(O)=CC=C3C2)=CC=CC(O)=C1 ZLVXBBHTMQJRSX-VMGNSXQWSA-N 0.000 description 5
- JOWQNXIISCPKBK-UHFFFAOYSA-M magnesium;1,3,5-trimethylbenzene-6-ide;bromide Chemical compound [Mg+2].[Br-].CC1=CC(C)=[C-]C(C)=C1 JOWQNXIISCPKBK-UHFFFAOYSA-M 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- 239000003921 oil Substances 0.000 description 5
- 230000035484 reaction time Effects 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 238000010898 silica gel chromatography Methods 0.000 description 5
- 125000001981 tert-butyldimethylsilyl group Chemical group [H]C([H])([H])[Si]([H])(C([H])([H])[H])[*]C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 5
- 125000000037 tert-butyldiphenylsilyl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1[Si]([H])([*]C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 5
- 125000003396 thiol group Chemical group [H]S* 0.000 description 5
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 5
- GLGNXYJARSMNGJ-VKTIVEEGSA-N (1s,2s,3r,4r)-3-[[5-chloro-2-[(1-ethyl-6-methoxy-2-oxo-4,5-dihydro-3h-1-benzazepin-7-yl)amino]pyrimidin-4-yl]amino]bicyclo[2.2.1]hept-5-ene-2-carboxamide Chemical compound CCN1C(=O)CCCC2=C(OC)C(NC=3N=C(C(=CN=3)Cl)N[C@H]3[C@H]([C@@]4([H])C[C@@]3(C=C4)[H])C(N)=O)=CC=C21 GLGNXYJARSMNGJ-VKTIVEEGSA-N 0.000 description 4
- PGZVFRAEAAXREB-UHFFFAOYSA-N 2,2-dimethylpropanoyl 2,2-dimethylpropanoate Chemical compound CC(C)(C)C(=O)OC(=O)C(C)(C)C PGZVFRAEAAXREB-UHFFFAOYSA-N 0.000 description 4
- JVSFQJZRHXAUGT-UHFFFAOYSA-N 2,2-dimethylpropanoyl chloride Chemical compound CC(C)(C)C(Cl)=O JVSFQJZRHXAUGT-UHFFFAOYSA-N 0.000 description 4
- VLRIERSBZHUCOW-UHFFFAOYSA-N 2-[(5-bromo-2-methylphenyl)methyl]-5-(4-fluorophenyl)thiophene Chemical compound CC1=CC=C(Br)C=C1CC1=CC=C(C=2C=CC(F)=CC=2)S1 VLRIERSBZHUCOW-UHFFFAOYSA-N 0.000 description 4
- WADSJYLPJPTMLN-UHFFFAOYSA-N 3-(cycloundecen-1-yl)-1,2-diazacycloundec-2-ene Chemical compound C1CCCCCCCCC=C1C1=NNCCCCCCCC1 WADSJYLPJPTMLN-UHFFFAOYSA-N 0.000 description 4
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 4
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- PHOQVHQSTUBQQK-SQOUGZDYSA-N D-glucono-1,5-lactone Chemical class OC[C@H]1OC(=O)[C@H](O)[C@@H](O)[C@@H]1O PHOQVHQSTUBQQK-SQOUGZDYSA-N 0.000 description 4
- QOSSAOTZNIDXMA-UHFFFAOYSA-N Dicylcohexylcarbodiimide Chemical compound C1CCCCC1N=C=NC1CCCCC1 QOSSAOTZNIDXMA-UHFFFAOYSA-N 0.000 description 4
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 4
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 4
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 4
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 4
- WETWJCDKMRHUPV-UHFFFAOYSA-N acetyl chloride Chemical compound CC(Cl)=O WETWJCDKMRHUPV-UHFFFAOYSA-N 0.000 description 4
- 239000012346 acetyl chloride Substances 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 125000004659 aryl alkyl thio group Chemical group 0.000 description 4
- 125000002102 aryl alkyloxo group Chemical group 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 4
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 4
- KQIADDMXRMTWHZ-UHFFFAOYSA-N chloro-tri(propan-2-yl)silane Chemical compound CC(C)[Si](Cl)(C(C)C)C(C)C KQIADDMXRMTWHZ-UHFFFAOYSA-N 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- 239000012230 colorless oil Substances 0.000 description 4
- 229940125758 compound 15 Drugs 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 238000004817 gas chromatography Methods 0.000 description 4
- 229910000042 hydrogen bromide Inorganic materials 0.000 description 4
- 229910052740 iodine Inorganic materials 0.000 description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
- 229910003002 lithium salt Inorganic materials 0.000 description 4
- 159000000002 lithium salts Chemical class 0.000 description 4
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 4
- 125000004433 nitrogen atom Chemical group N* 0.000 description 4
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- 238000011084 recovery Methods 0.000 description 4
- 239000011780 sodium chloride Substances 0.000 description 4
- 229910052938 sodium sulfate Inorganic materials 0.000 description 4
- 235000011152 sodium sulphate Nutrition 0.000 description 4
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 4
- 239000011593 sulfur Substances 0.000 description 4
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 4
- 125000003718 tetrahydrofuranyl group Chemical group 0.000 description 4
- AQRLNPVMDITEJU-UHFFFAOYSA-N triethylsilane Chemical compound CC[SiH](CC)CC AQRLNPVMDITEJU-UHFFFAOYSA-N 0.000 description 4
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 4
- SZUVGFMDDVSKSI-WIFOCOSTSA-N (1s,2s,3s,5r)-1-(carboxymethyl)-3,5-bis[(4-phenoxyphenyl)methyl-propylcarbamoyl]cyclopentane-1,2-dicarboxylic acid Chemical compound O=C([C@@H]1[C@@H]([C@](CC(O)=O)([C@H](C(=O)N(CCC)CC=2C=CC(OC=3C=CC=CC=3)=CC=2)C1)C(O)=O)C(O)=O)N(CCC)CC(C=C1)=CC=C1OC1=CC=CC=C1 SZUVGFMDDVSKSI-WIFOCOSTSA-N 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 3
- RKMGAJGJIURJSJ-UHFFFAOYSA-N 2,2,6,6-Tetramethylpiperidine Substances CC1(C)CCCC(C)(C)N1 RKMGAJGJIURJSJ-UHFFFAOYSA-N 0.000 description 3
- MGXZKAYHSITHMW-UHFFFAOYSA-N 2-(4-fluorophenyl)-5-[(5-iodo-2-methylphenyl)methyl]thiophene Chemical compound CC1=CC=C(I)C=C1CC1=CC=C(C=2C=CC(F)=CC=2)S1 MGXZKAYHSITHMW-UHFFFAOYSA-N 0.000 description 3
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- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- 125000002672 4-bromobenzoyl group Chemical group BrC1=CC=C(C(=O)*)C=C1 0.000 description 1
- 125000000242 4-chlorobenzoyl group Chemical group ClC1=CC=C(C(=O)*)C=C1 0.000 description 1
- 125000006618 5- to 10-membered aromatic heterocyclic group Chemical group 0.000 description 1
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- XHZWFUVEKDDQPF-UHFFFAOYSA-N 5-bromo-1h-pyrazole Chemical compound BrC1=CC=NN1 XHZWFUVEKDDQPF-UHFFFAOYSA-N 0.000 description 1
- MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- KZMGYPLQYOPHEL-UHFFFAOYSA-N Boron trifluoride etherate Chemical compound FB(F)F.CCOCC KZMGYPLQYOPHEL-UHFFFAOYSA-N 0.000 description 1
- NWGYFCCFFAYTNK-UHFFFAOYSA-N C(C)(C)O[Cu] Chemical compound C(C)(C)O[Cu] NWGYFCCFFAYTNK-UHFFFAOYSA-N 0.000 description 1
- 229940126657 Compound 17 Drugs 0.000 description 1
- 229910021590 Copper(II) bromide Inorganic materials 0.000 description 1
- 229910021592 Copper(II) chloride Inorganic materials 0.000 description 1
- 241000711573 Coronaviridae Species 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- 229910016347 CuSn Inorganic materials 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- OBWASQILIWPZMG-UHFFFAOYSA-N Empagliflozin Chemical compound OC1C(O)C(O)C(CO)OC1C1=CC=C(Cl)C(CC=2C=CC(OC3COCC3)=CC=2)=C1 OBWASQILIWPZMG-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- YKFRUJSEPGHZFJ-UHFFFAOYSA-N N-trimethylsilylimidazole Chemical compound C[Si](C)(C)N1C=CN=C1 YKFRUJSEPGHZFJ-UHFFFAOYSA-N 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 241000725643 Respiratory syncytial virus Species 0.000 description 1
- 108091006269 SLC5A2 Proteins 0.000 description 1
- 101710103228 Sodium/glucose cotransporter 2 Proteins 0.000 description 1
- LNUFLCYMSVYYNW-ZPJMAFJPSA-N [(2r,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6r)-6-[(2r,3r,4s,5r,6r)-6-[(2r,3r,4s,5r,6r)-6-[[(3s,5s,8r,9s,10s,13r,14s,17r)-10,13-dimethyl-17-[(2r)-6-methylheptan-2-yl]-2,3,4,5,6,7,8,9,11,12,14,15,16,17-tetradecahydro-1h-cyclopenta[a]phenanthren-3-yl]oxy]-4,5-disulfo Chemical compound O([C@@H]1[C@@H](COS(O)(=O)=O)O[C@@H]([C@@H]([C@H]1OS(O)(=O)=O)OS(O)(=O)=O)O[C@@H]1[C@@H](COS(O)(=O)=O)O[C@@H]([C@@H]([C@H]1OS(O)(=O)=O)OS(O)(=O)=O)O[C@@H]1[C@@H](COS(O)(=O)=O)O[C@H]([C@@H]([C@H]1OS(O)(=O)=O)OS(O)(=O)=O)O[C@@H]1C[C@@H]2CC[C@H]3[C@@H]4CC[C@@H]([C@]4(CC[C@@H]3[C@@]2(C)CC1)C)[C@H](C)CCCC(C)C)[C@H]1O[C@H](COS(O)(=O)=O)[C@@H](OS(O)(=O)=O)[C@H](OS(O)(=O)=O)[C@H]1OS(O)(=O)=O LNUFLCYMSVYYNW-ZPJMAFJPSA-N 0.000 description 1
- BIGUVDUZGAJWQK-UHFFFAOYSA-M [Br-].CC1=CC=CC(C)=C1[Mg+] Chemical compound [Br-].CC1=CC=CC(C)=C1[Mg+] BIGUVDUZGAJWQK-UHFFFAOYSA-M 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000008186 active pharmaceutical agent Substances 0.000 description 1
- 235000013334 alcoholic beverage Nutrition 0.000 description 1
- 125000005092 alkenyloxycarbonyl group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000000840 anti-viral effect Effects 0.000 description 1
- 229940125708 antidiabetic agent Drugs 0.000 description 1
- 239000003472 antidiabetic agent Substances 0.000 description 1
- 239000003443 antiviral agent Substances 0.000 description 1
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 1
- 125000005098 aryl alkoxy carbonyl group Chemical group 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 125000005605 benzo group Chemical group 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004063 butyryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229940126142 compound 16 Drugs 0.000 description 1
- 150000004696 coordination complex Chemical class 0.000 description 1
- QWLDGFJOWIBTBQ-UHFFFAOYSA-M copper(1+);2,2-dimethylpropanoate Chemical compound [Cu+].CC(C)(C)C([O-])=O QWLDGFJOWIBTBQ-UHFFFAOYSA-M 0.000 description 1
- RFKZUAOAYVHBOY-UHFFFAOYSA-M copper(1+);acetate Chemical compound [Cu+].CC([O-])=O RFKZUAOAYVHBOY-UHFFFAOYSA-M 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 229910000366 copper(II) sulfate Inorganic materials 0.000 description 1
- NKNDPYCGAZPOFS-UHFFFAOYSA-M copper(i) bromide Chemical compound Br[Cu] NKNDPYCGAZPOFS-UHFFFAOYSA-M 0.000 description 1
- ITFUHOHJQIDNQW-UHFFFAOYSA-L copper;2,2-dimethylpropanoate Chemical compound [Cu+2].CC(C)(C)C([O-])=O.CC(C)(C)C([O-])=O ITFUHOHJQIDNQW-UHFFFAOYSA-L 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000012043 crude product Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 125000005982 diphenylmethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 description 1
- 229940088679 drug related substance Drugs 0.000 description 1
- 241001493065 dsRNA viruses Species 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000002523 gelfiltration Methods 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000004446 heteroarylalkyl group Chemical group 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 230000000415 inactivating effect Effects 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000002198 insoluble material Substances 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- SKTCDJAMAYNROS-UHFFFAOYSA-N methoxycyclopentane Chemical compound COC1CCCC1 SKTCDJAMAYNROS-UHFFFAOYSA-N 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000004923 naphthylmethyl group Chemical group C1(=CC=CC2=CC=CC=C12)C* 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000006464 oxidative addition reaction Methods 0.000 description 1
- WYURNTSHIVDZCO-SVYQBANQSA-N oxolane-d8 Chemical compound [2H]C1([2H])OC([2H])([2H])C([2H])([2H])C1([2H])[2H] WYURNTSHIVDZCO-SVYQBANQSA-N 0.000 description 1
- CHNLPLHJUPMEOI-UHFFFAOYSA-N oxolane;trifluoroborane Chemical compound FB(F)F.C1CCOC1 CHNLPLHJUPMEOI-UHFFFAOYSA-N 0.000 description 1
- 125000003232 p-nitrobenzoyl group Chemical group [N+](=O)([O-])C1=CC=C(C(=O)*)C=C1 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 125000000587 piperidin-1-yl group Chemical group [H]C1([H])N(*)C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 125000001325 propanoyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 229960002920 sorbitol Drugs 0.000 description 1
- 239000012258 stirred mixture Substances 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- GHQPTCBGJZNYIO-UHFFFAOYSA-N tert-butyl (2-methylpropan-2-yl)oxycarbonylperoxy carbonate Chemical compound CC(C)(C)OC(=O)OOOC(=O)OC(C)(C)C GHQPTCBGJZNYIO-UHFFFAOYSA-N 0.000 description 1
- 125000005931 tert-butyloxycarbonyl group Chemical group [H]C([H])([H])C(OC(*)=O)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000004149 thio group Chemical group *S* 0.000 description 1
- 125000005505 thiomorpholino group Chemical group 0.000 description 1
- ZGYICYBLPGRURT-UHFFFAOYSA-N tri(propan-2-yl)silicon Chemical compound CC(C)[Si](C(C)C)C(C)C ZGYICYBLPGRURT-UHFFFAOYSA-N 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- VOITXYVAKOUIBA-UHFFFAOYSA-N triethylaluminium Chemical compound CC[Al](CC)CC VOITXYVAKOUIBA-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- UHUUYVZLXJHWDV-UHFFFAOYSA-N trimethyl(methylsilyloxy)silane Chemical compound C[SiH2]O[Si](C)(C)C UHUUYVZLXJHWDV-UHFFFAOYSA-N 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000012982 x-ray structure analysis Methods 0.000 description 1
- 150000003752 zinc compounds Chemical class 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
- C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
- C07D333/26—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D333/38—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B49/00—Grignard reactions
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C253/00—Preparation of carboxylic acid nitriles
- C07C253/30—Preparation of carboxylic acid nitriles by reactions not involving the formation of cyano groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/51—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by pyrolysis, rearrangement or decomposition
- C07C45/518—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by pyrolysis, rearrangement or decomposition involving transformation of sulfur-containing compounds to >C = O groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/51—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by pyrolysis, rearrangement or decomposition
- C07C45/54—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by pyrolysis, rearrangement or decomposition of compounds containing doubly bound oxygen atoms, e.g. esters
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C67/00—Preparation of carboxylic acid esters
- C07C67/30—Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group
- C07C67/317—Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by splitting-off hydrogen or functional groups; by hydrogenolysis of functional groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C67/00—Preparation of carboxylic acid esters
- C07C67/30—Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group
- C07C67/333—Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by isomerisation; by change of size of the carbon skeleton
- C07C67/343—Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/16—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms
- C07D295/18—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms by radicals derived from carboxylic acids, or sulfur or nitrogen analogues thereof
- C07D295/182—Radicals derived from carboxylic acids
- C07D295/192—Radicals derived from carboxylic acids from aromatic carboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
- C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
- C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
- C07D333/22—Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
Definitions
- the present invention relates to a method for producing a ketone derivative.
- SGLT2 inhibitors are useful as anti-diabetic agents.
- SGLT2 means sodium-glucose cotransporter-2.
- examples of the SGLT2 inhibitor include canagliflozin (1- ( ⁇ -D-glycopyranosyl) -4-methyl-3- [5- (4-fluorophenyl) -2-thienylmethyl] benzene) and empagliflozin (1).
- the protecting group of the 1- ( ⁇ -D-glycopyranosyl) -4-methyl-3- [5- (4-fluorophenyl) -2-thienylmethyl] benzene precursor is deprotected. It has been proposed to synthesize canagliflozin (see Patent Document 1).
- the 1- ( ⁇ -D-glycopyranosyl) -4-methyl-3- [5- (4-fluorophenyl) -2-thienylmethyl] benzene precursor is also referred to as a C-arylhydroxyglycoxide derivative and is SGLT-2. It is attracting attention as an intermediate for producing an inhibitor (Patent Documents 1 and 2 and Non-Patent Documents 1 to 3).
- Non-Patent Documents 1 and 3 a method in which an aryl lithium is allowed to act on a D-gluconolactone derivative at an ultra-low temperature of ⁇ 78 ° C. to cause an addition reaction (an aryl group).
- an aryl group is added to a D-gluconolactone derivative by reacting a D-gluconolactone derivative with a turboglycar reagent such as ArMgBr / LiCl (Ar represents an aryl group) at a low temperature of -20 to -10 ° C.
- Non-Patent Document 2 using a magnesium art complex obtained from lithiumtri n-butylmagnesate (nBu 3 MgLi), to a D-gluconolactone derivative under a temperature environment of about -15 ° C.
- a method of adding an aryl group to an addition reaction Patent Document 2 and the like are known. It has also been reported that coupling occurs by reacting an organozinc reagent with a thioester derivative in the presence of a nickel catalyst to obtain a ketone derivative (Non-Patent Documents 4 and 5).
- Remdesivir represented by the following formula (VI') is a compound that can be used as an antiviral drug.
- Remdesivir exhibits antiviral activity against single-stranded RNA viruses such as respiratory syncytial virus and coronavirus.
- Patent Document 3 discloses a method for producing remdesivir and its intermediate.
- Patent Document 3 describes a lactone represented by the following formula (I') and a bromopyrazole represented by the following formula (Ar'') in the presence of chlorotrimethylsilane (TMSCl) and n-butyllithium. It is described that the hydroxynucleoside represented by the following formula (V') can be obtained by reacting at 78 ° C. This hydroxynucleoside can be used as an intermediate for remdesivir synthesis.
- TMSCl chlorotrimethylsilane
- V' chlorotrimethylsilane
- One object of the present invention is to provide a new method for producing a ketone derivative.
- W 1 and W 2 independently have an alkyl group which may have a substituent, an alkenyl group which may have a substituent, and a cyclo which may have a substituent.
- W 1 has the same meaning as described above, and W 3 has an alkyl group which may have a substituent, an alkenyl group which may have a substituent, and a substituent. It has a good cycloalkyl group, a heterocycloalkyl group which may have a substituent, an aryl group which may have a substituent, a heteroaryl group which may have a substituent, and a substituent. Represents an arylalkyl group which may have a substituent or an arylalkenyl group which may have a substituent.
- the Grignard reagent (III) and the copper salt are mixed to form an organic copper reagent, and then the thioester derivative (II) is mixed, and the organic copper reagent and the thioester derivative ( II)
- the method according to [1] which is in contact with (1).
- [3] The method according to [1] or [2], wherein the amount of the copper salt used is 0.1 mol or more and 1 mol or less with respect to 1 mol of the Grignard reagent (III).
- the thioester derivative (II), the Grignard reagent (III) and the copper salt are mixed at a temperature within the range of 20 ° C.
- W 4 represents a phenyl group which has a substituent at at least one ortho position and may have a substituent at the meta position and / or the para position
- X 1 represents a halogen atom. .. ]
- [6] The method according to [5], wherein the amount of the Grignard reagent (IV) used is 0.01 mol or more and 1 mol or less with respect to 1 mol of the Grignard reagent (III).
- the Grignard reagent (III) and the copper salt are mixed, and then the Grignard reagent (IV) is mixed to form an organic copper reagent, and then the thioester derivative (II) is used.
- a new method for producing a ketone derivative is provided.
- the production method of the present invention enables inexpensive and efficient industrial production of ketone derivatives, and can significantly reduce equipment costs, running costs, and the like.
- FIG. 1 shows the molecular structure of [Ph 2 Cu] [Mg 2 Br 3 (thf) 6 ] by a 50% thermal ellipsoid.
- Halogen atom is selected from a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
- the linear alkyl group usually has 1 to 20 carbon atoms, preferably 1 to 10 carbon atoms.
- the number of carbon atoms of the linear alkyl group is, for example, 1 to 8, 1 to 6, 1 to 5, 1 to 4, 1 to 3 or 1 to 2.
- the number of carbon atoms of the branched-chain alkyl group is usually 3 to 20, preferably 3 to 10.
- the number of carbon atoms of the branched-chain alkyl group is, for example, 3 to 8, 3 to 6, 3 to 5 or 3 to 4.
- the linear alkenyl group usually has 1 to 20 carbon atoms, preferably 1 to 10 carbon atoms.
- the number of carbon atoms of the linear alkenyl group is, for example, 1 to 8, 1 to 6, 1 to 5, 1 to 4, 1 to 3 or 1 to 2.
- the number of carbon atoms of the branched alkenyl group is usually 3 to 20, preferably 3 to 10.
- the number of carbon atoms of the branched alkenyl group is, for example, 3 to 8, 3 to 6, 3 to 5 or 3 to 4.
- Cycloalkyl Group The carbon number of the cycloalkyl group is usually 3 to 10, preferably 3 to 8, and more preferably 3 to 6.
- Heterocycloalkyl groups include, for example, one or two heteroatoms independently selected from the group consisting of oxygen, sulfur and nitrogen atoms.
- the heterocycloalkyl group is, for example, a 4- to 7-membered ring heterocycloalkyl group.
- the heterocycloalkyl group preferably contains an oxygen atom as a heteroatom.
- Examples of the heterocycloalkyl group include a tetrahydrofuranyl group and a tetrahydropyranyl group.
- the heterocycloalkyl group is preferably a tetrahydrofuranyl group.
- the aryl group is, for example, a monocyclic, bicyclic or tricyclic aromatic hydrocarbon ring group having 4 to 14 carbon atoms, preferably 6 to 14 carbon atoms.
- Examples of the aryl group include a phenyl group and a naphthyl group.
- the aryl group is preferably a phenyl group.
- alkylene group, an arylene group and a heteroarylene group The alkylene group, the arylene group and the heteroarylene group are divalent functional groups produced by removing one hydrogen atom from the alkyl group, the aryl group and the heteroaryl group, respectively.
- the description of the alkyl group, the aryl group and the heteroaryl group is as described above.
- Haloalkylene group, haloarylene group and haloheteroarylene group The haloalkylene group, haloarylene group and haloheteroarylene group are produced by removing one hydrogen atom from the haloalkyl group, haloaryl group and haloheteroaryl group, respectively.
- the divalent functional group to be used, and the description of the haloalkyl group, the haloaryl group and the haloheteroaryl group is as described above.
- the arylalkenyl group is an alkenyl group having one or more aryl groups, and the description of the alkenyl group and the aryl group is as described above.
- the number of aryl groups contained in the arylalkenyl group is usually 1 to 3, preferably 1 or 2, and more preferably 1.
- Alkylcarbonyl group and arylcarbonyl group are groups represented by the formula: -CO-alkyl group and the formula: -CO-aryl group, respectively, and the description of the alkyl group and the aryl group is described. As above.
- alkyloxy group, haloalkyloxy group, heterocycloalkyloxy group and arylalkyloxy group alkyloxy group, haloalkyloxy group, heterocycloalkyloxy group and arylalkyloxy group are each represented by the formula: —O—alkyl group, formula: -O-Haloalkyl group, formula: -O-heterocycloalkyl group and formula: -O-arylalkyl group is a group represented by an alkyl group, a haloalkyl group, a heterocycloalkyl group and an arylalkyl group. As above.
- alkylthio group, haloalkylthio group, heterocycloalkylthio group and arylalkylthio group alkylthio group, haloalkylthio group, heterocycloalkylthio group and arylalkylthio group are each represented by the formula: —S—alkyl group, formula: —S—haloalkyl group, respectively. It is a group represented by the formula: —S-heterocycloalkyl group and the formula: —S-arylalkyl group, and the description of the alkyl group, the haloalkyl group, the heterocycloalkyl group and the arylalkyl group is as described above.
- alkyloxycarbonyl group is a group represented by the formula: -CO-O-alkyl group, and the description of the alkyl group is as described above.
- the alkyl group contained in the alkyloxycarbonyl group preferably has 1 to 10, more preferably 1 to 8, still more preferably 1 to 6, and even more preferably 1 to 4.
- the monoalkylamino group is of the formula: -NH (-Q 1 ) [in the formula, Q 1 represents an alkyl group. ], And the description of the alkyl group is as described above.
- the number of carbon atoms of the alkyl group represented by Q1 is preferably 1 to 6, more preferably 1 to 4, still more preferably 1 to 3, and even more preferably 1 or 2.
- Dialkylamino group has the formula: -N (-Q 2 ) (-Q 3 ) [In the formula, Q 2 and Q 3 each independently represent an alkyl group. ], And the description of the alkyl group is as described above.
- the number of carbon atoms of the alkyl group represented by Q 2 or Q 3 is preferably 1 to 6, more preferably 1 to 4, still more preferably 1 to 3, and even more preferably 1 or 2.
- the alicyclic amino group is, for example, a 5- or 6-membered alicyclic amino group, and the 5- or 6-membered alicyclic amino group is, for example, a morpholino group or a thiomorpholino group. , Pyrrolidine-1-yl group, pyrazolidine-1-yl group, imidazolidine-1-yl group, piperidin-1-yl group and the like.
- the alicyclic amino group is a hetero atom independently selected from the group consisting of an oxygen atom, a sulfur atom and a nitrogen atom (for example, one hetero) in addition to the nitrogen atom having a bond of the alicyclic amino group. Atoms) may be included.
- the alicyclic amino group is preferably a morpholino group.
- Aminocarbonyl group, monoalkylaminocarbonyl group, dialkylaminocarbonyl group and alicyclic aminocarbonyl group have the formula: -CO, respectively.
- the ketone derivative (I) is a compound represented by the following formula (I).
- W 1 and W 2 are independent of each other.
- An alkyl group which may have a substituent (2) An alkenyl group which may have a substituent, (3) A cycloalkyl group which may have a substituent, (4) A heterocycloalkyl group which may have a substituent, (5) Aryl group which may have a substituent, (6) A heteroaryl group which may have a substituent, (7) Represents an arylalkyl group which may have a substituent, or (8) an arylalkenyl group which may have a substituent.
- Alkyl groups that may have substituents Alkyl groups are described above.
- the alkyl group may have one or more substituents.
- the number of substituents is preferably 1 to 3, more preferably 1 or 2.
- One or more substituents can be independently selected from the substituent groups ⁇ and ⁇ .
- One or more substituents may be selected from the substituent group ⁇ , and one or more substituents may be selected from the substituent group ⁇ .
- alkenyl group which may have a substituent
- the description of the alkenyl group is as described above.
- the alkenyl group may have one or more substituents.
- the number of substituents is preferably 1 to 3, more preferably 1 or 2.
- One or more substituents can be independently selected from the substituent groups ⁇ and ⁇ .
- One or more substituents may be selected from the substituent group ⁇ , and one or more substituents may be selected from the substituent group ⁇ .
- Cycloalkyl Group May Have Substituent
- the description of the cycloalkyl group is as described above.
- the cycloalkyl group may have one or more substituents.
- the number of substituents is preferably 1 to 3, more preferably 1 or 2.
- One or more substituents can be independently selected from the substituent groups ⁇ and ⁇ .
- One or more substituents may be selected from the substituent group ⁇ , and one or more substituents may be selected from the substituent group ⁇ .
- Heterocycloalkyl groups that may have substituents
- the description of the heterocycloalkyl groups is as described above.
- the heterocycloalkyl group may have one or more substituents.
- the number of substituents is preferably 1 to 3, more preferably 1 or 2.
- One or more substituents can be independently selected from the substituent groups ⁇ and ⁇ .
- One or more substituents may be selected from the substituent group ⁇ , and one or more substituents may be selected from the substituent group ⁇ .
- Aryl Group May Have Substituents
- the aryl group may have one or more substituents.
- the number of substituents is preferably 1 to 3, more preferably 1 or 2.
- One or more substituents can be independently selected from the substituent groups ⁇ and ⁇ .
- One or more substituents may be selected from the substituent group ⁇ , and one or more substituents may be selected from the substituent group ⁇ .
- a carbon atom having a bond of the aryl group (a carbon atom bonded to W1 - CO- or W2 - CO- in the formula (I), a carbon bonded to Mg in the formula (IIIa) or (IIIb)). It is preferable that the carbon atoms located on both sides of the atom) do not have a substituent. The remaining carbon atoms may have substituents.
- the heteroaryl group may have one or more substituents.
- the number of substituents is preferably 1 to 3, more preferably 1 or 2.
- One or more substituents can be independently selected from the substituent groups ⁇ and ⁇ .
- One or more substituents may be selected from the substituent group ⁇ , and one or more substituents may be selected from the substituent group ⁇ .
- a carbon atom having a bond of the heteroaryl group (a carbon atom bonded to W1 - CO- or W2 - CO- in the formula (I), bonded to Mg in the formula (IIIa) or (IIIb)). It is preferable that the carbon atom or the hetero atom located on both sides of the carbon atom) has no substituent. The remaining carbon atom or heteroatom may have a substituent.
- Arylalkyl groups that may have substituents A description of the arylalkyl groups is as described above.
- the arylalkyl group may have one or more substituents.
- the number of substituents is preferably 1 to 3, more preferably 1 or 2.
- One or more substituents can be independently selected from the substituent groups ⁇ and ⁇ .
- One or more substituents may be selected from the substituent group ⁇ , and one or more substituents may be selected from the substituent group ⁇ .
- Arylalkenyl Group May Have Substituents
- the arylalkenyl group may have one or more substituents.
- the number of substituents is preferably 1 to 3, more preferably 1 or 2.
- One or more substituents can be independently selected from the substituent groups ⁇ and ⁇ .
- One or more substituents may be selected from the substituent group ⁇ , and one or more substituents may be selected from the substituent group ⁇ .
- Substituent group ⁇ is composed of the following substituents.
- Protective group may be protected Hydroxyl group ( ⁇ -16)
- Protective group may be protected thio group
- the number of carbon atoms of the alkyl group is preferably 1 to 10, more preferably 1 to 8, still more preferably 1 to 6, still more preferably 1 to 4, and more. It is more preferably 1 to 3, and even more preferably 1 to 2.
- the number of halogen atoms contained in the alkyl group is preferably 1 to 3, more preferably 1 to 2, and even more preferably 1.
- alkylcarbonyl-type protecting group examples include an alkylcarbonyl group having 1 to 10 carbon atoms which may have one or more substituents.
- the substituent is, for example, a halogen atom, a nitro group, a cyano group, a phenyl group, 1 or more and 10 or less carbon atoms, preferably 1 or more and 8 or less carbon atoms, more preferably 1 or more and 6 or less carbon atoms, and even more preferably carbon number.
- alkylcarbonyl group having 1 to 10 carbon atoms which may have one or more substituents include an acetyl group, a propanoyl group, a butanoyl group, an isopropanoyl group, a pivaloyl group and the like.
- the alkylcarbonyl-type protecting group is preferably an alkylcarbonyl group having 1 to 5 carbon atoms, more preferably an acetyl group or a pivaloyl group, and even more preferably an acetyl group.
- Examples of the arylcarbonyl-type protecting group include an arylcarbonyl group having 6 to 10 carbon atoms which may have one or more substituents. Specific examples of the substituent are the same as those of the alkylcarbonyl-type protecting group. Examples of the arylcarbonyl group having 6 to 10 carbon atoms which may have one or more substituents include a benzoyl group, a 4-nitrobenzoyl group, a 4-methyloxybenzoyl group, a 4-methylbenzoyl group, and 4-.
- Examples thereof include a tert-butylbenzoyl group, a 4-fluorobenzoyl group, a 4-chlorobenzoyl group, a 4-bromobenzoyl group, a 4-phenylbenzoyl group, a 4-methyloxycarbonylbenzoyl group and the like.
- Examples of the arylalkyl-type protecting group include an arylalkyl group having 7 to 11 carbon atoms which may have one or more substituents. Specific examples of the substituent are the same as those of the alkylcarbonyl-type protecting group. Examples of the arylalkyl group having 7 to 11 carbon atoms which may have one or more substituents include a benzyl group, a 1-phenylethyl group, a diphenylmethyl group, a 1,1-diphenylethyl group and a naphthylmethyl group. , Trityl group and the like.
- the arylalkyl protecting group is preferably a benzyl group.
- alkyl-type protecting group examples include an alkyl group having 1 to 10 carbon atoms which may have one or more substituents. Specific examples of the substituent are the same as those of the alkylcarbonyl-type protecting group.
- the alkyl-type protective group is preferably an alkyl group having 1 to 5 carbon atoms which may have one or more substituents, and more preferably a methyl group, an ethyl group, a tert-butyl group, and more. More preferably, it is a methyl group.
- arylalkyloxyalkyl type protective group for example, an arylalkyloxymethyl group having 7 to 11 carbon atoms which may have 1 or more substituents and a carbon number which may have 1 or more substituents.
- examples thereof include an arylalkyloxyalkyl group having 7 to 11 arylalkyloxyethyl groups and an arylalkyloxypropyl group having 7 to 11 carbon atoms which may have one or more substituents.
- substituent are the same as those of the alkylcarbonyl-type protecting group.
- the arylalkyloxyalkyl type protective group is substituted with, for example, a benzyloxymethyl group which may have one or more substituents, preferably a halogen atom, a nitro group, a cyano group, a methyl group or a methyloxy group. It may be a benzyloxymethyl group, more preferably a benzyloxymethyl group.
- alkyloxyalkyl type protective group examples include an alkyloxymethyl group having 1 to 10 carbon atoms which may have 1 or more substituents and 1 to 1 to 10 carbon atoms which may have 1 or more substituents.
- Specific examples of the substituent are the same as those of the alkylcarbonyl-type protecting group.
- the alkyloxyalkyl-type protective group is preferably an alkyloxymethyl group having 1 to 10 carbon atoms which may have one or more substituents, and more preferably a halogen atom, a nitro group, a cyano group or a methyloxy group. Alternatively, it is an alkyloxymethyl group having 1 to 5 carbon atoms which may have an ethyloxy group, and more preferably a methyloxymethyl group.
- silyl type protective group for example, an alkyl group having 1 to 10 carbon atoms which may have 1 or more substituents and an arylalkyl group having 7 to 10 carbon atoms which may have 1 or more substituents.
- examples thereof include a silyl group having a functional group selected from an aryl group having 6 to 10 carbon atoms which may have a group and one or more substituents.
- Specific examples of the substituent are the same as those of the alkylcarbonyl-type protecting group.
- the silyl type protective group is preferably a silyl group having a functional group selected from an alkyl group having 1 to 10 carbon atoms and an aryl group having 6 to 10 carbon atoms, and more preferably an alkyl group having 1 to 5 carbon atoms and an alkyl group having 1 to 5 carbon atoms.
- Examples of the oxycarbonyl-type protecting group include an alkyloxycarbonyl group having 1 to 10 carbon atoms which may have 1 or more substituents and 2 to 10 carbon atoms which may have 1 or more substituents. Examples thereof include an arylalkyloxycarbonyl group having 7 to 11 carbon atoms which may have one or more substituents. Specific examples of the substituent are the same as those of the alkylcarbonyl-type protecting group.
- the oxycarbonyl-type protecting group is preferably an alkyloxycarbonyl group having 1 to 5 carbon atoms, an alkenyloxycarbonyl group or a benzyloxycarbonyl group having 2 to 5 carbon atoms, and more preferably a methyloxymethyl group, an allyloxycarbonyl group or. It is a benzyloxycarbonyl group.
- acetal-type protecting group examples include a tetrahydrofuranyl group and a tetrahydropyranyl group.
- aryl-type protecting group examples include an aryl group such as a phenyl group.
- the hydroxy group protected by the protecting group is preferably a group represented by the formula: —OR.
- R represents an alkyl group, a haloalkyl group, an aryl group, a haloaryl group, a heterocycloalkyl group, an alkylcarbonyl group, an arylcarbonyl group or an arylalkyl group.
- the number of carbon atoms of the group represented by the formula: —OR is preferably 1 to 10, and more preferably 1 to 8.
- R is preferably an alkyl group, a heterocycloalkyl group, an alkylcarbonyl group or an arylalkyl group, and more preferably an ethyl group, a tetrahydrofuranyl group, an acetyl group or a benzyl group.
- a thiol group that may be protected by a protecting group The thiol group protecting group can protect the thiol group when the desired reaction is carried out, and can be desorbed from the thiol group after the desired reaction is completed. It is preferable that it is a thing.
- the thiol-type protecting group include an alkylcarbonyl-type protecting group, an arylcarbonyl-type protecting group, an arylalkyl-type protecting group, an alkyl-type protecting group, an arylalkyloxyalkyl-type protecting group, an alkyloxyalkyl-type protecting group, and a silyl-type protecting group.
- Examples include a group, an oxycarbonyl-type protecting group, an acetal-type protecting group, an aryl-type protecting group and the like. These protecting groups may have one or more halogen atoms. The description of these protecting groups is as described above.
- the thiol group protected by the protecting group is preferably a group represented by the formula: —SR.
- the description of R is as described above.
- R 11 , R 12 and R 13 each independently represent a hydroxy group which may be protected by an alkyl group, a haloalkyl group, an aryl group, a haloaryl group or a protecting group.
- the hydroxy group which may be protected by a protecting group is preferably a group represented by the above formula: —OR. a is 0 or more and 3 or less.
- V 10 represents an alkylene group, a haloalkylene group, an arylene group, a haloarylene group, a heteroarylene group, a haloheteroarylene group, an ester bond, an ether bond or a carbonyl group.
- the carbon number of the alkylene group or the haloalkylene group is preferably 1 to 10, and more preferably 1 to 8.
- the arylene group, haloarylene group, heteroarylene group or haloheteroarylene group preferably has 4 to 14 carbon atoms, more preferably 6 to 14 carbon atoms.
- V 10 is preferably an alkylene group, more preferably a methylene group or an ethylene group.
- b represents 0 or 1. b is preferably 1.
- W 10 represents an alkylene group, a haloalkylene group, an arylene group, a haloarylene group, a heteroarylene group, a haloheteroarylene group, an ester bond, an ether bond or a carbonyl group.
- W 10 is preferably a heteroarylene group, more preferably a 5-membered heteroarylene group containing a sulfur atom as a heteroatom.
- c represents 0 or 1. c is preferably 1.
- X 10 has a hydrogen atom, an alkyl group which may have a substituent, an aryl group which may have a substituent, or a heteroaryl which may have a substituent. Represents a group.
- the alkyl group, aryl group or heteroaryl group represented by X 10 may have one or more substituents, and the one or more substituents are independently selected from the substituent group ⁇ . Can be done.
- One or more substituents shall be independently selected from a halogen atom, an alkyl group, a haloalkyl group, an alkyloxy group, a haloalkyloxy group, an alkylthio group, a haloalkylthio group, a heterocycloalkyloxy group and a heterocycloalkylthio group.
- halogen atom an alkyloxy group having 1 to 3 carbon atoms and a heterocycloalkyloxy group, and even more preferably to select from a fluorine atom, an ethyloxy group and a tetrahydrofuranyloxy group.
- X 10 is preferably an aryl group which may have a substituent or a heteroaryl group which may have a substituent, and contains a halogen atom, an alkyloxy group having 1 to 3 carbon atoms or an oxygen atom.
- An aryl group having a heterocycloalkyloxy group contained as a hetero atom or an unsubstituted heteroaryl group is more preferable, and a phenyl group having a fluorine atom, an ethyloxy group or a tetrahydrofuranyloxy group, or an unsubstituted benzo. It is more preferably a thiophenyl group.
- W 1 is preferably represented by the following formula (iii).
- R 14 , R 15 and R 16 independently represent an alkyl group, a haloalkyl group, an aryl group, a haloaryl group, an alkylcarbonyl group, an arylcarbonyl group or an arylalkyl group, respectively.
- R 14 and R 16 are preferably the same substituents, and R 15 is preferably a different type of substituent than R 14 and R 16 .
- R 14 and R 16 are preferably an alkylcarbonyl group or an arylalkyl group, respectively, preferably an acetyl group or a benzyl group, and more preferably a benzyl group.
- R15 is preferably an alkylcarbonyl group or an arylalkyl group, more preferably an acetyl group or a benzyl group, and even more preferably an acetyl group.
- d is 1 or more and 5 or less. d is preferably 2 or 3.
- W 2 is preferably represented by the following formula (iv).
- Y 10 represents an alkylene group which may have a substituent, an arylene group which may have a substituent, or a heteroarylene group which may have a substituent. ..
- the alkylene group preferably has 1 to 10 carbon atoms, and more preferably 1 to 8 carbon atoms.
- the arylene group or the heteroarylene group preferably has 4 to 14 carbon atoms, more preferably 6 to 14 carbon atoms.
- the alkylene group, arylene group or heteroarylene group represented by Y 10 may have one or more substituents, and the one or more substituents are independently selected from the substituent group ⁇ . Can be done.
- the substituent of 1 or more is preferably independently selected from a halogen atom, an alkyl group, a haloalkyl group, an alkyloxy group, a haloalkyloxy group, an alkylthio group and a haloalkylthio group, and has a halogen atom and 1 to 3 carbon atoms. It is more preferable to select from the above alkyl groups and alkyloxy groups having 1 to 3 carbon atoms.
- Y 10 is preferably an arylene group having a substituent, more preferably an arylene group having a halogen atom or an alkyl group having 1 to 3 carbon atoms, and a phenylene group having a fluorine atom, a chlorine atom or a methyl group. Is even more preferable.
- Y 10 the carbon atoms located on both sides of the carbon atom bonded to W1 - CO- do not have a substituent, and the remaining carbon atoms may have a substituent or an arylene group or W 1 -
- the carbon atom or heteroatom located on both sides of the carbon atom bonded to CO- may have no substituent, and the remaining carbon atom or heteroatom may be a heteroarylene group which may have a substituent.
- Y 10 is a phenylene group which does not have a substituent at the ortho position and may have a substituent at the meta position and / or the para position with respect to the carbon atom bonded to W1 - CO-. Is more preferable.
- V 10 , W 10 , X 10 , b and c are synonymous with the formula (ii), respectively.
- W 2 is preferably represented by the following formula (vi).
- R 41 and R 42 each independently represent a protecting group of a hydrogen atom or an amino group.
- the protecting group for the amino group any protecting group such as carbamate-based, acyl-based, amide-based, sulfonamide-based, and phthaloyl group may be used.
- the carbamate-based protecting group include a tert-butoxycarbonyl group, a benzyloxycarbonyl group, a 9-fluorenylmethyloxycarbonyl group, a 2,2,2-trichloroethoxycarbonyl group, an allyloxycarbonyl group and the like. ..
- Examples of the acyl-based protecting group include an acetyl group, a pivaloyl group, a benzoyl group and the like.
- Examples of the amide-based protecting group include a trifluoroacetyl group and the like.
- Examples of the sulfonamide-based protecting group include a p-toluenesulfonyl group and a 2-nitrobenzenesulfonyl group.
- the amino-protecting group is preferably an acyl-based or amide-based protecting group.
- the amino-protecting group is more preferably a pivaloyl group or a trifluoroacetyl group.
- R 41 and R 42 may be bonded to each other to form a protecting group for an amino group such as a phthaloyl group.
- Examples of the ketone derivative (I) according to one embodiment include compounds in which W 1 and W 2 each independently represent an aryl group which may have a substituent, and specific examples thereof include a compound. , The following compounds are mentioned.
- W 1 and W 2 each represent an aryl group which may independently have a substituent
- the following compounds can be mentioned.
- Me represents a methyl group
- Et represents an ethyl group
- tBu represents a tert-butyl group
- Ph represents a phenyl group
- compounds I-1 to I-17 compounds I-1 to I-9, I-12 and I-13 are preferable.
- Examples of the ketone derivative (I) according to another embodiment include the ketone derivative (Ia) represented by the following formula (Ia).
- Ar may have an alkyl group which may have a substituent, an alkenyl group which may have a substituent, a cycloalkyl group which may have a substituent, and a hetero which may have a substituent. It has a cycloalkyl group, an aryl group that may have a substituent, a heteroaryl group that may have a substituent, an arylalkyl group that may have a substituent, or a substituent. It may be an arylalkenyl group, preferably an aryl group which may have a substituent.
- R 1 and R 2 independently represent a hydroxy group-protecting group or a hydrogen atom
- R 3 and R 4 independently represent a hydroxy group-protecting group or a hydrogen atom
- R 5 is a hydroxy group. It is preferable to represent a protective group
- R 1 and R 2 each independently represent a hydroxy group protective group
- R 3 and R 4 each independently represent a hydroxy group protective group or a hydrogen atom. 5 more preferably represents a hydroxy group protective group.
- R 1 and R 2 may be hydrogen atoms, they are preferably hydroxy-protecting groups from the viewpoint of efficiently forming a 6-membered ring compound of the formula (IVa) described later.
- R 1 and R 2 may be the same type of hydroxy-protecting group or different types of hydroxy-protecting group, but from the viewpoint of efficient introduction and removal of the hydroxy-protecting group, they may be used. It is preferably the same type of hydroxy protecting group.
- R 3 and R 4 may be hydrogen atoms, they are preferably hydroxy-protecting groups from the viewpoint of efficiently forming a 6-membered ring compound of the formula (IVa) described later.
- R 3 and R 4 may be the same type of hydroxy-protecting group or different types of hydroxy-protecting group, but from the viewpoint of efficient introduction and removal of the hydroxy-protecting group, they may be used. It is preferably the same type of hydroxy protecting group.
- R 3 and R 4 may be the same type of hydroxy-protecting group as R 1 and R 2 , or may be a different type of hydroxy-protecting group from R 1 and R 2 , but they may be hydroxy groups. From the viewpoint of efficient introduction and removal of the protecting group, it is preferable that the hydroxy group protecting group is the same type as R 1 and R 2 .
- R 5 is preferably a hydroxy group protecting group of a different type from R 1 and R 2 .
- a hydroxy group is generated and reacts with a carbonyl group in the same molecule to form a ring of the formula (IVa) described later. Therefore, the hydroxy group represented by R 5 can be selectively removed while retaining the hydroxy protecting group represented by R 1 and R 2 . It is preferable to select the type of protecting group.
- the hydroxy - protecting group represented by R5 is an acetyl group or a pivaloyl group, and the hydroxy-protecting group represented by R1 and the hydroxy-protecting group represented by R2 are independent of each other. Then, it is a methyl group, a benzyl group, a trimethylsilyl group, a tert-butyldimethylsilyl group or a tert-butyldiphenylsilyl group.
- the hydroxy-protecting group represented by R 5 is a trimethylsilyl group, a tert-butyldimethylsilyl group or a tert-butyldiphenylsilyl group, a hydroxy-protecting group represented by R1 and R2 .
- the hydroxy-protecting groups represented by are independently methyl groups, benzyl groups, acetyl groups or pivaloyl groups.
- R 5 is preferably a hydroxy-protecting group different from R 1 , R 2 , R 3 and R 4 .
- R 5 is preferably a hydroxy protecting group (for example, an acetyl group) other than the benzyl group. Since R 5 is a hydroxy-protecting group different from R 1 , R 2 , R 3 and R 4 , -OR 5 is maintained while maintaining -OR 1 , -OR 2 , -OR 3 and -OR 4 . It can be desorbed, and a 6-membered ring of the formula (IVa) described later can be efficiently formed.
- the hydroxy group - protecting group represented by R5 is an acetyl group or a pivaloyl group
- the hydroxy group-protecting groups represented by R1 , R2 , R3 and R4 are independent of each other.
- the hydroxy - protecting group represented by R5 is a trimethylsilyl group, a tert-butyldimethylsilyl group or a tert-butyldiphenylsilyl group, represented by R1 , R2 , R3 and R4 .
- the hydroxy-protecting groups to be formed are independently methyl groups, benzyl groups, acetyl groups or pivaloyl groups.
- the ketone derivative (Ia) is, for example, a compound in which R 1 to R 5 each independently represent a hydroxy-protecting group, and Ar represents an aryl group which may have a substituent.
- Examples of such a compound include the following compounds.
- “Ac” represents an acetyl group
- “Bn” represents a benzyl group (the same applies throughout the present specification).
- the phenyl group corresponding to Ar may have one or more substituents.
- the number of substituents is preferably 1 to 3, more preferably 1 or 2.
- One or more substituents can be independently selected from the substituent groups ⁇ and ⁇ .
- One or more substituents may be selected from the substituent group ⁇ , and one or more substituents may be selected from the substituent group ⁇ .
- Ar is the same as the functional group of the SGLT-2 inhibitor or the functional group of the SGLT-2 inhibitor from the viewpoint of using the ketone derivative (Ia) as a raw material for producing the SGLT-2 inhibitor or its derivative. It is preferable that the functional group is derivatized.
- canagliflozin (1- ( ⁇ -D-glycopyranosyl) -4-methyl-3- [5- (4-fluorophenyl) -2-thienylmethyl] benzene
- empagliflozin (1S)-" 1,5-Anhydro-1-C- ⁇ 4-Chloro-3-[(also referred to as 4- ⁇ [(3S) -oxolan-3-yl] oxy ⁇ phenyl) methyl] phenyl ⁇ -D-glucitol ”
- Iplugriflozin (“(1S) -1,5-anhydro-1-C- ⁇ 3-[(1-benzothiophen-2-yl) methyl] -4-fluorophenyl ⁇ -D-glucitol- (2S)) -Pyrrolidine-2-carboxylic acid ”)
- dapagliflozin (2S, 3R, 4R, 5S, 6R) -2-
- Ar is preferably a functional group represented by the following formula (A).
- n represents an integer of 0 to 4. n is preferably 1 to 3, more preferably 1 or 2, and even more preferably 1. When n is 2 or more, the n Ras may be the same or different.
- the n Ras can be independently selected from the substituent group ⁇ .
- the n Ras are preferably independently selected from a halogen atom, an alkyl group, a haloalkyl group, an alkyloxy group, a haloalkyloxy group, an alkylthio and a haloalkylthio group, and have a halogen atom and 1 to 3 carbon atoms. It is more preferable to select from an alkyl group and an alkyloxy group having 1 to 3 carbon atoms.
- Ar' is a group represented by the following formula (v).
- W 10 , X 10 and c are synonymous with the formula (ii), respectively.
- Ar' is preferably a group represented by the following formula (Ar'-1), (Ar'-2) or (Ar'-3).
- p is an integer of 0 to 5.
- p is preferably an integer of 0 to 3, more preferably an integer of 0 to 2, and even more preferably 0 or 1.
- p R bs are independently selected from the substituent group ⁇ and the substituent group ⁇ , respectively. It can be selected from an aryl group which may have a substituent of the above and a heteroaryl group which may have one or more substituents selected from the substituent group ⁇ . It is preferable that the p R bs are independently selected from the substituent group ⁇ and the aryl group which may have one or more substituents selected from the substituent group ⁇ .
- One or more substituents selected from the substituent group ⁇ are independently a halogen atom, an alkyl group, a haloalkyl group, an alkyloxy group, a haloalkyloxy group, an alkylthio group, a haloalkylthio group, a heterocycloalkyloxy group and It is preferable to select from a heterocycloalkylthio group, and more preferably to select from a halogen atom, an alkyl group having 1 to 3 carbon atoms, an alkyloxy group having 1 to 3 carbon atoms and a heterocycloalkyloxy group, and a fluorine atom and ethyloxy. It is even more preferred to choose from groups and tetrahydrofuranyloxy groups.
- the p R bs may be the same or different.
- R b is preferably a phenyl group which may have a substituent, and more preferably a phenyl group which has a halogen atom. Yes, and even more preferably, it is a phenyl group having a fluorine atom.
- the position to which the unsubstituted or substituted phenyl group is attached is preferably the 2-position of the thiophene ring.
- the position where the halogen atom is bonded is preferably the 4-position of the benzene ring.
- p is preferably 0.
- R b is preferably an alkyloxy group which may have a substituent or a heterocycloalkyl which may have a substituent. It is an oxy group.
- the alkyloxy group which may have a substituent is preferably an alkyloxy group having 1 to 3 carbon atoms, and more preferably a methoxy group or an ethoxy group.
- the heterocycloalkyloxy group which may have a substituent is preferably a tetrahydrofuranyloxy group.
- the position to which the alkyloxy group which may have a substituent or the heterocycloalkyloxy group which may have a substituent is bonded is preferably the 4-position of the benzene ring.
- Ar is preferably a group represented by the following formula (B).
- Ra and Ar' are synonymous with formula (A).
- Ar is preferably a group represented by the following formula (Ar-1), (Ar-2), (Ar-3) or (Ar-4).
- “Et” represents an ethyl group.
- the ketone derivative (Ia) is, for example, a compound in which R 1 to R 5 independently represent a hydroxy-protecting group, and Ar represents a group represented by the formula (Ar-1). Examples of such a compound include the following compounds. In addition, “Ac” represents an acetyl group, and “Bn” represents a benzyl group.
- Examples of the ketone derivative (I) according to another embodiment include the ketone derivative (Ib) represented by the following formula (Ib).
- R 1 , R 2 , R 3 , R 5 and Ar are synonymous with the above, respectively.
- the thioester derivative (II) is a compound represented by the following formula (II).
- W 1 is synonymous with the above, and W 3 is Alkyl groups, which may have substituents, An alkenyl group which may have a substituent, Cycloalkyl groups, which may have substituents, Heterocycloalkyl groups, which may have substituents, Aryl groups, which may have substituents, Heteroaryl groups, which may have substituents, Arylalkyl groups that may have substituents, or Represents an arylalkenyl group which may have a substituent.
- An aryl group which may have a substituent, a heteroaryl group which may have a substituent, an arylalkyl group which may have a substituent, and a substituent may be possessed.
- the description of the arylalkenyl group is as described above.
- W 3 may be the same as or different from W 1 and / or W 2 .
- the thioester derivative (II) may be a commercially available product or may be produced according to a conventional method.
- W 1 is an alkyl group which may have a substituent.
- W 1 is preferably an alkyl group having a hydroxy group which may be protected by a protecting group, and an alkyl group having a hydroxy group which may be protected by a protecting group. Is more preferable.
- Examples of the thioester derivative (II) according to this embodiment include a thioester derivative (IIa) represented by the following formula (IIa).
- R 1 to R 5 and W 3 have the same meanings as described above.
- W 3 is an alkyl group which may have a substituent.
- W3 is more preferably an alkyl group having 1 to 20 carbon atoms which may have a substituent, and an alkyl group having 1 to 16 carbon atoms which may have a substituent. It is more preferable that it is an alkyl group having 1 to 12 carbon atoms which may have a substituent.
- Examples of the thioester derivative (IIa) according to this embodiment include the following compounds.
- “Ac” represents an acetyl group
- Bn represents a benzyl group.
- —C 10 H 21 corresponding to W 3 may have one or more substituents.
- the number of substituents is preferably 1 to 3, more preferably 1 or 2.
- One or more substituents can be independently selected from the substituent groups ⁇ and ⁇ .
- One or more substituents may be selected from the substituent group ⁇ , and one or more substituents may be selected from the substituent group ⁇ .
- -C 10 H 21 corresponding to W 3 can be changed to another alkyl group.
- examples of other alkyl groups include -C 12 H 25 and the like.
- Other alkyl groups may have one or more substituents.
- the number of substituents is preferably 1 to 3, more preferably 1 or 2.
- One or more substituents can be independently selected from the substituent groups ⁇ and ⁇ .
- One or more substituents may be selected from the substituent group ⁇ , and one or more substituents may be selected from the substituent group ⁇ .
- Examples of the thioester derivative (II) according to another embodiment include the thioester derivative (IIb) represented by the following formula (IIb).
- R 1 , R 2 , R 3 , R 5 and W 3 have the same meanings as above.
- the thioester derivative (II) can be obtained, for example, by the following method.
- R 1 , R 2 and R 3 are synonymous with the above.
- e is 1 or more and 4 or less.
- lactone derivative (V) As the lactone derivative (V), a commercially available one may be used, or one synthesized by a known method may be used.
- W 3 has the same meaning as above.
- thiol (1) a commercially available thiol may be used, or a thiol synthesized by a known method may be used.
- the thiol (1) preferably contains at least one selected from the group consisting of 1-decanethiol and 1-dodecanethiol.
- R 1 , R 2 , R 3 , W 3 and e are synonymous with the above.
- R 1 , R 2 , R 3 , R 5 , W 3 and e are synonymous with the above.
- the amount of thiol (1) is, for example, 0.5 mol or more and 10 mol or less, preferably 1 mol or more and 5 mol or less, and more preferably 1 mol or more and 2 mol or less with respect to 1 mol of the lactone derivative (V). be.
- the amount of substance of the thiol (1) is preferably larger than the amount of substance of the lactone derivative (V).
- Trialkylaluminum acts as a reactant.
- the trialkylaluminum preferably contains at least one selected from the group consisting of trimethylaluminum, triethylaluminum and triproprualuminum, and more preferably contains trimethylaluminum.
- the amount of trialkylaluminum is, for example, 1 mol or more and 10 mol or less, preferably 1 mol or more and 5 mol or less, and more preferably 1 mol or more and 3 mol or less with respect to 1 mol of the lactone derivative (V).
- the amount of substance of trialkylaluminum is preferably larger than the amount of substance of the lactone derivative (V).
- the amount of trialkylaluminum is, for example, 1 mol or more and 2 mol or less, preferably 1 mol or more and 1.5 mol or less, and more preferably 1 mol or more and 1.1 mol or less with respect to 1 mol of thiol (1). be.
- the contact temperature is, for example, ⁇ 30 ° C. or higher and 80 ° C. or lower, preferably ⁇ 10 ° C. or higher and 40 ° C. or lower, more preferably ⁇ 10. ° C or higher and 10 ° C or lower.
- the contact time is, for example, 30 minutes or more and 120 hours or less, preferably 1 hour or more and 100 hours or less, and more preferably 30 hours or more and 90 hours or less. It is preferable that the lactone derivative (V) and the thiol (1) are stirred while being maintained at the above contact temperature for the contact time. This reaction is preferably carried out in an inert atmosphere such as argon.
- the contact between the lactone derivative (V) and the thiol (1) is preferably carried out in the presence of the first reaction solvent.
- the first reaction solvent it is preferable to bring the lactone derivative (V) into contact with the thiol (1) by the following method.
- the lactone derivative (V), the thiol (1) and the trialkylaluminum are mixed with the first reaction solvent, respectively, to prepare a lactone derivative solution, a thiol solution and a trialkylaluminum solution.
- a trialkylaluminum solution is added to the thiol solution at a rate of, for example, 0.1 mL or more and 10 mL or less per minute, and the mixture is stirred for 1 minute or more and 1 hour or less.
- a lactone derivative solution is added to the stirred mixture at a rate of 0.1 mL or more and 10 mL or less per minute, and the mixture is stirred for 20 minutes or more and 3 hours or less.
- the amount of the first reaction solvent with respect to 1 g of the lactone derivative (V) is preferably 1 mL or more and 10 mL or less.
- the amount of the first reaction solvent with respect to 1 g of thiol (1) is preferably 1 mL or more and 15 mL or less.
- the concentration of the trialkylaluminum solution is preferably 0.1 mol / L or more and 5 mol / L or less.
- the first reaction solvent examples include acetonitrile, propionitrile, tetrahydrofuran (THF), 2-methyl-tetrachloride, 1,4-dioxane, tert-butylmethyl ether, diisopropyl ether, dimethyloxyethane, diglime, acetone and methyl ethyl ketone. , Diethyl ketone, methyl acetate, ethyl acetate, butyl acetate, methylene chloride, chloroform, carbon tetrachloride, 1,2-dichloroethane, chlorobenzene, toluene, xylene, hexane and heptane.
- methylene chloride, toluene, hexane or a mixed solvent thereof is preferably used, and more preferably methylene chloride is used.
- the hydroxyl group-containing compound (II-i) obtained by the reaction of the lactone derivative (V) and the thiol (1) is preferably isolated by the following method.
- a quenching solution such as ice-cold water is added to the reaction solution to stop the reaction.
- Bronsted acid is added to the reaction solution after the quenching solution is added.
- the hydroxyl group-containing compound (II-i) obtained by using a lactone derivative (V) having a ring number of 5 members or less as a substrate can be obtained by using a lactone derivative (V) having a ring number of 6 members or more as a substrate.
- the present inventors have found that the structure of the substrate is more likely to change as compared with the hydroxyl group-containing compound. To solve such a problem, it was found that by making the pH of the reaction solution acidic, the cyclization of the hydroxyl group-containing compound (II-i) is suppressed and the yield thereof is increased.
- the amount of Bronsted acid is, for example, 1 mol or more, preferably 3 mol or more, and more preferably 5 mol or more with respect to 1 mol of the lactone derivative (V). There is no particular upper limit to the amount of Bronsted acid, but according to one example, it is 30 mol or less.
- Examples of the Bronsted acid include hydrogen halide, sulfuric acid (H2 SO 4 ) , carbonic acid, acetic acid, oxalic acid, citric acid, trifluoroacetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, p-toluenesulfonic acid and phosphorus. At least one selected from the group consisting of acids is used.
- the hydrogen halide for example, hydrogen fluoride (HF), hydrogen chloride (HCl), hydrogen bromide (HBr) or hydrogen iodide (HI) is used.
- the Bronsted acid it is preferable to use at least one selected from the group consisting of hydrogen chloride, hydrogen bromide and sulfuric acid.
- An acidic solution in which Bronsted acid is dissolved in water may be used.
- the amount thereof is preferably 10 mL or more and 30 mL or less with respect to 1 g of the lactone derivative (V).
- the reaction solution containing Bronsted acid is stirred to separate it into an aqueous layer and an organic layer.
- a solvent of the same type as the solvent mentioned in the first reaction solvent is added to the aqueous layer, and the organic layer and the aqueous layer are separated again.
- the organic layer is extracted and combined with the previously extracted organic layer to obtain a total organic layer.
- the total organic layer is washed with water, saline or the like and then dried over sodium sulfate or the like to obtain a residue containing the product of the hydroxyl group-containing compound (II-i).
- the structure of the hydroxyl group-containing compound (II-i) can be confirmed by, for example, nuclear magnetic resonance (NMR) spectroscopic analysis.
- NMR nuclear magnetic resonance
- the thioester derivative (II-ii) can be obtained.
- the method for protecting the hydroxyl group is not particularly limited, and a known method can be used.
- a method of reacting the hydroxyl-containing compound (II-i) with the protecting group - introducing reagent in the presence of an acid or a basic reagent in an inert solvent to introduce the protecting group R5 can be mentioned. This reaction is preferably carried out in an inert atmosphere such as argon.
- the protecting group - introducing reagent can be appropriately determined according to the type of R5.
- the protecting group-introducing reagent include an ester-type protecting group-introducing agent such as acetic anhydride, pivalic acid anhydride, acetyl chloride and pivaloyl chloride; an arylalkyl ether-type protecting group-introducing agent such as benzyl bromide; and an alkyl such as iodomethane.
- Ester-type protecting group-introducing agent such as trimethylsilyl chloride, triisopropylsilyl chloride, tert-butyldimethylsilyl chloride, tert-butyldiphenylsilyl chloride; oxy such as bis (tert-butyloxycarbonyloxy) oxide
- Examples thereof include a carbonyl-type protecting group-introducing agent, preferably an ester-type protecting group-introducing agent such as acetic acid anhydride, pivalic acid anhydride, acetyl chloride, and pivaloyl chloride, and more preferably acetic acid anhydride.
- Examples of the acidic reagent include inorganic acids such as acetic acid and hydrogen bromide, and organic acids such as p-toluenesulfonic acid and phthalic acid.
- Examples of the basic reagent include organic amines such as triethylamine, 4-dimethylaminopyridine (DMAP), diazabicycloundecene (DBU) and diethylaniline, and triethylamine and 4-dimethylaminopyridine (preferably). DMAP) or a mixture thereof.
- the amount of the acidic reagent used is not particularly limited, but is, for example, 0.1 to 1000 mol, preferably 1 to 5 mol, per 1 mol of the lactone derivative (V).
- the amount of the basic reagent used is not particularly limited, but is, for example, 0.001 to 10 mol, preferably 0.01 to 2 mol, relative to 1 mol of the lactone derivative (V).
- the solvent used is preferably an organic solvent, for example, acetonitrile, propionitrile, THF, 2-methyl-tetrachloride, 1,4-dioxane, tert-butylmethyl ether, diisopropyl ether, dimethyloxyethane, diglyme.
- organic solvent for example, acetonitrile, propionitrile, THF, 2-methyl-tetrachloride, 1,4-dioxane, tert-butylmethyl ether, diisopropyl ether, dimethyloxyethane, diglyme.
- the amount of the solvent used is not particularly limited, but is, for example, 1 to 1000 mL, preferably 1 to 100 mL with respect to 1 g of the lactone derivative (V).
- the reaction temperature is not particularly limited, but is usually ⁇ 30 to 100 ° C., preferably ⁇ 30 to 40 ° C., more preferably ⁇ 10 to 40 ° C., and even more preferably 0 to 30 ° C.
- the thioester derivative (II-ii) obtained by introducing the hydroxyl protecting group R5 into the hydroxyl group - containing compound (II-i) is preferably isolated by the following method.
- a quenching solution such as water is added to the reaction solution to stop the reaction.
- the reaction solution to which the quenching solution is added is stirred to separate it into an aqueous layer and an organic layer.
- a solvent of the same type as the solvent mentioned in the first reaction solvent is added to the aqueous layer, and the organic layer and the aqueous layer are separated again.
- the organic layer is extracted and combined with the previously extracted organic layer to obtain a total organic layer.
- the total organic layer is washed with water, saline or the like and then dried over sodium sulfate or the like to obtain a residue containing the product of the thioester derivative (II-ii).
- the structure of the thioester derivative (II-ii) can be confirmed by, for example, nuclear magnetic resonance (NMR) spectroscopic analysis.
- Grignard reagent (III) The following formula (IIIa): Grignard reagent (IIIa) represented by, and The following formula (IIIb): Grignard reagent (IIIb) represented by Is selected from.
- W 2 is synonymous with the above, and X represents a halogen atom.
- the halogen atom is preferably selected from a chlorine atom, a bromine atom and an iodine atom.
- one of the Grignard reagent (IIIa) and the Grignard reagent (IIIb) may be selected, or both may be selected. When both are selected, a mixture of both may be added to the reaction system, or both may be added to the reaction system separately.
- the Grignard reagent (IIIa) may be a commercially available product or may be produced according to a conventional method.
- the Grignard reagent (III) preferably contains the Grignard reagent (IIIb) from the viewpoint of improving the reaction rate.
- the Grignard reagent (IIIb) is called a turbo Grignard reagent.
- the Grignard reagent (IIIb) may be a commercially available product or may be produced according to a conventional method.
- the Grignard reagent (IIIb) is, for example, in a reaction vessel substituted with an inactivating gas (eg, nitrogen, argon, etc.) with magnesium in the presence of a lithium salt, in the formula: W 2 X [in formula, W 2 and X]. Is synonymous with the above. ] Can be produced by reacting with the halogen organic compound represented by the above in an organic solvent.
- an inactivating gas eg, nitrogen, argon, etc.
- the Grignard reagent (IIIb) is described in Angewandte Chemiet. Int. According to the known method described in Ed2006, 45, 2958 and the like, the formula: TMPMgX ⁇ LiY [in the formula, TMP represents 2,2,6,6-tetramethylpiperidine. ], It may be produced by reacting a Noschel-Hauser base represented by the formula: W2 - H with a compound represented by the formula: W2-H.
- Copper salt examples include copper (I) chloride (CuCl), copper (II) chloride (CuCl 2 ), copper (I) bromide (CuBr), copper (II) bromide (CuBr 2 ), and copper cyanide.
- the valence of the copper atom contained in the copper salt is usually monovalent or divalent, but preferably monovalent.
- a copper salt having a monovalent copper atom has an excellent catalytic action.
- CuCl, CuI or CuBr is particularly preferable.
- CuCl, CuI and CuBr are particularly excellent in catalytic action.
- Examples of the copper salt containing sulfur (S) include copper (I) thiophene-2-carboxylate. S has a high affinity with Cu, and in a copper salt, S is easy to coordinate with Cu. This coordination activates Cu and increases the yield.
- the method for producing the ketone derivative (I) includes a step of mixing the thioester derivative (II), the Grignard reagent (III), and the copper salt to form the ketone derivative (I).
- the ketone derivative (I) By mixing the thioester derivative (II), the Grignard reagent (III), and the copper salt, the ketone derivative (I) can be obtained in high yield.
- the present inventors presume that the reason for this is that an anionic complex represented by the following formula (10) is formed. That is, it is considered that the oxidative addition of the carbon-sulfur bond of the thioester derivative (II) is promoted to the complex (10) which is anionic rather than neutral.
- the Grinard reagent (III) and the copper salt are mixed to form an organic copper reagent, and then the thioester derivative (II) is used. It is preferable to mix and bring the organic copper reagent into contact with the thioester derivative (II). Thereby, the ketone derivative (I) can be obtained in a high yield.
- the amount of copper salt used is preferably 0.1 mol or more and 1 mol or less with respect to 1 mol of Grignard reagent (III). By setting the amount of the copper salt used with respect to the Grignard reagent (III) within this range, the formation of the complex (10) tends to proceed smoothly.
- the amount of the copper salt used is more preferably 0.3 mol or more and 0.9 mol or less, still more preferably 0.4 mol or more and 0.8 mol or less, based on 1 mol of the Grignard reagent (III). Is.
- the amount of copper salt used is 0.5 mol or more and 0.9 mol or less according to one example, and 0.6 mol or more and 0.8 mol or less according to another example, with respect to 1 mol of Grignard reagent (III). It is as follows.
- the amount of copper salt used is usually 0.1 mol or more and 1 mol or less, preferably 0.3 mol or more, with respect to 1 mol of the Grinard reagent (IIIb). It is 0.9 mol or less, more preferably 0.4 mol or more and 0.8 mol or less.
- the amount of the copper salt used is 0.4 mol or more and 0.92 mol or less with respect to 1 mol of the Grinard reagent (IIIb). According to another example, it is 0.5 mol or more and 0.82 mol or less, and according to another example, it is 0.6 mol or more and 0.72 mol or less.
- the amount of the copper salt used is usually 0.1 mol or more and 10 mol or less, preferably 0.5 mol or more and 5 mol or less, and more preferably 0.6 mol or more and 3 mol or less with respect to 1 mol of the thioester derivative (II). , More preferably 1 mol or more and 3 mol or less.
- the amount of the Grinard reagent (III) used is usually 1 mol or more and 10 mol or less, preferably 1 mol or more and 5 mol or less, and more preferably 1.05 mol or more and 4 mol or less, based on 1 mol of the thioester derivative (II). Even more preferably, it is 1.5 mol or more and 4 mol or less.
- the amount of Grignard reagent (III) used does not have to be in excess of the amount of thioester derivative (II) used.
- the amount of the Grignard reagent (IIIb) is, for example, the total mass of the Grignard reagent (IIIa) and the Grignard reagent (IIIb). Is 10% by mass or more and 90% by mass or less based on the above.
- Examples of the solvent used when mixing the thioester derivative (II), the Grignard reagent (III), and the copper salt include tetrahydrofuran (THF), 2-methyl-tetrahydrofuran, 1,4-dioxane, and tert-. Examples thereof include butyl methyl ether, cyclopentyl methyl ether, dimethoxyethane, diglime, methylene chloride, toluene, xylene, hexane, heptane and the like.
- the solvent one type may be used alone, or two or more types may be used in combination as a mixed solvent.
- the solvent is preferably THF, toluene or a mixed solvent thereof.
- the amount of the solvent used is usually 1 mL or more and 100 mL or less, preferably 2 mL or more and 50 mL or less, with respect to 1 g of the thioester derivative (II).
- the temperature at which the thioester derivative (II), the Grignard reagent (III), and the copper salt are mixed is usually in the range of ⁇ 10 ° C. or higher and 100 ° C. or lower. According to the method according to one embodiment, since the Grignard reagent (III) is used, the ketone derivative (I) can be produced even under relatively high temperature conditions. This reduces equipment costs associated with temperature control and is a cheaper industrial case of the ketone derivative (I), as compared to methods that require ultra-low temperatures below -10 ° C for the conditions for synthesizing the ketone derivative (I). Production can be realized.
- the temperature at the time of mixing is preferably in the range of 10 ° C. or higher and 80 ° C. or lower, more preferably 20 ° C. or higher and 60 ° C. or lower. Within this temperature range, the yield of the ketone derivative (I) tends to be higher.
- the time for mixing the thioester derivative (II), the Grignard reagent (III), and the copper salt is usually 0.5 to 72 hours, preferably 1 to 48 hours.
- One or both of the organozinc compounds (III-II) represented by the above may be used in combination with the Grignard reagent (III) and the copper salt.
- the organozinc compound (III-I) and the organozinc compound (III-II) can be used as reagents for introducing the group W2 into the thioester derivative ( II ).
- the total amount of the organozinc compound (III-I) and the organozinc compound (III-II) used is preferably 10% by mass or less, more preferably 5% by mass or less, based on the mass of the thioester derivative (II). More preferably, it is 1% by mass or less. The lower limit is zero.
- organozinc compound (III-II) examples include diarylzinc (a compound in which W2 is an aryl group in the formula (III-II)) and dialkylzinc (in the formula (III - II ), W2 is an alkyl group). Compounds) and the like.
- the organozinc compound (III-I) and the organozinc compound (III-II) may be commercially available products or may be produced according to a conventional method.
- the organozinc compound (III-I) and / or the organozinc compound (III-II) may be used together with a lithium salt such as lithium chloride.
- the organozinc compound (III-I) may form a complex with a lithium salt.
- the complex of the organozinc compound (III-I) and the lithium salt can be represented by, for example, the following formula (III-Ia).
- W 2 and X are synonymous with the above.
- W 2 is a carbon atom having an aryl group bond (a carbon atom that binds to W1 - CO- or W2 - CO- in formula (I), and a carbon that binds to Mg in formula (IIIa) or (IIIb).
- the carbon atoms located on both sides of the atom) do not have a substituent, and the remaining carbon atoms may have a substituent or a carbon atom having a bond of a heteroaryl group (formula (I).
- the carbon atom bonded to W1 - CO- or W2 - CO-, the carbon atom bonded to Mg in the formula (IIIa) or (IIIb)), and the carbon atom or hetero atom located on both sides of the carbon atom has a substituent.
- the remaining carbon atom or hetero atom is a heteroaryl group which may have a substituent
- the following formula (IV): The Grignard reagent (IV) represented by may be used.
- W 4 represents a phenyl group which has a substituent at at least one ortho position and may have a substituent at the meta position and / or the para position
- X 1 represents a halogen. Represents an atom.
- the Grignard reagent (IV) can be used with one or both of the Grignard reagents (IIIa) and (IIIb). In this case, a mixture of one or both Grignard reagents (IIIa) and (IIIb) and the Grignard reagent (IV) may be added to the reaction system, or with one or both of the Grignard reagents (IIIa) and (IIIb). The Grignard reagent (IV) may be added to the reaction system separately.
- the total amount of Grignard reagent (III) and Grignard reagent (IV) may be 80% by mass or more based on the total mass of Grignard reagent (III), Grignard reagent (IV) and other Grignard reagents. Preferably, it may be 100% by mass.
- the ketone derivative (I) can be formed by mixing the thioester derivative (II), the Grignard reagent (III), the copper salt, and the Grignard reagent (IV). can.
- the Grignard reagent (III) and the copper salt are mixed, and then the Grignard reagent (IV) is added.
- the thioester derivative (II) it is preferable to mix the thioester derivative (II) and bring the organic copper reagent and the thioester derivative (II) into contact with each other. Thereby, the ketone derivative (I) can be obtained in a high yield.
- the carbon atoms in which W 2 is located on both sides of the carbon atom having an aryl group bond (carbon atom bonded to Mg) do not have a substituent and remain.
- the carbon atom of is an aryl group which may have a substituent, or a carbon atom or a hetero atom located on both sides of a carbon atom having a bond of a heteroaryl group (a carbon atom bonded to Mg) has a substituent.
- the remaining carbon atom or hetero atom is an example of the Grinard reagent (IIIa) or (IIIb) which is a heteroaryl group which may have a substituent.
- the meta position for the carbon atom bonded to MgX has R 21 and R 23 .
- the para position for the carbon atom bonded to MgX has R 22 .
- R 21 , R 22 and R 23 are hydrogen atoms or substituents independently selected from the substituent groups ⁇ and ⁇ , respectively.
- f is 0 or 1.
- the compound represented by the following formula (IV') is an example of the Grignard reagent ( IV ), and the details of W4 will be described below.
- R 31 , R 32 , R 33 , R 34 and R 35 each independently represent a hydrogen atom or a substituent. At least one of R 31 and R 35 bonded to the meta position with respect to the carbon atom bonded to MgX 1 is a substituent. It is preferred that both R 31 and R 35 are substituents.
- the substituent is, for example, an alkyl group, an arylalkyl group, a halogen group, a nitrile group, a dialkylamino group, an alkyloxy group, an arylalkyloxy group, an alkylthio group or an arylalkylthio group.
- the number of carbon atoms of the alkyl group, the alkyloxy group or the alkylthio group is preferably 1 to 10.
- the number of carbon atoms of the dialkylamino group is preferably 2 to 10.
- the arylalkyl group, arylalkyloxy group or arylalkylthio group preferably has 5 to 14 carbon atoms, more preferably 7 to 14 carbon atoms.
- the substituent is preferably an alkyl group, more preferably a methyl group.
- Preferred specific examples of W 4 include 2,4,6-trimethylphenyl group, 2,6-dimethylphenyl group and the like.
- the yield of the ketone derivative (I) can be further increased.
- the present inventors presume that the reason for this is as follows. First, in the Grignard reagents (IIIa) and (IIIb), W 2 is located on both sides of the carbon atom bonded to Mg, and the carbon atom is located on both sides of the aryl group having no substituent or the carbon atom bonded to Mg. It is a compound in which the carbon atom or the hetero atom is a heteroaryl group having no substituent.
- the Grignard reagent ( IV ) is a phenyl group in which W4 has a substituent at least one of the carbon atoms located on both sides of the carbon atom bonded to Mg.
- W4 has a substituent at least one of the carbon atoms located on both sides of the carbon atom bonded to Mg.
- the yield of the ketone derivative (I) per Grignard reagent (IIIa) and (IIIb) used is higher than that when the complex (10) is used.
- the substituent at the ortho position can enhance the reactivity of W 2 by the electron donating effect.
- the amount of Grignard reagent that actually generates W 2 that reacts can be reduced.
- the substitution reaction from -SW 3 to -W 2 in the thioester derivative (II) can be promoted, so that the amount of the copper salt and the Grignard reagent (III) can be adjusted. It can be relatively reduced.
- the amount of the copper salt used is, for example, 0.1 mol or more and 10 mol or less, preferably 0.5 mol or more and 5 mol or less, and more preferably 0, with respect to 1 mol of the Grignard reagent (III). It is 5.5 mol or more and 2 mol or less.
- the amount of the copper salt used is, for example, 0.1 mol or more and 10 mol or less, preferably 0.5 mol or more and 5 mol or less, and more preferably 0, with respect to 1 mol of the Grignard reagent (IV). It is 5.5 mol or more and 2 mol or less. According to another example, the amount of the copper salt used is 1 mol or more and 3 mol or less with respect to 1 mol of the Grignard reagent (IV).
- the amount of the copper salt used is, for example, 0.1 mol or more and 10 mol or less, more preferably 0.5 mol or more and 5 mol or less, still more preferably, with respect to 1 mol of the thioester derivative (II). It is 0.5 mol or more and 1.4 mol or less.
- the amount of Grignard reagent (III) used is, for example, 0.1 mol or more and 10 mol or less, preferably 0.5 mol or more and 5 mol or less, more preferably 0.5 mol, relative to 1 mol of the thioester derivative (II). It is 1.4 mol or less.
- the amount of the Grignard reagent (IV) used is, for example, 0.01 mol or more and 1 mol or less, preferably 0.01 mol or more and 0.8 mol or less, more preferably 0, with respect to 1 mol of the Grignard reagent (III). It is 1 mol or more and 0.8 mol or less.
- the amount of Grignard reagent (IV) used is, for example, 0.1 mol or more and 10 mol or less, preferably 0.1 mol or more and 5 mol or less, more preferably 0.1 mol, relative to 1 mol of the thioester derivative (II). More than 1.0 mol or less.
- reaction solvent reaction conditions, etc. are the same as the above-mentioned method for producing the ketone derivative (I).
- the ketone derivative (Ia) can be obtained by mixing the thioester derivative (IIa), the Grignard reagent (III), and the copper salt.
- the reaction scheme is as follows.
- the hydroxy - protecting group represented by R5 can be removed according to a conventional method, depending on the type thereof.
- the ketone derivative ( Ia) can be reacted with an acidic reagent or a basic reagent in an inert solvent to remove the hydroxy protecting group represented by R5.
- the acidic reagent include inorganic acids such as hydrochloric acid, sulfuric acid, nitric acid, acetic acid and hydrogen bromide, and organic acids such as trifluoroacetic acid, trichloroacetic acid, p-toluenesulfonic acid, formic acid and phthalic acid, which are basic.
- reagent examples include tetra-n-butylammonium fluoride, ammonium fluoride, ammonium bifluoride, fluorides such as hydrofluoric acid, potassium carbonate, lithium hydroxide, sodium hydroxide, potassium hydroxide, and sodium methoxy. Do, sodium ethoxydo, aqueous ammonia and the like can be mentioned.
- a thioester derivative (IIa), a Grinard reagent (III), and a copper salt are mixed to form a ketone derivative (Ia), and then the ketone derivative (Ia) separated from the reaction system is reacted with an acidic reagent or a basic reagent.
- the compound (IVa) may be obtained, or the thioester derivative (IIa), the Grinard reagent (III) and the copper salt are mixed to form a ketone derivative (Ia), and then the ketone derivative (Ia) is formed from the reaction system.
- Compound (IVa) may be obtained by adding an acidic reagent or a basic reagent to the reaction system without separating the compound (IVa).
- the solvent used when mixing the thioester derivative (IIa), the Grignard reagent (III) and the copper salt is preferably tetrahydrofuran (THF) or the like. It is preferable to use a basic reagent, and the basic reagent is preferably sodium methoxide, sodium methoxide, potassium carbonate, sodium carbonate, sodium hydroxide, ammonia and the like.
- the amount of the basic reagent used is usually 0.001 to 10 mol, preferably 0.01 to 8 mol, relative to 1 mol of the ketone derivative (Ia).
- the amount of the solvent used is usually 1 to 500 mL or less, preferably 3 to 200 mL with respect to 1 g of the ketone derivative (Ia).
- the temperature at which the ketone derivative (Ia) is reacted with the basic reagent is usually ⁇ 20 to 120 ° C., preferably ⁇ 10 to 100 ° C.
- the time for reacting the ketone derivative (Ia) with the basic reagent is usually 0.1 to 48 hours, preferably 0.5 to 24 hours.
- the thioester derivative (IIa) may be a commercially available product or may be produced according to the following reaction scheme.
- the thioester derivative (IIa) has the following formula (VI): Compound (VI) represented by The following formula (VII): By reacting with the compound (VII) represented by the following formula (VIII): After obtaining the compound (VIII) represented by It can be obtained by protecting the hydroxy group in compound ( VIII) with a hydroxy group protecting group represented by R5.
- the compound (VI) and the compound (VII) may be commercially available products or may be produced according to a conventional method.
- the introduction of the hydroxy-protecting group to the hydroxy group in the compound (VIII) can be carried out according to a conventional method depending on the type of the hydroxy-protecting group.
- a hydroxy-protecting group can be introduced by reacting compound (VIII) with a protective group-introducing reagent in the presence of an acid or a basic reagent in an inert solvent.
- the protecting group-introducing reagent include an ester-type protecting group-introducing agent such as acetic anhydride, pivalic acid anhydride, acetyl chloride and pivaloyl chloride; an arylalkyl ether-type protecting group-introducing agent such as benzyl bromide; and an alkyl such as iodomethane.
- Ester-type protecting group-introducing agent Cyril-type protecting group-introducing agent bis (tert-butyloxycarbonyloxy) such as trimethylsilyl chloride, N-trimethylsilylimidazole, triisopropylsilyl chloride, tert-butyldimethylsilyl chloride, and tert-butyldiphenylsilyl chloride.
- Examples thereof include an oxycarbonyl-protecting group such as oxide, and an ester-type protecting group-introducing agent such as acetic anhydride, pivalic acid anhydride, acetyl chloride, and pivaloyl chloride is preferable, and acetic acid anhydride is more preferable.
- Examples of the acidic reagent include inorganic acids such as acetic acid and hydrogen bromide, and organic acids such as p-toluenesulfonic acid and phthalic acid.
- Examples of the basic reagent include organic amines such as triethylamine, 4-dimethylaminopyridine (DMAP), diazabicycloundecene (DBU) and diethylaniline.
- the reaction between the compound (VI) and the compound (VII) is preferably carried out in the presence of the compound (IX) represented by the following formula (IX).
- the compound (IX) may be a commercially available aluminum catalyst or may be produced according to a conventional method.
- R c and R d each independently contain a halogen atom, an alkyl group which may have a substituent, a heterocycloalkyl group which may have a substituent, and a substituent.
- R c and R d are each independently an alkyl group, an aryl group or an arylalkyl group.
- q represents an integer of 0 to 3
- r represents an integer of 0 to 3.
- q + r 3.
- one of q or r represents 0 and the other represents 3.
- the compound (IVa) can be used as a production raw material to produce a compound (XI) represented by the following formula (XI), that is, a ⁇ -C-arylglycoside derivative.
- a known reduction reaction can be used as the reaction from compound (IVa) to compound (XI).
- a reduction method for example, a method of reducing using triethylsilane in the presence of boron trifluoride diethyl ether complex (BF 3 , OEt 2 ), a silane compound such as triethylsilane, triisopropylsilane, or tetramethyldisiloxane. Examples thereof include a method of reacting with Lewis acids such as BF 3 ⁇ OEt 2 , boron trifluoride tetrahydrofuran (BF 3 ⁇ THF) and aluminum chloride.
- Lewis acids such as BF 3 ⁇ OEt 2 , boron trifluoride tetrahydrofuran (BF 3 ⁇ THF) and aluminum chloride.
- the obtained compound (XI) can be used as it is, or if R1 , R2 , R3 or R4 is a hydroxy-protecting group, it is optionally deprotected and used as a ⁇ -C-arylglycoside derivative. can do.
- the yield was determined by the integral ratio (integral ratios) using triphenylmethane (manufactured by Aldrich, 25 g) as an internal standard substance. The results are shown in Table 4. The yield of compound 2 in Example 1 was 89%.
- Example 2 The same operation as in Example 1 was performed except that CuI was changed to 0.25 equivalent. The results are shown in Table 4. The yield of compound 2 in Example 2 was 48%.
- Example 3 The same operation as in Example 1 was performed except that CuI was changed to 0.50 equivalent. The results are shown in Table 4. The yield of compound 2 in Example 3 was 63%.
- Example 4 The same operation as in Example 1 was performed except that CuI was changed to 1.0 equivalent. The results are shown in Table 4. The yield of compound 2 in Example 4 was 33%.
- a methylene chloride suspension (20 mL) of p-toluic acid (1.43 g, 10.5 mmol) was prepared in an 80 mL Schlenk tube. After cooling the suspension to 0 ° C., 4-dimethylaminopyridine (122 mg, 1.00 mmol), 1-decanethiol (2.08 mL, 10.0 mmol), N, N'-dicyclohexylcarbodiimide (2. 17 g, 10.5 mmol) was added. After stirring at 0 ° C. for 30 minutes, the temperature was raised to room temperature and the mixture was stirred overnight.
- Example 5 The reaction represented by the following formula was carried out to produce compound 5 from compound 4.
- Ac represents an acetyl group
- Bn represents a benzyl group. The same applies hereinafter.
- Example 8> The same operation as in Example 7 was performed except that the use of RMBr was omitted and the amount of CuCl used was changed to 0.75 equivalent. As a result, the yield of the ketone derivative (compound 7) was 44%.
- Ketonization reaction CuCl (49.5 mg, 0.500 mmol, 2.0 eq) in dry THF (1.00 mL) suspension with 0.5 M ArMgBr ⁇ LiCl in THF solution (1.5 mL, 0.750 mmol, 3). 9.0 equivalent) was added dropwise over 5 minutes and stirred for 10 minutes.
- a THF solution (1.5 mL) of compound 8 (196 mg, 0.250 mmol, 1.0 eq) was added dropwise to this solution over 5 minutes, followed by stirring at 80 ° C. for 20 hours. After completion of the reaction, quenching was performed with 1 M aqueous HCl solution (1 mL).
- a THF solution of 0.25M ArMgBr ⁇ LiCl was prepared by the same method as described in Example 6.
- a THF solution of 0.25M ArMgCl / LiCl (3.00 mL, 0.750 mmol, 3.0 equivalents) in a dry THF (2.00 mL) suspension of CuCl (49.5 mg, 0.500 mmol, 2.0 equivalents) ) was added dropwise over 5 minutes and stirred for 10 minutes.
- a THF solution (3.00 mL) of compound 8 (196 mg, 0.250 mmol, 1.0 eq) was added dropwise to this solution over 5 minutes, and then the mixture was stirred at 40 ° C. for 20 hours.
- a 2.5 mL 2M trimethylaluminum solution (trimethylaluminum: 5 mmol) was added dropwise to the 1-decanothiol solution cooled to 0 ° C. over 10 minutes, and the mixture was stirred for 20 minutes to obtain a mixed solution.
- a lactone derivative (Ia) solution was slowly added to this mixture over 20 minutes, and the mixture was stirred for 2 hours to obtain a reaction solution. After adding 30 mL of dichloromethane to this reaction, it was slowly poured into a 500 mL beaker containing 20 mL of ice-cold water.
- the reaction solution placed in the beaker was stirred, and 40 mL of 1N hydrochloric acid was slowly added thereto to quickly separate the reaction solution into an organic layer and an aqueous layer.
- 30 mL of ice-cooled dichloromethane was added to the aqueous layer to separate the organic layer into the aqueous layer, and the organic layer was extracted. This operation was repeated two more times. All organic layers were mixed to give a total organic layer. The total organic layer was washed with water and saline in this order, and then dried over sodium sulfate to obtain a residue.
- the total organic layer was washed with 30 mL of water and 30 mL of saline in this order, and then dried over sodium sulfate to obtain a residue.
- This residue was purified by silica gel column chromatography to obtain a transparent liquid thioester derivative (II-ia).
- the amount of the thioester derivative (II-ia) was 2.67 g, and the yield from the lactone derivative (I) was 84%.
- the results of NMR spectroscopic analysis of the thioester derivative (II-ia) were as follows.
- Ketonization reaction The reaction represented by the following formula was carried out to produce compound (9) from the thioester derivative (II-ia).
- THF Solution of 0.25M ArMgBr ⁇ LiCl Add THF (0.750mL) to LiCl (21.2mg, 0.500 mmol, 1.00 equivalent) dried by vacuuming at 100 ° C. for 1 hour to make a solution. Then, while cooling at 0 ° C., a THF solution of 2.0 M iPrMgCl (0.250 mL, 0.500 mmol, 1.00 equivalent) was added.
- iPr represents an isopropyl group.
- Ketonization reaction CuCl (37.1 mg, 0.375 mmol, 1.5 eq) in a dry THF (1.50 mL) suspension with a THF solution of 0.25 M ArMgCl ⁇ LiCl (1.50 mL, 0.375 mmol, 1). (0.5 eq) was added dropwise over 5 minutes and stirred for 10 minutes to give a suspension.
- a THF solution (0.188 mL) of 1.0 M RMgBr (2,6-dimethylphenylmagnesium bromide) (0.188 mmol, 0.75 eq) was added to this suspension, and the mixture was further stirred for 10 minutes to prepare an organic copper reagent. Obtained.
- Example 14 Examples except that the amount of CuCl used was changed to 2.0 equivalents, the amount of ArMgBr / LiCl used was changed to 2.0 equivalents, and the amount of RMgBr used was changed to 1.0 equivalents. The same operation as in No. 13 was performed. As a result, the yield of the ketone derivative (Compound 7) was 91% (196 mg), and the yield of Compound 8 was 4% (8.6 mg).
- THF Solution of 0.25M ArMgBr Activated by adding THF (1.00 mL) and 1,2-dibromoethane (0.05 mL) to magnesium (24.3 mg, 1.00 mmol, 2.00 equivalents). After that, a THF solution (1.00 mL) of BMB (2- (5-bromo-2-methylbenzyl) -5- (4-fluorophenyl) thiophene: 181 mg, 0.500 mmol, 1.00 equivalent) was added to this. Was slowly dropped. Then, the mixture was stirred at 80 ° C. for 3 hours to prepare a THF solution of 0.25M ArMgBr.
- THF Solution of 0.25M MesMgBr Activate by adding THF (1.00 mL) and 1,2-dibromoethane (0.05 mL) to magnesium (24.3 mg, 1.00 mmol, 2.00 eq). After that, a THF solution (1.00 mL) of 2-bromomecitylene (99.5 mg, 0.500 mmol, 1.00 equivalent) was slowly added dropwise to this while paying attention to heat generation. Then, the mixture was stirred at room temperature for 3 hours to prepare a THF solution of 0.25M MesMgBr.
- Compound 8 was dissolved in THF (1.50 mL), added dropwise to the prepared THF suspension of copper reagent at room temperature over 5 minutes, and then stirred at 40 ° C. for 20 hours. After allowing to cool to room temperature, a methanol solution (5.00 mL) of sodium methoxide (67.5 mg, 1.25 mmol, 5.0 equivalents) was added to the reaction mixture, and the mixture was stirred at 60 ° C. for 6 hours.
- the reaction was stopped with a 1M HCl aqueous solution (1 mL), ethyl acetate (10 mL) was added, the mixture was washed with a 1M HCl aqueous solution (5 mL ⁇ 3) and a saline solution (5 mL ⁇ 1), and then the organic layer was dried with Na 2 SO 4 . rice field.
- Lactol synthetic compound 8 was dissolved in THF (1.50 mL), added dropwise to the prepared THF suspension of the copper reagent at room temperature for 5 minutes, and then stirred at 40 ° C. for 20 hours. After allowing to cool to room temperature, a methanol solution (5.00 mL) of sodium methoxide (67.5 mg, 1.25 mmol, 5.0 equivalents) was added to the reaction mixture, and the mixture was stirred at 60 ° C. for 6 hours.
- the reaction was stopped with a 1M HCl aqueous solution (1 mL), ethyl acetate (10 mL) was added, the cells were washed with a 1M HCl aqueous solution (5 mL ⁇ 3) and a saline solution (5 mL ⁇ 1), and then the organic layer was dried with Na 2 SO 4 . rice field.
- Example 17 The reaction represented by the following formula was carried out to produce compound 12a from compound 11a. Similarly, compounds 12b to 12k were produced from compounds 11b to 11k, respectively.
- 11 g of the compound was obtained as a white solid (0.702 g, 2.06 mmol, 69% yield).
- Ketonization reaction production of compounds 12a-12k
- a THF solution (0.325 mmol, 0.325 mmol, 0.52 M PhMgBr) of CuTC (copper (I) thiophen-2-carboxylate, 0.250 mmol, 47.7 mg, 1.0 equivalent) in a THF suspension (2 mL).
- 0.625 mL (1.3 equivalents) was added dropwise over 5 minutes, and the mixture was stirred at room temperature for 10 minutes. At this stage, an organocopper reagent was produced.
- the produced organic copper reagent was added dropwise to the THF solution (2 mL) of the thioester (0.250 mmol, 1.0 eq) obtained above over 5 minutes, and then the reaction mixture was stirred at 30 ° C. for 1 hour. After completion of the reaction, the reaction was stopped with a 1M aqueous HCl solution (1 mL), and the yield was calculated by the following method.
- yield was calculated from the proton integral ratio of the internal standard substance (triphenylmethane) and the product.
- the sample was prepared by adding triphenylmethane, which is an internal standard, removing the metal salt with short-pat silica (ethyl acetate), distilling off the solvent under reduced pressure, and dissolving it in deuterated chloroform.
- Example 18a 1.3 equivalents of PhMgBr was used with respect to 1 equivalent of CuCl, and the reaction time was set to 3 hours. That is, the amount of CuCl per 1 mol of PhMgBr was set to 0.77 mol.
- Example 18b 1.6 equivalents of PhMgBr was used with respect to 1 equivalent of CuCl, and the reaction time was set to 3 hours. That is, the amount of CuCl per 1 mol of PhMgBr was set to 0.63 mol.
- Example 18c 1.3 equivalents of PhMgBr was used with respect to 1 equivalent of CuTC (copper (I) thiophen-2-carboxylate), and the reaction time was set to 3 hours.
- Example 18d 1.3 equivalents of PhMgBr was used with respect to 1 equivalent of CuTC, and the reaction time was set to 1 hour.
- the optimum equivalent ratio of the copper salt to the Grignard reagent (copper salt equivalent: Grignard reagent equivalent) was determined to be 1: 1.3. Further, CuTC showed higher activity than CuCl, and although by-production of compound 13 was observed, compound 12a was obtained in a higher yield. Furthermore, by shortening the reaction time from 3 hours to 1 hour, compound 12a was obtained in a higher yield.
- FIG. 1 shows the molecular structure of [Ph 2 Cu] [Mg 2 Br 3 (thf) 6 ] by a 50% thermal ellipsoid.
- the hydrogen atom is omitted for the sake of clarity in the figure.
- Schemes (a) to (d) were operated with a J-young tube.
- Scheme (e) was operated with a 20 mL J-young Schlenk tube.
- the metal complex was removed by filtration through a silica gel pad eluted with ethyl acetate.
- the yield of compound 18 was determined by gas chromatography analysis using triphenylethane (Ph 3 CH) as an internal standard substance and found to be 84%.
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Abstract
Description
[1]下記式(I):
で表されるケトン誘導体(I)を製造する方法であって、
下記式(II):
で表されるチオエステル誘導体(II)と、
下記式(IIIa):
で表されるグリニャール試薬(IIIa)、及び、
下記式(IIIb):
で表されるグリニャール試薬(IIIb)
から選択されるグリニャール試薬(III)と、
銅塩と、
を混合して、前記ケトン誘導体(I)を形成する工程
を含む、前記方法。
[2]前記工程において、前記グリニャール試薬(III)と前記銅塩とを混合して有機銅試薬を形成させた後、前記チオエステル誘導体(II)を混合し、前記有機銅試薬と前記チオエステル誘導体(II)とを接触させる、[1]に記載の方法。
[3]前記銅塩の使用量が、前記グリニャール試薬(III) 1モルに対して、0.1モル以上1モル以下である、[1]又は[2]に記載の方法。
[4]前記工程において、前記チオエステル誘導体(II)、前記グリニャール試薬(III)及び前記銅塩を、20℃以上60℃以下の範囲内の温度で混合する、[1]~[3]のいずれかに記載の方法。
[5]W2が、アリール基の結合手を有する炭素原子の両隣に位置する炭素原子は置換基を有さず、残りの炭素原子は置換基を有していてもよいアリール基、又は、ヘテロアリール基の結合手を有する炭素原子の両隣に位置する炭素原子若しくはヘテロ原子は置換基を有さず、残りの炭素原子若しくはヘテロ原子は置換基を有していてもよいヘテロアリール基であり、
前記工程において、前記チオエステル誘導体(II)と、前記グリニャール試薬(III)と、前記銅塩と、下記式(IV):
[6]前記グリニャール試薬(IV)の使用量が、前記グリニャール試薬(III) 1モルに対して、0.01モル以上1モル以下である、[5]に記載の方法。
[7]前記工程において、前記グリニャール試薬(III)と前記銅塩とを混合し、次いで、前記グリニャール試薬(IV)を混合して有機銅試薬を形成させた後、前記チオエステル誘導体(II)を混合し、前記有機銅試薬と前記チオエステル誘導体(II)とを接触させる、[5]又は[6]に記載の方法。
以下、本明細書で用いられる用語について説明する。以下の説明は、別段規定される場合を除き、本明細書を通じて適用される。
ハロゲン原子は、フッ素原子、塩素原子、臭素原子及びヨウ素原子から選択される。
直鎖状のアルキル基の炭素数は、通常1~20、好ましくは1~10である。直鎖状のアルキル基の炭素数は、例えば、1~8、1~6、1~5、1~4、1~3又は1~2である。分岐鎖状のアルキル基の炭素数は、通常3~20、好ましくは3~10である。分岐鎖状のアルキル基の炭素数は、例えば、3~8、3~6、3~5又は3~4である。
直鎖状のアルケニル基の炭素数は、通常1~20、好ましくは1~10である。直鎖状のアルケニル基の炭素数は、例えば、1~8、1~6、1~5、1~4、1~3又は1~2である。分岐鎖状のアルケニル基の炭素数は、通常3~20、好ましくは3~10である。分岐鎖状のアルケニル基の炭素数は、例えば、3~8、3~6、3~5又は3~4である。
シクロアルキル基の炭素数は、通常3~10、好ましくは3~8、より好ましくは3~6である。
ヘテロシクロアルキル基は、例えば、酸素原子、硫黄原子及び窒素原子からなる群から独立して選択される1個又は2個のヘテロ原子を含む。ヘテロシクロアルキル基は、例えば、4~7員環のヘテロシクロアルキル基である。ヘテロシクロアルキル基は、酸素原子をヘテロ原子として含むことが好ましい。ヘテロシクロアルキル基としては、例えば、テトラヒドロフラニル基、テトラヒドロピラニル基等が挙げられる。ヘテロシクロアルキル基は、好ましくは、テトラヒドロフラニル基である。
アリール基は、例えば、単環式、二環式又は三環式の炭素数4~14、好ましくは6~14の芳香族炭化水素環基である。アリール基としては、例えば、フェニル基、ナフチル基等が挙げられる。アリール基は、好ましくは、フェニル基である。
ヘテロアリール基は、例えば、酸素原子、硫黄原子及び窒素原子からなる群から独立して選択される1個、2個又は3個のヘテロ原子を含む。ヘテロアリール基は、例えば、単環式又は二環式の4~10員、好ましくは5~10員の芳香族複素環基である。ヘテロアリール基は、好ましくは、チエニル基、ベンゾチオフェニル基、フリル基、ピロリル基、イミダゾリル基又はピリジル基であり、より好ましくは、チエニル基又はベンゾチオフェニル基である。
ハロアルキル基、ハロアリール基及びハロヘテロアリール基は、それぞれ、1以上のハロゲン原子を有するアルキル基、アリール基及びヘテロアリール基であり、アルキル基、アリール基及びヘテロアリール基に関する説明は、上記の通りである。ハロアルキル基、ハロアリール基又はハロヘテロアリール基が有するハロゲン原子の数は、通常1~3、好ましくは1~2、より好ましくは1である。
アルキレン基、アリーレン基及びヘテロアリーレン基は、それぞれ、アルキル基、アリール基及びヘテロアリール基から1個の水素原子を除去することにより生成される2価の官能基であり、アルキル基、アリール基及びヘテロアリール基に関する説明は、上記の通りである。
ハロアルキレン基、ハロアリーレン基及びハロヘテロアリーレン基は、それぞれ、ハロアルキル基、ハロアリール基及びハロヘテロアリール基から1個の水素原子を除去することにより生成される2価の官能基であり、ハロアルキル基、ハロアリール基及びハロヘテロアリール基に関する説明は、上記の通りである。
アリールアルキル基は、1以上のアリール基を有するアルキル基であり、アルキル基及びアリール基に関する説明は、上記の通りである。アリールアルキル基が有するアリール基の数は、通常1~3、好ましくは1又は2、より好ましくは1である。
アリールアルケニル基は、1以上のアリール基を有するアルケニル基であり、アルケニル基及びアリール基に関する説明は、上記の通りである。アリールアルケニル基が有するアリール基の数は、通常1~3、好ましくは1又は2、より好ましくは1である。
アルキルカルボニル基及びアリールカルボニル基は、それぞれ、式:-CO-アルキル基及び式:-CO-アリール基で表される基であり、アルキル基及びアリール基に関する説明は、上記の通りである。
アルキルオキシ基、ハロアルキルオキシ基、ヘテロシクロアルキルオキシ基及びアリールアルキルオキシ基は、それぞれ、式:-O-アルキル基、式:-O-ハロアルキル基、式:-O-ヘテロシクロアルキル基及び式:-O-アリールアルキル基で表される基であり、アルキル基、ハロアルキル基、ヘテロシクロアルキル基及びアリールアルキル基に関する説明は、上記の通りである。
アルキルチオ基、ハロアルキルチオ基、ヘテロシクロアルキルチオ基及びアリールアルキルチオ基は、それぞれ、式:-S-アルキル基、式:-S-ハロアルキル基、式:-S-ヘテロシクロアルキル基及び式:-S-アリールアルキル基で表される基であり、アルキル基、ハロアルキル基、ヘテロシクロアルキル基及びアリールアルキル基に関する説明は、上記の通りである。
アルキルオキシカルボニル基は、式:-CO-O-アルキル基で表される基であり、アルキル基に関する説明は、上記の通りである。アルキルオキシカルボニル基に含まれるアルキル基の炭素数は、好ましくは1~10、より好ましくは1~8、より一層好ましくは1~6、より一層好ましくは1~4である。
モノアルキルアミノ基は、式:-NH(-Q1)[式中、Q1は、アルキル基を表す。]で表される基であり、アルキル基に関する説明は、上記の通りである。Q1で表されるアルキル基の炭素数は、好ましくは1~6、より好ましくは1~4、より一層好ましくは1~3、より一層好ましくは1又は2である。
ジアルキルアミノ基は、式:-N(-Q2)(-Q3)[式中、Q2及びQ3は、それぞれ独立して、アルキル基を表す。]で表される基であり、アルキル基に関する説明は、上記の通りである。Q2又はQ3で表されるアルキル基の炭素数は、好ましくは1~6、より好ましくは1~4、より一層好ましくは1~3、より一層好ましくは1又は2である。
脂環式アミノ基は、例えば、5又は6員環の脂環式アミノ基であり、5又は6員環の脂環式アミノ基としては、例えば、モルホリノ基、チオモルホリノ基、ピロリジン-1-イル基、ピラゾリジン-1-イル基、イミダゾリジン-1-イル基、ピペリジン-1-イル基等が挙げられる。脂環式アミノ基は、脂環式アミノ基の結合手を有する窒素原子に加えて、酸素原子、硫黄原子及び窒素原子からなる群から独立して選択されるヘテロ原子(例えば、1個のヘテロ原子)を含んでいてもよい。脂環式アミノ基は、好ましくは、モルホリノ基である。
アミノカルボニル基、モノアルキルアミノカルボニル基、ジアルキルアミノカルボニル基及び脂環式アミノカルボニル基は、それぞれ、式:-CO-アミノ基、式:-CO-モノアルキルアミノ基、式:-CO-ジアルキルアミノ基及び式:-CO-脂環式アミノ基で表される基であり、モノアルキルアミノ基、ジアルキルアミノ基及び脂環式アミノ基に関する説明は、上記の通りである。
(1)置換基を有していてもよいアルキル基、
(2)置換基を有していてもよいアルケニル基、
(3)置換基を有していてもよいシクロアルキル基、
(4)置換基を有していてもよいヘテロシクロアルキル基、
(5)置換基を有していてもよいアリール基、
(6)置換基を有していてもよいヘテロアリール基、
(7)置換基を有していてもよいアリールアルキル基、又は
(8)置換基を有していてもよいアリールアルケニル基
を表す。
アルキル基に関する説明は、上記の通りである。アルキル基は、1以上の置換基を有していてもよい。置換基の数は、好ましくは1~3、より好ましくは1又は2である。1以上の置換基は、それぞれ独立して、置換基群α及びβから選択することができる。置換基群αから1以上の置換基を選択するとともに、置換基群βから1以上の置換基を選択してもよい。
アルケニル基に関する説明は、上記の通りである。アルケニル基は、1以上の置換基を有していてもよい。置換基の数は、好ましくは1~3、より好ましくは1又は2である。1以上の置換基は、それぞれ独立して、置換基群α及びβから選択することができる。置換基群αから1以上の置換基を選択するとともに、置換基群βから1以上の置換基を選択してもよい。
シクロアルキル基に関する説明は、上記の通りである。シクロアルキル基は、1以上の置換基を有していてもよい。置換基の数は、好ましくは1~3、より好ましくは1又は2である。1以上の置換基は、それぞれ独立して、置換基群α及びβから選択することができる。置換基群αから1以上の置換基を選択するとともに、置換基群βから1以上の置換基を選択してもよい。
ヘテロシクロアルキル基に関する説明は、上記の通りである。ヘテロシクロアルキル基は、1以上の置換基を有していてもよい。置換基の数は、好ましくは1~3、より好ましくは1又は2である。1以上の置換基は、それぞれ独立して、置換基群α及びβから選択することができる。置換基群αから1以上の置換基を選択するとともに、置換基群βから1以上の置換基を選択してもよい。
アリール基に関する説明は、上記の通りである。アリール基は、1以上の置換基を有していてもよい。置換基の数は、好ましくは1~3、より好ましくは1又は2である。1以上の置換基は、それぞれ独立して、置換基群α及びβから選択することができる。置換基群αから1以上の置換基を選択するとともに、置換基群βから1以上の置換基を選択してもよい。
ヘテロアリール基に関する説明は、上記の通りである。ヘテロアリール基は、1以上の置換基を有していてもよい。置換基の数は、好ましくは1~3、より好ましくは1又は2である。1以上の置換基は、それぞれ独立して、置換基群α及びβから選択することができる。置換基群αから1以上の置換基を選択するとともに、置換基群βから1以上の置換基を選択してもよい。
アリールアルキル基に関する説明は、上記の通りである。アリールアルキル基は、1以上の置換基を有していてもよい。置換基の数は、好ましくは1~3、より好ましくは1又は2である。1以上の置換基は、それぞれ独立して、置換基群α及びβから選択することができる。置換基群αから1以上の置換基を選択するとともに、置換基群βから1以上の置換基を選択してもよい。
アリールアルケニル基に関する説明は、上記の通りである。アリールアルケニル基は、1以上の置換基を有していてもよい。置換基の数は、好ましくは1~3、より好ましくは1又は2である。1以上の置換基は、それぞれ独立して、置換基群α及びβから選択することができる。置換基群αから1以上の置換基を選択するとともに、置換基群βから1以上の置換基を選択してもよい。
置換基群αは、以下の置換基で構成される。
(α-1)ハロゲン原子
(α-2)ニトリル基
(α-3)ニトロ基
(α-4)アミノ基
(α-5)アルキル基
(α-6)ハロアルキル基
(α-7)モノアルキルアミノ基
(α-8)ジアルキルアミノ基
(α-9)脂環式アミノ基
(α-10)アルキルオキシカルボニル基
(α-11)アミノカルボニル基
(α-12)モノアルキルアミノカルボニル基
(α-13)ジアルキルアミノカルボニル基
(α-14)脂環式アミノカルボニル基
(α-15)保護基で保護されていてもよいヒドロキシ基
(α-16)保護基で保護されていてもよいチオ基
置換基群βは、以下の置換基で構成される。
(β-1)式(i)で表される置換基
(β-2)式(ii)で表される置換基
ヒドロキシ基保護基は、目的の反応を行う際にはヒドロキシ基を保護することができ、目的の反応の終了後にはヒドロキシ基から脱離させることができるものであることが好ましい。ヒドロキシ基保護基としては、例えば、アルキルカルボニル型保護基、アリールカルボニル型保護基、アリールアルキル型保護基、アルキル型保護基、アリールアルキルオキシアルキル型保護基、アルキルオキシアルキル型保護基、シリル型保護基、オキシカルボニル型保護基、アセタール型保護基、アリール型保護基等が挙げられる。これらの保護基は、1以上のハロゲン原子を有していてもよい。
チオール基保護基は、目的の反応を行う際にはチオール基を保護することができ、目的の反応の終了後にはチオール基から脱離させることができるものであることが好ましい。チオール基保護基としては、例えば、アルキルカルボニル型保護基、アリールカルボニル型保護基、アリールアルキル型保護基、アルキル型保護基、アリールアルキルオキシアルキル型保護基、アルキルオキシアルキル型保護基、シリル型保護基、オキシカルボニル型保護基、アセタール型保護基、アリール型保護基等が挙げられる。これらの保護基は、1以上のハロゲン原子を有していてもよい。これらの保護基に関する説明は、上記の通りである。
置換基を有していてもよいアルキル基、
置換基を有していてもよいアルケニル基、
置換基を有していてもよいシクロアルキル基、
置換基を有していてもよいヘテロシクロアルキル基、
置換基を有していてもよいアリール基、
置換基を有していてもよいヘテロアリール基、
置換基を有していてもよいアリールアルキル基、又は、
置換基を有していてもよいアリールアルケニル基
を表す。置換基を有していてもよいアルキル基、置換基を有していてもよいアルケニル基、置換基を有していてもよいシクロアルキル基、置換基を有していてもよいヘテロシクロアルキル基、置換基を有していてもよいアリール基、置換基を有していてもよいヘテロアリール基、置換基を有していてもよいアリールアルキル基、及び、置換基を有していてもよいアリールアルケニル基に関する説明は、上記の通りである。
チオエステル誘導体(II)は、例えば、以下の方法で得ることができる。
グリニャール試薬(III)は、
下記式(IIIa):
下記式(IIIb):
から選択される。
銅塩としては、例えば、塩化銅(I)(CuCl)、塩化銅(II)(CuCl2)、臭化銅(I)(CuBr)、臭化銅(II)(CuBr2)、シアン化銅(I)(CuCN)、3-メチルサリチル酸銅(I)、メシチレン銅(I)(MesCu)、イソプロポキシ銅(I)(iPrOCu)、ヨウ化銅(I)(CuI)、ヨウ化銅(II)(CuI2)、酢酸銅(I)(CuOAc)、酢酸銅(II)(Cu(OAc)2)、硫酸銅(II)(CuSO4)、酸化銅(I)(Cu2O)、酸化銅(II)(CuO)、ピバル酸銅(I)(CuOPiv)、ピバル酸銅(II)(Cu(OPiv)2)、硫黄(S)を含む銅塩等が挙げられる。銅塩に含まれる銅原子の価数は、通常、1価又は2価であるが、好ましくは、1価である。銅原子の価数が1価である銅塩は、触媒作用が優れている。銅原子の価数が1価である銅塩のうち、CuCl、CuI又はCuBrが特に好ましい。CuCl、CuI及びCuBrは、触媒作用が特に優れている。硫黄(S)を含む銅塩としては、例えば、銅(I)チオフェン-2-カルボン酸塩等が挙げられる。Sは、Cuとの親和性が高く、銅塩において、SがCuに配位し易い。この配位により、Cuが活性化され、収率が高まる。
ケトン誘導体(I)を製造する方法は、チオエステル誘導体(II)と、グリニャール試薬(III)と、銅塩とを混合して、ケトン誘導体(I)を形成する工程を含む。
で表される有機亜鉛化合物(III-I)、及び、
下記式(III-II):
で表される有機亜鉛化合物(III-II)の一方又は両方を、グリニャール試薬(III)及び銅塩と併用してもよい。有機亜鉛化合物(III-I)及び有機亜鉛化合物(III-II)は、チオエステル誘導体(II)に基W2を導入するための試薬として使用することができる。
W2が、アリール基の結合手を有する炭素原子(式(I)においてW1-CO-又はW2-CO-と結合する炭素原子、式(IIIa)又は(IIIb)においてMgと結合する炭素原子)の両隣に位置する炭素原子は置換基を有さず、残りの炭素原子は置換基を有していてもよいアリール基、又は、ヘテロアリール基の結合手を有する炭素原子(式(I)においてW1-CO-又はW2-CO-と結合する炭素原子、式(IIIa)又は(IIIb)においてMgと結合する炭素原子)の両隣に位置する炭素原子若しくはヘテロ原子は置換基を有さず、残りの炭素原子若しくはヘテロ原子は置換基を有していてもよいヘテロアリール基である場合、ケトン誘導体(I)を製造する方法において、下記式(IV):
下記式(VII):
化合物(VIII)におけるヒドロキシ基を、R5で表されるヒドロキシ基保護基で保護することにより得ることができる。
・機器名:GC-2014(SHIMADSU GAS CHROMATOGRAPH)・カラム:SH-Rtx-50(長さ:30.0m,内径:0.25mm,フィルム厚:0.25μm,medium polar column)
インジェクション容量:1.0μL
カラムオーブン温度プログラム(合計プログラム時間:15分)
1H NMR(400MHz,CDCl3,30℃) δ 7.80-7.77(m,2H),7.73-7.71(m,2H),7.59-7.55(m,1H),7.49-7.45(m,2H),7.29-7.27(m,2H),2.44(s,3H)。
13C NMR(100MHz,CDCl3,30℃) δ 196.6,143.4,138.2,135.1,132.3,130.5,130.1,129.1,128.4,21.8。
CuIを0.25当量に変更した点を除き、実施例1と同様の操作を行った。結果を表4に示す。実施例2における化合物2の収率は48%であった。
CuIを0.50当量に変更した点を除き、実施例1と同様の操作を行った。結果を表4に示す。実施例3における化合物2の収率は63%であった。
CuIを1.0当量に変更した点を除き、実施例1と同様の操作を行った。結果を表4に示す。実施例4における化合物2の収率は33%であった。
CuIを使用しなかった点を除き、実施例1と同様の操作を行った。結果を表4に示す。比較例1におけるケトン誘導体(1)の収率は0%であった。
1H NMR(400MHz,CDCl3,30℃) δ 7.86(d,J=8.1Hz,2H),7.23(d,J=8.0Hz,2H),3.05(t,J=7.3Hz,2H),2.40(s,3H),1.66(quint,J=7.4Hz,2H),1.42(quint,J=7.1Hz,2H),1.35-1.26(m,12H),0.88(t,J=6.8Hz,3H)。
13C NMR(100MHz,CDCl3,30℃) δ 191.9,170.1,144.1,135.0,129.4,127.4,32.0,29.8,29.7,29.66,29.5,29.3,29.1,22.8,21.8,14.2。HRMS:[M+H]+ C18H29OS 計算値293.1934;実測値293.1938。
1H NMR (400MHz,CDCl3,30℃) δ 7.31-7.23(m,10H),7.12(q,J=8.2Hz,4H),2.76(s,1H),2.33(s,3H)。
13C NMR(100MHz,CDCl3,30℃) δ 147.2,144.2,137.0,128.7,128.0,127.99,127.3,82.0,21.1。
1H NMR(400MHz,CDCl3,30℃) δ 7.92(dd,J=8.3,1.1Hz,2H),7.49-7.45(m,1H),7.36-7.14(m,20H),7.05-7.02(m,2H),5.28(dt,J=5.4,3.5Hz,1H),4.89(d,J=4.2Hz,1H),4.67-4.41(m,7H),4.31(d,J=10.8Hz,1H),4.21(dd,J=6.9,4.3Hz,1H),4.07(dd,J=6.9,3.5Hz,1H),3.87(dd,J=10.2,5.4Hz,1H),3.63(dd,J=10.2,5.5Hz,1H),1.97(s,3H)。
13C NMR(100MHz,CDCl3,30℃) δ 199.0,170.1,138.5,138.0,137.9,137.2,136.2,133.2,129.1,128.9,128.6,128.5,128.4,128.36,128.3,128.2,128.0,127.9,127.8,127.81,127.6,127.56,82.8,80.5,79.7,75.4,74.7,73.3,73.2,72.7,68.0,21.2。
1H NMR(400MHz,CDCl3,30℃) δ 7.42-7.21(m,20H),5.17-5.14(m,1H),4.81-4.42(m,8H),4.25(d,J=4.4Hz,1H),4.01-3.95(m,2H),3.82(dd,J=10.7,4.2Hz,1H),3.65(dd,J=10.6,5.7Hz,1H),2.84(t,J=7.4Hz,2H),1.96(s,3H),1.56(quint,J=7.4Hz,2H),1.37-1.26(m,14H),0.88(t,J=6.9Hz,3H)。
13C NMR(100MHz,CDCl3,30℃) δ 202.0,170.1,138.6,138.2,138.1,137.2,128.7,128.6,128.5,128.46,128.43,128.3,128.2,128.1,128.0,127.9,127.8,127.7,127.6,126.7,85.6,80.4,78.5,75.8,74.7,74.6,73.3,73.0,68.2,32.0,29.7,29.6,29.4,29.3,29.1,28.5,22.8,21.2,14.2。
100℃で1時間真空引きすることにより乾燥させたLiCl(32.0mg,0.755mmol,1.01当量)にTHF(1.3mL)を加え、溶液とした後、0℃で冷却しながら2.0MのiPrMgClのTHF溶液(0.4mL,0.8mmol,1.07当量)を加えた。なお、「iPr」はイソプロピル基を表す。次いで、ArI(2-(5-ヨード-2-メチルベンジル)-5-(4-フルオロフェニル)チオフェン(306mg,0.750mmol,1.0当量)のTHF(1.3mL)溶液を0℃でゆっくり滴下した後、室温で1時間撹拌した。TLCでArIが消費され、ArMgBr・LiClが生成していることを確認し、次の反応に用いた。
CuI(71.4mg,0.375mmol,1.5当量)の乾燥THF(0.5mL)懸濁液に、0.25M ArMgBr・LiClのTHF溶液(2.25mL,0.563mmol,2.3当量)を5分かけて滴下し、10分間撹拌した。この溶液に化合物6(189mg,0.250mmol,1.0当量)のTHF溶液(1.5mL)を5分かけて滴下した後、40℃で20時間撹拌した。反応はTLC(酢酸エチル/n-ヘキサン=1:5)でモニターした。反応終了後、1M HCl水溶液(1mL)でクエンチした。クエンチ後の反応液に酢酸エチル(10mL)を加え、1M HCl水溶液(5mL×3)、食塩水(5mL×1)で洗浄した後、Na2SO4で有機層を乾燥させた。シリカカラムクロマトグラフィー(酢酸エチル/n-ヘキサン=1:20~1:5)で混合物を精製することにより、対応するケトン体(化合物7)を収率76%(164mg,黄色油状物)、チオエステル体(化合物6)を回収率19%(35.2mg,黄色油状物)で得た。
1H NMR(400MHz,CDCl3,30℃) δ 7.89(d,J=1.3Hz,1H),7.76(dd,J=7.9,1.7Hz,1H),7.38-7.27(m,9H),7.24-7.11(m,11H),7.07-7.02(m,3H),7.00-6.94(m,3H),6.54(d,J=3.6Hz,1H),5.27(q,J=4.7Hz,1H),4.88(d,J=4.6Hz,2H),4.70-4.35(m,9H),4.21(dd,J=6.5,4.7Hz,1H),4.05-4.02(m,3H),3.85(dd,J=10.4,5.0Hz,1H),3.62(dd,J=10.4,5.6Hz,1H),2.33(s,3H),1.96(s,3H)。13C{1H}NMR(100MHz,CDCl3,30℃) δ 198.5,170.1,142.7,142.6,138.6,138.1,138.0,137.4,134.6,130.7,130.3,128.8,128.6,128.43,128.4,128.3,128.2,128.0,127.9,127.8,127.6,127.3,127.2,126.3,122.9,115.9,115.7,83.0,80.7,79.5,75.5,74.7,73.3,73.2,72.8,68.1,34.2,21.2,19.9。
RMgBrの使用を省略したこと、及び、CuClの使用量を0.75当量へ変更したこと以外は、実施例7と同様の操作を行った。その結果、ケトン誘導体(化合物7)の収率は44%であった。
100℃で1時間真空引きすることにより乾燥させたLiCl(42.4mg、1.00mmol)にTHF(0.500mL)を加え溶液とした後、0℃で冷却しながら2.0MのiPrMgClのTHF溶液(0.500mL、1.00mmol)を加えた。次いで、ArI(2-(5-ヨード-2-メチルベンジル)-5-(4-フルオロフェニル)チオフェン、408mg、1.00mmol)のTHF(1.00mL)溶液を0℃でゆっくり滴下した後、室温で1時間撹拌した。
CuCl(49.5mg,0.500mmol,2.0当量)の乾燥THF(1.00mL)懸濁液に、0.5M ArMgBr・LiClのTHF溶液(1.5mL,0.750mmol,3.0当量)を5分かけて滴下し、10分間撹拌した。この溶液に化合物8(196mg,0.250mmol,1.0当量)のTHF溶液(1.5mL)を5分かけて滴下した後、80℃で20時間撹拌した。反応終了後、1M HCl水溶液(1mL)でクエンチした。クエンチ後の反応液に酢酸エチル(10mL)を加え、1M HCl水溶液(5mL×3)、食塩水(5mL×1)で洗浄した後、Na2SO4で有機層を乾燥させた。シリカカラムクロマトグラフィー(酢酸エチル/n-ヘキサン=1:20~1:5)で混合物を精製することにより、対応するケトン体(化合物7)を収率50%(109mg)、チオエステル体(化合物8)を回収率8%(15.4mg)で得た。
Mg(18.2mg、0.750mmol、2.0当量)にTHF(0.500mL)、1,2-ジブロモエタン(0.05mL)を加えて活性化させた後、発熱に気を付けながらArBr(2-(5-ブロモ-2-メチルベンジル)-5-(4-フルオロフェニル)チオフェン、135mg、0.375mmol、1.00当量)のTHF(1.00mL)溶液をゆっくり滴下した後、室温で3時間撹拌した。
CuCl(18.6mg,0.188mmol,0.75当量)の乾燥THF(1.00mL)懸濁液に、0.25M ArMgBrのTHF溶液(1.10mL,0.275mmol,1.1当量)を5分かけて滴下し、10分間撹拌した。この溶液に化合物8(196mg,0.250mmol,1.0当量)のTHF溶液(2.00mL)を5分かけて滴下した後、80℃で20時間撹拌した。反応終了後、1M HCl水溶液(1mL)でクエンチした。クエンチ後の反応液に酢酸エチル(10mL)を加え、1M HCl水溶液(5mL×3)、食塩水(5mL×1)で洗浄した後、Na2SO4で有機層を乾燥させた。シリカカラムクロマトグラフィー(酢酸エチル/n-ヘキサン=1:20~1:5)で混合物を精製することにより、対応するケトン体(化合物7)を収率42%(90.2mg)、チオエステル体(化合物8)を回収率51%(100mg)で得た。
13C NMR (101MHz,CDCl3) δ=200.66,169.86,138.27,137.80,137.14,128.50,128.45,128.41,128.16,128.08,128.04,127.84,127.84,127.71,83.97,79.29,73.92,73.55,73.22,71.42,68.43,32.02,29.67,29.62,29.50,29.43,29.27,29.16,28.45,22.81,21.34,14.23。
HRMS:[M+H]+ C38H51O6S 計算値635.3406;実測値635.3403。
1H NMR (400MHz,CDCl3,30℃) δ 7.87(d,J=7.2Hz,2H),7.52(t,J=7.4Hz,1H),7.38-7.15(m,15H),6.99-6.97(m,2H),5.49(q,J=4.8Hz,1H),4.87(d,J=6.7Hz,1H),4.64(d,J=11.6Hz,1H),4.54-4.34(m,5H),4.20(dd,J=6.6,4.6Hz,1H),3.74-3.73(m,2H),1.96(s,3H)。
100℃で1時間真空引きすることにより乾燥させたLiCl(21.2mg,0.500mmol,1.00当量)にTHF(0.750mL)を加え、溶液とした後、0℃で冷却しながら2.0MのiPrMgClのTHF溶液(0.250mL,0.500mmol,1.00当量)を加えた。なお、「iPr」はイソプロピル基を表す。次いで、ArI(2-(5-ヨード-2-メチルベンジル)-5-(4-フルオロフェニル)チオフェン(204mg,0.500mmol,1.00当量)のTHF(1.00mL)溶液を0℃でゆっくり滴下した後、室温で1時間撹拌した。TLCでArIが消費され、ArMgBr・LiClが生成していることを確認し、次の反応に用いた。
CuCl(37.1mg、0.375mmol,1.5当量)の乾燥THF(1.50mL)懸濁液に、0.25M ArMgCl・LiClのTHF溶液(1.50mL、0.375mmol、1.5当量)を5分かけて滴下し、10分間撹拌して懸濁液を得た。この懸濁液に1.0M RMgBr(2、6-ジメチルフェニルマグネシウムブロミド)(0.188mmol、0.75当量)のTHF溶液(0.188mL)を加え、さらに10分撹拌して有機銅試薬を得た。
CuClの使用量を2.0当量へ変更したこと、ArMgBr・LiClの使用量を2.0当量へ変更したこと、及び、RMgBrの使用量を1.0当量に変更したこと以外は、実施例13と同様の操作を行った。その結果、ケトン誘導体(化合物7)の収率は91%(196mg)であり、化合物8の収率は4%(8.6mg)であった。
マグネシウム(24.3mg,1.00mmol,2.00当量)にTHF(1.00mL)、及び、1,2-ジブロモエタン(0.05mL)を加えて活性化させた後、これにBMB(2-(5-ブロモ-2-メチルベンジル)-5-(4-フルオロフェニル)チオフェン:181mg、0.500mmol、1.00当量)のTHF溶液(1.00mL)をゆっくりと滴下した。その後、80℃で3時間撹拌して、0.25M ArMgBrのTHF溶液を調製した。
マグネシウム(24.3mg,1.00mmol,2.00当量)にTHF(1.00mL)、及び、1,2-ジブロモエタン(0.05mL)を加えて活性化させた後、これに2-ブロモメシチレン(99.5mg、0.500mmol、1.00当量)のTHF溶液(1.00mL)をゆっくりと発熱に注意しながら滴下した。その後、室温で3時間撹拌して、0.25M MesMgBrのTHF溶液を調製した。
CuCl(27.2mg、0.275mmol,1.1当量)のTHF(1.50mL)懸濁液に、0.25M ArMgClのTHF溶液(1.10mL、0.275mmol、1.1当量)を5分かけて滴下し、10分間撹拌して懸濁液を得た。この懸濁液に0.25M MesMgBr(0.138mmol、0.55当量)のTHF溶液(0.550mL)を加え、さらに10分撹拌して有機銅試薬を得た。
マグネシウム(48.6mg,2.00mmol,2.0当量)にTHF(2.00mL)、1,2-ジブロモエタン(0.05mL)を加えて活性化した後、BMB(2-(5-ブロモ-2-メチルベンジル)-5-(4-フルオロフェニル)チオフェン,361mg,1.00mmol,1.00当量)のTHF溶液(2.00mL)をゆっくり滴下した。すべて加え終わった後、80℃で3時間撹拌した。
マグネシウム(48.6mg,2.00mmol,2.0当量)にTHF(2.00mL)、1,2-ジブロモエタン(0.05mL)を加えて活性化した後、発熱に気を付けながら2-ブロモメシチレン(200mg,1.00mmol,1.00当量)のTHF溶液(2.00mL)をゆっくり滴下した。すべて加え終わった後、80℃で3時間撹拌した。
CuCl(37.1mg,0.375mmol,1.5当量)のTHF懸濁液(1.25mL)に、0.25M ArMgBrのTHF溶液(1.50mL,0.375mmol,1.5当量)を5分かけて滴下し、10分間撹拌した。0.25M 2-メシチルマグネシウムブロミドのTHF溶液(0.750mL,0.188mmol,0.75当量)を加え、さらに10分間撹拌した。得られた銅試薬のTHF懸濁液の全量を反応に用いた。
マグネシウム(48.6mg,2.00mmol,2.0当量)にTHF(2.00mL)、1,2-ジブロモエタン(0.05mL)を加えて活性化した後、BMB(2-(5-ブロモ-2-メチルベンジル)-5-(4-フルオロフェニル)チオフェン,361mg,1.00 mmol,1.00当量)のTHF溶液(2.00mL)をゆっくり滴下した。すべて加え終わった後、80℃で3時間撹拌した。
CuCl(37.1mg,0.375mmol,1.5当量)のTHF懸濁液(1.81mL)に、0.25M ArMgBrのTHF溶液(1.50mL,0.375 mmol,1.5当量)を5分かけて滴下し、10分間撹拌した。1M 2,6-キシリルマグネシウムブロミドのTHF溶液(Aldrich:425508-100ML,0.188mL,0.188mmol,0.75当量)を加え、さらに10分間撹拌した。得られた銅試薬のTHF懸濁液の全量を反応に用いた。
化合物8をTHF(1.50mL)に溶解し、調製した銅試薬のTHF懸濁液に室温下、5分で滴下した後、40℃で20時間撹拌した。室温へ放冷後、ナトリウムメトキシド(67.5mg,1.25mmol,5.0当量)のメタノール溶液(5.00mL)を反応混合物に加えて、60℃で6時間撹拌した。1M HCl水溶液(1mL)で反応を停止し、酢酸エチル(10mL)を加え、1M HCl水溶液(5mL×3)、食塩水(5mL×1)で洗浄後、Na2SO4で有機層を乾燥させた。シリカゲルカラムクロマトグラフィー(酢酸エチル:n-ヘキサン=1:10~1:3)で混合物を精製することにより、化合物10を収率77%(157mg,黄色油状物)で得た。
1H NMR(400MHz,CDCl3,30℃) δ 7.52(d,J=1.8Hz,1H),7.45(dd,J=7.8,1.9Hz,1H),7.38-7.28(m,10H),7.26-7.15(m,11H),7.00-6.94(m,5H),6.61(d,J=3.6Hz,1H),4.89-4.86(m,3H),4.67(d,J=8.4Hz,1H),4.64(d,J=9.8Hz,1H),4.54(d,J=12.4Hz,1H),4.38(d,J=10.6Hz,1H),4.18-4.03(m,4H),3.94(d,J=10.6Hz,1H),3.88-3.82(m,2H),3.72(dd,J=11.1,1.8Hz,1H),3.60(dd,J=9.3,0.8Hz,1H),3.06(d,J=0.9Hz,1H),2.33(s,3H).
下記式で示される反応を行い、化合物11aから、化合物12aを製造した。同様にして、化合物11b~11kから、それぞれ、化合物12b~12kを製造した。
1H NMR (400MHz,CDCl3,30℃) δ 8.11(d,J=8.6Hz,2H,ArH),8.01(d,J=8.6Hz,2H,ArH),4.41(q,J=7.1Hz,2H,OCH2CH3),3.09(t,J=7.3Hz,2H,SCH2),1.69(quint,J=7.1Hz,2H,SCH2CH2),1.43-1.26(m,21H,SCH2CH2(CH2)9CH3+OCH2CH3),0.88(t,J=6.6Hz,3H,S(CH2)11CH3)。 13C{1H} NMR (100MHz,CDCl3,30℃) δ 191.7,165.8,140.6,134.5,129.9,127.2,61.6,32.0,29.8,29.74,29.69,29.60,29.55,29.5,29.3,29.1,22.8,14.4,14.2。
1H NMR (400MHz,CDCl3,30℃) δ 8.05-7.97(m,4H,ArH),3.08(t,J=7.2Hz,2H,SCH2),1.68(quint,J=7.5Hz,2H,SCH2CH2),1.61(s,9H,tBu),1.43(m,2H,SCH2CH2CH2),1.30-1.26(m,16H,SCH2CH2CH2(CH2)8CH3),0.88(t,J=6.7Hz,3H,S(CH2)11CH3)。
13C{1H} NMR (100MHz,CDCl3,30℃) δ 191.8,164.9,140.3,136.1,129.7,127.5,127.1,81.9,32.0,29.74,29.69,29.60,29.56,29.46,29.4,29.3,29.1,28.3,22.8,14.2。
IR (neat KBr,ν/cm-1) 2952,2915,2871,2850,1728,1657,1607,1542。
HRMS (FAB+) m/z C40H49O3S ([M+H]+) 計算値406.2542 実測値407.2616。
融点:50.8-52.0℃。
1H NMR (400MHz,CDCl3,30℃) δ 8.10(d,J=8.0Hz,2H,ArH),8.01(d,J=8.0Hz,2H,ArH),3.94(s,3H,OCH3),3.09(t,J=8.0Hz,2H,SCH2),1.68(quint,J=8.0Hz,2H,SCH2CH2),1.41-1.43(m,2H,SCH2CH2CH2),1.26-1.30(m,16H,SCH2CH2CH2(CH2)8CH3),0.88(t,J=6.0Hz,3H,S(CH2)11CH3)。13C{1H} NMR (100MHz,CDCl3,30℃) δ 191.7,166.3,140.7,134.2,129.9,127.2,66.2,56.1,52.6,52.2,32.0,29.7,29.7,29.6,29.5,29.5,29.3,29.0,22.8,14.2。
IR (neat KBr,ν/cm-1) 2952,2917,2850,1715,1656。
HRMS (FAB+) m/z C24H49O3S ([M+H]+) 計算値364.2072 実測値365.2151。
融点:68.3-70.7℃。
1H NMR (400MHz,CDCl3,30℃) δ 8.01(d,J=8.2Hz,2H,ArH),7.47(d,J=8.2Hz,2H,ArH),3.77-3.40(m,8H,morpholine),3.08(t,J=8.0Hz,2H,SCH2),1.68(quint,J=8.0Hz,2H,SCH2CH2),1.43-1.40(m,2H,SCH2CH2CH2),1.26(m,16H,SCH2CH2CH2(CH2)8CH3),0.88(t,J=6.0Hz,3H,S(CH2)11CH3)。
13C{1H} NMR (100MHz,CDCl3,30℃) δ 191.5,169.3,139.9,138.4,127.6,127.4,66.9,48.2,42.7,32.0,29.73,29.69,29.60,29.57,29.5,29.4,29.3,29.0,22.8,14.2。
IR (neat KBr,ν/cm-1) 2951,2917,2849,1661,1920,1604。
HRMS (FAB+) m/z C40H49NO3S ([M+H]+) 計算値419.2494 実測値420.2571。
融点:75.9-77.1℃。
1H NMR (400MHz,CDCl3,30℃) δ 8.05(d,J=8.5Hz,2H,ArH),7.75(d,J=8.4Hz,2H,ArH),3.10(t,J=7.3Hz,2H,SCH2),1.69(quint,J=7.1Hz,2H,SCH2CH2),1.43-1.41(m,2H,SCH2CH2CH2),1.32-1.26(m,16H,SCH2CH2CH2(CH2)8CH3),0.88(t,J=6.6Hz,3H,S(CH2)11CH3)。13C{1H} NMR (100MHz,CDCl3,30℃) δ 190.9,140.5,132.6,127.8,118.0,116.6,32.0,29.74,29.67,29.64,29.58,29.5,29.2,29.0,22.8,14.2。
IR (neat KBr,ν/cm-1) 2952,2915,2870,2851,1658,1623,1560,1542。
HRMS (FAB+) m/z C24H49NOS ([M+H]+) 計算値331.1970 実測値332.2047。
融点:50.6-53.1℃。
1H NMR (400MHz,CDCl3,30℃) δ 8.02-7.98(m,2H,ArH),7.14-7.10(m,2H,ArH),3.07(t,J=7.3Hz,2H,SCH2),1.67(quint,J=7.0Hz,2H,SCH2CH2),1.43-1.27(m,18H,SCH2CH2(CH2)9CH3),0.89(t,J=6.6Hz,3H,S(CH2)11CH3)。13C{1H} NMR (100MHz,CDCl3,30℃) δ 190.7,166.0(d,JC-F=253Hz),133.8,129.8(d,JC-F=10Hz),115.7(d,JC-F=22Hz),32.0,29.76,29.75,29.70,29.67,29.6,29.5,29.32,29.27,29.1,22.8,14.2。
19F{1H} NMR (376MHz,CDCl3,30℃) δ -105.2。
1H NMR (400MHz,CDCl3,30℃) δ 7.91(d,J=8.4Hz,2H,ArH),7.42(d,J=8.4Hz,2H,ArH),3.07(t,J=7.4Hz,2H,SCH2),1.67(quint,J=7.2Hz,2H,SCH2CH2),1.43-1.27(m,18H,SCH2CH2(CH2)9CH3),0.89(t,J=6.3Hz,3H,S(CH2)11CH3)。13C{1H} NMR (100MHz,CDCl3,30℃) δ 191.2,139.8,135.9,129.1,128.8,32.2,29.91,29.85,29.8,29.6,29.5,29.4,29.2,23.0,14.4。
1H NMR (400MHz,CDCl3,30℃) δ 7.83(d,J=8.6Hz,2H,ArH),7.58(d,J=8.6Hz,2H,ArH),3.07(t,J=7.3Hz,2H,SCH2),1.67(quint,J=7.1Hz,2H,SCH2CH2),1.42-1.40(m,2H,SCH2CH2CH2),1.26(m,16H,SCH2CH2CH2(CH2)8CH3),0.88(t,J=6.6Hz,3H,S(CH2)11CH3)。
13C{1H} NMR (100MHz,CDCl3,30℃) δ 191.3,136.2,132.0,128.8,128.3,32.0,29.74,29.73,29.68,29.59,29.58,29.5,29.34,29.25,29.0,22.8,14.2。
1H NMR (400MHz,CDCl3,30℃) δ 7.81(d,J=8.5Hz,2H,ArH),7.68(d,J=8.6Hz,2H,ArH),3.07(t,J=7.3Hz,2H,SCH2),1.67(quint,J=7.0Hz,2H,SCH2CH2),1.42-1.40(m,2H,SCH2CH2CH2),1.27(m,16H,SCH2CH2CH2(CH2)8CH3),0.89(t,J=6.6Hz,3H,S(CH2)11CH3)。
13C{1H} NMR (100MHz,CDCl3,30℃) δ 191.3,137.8,136.6,128.5,100.7,31.8,29.6,29.54,29.49,29.41,29.38,29.3,29.11,29.06,28.8,22.6,14.0。
IR (neat KBr,ν/cm-1) 2952,2915,2869,2847,1651,1578,1559,1541,1508。
HRMS (FAB+) m/z C24H49OSI ([M+H]+) 計算値432.0984 実測値433.1055。
融点:47.6-48.6℃。
1H NMR (400MHz,CDCl3,30℃) δ 7.80(d,J=3.8Hz,1H,thiophene),7.60(d,J=4.9Hz,1H,thiophene),7.10(d,J=4.0Hz,1H,thiophene),3.07(t,J=7.3Hz,2H,SCH2),1.67(quint,J=7.0Hz,2H,SCH2CH2),1.42-1.40(m,2H,SCH2CH2CH2),1.27(m,16H,SCH2CH2CH2(CH2)8CH3),0.88(t,J=6.6Hz,3H,S(CH2)11CH3)。
13C{1H} NMR (100MHz,CDCl3,30℃) δ 184.3,142.6,132.4,130.9,127.9,32.0,29.78,29.76,29.74,29.70,29.6,29.5,29.4,29.3,29.0,22.8,14.2。
1H NMR (400MHz,CDCl3,30℃) δ 7.30-7.25(m,2H,ArH),7.21-7.17(m,3H,ArH),2.98(t,J=7.2Hz,2H,SCH2),2.89-2.83(m,4H,PhCH2CH2),1.55(quint,J=7.2Hz,2H,SCH2CH2),1.26(m,18H,SCH2CH2(CH2)9CH3),0.89(t,J=7.0Hz,3H,S(CH2)11CH3)。
13C{1H} NMR (100MHz,CDCl3,30℃) δ 198.8,140.3,128.6,128.4,126.4,45.7,32.1,31.6,29.78,29.76,29.71,28.67,29.6,29.5,29.3,29.1,28.9,22.8,14.2。
CuTC(銅(I)チオフェン-2-カルボン酸塩,0.250mmol,47.7mg,1.0当量)のTHF懸濁液(2mL)に、0.52MのPhMgBrのTHF溶液(0.325mmol,0.625mL,1.3当量)を5分かけて滴下した後、室温で10分間撹拌した。この段階で、有機銅試薬が生成した。生成した有機銅試薬を、上記で得られたチオエステル(0.250mmol,1.0当量)のTHF溶液(2mL)に5分かけて滴下した後、反応混合物を30℃で1時間撹拌した。反応終了後、1M HCl水溶液(1mL)で反応を停止し、下記の方法で収率を算出した。
内部標準物質(トリフェニルメタン)と生成物とのプロトン積分比から収率を算出した。サンプルは内部標準であるトリフェニルメタンを加えた後、ショートパットシリカ(酢酸エチル)により金属塩を除き、溶媒を減圧留去したものを重クロロホルムに溶解することで調製した。
1H NMR (400MHz,CDCl3,30℃) δ 8.15(d,J=8.2Hz,2H,ArH),7.83(d,J=8.2Hz,2H,ArH),7.80(d,J=7.5Hz,2H,ArH),7.61(t,J=7.3Hz,1H,ArH),7.49(t,J=7.6Hz,2H,ArH),4.42(q,J=7.1Hz,2H,OCH2),1.42(t,J=7.2Hz,3H,OCH2CH3)。13C{1H} NMR (100MHz,CDCl3,30℃) δ 196.1,165.9,141.4,137.2,133.7,133.0,130.2,129.8,129.6,128.6,61.5,14.4。
1H NMR (400MHz,CDCl3,30℃) δ 8.09(d,J=8.3Hz,2H,ArH),7.81(d,J=8.0Hz,2H,ArH),7.79(d,J=6.8Hz,2H,ArH),7.61(t,J=7.3Hz,2H,ArH),7.49(t,J=7.8Hz,2H,ArH),1.62(s,9H,OtBu)。13C{1H} NMR (100MHz,CDCl3,30℃) δ 196.1,164.9,140.9,137.1,135.2,132.8,130.1,129.6,129.3,128.4,81.8,28.1。
1H NMR (400MHz,CDCl3,30℃) δ 8.15(d,J=8.4Hz,2H,ArH),8.15(d,J=8.0Hz,2H,ArH),8.15(d,J=8.0Hz,2H,ArH),7.61(t,J=7.4Hz,1H,ArH),7.49(t,J=7.4Hz,2H,ArH),3.96(s,3H,OMe)。
13C{1H} NMR (100MHz,CDCl3,30℃) δ 196.0,166.3,141.3,137.0,132.9,130.1,129.7,129.5,128.4,52.4。
1H NMR (400MHz,CDCl3,30℃) δ 7.85-7.79(m,4H,ArH),7.63-7.59(m,1H,ArH),7.53-7.47(m,4H,ArH),3.78-3.45(m,8H,morpholine)。
13C{1H} NMR (100MHz,CDCl3,30℃) δ 196.0,169.5,139.1,139.0,137.2,133.0,130.3,130.2,128.6,127.1,67.0,48.1,42.8。
1H NMR (400MHz,CDCl3,30℃) δ 7.88(d,J=8.3Hz,2H,ArH),7.79(m,4H,ArH),7.65(t,J=7.3Hz,2H,ArH),7.52(t,J=7.7Hz,2H,ArH)。
13C{1H} NMR (100MHz,CDCl3,30℃) δ 195.1,141.4,136.5,133.4,132.3,130.4,130.2,128.8,118.1,115.8。
1H NMR (400MHz,CDCl3,30℃) δ 7.86-7.83(m,2H,ArH),7.77(d,J=7.3Hz,2H,ArH),7.59(t,J=7.4Hz,1H,ArH),7.49(t,J=7.8Hz,2H,ArH),7.16(t,J=8.6Hz,2H,ArH)。
13C{1H} NMR (100MHz,CDCl3,30℃) δ 195.2,165.3(d,JC-F=252Hz),137.5,133.8(d,JC-F=3Hz),132.6(d,JC-F=9Hz),132.4,129.8,128.3,115.4(d,JC-F=22Hz)。
19F{1H} NMR (376MHz,CDCl3,30℃) δ -106.0。
1H NMR (400MHz,CDCl3,30℃) δ 7.78(d,J=6.4Hz,2H,ArH),7.76(d,J=8.3Hz,2H,ArH),7.60(t,J=7.3Hz,1H,ArH),7.49(t,J=7.8Hz,2H,ArH),7.46(d,J=8.4Hz,2H,ArH)。
13C{1H} NMR (100MHz,CDCl3,30℃) δ 195.4,138.9,137.3,135.9,132.6,131.4,129.9,128.6,128.4。
1H NMR (400MHz,CDCl3,30℃) δ 7.77(d,J=7.1Hz,2H,ArH),7.68(d,J=8.6Hz,2H,ArH),7.63(d,J=8.5Hz,2H,ArH),7.59(d,J=7.4Hz,1H,ArH),7.49(t,J=7.5Hz,2H,ArH)。
13C{1H} NMR (100MHz,CDCl3,30℃) δ 195.7,137.4,136.5,132.8,131.8,131.7,130.1,128.5,127.6。
1H NMR (400MHz,CDCl3,30℃) δ 7.85(d,J=8.4Hz,2H,ArH),7.77(d,J=7.2Hz,2H,ArH),7.60(t,J=7.4Hz,1H,ArH),7.53-7.47(m,4H,ArH)。
13C{1H} NMR (100MHz,CDCl3,30℃) δ 196.0,137.7,137.3,137.1,132.8,131.6,130.1,128.5,100.2。
1H NMR (400MHz,CDCl3,30℃) δ 7.87(d,J=7.4Hz,2H,ArH),7.72(d,J=5.0Hz,1H,thiophene),7.66(d,J=3.8Hz,1H,thiophene),7.59(t,J=7.2Hz,1H,ArH),7.50(t,J=7.8Hz,2H,ArH),7.16(t,J=4.0Hz,1H,thiophene)。
13C{1H} NMR (100MHz,CDCl3,30℃) δ 188.3,143.8,138.3,134.9,134.3,132.4,129.3,128.5,128.1。
1H NMR (400MHz,CDCl3,30℃) δ 7.95(d,J=7.5Hz,2H,ArH),7.54(t,J=7.4Hz,2H,ArH),7.44(t,J=7.7Hz,2H,ArH),7.31-7.27(m,3H,ArH),7.21-7.17(m,2H,ArH),3.29(t,J=7.7Hz,2H,PhCH2CH2),3.07(t,J=7.7Hz,2H,PhCH2CH2)。13C{1H} NMR (100MHz,CDCl3,30℃) δ 199.3,141.4,137.0,133.2,128.7,128.65,128.6,128.55,128.4,128.2,126.3,40.6,30.3。
下記式で示される反応の最適化を行った。
[Ph 2 Cu][Mg 2 Br 3 (thf) 6 ]の調製
下記式で示される反応を行い、[Ph2Cu][Mg2Br3(thf)6]を調製した。
2CuCl+3PhMgBr→[Ph2Cu][Mg2Br3(thf)6]+PhCu+MgCl2
CuBr(1.43g,10.0mmol,1.00当量)のTHF溶液(20.0mL)に、0.9M PhMgBrのTHF溶液(11.1mL,10.0mmol,1.00当量)を0℃で滴下した。室温で2時間撹拌した後、ろ過により上澄みを除去した。残渣をTHF(10mL×3)で洗浄し、真空引きすることにより乾燥させた。THF(20mL)を加えて、0.5M CuPhのTHF懸濁液を得た。
[Ph2Cu][Mg2Br3(thf)6](11.7mg,12.5μmol,0.500当量、又は、23.5mg,25.0μmol,1.00当量)のTHF-d8溶液(0.250mL)に、化合物14(S-ブチルチオベンゾエート,4.63μL,25.0μmol,1.00当量)のTHF-d8溶液(0.250mL)を加えた。反応混合物を30℃で3時間加熱し、反応混合物の1H NMR分析を直接行った。化合物15の収率を、S-ブチルチオベンゾエートとCuSnブチルとの-SCH2-積分比により求めたところ、[Ph2Cu][Mg2Br3(thf)6]が0.500当量である場合は、50%、[Ph2Cu][Mg2Br3(thf)6]が1.00当量である場合は、ほぼ100%(quant.)であった。
J-youngチューブに0.5M CuPhのTHF懸濁液(50.0μL,25.0μmol,1.00当量)を加え、真空引きすることによりTHFを除去した。THF-d8(0.250mL)を加えた後、化合物14(S-ブチルチオベンゾエート,4.63μL,25.0μmol,1.00当量)のTHF-d8溶液(0.250mL)を加えた。反応混合物を30℃で3時間加熱し、反応混合物の1H NMR分析を直接行った。化合物15の収率を、S-ブチルチオベンゾエートとCuSnブチルとの-SCH2-積分比により求めたところ、痕跡量であった。
J-youngチューブに0.5M CuPhのTHF懸濁液(25.0μL,12.5μmol,0.500当量)を加え、真空引きすることによりTHFを除去した。[Ph2Cu][Mg2Br3(thf)6](11.7mg,12.5μmol,0.500当量)のTHF-d8溶液(0.250mL)を加えた後、化合物14(S-ブチルチオベンゾエート,4.63μL,25.0μmol,1.00当量)のTHF-d8溶液(0.250mL)を加えた。反応混合物を30℃で3時間加熱し、反応混合物の1H NMR分析を直接行った。化合物15の収率を、S-ブチルチオベンゾエートとCuSnブチルの-SCH2-積分比により求めたところ、90%であった。
J-youngチューブに0.5M CuPhのTHF懸濁液(25.0μL,12.5μmol,0.500当量)を加え、真空引きすることによりTHFを除去した。[Ph2Cu][Mg2Br3(thf)6](11.7mg,12.5μmol,0.500当量)のTHF-d8溶液(0.250mL)を加えた後、化合物16(エチルベンゾエート,3.58μL,25.0μmol,1.00当量)のTHF-d8溶液(0.250mL)を加えた。反応混合物を30℃で3時間加熱し、反応混合物の1H NMR分析を直接行った。化合物15は検出されなかった。
[Ph2Cu][Mg2Br3(thf)6](70.4mg,0.0750mmol,30.0mol%)のTHF溶液(3.15mL)に、0.5M CuPhのTHF懸濁液(0.350mL,0.175mmol,0.700当量)を加え、次いで、化合物17(94.6mg,0.250mmol,1.00当量)のTHF溶液(1.50mL)を加えた。反応混合物を30℃で3時間加熱した後、反応混合物に1M HCl水溶液(1mL)を加えて反応をクエンチした。酢酸エチルによって溶出するシリカゲルパッドを通じたろ過により金属錯体を除去した。化合物18の収率を、トリフェニルエタン(Ph3CH)を内部標準物質として使用したガスクロマトグラフィー分析により求めたところ、84%であった。
Claims (7)
- 下記式(I):
で表されるケトン誘導体(I)を製造する方法であって、
下記式(II):
で表されるチオエステル誘導体(II)と、
下記式(IIIa):
で表されるグリニャール試薬(IIIa)、及び、
下記式(IIIb):
で表されるグリニャール試薬(IIIb)
から選択されるグリニャール試薬(III)と、
銅塩と、
を混合して、前記ケトン誘導体(I)を形成する工程
を含む、前記方法。 - 前記工程において、前記グリニャール試薬(III)と前記銅塩とを混合して有機銅試薬を形成させた後、前記チオエステル誘導体(II)を混合し、前記有機銅試薬と前記チオエステル誘導体(II)とを接触させる、請求項1に記載の方法。
- 前記銅塩の使用量が、前記グリニャール試薬(III) 1モルに対して、0.1モル以上1モル以下である、請求項1又は2に記載の方法。
- 前記工程において、前記チオエステル誘導体(II)、前記グリニャール試薬(III)及び前記銅塩を、20℃以上60℃以下の範囲内の温度で混合する、請求項1~3のいずれか一項に記載の方法。
- W2が、アリール基の結合手を有する炭素原子の両隣に位置する炭素原子は置換基を有さず、残りの炭素原子は置換基を有していてもよいアリール基、又は、ヘテロアリール基の結合手を有する炭素原子の両隣に位置する炭素原子若しくはヘテロ原子は置換基を有さず、残りの炭素原子若しくはヘテロ原子は置換基を有していてもよいヘテロアリール基であり、
前記工程において、前記チオエステル誘導体(II)と、前記グリニャール試薬(III)と、前記銅塩と、下記式(IV):
- 前記グリニャール試薬(IV)の使用量が、前記グリニャール試薬(III) 1モルに対して、0.01モル以上1モル以下である、請求項5に記載の方法。
- 前記工程において、前記グリニャール試薬(III)と前記銅塩とを混合し、次いで、前記グリニャール試薬(IV)を混合して有機銅試薬を形成させた後、前記チオエステル誘導体(II)を混合し、前記有機銅試薬と前記チオエステル誘導体(II)とを接触させる、請求項5又は6に記載の方法。
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